JPH0780956A - Production of light scattering material - Google Patents

Production of light scattering material

Info

Publication number
JPH0780956A
JPH0780956A JP5254925A JP25492593A JPH0780956A JP H0780956 A JPH0780956 A JP H0780956A JP 5254925 A JP5254925 A JP 5254925A JP 25492593 A JP25492593 A JP 25492593A JP H0780956 A JPH0780956 A JP H0780956A
Authority
JP
Japan
Prior art keywords
light
resin
good solvent
solvent
resin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP5254925A
Other languages
Japanese (ja)
Inventor
Shuzo Okumura
秀三 奥村
Kazuhiko Takahata
和彦 高畑
Tatsuo Ishibashi
達男 石橋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissha Printing Co Ltd
Original Assignee
Nissha Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissha Printing Co Ltd filed Critical Nissha Printing Co Ltd
Priority to JP5254925A priority Critical patent/JPH0780956A/en
Publication of JPH0780956A publication Critical patent/JPH0780956A/en
Withdrawn legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a light scattering material enhanced in light scattering rate by forming a resin film and exposing the film to a poor solvent having a b.p. higher than that of a good solvent to dry the same to vaporize the solvent and forming the resin film having fine voids on a substrate. CONSTITUTION:Polyethylene dissolved in a good solvent 3, for example, benzene, toluene or ethyl acetate and an acrylic resin soln. are applied or printed on a substrate to form a resin film l. The resin film 1 is exposed to a poor solvent 4 having a b.p. higher than that of the good solvent, for example, methanol, n-butanol or diacetone alcohol before the good solvent 3 in the resin film 1 is perfectly dried. The good solvent 3 and the poor solvent 4 are successively vaporized by drying the resin film to form the resin film having a large number of non-spherical continuous fine voids on the substrate to obtain a light scattering material. Herein, when the substrate is a light guide plate, as the material quality thereof, an acrylic resin, polycarbonate or a polyvinyl chloride resin is used.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、光散乱率が高い光散乱
材の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a light scattering material having a high light scattering rate.

【0002】液晶ディスプレイのバックライトは、薄型
で、高輝度かつ均一な発光を行なうことが必要である。
このような液晶ディスプレイのバックライトとして、透
明な導光板の側方に線光源が配置され、線光源からの距
離に応じて形成密度の変化したグラデーションパターン
を有する光散乱反射部が導光板裏面に設けられたエッジ
ライト方式の面光源装置が多く用いられている。
The backlight of a liquid crystal display is required to be thin and to emit high brightness and uniform light.
As a backlight of such a liquid crystal display, a line light source is arranged on the side of a transparent light guide plate, and a light scattering reflection portion having a gradation pattern whose formation density changes according to the distance from the line light source is provided on the back surface of the light guide plate. The edge light type surface light source device provided is often used.

【0003】光散乱反射部は、線光源から導光板内に入
射した光を上方に散乱反射させ導光板の上面より出射さ
せる。よって、光散乱反射部の光散乱率を高めることが
面光源装置の高輝度化の重要なポイントとなる。
The light-scattering / reflecting portion scatters and reflects upwardly the light that has entered the light guide plate from the linear light source and emits it from the upper surface of the light guide plate. Therefore, increasing the light-scattering rate of the light-scattering / reflecting portion is an important point for increasing the brightness of the surface light source device.

【0004】また、面光源装置には、導光板の表側に拡
散板を配置したものがある。拡散板は、導光板より出射
した光を散乱させることにより光散乱反射部の形成部分
と非形成部分との輝度差を解消して均一な発光面を得る
ものである。
In some surface light source devices, a diffusion plate is arranged on the front side of the light guide plate. The diffusion plate scatters the light emitted from the light guide plate to eliminate the brightness difference between the portion where the light scattering reflection portion is formed and the portion where the light scattering reflection portion is not formed, and obtains a uniform light emitting surface.

【0005】[0005]

【従来の技術】従来より、導光板裏面に光散乱反射部を
形成する方法としては、白色顔料やガラスビーズなどの
光散乱性微粒子が混入されたインキを用いてグラデーシ
ョンパターンの光散乱層を導光板裏面に直接印刷する方
法や、ガス発生物質が混入されたインキを用いてグラデ
ーションパターンの光散乱層を導光板裏面に直接印刷し
た後、光照射または加熱により発泡させ内部に多数の気
泡が封入された樹脂層を形成する方法があった。
2. Description of the Related Art Conventionally, as a method of forming a light-scattering / reflecting portion on the back surface of a light guide plate, an ink mixed with light-scattering fine particles such as white pigment or glass beads is used to guide the light-scattering layer in a gradation pattern. A method of printing directly on the back surface of the light plate, or a light scattering layer with a gradation pattern is printed directly on the back surface of the light guide plate using ink mixed with a gas generating substance, and then a large number of air bubbles are enclosed inside by foaming by light irradiation or heating. There was a method of forming the resin layer.

【0006】また、導光板裏面に光散乱反射部を形成す
る別の方法として、線光源からの距離に応じて形成密度
の変化したグラデーションパターンを有する光透過性層
を導光板裏面に設けた後、白色顔料やガラスビーズなど
の光散乱性微粒子が混入されたインキを全面塗布したフ
ィルムを導光板裏面に積層する方法や、線光源からの距
離に応じて形成密度の変化したグラデーションパターン
を有する光透過性層を導光板裏面に設けた後、ガス発生
物質が混入されたインキを全面塗布し光照射または加熱
により塗布膜が発泡されたフィルムを導光板裏面に積層
する方法がある。
As another method of forming the light-scattering / reflecting portion on the back surface of the light guide plate, after providing a light-transmitting layer having a gradation pattern whose formation density changes according to the distance from the linear light source on the back surface of the light guide plate. , A method in which a film coated with ink mixed with light scattering fine particles such as white pigments and glass beads is laminated on the back surface of the light guide plate, or light having a gradation pattern in which the formation density changes according to the distance from the linear light source. After providing the transparent layer on the back surface of the light guide plate, there is a method of coating the entire surface with an ink mixed with a gas generating substance and laminating a film having a coating film foamed by light irradiation or heating on the back surface of the light guide plate.

【0007】また、拡散板の場合には、上記の光散乱性
微粒子が混入されたインキを全面塗布したフィルムや、
ガス発生物質が混入されたインキを全面塗布し光照射ま
たは加熱により塗布膜が発泡されたフィルムを用いたも
のがあった。
In the case of a diffusion plate, a film coated with the above-mentioned ink mixed with the above light-scattering fine particles,
In some cases, a film in which an ink mixed with a gas generating substance is applied over the entire surface and a coating film is foamed by light irradiation or heating is used.

【0008】[0008]

【発明が解決しようとする課題】しかし、上記の従来技
術には、以下のような問題があった。
However, the above-mentioned prior art has the following problems.

【0009】つまり、白色顔料やガラスビーズなどの光
散乱性微粒子が混入されたインキを用いる方法では、イ
ンキとしての印刷適性を出すためには光散乱性微粒子の
含有率に限界があり、高い光散乱率は得られなかった。
また、光散乱微粒子の粒径が大きいため、光散乱微粒子
の混入によって得られる塗布膜の凹凸が粗くなり、やは
り高い光散乱率は得られなかった。
That is, in the method of using an ink mixed with light-scattering fine particles such as white pigment and glass beads, the content of the light-scattering fine particles is limited in order to obtain printability as an ink, and high light No scattering rate was obtained.
Further, since the light-scattering fine particles have a large particle diameter, the unevenness of the coating film obtained by mixing the light-scattering fine particles becomes rough, and thus a high light-scattering rate cannot be obtained.

【0010】また、ガス発生物質が混入されたインキを
用い光照射や加熱により塗布膜を発泡させる方法では、
発生した気泡がほぼ球形に近く形成される。換言すれ
ば、気泡の表面積が非常に小さくなるため、気泡と樹脂
の界面、すなわち光散乱界面の表面積が大きくならな
い。よって、高い光散乱率は得られなかった。
Further, in the method of foaming the coating film by light irradiation or heating using an ink containing a gas generating substance,
The generated bubbles are formed almost in a spherical shape. In other words, since the surface area of the bubbles is very small, the surface area of the interface between the bubbles and the resin, that is, the light scattering interface does not become large. Therefore, a high light scattering rate was not obtained.

【0011】加えて、気泡を高密度に発生させようとす
ると、気泡の発生によって塗布層が膨れ上がるのでパタ
ーンの精度が極端に悪くなり、たとえばドットグラデー
ションを印刷しても忠実なパターンを再現できず、輝度
の不均一性の原因となる。また、発泡により膜質が極端
に脆くなる。よって、発泡密度に限界があり、高い光散
乱率は得られなかった。
In addition, when trying to generate bubbles with a high density, the coating layer swells due to the generation of bubbles, resulting in extremely poor pattern accuracy. For example, even if dot gradation is printed, a faithful pattern can be reproduced. This causes uneven brightness. Further, the film quality becomes extremely brittle due to foaming. Therefore, the foam density is limited and a high light scattering rate cannot be obtained.

【0012】したがって、本発明は、以上のような問題
点を解決し、光散乱率の高い光散乱材を提供することを
目的とする
Therefore, an object of the present invention is to solve the above problems and to provide a light scattering material having a high light scattering rate.

【0013】[0013]

【課題を解決するための手段および作用】上記の目的を
達成するために、本発明の光散乱材の製造方法は、良溶
媒に溶解した樹脂液を基体上に塗布または印刷して樹脂
被膜を形成し、樹脂被膜中の良溶媒が完全乾燥する前に
樹脂被膜を良溶媒より高沸点の貧溶媒中にさらし、その
後樹脂被膜を乾燥させることによって良溶媒、貧溶媒の
順で気化させて非球形でかつ連続した多数の微細空孔を
有する樹脂被膜が基体上に形成された光散乱材を得るよ
うに構成した。
In order to achieve the above object, in the method for producing a light-scattering material of the present invention, a resin solution dissolved in a good solvent is applied or printed on a substrate to form a resin film. Before the good solvent in the resin film is completely dried, the resin film is exposed to a poor solvent having a boiling point higher than that of the good solvent, and then the resin film is dried to vaporize the good solvent and the poor solvent in this order. The light-scattering material was formed so that a resin coating having a spherical shape and a large number of continuous fine pores was formed on the substrate.

【0014】また、本発明の光散乱材の製造方法は、良
溶媒に溶解した樹脂液を基体上に塗布または印刷して樹
脂被膜を形成し、樹脂被膜中の良溶媒が完全乾燥する前
に樹脂被膜を良溶媒と同等または良溶媒より低沸点でか
つ良溶媒に対して過剰な貧溶媒中にさらし、その後樹脂
被膜を乾燥させることによって貧溶媒を気化させて非球
形でかつ連続した多数の微細空孔を有する樹脂被膜が基
体上に形成された光散乱材を得るように構成した。
Further, in the method for producing a light-scattering material of the present invention, a resin liquid dissolved in a good solvent is applied or printed on a substrate to form a resin film, and before the good solvent in the resin film is completely dried. The resin coating is exposed to a poor solvent which has a boiling point equal to or lower than that of the good solvent and is excessive with respect to the good solvent, and then the resin coating is dried to vaporize the poor solvent to form a large number of non-spherical and continuous particles. A resin coating having fine pores was formed on the substrate so as to obtain a light scattering material.

【0015】また、本発明の光散乱材の製造方法は、良
溶媒と良溶媒より高沸点の貧溶媒とからなる混合溶液中
に溶解した樹脂液を基体上に塗布または印刷して樹脂被
膜を形成し、この樹脂被膜を乾燥させることによって良
溶媒、貧溶媒の順で気化させて非球形でかつ連続した多
数の微細空孔を有する樹脂被膜が基体上に形成された光
散乱材を得るように構成した。
Further, in the method for producing a light-scattering material of the present invention, a resin liquid dissolved in a mixed solution of a good solvent and a poor solvent having a boiling point higher than that of the good solvent is applied or printed on a substrate to form a resin film. By forming and drying this resin film, a good solvent and a poor solvent are vaporized in this order to obtain a light-scattering material with a non-spherical and continuous resin film having a large number of fine pores formed on the substrate. Configured to.

【0016】以下、本発明を図を用いてさらに詳しく説
明する。
The present invention will be described in more detail below with reference to the drawings.

【0017】図1〜図11は本発明に係る光散乱材の製
造方法の一実施例を示す模式図、図12〜14は本発明
に係る光散乱材を用いた面光源装置を示す断面図であ
る。1は樹脂被膜、2は樹脂、3は良溶媒、4は貧溶
媒、5は凝集樹脂相、6は貧溶媒相、7は空隙、8は微
細空孔を有する樹脂被膜、9は導光板、10は線光源、
11は光散乱層、121,122,123は光散乱材、
13は光透過性層、14は支持体をそれぞれ示す。
1 to 11 are schematic views showing an embodiment of the method for manufacturing a light scattering material according to the present invention, and FIGS. 12 to 14 are sectional views showing a surface light source device using the light scattering material according to the present invention. Is. 1 is a resin film, 2 is a resin, 3 is a good solvent, 4 is a poor solvent, 5 is an agglomerated resin phase, 6 is a poor solvent phase, 7 is a void, 8 is a resin film having fine pores, 9 is a light guide plate, 10 is a line light source,
11 is a light scattering layer, 121, 122 and 123 are light scattering materials,
13 is a light transmissive layer, and 14 is a support.

【0018】本発明は、次のようにして、非球形でかつ
連続した多数の微細空孔を有する樹脂被膜8が基体上に
形成された光散乱材121,122,123を得る。
According to the present invention, the light-scattering materials 121, 122, 123 having the resin coating 8 which is non-spherical and has a large number of continuous fine pores formed on the substrate are obtained as follows.

【0019】<方法1>基体は、導光板9である場合
(図12参照)と導光板9に積層する支持体14である
場合(図13および図14参照)とがある。
<Method 1> The substrate may be the light guide plate 9 (see FIG. 12) or the support 14 laminated on the light guide plate 9 (see FIGS. 13 and 14).

【0020】線光源10からの距離に応じて面積率の変
化するグラデーションパターンの光散乱層11を導光板
9裏面に直接形成して光散乱材121とした場合には、
導光板9が基体となる(図12参照)。導光板9の材質
としては、アクリル、ポリカーボネート、ポリ塩化ビニ
ルなどの樹脂、あるいはガラスなどを使用する。
When the light-scattering layer 11 having a gradation pattern whose area ratio changes according to the distance from the linear light source 10 is directly formed on the back surface of the light guide plate 9 to form the light-scattering material 121,
The light guide plate 9 serves as a base (see FIG. 12). As the material of the light guide plate 9, resin such as acrylic, polycarbonate, polyvinyl chloride, or glass is used.

【0021】また、線光源10からの距離に応じて面積
率の変化するグラデーションパターンの光透過性層13
を導光板9裏面に形成し、光散乱層11を全面塗布形成
した支持体14を導光板9を光散乱材122として透過
性層13を有する面に積層した場合(図13参照)、あ
るいは光散乱層11を全面塗布形成した支持体14を光
散乱材123として導光板9の表側に積層した場合(図
14参照)には、支持体14が基体となる。支持体14
は、フィルムや樹脂薄板からなり、これらの材質として
は、アクリル、ポリエチレンテレフタレートなどの樹脂
を使用する。
The light-transmitting layer 13 having a gradation pattern whose area ratio changes according to the distance from the linear light source 10.
Is formed on the back surface of the light guide plate 9 and the support 14 having the light scattering layer 11 applied to the entire surface is laminated on the surface having the transparent layer 13 using the light guide plate 9 as the light scattering material 122 (see FIG. 13), or When the support 14 on which the scattering layer 11 is coated and formed is laminated on the front side of the light guide plate 9 as the light scattering material 123 (see FIG. 14), the support 14 serves as a base. Support 14
Is made of a film or a resin thin plate, and a resin such as acrylic or polyethylene terephthalate is used as the material thereof.

【0022】まず、これらの基体上に、樹脂2を良溶媒
3に溶解した樹脂液を塗布または印刷する(図1参
照)。良溶媒3とは溶質を溶かす能力の大きい溶媒のこ
とをいう。これに反し溶質を溶かす能力の小さい溶媒を
貧溶媒4という。良溶媒3としては、たとえばポリスチ
レン樹脂に対しては、ベンゼン、トルエン、キシレンな
どの芳香族炭化水素、酢酸エチル、酢酸ブチルなどのエ
ステル、アセトン、メチルエチルケトン、シクロヘキサ
ノンなどのケトン、四塩化炭素、ジクロロエタンなどの
ハロゲン化炭化水素のほか、テトラヒドロフラン、シク
ロヘキサンなどが使用される。また、アクリル樹脂に対
しては、ベンゼン、トルエン、キシレンなどの芳香族炭
化水素、酢酸エチル、酢酸ブチルなどのエステル、アセ
トン、メチルエチルケトン、シクロヘキサノンなどのケ
トン、四塩化炭素、ジクロロエタンなどのハロゲン化炭
化水素のほか、クロロホルムなどが使用される。もちろ
ん、上記ポリスチレン樹脂やアクリル樹脂以外の樹脂2
に対しても良溶媒3が適宜選択される。塗布および印刷
の方法は、必要膜厚やパターン精度の度合いによって適
当な方法を選べばよく、たとえば、バーコート、ロール
コート、ディップコートなどの塗布法、スクリーン、グ
ラビア、オフセットなどの印刷法が使用できる。
First, a resin solution obtained by dissolving the resin 2 in the good solvent 3 is applied or printed on these substrates (see FIG. 1). The good solvent 3 refers to a solvent having a large ability to dissolve a solute. On the contrary, a solvent having a small ability to dissolve a solute is referred to as a poor solvent 4. Examples of the good solvent 3 are aromatic hydrocarbons such as benzene, toluene and xylene, esters such as ethyl acetate and butyl acetate, acetone, methyl ethyl ketone, ketones such as cyclohexanone, carbon tetrachloride and dichloroethane for polystyrene resin. In addition to the halogenated hydrocarbons, tetrahydrofuran, cyclohexane, etc. are used. For acrylic resins, aromatic hydrocarbons such as benzene, toluene, xylene, esters such as ethyl acetate and butyl acetate, ketones such as acetone, methyl ethyl ketone, cyclohexanone, carbon tetrachloride, halogenated hydrocarbons such as dichloroethane. Besides, chloroform is used. Of course, resin 2 other than the polystyrene resin and acrylic resin described above
Also, the good solvent 3 is appropriately selected. Appropriate coating and printing methods may be selected depending on the required film thickness and degree of pattern accuracy. For example, coating methods such as bar coating, roll coating and dip coating, and printing methods such as screen, gravure and offset are used. it can.

【0023】次に、樹脂被膜1中の良溶媒3が完全乾燥
する前に、樹脂被膜1を良溶媒3より高沸点の貧溶媒4
中にさらす。貧溶媒4としては、たとえばポリスチレン
樹脂に対しては、メタノール、n-ブタノール、n-オクタ
ノール、エチレングリコール、ジアセトンアルコール、
メトキシエタノールなどのアルコールなどが使用され
る。また、アクリル樹脂に対しては、ジアセトンアルコ
ール、メトキシエタノールなどを一部除くアルコールな
どが使用される。また、ポリスチレン樹脂やアクリル樹
脂以外の樹脂2に対しても貧溶媒4が適宜選択される。
なお、良溶媒3と貧溶媒4の沸点の高低は相対的なもの
であり、たとえばアクリル樹脂に対する良溶媒3と貧溶
媒4は、ジエチルベンゼンとそれより高沸点のn-オクタ
ノールの組み合わせなどが使用される。また、ポリスチ
レン樹脂に対する良溶媒3と貧溶媒4は、キシレンとそ
れより高沸点のn-ヘキサノールの組み合わせ、あるいは
テトラヒドロフランとそれより高沸点のn-ブタノールの
組み合わせなどが使用される。樹脂被膜1を良溶媒3よ
り高沸点の貧溶媒4中にさらす方法は、たとえば、貧溶
媒4を入れた液槽に樹脂被膜1の形成された基体を浸け
たり、樹脂被膜1表面にシャワーやスプレーなどで貧溶
媒4を浴びせる方法を使用する。このとき、樹脂被膜1
中より良溶媒3が徐々に溶け出し、逆に樹脂被膜1中に
良溶媒3に比べて高沸点の貧溶媒4が徐々に浸透して
(図2参照)、樹脂被膜1は樹脂2と良溶媒3と良溶媒
3より高沸点の貧溶媒4とからなる層へと変化する(図
3参照)。
Next, before the good solvent 3 in the resin coating film 1 is completely dried, the resin coating film 1 is subjected to a poor solvent 4 having a boiling point higher than that of the good solvent 3.
Expose inside. Examples of the poor solvent 4 include methanol, n-butanol, n-octanol, ethylene glycol, diacetone alcohol, and polystyrene resin.
Alcohol such as methoxyethanol is used. For the acrylic resin, diacetone alcohol, alcohol excluding methoxyethanol and the like are used. Further, the poor solvent 4 is appropriately selected for the resin 2 other than the polystyrene resin and the acrylic resin.
The boiling points of the good solvent 3 and the poor solvent 4 are relative to each other. For example, the good solvent 3 and the poor solvent 4 for the acrylic resin may be a combination of diethylbenzene and n-octanol having a higher boiling point. It As the good solvent 3 and the poor solvent 4 for the polystyrene resin, a combination of xylene and n-hexanol having a higher boiling point or a combination of tetrahydrofuran and n-butanol having a higher boiling point is used. The method of exposing the resin coating film 1 to the poor solvent 4 having a boiling point higher than that of the good solvent 3 may be, for example, immersing the substrate on which the resin coating film 1 is formed in a liquid tank containing the poor solvent 4, or showering the surface of the resin coating film 1. A method of exposing the poor solvent 4 to spraying is used. At this time, the resin coating 1
The good solvent 3 gradually dissolves out from the inside, and conversely, the poor solvent 4 having a higher boiling point than the good solvent 3 gradually penetrates into the resin coating 1 (see FIG. 2), and the resin coating 1 is good with the resin 2. The layer changes to a layer composed of the solvent 3 and the poor solvent 4 having a higher boiling point than the good solvent 3 (see FIG. 3).

【0024】次に、樹脂被膜1を乾燥させることによっ
て、まず良溶媒3を気化させる(図4参照)。良溶媒3
を気化させると、樹脂被膜1中の樹脂2が良溶媒3より
高沸点の貧溶媒4に溶解しきれなくなって凝集して析出
し、凝集樹脂相5と貧溶媒相6とに二相分離を起こす
(図5参照)。
Next, the resin film 1 is dried to first vaporize the good solvent 3 (see FIG. 4). Good solvent 3
When the resin is vaporized, the resin 2 in the resin coating film 1 cannot be completely dissolved in the poor solvent 4 having a boiling point higher than that of the good solvent 3 and agglomerates and precipitates, so that the agglomerated resin phase 5 and the poor solvent phase 6 are separated into two phases. Raise (see Figure 5).

【0025】さらに乾燥して良溶媒3より高沸点の貧溶
媒4を気化させると(図6参照)、良溶媒3より高沸点
の貧溶媒4が飛び去った後に空隙7が残り、非球形でか
つ連続した多数の微細空孔を有する樹脂被膜8となる
(図7参照)。
When it is further dried to vaporize the poor solvent 4 having a higher boiling point than the good solvent 3 (see FIG. 6), the poor solvent 4 having a higher boiling point than the good solvent 3 is left behind, and the voids 7 remain, thus forming a non-spherical shape. Further, the resin coating film 8 has a large number of continuous fine pores (see FIG. 7).

【0026】また、光散乱材を得る別の方法として、次
の方法2、方法3がある。
As another method for obtaining the light scattering material, there are the following methods 2 and 3.

【0027】<方法2>まず、方法1と同様に基体上に
良溶媒3に樹脂2を溶解した樹脂液を塗布または印刷す
る(図8参照)。
<Method 2> First, in the same manner as in Method 1, a resin solution in which the resin 2 is dissolved in the good solvent 3 is applied or printed on the substrate (see FIG. 8).

【0028】次に、樹脂被膜1中の良溶媒3が完全乾燥
する前に、樹脂被膜1を良溶媒3と同等または良溶媒3
より低沸点でかつ良溶媒3に対して過剰な貧溶媒4中に
さらす。なお、良溶媒3に対して過剰な量の貧溶媒4を
必要とする理由は、貧溶媒4の沸点が良溶媒3に比べて
同等か低い場合、樹脂被膜1中の良溶媒3を貧溶媒4と
十分に置換しておかないと、乾燥時に貧溶媒4が良溶媒
3より先に気化してしまい、良溶媒3のみが樹脂被膜1
中に残って微細空孔を有する樹脂層8が形成できないか
らである。良溶媒3と同等または良溶媒3より低沸点で
かつ良溶媒3に対して過剰な貧溶媒4中にさらす方法
は、たとえば、過剰量の貧溶媒4を入れた液槽に樹脂被
膜1の形成された基体を浸けたり、樹脂被膜1表面にシ
ャワーやスプレーなどで過剰量の貧溶媒4を浴びせる方
法を使用する。このとき、樹脂被膜1中より良溶媒3が
徐々に溶け出し、逆に良溶媒3と同等かまたは良溶媒3
より低沸点の貧溶媒4が徐々に樹脂被膜1中に浸透して
(図9参照)、最終的に樹脂被膜1は樹脂2と貧溶媒4
とからなる層へと変化する。その結果、樹脂被膜1中の
樹脂2は貧溶媒4に溶解しきれなくなって凝集して析出
し、凝集樹脂相5と貧溶媒相6とに二相分離を起こす
(図10参照)。
Next, before the good solvent 3 in the resin coating 1 is completely dried, the resin coating 1 is equal to or better than the good solvent 3.
It is exposed to the poor solvent 4 having a lower boiling point and an excess of the good solvent 3. The reason why the excess amount of the poor solvent 4 is required with respect to the good solvent 3 is that when the boiling point of the poor solvent 4 is equal to or lower than that of the good solvent 3, the good solvent 3 in the resin film 1 is replaced with the poor solvent 3. If not sufficiently replaced with 4, the poor solvent 4 will be vaporized before the good solvent 3 during drying, and only the good solvent 3 will be the resin coating 1.
This is because the resin layer 8 having fine pores remaining therein cannot be formed. The method of exposing to the poor solvent 4 which is equivalent to the good solvent 3 or has a lower boiling point than the good solvent 3 and an excess amount with respect to the good solvent 3 is, for example, the formation of the resin film 1 in a liquid tank containing an excess amount of the poor solvent 4. A method is used in which the formed substrate is dipped, or the surface of the resin film 1 is showered or sprayed with an excess amount of the poor solvent 4. At this time, the good solvent 3 gradually dissolves out of the resin coating 1, and on the contrary, is equal to or better than the good solvent 3.
The poor boiling solvent 4 having a lower boiling point gradually permeates into the resin coating film 1 (see FIG. 9), and finally the resin coating film 1 forms the resin 2 and the poor solvent 4.
It changes into a layer consisting of and. As a result, the resin 2 in the resin coating film 1 cannot be completely dissolved in the poor solvent 4 and aggregates and precipitates, causing two-phase separation between the aggregated resin phase 5 and the poor solvent phase 6 (see FIG. 10).

【0029】最後に、樹脂被膜1を乾燥して貧溶媒4を
気化させると(図11参照)、貧溶媒4が飛び去った後
に空隙7が残り、非球形でかつ連続した多数の微細空孔
を有する樹脂被膜8となる(図7参照)。
Finally, when the resin coating film 1 is dried to vaporize the poor solvent 4 (see FIG. 11), after the poor solvent 4 flies away, voids 7 remain, and a large number of non-spherical and continuous fine holes are formed. (See FIG. 7).

【0030】<方法3>まず、良溶媒3と良溶媒3より
高沸点の貧溶媒4とからなる混合溶液中に樹脂2を溶解
した樹脂液を基体上に塗布または印刷する(図3参
照)。良溶媒3および良溶媒3より高沸点の貧溶媒4と
しては、方法1と同様のものを用いることができる。
<Method 3> First, a resin solution in which a resin 2 is dissolved in a mixed solution of a good solvent 3 and a poor solvent 4 having a boiling point higher than that of the good solvent 3 is applied or printed on a substrate (see FIG. 3). . As the good solvent 3 and the poor solvent 4 having a boiling point higher than that of the good solvent 3, the same one as in Method 1 can be used.

【0031】次に、方法1と同様に樹脂被膜1を乾燥さ
せることによって、まず良溶媒3を気化させ(図4参
照)、樹脂被膜1に凝集樹脂相5と貧溶媒相6の二相分
離を起こさせる(図5参照)。
Next, by drying the resin film 1 in the same manner as in Method 1, first the good solvent 3 is vaporized (see FIG. 4), and the resin film 1 is separated into two phases, an agglomerated resin phase 5 and a poor solvent phase 6. (See FIG. 5).

【0032】さらに乾燥して貧溶媒4を気化させる(図
6参照)と、貧溶媒4が飛び去った後に空隙7が残り、
非球形でかつ連続した多数の微細空孔を有する樹脂被膜
8となる(図7参照)。
When the poor solvent 4 is vaporized by further drying (see FIG. 6), the voids 7 remain after the poor solvent 4 flies away,
The resin coating 8 is non-spherical and has a large number of continuous fine pores (see FIG. 7).

【0033】なお、方法1〜3によって製造された光散
乱材は、樹脂2、良溶媒3、貧溶媒4の組み合わせや混
合比率、塗布膜厚、乾燥温度などの条件設定によって微
細空孔の平均径、形状および密度を調節し、光散乱や光
透過の条件設定を行なうことができる。
The light-scattering materials produced by the methods 1 to 3 have an average of fine pores depending on the combination of the resin 2, the good solvent 3 and the poor solvent 4, the mixing ratio, the coating film thickness, and the drying temperature. The diameter, shape and density can be adjusted to set the conditions for light scattering and light transmission.

【0034】[0034]

【実施例】以下、本発明の光散乱材の製造方法について
実施例を示す。
EXAMPLES Examples of the method for producing the light-scattering material of the present invention will be shown below.

【0035】実施例1 厚さ1mmの透明アクリル樹脂板からなる基体上に、樹脂
と良溶媒とからなる下記の組成の樹脂液をバーコーター
で塗布した。 アクリル樹脂(三菱レイヨン株式会社製、BR−85) 20重量部 シクロヘキサノン(良溶媒) 80重量部
Example 1 A resin liquid having the following composition consisting of a resin and a good solvent was coated on a substrate made of a transparent acrylic resin plate having a thickness of 1 mm with a bar coater. Acrylic resin (Mitsubishi Rayon Co., Ltd., BR-85) 20 parts by weight Cyclohexanone (good solvent) 80 parts by weight

【0036】コーティング後直ちに樹脂被膜の形成され
た基体を良溶媒より高沸点のn-オクタノール(貧溶媒)
中に浸漬してシクロヘキサノン(良溶媒)とn-オクタノ
ール(貧溶媒)とを一部入れ換え、樹脂被膜を樹脂と良
溶媒と良溶媒より高沸点の貧溶媒とからなる層とした。
その後、50℃、30分間オーブン中で乾燥させることによ
って、シクロヘキサノン(良溶媒)、n-オクタノール
(貧溶媒)の順で気化させて光散乱材を得た。
Immediately after coating, the substrate on which the resin film is formed is treated with n-octanol (poor solvent) having a boiling point higher than that of a good solvent.
It was immersed in the solution, and cyclohexanone (good solvent) and n-octanol (poor solvent) were partially replaced, and the resin coating was formed into a layer composed of the resin, the good solvent, and the poor solvent having a boiling point higher than that of the good solvent.
Then, by drying in an oven at 50 ° C. for 30 minutes, cyclohexanone (good solvent) and n-octanol (poor solvent) were vaporized in this order to obtain a light scattering material.

【0037】乾燥により基体上に形成された微細空孔を
有する樹脂被膜は白色不透明であり、膜厚は25μmであ
った。顕微鏡で樹脂被膜を観察したところ、平均径が0.
4μmの微細空孔が密に存在していた。
The resin film having fine pores formed on the substrate by drying was white and opaque, and the film thickness was 25 μm. When observing the resin coating with a microscope, the average diameter was 0.
There were dense 4 μm pores.

【0038】このようにして得られた光散乱材を、導光
板裏面に設けられたグラデーションパターンを有する光
透過性層上に積層して光散乱反射部を形成したところ、
光散乱率が高いので導光板の出射面での輝度が向上し
た。
The light-scattering material thus obtained was laminated on the light-transmitting layer having a gradation pattern provided on the back surface of the light guide plate to form the light-scattering / reflecting portion.
Since the light scattering rate is high, the brightness at the exit surface of the light guide plate is improved.

【0039】実施例2 厚さ1mmの透明アクリル樹脂板からなる基体上に、樹脂
と良溶媒とからなる下記の組成の樹脂液を200線のスク
リーン印刷により、ピッチが1.5mmの円形のドットグラ
デーションパターンに印刷した。 ポリスチレン樹脂(重合度約1400) 25重量部 酢酸ブチル(良溶媒) 75重量部
Example 2 On a substrate made of a transparent acrylic resin plate having a thickness of 1 mm, a resin liquid having the following composition consisting of a resin and a good solvent was screen printed with 200 lines to form circular dot gradations having a pitch of 1.5 mm. Printed on a pattern. Polystyrene resin (degree of polymerization about 1400) 25 parts by weight Butyl acetate (good solvent) 75 parts by weight

【0040】印刷後2分間室温でレベリングした後、樹
脂被膜の形成された基体を良溶媒より高沸点のエチレン
グリコールモノアセテート(貧溶媒)中に浸漬して酢酸
ブチル(良溶媒)とエチレングリコールモノアセテート
(貧溶媒)とを一部入れ換え、樹脂被膜を樹脂と良溶媒
と良溶媒より高沸点の貧溶媒とからなる層とした。その
後、50℃、30分間オーブン中で乾燥させることによって
酢酸ブチル(良溶媒)、エチレングリコールモノアセテ
ート(貧溶媒)の順で気化させて光散乱材を得た。
After leveling at room temperature for 2 minutes after printing, the substrate with the resin coating formed thereon is dipped in ethylene glycol monoacetate (poor solvent) having a boiling point higher than that of a good solvent to obtain butyl acetate (good solvent) and ethylene glycol monoacetate. Acetate (poor solvent) was partially replaced, and the resin coating was formed into a layer composed of a resin, a good solvent, and a poor solvent having a boiling point higher than that of the good solvent. Then, by drying in an oven at 50 ° C. for 30 minutes, butyl acetate (good solvent) and ethylene glycol monoacetate (poor solvent) were vaporized in this order to obtain a light scattering material.

【0041】乾燥により基体上にグラデーションパター
ンで形成された微細空孔を有する樹脂被膜は白色不透明
であり、膜厚は20μmであった。顕微鏡で樹脂被膜を観
察したところ、平均径が0.7μmの微細空孔が密に存在
していた。
The resin film having fine pores formed in a gradation pattern on the substrate by drying was white and opaque and had a film thickness of 20 μm. When the resin coating film was observed with a microscope, fine pores having an average diameter of 0.7 μm were densely present.

【0042】このようにして得られた光散乱材を、導光
板として用いたところ、光散乱率が高いので導光板の出
射面での輝度が向上した。
When the light-scattering material thus obtained was used as a light guide plate, the light-scattering rate was high, so that the brightness at the exit surface of the light-guide plate was improved.

【0043】実施例3 厚さ1mmの透明アクリル樹脂板からなる基体上に、樹脂
と良溶媒とからなる下記の組成の樹脂液をバーコーター
で塗布した。 アクリル樹脂(三菱レイヨン株式会社製、BR−85) 9重量部 酢酸エチル(良溶媒) 91重量部
Example 3 A resin liquid having the following composition consisting of a resin and a good solvent was applied by a bar coater onto a substrate made of a transparent acrylic resin plate having a thickness of 1 mm. Acrylic resin (Mitsubishi Rayon Co., Ltd., BR-85) 9 parts by weight Ethyl acetate (good solvent) 91 parts by weight

【0044】コーティング後直ちに樹脂被膜の形成され
た基体を良溶媒より高沸点のn-ペンタノール(貧溶媒)
中に浸漬して 酢酸エチル(良溶媒)とn-ペンタノール
(貧溶媒)とを一部入れ換え、樹脂被膜を樹脂と良溶媒
と良溶媒より高沸点の貧溶媒とからなる層とした。その
後、50℃、30分間オーブン中で乾燥させることによって
酢酸エチル(良溶媒)、n-ペンタノール(貧溶媒)の順
で気化させて光散乱材を得た。
Immediately after coating, the substrate on which the resin film is formed is treated with n-pentanol (poor solvent) having a boiling point higher than that of a good solvent.
It was immersed in the solution and ethyl acetate (good solvent) and n-pentanol (poor solvent) were partially replaced, and the resin coating was formed into a layer composed of the resin, the good solvent, and the poor solvent having a boiling point higher than that of the good solvent. Then, by drying in an oven at 50 ° C. for 30 minutes, ethyl acetate (good solvent) and n-pentanol (poor solvent) were vaporized in this order to obtain a light scattering material.

【0045】乾燥により基体上に形成された微細空孔を
有する樹脂被膜は乳白色半透明であり、膜厚は1.8μmで
あった。顕微鏡で樹脂被膜を観察したところ、平均径が
1.5μmの微細空孔が密に存在していた。
The resin film having fine pores formed on the substrate by drying was milky white translucent and had a film thickness of 1.8 μm. When observing the resin coating with a microscope, the average diameter is
Micropores of 1.5 μm were densely present.

【0046】このようにして得られた光散乱材を、拡散
板として用いたところ、光散乱率が高いので拡散板の出
射面での輝度が均一になった。
When the light-scattering material thus obtained was used as a diffusing plate, the light-scattering rate was high, so that the brightness at the exit surface of the diffusing plate was uniform.

【0047】実施例4 厚さ1mmの透明アクリル樹脂板からなる基体上に、樹脂
と良溶媒とからなる下記の組成の樹脂液をバーコーター
で塗布した。 ポリスチレン樹脂(重合度約1400) 30重量部 トルエン(良溶媒) 70重量部
Example 4 A resin liquid having the following composition consisting of a resin and a good solvent was coated on a substrate made of a transparent acrylic resin plate having a thickness of 1 mm with a bar coater. Polystyrene resin (degree of polymerization about 1400) 30 parts by weight Toluene (good solvent) 70 parts by weight

【0048】コーティング後直ちに樹脂被膜の形成され
た基体を良溶媒より低沸点でかつ良溶媒に対して過剰な
n-プロパノール(貧溶媒)中に5分間浸漬してトルエン
とn-プロパノール(貧溶媒)とを十分に入れ換え、その
後50℃、30分間オーブン中で乾燥してn-プロパノール
(貧溶媒)を気化させて光散乱材を得た。
Immediately after coating, the substrate on which the resin film is formed has a boiling point lower than that of the good solvent and is excessive with respect to the good solvent.
Immerse in n-propanol (poor solvent) for 5 minutes to sufficiently replace toluene with n-propanol (poor solvent), then dry in an oven at 50 ° C for 30 minutes to vaporize n-propanol (poor solvent). Then, a light scattering material was obtained.

【0049】乾燥により基体上に形成された微細空孔を
有する樹脂被膜は白色不透明であり、膜厚は30μmであ
った。顕微鏡で樹脂被膜を観察したところ、平均径が0.
5μmの微細空孔が密に存在していた。
The resin film having fine pores formed on the substrate by drying was white and opaque and had a film thickness of 30 μm. When observing the resin coating with a microscope, the average diameter was 0.
There were dense 5 μm pores.

【0050】このようにして得られた光散乱材を、導光
板裏面に設けられたグラデーションパターンを有する光
透過性層上に積層したところ、光散乱率が高いので導光
板の出射面での輝度が向上した。
When the light-scattering material thus obtained is laminated on the light-transmitting layer having a gradation pattern provided on the back surface of the light guide plate, the light scattering rate is high, so that the brightness on the exit surface of the light guide plate is high. Has improved.

【0051】実施例5 厚さ1mmの透明アクリル樹脂板からなる基体上に、樹脂
と良溶媒とからなる下記の組成の樹脂液を200線のスク
リーン印刷により、ピッチが1.5mmの円形のドットグラ
デーションパターンに印刷した。 アクリル樹脂(三菱レイヨン株式会社製、BR−85) 20重量部 ジアセトンアルコール(良溶媒) 80重量部
Example 5 On a substrate made of a transparent acrylic resin plate having a thickness of 1 mm, a resin liquid having the following composition consisting of a resin and a good solvent was screen printed with 200 lines to form circular dot gradations having a pitch of 1.5 mm. Printed on a pattern. Acrylic resin (Mitsubishi Rayon Co., Ltd., BR-85) 20 parts by weight Diacetone alcohol (good solvent) 80 parts by weight

【0052】印刷後2分間室温でレベリングした後、樹
脂被膜の形成された基体を良溶媒より低沸点でかつ良溶
媒に対して過剰なn-ヘキサノール(貧溶媒)中に30秒間
浸漬してジアセトンアルコール(良溶媒)とn-ヘキサノ
ール(貧溶媒)とを十分に入れ換え、その後50℃、30分
間オーブン中で乾燥してn-ヘキサノール(貧溶媒)を気
化させて光散乱材を得た。
After leveling at room temperature for 2 minutes after printing, the substrate on which the resin coating is formed is dipped in n-hexanol (poor solvent) having a boiling point lower than that of the good solvent and an excess amount relative to the good solvent for 30 seconds. Acetone alcohol (good solvent) and n-hexanol (poor solvent) were sufficiently exchanged, and then dried in an oven at 50 ° C for 30 minutes to vaporize n-hexanol (poor solvent) to obtain a light scattering material.

【0053】乾燥により基体上にグラデーションパター
ンで形成された微細空孔を有する樹脂被膜は白色不透明
であり、膜厚は15μmであった。顕微鏡で樹脂被膜を観
察したところ、平均径が0.3μmの微細空孔が密に存在
していた。
The resin film having fine pores formed in a gradation pattern on the substrate by drying was white and opaque and had a film thickness of 15 μm. When the resin coating film was observed with a microscope, fine pores having an average diameter of 0.3 μm were densely present.

【0054】このようにして得られた光散乱材を、導光
板として用いたところ、光散乱率が高いので導光板の出
射面での輝度が向上した。
When the light-scattering material thus obtained was used as a light guide plate, the light-scattering rate was high, so that the brightness at the exit surface of the light-guide plate was improved.

【0055】実施例6 厚さ1mmの透明アクリル樹脂板からなる基体上に、樹脂
と良溶媒とからなる下記の組成の樹脂液をバーコーター
で塗布した。 アクリル樹脂(三菱レイヨン株式会社製、BR85) 7重量部 酢酸ブチル(良溶媒) 93重量部
Example 6 A resin liquid having the following composition consisting of a resin and a good solvent was applied on a substrate made of a transparent acrylic resin plate having a thickness of 1 mm by a bar coater. Acrylic resin (Mitsubishi Rayon Co., Ltd., BR85) 7 parts by weight Butyl acetate (good solvent) 93 parts by weight

【0056】コーティング後直ちに樹脂被膜の形成され
た基体を良溶媒より低沸点でかつ良溶媒に対して過剰な
n-ブタノール(貧溶媒)中に20秒間浸漬して酢酸ブチル
(良溶媒)とn-ブタノール(貧溶媒)とを十分に入れ換
え、その後50℃、30分間オーブン中で乾燥してn-ブタノ
ール(貧溶媒)を気化させて光散乱材を得た。
Immediately after coating, the substrate on which the resin film is formed has a boiling point lower than that of the good solvent and is excessive with respect to the good solvent.
Immerse in n-butanol (poor solvent) for 20 seconds to sufficiently replace butyl acetate (good solvent) with n-butanol (poor solvent), then dry in an oven at 50 ° C for 30 minutes to dry n-butanol (poor solvent). The poor solvent) was vaporized to obtain a light scattering material.

【0057】乾燥により基体上に形成された微細空孔を
有する樹脂被膜は乳白色半透明であり、膜厚は1.5μmで
あった。顕微鏡で樹脂被膜を観察したところ、平均径が
1μmの微細空孔が密に存在していた。
The resin coating having fine pores formed on the substrate by drying was milky white translucent and had a thickness of 1.5 μm. When the resin coating film was observed with a microscope, fine pores having an average diameter of 1 μm were densely present.

【0058】このようにして得られた光散乱材を、拡散
板として用いたところ、光散乱率が高いので拡散板の出
射面での輝度が均一になった。
When the light-scattering material thus obtained was used as a diffusing plate, the light-scattering rate was high, and the brightness on the exit surface of the diffusing plate was uniform.

【0059】実施例7 厚さ1mmの透明アクリル樹脂板からなる基体上に、樹脂
と良溶媒と良溶媒より高沸点の貧溶媒とからなる下記の
組成の樹脂液をバーコーターで塗布した。 ポリスチレン樹脂(重合度約1400) 20重量部 キシレン(良溶媒) 50重量部 n-ヘキサノール(貧溶媒) 30重量部
Example 7 A resin liquid of the following composition comprising a resin, a good solvent, and a poor solvent having a boiling point higher than that of the good solvent was coated on a substrate made of a transparent acrylic resin plate having a thickness of 1 mm by a bar coater. Polystyrene resin (degree of polymerization about 1400) 20 parts by weight xylene (good solvent) 50 parts by weight n-hexanol (poor solvent) 30 parts by weight

【0060】樹脂液を塗布した後、50℃、30分間オーブ
ン中で乾燥させることによってキシレン(良溶媒)、n-
ヘキサノール(貧溶媒)の順で気化させて光散乱材を得
た。
After applying the resin solution, it is dried in an oven at 50 ° C. for 30 minutes to obtain xylene (good solvent), n-
Hexanol (poor solvent) was vaporized in this order to obtain a light scattering material.

【0061】乾燥により基体上に形成された微細空孔を
有する樹脂被膜は白色不透明であり、膜厚は30μmであ
った。顕微鏡で樹脂被膜を観察したところ、平均径が0.
5μmの微細空孔が密に存在していた。
The resin film having fine pores formed on the substrate by drying was white and opaque, and the film thickness was 30 μm. When observing the resin coating with a microscope, the average diameter was 0.
There were dense 5 μm pores.

【0062】このようにして得られた光散乱材を、導光
板裏面に設けられたグラデーションパターン有する光透
過性層上に積層したところ、光散乱率が高いので導光板
の出射面での輝度が向上した。
When the light-scattering material thus obtained was laminated on the light-transmitting layer having a gradation pattern provided on the back surface of the light guide plate, the light-scattering rate was high, so that the brightness at the exit surface of the light-guide plate was high. Improved.

【0063】実施例8 厚さ1mmの透明アクリル樹脂板からなる基体上に、樹脂
と良溶媒と良溶媒より高沸点の貧溶媒とからなる下記の
組成の樹脂液を200線のスクリーン印刷により、ピッチ
が1.5mmの円形のドットグラデーションパターンに印刷
した。 アクリル樹脂(三菱レイヨン株式会社製、BR85) 20重量部 ジエチルベンゼン(良溶媒) 60重量部 n-オクタノール(貧溶媒) 20重量部
Example 8 A resin solution of the following composition comprising a resin, a good solvent, and a poor solvent having a boiling point higher than that of a good solvent was screen-printed with 200 lines on a substrate made of a transparent acrylic resin plate having a thickness of 1 mm. Printed on a circular dot gradation pattern with a pitch of 1.5 mm. Acrylic resin (Mitsubishi Rayon Co., Ltd., BR85) 20 parts by weight Diethylbenzene (good solvent) 60 parts by weight n-Octanol (poor solvent) 20 parts by weight

【0064】印刷後、60℃、1時間オーブン中で乾燥さ
せることによってジエチルベンゼン(良溶媒)、n-オク
タノール(貧溶媒)の順で気化させて光散乱材を得た。
After printing, by drying in an oven at 60 ° C. for 1 hour, diethylbenzene (good solvent) and n-octanol (poor solvent) were vaporized in this order to obtain a light scattering material.

【0065】乾燥により基体上にグラデーションパター
ンで形成された微細空孔を有する樹脂被膜は白色不透明
であり、膜厚は30μmであった。顕微鏡で樹脂被膜観察
したところ、平均径が0.3μmの微細空孔が密に存在して
いた。
The resin film having fine pores formed in a gradation pattern on the substrate by drying was white and opaque and had a film thickness of 30 μm. When the resin film was observed with a microscope, fine pores having an average diameter of 0.3 μm were densely present.

【0066】このようにして得られた光散乱材を、導光
板として用いたところ、光散乱率が高いので導光板の出
射面での輝度が向上した。
When the light-scattering material thus obtained was used as a light guide plate, the light-scattering rate was high, so that the brightness on the exit surface of the light-guide plate was improved.

【0067】実施例9 厚さ0.5mmの透明ポリエチレンテレフタレート樹脂から
なる基体上に、樹脂と良溶媒と良溶媒より高沸点の貧溶
媒とからなる下記の組成の樹脂液をバーコーターで塗布
した。 ポリスチレン樹脂(重合度約1400) 9重量部 テトラヒドロフラン(良溶媒) 67重量部 n-ブタノール(貧溶媒) 24重量部
Example 9 A resin solution of the following composition comprising a resin, a good solvent, and a poor solvent having a boiling point higher than that of the good solvent was coated on a substrate made of a transparent polyethylene terephthalate resin having a thickness of 0.5 mm by a bar coater. Polystyrene resin (degree of polymerization about 1400) 9 parts by weight Tetrahydrofuran (good solvent) 67 parts by weight n-Butanol (poor solvent) 24 parts by weight

【0068】印刷後、50℃、30分間オーブン中で乾燥さ
せることによってテトラヒドロフラン(良溶媒)、n-ブ
タノール(貧溶媒)の順で気化させて光散乱材を得た。
After printing, tetrahydrofuran (good solvent) and n-butanol (poor solvent) were vaporized in this order by drying in an oven at 50 ° C. for 30 minutes to obtain a light scattering material.

【0069】乾燥により形成された微細空孔を有する樹
脂被膜は乳白色半透明であり、膜厚は2.0μmであった。
顕微鏡で樹脂被膜を観察したところ、平均径が1μmの
微細空孔が密に存在していた。
The resin film having fine pores formed by drying was milky white translucent and had a film thickness of 2.0 μm.
When the resin coating film was observed with a microscope, fine pores having an average diameter of 1 μm were densely present.

【0070】このようにして得られた光散乱材を、拡散
板として用いたところ、光散乱率が高いので拡散板の出
射面での輝度が均一になった。
When the light-scattering material thus obtained was used as a diffusing plate, the light-scattering rate was high, and the brightness on the exit surface of the diffusing plate was uniform.

【0071】[0071]

【発明の効果】本発明の光散乱材の製造方法は、非球形
で連続した多数の微細空孔を有する樹脂層を基体上に形
成することのできるものである。
According to the method for producing a light-scattering material of the present invention, a resin layer having a large number of non-spherical and continuous fine pores can be formed on a substrate.

【0072】したがって、樹脂層中の樹脂と微細空孔と
の間の光散乱界面の面積が大きいので、光散乱率の高い
光散乱材が得られる。
Therefore, since the area of the light-scattering interface between the resin and the fine pores in the resin layer is large, a light-scattering material having a high light-scattering rate can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 1 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図2】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 2 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図3】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 3 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図4】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 4 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図5】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 5 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図6】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 6 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図7】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 7 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図8】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 8 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図9】本発明に係る光散乱材の製造方法の一実施例を
示す模式図である。
FIG. 9 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図10】本発明に係る光散乱材の製造方法の一実施例
を示す模式図である。
FIG. 10 is a schematic view showing an example of the method for manufacturing a light-scattering material according to the present invention.

【図11】本発明に係る光散乱材の製造方法の一実施例
を示す模式図である。
FIG. 11 is a schematic view showing an example of a method for manufacturing a light-scattering material according to the present invention.

【図12】本発明に係る光散乱材を用いた面光源装置を
示す断面図である。
FIG. 12 is a sectional view showing a surface light source device using a light scattering material according to the present invention.

【図13】本発明に係る光散乱材を用いた面光源装置を
示す断面図である。
FIG. 13 is a sectional view showing a surface light source device using a light scattering material according to the present invention.

【図14】本発明に係る光散乱材を用いた面光源装置を
示す断面図である。
FIG. 14 is a sectional view showing a surface light source device using a light scattering material according to the present invention.

【符号の説明】[Explanation of symbols]

1 インキ層 2 樹脂 3 良溶媒 4 貧溶媒 5 凝集樹脂相 6 貧溶媒相 7 微細空孔 8 樹脂層 9 導光板 10 線光源 11 光散乱層 121 光散乱材 122 光散乱材 123 光散乱材 13 光透過性層 14 支持体 1 Ink Layer 2 Resin 3 Good Solvent 4 Poor Solvent 5 Aggregated Resin Phase 6 Poor Solvent Phase 7 Micropores 8 Resin Layer 9 Light Guide Plate 10 Light Source 11 Light Scattering Layer 121 Light Scattering Material 122 Light Scattering Material 123 Light Scattering Material 13 Light Permeable layer 14 support

─────────────────────────────────────────────────────
─────────────────────────────────────────────────── ───

【手続補正書】[Procedure amendment]

【提出日】平成6年9月8日[Submission date] September 8, 1994

【手続補正1】[Procedure Amendment 1]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0029[Name of item to be corrected] 0029

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0029】最後に、樹脂被膜1を乾燥して貧溶媒4を
気化させると(図11参照)、貧溶媒4が飛び去った後
に微細空孔7が残り、非球形でかつ連続した多数の微細
空孔を有する樹脂被膜8となる(図7参照)。
Finally, when the resin film 1 is dried to vaporize the poor solvent 4 (see FIG. 11), fine holes 7 remain after the poor solvent 4 flies away, and a large number of non-spherical and continuous fine particles are formed. The resin coating 8 has pores (see FIG. 7).

【手続補正2】[Procedure Amendment 2]

【補正対象書類名】明細書[Document name to be amended] Statement

【補正対象項目名】0032[Name of item to be corrected] 0032

【補正方法】変更[Correction method] Change

【補正内容】[Correction content]

【0032】さらに乾燥して貧溶媒4を気化させる(図
6参照)と、貧溶媒4が飛び去った後に微細空孔7が残
り、非球形でかつ連続した多数の微細空孔を有する樹脂
被膜8となる(図7参照)。
When the poor solvent 4 is vaporized by further drying (see FIG. 6), fine pores 7 remain after the poor solvent 4 flies off, and the resin coating has a large number of non-spherical and continuous fine pores. 8 (see FIG. 7).

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 良溶媒に溶解した樹脂液を基体上に塗布
または印刷して樹脂被膜を形成し、樹脂被膜中の良溶媒
が完全乾燥する前に樹脂被膜を良溶媒より高沸点の貧溶
媒中にさらし、その後樹脂被膜を乾燥させることによっ
て良溶媒、貧溶媒の順で気化させて非球形でかつ連続し
た多数の微細空孔を有する樹脂被膜が基体上に形成され
た光散乱材を得ることを特徴とする光散乱材の製造方
法。
1. A resin solution dissolved in a good solvent is applied or printed on a substrate to form a resin film, and the resin film is a poor solvent having a boiling point higher than that of the good solvent before the good solvent in the resin film is completely dried. A light-scattering material in which a good solvent and a poor solvent are vaporized in that order to form a non-spherical and continuous resin film having a large number of fine pores formed on the substrate A method for producing a light-scattering material, comprising:
【請求項2】 良溶媒に溶解した樹脂液を基体上に塗布
または印刷して樹脂被膜を形成し、樹脂被膜中の良溶媒
が完全乾燥する前に樹脂被膜を良溶媒と同等または良溶
媒より低沸点でかつ良溶媒に対して過剰な貧溶媒中にさ
らし、その後樹脂被膜を乾燥させることによって貧溶媒
を気化させて非球形でかつ連続した多数の微細空孔を有
する樹脂被膜が基体上に形成された光散乱材を得ること
を特徴とする光散乱材の製造方法。
2. A resin solution dissolved in a good solvent is applied or printed on a substrate to form a resin film, and the resin film is equal to or better than the good solvent before the good solvent in the resin film is completely dried. The poor solvent is vaporized by exposing it to a poor solvent with a low boiling point and an excess amount relative to the good solvent, and then drying the resin film to form a non-spherical and continuous resin film with many fine pores on the substrate. A method for producing a light-scattering material, comprising obtaining the formed light-scattering material.
【請求項3】 良溶媒と良溶媒より高沸点の貧溶媒とか
らなる混合溶液中に溶解した樹脂液を基体上に塗布また
は印刷して樹脂被膜を形成し、この樹脂被膜を乾燥させ
ることによって良溶媒、貧溶媒の順で気化させて非球形
でかつ連続した多数の微細空孔を有する樹脂被膜が基体
上に形成された光散乱材を得ることを特徴とする光散乱
材の製造方法。
3. A resin solution dissolved in a mixed solution of a good solvent and a poor solvent having a boiling point higher than that of the good solvent is applied or printed on a substrate to form a resin film, and the resin film is dried. A method for producing a light-scattering material, which comprises vaporizing a good solvent and a poor solvent in this order to obtain a light-scattering material having a non-spherical resin film having a large number of continuous fine pores formed on a substrate.
JP5254925A 1993-09-16 1993-09-16 Production of light scattering material Withdrawn JPH0780956A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5254925A JPH0780956A (en) 1993-09-16 1993-09-16 Production of light scattering material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5254925A JPH0780956A (en) 1993-09-16 1993-09-16 Production of light scattering material

Publications (1)

Publication Number Publication Date
JPH0780956A true JPH0780956A (en) 1995-03-28

Family

ID=17271768

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5254925A Withdrawn JPH0780956A (en) 1993-09-16 1993-09-16 Production of light scattering material

Country Status (1)

Country Link
JP (1) JPH0780956A (en)

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JP2013508780A (en) * 2009-10-24 2013-03-07 スリーエム イノベイティブ プロパティズ カンパニー Diffuser having a void
JP2014202994A (en) * 2013-04-08 2014-10-27 帝人株式会社 Reflective polarizing film laminate, liquid crystal display optical member produced using the same, and liquid crystal display
CN111933824A (en) * 2020-07-06 2020-11-13 华南理工大学 Micro lens used as light extraction layer, scattering layer and preparation method thereof
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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013508780A (en) * 2009-10-24 2013-03-07 スリーエム イノベイティブ プロパティズ カンパニー Diffuser having a void
JP2015165326A (en) * 2009-10-24 2015-09-17 スリーエム イノベイティブ プロパティズ カンパニー Voided diffuser
WO2011104765A1 (en) * 2010-02-26 2011-09-01 株式会社クラレ Light-guide plate and method for manufacturing a light-guide plate
JP5436655B2 (en) * 2010-02-26 2014-03-05 株式会社クラレ Light guide plate and light guide plate manufacturing method
TWI464462B (en) * 2010-02-26 2014-12-11 Kuraray Co Light-guiding plate and method for manufacturing light-guiding plate
JP2011186056A (en) * 2010-03-05 2011-09-22 Fujifilm Corp Method of producing antiglare film
JP2014202994A (en) * 2013-04-08 2014-10-27 帝人株式会社 Reflective polarizing film laminate, liquid crystal display optical member produced using the same, and liquid crystal display
CN111933824A (en) * 2020-07-06 2020-11-13 华南理工大学 Micro lens used as light extraction layer, scattering layer and preparation method thereof
WO2023054591A1 (en) * 2021-09-30 2023-04-06 古河電気工業株式会社 Article that diffusely reflects ultraviolet light, visible light, and/or infrared light, and production method therefor

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