JPH01189014A - Thin film magnetic head - Google Patents
Thin film magnetic headInfo
- Publication number
- JPH01189014A JPH01189014A JP1098788A JP1098788A JPH01189014A JP H01189014 A JPH01189014 A JP H01189014A JP 1098788 A JP1098788 A JP 1098788A JP 1098788 A JP1098788 A JP 1098788A JP H01189014 A JPH01189014 A JP H01189014A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- magnetic
- protecting
- thin film
- magnetic head
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 230000005291 magnetic effect Effects 0.000 title claims abstract description 47
- 239000010409 thin film Substances 0.000 title claims abstract description 15
- 239000010410 layer Substances 0.000 claims abstract description 54
- 239000000203 mixture Substances 0.000 claims abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 8
- 239000004020 conductor Substances 0.000 claims abstract description 7
- 239000011241 protective layer Substances 0.000 claims description 24
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 9
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 4
- 229910000859 α-Fe Inorganic materials 0.000 abstract description 4
- 239000012790 adhesive layer Substances 0.000 abstract description 3
- 229910052681 coesite Inorganic materials 0.000 abstract description 2
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 2
- 239000000377 silicon dioxide Substances 0.000 abstract description 2
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 2
- 229910052682 stishovite Inorganic materials 0.000 abstract description 2
- 239000000126 substance Substances 0.000 abstract description 2
- 229910052905 tridymite Inorganic materials 0.000 abstract description 2
- 238000005299 abrasion Methods 0.000 abstract 2
- 230000005294 ferromagnetic effect Effects 0.000 abstract 1
- 239000000463 material Substances 0.000 description 4
- 229910001093 Zr alloy Inorganic materials 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000696 magnetic material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000005566 electron beam evaporation Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000003302 ferromagnetic material Substances 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910000702 sendust Inorganic materials 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は薄膜磁気ヘッドに関し、更に詳述すれば、磁性
層上に積層される保護層が改良された薄膜磁気ヘッドに
関する。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a thin film magnetic head, and more specifically, to a thin film magnetic head in which a protective layer laminated on a magnetic layer is improved.
薄膜磁気ヘッドは、フェライト或いはサファイア等の耐
摩耗性材料より成る基板上に、センダスト、アモルファ
ス等により形成した複数の磁性層、導電性金属から成る
コイル導体層及び絶縁層等を順次成膜及びエツチングを
繰返して所定の形状にバターニングし、最後に記録媒体
の走行による摩耗等から前記磁性層を保護する目的で保
護層を形成して設けられている。A thin-film magnetic head is made by sequentially forming and etching multiple magnetic layers made of sendust, amorphous, etc., a coil conductor layer made of conductive metal, an insulating layer, etc. on a substrate made of wear-resistant material such as ferrite or sapphire. This process is repeated to pattern the magnetic layer into a predetermined shape, and finally a protective layer is formed to protect the magnetic layer from wear caused by running the recording medium.
処で、上記のような構成において、保護層が磁性層に較
べて充分に硬いと、記録媒体の走行による摩耗が磁性層
側に早く及び、磁性層に偏摩耗が生じてスペーシング・
ロスを発生することは良く知られている。However, in the above structure, if the protective layer is sufficiently hard compared to the magnetic layer, the wear caused by the running of the recording medium will reach the magnetic layer side more quickly, causing uneven wear on the magnetic layer and causing problems with the spacing.
It is well known that losses occur.
一方、前記保護層は軟らか過ぎると全体の摩耗が早くな
り、ヘッド寿命を短かくする。従って、保護層の硬度は
磁性層と路間しか、これよりも幾分低い硬さに設けられ
ていることが望ましい。On the other hand, if the protective layer is too soft, the overall wear will be rapid, shortening the life of the head. Therefore, it is desirable that the hardness of the protective layer is set to be slightly lower only between the magnetic layer and the path.
例えば、磁性層のビッカース硬度がHv =600〜6
50kg/mm2 のとき、保護層はHv =400〜
600kg/mm” の範囲に設定されていることが望
ましい。For example, the Vickers hardness of the magnetic layer is Hv = 600 to 6
At 50 kg/mm2, the protective layer has Hv = 400 ~
It is desirable to set it within a range of 600 kg/mm.
また、前記保護層の厚みは、記録媒体の摺動性、耐偏摩
耗の点から20〜40μm程度以上を必要とする。しか
しこの程度の厚みになると、通常、累積された内部応力
により保護層が剥離又は保護層に亀裂を生じる。このた
め内部応力を極力小さくする必要がある。この問題を解
決する1つの有効手段は、ヘッドを構成する各材料の熱
膨張係数を合わせることである。しかしながら、一般に
従来は金属磁性材料と保護層の熱膨張係数を合わせるこ
とは難しかった。Further, the thickness of the protective layer needs to be about 20 to 40 μm or more from the viewpoint of sliding properties of the recording medium and resistance to uneven wear. However, when the thickness reaches this level, the protective layer usually peels off or cracks due to accumulated internal stress. Therefore, it is necessary to reduce internal stress as much as possible. One effective means to solve this problem is to match the thermal expansion coefficients of the materials that make up the head. However, it has generally been difficult to match the thermal expansion coefficients of the metallic magnetic material and the protective layer.
特開昭62−16218号公報には、偏摩耗の発生を効
果的に抑制できる保護層としてMgOと5in2の混合
物が開示されている。更に、MgOと5iOz の組成
比をSiC2を濃度にして10〜70%とすることによ
り、適度な硬さ(Hv=450〜850)と所望の熱膨
張係数が得られることが記載されている。JP-A-62-16218 discloses a mixture of MgO and 5in2 as a protective layer that can effectively suppress the occurrence of uneven wear. Furthermore, it is stated that by setting the composition ratio of MgO and 5iOz to 10 to 70% with SiC2 as the concentration, an appropriate hardness (Hv=450 to 850) and a desired coefficient of thermal expansion can be obtained.
しかしながら、本発明者が種々実験を重ねたところ、上
記MgO−3iO□系では硬度及び応力の自由度は大き
いが、耐水性に劣り実用上大きな欠点があることが分か
った。すなわち、望ましいビッカース硬度範囲(550
kg/mm”以上)は、MgOの組成比が70モル%以
上であり、この場合は耐水性が著しく悪く実用に適さな
い。一方、MgOの組成を70モル%以下にすると、耐
水性は向上し一応満足できる程度にはなるが、軟らか(
なり過ぎ、すなわちビッカース硬度が不適当な範囲とな
り、この場合も実用に適さないことを見出した。However, as a result of various experiments conducted by the present inventor, it was found that although the MgO-3iO□ system has a high degree of freedom in hardness and stress, it is inferior in water resistance and has a major drawback in practical use. That is, the desirable Vickers hardness range (550
kg/mm" or more), the MgO composition ratio is 70 mol% or more, and in this case the water resistance is extremely poor and is not suitable for practical use. On the other hand, if the MgO composition is 70 mol% or less, the water resistance improves. It will be to a certain degree that you are satisfied with it, but it will be soft (
It has been found that the Vickers hardness is too high, that is, the Vickers hardness is in an inappropriate range, and that this case is also not suitable for practical use.
本発明の目的は、上記事情に鑑みなされたもので、偏摩
耗を生じさせないでかつ耐水性に優れた保護層を形成し
た薄膜磁気ヘッドを提供することにある。SUMMARY OF THE INVENTION An object of the present invention has been made in view of the above circumstances, and it is an object of the present invention to provide a thin film magnetic head that does not cause uneven wear and has a protective layer that is excellent in water resistance.
すなわち、本発明の上記目的は、基板上に磁性層、コイ
ル導体層及び絶縁層を形成し、保護層を前記磁性層上に
積層した構成から成る薄膜磁気ヘッドにおいて、前記保
護層の組成がNiOとSiO□ とから成ることを特徴
とする薄膜磁気ヘッドにより達成される。That is, the above object of the present invention is to provide a thin film magnetic head having a structure in which a magnetic layer, a coil conductor layer, and an insulating layer are formed on a substrate, and a protective layer is laminated on the magnetic layer, wherein the composition of the protective layer is NiO. This is achieved by a thin film magnetic head characterized by being made of and SiO□.
以下、図面を参照して本発明の詳細な説明する。 Hereinafter, the present invention will be described in detail with reference to the drawings.
第1図の1実施例は、本発明の薄膜磁気ヘッドの構造を
示す断面図であり、製造プロセスに基づいて説明する。An embodiment shown in FIG. 1 is a sectional view showing the structure of a thin film magnetic head of the present invention, and will be explained based on the manufacturing process.
図において、フェライト基板10上にスパッタ法により
Co−Nb−Zr合金の強磁性体を10μm付着し、下
部磁性層11を形成する。次に下部磁性層11上にSi
n、等よりなる非磁性絶縁層12及びCu、A1等より
なるコイル導体層13を適宜形成した後、略台形状にイ
オンミリングにより加工し、フロントギャップ部17及
び図示しないリアギャップ部で下部磁性層11を露出せ
しめ、ギャップ層14を形成する。前記非磁性絶縁層1
2上に下部磁性層11とフロントギャップ部及びリアギ
ャップ部で磁気的に接合するようにCo−Nb−Zr合
金の金属磁性材料をスパッタ法で15μm付着し、上部
磁性層15を形成する。In the figure, a ferromagnetic material of Co--Nb--Zr alloy is deposited to a thickness of 10 μm on a ferrite substrate 10 by sputtering to form a lower magnetic layer 11. Next, Si is placed on the lower magnetic layer 11.
After properly forming a non-magnetic insulating layer 12 made of a material such as N, etc. and a coil conductor layer 13 made of a material such as Cu, A1, etc., they are processed into a substantially trapezoidal shape by ion milling, and a lower magnetic insulating layer 12 is formed in a front gap portion 17 and a rear gap portion (not shown). Layer 11 is exposed and gap layer 14 is formed. Said non-magnetic insulating layer 1
An upper magnetic layer 15 is formed by sputtering a Co--Nb--Zr alloy metal magnetic material to a thickness of 15 μm on the lower magnetic layer 11 so as to be magnetically connected to the lower magnetic layer 11 at the front gap and rear gap.
次に、本発明の要部である保護層16を上部磁性層15
の上に形成する。Next, the protective layer 16, which is the main part of the present invention, is applied to the upper magnetic layer 15.
form on top of.
なお、保護層は電子ビーム蒸着(真空度=゛1xIQ−
2Pa、基板温度=200℃、付着速度=100OA/
分)により、30μm厚に成膜した。The protective layer was formed by electron beam evaporation (degree of vacuum = ゛1xIQ-
2Pa, substrate temperature = 200℃, deposition rate = 100OA/
A film was formed to a thickness of 30 μm using the following steps.
上述のようにして保護層16が形成された後、従来と同
様、前記保護層16を平坦化し、接着剤層18を介して
保護板19と貼着して製作される。After the protective layer 16 is formed as described above, the protective layer 16 is flattened and bonded to a protective plate 19 via the adhesive layer 18, as in the conventional method.
第2図にNiOのモル%とビッカース硬度の関係を示す
。ビッカース硬度Hv=400〜600kg/mm’
の硬度範囲に対して、NiOのモル%は45%〜75%
で得られることがわかる。FIG. 2 shows the relationship between NiO mol% and Vickers hardness. Vickers hardness Hv=400~600kg/mm'
For the hardness range of , the mole% of NiO is 45% to 75%
You can see what you can get.
前記の通りに構成した薄膜磁気ヘッド面に対して記録媒
体を、1000時間走行させて偏摩耗を観察した。偏摩
耗はオプティカルフラットにより干渉縞を観察し、磁性
層と保護層との段差を調べることにより行った。その結
果、上記組成範囲の保護層で、段差は認められなかった
。A recording medium was run for 1000 hours on the surface of the thin film magnetic head constructed as described above, and uneven wear was observed. Uneven wear was determined by observing interference fringes with an optical flat and examining the level difference between the magnetic layer and the protective layer. As a result, no step difference was observed in the protective layer having the above composition range.
又、上記組成範囲の保護層の内部応力は0.1×10’
dyn/crI〜3.9X 10’ dyn/c
atでSiO2単体に比べて、凡そ1桁小さい事がわか
った。Moreover, the internal stress of the protective layer having the above composition range is 0.1×10'
dyn/crI~3.9X 10' dyn/c
It was found that at is approximately one order of magnitude smaller than that of SiO2 alone.
さらに、純水浸漬試験の結果、何ら変化は認められず、
耐水性上、何ら問題がないことが確認された。Furthermore, as a result of the pure water immersion test, no changes were observed.
It was confirmed that there were no problems with water resistance.
以上記載したとおり、本発明によれば、磁性層に積層さ
れる保護層の硬度を適当としたことにより、記録媒体の
走行による偏摩耗の発生が好適に阻止され、かつ耐水性
の良好な薄膜磁気ヘッドを得ることができ、前記従来技
術の欠点を除いて優れた性能を有する薄膜磁気ヘッドを
提供することができる。As described above, according to the present invention, by appropriately setting the hardness of the protective layer laminated on the magnetic layer, occurrence of uneven wear due to running of the recording medium can be suitably prevented, and a thin film with good water resistance can be formed. A magnetic head can be obtained, and a thin film magnetic head can be provided which has excellent performance by eliminating the drawbacks of the prior art.
なお、N i Oと8102以外の第3物質を少量添加
しても本発明の効果が損われることはない。Note that even if a small amount of a third substance other than N i O and 8102 is added, the effects of the present invention are not impaired.
第1図は本発明に基づいて構成される薄膜磁気ヘッドの
断面図、第2図はNiOのモル%とビッカース硬度の関
係を示した図である。
10 フェライト基板、11 下部磁性層、12 非磁
性絶縁層、13 コイル導体層、14 ギャップ層、1
5 上部磁性層、16−保護層、17 フロントギャッ
プ部、18 接着剤層、19−・保護板FIG. 1 is a cross-sectional view of a thin film magnetic head constructed based on the present invention, and FIG. 2 is a diagram showing the relationship between NiO mole % and Vickers hardness. 10 ferrite substrate, 11 lower magnetic layer, 12 nonmagnetic insulating layer, 13 coil conductor layer, 14 gap layer, 1
5 Upper magnetic layer, 16-protective layer, 17 front gap portion, 18 adhesive layer, 19-protective plate
Claims (1)
形成し、保護層を前記磁性層上に積層した構成から成る
薄膜磁気ヘッドにおいて、前記保護層の組成がNiOと
SiO_2から成ることを特徴とする薄膜磁気ヘッド。A thin film magnetic head comprising a structure in which at least a magnetic layer, a coil conductor layer, and an insulating layer are formed on a substrate, and a protective layer is laminated on the magnetic layer, characterized in that the composition of the protective layer is composed of NiO and SiO_2. Thin film magnetic head.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1098788A JPH01189014A (en) | 1988-01-22 | 1988-01-22 | Thin film magnetic head |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1098788A JPH01189014A (en) | 1988-01-22 | 1988-01-22 | Thin film magnetic head |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH01189014A true JPH01189014A (en) | 1989-07-28 |
Family
ID=11765503
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1098788A Pending JPH01189014A (en) | 1988-01-22 | 1988-01-22 | Thin film magnetic head |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH01189014A (en) |
-
1988
- 1988-01-22 JP JP1098788A patent/JPH01189014A/en active Pending
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