JPH0793296B1 - - Google Patents
Info
- Publication number
- JPH0793296B1 JPH0793296B1 JP4501476A JP50147691A JPH0793296B1 JP H0793296 B1 JPH0793296 B1 JP H0793296B1 JP 4501476 A JP4501476 A JP 4501476A JP 50147691 A JP50147691 A JP 50147691A JP H0793296 B1 JPH0793296 B1 JP H0793296B1
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4501476A JPH0793296B1 (OSRAM) | 1991-01-08 | 1991-12-19 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP73491 | 1991-01-08 | ||
| JP6213391 | 1991-03-26 | ||
| JP4501476A JPH0793296B1 (OSRAM) | 1991-01-08 | 1991-12-19 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0793296B1 true JPH0793296B1 (OSRAM) | 1995-10-09 |
Family
ID=27274578
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4501476A Pending JPH0793296B1 (OSRAM) | 1991-01-08 | 1991-12-19 | |
| JP4-501476A Expired - Lifetime JPH0793296B2 (ja) | 1991-01-08 | 1991-12-19 | シリコン酸化膜の形成方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4-501476A Expired - Lifetime JPH0793296B2 (ja) | 1991-01-08 | 1991-12-19 | シリコン酸化膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (2) | JPH0793296B1 (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002538604A (ja) * | 1999-02-26 | 2002-11-12 | トリコン ホールディングス リミティド | ポリマー層の処理方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5494878A (en) * | 1978-01-11 | 1979-07-26 | Hitachi Ltd | Surface stabilizing method of semiconductor elements |
| JPH01307247A (ja) * | 1988-06-03 | 1989-12-12 | Fuji Xerox Co Ltd | 半導体装置の製造方法 |
| IT1226701B (it) * | 1988-07-29 | 1991-02-05 | Eniricerche Spa | Procedimento per la deposizione di organosilani su substrati di silicio o di ossido di silicio per dispositivi del tipo eos o chemfet. |
| JPH02262336A (ja) * | 1989-04-03 | 1990-10-25 | Toshiba Corp | 薄膜形成方法 |
| JP2772819B2 (ja) * | 1989-04-26 | 1998-07-09 | 株式会社高純度化学研究所 | 半導体装置の酸化膜の製造法 |
-
1991
- 1991-12-19 JP JP4501476A patent/JPH0793296B1/ja active Pending
- 1991-12-19 JP JP4-501476A patent/JPH0793296B2/ja not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002538604A (ja) * | 1999-02-26 | 2002-11-12 | トリコン ホールディングス リミティド | ポリマー層の処理方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0793296B2 (ja) | 1995-10-09 |