KR101227140B1 - Method for manufacturing color filter substrate for liquid crystal display - Google Patents

Abstract

A method of manufacturing a color filter substrate for a liquid crystal display device in which a selectively driven liquid crystal cell may serve as a mask is provided. A method of manufacturing a color filter substrate for a liquid crystal display includes: a) forming a black matrix defining a pixel region on a transparent insulating substrate; And b) applying a color photosensitive agent to the exposed front surface; c) aligning a preformed liquid crystal cell with the black matrix and the pixel region; d) driving a sub-pixel of said liquid crystal cell and exposing a color filter pattern corresponding to said color photosensitive agent; And e) developing the exposed color filter pattern to form a color filter.

Liquid crystal display, color filter, liquid crystal cell, exposure, mask, gradation voltage, spacer

Description

Manufacturing method of color filter substrate for liquid crystal display {METHOD FOR MANUFACTURING COLOR FILTER SUBSTRATE FOR LIQUID CRYSTAL DISPLAY}

1 is a diagram schematically illustrating a configuration of a general liquid crystal display panel.

2 is a vertical cross-sectional view of a general liquid crystal display panel.

3A and 3E are views illustrating a manufacturing process of a color filter for a liquid crystal display according to a related art.

4 is a view for explaining the principle of the manufacturing method of the color filter substrate for a liquid crystal display according to an embodiment of the present invention.

5 is a vertical cross-sectional view of a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

6A to 6P are views illustrating a manufacturing process of a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

FIG. 7 is a diagram for describing a liquid crystal cell serving as a half-tone mask illustrated in FIG. 6.

DESCRIPTION OF THE REFERENCE NUMERALS

100: liquid crystal cell 110: TFT substrate of liquid crystal cell

111: sub-pixel 120: liquid crystal

130: color filter substrate of liquid crystal cell 200: color filter substrate to be manufactured

210: transparent insulating substrate 220: black matrix

230R, 230G, 230B: color filter layer

The present invention relates to a method for producing a color filter substrate for a liquid crystal display device.

In general, a liquid crystal display is an apparatus that expresses an image by using optical anisotropy and birefringence characteristics of liquid crystal molecules. In the liquid crystal display, two substrates on which the field generating electrodes are formed are disposed so that the surfaces on which the two electrodes are formed face each other, a liquid crystal material is injected between the two substrates, and then a voltage is applied to the two electrodes. By changing the arrangement of the liquid crystal molecules by the electric field, and by controlling the amount of light transmitted through the transparent insulating substrate, the desired image is expressed.

As the liquid crystal display, a thin film transistor liquid crystal display (TFT LCD) using a thin film transistor (TFT) as a switching element is mainly used. The TFT LCD transmits the red (R), green (G), and blue (B) color filter layers disposed 1: 1 on each liquid crystal pixel after the backlight having white light passes through the liquid crystal pixel and the light transmittance is adjusted. The color mixture of the TFT-LCD is produced by adding mixed color of the emitted light.

FIG. 1 is a view schematically showing a configuration of a general liquid crystal panel, and FIG. 2 is a vertical cross-sectional view of the portion II ′ of FIG. 1.

1 and 2, the liquid crystal panel provided in the liquid crystal display device includes a first substrate 10, a second substrate 20, and the first substrate 10 and the second substrate which are bonded to each other with a predetermined space. It consists of a liquid crystal layer 30 injected between the substrates 20. In this case, the first substrate 10 is defined as a TFT region TFT, a pixel region and a storage region C _ST , which are switching regions, and the first substrate 10 is a transparent glass substrate 11 and a gate layer. 12a, 12b, interlayer insulating film 13, active layer 14, ohmic contact layers 15a, 15b, data layers 16a, 16b, 16c, passivation layer 17, pixel electrode 18 and the like. It is configured to include. In addition, the color filter substrate 20 includes a transparent glass substrate 21, a black matrix 22, a color filter 23, and a common electrode 24.

Specifically, the first substrate 10 has a predetermined distance on the transparent glass substrate 11 with a plurality of gate lines 12 in one direction, and a constant interval in a direction perpendicular to the gate line 12. By arranging a plurality of data lines 16, the pixel region Pixel is defined.

A pixel electrode 18 is formed in each pixel region Pixel, and a thin film transistor TFT is formed at a portion where the gate line 12 and the data line 16 cross each other. The data signal of the data line 16 is applied to each of the pixel electrodes 18 according to the scan signal applied through the gate line 12.

In addition, a black matrix layer 22 is formed on the transparent glass substrate 21 to block light in a portion other than the pixel area on the transparent glass substrate 21, and corresponds to each pixel area. R, G, and B color filter layers 23 for forming colors are formed in the portion, and a common electrode 24 is formed on the color filter layers 23.

A charging capacitor C _ST connected in parallel with the pixel electrode 18 is configured on the gate line 12, and a portion of the gate line 12 is used as the first electrode of the charging capacitor C _ST . As the second electrode, an island-shaped metal pattern formed of the same material as the source and drain electrodes is used.

The thin film transistor TFT, the gate lines 12a and 12b and the data line 16a may be disposed on an opposite surface of the second substrate 20 spaced apart from each other with the first substrate 10 and the liquid crystal layer 30 interposed therebetween. The black matrix 22 is formed corresponding to 16b and 16c, and the color filter 23 is formed in the surface corresponding to the pixel area Pixel. In addition, a transparent common electrode 24 is formed on an entire surface of the second substrate 20 including the color filter 23 and the black matrix 22. Here, an alignment layer (not shown) may be formed on the pixel electrode 14 and the common electrode 24, respectively.

In addition, a spacer 25 may be formed between the first substrate 10, which is an array substrate, and the second substrate 20, which is a color filter substrate, to maintain a gap between the two substrates.

In the liquid crystal display, the liquid crystal layer 30 formed between the first substrate 10 and the second substrate 20 is aligned by an electric field between the pixel electrode 18 and the common electrode 24, and the liquid crystal is aligned. The desired image can be expressed by adjusting the amount of light passing through the liquid crystal layer 30 according to the degree of alignment of the layer 30.

Such a liquid crystal display is called a twisted nematic (TN) mode liquid crystal display, and the TN mode liquid crystal display has a disadvantage of having a narrow viewing angle, and an in-plane switching (IPS) for overcoming the disadvantage of the TN mode. A mode liquid crystal display has been developed.

In the IPS mode liquid crystal display, a pixel electrode and a common electrode are formed parallel to each other at a predetermined distance in a pixel region of the first substrate so that a lateral electric field (horizontal electric field) is generated between the pixel electrode and the common electrode. The liquid crystal layer is aligned by the electric field.

3A and 3E are diagrams illustrating a manufacturing process of a color filter for a liquid crystal display according to a related art.

Referring to FIG. 3A, in the process of manufacturing a color filter for a liquid crystal display according to the related art, a black matrix 22 is formed on a transparent glass substrate 21 to define a pixel region. Referring to FIG. 3B, the color photosensitive agent 23 is applied to the entire surface of the exposed transparent glass substrate 21.

 Subsequently, referring to FIG. 3C, by exposing the color photosensitive agent 23 using the mask 24, for example, a red (R) color filter pattern is formed and subsequently developed, dried, and cleaned. Through this, a color filter 23R as shown in FIG. 3D is formed.

Thereafter, by repeating the process of FIGS. 3B to 3D, the green (G) and blue (B) color filters 23G and 23B are formed, respectively.

However, in the manufacturing process of the color filter for the liquid crystal display according to the related art, each mask should be used when the black matrix and the color filter layer are formed. Such a mask process has a problem that the process is complicated as well as cost.

An object of the present invention for solving the above problems is to provide a method of manufacturing a color filter substrate for a liquid crystal display device which can reduce the number of masks for forming a color filter by the driving liquid crystal cell serves as a mask.

In addition, another object of the present invention is to provide a method for manufacturing a color filter substrate for a liquid crystal display device, in which a liquid crystal cell driven according to a gray voltage serves as a half-tone mask, thereby forming a spacer.

The objects of the present invention are not limited to the above-mentioned objects, and other objects not mentioned can be clearly understood by those skilled in the art from the following description.

As a means for achieving the above object, a method of manufacturing a color filter substrate for a liquid crystal display according to the present invention comprises the steps of: a) forming a black matrix defining a pixel region on a transparent insulating substrate; And b) applying a color photosensitive agent to the exposed front surface; c) aligning a preformed liquid crystal cell with the black matrix and the pixel region; d) driving a sub-pixel of said liquid crystal cell and exposing a color filter pattern corresponding to said color photosensitive agent; And e) developing the exposed color filter pattern to form a color filter.

Here, steps b) to e) are repeated to form red (R), green (G), or blue (B) color filters by applying a red (R), green (G), or blue (B) photosensitive agent. It is characterized by.

Herein, the liquid crystal cell of step d) drives any one of the red (R), green (G), and blue (B) sub-pixels to full-white, and the rest is full-black. -Black).

Here, when the liquid crystal cell is driven to the full-white, it transmits light so that the color photosensitive agent is cured, and when the liquid crystal cell is driven to the full-black, blocking the light so that the color photosensitive agent is not cured It is characterized by.

Here, the color filter of step e) is formed in a pattern of a shape corresponding to the same color sub-pixel of the liquid crystal cell, respectively.

Here, the color photosensitive agent of step b) is characterized in that the exposed portion forms a corresponding color filter pattern, the unexposed portion is removed.

Here, the step b), it is characterized in that any one of the R, G and B color photosensitive agent is applied to the exposed entire surface by the spin coating method (Spin Coating).

Here, the step a) may include a-1) forming a black matrix layer on the transparent insulating substrate; a-2) aligning a pre-formed liquid crystal cell with the black matrix and the pixel region; a-3) driving a sub-pixel of the liquid crystal cell and exposing the black matrix layer to form a black matrix pattern; a-4) developing the exposed black matrix pattern to form the black matrix.

Here, the step a-3) is characterized in that all of the R, G, B sub-pixels of the liquid crystal cell are driven full-white to expose the black matrix layer.

Here, the black matrix layer of step a-1) is characterized in that the exposed portion is removed by development.

On the other hand, as another means for achieving the above object, a method of manufacturing a color filter substrate for a liquid crystal display according to the present invention, a) forming a black matrix defining a pixel region on a transparent insulating substrate; b) forming R, G, and B color filters on the pixel region, respectively; c) forming an overcoat by entirely depositing an organic material on the color filter; d) applying a photoresist for forming a column spacer on the planarization layer; And e) driving the sub-pixels of the liquid crystal cell to expose the photosensitizer and form column spacers.

Here, the liquid crystal cell of step e) is driven to a predetermined level corresponding to the gray scale voltage.

The liquid crystal cell may serve as a half-tone mask to expose the photosensitive agent for forming the column spacer.

The region where the column spacer of the liquid crystal cell is to be formed is driven in correspondence to the gray voltage, and the other regions are driven to full-black.

Here, the photosensitive agent of step e) is characterized in that the portion exposed by the liquid crystal cell forms a pattern for forming a spacer.

Here, the step e) may include: e-1) aligning a sub-pixel of a pre-formed Liquid Crystal Cell with a portion to form the column spacer; e-2) driving the sub-pixels of the liquid crystal cell and exposing a column spacer pattern corresponding to the photoresist for forming column spacers; And e-3) developing the exposed column spacer pattern to form a column spacer.

Advantages and features of the present invention, and methods of achieving the same will become apparent with reference to the embodiments described below in detail in conjunction with the accompanying drawings. However, the present invention is not limited to the embodiments disclosed below, but may be embodied in various forms, and the present embodiments are merely provided to make the disclosure of the present invention complete and the general knowledge in the art to which the present invention belongs. It is provided to fully inform the person having the scope of the invention, the invention is defined only by the scope of the claims. Like reference numerals refer to like elements throughout.

Hereinafter, a method of manufacturing a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention will be described in detail with reference to the accompanying drawings.

4 is a view for explaining the principle of the manufacturing method of the color filter substrate for a liquid crystal display according to an embodiment of the present invention.

Referring to FIG. 4, in the method of manufacturing a color filter substrate 200 for a liquid crystal display according to an exemplary embodiment of the present invention, a color is formed on a transparent insulating substrate 210 on which a black matrix 220 defining a pixel region is formed. The liquid crystal cell 100 is used to form the filters 230R, 230G, 230B. In this case, the liquid crystal cell 100 includes a TFT array substrate 110, a color filter substrate 130, and a liquid crystal layer 130 injected therebetween, and includes a gate driver (not shown) and a source driver ( Not shown).

Specifically, a color photoresist is applied to the entire surface of the exposed transparent insulating substrate 210, and the preformed liquid crystal cell 100 is aligned to correspond to the black matrix 220 and the pixel region.

Subsequently, the sub-pixel 111 of the liquid crystal cell 100 is driven, and the color filter pattern corresponding to the color photosensitive agent is lit. Subsequently, the exposed color filter patterns are developed to form color filters 230R, 230G, and 230B. Therefore, the color filters 230R, 230G, and 230B apply red (R), green (G), or blue (B) photosensitizers, and then apply red (R), green (G), or blue (B) color filters, respectively. This is accomplished by repeating each of the above processes to form.

The liquid crystal cell 100 drives one of red (R), green (G), and blue (B) sub-pixels in full-white, and the rest in full-black. For example, if the color filter to be formed is a red color filter 230R, the red (R) sub-pixel 111 is driven full-white, and the remaining green (G) and blue (B) sub-pixels are driven. Will be driven full-black. Here, the full-white driving and the full-black driving are obvious to those skilled in the art according to the existing pixel driving technology, and thus detailed description thereof will be omitted.

Substantially, when the liquid crystal cell 100 is driven full-white, light is transmitted to the color photosensitive agent to be cured, and when the liquid crystal cell 100 is driven to the full-black, the color photosensitive agent is It serves to block light so as not to cure. Accordingly, the color filters 230R, 230G, and 230B may be formed in shapes corresponding to the same color sub-pixels of the liquid crystal cell 100, respectively.

Here, the exposed portion of the color photosensitive agent forms a corresponding color filter pattern, and the unexposed portion is removed. In this case, the color photosensitive agent is a transparent insulating substrate 210 exposing any one of the R, G and B color photosensitive agents. ) It is formed by applying the spin coating (Spin Coating) method to the front, but is not limited thereto.

Meanwhile, although FIG. 4 described the driving of the liquid crystal cell 100 to take the role of a mask when the color filters 230R, 230G, and 230B are formed, the black matrix 220 is not limited thereto. In this case, the liquid crystal cell 100 may be used.

That is, after forming by forming a black matrix layer (not shown) on the transparent insulating substrate 210, as described above, the pre-formed liquid crystal cell 100 is aligned to correspond to the black matrix and the pixel region. . Next, the sub-pixel of the liquid crystal cell 100 is driven, the black matrix layer is exposed to form a black matrix pattern, and the exposed black matrix pattern is developed to form the black matrix 220. It may be.

Here, the R, G, and B sub-pixels of the liquid crystal cell 100 are driven to full-white, for example, to expose the black matrix layer, wherein the exposed portion of the black matrix layer is developed. As a result, the black matrix 220 may be formed on the transparent insulating substrate 210.

As a result, the mask for forming the black matrix 220 used for forming the existing black matrix 220 and the mask for forming the R, G, and B color filters used for forming the color filters 230R, 230G, and 230B are not used. It can only manufacture by driving the liquid crystal cell 100. Substantially, the liquid crystal cell 100 may use the liquid crystal cell 100 that is being used as it is.

5 is a vertical cross-sectional view of a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

Referring to FIG. 5, a color filter substrate 200 for a liquid crystal display according to an exemplary embodiment of the present invention may include a transparent insulating substrate 210, a black matrix 220, an RGB color filter 230R, 230G, and 230B, and a planarization layer. (Overcoat: 240), and in addition, the column spacer 250 may be formed on the planarization layer 240.

At this time, also in the case of the column spacer 250, the principles of the present invention as described above can be applied. That is, the photoresist for forming column spacers is deposited on the planarization layer 240, and the liquid crystal cell 100 is driven to serve as a mask, but the liquid crystal cell 100 is at a predetermined level according to the gray voltage. By driving, it can serve as a half-tone mask. Here, the liquid crystal cell 100 serves as a half-tone mask will be described later.

In addition, the color filter substrate 200 according to the embodiment of the present invention may optionally include a planarization layer 240. That is, although the planarization film 240 may be further formed on the color filters 230R, 230G, and 230B to planarize the surface of the color filters 230R, 230G, and 230B, the planarization film 240 may be formed. It may not be formed.

6A to 6P are views illustrating a manufacturing process of a color filter substrate for a liquid crystal display according to an exemplary embodiment of the present invention.

First, referring to FIG. 6A, after depositing the black matrix layer 230 -D on the transparent insulating substrate 210, the liquid crystal cell 100 according to the exemplary embodiment of the present invention is driven, thereby being shown in FIG. 6C. The black matrix 220 is formed to define the pixel area.

That is, the first layer produced in the manufacture of the color filter substrate 200 according to the embodiment of the present invention is the black matrix 220 used as the light blocking layer. The black matrix 200 is installed near the boundary of each pixel to separate the RGB of the color filter of the RGB unit pixel, and simultaneously blocks the light passing through the liquid crystal cell in the region that the pixel electrode of the TFT array substrate cannot control. It serves to improve the contrast ratio of the liquid crystal display.

Next, a method of forming color filters 230R, 230G, and 230B will be described with reference to FIGS. 6D to 6L.

After the black matrix 220 is formed, an RGB pattern for realizing color is formed by an exposure method using driving of the liquid crystal cell 100 as described above.

At this time, the difference from the above-described method of forming the black matrix is that a color photosensitive agent containing pigment particles is used as the photosensitive agent. Although the RGB pattern formation order of the color filter substrate 200 according to the embodiment of the present invention is not determined, it is assumed that the red filter is manufactured in the order of red (R), green (G), and blue (B) for convenience.

The exposure machine used to manufacture the color filters 230R, 230G, and 230B is excellent in productivity because the pattern accuracy of the color filter is not relatively high, and an exposure machine such as a proximity aligner can be used. In this case, the RGB patterns of the color filters 230R, 230G, and 230B formed in a stripe shape may be formed at a level not overlapping each other in the black matrix 220 for dividing the unit pixels. In general, since the width of the black matrix that distinguishes between pixels is relatively wider than 15 μm, the accuracy of the pattern formation level of the TFT array is not required for forming the RGB pattern.

At this time, the application of the color photosensitive agent may be a method using a spin method or a slit nozzle like a photolithography process. The spin coating method is most commonly used because the color photoresist consumes a lot, but the thickness uniformity is excellent. When the size of the glass substrate becomes large enough to not spin coating, another method such as a slit coating method may be used.

Generally, since a color photosensitive agent uses a negative photosensitive agent, the part which is not exposed is removed by a developing solution. The development may include dipping, puddle, shower spray, and the like. After development, a post bake process may be performed to fix the color filter pattern.

Hereinafter, a process of forming a red (R) pattern will be described with reference to FIGS. 6D through 6F, and a process of forming a green (G) pattern will be described with reference to FIGS. 6G through 6I and with reference to FIGS. 6J through 6L. , Blue (B) pattern formation process will be described respectively.

Referring to FIG. 6D, a negative color photosensitive agent 231 in which a pigment of a red component is dispersed is applied onto the substrate 210 on which the black matrix 220 pattern is formed, and as shown in FIG. 6E, the The red sub-pixels are driven full-white, and the remaining green and blue sub-pixels are driven full-black. Accordingly, as shown in FIG. 6F, the photopolymerization initiator in the exposed region reacts to form a polymer, which is left in a pattern without being removed during development. After the development, the formed red color pattern should be fixed by applying heat.

Repeatedly, referring to FIG. 6G, a negative color photosensitive agent 232 in which a pigment of green component is dispersed is applied onto a substrate 210 on which a red color pattern 230R is formed, and referring to FIG. 6H, the liquid crystal cell ( Exposure again using the drive of 100) forms a green color pattern, as shown in FIG. 6I. In this case, the green sub-pixels are driven full-white, and the remaining red and blue sub-pixels are driven full-black.

Herein, although the same design mask is moved after exposure by moving the unit pixel pitch, the liquid crystal cell 100 according to the present invention moves the liquid crystal cell 100 serving as a mask when the color filter is formed. You do not have to do.

Next, as illustrated in FIGS. 6J to 6L, after the green pattern is formed, the color pattern formed by the baking process is solidified again, and then a negative color photosensitive agent 233 in which a pigment of blue (B) component is dispersed. If the above process is repeated by using the above method, all of the RGB color filter patterns 230R, 230G, and 230B are completed.

Next, referring to FIG. 6M, an overcoat is formed on the surface of the color filters 230R, 230G, and 230B for dissolution of the organic material toward the liquid crystal cell to be subsequently formed in the RGB pattern and good step coverage in forming the pixel electrode. ), The planarization layer 240 is formed of an acrylic resin or the like by a coating method. In this case, in order to lower the cost of manufacturing the color filter, the color filter pattern may be formed at a good taper angle to omit the planarization film forming process.

Next, referring to FIG. 6N, a photosensitive agent 251 for forming a column spacer is coated on the planarization layer 240. Next, referring to FIG. 6O, the sub of the liquid crystal cell 100 is applied. The column spacer 250 is formed as shown in FIG. 6P by driving the pixel for each gray level to expose the photosensitive agent 251.

Specifically, the sub-pixels of the pre-formed liquid crystal cell 100 are aligned with a portion to form the column spacers, and then the sub-pixels of the liquid crystal cell 100 are driven to the photoresist for forming the column spacers. The corresponding column spacer pattern is exposed. Subsequently, the exposed column spacer pattern is developed to form column spacers.

The liquid crystal cell 100 of FIG. 6O is driven to a predetermined level corresponding to the gray scale voltage. In this case, the liquid crystal cell 100 serves as a half-tone mask to expose the photoresist for forming column spacers. For example, the gray voltage is set to any one of 256 levels, and the exposure level is changed according to the level set as described above. Accordingly, the liquid crystal cell 100 may serve as a half-tone mask.

That is, the region in which the column spacer 250 of the liquid crystal cell 100 is to be formed is driven corresponding to the gray voltage, and the other regions are driven full-black. In the photosensitive agent 251, a portion exposed by the liquid crystal cell 100 forms a spacer forming pattern.

As described above, the completed color filter substrate 200 is introduced into a liquid crystal cell process like a TFT array substrate through an inspection process. The color filter substrate 200 may be manufactured in the same mass production line as a TFT array, but may be made by a color filter manufacturer and put into a TFT-LCD liquid crystal cell process.

7 is a diagram for describing a liquid crystal cell serving as a halftone mask illustrated in FIG. 6.

First, half-tone exposure is an exposure method that enables the simultaneous formation of a photosensitive film pattern having a thickness difference by controlling the amount of ultraviolet light passing through the mask using a light absorption mask.

As shown in FIG. 7, the photoresist layer 251 is deposited on the planarization layer 240, and the color filter 230R, 230G, 230B is formed on the liquid crystal cell 100, and the black matrix 220 is formed. Unlike at the time of operation, the driving is performed at a predetermined level according to the gray scale voltage. To this end, the liquid crystal cell 100 should align the sub-pixels of the liquid crystal cell 100 on the black matrix 220 of the color filter substrate 200.

That is, the column spacer 250 should be formed on the black matrix 220. The liquid crystal cell 100 used in forming the color filters 230R, 230G, and 230B has a sub-pixel region toward the black matrix region. After the movement, only the region to form the column spacer 250 is driven according to the gray voltage, and the remaining region is driven to full-black.

Here, since the liquid crystal cell 100 driven according to the gray voltage may adjust the exposure level, the liquid crystal cell 100 may serve as a half-tone mask as described above. Accordingly, the column spacer 250 may be formed on the black matrix 220 of the color filter substrate 200.

The color filter formed as described above can be easily applied not only to a liquid crystal display panel of twisted nematic (TN) mode but also to a liquid crystal display panel of in-plane switching (IPS) mode and vertical alignment (VA) mode. Subsequently, the color filter substrate 200 manufactured as described above is injected into a liquid crystal cell process as a thin film transistor substrate manufactured separately through an inspection process.

While the present invention has been described in connection with what is presently considered to be practical exemplary embodiments, it is to be understood that the invention is not limited to the disclosed embodiments, but, on the contrary, You will understand. Therefore, the embodiments described above are to be understood in all respects as illustrative and not restrictive.

According to the present invention, since the driven liquid crystal cell serves as a mask, the number of masks for forming color filters can be reduced, and the liquid crystal cell driven according to the gray scale voltage acts as a half-tone mask, thereby providing a column spacer. Can be formed. Accordingly, the manufacturing cost of the color filter substrate for the liquid crystal display device can be reduced.

Claims (17)

a) forming a black matrix defining a pixel region on the transparent insulating substrate; And b) applying a color photo resist on the exposed front surface; c) arranging a preformed Liquid Crystal Cell so as to correspond to the black matrix and the pixel region in a spatially separated state from the transparent insulating substrate; d) driving a sub-pixel of said liquid crystal cell and lithography a color filter pattern corresponding to said color photosensitive agent; And e) developing the exposed color filter pattern to form a color filter; Method of manufacturing a color filter substrate for a liquid crystal display comprising a. The method of claim 1, Steps b) to e) are repeated to apply red (R), green (G) or blue (B) photosensitizers to form red (R), green (G) or blue (B) color filters, respectively. The manufacturing method of the color filter substrate for liquid crystal display devices characterized by the above-mentioned. The method of claim 1, The liquid crystal cell of step d) drives any one of the red (R), green (G), and blue (B) sub-pixels to full-white, and the rest is full-white. A method of manufacturing a color filter substrate for a liquid crystal display device, characterized by driving in full-black. The method of claim 3, And transmitting the light so that the color photosensitive agent is cured when the liquid crystal cell is driven in the full-white color. The method of claim 3, And when the liquid crystal cell is driven to the full-black, light is blocked so that the color photosensitive agent is not cured. The method of claim 1, And the color filter of step e) is formed in a pattern of a shape corresponding to the same color sub-pixel of the liquid crystal cell, respectively. The method of claim 1, The method of manufacturing a color filter substrate for a liquid crystal display device according to claim b, wherein the color photosensitive agent of step b) forms a corresponding color filter pattern and an unexposed part is removed. The method of claim 1, B) the method of manufacturing a color filter substrate for a liquid crystal display device, characterized in that any one of the R, G and B color photosensitive agent is applied to the exposed entire surface by spin coating. The method of claim 1, wherein step a) comprises: a-1) forming a black matrix layer on the transparent insulating substrate; a-2) aligning a pre-formed liquid crystal cell with the black matrix and the pixel region; a-3) driving a sub-pixel of the liquid crystal cell and exposing the black matrix layer to form a black matrix pattern; And a-4) developing the exposed black matrix pattern to form the black matrix Method of manufacturing a color filter substrate for a liquid crystal display comprising a. 10. The method of claim 9, In the step a-3), the R, G, and B sub-pixels of the liquid crystal cell are driven in full-white to expose the black matrix layer. 10. The method of claim 9, The black matrix layer of step a-1) is a manufacturing method of a color filter substrate for a liquid crystal display, characterized in that the exposed portion is removed by development. a) forming a black matrix defining a pixel region on a transparent insulating substrate; b) forming R, G, and B color filters on the pixel region, respectively; c) forming an overcoat by entirely depositing an organic material on the color filter; d) applying a photoresist for forming a column spacer on the planarization layer; And e) driving a sub-pixel of a liquid crystal cell to expose the photosensitive agent and form column spacers Method of manufacturing a color filter substrate for a liquid crystal display comprising a. The method of claim 12, And the liquid crystal cell of step e) is driven at a predetermined level corresponding to the gray scale voltage. The method of claim 12, And the liquid crystal cell serves as a half-tone mask to expose the photoresist for forming column spacers. The method of claim 12, And a region in which the column spacers of the liquid crystal cell are to be formed are driven in response to the gray voltage, and other regions are driven in full-black. The method of claim 12, And the photosensitive agent of step e) forms a pattern for forming a spacer in a portion exposed by the liquid crystal cell. The method of claim 12, wherein step e) e-1) aligning the sub-pixels of the pre-formed liquid crystal cell with a portion to form the column spacer; e-2) driving the sub-pixels of the liquid crystal cell and exposing a column spacer pattern corresponding to the photoresist for forming column spacers; And e-3) developing the exposed column spacer pattern to form a column spacer Method of manufacturing a color filter substrate for a liquid crystal display comprising a.

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