JPH0782620B2 - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPH0782620B2 JPH0782620B2 JP24413987A JP24413987A JPH0782620B2 JP H0782620 B2 JPH0782620 B2 JP H0782620B2 JP 24413987 A JP24413987 A JP 24413987A JP 24413987 A JP24413987 A JP 24413987A JP H0782620 B2 JPH0782620 B2 JP H0782620B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- protective layer
- thin film
- magnetic head
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/127—Structure or manufacture of heads, e.g. inductive
- G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
- G11B5/3103—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing
- G11B5/3106—Structure or manufacture of integrated heads or heads mechanically assembled and electrically connected to a support or housing where the integrated or assembled structure comprises means for conditioning against physical detrimental influence, e.g. wear, contamination
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Magnetic Heads (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は薄膜磁気ヘッドに関し、更に詳述すれば、磁性
層上に積層される保護層が改良された薄膜磁気ヘッドに
関する。The present invention relates to a thin film magnetic head, and more particularly to a thin film magnetic head having an improved protective layer laminated on the magnetic layer.
薄膜磁気ヘッドは、フェライト或いはサファイア等の耐
摩耗性材料より成る基板上に、センダスト、アモルファ
ス等により形成した複数の磁性層、導電性金属から成る
コイル導体層及び絶縁層等を順次成膜及びエッチングを
繰返して所定の形状にパターニングし、最後に記録媒体
の走行による摩耗等から前記磁性層を保護する目的で保
護層を形成して設けられている。A thin-film magnetic head is formed by sequentially forming and etching a plurality of magnetic layers made of sendust, amorphous, etc., a coil conductor layer made of a conductive metal, an insulating layer, etc. on a substrate made of a wear-resistant material such as ferrite or sapphire. Is repeatedly patterned to form a predetermined shape, and finally a protective layer is formed for the purpose of protecting the magnetic layer from abrasion and the like due to running of the recording medium.
処で、上記のようの構成において、保護層が磁性層に較
べて充分に硬いと、記録媒体の走行による摩耗が磁性層
側に早く及び、磁性層に偏摩耗が生じてスペーシング・
ロスを発生することは良く知られている。In the above-mentioned structure, if the protective layer is sufficiently hard as compared with the magnetic layer, the wear due to running of the recording medium is accelerated toward the magnetic layer side, and uneven wear occurs in the magnetic layer, resulting in spacing.
It is well known that loss occurs.
一方、前記保護層は柔らか過ぎると全体の摩耗が早くな
り、ヘッド寿命を短かくする。従って、保護層の硬度は
磁性層と略同じか、これよりも幾分低い硬さに設けられ
ていることが望ましい。On the other hand, if the protective layer is too soft, the entire wear will be accelerated and the life of the head will be shortened. Therefore, it is desirable that the hardness of the protective layer be substantially the same as that of the magnetic layer or be slightly lower than this.
例えば、磁性層のビッカース硬度がHv＝600〜650kg/mm2
のとき、保護層はHv＝550〜700kg/mm2の範囲に設定され
ていることが望ましい。For example, the Vickers hardness of the magnetic layer is Hv = 600-650kg / mm 2
At this time, the protective layer is preferably set in the range of Hv = 550 to 700 kg / mm 2 .
また、前記保護層の厚みは、記録媒体の摺動性、耐偏摩
耗の点から20〜40μｍ程度以上を必要とする。しかしこ
の程度の厚みになると、通常、蓄積された内部応力によ
り保護層が剥離又は保護層に亀裂を生ずる。このため内
部応力を極力小さくする必要がある。この問題を解決す
る１つの有効手段は、ヘッドを構成する各材料の熱膨張
係数を合わせることである。しかしながら、一般に従来
は金属磁性材料と保護層の熱膨張係数を合わせることは
難しかった。Further, the thickness of the protective layer needs to be about 20 to 40 μm or more in terms of slidability of the recording medium and uneven wear resistance. However, at such a thickness, the protective layer usually peels off or cracks in the protective layer due to the accumulated internal stress. Therefore, it is necessary to minimize the internal stress. One effective means of solving this problem is to match the thermal expansion coefficient of each material forming the head. However, it has been generally difficult to match the thermal expansion coefficient of the metal magnetic material with that of the protective layer.
特開昭62−16218号公報には、偏摩耗の発生を効果的に
抑制できる保護層としてMgOとSiO2の混合物が開示され
ている。更に、MgOとSiO2の組成比をSiO2を濃度にして1
0〜70％とすることにより、適度な硬さ（Hv＝450〜85
0）と所望の熱膨張係数が得られることが記載されてい
る。Japanese Unexamined Patent Publication No. 62-16218 discloses a mixture of MgO and SiO 2 as a protective layer capable of effectively suppressing the occurrence of uneven wear. Further, the composition ratio of MgO and SiO 2 and SiO 2 in the concentration of 1
By setting 0 to 70%, appropriate hardness (Hv = 450 to 85
0) and a desired coefficient of thermal expansion are obtained.
しかしながら、本発明者が種々実験を重ねたところ、上
記MgO−SiO2系では硬度及び応力の自由度は大きいが、
耐水性に劣り実用上大きな欠点があることが分かった。
すなわち、望ましいビッカース硬度範囲（550kg/mm2以
上）は、MgOの組成比が70モル％以上であり、この場合
は耐水性が著しく悪く実用に適さない。一方、MgOの組
成を70モル％以下にすると、耐水性は向上し一応満足で
きる程度にはなるが、柔らかくなり過ぎ、すなわちビッ
カース硬度が不適当な範囲となり、この場合も実用に適
さないことを見出した。However, when the present inventors have conducted various experiments, the MgO-SiO 2 system has a large degree of freedom in hardness and stress,
It was found that the water resistance was inferior and there was a big drawback in practical use.
That is, in the desirable Vickers hardness range (550 kg / mm 2 or more), the composition ratio of MgO is 70 mol% or more, and in this case, the water resistance is remarkably poor and it is not suitable for practical use. On the other hand, if the composition of MgO is 70 mol% or less, the water resistance is improved to a satisfactory level, but it becomes too soft, that is, the Vickers hardness is in an inappropriate range, and in this case also, it is not suitable for practical use. I found it.
本発明の目的は、上記事情に鑑みなされたもので、偏摩
耗を生じさせないでかつ耐水性に優れた保護層を形成し
た薄膜磁気ヘッドを提供することにある。The present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a thin film magnetic head in which a protective layer that does not cause uneven wear and is excellent in water resistance is formed.
すなわち、本発明の上記目的は、基板上に少なくとも磁
性層、コイル導体層及び絶縁層を形成し、保護層を前記
磁性層上に積層した構成から成る薄膜磁気ヘッドにおい
て、前記保護層がMgOを15〜70モル％、SiO2を25〜80モ
ル％、Al2O3を５〜60モル％の組成から成ることを特徴
とする薄膜磁気ヘッドにより達成される。That is, the above-mentioned object of the present invention is a thin-film magnetic head comprising at least a magnetic layer, a coil conductor layer and an insulating layer formed on a substrate, and a protective layer laminated on the magnetic layer, wherein the protective layer is MgO. It is achieved by a thin film magnetic head characterized in that it has a composition of 15 to 70 mol%, SiO 2 is 25 to 80 mol%, and Al 2 O 3 is 5 to 60 mol%.
MgOとSiO2の組成物に更にAl2O3を適当な割合で加えたこ
とにより、硬度に加えて耐水性を有する保護層が得られ
る。By further adding Al 2 O 3 to the composition of MgO and SiO 2 in an appropriate ratio, a protective layer having water resistance in addition to hardness can be obtained.
以下、図面を参照して本発明の実施例を説明する。 Embodiments of the present invention will be described below with reference to the drawings.
第１図の１実施例は、本発明の薄膜磁気ヘッドの構造を
示す断面図であり、製造プロセスに基づいて説明する。1 is a cross-sectional view showing the structure of the thin film magnetic head of the present invention, which will be described based on the manufacturing process.
図において、フェライト基板10上にスパッタ法によりCo
−Nb−Zr合金の強磁性体を10μｍ付着し、下部磁性層11
を形成する。次に下部磁性層11上にSiC2等よりなる非磁
性絶縁層12及びCu,Al等よりなるコイル導体層13を適宜
形成した後、略台形状にイオンミリングにより加工し、
フロントギャップ部17及び図示しないリヤギャップ部で
下部磁性層11を露出せしめ、ギャップ層14を形成する。
前記非磁性絶縁層12上に下部磁性層11とフロントギャッ
プ部及びリアギャップ部で磁気的に接合するようにCo−
Nb−Zr合金の金属磁性材料をスパッタ法で15μｍ付着
し、上記磁性層15を形成する。In the figure, Co is sputtered on the ferrite substrate 10.
-Nb-Zr alloy ferromagnet was deposited to 10 μm, and the lower magnetic layer 11
To form. Next, after appropriately forming a non-magnetic insulating layer 12 made of SiC 2 or the like and a coil conductor layer 13 made of Cu, Al or the like on the lower magnetic layer 11, it is processed by ion milling into a substantially trapezoidal shape,
The lower magnetic layer 11 is exposed at the front gap portion 17 and the rear gap portion (not shown) to form the gap layer 14.
On the non-magnetic insulating layer 12, Co-- is formed so as to be magnetically bonded to the lower magnetic layer 11 at the front gap portion and the rear gap portion.
A magnetic metal material of Nb-Zr alloy is deposited by a thickness of 15 μm by a sputtering method to form the magnetic layer 15.
次に、本発明の要部である保護層16を上部磁性層15の上
に形成する。Next, the protective layer 16 which is the main part of the present invention is formed on the upper magnetic layer 15.
保持層をMgO−SiO2の組成物で形成したところ磁性層と
同程度かこれよりも低い硬さの所望の硬度が得られた。
しかし耐水性を考慮すると、上記の組成だけでは不充分
であることが分かった。Retaining layer of the desired hardness of either magnetic layer comparable was formed with the composition of MgO-SiO 2 than this lower hardness is obtained.
However, considering the water resistance, it was found that the above composition alone was insufficient.
本発明者は、上記組成に更にAl2O3を加えた組成物で保
護層を設け、夫々の組成比を種々変化させたところ、下
記表１のような結果を得た。The present inventor provided a protective layer with a composition obtained by further adding Al 2 O 3 to the above composition, and variously changed the respective composition ratios, and the results shown in Table 1 below were obtained.
なお、保護層はスパッタ（陰極電力＝1kw,Arガス圧＝0.
4Pa,基板温度＝水冷）により30μ厚に成膜し、MgO・SiO
2から成るターゲット上にSiO2,MgO又はAl2O3のペレット
を配して組成を変化させた。そして成膜した保護層をXR
S（蛍光Ｘ線）により組成分析した。The protective layer is sputter (cathode power = 1kw, Ar gas pressure = 0.
4Pa, substrate temperature = water cooling) to form a film with a thickness of 30μ, MgO ・ SiO
The composition was changed by placing pellets of SiO 2 , MgO or Al 2 O 3 on a target composed of 2 . And the formed protective layer is XR
The composition was analyzed by S (fluorescent X-ray).
上記の結果に基づいて更に詳細に実験をかさねたとこ
ろ、以下のことが分かった。 A more detailed experiment based on the above results revealed the following.
すなわち、MgOは15モル％以下では応力が大きくなり、7
0モル％以上だと耐水性が下がる。SiO2は25モル％以下
だと硬度が硬すぎ、80モル％以上だと応力が大きくな
る。また、Al2O3は５モル％以下だと硬度が低すぎ、60
モル％以上だと硬度が硬すぎる。さらには、SiO2−Al2O
3の２成分系は切削性に劣りヘッド摺動面の研削加工の
際に亀裂や剥離，割れ等が発生する。これにMgOを15モ
ル％加えると研削性が良好となり、上記の不都合は発生
しなくなることも明らかとなった。That is, when MgO is 15 mol% or less, the stress becomes large.
If it is 0 mol% or more, the water resistance decreases. If the SiO 2 content is 25 mol% or less, the hardness becomes too hard, and if it is 80 mol% or more, the stress increases. Also, if Al 2 O 3 is less than 5 mol%, the hardness is too low,
If it is more than mol%, the hardness will be too high. Furthermore, SiO 2 -Al 2 O
The two-component system of 3 is inferior in machinability and cracks, peeling, and cracks occur during grinding of the head sliding surface. It was also clarified that when MgO of 15 mol% was added thereto, the grindability was improved and the above-mentioned inconvenience did not occur.
第２図は、上記分析結果を示す３成分系組成図である。FIG. 2 is a three-component composition diagram showing the above analysis results.
従って、本発明の薄膜磁気ヘッドにおける保護層は、Mg
O−SiO2−Al2O3の組成からなり、好ましくはMgOを15〜7
0モル％,SiO2を25〜80モル％,Al2O3を５〜60モル％の組
成とすることにより、好適な結果が得られた。Therefore, the protective layer in the thin film magnetic head of the present invention is
It consists composition of O-SiO 2 -Al 2 O 3 , preferably at MgO 15 to 7
Suitable results were obtained by making the composition 0 mol%, SiO 2 25 to 80 mol%, and Al 2 O 3 5 to 60 mol%.
以上記載したとおり、本発明によれば、熱膨張係数が金
属磁性材料に近くて内部応力を小さくすることが出来、
偏摩耗を生じさせないで且つ耐水性にも優れた保護層を
具備することにより、テープ摺動性の良好な薄膜磁気ヘ
ッドが得られる。特開昭62−16218号公報に於いて、MgO
とSiO2以外の少量の第３物質を添加してもよいことが開
示されているが、本発明は、MgO−SiO2−Al2O3より成る
組成物が薄膜磁気ヘッドの保護層として優れた機能を有
することを見出すことによって成されたものであり、上
記特開昭62−16218号に何ら拘束されるものではないこ
とは云うまでもない。As described above, according to the present invention, the thermal expansion coefficient is close to that of the metal magnetic material, and the internal stress can be reduced,
By providing the protective layer which does not cause uneven wear and is also excellent in water resistance, a thin film magnetic head having good tape slidability can be obtained. In Japanese Patent Laid-Open No. 62-16218, MgO
Although it is disclosed that a small amount of a third substance other than SiO 2 and SiO 2 may be added, in the present invention, a composition comprising MgO—SiO 2 —Al 2 O 3 is excellent as a protective layer for a thin film magnetic head. It is needless to say that the present invention is made by finding out that it has the above-mentioned function and is not restricted by the above-mentioned JP-A-62-16218.
また、本発明はMgO−SiO2−Al2O3より成る組成物に少量
の第４の物質を添加しても本発明の効果は損なわれるこ
とはない。Further, the present invention is effective is not impaired in the invention to add a small amount of a fourth substance to a composition consisting of MgO-SiO 2 -Al 2 O 3 .
また、本発明の説明に、第１図に示した構造の薄膜磁気
ヘッドを用いたが、この発明はこの構造に限定されるも
のではない。たとえば、本発明は保護層の上にさらに保
護板を設けた構造の薄膜磁気ヘッドに於いても適用され
る。Further, although the thin film magnetic head having the structure shown in FIG. 1 was used in the description of the present invention, the present invention is not limited to this structure. For example, the present invention can be applied to a thin film magnetic head having a structure in which a protective plate is further provided on the protective layer.
第１図は、本発明の薄膜磁気ヘッドの構造を説明する断
面図、第２図は本発明に用いられる保護層の組成比を示
す３成分系組成図である。 10:基板,11:下部磁性層， 12:非磁性絶縁層,14:ギャップ層 15:上部磁性層,16:保護層FIG. 1 is a sectional view for explaining the structure of the thin film magnetic head of the present invention, and FIG. 2 is a three-component composition diagram showing the composition ratio of the protective layer used in the present invention. 10: Substrate, 11: Lower magnetic layer, 12: Non-magnetic insulating layer, 14: Gap layer 15: Upper magnetic layer, 16: Protective layer
Claims (1)
及び絶縁層を形成し、保護層を前記磁性層上に積層した
構成から成る薄膜磁気ヘッドにおいて、前記保護層がMg
Oを15〜70モル％、SiO2を25〜80モル％、Al2O3を５〜60
モル％の組成から成ることを特徴とする薄膜磁気ヘッ
ド。1. A thin film magnetic head having a structure in which at least a magnetic layer, a coil conductor layer and an insulating layer are formed on a substrate and a protective layer is laminated on the magnetic layer, wherein the protective layer is Mg.
O 15 to 70 mol%, a SiO 2 25 to 80 mol%, the Al 2 O 3 5 to 60
A thin film magnetic head comprising a composition of mol%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24413987A JPH0782620B2 (en) | 1987-09-30 | 1987-09-30 | Thin film magnetic head |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP24413987A JPH0782620B2 (en) | 1987-09-30 | 1987-09-30 | Thin film magnetic head |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6489010A JPS6489010A (en) | 1989-04-03 |
| JPH0782620B2 true JPH0782620B2 (en) | 1995-09-06 |
Family
ID=17114340
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP24413987A Expired - Fee Related JPH0782620B2 (en) | 1987-09-30 | 1987-09-30 | Thin film magnetic head |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0782620B2 (en) |
-
1987
- 1987-09-30 JP JP24413987A patent/JPH0782620B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6489010A (en) | 1989-04-03 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0114076A2 (en) | Magnetic head | |
| JP2513205B2 (en) | Composite magnetic head | |
| EP0183427B1 (en) | Magnetic recording medium | |
| US6424489B1 (en) | Magnetic head having a wear-resistant layer, and method of manufacturing such a magnetic head | |
| JPH0782620B2 (en) | Thin film magnetic head | |
| US4752344A (en) | Magnetic layer and method of manufacture | |
| US4983465A (en) | Thin film magnetic head | |
| US5997698A (en) | Process for fabricating soft magnetic thin films | |
| US5061576A (en) | Thin film magnetic head | |
| US6638647B2 (en) | Vertical recording medium with thin soft magnetic film | |
| JPH01191316A (en) | Thin film magnetic head | |
| EP0619585A1 (en) | FeRhGaSi soft magnetic materials for inductive magnetic heads | |
| US6902826B1 (en) | High moment films with sub-monolayer nanolaminations retaining magnetic anisotropy after hard axis annealing | |
| JPH01189011A (en) | Thin film magnetic head | |
| JPH01189014A (en) | Thin film magnetic head | |
| JPH01189012A (en) | Thin film magnetic head | |
| JPH01191315A (en) | Thin film magnetic head | |
| JP3651916B2 (en) | Magnetic head | |
| JP2574768B2 (en) | Magneto-optical recording medium | |
| EP0392675B1 (en) | Substrate material for magnetic head and magnetic head using same | |
| JPH0296909A (en) | Thin film magnetic head | |
| JPH0296910A (en) | Thin film magnetic head | |
| JPH0610848B2 (en) | Laminated magnetic material | |
| JPH10503314A (en) | Method for producing magnetic head having thin wear-resistant layer and magnetic head obtainable by this method | |
| Rook et al. | Collimated deposition of hard bias magnetic films via long-throw techniques |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |