JPH0785784A - Photosensitive solution applying device - Google Patents

Abstract

PURPOSE:To provide an applying device capable of forming a resist film uniformed in thickness in the cross direction and longitudinal direction of a metal thin plate. CONSTITUTION:An applying device has a coating roller 21a having a circumferential surface rolling in contact with the surface of a long metal thin plate 1 traveling in the longitudinal direction. A photosensitive resin solution having a prescribed film thickness is applied onto the circumferential surface of the coating roller 21a by a pipe doctor nozzle 22a. The coating roller 21a is rotated in the direction opposite to the traveling direction of the metal thin plate 1 by a motor to transfer and apply the photosensitive resin solution applied on the circumferential surface of the coating roller 21a to the metal thin plate 1. The contact state between the metal thin plate 1 and the coating roller 21a is controlled by an adjusting roller 24a.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a resist coating apparatus used in the process of manufacturing a shadow mask for a color picture tube.

[0002]

2. Description of the Related Art In general, a shadow mask type color picture tube has a shadow mask which is arranged in close proximity to a phosphor screen, and this shadow mask has a large number of beam apertures through which electron beams pass at a predetermined pitch. Has been formed. The shadow mask concentrates three electron beams corresponding to red, blue and green emitted from the electron gun in the vicinity of one beam aperture, and forms a fluorescent screen that is painted so as to correspond to red, blue and green. It is one of the important members that has a so-called color selection function that reproduces a color image by irradiating it correctly. Therefore, the distortion of the beam aperture shape of the shadow mask, the dislocation of the beam aperture and the corresponding phosphor layer, and the variation of the distance between the shadow mask and the phosphor screen exceed the permissible range. It causes serious problems such as deterioration. Each beam aperture of the shadow mask is generally formed by combining a large aperture located on the phosphor screen side and a small aperture located on the electron gun side so that a certain amount of even obliquely incident electron beam can pass through. . The large hole is drilled so as to have an area about three times as large as the small hole.

Such a shadow mask is manufactured through the following steps. First, a photosensitive resin layer, for example, a resist film containing a photosensitizer is applied to both surfaces of a strip metal thin plate which is a shadow mask material. Then, a predetermined portion of the resist film is exposed through a predetermined mask pattern, and the resist film in the large hole and small hole portions to be opened is removed by a developing process to expose the material surface. Next, when the material contains iron as a main component, etching is performed with an etching solution containing ferric chloride as a main component to form a predetermined opening. After that, the remaining resist film is removed, and the obtained flat mask is molded to obtain a finished product.

In the shadow mask manufactured by the above structure, the variation in the size of the exposed portion of the thin metal plate formed by the exposure and development of the resist film directly affects the size of the beam aperture formed by etching, resulting in shadowing. This causes deterioration of mask quality. Variation in the thickness of the resist film is one of the causes of the variation in the exposed portion size. That is, since light that has passed through the baking pattern in the exposure process diffuses in the resist film formed on the thin metal plate, for example, the thick resist film portion is exposed at the exposed portion of the thin metal plate after exposure and development. The size is smaller than that of the portion where the resist film thickness is thin. Therefore, under a constant exposure condition, unless the film thickness of the resist film is uniform, the size of the exposed portion varies.

The following conventional resist coating methods are available. The first method is a flow method. In the flow method, a strip-shaped thin metal plate is conveyed in an upright state, a photosensitive resin liquid is dripped from both sides onto both sides of the thin metal plate, and then dried in a drying oven to form a resist film. is there. However, in this method, due to the influence of gravity, the upper part of the resist film has a smaller film thickness than the lower part, and a difference in film thickness in the plate width direction of the metal thin plate cannot be avoided. In order to eliminate this difference in film thickness, for example, a drying furnace having a temperature distribution that should accelerate the drying of the upper part, or a method of variously changing the transport speed of the thin metal plate or the viscosity of the photosensitive resin liquid may be used. However, it is difficult to obtain a uniform film thickness.

The second method is the immersion pulling method.
In this immersion pull-up method, a thin metal plate is immersed in a photosensitive resin liquid and then pulled up in the vertical direction. However,
In this method, the photosensitive resin liquid on the metal thin plate that has been pulled down flows downward due to gravity until it is dried and completely fixed to the metal thin plate. Thickness variation occurs. To control this,
Although it is necessary to adjust the viscosity of the photosensitive resin liquid, the temperature distribution in the drying oven, and the amount of air sucked into the oven, it is difficult to obtain a uniform film thickness.

Further, in order to manufacture a shadow mask having a high definition, it is preferable that the resist film on the small hole side is thinner than the resist film on the large hole side. However, it is very difficult to form a uniform resist film with different film thicknesses on the small hole side and the large hole side by the conventional flow method and dip-and-draw method.

[0008]

In view of such problems, USP 5,006,432 and Japanese Patent Laid-Open No. 4-160725 disclose resists on one side while conveying a strip-shaped long metal thin plate in the horizontal direction. A method of coating and forming a film is disclosed. According to this method, there is an advantage that a resist film having a relatively uniform desired thickness can be formed on each surface of the metal thin plate because it is not affected by gravity.

However, in the case of this method, since the thin metal plate is continuously coated on each side, the condition of the manufacturing process may not be changed when the resist film is formed on the first main surface and then the second main surface is coated. If it occurs, there is a problem that the resist film formed on the first main surface is wasted. Also, considering only one main surface, a thin metal plate is laid between a plurality of rollers, and the photosensitive liquid is applied to the thin metal plate by contact and transfer between the coating roller coated with the photosensitive liquid and the thin metal plate. is doing. However, if the adjustment of the film thickness and the adjustment of the coating operation ON / OFF are attempted by moving the roller, there are problems in terms of the uniformity of the film thickness and the structure of the apparatus.

The present invention has been made in view of the above problems, and an object of the present invention is to form a resist film having a uniform thickness in the width direction and the longitudinal direction of a long thin metal plate, and to form a thin metal plate. It is an object of the present invention to provide a coating apparatus capable of freely changing the thickness of a resist film on the main surface and extremely reducing fluctuations in the coating film thickness.

[0011]

In order to achieve the above object, a coating apparatus according to the present invention comprises means for running a long thin metal plate used in the manufacture of a shadow mask for a color cathode ray tube in its length direction. , A turn roller and a backup roller arranged such that the metal thin plate is wound and spaced apart from each other, and between the turn roller and the backup roller, from a traveling path of the metal thin plate passing between these rollers. A coating roller having a peripheral surface which is disposed slightly spaced apart and is in rolling contact with the surface of the thin metal plate, and a photosensitive solution supplying means for applying a photosensitive solution to a predetermined thickness on the peripheral surface of the coating roller,
A driving means for rotating the coating roller in a direction opposite to the traveling direction of the metal thin plate, and continuously transferring and applying the photosensitive liquid applied to the peripheral surface of the coating roller to the surface of the metal thin plate. In the photosensitive liquid coating device, the coating position is provided on the opposite side of the coating roller across the traveling path, the metal thin plate is pressed against the peripheral surface of the coating roller, and the metal thin plate is separated from the metal thin plate to separate the metal thin plate from the coating roller. A photosensitive liquid coating apparatus comprising: an adjusting roller that can move between a release position that is separated from the peripheral surface and a moving unit that moves the adjusting roller.

Further, a means for running an elongated metal sheet having first and second surfaces in the length direction, which is used for manufacturing a shadow mask of a color cathode ray tube, and a first means for the metal sheet. A first coating means for coating the surface with the photosensitive liquid; and a second coating means for coating the second surface of the metal thin plate with the photosensitive liquid. Each of the first and second coating means comprises: , A turn roller and a backup roller arranged such that the metal thin plate is wound and spaced apart from each other, and between the turn roller and the backup roller, from a traveling path of the metal thin plate passing between these rollers. A coating roller having a peripheral surface which is disposed slightly spaced apart and is in rolling contact with the surface of the thin metal plate, and a photosensitizer which applies a photosensitive liquid to a predetermined thickness on the peripheral surface of the coating roller. Supply means, the coating roller is rotated in the traveling direction opposite to the direction of the metal sheet,
A photosensitive liquid coating device which continuously transfers and coats the photosensitive liquid applied to the peripheral surface of the coating roller onto the surface of the thin metal plate, each of the first and second coating devices. Is provided on the opposite side of the coating roller across the traveling path, and the application position for pressing the metal thin plate against the peripheral surface of the coating roller, and the metal thin plate is separated from the metal thin plate and the metal thin plate is separated from the peripheral surface of the coating roller. A photosensitive liquid coating apparatus comprising: an adjusting roller that can move between a releasing position and a moving unit that moves the adjusting roller.

[0013]

According to the present invention, the turn roller and the back-up roller of the resist coating apparatus for transferring and coating the resist liquid onto the long thin metal plate running between the two rollers of the turn roller and the back-up roller by using the coating roller. An adjusting roller is provided between the rollers at a predetermined position on the opposite side of the coating roller with respect to the metal thin plate, and by moving and pressing the metal sheet in the direction of the coating roller by this adjusting roller, the distance between the metal sheet and the coating roller can be reduced. The relationship such as the pressing force can be adjusted to a desired range.

By carrying out such an adjustment, the mechanical strength of the metal thin plate fluctuates due to changes in the width, thickness or material of the metal thin plate, or the tension of the metal thin plate traveling between the two rollers is maintained. It is possible to always control the pressing state of the thin metal plate pressed against the coating roller to a desired state against fluctuations. As a result, it is possible to form a resist film having a uniform thickness in the width direction and the length direction of the thin metal plate.

[0015]

Embodiments of the present invention will now be described in detail with reference to the drawings. FIG. 1 shows a coating apparatus used for coating a photosensitive resin solution on a continuous strip-shaped metal thin plate 1 in a shadow mask manufacturing process of a color cathode ray tube.

First, the overall structure will be briefly described. The coating apparatus comprises an unwinder 2 around which a long thin metal plate 1 is wound, a back tension device 3 for applying tension to the thin metal plate, a degreasing chamber 10, and a work piece. Water washing chamber 11, pure water washing chamber 12, air knife drying oven 14, first coater 15a for applying photosensitive resin liquid to one surface (first surface) of the thin metal plate, first drying oven 16a, first Cooling chamber
17a, turn rollers 18a, 18b for reversing the thin metal plate 1
, A second coater 15b for applying the photosensitive resin liquid to the other surface (second surface) of the metal thin plate, a second drying oven 16b, a second cooling chamber 17b, and the metal thin plate in the direction of the arrow through the above-mentioned components. It is provided with a thin plate transporting device 9 for traveling and a winder 5 for winding thin plates.

Next, the configuration of each part of the coating apparatus will be described together with the operation. First, when the transport device 9 is driven, the metal thin plate 1 made of continuous strip-shaped iron as the material for the shadow mask is pulled out from the unwinder 2. The drawn thin plate 1 passes through the back tension device 3 and is sprayed with a high temperature alkaline degreasing liquid of 80 ° C or more in the degreasing chamber 10 to remove the rolling oil and rust preventive oil applied to both sides of the thin plate. .

Thereafter, the working water is sprayed in the working water washing chamber 11 to remove the degreasing liquid from the thin metal plate 1, and the pure water is sprayed in the pure water washing chamber 12 to clean the surface of the thin metal plate 1. Next, the metal sheet 1 is dried.
If the temperature is too high, unevenness is likely to occur when the photosensitive resin liquid 6 is applied later. Therefore, the metal thin plate 1 is passed through an air knife drying furnace 14 to which a large number of air knives are attached so that the metal thin plate 1 whose clean surface is exposed is dried without raising the temperature.

As described above, the thin metal plate 1 is used in the degreasing chamber 1
0, water washing chamber 11, pure water washing chamber 12 and drying oven 1
After passing 4 in a horizontal state, it is sent to the first coater 15a and the photosensitive resin liquid is applied to the first surface 1a of the thin metal plate 1.

The first coater 15a has three rotatable turn rollers 18a, 19a, 20 as shown in FIGS.
a and a rotatable backup roller 23a, and the thin metal plate 1 is stretched around these rollers in a state in which a predetermined tension is applied. The thin metal plate 1 is folded back downward by the turn roller 18a,
It is folded back upward by the turn roller 20a via a, and then returned by the backup roller 23a in the original conveying direction. Between the backup roller 23a and the turn roller 20a, a coating roller 21a whose peripheral surface is in contact with the first surface 1a of the thin metal plate 1 is provided. Here, the coating roller 21a is provided slightly separated from the traveling path (shown by the broken line in FIG. 2) of the thin metal plate 1 passing between the backup roller 23a and the turn roller 20a. The coating roller 21a is rotated in the opposite direction to the traveling direction of the thin metal plate 1 by the vector inverter motor 31 via the pulleys 35a, 35b, the V belt 36 and the planetary roller speed reducer 32. The rotation speed of the motor 31 can be changed to control the peripheral speed of the coating roller 21a.
It can be changed within the range of 3 to 15 M / min.

As shown in FIGS. 3 and 5, the planetary roller speed reducer 32 includes a sun gear 41 connected to an output shaft 38 of a vector motor 31 and a planet carrier extending coaxially with the rotation shaft of the motor 31. 40 and the planetary carrier and the output shaft are rotatably supported by the case 32a of the speed reducer 32. Three planet gears 43 (only two are shown) are rotatably attached to the planet carrier 40 via pivots 42, and these planet gears 43 mesh with the sun gear 41. A pulley 35b is fixed to the other end of the planet carrier 40. In addition, a case 32a is provided around the planetary gear 43.
A fixed ring 45 fixed to the output shaft 38 is arranged coaxially with the output shaft 38. Then, on the inner peripheral surface of the fixed ring 45, an internal gear
46 is formed and meshes with the planetary gear 43.

When the vector motor 31 is driven to rotate the sun gear 41 via the output shaft 38, each planet gear 43 revolves around the sun gear 41 while rotating about its pivot axis. As a result, the rotation of the motor 31 depends on the planetary gear 43 and the sun gear.
It is transmitted to the planet carrier 40 in a decelerated state via 41.

Further, as shown in FIGS. 2 and 4, the coating roller 21 is sandwiched between the backup roller 23a and the turn roller 20a with the thin metal plate 1 interposed therebetween.
An adjusting roller 24a is provided on the opposite side of a. Both ends of the central axis of the adjusting roller 24a are connected to a moving mechanism 60 fixed to a support frame 50 of the first coater 15a. By the moving mechanism 60,
The adjusting roller 24a is provided so as to be movable substantially horizontally between a coating position shown by a solid line and a releasing position shown by a broken line in FIG. Then, when the photosensitive resin liquid is applied to the metal thin plate 1, the roller 24a is moved to the coating position by the moving mechanism 60 and presses the metal thin plate 1 against the coating roller 21a with a predetermined pressure. Further, when the thin metal plate 1 is not coated with the photosensitive resin liquid, the adjusting roller 24a is moved to the release position and separated from the thin metal plate 1, so that the thin metal plate is surrounded by the coating roller 21a as shown by the broken line in FIG. Away from the surface.

Details of the moving mechanism 60 are shown in FIGS. The adjusting roller 24a is rotatable and its central axis 63 is fixed to a roller bearing portion 64, and the roller bearing portion 64 is slidably attached via upper and lower guide rails 65a and 65b. In addition, the air cylinder 66 supports the bearings on both sides of the adjusting roller 24a so that the adjusting roller 24a evenly pushes out the thin metal plate 1 and the force when the thin metal plate 1 contacts the coating roller 21a is made uniform on the entire contact surface. It is attached to the bottom of part 64. Further, a pressure detector 61 is arranged on the shaft of the air cylinder 66, and the adjusting roller 24a detects the force pushing the thin metal plate 1. The position of the pressure detector 61 is variable by a position adjusting mechanism 67 such as an adjusting screw. For the pressure detector, for example, a press ductor manufactured by ASEA of Sweden used for measuring roll load of a rolling mill, an electric resistance strain gauge type load cell, a differential transformer type load cell, or the like is suitable. The adjusting roller 24a may be moved by a combination of a DC motor and a ball screw other than the air cylinder.

As described above, the metal thin plate 1 is moved by the adjusting roller 24a to move the coating roller 21a.
Get in and out of contact with. At this time, if the tension changes due to the change in the shape or size of the metal thin plate, the contact pressure with the coating roller 21a or the distance between the coating roller 21a and the metal thin plate 1 changes, which causes a change in the film thickness. . Therefore, the pressing force of the thin metal plate 1 by the adjusting roller 24a is adjusted within a predetermined range to maintain the film quality. Also,
The force of pressing the thin metal plate against the coating roller must be uniform across the width of the thin metal plate.

The force by which the air cylinder 66 presses the thin metal plate 1 for adjusting the pressing force is detected by the pressure detector 61. Further, the signal from the pressure detector 61 is input to the control unit 62. On the other hand, the air cylinder 66 is connected to the control unit 62. If the desired pressure is not reached or the pressures at both ends are different, the control unit 62 adjusts the pressure corresponding to the difference.

According to the method of adjusting the pressing force of the metal thin plate 1 by the adjusting roller 24a as described above, the contact pressure and the interval can be adjusted while keeping the change in the contact area between the coating roller 21a and the metal thin plate 1 small. it can. That is, when the coating roller 21a itself is moved with respect to the metal thin plate, the contact angle between the metal thin plate and the coating roller changes due to the change in pressing force. On the other hand, the turn roller 20a and the backup roller 23
By adjusting the adjusting roller 24a as shown in FIG. 2, even if the adjusting roller 24a is moved, the change in the angle between the thin metal plate 1 and the side of the coating roller 21a where the photosensitive liquid is applied can be reduced. It is possible to reduce the change in the distance between the metal thin plates 1. Further, by disposing the adjusting roller 24a, the number of contact points of the metal thin plate 1 to be conveyed increases, so that the vibration of the metal thin plate can be suppressed.

As shown in FIGS. 2 and 4, a pipe doctor nozzle 22a is provided below the coating roller 21a as a photosensitive resin liquid supplying means for applying the photosensitive resin liquid 6a to the peripheral surface of the coating roller. It is provided in parallel. Nozzle 22a has knife edge 30a
And the tips of the knife edges face each other in parallel with the peripheral surface of the coating roller 21a with a predetermined gap. The nozzle 22a is provided near the knife edge 30a and has a discharge port (not shown) extending over the entire length of the nozzle, and the photosensitive resin liquid 6a supplied from a storage tank (not shown) is coated from the discharge port to the coating roller. It is sent out to the peripheral surface of 21a, and is applied to the peripheral surface of the coating roller with a predetermined thickness by a knife edge. And the photosensitive resin liquid
6a is a thin metal plate 1 from the peripheral surface of the coating roller 21a.
Is applied to the first surface 1a of the. The turn roller 18a,
19a, 20a, coating roller 21a, pipe doctor nozzle 22a, and adjusting roller 24a are supported in parallel with each other by the support frame of the first coater 15a.

The coating thickness of the photosensitive resin liquid 6a applied to the first surface 1a of the thin metal plate 1 can be determined by appropriately selecting the distance between the knife edge 30a of the pipe doctor nozzle 22a and the coating roller 21a. Alternatively, it can be changed by appropriately selecting the ratio between the traveling speed of the metal thin plate 1 and the peripheral speed of the coating roller 21a.

The running speed of the thin metal plate 1 matches the peripheral speed of the backup roller 23a which rotates in accordance with the running of the thin metal plate, and can be measured by detecting the rotation of the backup roller. Therefore, as shown in FIG. 3, a circle encoder 33 is connected to the rotation shaft of the backup roller 23a, and an output signal from the encoder 33 is input to the control unit 34. On the other hand, as described above, the peripheral speed of the coating roller 21a can be changed by adjusting the rotation speed of the vector inverter motor 31, and this motor is connected to the control unit 34.
Then, the rotation speed of the vector inverter motor 31 is controlled by the control unit 34 based on the output signal from the encoder 33 so that the traveling speed of the metal thin plate 1 and the peripheral speed of the coating roller 21a always have a predetermined ratio. . For example, when the traveling speed of the metal sheet 1 becomes slow, the peripheral speed of the coating roller 21a becomes slow so as to keep the speed ratio constant, and when the traveling speed of the metal sheet 1 becomes fast, the coating speed is changed accordingly. The peripheral speed of the roller 21a can also be increased.
The peripheral speed of the coating roller 21a is 1
It is desirable that the traveling speed is set to a range of about 1.2 to 2.0 times. This speed ratio has an appropriate value according to the characteristics of the photosensitive resin, and is determined according to the actual production line so that a coating surface free from streaks and waviness can be obtained.

The film thickness of the photosensitive resin liquid transferred onto the surface of the thin metal plate 1 changes depending on the amount of the photosensitive resin 6a supplied to the coating roller 21a. It is determined by the distance between the doctor nozzle 22a and the knife edge 30a. Therefore, the nozzle 22a is fitted with a coating roller 21a and a knife edge 30.
It is provided so that it can be moved with high accuracy along the vertical direction so that the distance between it and a can be changed freely. The accuracy of the spacing affects the thickness of the coating film, and ultimately affects the quality of the mask. Therefore, a mechanism (not shown) is provided to automatically control the deviation of the gap between the coating roller 21a and the axially opposite ends of the pipe doctor nozzle 22a from the set value.

When changing the coating film thickness for each lot of the thin metal plate 1 to be used, the interval between the coating roller 21a and the pipe doctor nozzle 22a is automatically changed according to the desired numerical value entered in advance. It is desirable that a mechanism (not shown) is provided.

The photosensitive resin liquid 6a is composed of milk caseinate alkali and ammonium dichromate and has a viscosity of about 10%.
The one adjusted to 0 cps is used. If the viscosity is too low, the photosensitive resin liquid 6a applied to the metal thin plate 1 may hang down until the metal thin plate 1 is conveyed horizontally, and a uniform film thickness may not be obtained. At least 50 cps
The above is necessary.

As described above, after the photosensitive resin liquid 6a is applied to the first surface of the metal thin plate 1, the metal thin plate is run through the first drying oven 16a to apply the applied photosensitive resin. The liquid is dried and a resist film 4a having a desired thickness is formed on the first surface of the thin metal plate 1.

In the first drying furnace 16a, the infrastein heater 26 and the hot air outlet 27 are provided only in the upper part, and the temperature of the resist film 4a is raised by the latent heat of vaporization of the photosensitive resin liquid 6a before the drying. Since there is no heat source, both heat sources are used, and in the latter stage, atmosphere drying using only hot air is performed in order to prevent heat fogging of the resist film 4a. By doing so, it is possible to perform atmosphere drying only with hot air drying at the time of decreasing rate drying, and it is possible to suppress an abnormal rise in the resist film temperature due to radiant heat when using a sheath heater or an infrastein heater. . When the thin metal plate 1 leaves the first drying oven 16a, the temperature of the resist film 4a is measured by a non-contact radiation thermometer 28a, and this temperature is always 60
The heater voltage and the hot-air heat source are controlled so as to fall within the set range of 80 to 80 ° C. In this control, when a deviation from the target set temperature occurs, basically, a small deviation is fed back to the hot air temperature, and a large deviation is fed back to the heater. Therefore, while the drying is sufficiently performed, it is possible to avoid the drying at the temperature causing the heat fogging.

If the resist film 4a is left to stand at a high temperature for a long time after drying, the temperature of the resist film 4a rises and the exposure conditions in the next exposure step become unstable.
1 is pulled down via the turn roller 18a,
It passes through a cooling chamber 17a to which cold air is supplied. However,
If the temperature is too low, condensation may occur.
And the relative temperature of cold air is 50% or less, and the temperature is 15 ℃ to 2 ℃.
Cold air at 5 ° C is desirable.

Next, the metal thin plate 1 is turned by the turn roller 18b.
The second coater 15b
Sent to. As shown in FIG. 6, the second coater 15
b has the same structure as the first coater except that the coating roller 21b comes into contact with the second surface 1b of the thin metal plate 1, so that the same parts are the same as those of the first coater. The reference symbol of “a” is attached with the symbol “b” and its description is omitted.

The thin metal plate 1 having the second surface 1b coated with the photosensitive resin liquid 6b having a desired thickness by the second coater 15b is passed through the second drying oven 16b in a horizontal state. A resist film 4b having a target thickness is formed. Then, the thin metal plate 1 is passed through the cooling chamber 17b, and the resist film 4b is cooled to a constant temperature. The second drying furnace and the cooling chamber 17b are respectively connected to the first drying furnace 16b.
a, it has the same structure as the cooling chamber 17a.

Through the above steps, resist films 4a and 4b are formed on both surfaces of the metal thin plate 1, and then the metal thin plate is wound up by the winding machine 5. When applying the photosensitive resin liquid to the second surface 1b of the metal thin plate 1 by the second coater 15b, the same control as the step of applying to the first surface 1a of the metal thin plate 1 is performed. As a result, a uniform resist film of photosensitive resin can be formed on the first and second surfaces of the thin metal plate 1. After the resist film is formed on the first surface 1a, when the resist film is formed on the second surface and the resist film on the second surface becomes non-uniform due to fluctuations in conditions, as a result, the shadow mask as a whole is It causes deterioration of quality. In particular, since the resist film is continuously applied and formed on both surfaces of a continuous long metal thin plate, the fluctuation of the metal thin plate in the step of applying the photosensitive resin on the first surface is also sensitive to the second surface. It also affects the transport speed of the thin metal plate in the step of applying the resin liquid. Therefore, as described above, in forming uniform resist films on both surfaces of the thin metal plate 1, each roller is controlled separately in the coating process on the first surface and the coating process on the second surface. ing.

After the resist films 4a and 4b having a thickness of 7 μm are formed on both surfaces of the metal thin plate 1 having a length of about 300 m as described above, a predetermined shadow mask baking pattern is used in the next exposure step. Each side of the thin metal plate is exposed for about 40 seconds with a 5 kW ultra-high pressure mercury lamp from a distance of about 1 m. The development is carried out by spraying hot water of about 40 ° C. under a pressure of 1.5 kg / cm 2 for about 1 minute, drying in an atmosphere of 150 ° C. for about 2 minutes, and further burning in an atmosphere of about 200 ° C. for about 1.5 minutes.

Through the above steps, the metal thin plate 1 in which the corresponding portion where the beam aperture is to be formed is exposed, that is, the shadow mask material is obtained. Next, in the etching process, for example,
Ferric chloride solution adjusted to a liquid temperature of 67 ° C and a specific gravity of 1.467 is used as an etching solution, and the etching solution is ejected from a nozzle arranged at a position of about 250 mm from the resist films 4a and 4b to etch a thin metal plate. I do. After a predetermined beam opening is obtained by etching, the thin metal plate is washed with water, and then 2.0% NaOH 2.0% aqueous solution at 90 ° C.
The residual resist films 4a and 4b are sprayed at a pressure of cm ² to remove the remaining resist films 4a and 4b from the metal thin plate, and then washed and dried to obtain a shadow mask.

As described above in detail, according to the coating apparatus having the above structure, the resist films are independently formed on both surfaces of the metal thin plate, so that a resist film having a desired film thickness can be arbitrarily formed on the metal thin plate. In particular, the resist film on the first surface side and the resist film on the second surface side can be formed to have different film thicknesses. Further, in the step of applying the photosensitive resin liquid to each surface, the contact state between the coating roller and the metal thin plate can be always maintained in a desired state. As a result, a resist film having a uniform film thickness and always stable quality can be formed. The thin metal plate coated with the photosensitive resin liquid is run in parallel with the coating layer facing upward. Therefore, there is no flow of the photosensitive resin liquid, and the photosensitive resin liquid is dried while being fixed to the surface of the thin metal plate even during drying. Therefore,
It is possible to form a resist film having a uniform thickness in the width direction and the longitudinal direction of the metal thin plate without causing the flow of the photosensitive resin liquid or the sagging.

The coating thickness of the photosensitive resin liquid applied to the thin metal plate can be adjusted by changing the position of the coating roller with respect to the thin metal plate and moving the coating roller by a movable mechanism.
When the coating roller is displaced according to the change of the state of the thin metal plate during the coating operation, vibration occurs due to the operation of the movable mechanism and the movement of the coating roller,
The applied thickness of the photosensitive resin liquid may become unstable. Further, when a turn roller, a backup roller, a coating roller, or the like is moved, there is a possibility that the positional relationship may shift. Such misalignment has a great influence on the coating thickness of the photosensitive resin liquid, making it difficult to form a resist film having a uniform thickness.

On the other hand, according to the present application, it is not necessary to move the position of the coating roller itself during the coating operation, and the above-mentioned problems such as vibration and positional deviation do not occur. Therefore, the photosensitive resin liquid can always be applied to the thin metal plate in a desired thickness. Further, since the metal thin plate is moved with respect to the coating roller by the adjusting roller, it is possible to suppress the positional deviation of the coater constituent parts.

From the above, according to the present application, it is possible to provide a high-quality shadow mask which can stably form a uniform resist film and has a beam aperture formed in a highly accurate dimension. The present invention is not limited to the above-described embodiments, but can be variously modified within the scope of the present invention.

[0046]

As described in detail above, according to the coating apparatus of the present invention, a resist film is independently formed on both surfaces of a metal thin plate, so that a resist film having a desired film thickness is formed on the metal thin plate. Can be formed arbitrarily, and in particular, the resist film on the first surface side and the resist film on the second surface side can be formed to have different film thicknesses. Further, in the step of applying the photosensitive resin liquid to each surface, the contact state between the coating roller and the metal thin plate can be always maintained in a desired state. As a result, a resist film having a uniform film thickness and always stable quality can be formed. The thin metal plate coated with the photosensitive resin liquid is run in parallel with the coating layer facing upward. Therefore, there is no flow of the photosensitive resin liquid, and the photosensitive resin liquid is dried while being fixed to the surface of the thin metal plate even during drying. Therefore,
It is possible to form a resist film having a uniform thickness in the width direction and the longitudinal direction of the metal thin plate without causing the flow of the photosensitive resin liquid or the sagging.

[Brief description of drawings]

FIG. 1 is a diagram schematically showing an entire coating apparatus according to an embodiment of the present invention.

FIG. 2 is a side view showing a first coater of the coating apparatus shown in FIG.

FIG. 3 is a front view showing a first coater of the coating apparatus of FIG.

FIG. 4 is a perspective view showing a first coater of the coating apparatus of FIG.

FIG. 5 is a perspective view showing the planetary speed reducer with a part thereof cut away.

FIG. 6 is a perspective view showing a moving mechanism of FIG.

FIG. 7 is a plan view illustrating the operation of the moving mechanism in FIG.

FIG. 8 is a side view showing a second coater of the coating apparatus of FIG.

[Explanation of symbols] 1 ... Metal thin plate 6a ... Photosensitive resin liquid 21a ... Coating roller 22a ... Pipe doctor nozzle 23a ... Backup roller 24a ... Adjusting roller 18a, 19a, 20a ... Turn roller 60 ... Moving mechanism 61 ... Pressure detector 62 ... Control unit

Claims (2)

[Claims] 1. A means for running a long metal thin plate used in the production of a shadow mask for a color cathode ray tube in the length direction thereof, and a means for winding the metal thin plate and arranging them separately from each other. A turn roller and a backup roller, and a peripheral surface which is disposed between the turn roller and the backup roller and slightly separated from the running path of the metal thin plate passing between these rollers, and which is in rolling contact with the surface of the metal thin plate. Coating roller having a, a photosensitive solution supply means for applying a photosensitive solution to the peripheral surface of the coating roller to a predetermined thickness, the coating roller is rotated in the direction opposite to the running direction of the thin metal plate, Drive means for continuously transferring and applying the photosensitive liquid applied to the peripheral surface onto the surface of the thin metal plate. In the photosensitive solution coating device, the coating position is provided on the opposite side of the coating roller across the traveling path, and the metal thin plate is pressed against the peripheral surface of the coating roller, and the metal thin plate is separated from the metal thin plate to separate the metal thin plate from the coating roller. A photosensitive liquid coating apparatus comprising: an adjusting roller that can move between a release position that is separated from the peripheral surface and a moving unit that moves the adjusting roller. 2. A means for running an elongated metal sheet having first and second surfaces in the length direction thereof, which is used for manufacturing a shadow mask of a color cathode ray tube, and a first means for the metal sheet. A first coating means for coating the surface with the photosensitive liquid; and a second coating means for coating the second surface of the metal thin plate with the photosensitive liquid. Each of the first and second coating means comprises: ,
Between the turn roller and the backup roller, which are arranged such that the metal thin plate is wound and are spaced apart from each other, and between the turn roller and the backup roller, a slight distance from the traveling path of the metal thin plate passing between these rollers. A coating roller having a peripheral surface which is disposed so as to be spaced apart from each other and is in rolling contact with the surface of the metal thin plate; a photosensitive solution supplying means for applying a photosensitive solution to a predetermined thickness on the peripheral surface of the coating roller; A rotating means in a direction opposite to the traveling direction of the metal thin plate, and a driving means for continuously transferring and applying the photosensitive liquid applied to the peripheral surface of the coating roller to the surface of the metal thin plate,
In the photosensitive liquid coating device, each of the first and second coating means is provided on the opposite side of the coating roller across the traveling path, and the coating position for pressing the thin metal plate against the peripheral surface of the coating roller. And an adjusting roller that is movable between a release position that separates the thin metal plate from the peripheral surface of the coating roller and that is separated from the thin metal plate, and a moving unit that moves the adjusting roller. A photosensitive liquid coating device characterized by the above.