JPH08104998A - Plating device of thin type substrate - Google Patents
Plating device of thin type substrateInfo
- Publication number
- JPH08104998A JPH08104998A JP24372794A JP24372794A JPH08104998A JP H08104998 A JPH08104998 A JP H08104998A JP 24372794 A JP24372794 A JP 24372794A JP 24372794 A JP24372794 A JP 24372794A JP H08104998 A JPH08104998 A JP H08104998A
- Authority
- JP
- Japan
- Prior art keywords
- plating
- thin substrate
- thin
- frame
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Manufacturing Of Printed Wiring (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、プリント基板等の板厚
の薄い薄形基板のめっき装置に係り、特にめっき装置の
揺動運動に合わせて薄形基板の揺動めっきを行う方法に
おいて、めっき厚さのバラツキを小さくして均一なめっ
き層を得ることができ、プリント基板のピン間に4本以
上の高密度の導体パターンを形成することが可能な薄形
基板のめっき装置に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a plating apparatus for thin substrates such as printed circuit boards and the like, and more particularly to a method for performing swing plating of a thin substrate according to the swing motion of the plating apparatus. The present invention relates to a thin board plating apparatus capable of forming a uniform plating layer by reducing variations in plating thickness and forming four or more high-density conductor patterns between pins of a printed board.
【0002】[0002]
【従来の技術】従来のプリント基板等の薄形基板の揺動
めっき方法は、例えば、図4に示すように、金属製の枠
体1の中央部に、被めっき部材であるプリント基板等の
薄形基板の大きさに合わせて、めっき用の開口部2を設
け、上記枠体1と基板固定金具3との間に、被めっき部
材である薄型基板を差し込み装着しためっき用枠体を用
い、これを、めっき浴中に懸垂支持し、揺動を与えなが
らプリント基板等の薄形基板の表面に所望のめっき、例
えば銅めっきを行っていた。しかし、上記構成の従来の
揺動めっき装置を用い、めっき浴中に垂直方向に浸漬し
揺動しながらめっきを行うと、薄形基板の下側の電流密
度が高くなるという現象が生じ、上記薄形基板の上側よ
りも下側に形成されるめっき層の厚みが大きくなり、薄
形基板に形成されるめっき層の厚さに大きなバラツキが
生じる。このめっき厚さのバラツキの大きい薄形基板を
用いて、例えば、ICのピン間(2.54mm)に、4
本以上の信号線を通す高密度の導体パターンを形成させ
るエッチングを行うと、断線あるいはライン細り等の導
体パターンの不良が発生し、製品の歩留まりが低いとい
う問題があった。2. Description of the Related Art A conventional swing plating method for a thin printed circuit board or the like is, for example, as shown in FIG. 4, at the center of a metal frame 1, a printed circuit board or the like, which is a member to be plated, is placed. An opening 2 for plating is provided in accordance with the size of the thin board, and a plating frame in which a thin board which is a member to be plated is inserted and mounted between the frame 1 and the board fixing metal fitting 3 is used. This was suspended and supported in a plating bath, and desired plating, for example, copper plating, was performed on the surface of a thin substrate such as a printed circuit board while rocking. However, when the conventional swing plating apparatus having the above-mentioned structure is used and the plating is performed while immersing in a plating bath in the vertical direction and swinging, there occurs a phenomenon that the current density on the lower side of the thin substrate increases. The thickness of the plating layer formed on the lower side of the thin substrate becomes larger than that on the upper side of the thin substrate, resulting in a large variation in the thickness of the plating layer formed on the thin substrate. By using this thin substrate with a large variation in plating thickness, for example, the distance between IC pins (2.54 mm)
When etching is performed to form a high-density conductor pattern through which more than one signal line is passed, there is a problem in that a defect in the conductor pattern such as disconnection or line thinning occurs, which results in low product yield.
【0003】[0003]
【発明が解決しようとする課題】本発明の目的は、上述
した従来技術における問題点を解消し、プリント基板等
の薄形基板の揺動めっきにおいて、めっきのバラツキが
小さく、薄形基板の表面にほぼ均等な膜厚のめっき層を
形成することができ、例えば、エッチングによってIC
のピン間に4本以上の信号線を通す高密度の導体パター
ンの形成を可能とした均一なめっき層が得られる揺動め
っき装置を提供することにある。SUMMARY OF THE INVENTION The object of the present invention is to solve the above-mentioned problems in the prior art, and in swing plating of a thin substrate such as a printed circuit board, variations in plating are small and the surface of the thin substrate is small. It is possible to form a plating layer having a substantially uniform film thickness on the
An object of the present invention is to provide an oscillating plating apparatus capable of forming a uniform plating layer capable of forming a high-density conductor pattern in which four or more signal lines are passed between the pins.
【0004】[0004]
【課題を解決するための手段】上記本発明の目的を達成
するために、本発明の薄形基板のめっき装置は、特許請
求の範囲に記載のような構成とするものである。すなわ
ち、請求項1に記載のように、被めっき部材である薄形
基板の大きさに合わせて中央部に開口部を形成し、該開
口部に、上記薄形基板を着脱自在に装着し得る構造とし
た金属製の枠と、該金属製の枠の下部に、揺動めっき時
の電流密度の関係で上記薄形基板の下側に堆積しやすい
厚いめっき層を付着させるダミー板を少なくとも配設
し、該ダミー板には揺動めっき時におけるめっき浴の抵
抗を低減する穴を複数個設けた構造とするものである。
また、請求項2に記載のように、薄形基板はプリント基
板であり、金属製の枠もしくはダミー板は、ニッケル、
クロム、またはこれらを主成分とするステンレス系合金
材料からなる薄形基板のめっき装置である。また、請求
項3に記載のように、上請求項1または請求項2に記載
の薄形基板のめっき装置を用い、金属製の枠の上部に、
めっき浴中に懸垂し揺動を与える着脱自在な構造の支持
装置を設けた薄形基板のめっき装置である。そして、請
求項4に記載のように、請求項3におけるめっき浴中に
懸垂し揺動を与える着脱自在な構造の支持装置は、クラ
ンプ式支持装置とするものである。In order to achieve the above-mentioned object of the present invention, the thin substrate plating apparatus of the present invention has a structure as set forth in the claims. That is, as described in claim 1, an opening is formed in the central portion according to the size of the thin substrate which is the member to be plated, and the thin substrate can be removably mounted in the opening. At least a metal frame having a structure and a dummy plate to which a thick plating layer which is easily deposited on the lower side of the thin substrate is attached to the lower part of the metal frame due to the current density during swing plating. The dummy plate is provided with a plurality of holes for reducing the resistance of the plating bath during swing plating.
Further, as described in claim 2, the thin substrate is a printed circuit board, and the metal frame or the dummy plate is nickel,
This is a plating apparatus for a thin substrate made of chromium or a stainless steel alloy material containing these as main components. Further, as described in claim 3, using the plating apparatus for a thin substrate according to claim 1 or claim 2, the metal substrate is provided on the upper part of the frame.
It is a plating apparatus for a thin substrate provided with a detachable support device for suspending and swinging in a plating bath. Further, as described in claim 4, the supporting device of the detachable structure which suspends and swings in the plating bath in claim 3 is a clamp type supporting device.
【0005】[0005]
【作用】本発明の薄形基板のめっき装置は、請求項1に
きさいのように、被めっき部材である薄形基板の大きさ
に合わせて中央部に開口部を形成し、該開口部に、上記
薄形基板を着脱自在に装着し得る構造とした金属製の枠
と、該金属製の枠の下部に、揺動めっき時の電流密度の
関係で上記薄形基板の下側に堆積しやすい厚いめっき層
を付着させるダミー板を少なくとも配設し、該ダミー板
には揺動時におけるめっき浴の抵抗を低減する穴を複数
個設けた構造としており、上記ダミー板の部分の電流密
度が大きくなり厚いめっき層が付着するように設定して
いるため、薄形基板の部分は電流密度がほぼ一定とな
り、めっき厚さもほぼ均一でバラツキの少ないない均一
なめっきを形成することができる。また、薄形基板のめ
っき作業を、厚板の基板のめっき工程と同じラインでめ
っきを行っても、バラツキの少ない均一なめっきができ
るのでめっきラインの合理化がはかられる。また、請求
項2に記載のように、薄形基板はプリント基板であり、
金属製の枠もしくはダミー板は、クロム、ニッケルまた
はそれらを主成分とするステンレス系合金材料からなる
薄形基板のめっき装置としているので、耐食性が良く、
薄形基板やめっき浴を汚染することがなく、揺動めっき
の後、付着した銅等のめっき層を溶解、洗浄することに
より何回でも使用することができ、経済的である。ま
た、請求項3に記載のように、薄形基板を支持する金属
製の枠の上部に、めっき浴中に懸垂支持し揺動を与える
着脱自在な構造の支持装置を設けているので、作業能率
よく薄形基板のめっきを行うことができ、請求項4に記
載のように、構造が簡単であり、安価なクランプ機構の
支持装置を用いているので、被めっき部材の着脱を極め
て簡易にスムースに行うことができ、めっき能率の向上
がはかられる。According to the thin substrate plating apparatus of the present invention, an opening is formed in the central portion according to the size of the thin substrate which is the member to be plated. And a metal frame having a structure in which the thin substrate can be detachably mounted, and a metal frame is deposited on the lower part of the metal frame on the lower side of the thin substrate due to the current density during swing plating. At least a dummy plate to which a thick plating layer is attached is provided, and the dummy plate is provided with a plurality of holes for reducing the resistance of the plating bath during rocking. Since the thickness of the thin substrate is set so that a thick plating layer adheres to the thin substrate, the current density is substantially constant in the thin substrate portion, and the plating thickness is substantially uniform and uniform plating can be formed. Further, even if the plating operation for the thin substrate is performed in the same line as the plating process for the thick substrate, uniform plating with little variation can be performed, so that the plating line can be rationalized. Further, as described in claim 2, the thin substrate is a printed circuit board,
Since the metal frame or dummy plate is used as a plating device for thin substrates made of chromium, nickel, or a stainless steel-based alloy material containing them as a main component, it has good corrosion resistance,
It is economical because it does not contaminate the thin substrate or the plating bath and can be used any number of times by dissolving and washing the deposited plating layer of copper or the like after swing plating. Further, as described in claim 3, since a supporting device having a detachable structure for suspending and supporting and swinging in a plating bath is provided on an upper part of a metal frame for supporting the thin substrate, Since the thin substrate can be plated efficiently, and the supporting device of the clamp mechanism, which has a simple structure and is inexpensive, is used as described in claim 4, attachment / detachment of the member to be plated is extremely easy. It can be carried out smoothly and the plating efficiency can be improved.
【0006】[0006]
【実施例】以下に本発明の実施例を挙げ、図面を用いて
さらに詳細に説明する。図1は、本発明のダミー板を設
けた薄形積層基板を保持する金属製の枠体を示す斜視図
で、図2は、図1の金属製の枠体に薄形積層基板を取付
けた状態を示す斜視図で、図3は、図2に示す金属製の
枠体に装着した薄形積層基板をめっき浴中に垂直方向に
懸垂支持するクランプ式支持装置を示す。図1に示すよ
うに、ステンレス製の枠体1の中央部に、被めっき部材
であるプリント基板等の薄型積層基板6のめっき面積の
大きさに合わせた開口部2を形成し、枠体1の開口部2
の一方の面の左右両端部に、薄形積層基板6を挿入可能
に隙間を有する基板固定金具3を設けている。そして、
上記枠体1の下方の端部に、所定の大きさの穴5を複数
個開けたステンレス製のダミー板4を取り付けている。
このダミー板4に複数個の穴5を設ける理由は、上記枠
体1に被めっき部材である薄形積層基板6を装着し、銅
等の所定めっき浴に垂直方向に浸漬し、薄形積層基板6
を揺動させてめっきを行う場合に、めっき浴の抵抗を低
減し、めっき浴中で揺動しやすくして均一なめっき層を
得るためのものである。次に、図2に示すように、被め
っき部材である薄形積層基板6を装着し、これを、例え
ば図3に示すように、2枚のクランプ用板7を、支点9
で支持し、板バネ8の作用で、薄形積層基板6と枠体1
を挾む構造としたクランプ式支持具11によって、所定
の銅めっき浴中に垂直方向に浸漬し支持して揺動めっき
を行った。その結果、ダミー板4の下側の部分に厚いめ
っき層が形成されたが、薄形積層基板6には、全面にわ
たってほぼ均一な厚さの銅めっき層が得られた。そし
て、エッチングにより導体パターンを形成したところ、
ICのピン間(2.54mm)に4本以上の信号線を通
す微細で高密度の導体パターンを形成することができ
た。Embodiments of the present invention will be described below in more detail with reference to the drawings. FIG. 1 is a perspective view showing a metal frame body for holding a thin laminated substrate provided with a dummy plate of the present invention, and FIG. 2 is a view showing a thin laminated substrate attached to the metal frame body of FIG. FIG. 3 is a perspective view showing a state, and FIG. 3 shows a clamp type supporting device for vertically suspending and supporting the thin laminated substrate mounted on the metal frame body shown in FIG. 2 in a plating bath. As shown in FIG. 1, an opening 2 is formed in a central portion of a stainless steel frame 1 in accordance with the size of a plating area of a thin laminated substrate 6 such as a printed board which is a member to be plated. Opening 2
Substrate fixing metal fittings 3 having a gap into which the thin laminated substrate 6 can be inserted are provided at both left and right ends of one surface. And
A dummy plate 4 made of stainless steel having a plurality of holes 5 of a predetermined size is attached to the lower end of the frame body 1.
The reason for providing the plurality of holes 5 in the dummy plate 4 is that the thin laminated substrate 6 which is a member to be plated is mounted on the frame body 1 and vertically immersed in a predetermined plating bath of copper or the like to form a thin laminated body. Board 6
This is for reducing the resistance of the plating bath and making it easier to swing in the plating bath when plating is performed by swinging. Next, as shown in FIG. 2, a thin laminated substrate 6 which is a member to be plated is mounted, and this is mounted on, for example, two clamping plates 7 as shown in FIG.
The thin laminated substrate 6 and the frame 1 are supported by
The clamp type supporting tool 11 having a structure of sandwiching was subjected to rocking plating by vertically immersing and supporting it in a predetermined copper plating bath. As a result, a thick plating layer was formed on the lower part of the dummy plate 4, but on the thin laminated substrate 6, a copper plating layer having a substantially uniform thickness was obtained over the entire surface. Then, when a conductor pattern is formed by etching,
It was possible to form a fine and high-density conductor pattern for passing four or more signal lines between the pins (2.54 mm) of the IC.
【0007】[0007]
【発明の効果】以上説明したごとく、本発明の薄形基板
のめっき装置によれば、所望のめっき浴中で揺動めっき
がしやすいように、複数の穴を開けたダミー板を用いて
おり、かつ最も電流密度の大きくなる薄型基板の下側に
はダミー板を配設しているので、被めっき部材である薄
形基板にほぼ均一な厚さのめっき層を形成することがで
き、エッチングによってICのピン間(2.54mm)
に4本以上の信号線を通す微細で高密度の導体パターン
を形成することが可能となる。As described above, according to the thin substrate plating apparatus of the present invention, a dummy plate having a plurality of holes is used to facilitate swing plating in a desired plating bath. Moreover, since the dummy plate is placed under the thin substrate with the highest current density, it is possible to form a plating layer of almost uniform thickness on the thin substrate that is the member to be plated, and to perform etching. Between IC pins (2.54mm)
It is possible to form a fine and high-density conductor pattern that allows four or more signal lines to pass therethrough.
【図1】本発明の実施例で例示した薄型基板のめっき装
置の枠体とダミー板の構成を示す斜視図。FIG. 1 is a perspective view showing a configuration of a frame body and a dummy plate of a plating apparatus for a thin substrate illustrated in an embodiment of the present invention.
【図2】図1に示す薄型基板のめっき装置の枠体に薄型
積層基板を装着した状態を示す斜視図。FIG. 2 is a perspective view showing a state in which a thin laminated substrate is mounted on the frame of the thin substrate plating apparatus shown in FIG.
【図3】図2に示す薄型積層基板を装着しためっき装置
の枠体をクランプ式支持具で懸垂した状態を示す模式
図。FIG. 3 is a schematic diagram showing a state in which a frame body of a plating apparatus equipped with the thin laminated substrate shown in FIG. 2 is suspended by a clamp type support.
【図4】従来の薄型積層基板のめっき治具の構成を示す
斜視図。FIG. 4 is a perspective view showing a configuration of a conventional plating jig for a thin laminated substrate.
1…枠体 2…開口部 3…基板固定金具 4…ダミー板 5…穴 6…薄形積層基板(プリント基板) 7…クランプ用板 8…板バネ 9…支点 10…クランプ用ツメ 11…クランプ式支持具 DESCRIPTION OF SYMBOLS 1 ... Frame 2 ... Opening 3 ... Board fixing metal fitting 4 ... Dummy board 5 ... Hole 6 ... Thin laminated board (printed board) 7 ... Clamping board 8 ... Leaf spring 9 ... Support point 10 ... Clamp tab 11 ... Clamp Type support
Claims (4)
わせて中央部に開口部を形成し、該開口部に、上記薄形
基板を着脱自在に装着し得る構造とした金属製の枠と、
該金属製の枠の下部に、揺動めっき時の電流密度の関係
で上記薄形基板の下側に堆積しやすい厚いめっき層を付
着させるダミー板を少なくとも配設し、該ダミー板には
揺動めっき時におけるめっき浴の抵抗を低減する穴を複
数個設けてなることを特徴とする薄形基板のめっき装
置。1. A metal body having a structure in which an opening is formed in a central portion according to the size of a thin substrate which is a member to be plated, and the thin substrate can be removably mounted in the opening. A frame,
At the bottom of the metal frame, at least a dummy plate to which a thick plating layer, which is likely to be deposited, is attached to the lower side of the thin substrate due to the current density during swing plating is disposed, and the dummy plate is shaken. A plating apparatus for thin substrates, comprising a plurality of holes for reducing the resistance of a plating bath during dynamic plating.
板であり、金属製の枠もしくはダミー板はステンレス系
の合金材料からなることを特徴とする薄形基板のめっき
装置。2. The thin substrate plating apparatus according to claim 1, wherein the thin substrate is a printed circuit board, and the metal frame or the dummy plate is made of a stainless alloy material.
のめっき装置を用い、金属製の枠の上部に、めっき浴中
に懸垂し揺動を与える着脱自在な構造の支持装置を設け
てなることを特徴とする薄形基板のめっき装置。3. A support device having a detachable structure for suspending and swinging in a plating bath is provided on an upper portion of a metal frame, using the thin substrate plating device according to claim 1 or 2. A thin substrate plating apparatus characterized by being provided.
動を与える着脱自在な構造の支持装置は、クランプ式支
持装置であることを特徴とする薄形基板のめっき装置。4. The thin substrate plating apparatus according to claim 3, wherein the detachable support device for suspending and swinging in a plating bath is a clamp type support device.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24372794A JPH08104998A (en) | 1994-10-07 | 1994-10-07 | Plating device of thin type substrate |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24372794A JPH08104998A (en) | 1994-10-07 | 1994-10-07 | Plating device of thin type substrate |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH08104998A true JPH08104998A (en) | 1996-04-23 |
Family
ID=17108097
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP24372794A Pending JPH08104998A (en) | 1994-10-07 | 1994-10-07 | Plating device of thin type substrate |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH08104998A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009191303A (en) * | 2008-02-13 | 2009-08-27 | Hitachi Aic Inc | Fixing jig for plating printed circuit board |
JP2021075743A (en) * | 2019-11-06 | 2021-05-20 | 株式会社花岡金属商会 | Electrolytic copper plating method, and method of treating dummy material |
-
1994
- 1994-10-07 JP JP24372794A patent/JPH08104998A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009191303A (en) * | 2008-02-13 | 2009-08-27 | Hitachi Aic Inc | Fixing jig for plating printed circuit board |
JP2021075743A (en) * | 2019-11-06 | 2021-05-20 | 株式会社花岡金属商会 | Electrolytic copper plating method, and method of treating dummy material |
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