JPH08100275A - Thinly enameled panel and its production - Google Patents

Thinly enameled panel and its production

Info

Publication number
JPH08100275A
JPH08100275A JP23910294A JP23910294A JPH08100275A JP H08100275 A JPH08100275 A JP H08100275A JP 23910294 A JP23910294 A JP 23910294A JP 23910294 A JP23910294 A JP 23910294A JP H08100275 A JPH08100275 A JP H08100275A
Authority
JP
Japan
Prior art keywords
glaze
enamel
firing
thickness
panel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23910294A
Other languages
Japanese (ja)
Other versions
JP3414523B2 (en
Inventor
Nobutaka Yugawa
信孝 湯川
Hirotsugu Yashiro
洋次 八代
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Takara Standard Co Ltd
Original Assignee
Takara Standard Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Takara Standard Co Ltd filed Critical Takara Standard Co Ltd
Priority to JP23910294A priority Critical patent/JP3414523B2/en
Publication of JPH08100275A publication Critical patent/JPH08100275A/en
Application granted granted Critical
Publication of JP3414523B2 publication Critical patent/JP3414523B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Abstract

PURPOSE: To thin an enameled panel, to facilitate the cutting of the panel into desired shape and size and to reduce the production cost and weight. CONSTITUTION: A glaze having high contents of boron oxide, nickel oxide and copper oxide or the glaze further mixed with cristobalite or tridymite or both is applied on a base steel sheet in <=1.0mm thickness, the glaze is fired at about 770 deg.C which is lower than the normal firing temp. to form a fired enamel layer in about 100μm thickness, the substrate firing and then finish firing are separately conducted, and a lower glaze and then the upper glaze are applied when the substrate is fired. Consequently, the utilization of the enameled panel is promoted in the field not used conventionally such as the inner wall of the kitchen, interior and exterior walls of the building and door.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、施工現場での切断加工
が容易でかつ表面の琺瑯焼成層の剥離が起き難い薄形琺
瑯パネルとその製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin enamel panel which is easy to cut at a construction site and is less likely to cause peeling of a porcelain enamel firing layer on the surface, and a manufacturing method thereof.

【0002】[0002]

【従来の技術】琺瑯は金属の上にガラス質の被覆をかけ
密着させたもので、金属の丈夫さと、ガラスのもつ耐食
性と清潔さを兼ね備えた材質としてつくられたものであ
る。
2. Description of the Related Art Enamel is a material in which a vitreous coating is applied on a metal and adhered to it, and is made of a material having both the durability of metal, the corrosion resistance and cleanliness of glass.

【0003】その製法は、フリットと称される予めガラ
ス化される配合物に、ミル添加物を加え、ミルで微粉に
粉砕されたものを濃度とPHの調節を図って懸濁液とし
た琺瑯釉薬を素地鋼板上に塗布して焼成するものであ
る。
The production method is enamel, which is prepared by adding a mill additive to a pre-vitrified compound called frit and pulverizing it into fine powder with a mill to adjust its concentration and PH to prepare a enamel suspension. The glaze is applied onto a base steel sheet and fired.

【0004】この釉薬の塗布焼成は、通常、ピンホール
の発生などを防止するために下引きと仕上げに分けて二
回行われる。
[0004] This glaze coating firing is usually carried out twice, undercoating and finishing, in order to prevent the occurrence of pinholes.

【0005】下引きに用いられる下釉は、素地金属に密
着することが第一に要求され、コバルト、ニッケル、マ
ンガン、モリブデンなどの化学的にガラスと鉄との密着
を助ける酸化物が配合されており、その焼成温度は80
0〜920℃である。
The lower glaze used for undercoating is required to adhere to the base metal first, and contains an oxide such as cobalt, nickel, manganese, or molybdenum that chemically assists adhesion between glass and iron. And the firing temperature is 80
It is 0-920 degreeC.

【0006】また仕上げに用いられる上釉は、上述した
密着金属を含む下釉の色やあらを隠すために、酸化アン
チモン、酸化スズ、酸化ジルコニウム、酸化チタンなど
の乳白剤が混入されており、その焼成温度は800〜8
90℃である。
The upper glaze used for finishing is mixed with an opacifying agent such as antimony oxide, tin oxide, zirconium oxide, and titanium oxide in order to hide the color and roughness of the lower glaze containing the above-mentioned adhesion metal. The firing temperature is 800-8
90 ° C.

【0007】以上の通り、琺瑯は素地となる鋼板上に釉
薬を塗布した後、これを焼成するものであるが、上述し
た従来の琺瑯釉薬を用いたものでは、良好な琺瑯を形成
するために、少なくとも下釉が80〜100μ、上釉が
100〜150μの厚さを必要とし、また800〜92
0℃という高い焼成温度による歪みを防止するために素
地鋼板も少なくとも1.2mm以上の厚さのものが必要
であった。
As described above, enamel is produced by applying a glaze on a steel plate as a base material and then firing it. However, in the case of using the conventional enamel glaze described above, in order to form a good enamel. , The lower glaze requires a thickness of 80 to 100 μ, and the upper glaze requires a thickness of 100 to 150 μ, and 800 to 92
In order to prevent distortion due to a high firing temperature of 0 ° C., the base steel sheet also needed to have a thickness of at least 1.2 mm or more.

【0008】また素地鋼板に表面処理を施すことによ
り、その上に直接上釉をかけ、釉薬の塗布焼成を一回と
することも行われていたが、この場合は、上釉を上記従
来例の場合よりも厚く塗布する必要があり、またその焼
成も同様に800〜920℃で行われるので、鋼板の厚
みも同様に1.2mm以上必要であった。
It has also been practiced that the base steel sheet is subjected to a surface treatment so that the top glaze is directly applied on the base steel sheet, and the glaze is applied and fired only once. Since it is necessary to apply it thicker than in the case of 1. and the firing is also performed at 800 to 920 ° C., the thickness of the steel sheet is also required to be 1.2 mm or more.

【0009】[0009]

【発明が解決しようとする課題】上述した従来の琺瑯パ
ネルは、素地となる鋼板の厚さが1.2mm以上と厚
く、またその表面に形成される琺瑯焼成層の厚さも下釉
と上釉を合わせて約180〜250μと比較的厚いの
で、切断加工が困難であると共に、切断した際にこのパ
ネルの切断端面に琺瑯の剥離やチッピング(欠け)が生
じ易く、その場合ここから金属の腐食が進み、琺瑯パネ
ル本来の機能を果たさなくなる虞れもあった。
In the conventional enamel panel described above, the thickness of the steel plate that is the base is as thick as 1.2 mm or more, and the thickness of the enamel firing layer formed on the surface of the enamel panel is lower glaze and upper glaze. Since it is relatively thick with about 180-250μ, the cutting process is difficult, and the enamel peeling or chipping (chip) is likely to occur on the cut end face of this panel when cutting, in which case metal corrosion However, there is a risk that the enamel panel will not perform its original function.

【0010】このため従来、琺瑯パネルは切断加工を必
要とせず、規格サイズのパネルを組み立てて形成される
キッチンユニットや浴室ユニットなどに主として用いら
れており、利用分野が限られるという問題点を有してい
た。
For this reason, conventionally, the enamel panel has not been required to be cut and has been mainly used for kitchen units and bathroom units formed by assembling standard-sized panels, which has a problem that the field of use is limited. Was.

【0011】本発明は、上記従来の琺瑯パネルが有して
いた問題点の解決を課題とするものである。
An object of the present invention is to solve the problems of the conventional enamel panel.

【0012】[0012]

【課題を解決するための手段】本発明では、上記の課題
を解決するために通常の琺瑯釉薬よりも酸化硼素や酸化
ニッケル、酸化銅の割合を増加させたフリットで釉薬を
製造すると共に、この釉薬を1.0mm以下の厚さの鋼
板上に塗布し、これを通常の琺瑯焼成温度の下限である
800℃以下の温度で焼成することとした。
In the present invention, in order to solve the above-mentioned problems, the glaze is produced with a frit in which the proportion of boron oxide, nickel oxide, and copper oxide is increased more than that of the usual enamel glaze, and The glaze was applied onto a steel plate having a thickness of 1.0 mm or less, and this was baked at a temperature of 800 ° C. or lower which is the lower limit of the usual enamel baking temperature.

【0013】さらに上記釉薬のミル添加物としてクリス
トバライトまたはトリジマイトあるいはこの両者を混入
させることとした。
Further, cristobalite, tridymite, or both of them are mixed as a mill additive for the glaze.

【0014】また釉薬の塗布焼成工程を一回目の下地琺
瑯の焼成と、二回目の仕上げ琺瑯の焼成に分けて行うと
共に、上記下地琺瑯を焼成する際の釉薬の塗布を下釉の
塗布と上釉の塗布の二工程で行うこととした。
The glaze coating and firing process is divided into the first firing of the base enamel and the second firing of the finished enamel, and the glaze coating for firing the base enamel is performed by applying the lower glaze and the upper glaze. It was decided to perform it in two steps of applying the glaze.

【0015】[0015]

【作用】フリットに混入された酸化銅は、焼成時にアル
カリ側の働きをし、鉄の表面に銅の被覆状物質を析出さ
せ、このことで琺瑯表面への酸化鉄の上がりを阻止する
ように作用する。
[Function] Copper oxide mixed in the frit acts on the alkaline side during firing, depositing a copper-like substance on the iron surface, which prevents iron oxide from rising to the enamel surface. To work.

【0016】また酸化ニッケルは、鉄−ニッケルの強固
な密着で素地鋼板と釉薬との密着性を向上させるように
作用する。
Further, nickel oxide acts to improve the adhesion between the base steel sheet and the glaze by the strong adhesion of iron-nickel.

【0017】さらに酸化硼素は、施釉時に釉薬の鋼板に
対するぬれ性を向上させるように作用する。
Further, boron oxide acts so as to improve the wettability of the glaze to the steel plate during glaze application.

【0018】ミル添加物として釉薬に混入されたクリス
トバライトやトリジマイトは、膨張係数を向上させるよ
うに作用し、琺瑯とこの琺瑯が焼成された素地鋼板との
膨張係数の差を少なくして、琺瑯焼成層の耐剥離強度を
向上させるものである。
Cristobalite and tridymite mixed in the glaze as a mill additive act to improve the expansion coefficient, and reduce the difference in expansion coefficient between the enamel and the base steel sheet on which this enamel is fired to reduce enamel firing. It is intended to improve the peel resistance of the layer.

【0019】下地琺瑯を下釉と上釉の二工程塗布と低温
焼成で形成することは、釉層の表面に酸化鉄が析出する
こと並びにピンホールが生じることを抑え、薄い琺瑯層
の焼成を可能とすると共に、この琺瑯層が形成される素
地鋼板の歪みを少なくするものである。
Forming the base enamel by two-step application of lower glaze and upper glaze and low temperature firing suppresses the precipitation of iron oxide and the formation of pinholes on the surface of the glaze layer, and the firing of the thin enamel layer In addition to making it possible, the strain of the base steel sheet on which the enamel layer is formed is reduced.

【0020】[0020]

【実施例】本発明の薄形琺瑯パネルは、厚さ1.0mm
以下の素地鋼板上に100μ程度の厚さの琺瑯焼成層が
形成されたものであるが、この薄形琺瑯パネルを製造す
るために本発明方法では、従来とは組成の異なる釉薬を
用いると共に、その塗布焼成についても従来とは異なる
技術を採用したものである。
EXAMPLE A thin enamel panel of the present invention has a thickness of 1.0 mm.
Although an enamel firing layer having a thickness of about 100μ is formed on the following base steel sheet, in the method of the present invention for producing this thin enamel panel, a glaze having a composition different from the conventional one is used, The technique for coating and firing is different from the conventional technique.

【0021】以下、本発明方法による薄形琺瑯パネルの
製造を実施例に基づき説明する。
The production of a thin enamel panel by the method of the present invention will be described below based on examples.

【0022】まず本発明方法では、酸化硼素20%〜、
酸化リチウム4%〜、酸化コバルト0.3%〜、酸化ニ
ッケル2.8%〜、酸化銅0.5%〜の組成を有するフ
リット(原料をガラスに溶解させた後水中に投じて急冷
したもの)を用い、これに添加物を加え、ミルで粉砕す
ることにより、釉薬を製造した。
First, in the method of the present invention, boron oxide of 20% to
Frit having a composition of 4% lithium oxide, 0.3% cobalt oxide, 2.8% nickel oxide, and 0.5% copper oxide (the raw material is melted in glass and then poured into water to be rapidly cooled). ) Was used to add an additive, and the mixture was pulverized with a mill to produce a glaze.

【0023】そして、この釉薬を厚さ1.0mm以下の
素地鋼板上にまず下釉として20μ塗布し、乾燥後、そ
の上に重ねて上釉を同じく20μ塗布し、これを約77
0℃で焼成して一回目の下地琺瑯を形成した。
Then, 20 μ of this glaze is applied as a lower glaze on a base steel sheet having a thickness of 1.0 mm or less, dried, and then 20 μ of an upper glaze is similarly applied, which is then applied.
Firing at 0 ° C. formed the first base enamel.

【0024】その後、この下地琺瑯上に上記と同じ釉薬
を60μの厚さで施釉し、これを上記と同じく約770
℃で焼成することにより、二回目の仕上げ琺瑯を形成し
た。
Thereafter, the same glaze as above was applied to the base enamel in a thickness of 60 μ, and this was glaze at about 770 as above.
A second finish enamel was formed by firing at ° C.

【0025】このようにして本発明方法では、酸化硼
素、酸化ニッケル、酸化銅を比較的多く含む釉薬を用い
て、通常の琺瑯焼成温度の下限である800℃以下の比
較的低温で琺瑯が焼成されるようにしたものである。
Thus, in the method of the present invention, the enamel is fired at a relatively low temperature of 800 ° C. or lower, which is the lower limit of the usual enamel firing temperature, using a glaze containing a relatively large amount of boron oxide, nickel oxide and copper oxide. It was made to be done.

【0026】以上のように本発明方法に用いられる釉薬
は、酸化硼素、酸化ニッケル、酸化銅の混入割合が高い
ので、施釉時に素地鋼板とのぬれ性が高く、かつ焼成時
に素地鋼板との密着性が向上する。また低温焼成が可能
であるので、焼成時に琺瑯表面に酸化鉄が上り難く、上
述した釉薬の2回塗布、1回焼成の下地琺瑯の焼成方法
と相まってピンホールを生じさせることなく、琺瑯層を
極めて薄く(約100μ)形成できるものである。
As described above, since the glaze used in the method of the present invention has a high mixing ratio of boron oxide, nickel oxide and copper oxide, it has a high wettability with the base steel sheet during glaze and is in close contact with the base steel sheet during firing. The property is improved. In addition, since low-temperature firing is possible, iron oxide does not easily rise to the surface of the enamel during firing, and the enamel layer is formed without the occurrence of pinholes in combination with the above-mentioned two-step glaze coating and one-step firing of the base enamel. It can be formed extremely thin (about 100 μ).

【0027】また焼成温度が低いため素地鋼板の熱によ
る歪みも少なく、1.0mm以下、0.4mm程度まで
の厚さの鋼板の使用が可能となり、上述した薄形琺瑯パ
ネルが製造されるものである。
Further, since the firing temperature is low, distortion of the base steel sheet due to heat is small, and it becomes possible to use a steel sheet having a thickness of 1.0 mm or less and up to about 0.4 mm, and the thin enamel panel described above is manufactured. Is.

【0028】また上述した釉薬にさらにクリストバライ
トまたはトリジマイトをミル添加物として混入させたも
のを用いても良く、この場合は、琺瑯層の膨張係数を素
地鋼板の膨張係数と近似させることができ、焼成歪みの
減少と琺瑯層の耐剥離強度を一層向上させることができ
る。例えば、釉薬中にクリストバライトを10%添加す
ると、膨張係数が20〜30×10-7/℃増加すること
が確認された。
It is also possible to use the above glaze further mixed with cristobalite or tridymite as a mill additive. In this case, the expansion coefficient of the enamel layer can be approximated to that of the base steel sheet, and firing It is possible to further reduce the distortion and further improve the peel strength of the enamel layer. For example, it was confirmed that when 10% of cristobalite was added to the glaze, the expansion coefficient increased by 20 to 30 × 10 −7 / ° C.

【0029】以上のように本発明方法では、1.0mm
以下の薄い素地鋼板に歪みを生じさせることなく、この
素地鋼板上に100μの薄さで強固に密着した琺瑯層が
形成できるので、形成された琺瑯パネルはダイヤモンド
ソーなどを用いて容易に切断することができると共に、
その際の琺瑯の剥離や欠けも極めて少なくなる。よっ
て、施工現場において必要な寸法に切断加工し、利用す
るという従来には想定されていなかった分野への利用が
促進されることとなり、例えば建物の内・外壁や、油汚
れなどが付着し易い厨房内壁面などを琺瑯パネルで被覆
して長年変質しない材質を得るということが容易に行え
るようになるものである。
As described above, according to the method of the present invention, 1.0 mm
The following enamel panel can be easily cut with a diamond saw, etc., because a porcelain enamel layer with a thickness of 100μ can be firmly adhered to this base steel sheet without causing distortion. While being able to
At that time, peeling and chipping of the enamel are extremely reduced. Therefore, it will be promoted to use in a field that was not expected in the past, where it is cut to the required size at the construction site and used, for example, the inner and outer walls of the building and oil stains tend to adhere. It will be easy to obtain a material that will not deteriorate for many years by covering the inner wall surface of the kitchen with an enamel panel.

【0030】[0030]

【発明の効果】以上の通り、本発明の琺瑯パネルの製造
方法では、焼成温度が比較的低温であるので、鋼板の熱
による歪みが少なくなると共に、琺瑯表面への酸化鉄の
上がりも少なくなる。よって薄い鋼板が使用できると共
に、琺瑯層も薄く形成できる。
As described above, in the method for manufacturing an enamel panel of the present invention, since the firing temperature is relatively low, the distortion of the steel sheet due to heat is reduced and the rise of iron oxide on the enamel surface is also reduced. . Therefore, a thin steel plate can be used and the enamel layer can be formed thin.

【0031】また下地琺瑯を下釉と上釉に分けて塗布す
ることにより、上述した低温焼成と相まって極めて薄い
琺瑯層であるにもかかわらず、製品の品質低下の原因と
なるピンホールが殆ど生じない。
Further, by applying the base enamel separately to the lower glaze and the upper glaze, the pinholes that cause the deterioration of the quality of the product are almost generated in spite of the extremely thin enamel layer combined with the above-mentioned low temperature firing. Absent.

【0032】また用いられる釉薬は、酸化硼素、酸化ニ
ッケル、酸化銅を多く含むので、鋼板との密着性が良
く、切断した際に琺瑯の剥離やチッピング(欠け)が生
じ難い。更に釉薬にミル添加物としてクリストバライト
やトリジマイトを混入させた場合は、琺瑯の膨張係数が
向上し、鋼板の膨張係数との差が少なくなるため焼成時
の歪みがさらに減少すると共に、琺瑯層の耐剥離強度も
一層向上し、高品質の薄形琺瑯パネルが製造できる。
Since the glaze used contains a large amount of boron oxide, nickel oxide, and copper oxide, it has good adhesion to the steel plate, and peeling or chipping of the enamel is unlikely to occur when cut. Furthermore, when cristobalite or tridymite is added to the glaze as a mill additive, the expansion coefficient of the enamel is improved, and the difference between the expansion coefficient of the steel sheet is reduced, and the strain during firing is further reduced, and the enamel layer resistance is increased. Peel strength is further improved and high quality thin enamel panel can be manufactured.

【0033】よって、切断加工の容易な薄形琺瑯パネル
の提供が可能となり、従来、その施工性の悪さから殆ど
採用されていなかった厨房内壁面など、現場において切
断加工を要する分野への利用が促進されることになると
いう従来には見られない多くの優れた効果を奏する。
Therefore, it becomes possible to provide a thin enamel panel which can be easily cut, and can be applied to a field requiring cutting on site such as a kitchen inner wall surface which has hardly been adopted due to its poor workability. It has many excellent effects that cannot be seen in the past.

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 厚さ1.0mm以下の素地鋼板上に約1
00μの厚さの琺瑯焼成層が形成されたことを特徴とす
る薄形琺瑯パネル。
1. About 1 on a base steel sheet having a thickness of 1.0 mm or less.
A thin enamel panel characterized in that an enamel firing layer having a thickness of 00μ is formed.
【請求項2】 酸化硼素と酸化ニッケルと酸化銅をそれ
ぞれ少なくとも20%、2.8%、0.5%含有したフ
リットを原料として製造された釉薬を厚さ1.0mm以
下の鋼板上に薄く塗布し、これを800℃以下の比較的
低温で焼成することを特徴とする薄形琺瑯パネルの製造
方法。
2. A glaze produced from a frit containing at least 20%, 2.8%, and 0.5% of boron oxide, nickel oxide, and copper oxide, respectively, is thinly formed on a steel plate having a thickness of 1.0 mm or less. A method for producing a thin enamel panel, which comprises applying and firing the coating at a relatively low temperature of 800 ° C. or lower.
【請求項3】 ミル添加物としてクリストバライトまた
はトリジマイトあるいはこの両者を混入させた釉薬を用
いたことを特徴とする請求項2記載の薄形琺瑯パネルの
製造方法。
3. The method for producing a thin enamel panel according to claim 2, wherein a glaze mixed with cristobalite or tridymite or both of them is used as a mill additive.
【請求項4】 釉薬の塗布焼成工程を一回目の下地琺瑯
の焼成と、二回目の仕上げ琺瑯の焼成に分けて行うと共
に、上記下地琺瑯を焼成する際の釉薬の塗布を下釉の塗
布と上釉の塗布の二工程で行うことを特徴とする請求項
2または3記載の薄形琺瑯パネルの製造方法。
4. The glaze coating and firing process is divided into a first firing of the base enamel and a second firing of the final enamel, and the glaze is applied to the lower glaze when firing the base enamel. The method for producing a thin enamel panel according to claim 2 or 3, which is performed in two steps of applying the upper glaze.
JP23910294A 1994-10-03 1994-10-03 Method of manufacturing thin enamel panel Expired - Fee Related JP3414523B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23910294A JP3414523B2 (en) 1994-10-03 1994-10-03 Method of manufacturing thin enamel panel

Publications (2)

Publication Number Publication Date
JPH08100275A true JPH08100275A (en) 1996-04-16
JP3414523B2 JP3414523B2 (en) 2003-06-09

Family

ID=17039842

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Link
JP (1) JP3414523B2 (en)

Also Published As

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