JPH077137U - Processing liquid supply / collection device for substrate processing equipment - Google Patents

Abstract

(57) [Abstract] [Purpose] To simplify the structure, increase the freedom of equipment layout, and downsize the device. [Structure] The processing liquid supply device 14 supplies / recovers a chemical liquid to / from a substrate processing tank 13 of a substrate processing device 1, and includes a temperature raising tank 15, a pump 24, and a processing liquid supply / recovery section 23.
It has and. The temperature raising tank 15 stores the chemical liquid while controlling the temperature. The pump 24 pressure-feeds the drug solution. Supply of treatment liquid
The recovery unit 23 supplies the chemical from the temperature raising tank 15 to the substrate processing tank 13 by the pump 24, recovers the chemical from the substrate processing tank 13 to the temperature raising tank 15, and then from the temperature raising tank 15 to the temperature raising tank 15. In order to circulate the chemical solution into the temperature rising tank 15 and to discharge the chemical solution from the substrate processing tank 13, the five valves 51 are provided.
To 55.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to a processing liquid supply / recovery device, and more particularly to a processing liquid supply / recovery device for a substrate processing device that supplies / recovers a processing liquid to / from a substrate processing tank of the substrate processing device.

[0002]

[Prior art]

 When surface-treating a thin substrate to be processed (hereinafter simply referred to as a substrate) such as a semiconductor substrate or a glass substrate for liquid crystal, an immersion type substrate processing apparatus that immerses the substrate in a processing tank for processing is used. Commonly used. This type of apparatus is composed of a substrate processing bath for performing a surface treatment of a substrate and a processing liquid supply unit for supplying a processing liquid to the substrate processing bath. The processing liquid supply unit is a sealed temperature rising tank that stores and controls the temperature of the chemical liquid, a pump for pumping the chemical liquid from the temperature rising tank to the substrate processing tank, and a filter that filters the chemical liquid discharged from the pump. And a chemical solution injection valve arranged between the filter and the substrate processing tank, and a circulation valve arranged in the middle of the circulation pipe branching from between the chemical solution injection valve and the filter and returning to the temperature raising tank. There is. An aspirator for decompressing the inside is connected to the temperature raising tank. The aspirator is configured to decompress with city water.

In this apparatus, when the chemical solution is charged, the chemical solution charging valve is opened to pump the chemical solution from the temperature raising tank to the substrate processing tank. When circulating the chemical, the chemical injection valve is closed and the chemical circulation valve is opened, and the chemical is circulated from the heating tank to the heating tank by the pump. Further, when the chemical solution is collected, the inside of the temperature rising tank is decompressed by an aspirator, the chemical solution circulation valve and the chemical solution injection valve are opened, and the chemical solution is collected from the substrate processing tank to the temperature rising tank. This aspirator is used not only for collecting the chemical liquid but also for discharging the chemical liquid in the substrate processing bath and discharging the chemical liquid in the temperature rising bath.

[0004]

[Problems to be solved by the device]

 In the above-mentioned conventional configuration, since it is necessary to depressurize the inside of the temperature raising tank at the time of collecting the chemical solution, the airtightness of the temperature raising tank must be improved, and the structure of the temperature raising tank becomes complicated. In addition, since the pressure is reduced by the aspirator, it cannot be recovered normally unless conditions such as the position of the aspirator and the pressure loss of the pipe are taken into consideration, and the layout of the equipment is limited. Furthermore, since space for the aspirator and city water for the aspirator are required, the piping space becomes large and the device becomes large.

An object of the present invention is to simplify the structure, increase the flexibility of equipment layout, and reduce the size of the device.

[0006]

[Means for Solving the Problems]

 The processing liquid supply / recovery device according to the present invention is a device for supplying / recovering a processing liquid to / from a substrate processing tank of a substrate processing apparatus, and comprises a storage tank, a pressure feeding means, a supplying means, a collecting means and a circulating means. I have it. The storage tank stores the processing liquid. The pumping means pumps the processing liquid. The supply means supplies the processing liquid from the storage tank to the substrate processing tank by the pressure feeding means. The collecting means collects the processing liquid from the substrate processing tank to the storage tank by the pressure feeding means. The circulation means circulates the processing liquid from the storage tank to the storage tank by the pressure feeding means.

[0007]

[Action]

 In the processing liquid supply / collection device according to the present invention, when the processing liquid stored in the storage tank is supplied, the processing liquid is supplied from the storage tank to the substrate processing tank by the pressure feeding means. Further, at the time of collection, the processing liquid is collected from the substrate processing tank to the storage tank by the pressure feeding means. Furthermore, during circulation, the processing liquid is circulated from the storage tank to the storage tank by the pumping means.

Here, since the same pumping means pumps the processing liquid during supply, recovery, and circulation of the processing liquid, the structure is simple, and there are no restrictions on the device layout such as when using the aspirator, and the device layout is eliminated. The degree of freedom of Furthermore, the piping space is small and the device can be downsized.

[0009]

【Example】

 In FIG. 1, an immersion type substrate processing apparatus 1 to which an embodiment of the present invention is applied includes a loading / unloading section 2, a substrate transfer apparatus 3, a substrate cleaning apparatus 4, and a horizontal axis rotary type drying apparatus 5. And a substrate transfer robot 6. The loading / unloading section 2 is for loading / unloading the carrier C for housing the substrate, and is provided with a substrate transfer robot 10 for transporting the carrier C. The substrate transfer robot 10 can move up and down and rotate, and can move in the direction indicated by arrow A in FIG. The substrate transfer device 3, the substrate cleaning device 4, and the drying device 5 are arranged side by side in the left-right direction. The substrate transfer robot 6 has a pair of arms 11 for holding the substrate. The substrate transfer robot 6 can move in the direction indicated by arrow B and can move up and down. The substrate can be transferred between the devices 3 to 5 by the substrate transfer robot 6. Further, the substrate cleaning device 4 is provided with a substrate holder 12 for immersing the substrate in the processing liquid.

As shown in FIG. 2, the substrate cleaning apparatus 4 mainly includes a substrate processing bath 13 and a processing liquid supply device 14 for supplying a chemical liquid and pure water to the substrate processing bath 13. The substrate processing tank 13 is made of quartz glass, and is formed in a substantially V shape in a side view and a substantially rectangular shape in a plan view. The substrate processing tank 13 is not limited to quartz glass, and may be made of resin such as tetrafluoroethylene resin when hydrofluoric acid is used as the cleaning liquid.

On the bottom surface of the substrate processing bath 13, a processing liquid supply port 29 that forms a uniform upward flow of the processing liquid is provided. As shown in FIG. 3, a large-diameter rapid discharge port 28 for rapidly discharging the processing liquid in the tank is formed on the back side surface of the substrate processing tank 13. The rapid discharge port 28 is sealed by an openable / closable plug 27. The plug 27 is opened and closed by the air cylinder 26.

A drain bat 21 is provided around the substrate processing bath 13. The drain vat 21 is for receiving the processing liquid discharged from the rapid discharge port 28 and the processing liquid overflowing. A drain port 30 is provided at the bottom of the drain butt 21. The discharge port 30 is connected to the drainage pipe 32. A nozzle device 31 is disposed above the substrate processing bath 13 for removing foreign matter adhering to the substrate W when the processing liquid is discharged. By providing the rapid discharge port 28 and the nozzle device 31, it is difficult for foreign matter to adhere to the substrate W when discharging the processing liquid.

The treatment liquid supply device 14 includes a temperature raising tank 15 that regulates and stores the chemical liquid, a treatment liquid supply / discharge unit 22, a treatment liquid supply / collection unit 23, and a treatment liquid pressure pump 24. It mainly has a filter 25 for filtering the treatment liquid. The temperature raising tank 15 is a container for storing the chemical liquid while controlling the temperature thereof, and a heater 16 is provided inside. Further, a chemical liquid supply pipe 17 and a chemical liquid circulation / recovery pipe 18 are connected to the temperature raising tank 15. The chemical liquid supply pipe 17 reaches near the bottom of the temperature raising tank 15, and the chemical liquid circulation / recovery pipe 18 opens at the upper portion of the temperature raising tank 15.

The processing liquid supply / discharge unit 22 is connected to the pure water supply valve 35 connected to the pure water supply pipe 33, the drainage valve 36 connected to the drainage pipe 32, and the processing liquid supply / collection unit 23. It has a chemical solution supply valve 37. These three valves 35 to 37 are opened and closed by air actuators 35a to 37a (FIG. 5). In the processing liquid supply / discharge section 22, a drain valve 38 is arranged between the primary side of the pure water supply valve 35 and the secondary side of the liquid discharge valve 36. The drain valve 38 is for preventing dead water (water accumulated in the passage).

As shown in FIGS. 4 to 6, the processing liquid supply / discharge unit 22 has a valve body 40 for integrating the three valves 35 to 37. The valve body 40 is a rectangular parallelepiped member made of, for example, tetrafluoroethylene resin, and has a pure water supply port 41 at one end (upper part in FIG. 4) and the substrate processing tank 13 at the other end (lower part in FIG. 4). The connection port 42 and the chemical solution supply port 43 are arranged on one side (the left side in FIG. 4).

Inside the valve body 40, a fluid passage 44 through which pure water flows is formed in the left-right direction of FIG. The fluid passage 44 connects the pure water supply port 41 and the connection port 42. A valve body 46 of the pure water supply valve 35 is arranged on the upstream side of the fluid passage 44, and the fluid passage 44 can be opened and closed. A drainage discharge port 45 that can be opened at the lower end is formed at the center of the fluid passage 44. A drain flow path 47 bent at 90 ° is formed between the pure water supply port 41 and the drainage discharge port 45, and the drain valve 38 is arranged at the bent part of the drain flow path 47. Has been done. With this drain valve 38, the flow rate of pure water flowing through the drain passage 45 can be reduced to an appropriate amount. The drain valve 38 is normally open so that a slight amount of pure water can flow. The drainage outlet 45 can be opened and closed by the valve body 48 of the drainage valve 36. A chemical liquid supply passage 49 connected to the chemical liquid supply port 43 is opened downstream of the liquid discharge outlet 45 of the fluid passage 44 (FIG. 6). The chemical liquid supply passage 49 is opened and closed by the valve body 50 of the chemical liquid supply valve 37. The upper and lower portions of the valve bodies 46, 48 and 50 of the valves 35 to 37 are liquid-tightly separated by diaphragms 46a, 48a and 50a, respectively.

In the treatment liquid supply / discharge section 22 configured as described above, the pure water supply port 41 is arranged at one end of the valve body 40, and the connection port 42 is arranged at the other end of the valve body 40. At the time of supply, the fluid passage 44 is washed with pure water, so that the processing liquid flowing in the fluid passage 44 can be prevented from being contaminated. Further, since the drainage discharge port 45 is opened at the lower end of the fluid passage 44, the processing liquid does not stay in the fluid passage 44 during drainage. Therefore, the contamination of the processing liquid flowing in the fluid passage 44 can be prevented more reliably. Further, since the drain valve 38 is provided, dead water in the pure water supply port 41 and the pure water supply pipe 32 is eliminated, and deterioration of pure water due to retention can be prevented.

The processing liquid supply / recovery unit 23 is for recovering the chemical liquid supplied to the substrate processing tank 13 and the chemical liquid supply / circulation valve 51 for supplying and circulating the chemical liquid stored in the temperature raising tank 15. A liquid medicine recovery valve 52, a liquid medicine supply valve 53 used for supplying a liquid medicine, a liquid medicine circulation / recovery valve 54 for circulating and collecting the liquid medicine, and a liquid discharge valve 55 used for discharging the liquid medicine. . These five valves 51-55 are opened / closed by air actuators 51a-55a (FIG. 8).

Further, the processing liquid supply / recovery section 23 has a valve body 50 for integrating the five valves 51 to 55, as shown in FIGS. 7 and 8. The valve body 50 is a rectangular parallelepiped member made of, for example, tetrafluoroethylene resin. At both longitudinal ends of the valve body 50, a suction connection port 60 connected to a suction pipe 62 (FIG. 2) of the pump 24 and a discharge connection port connected to the discharge port of the pump 24 via the filter 25. 61 and 61 are arranged. On the upper surface of the valve block 50 in FIG. 7, a drainage connection port 58 connected to the drainage pipe 32 and a circulation connection port 57 connected to the chemical liquid circulation / recovery pipe 18 are arranged. Further, on the lower surface of the valve body 50 in FIG. 7, a chemical liquid inlet 56 connected to the treatment liquid supply / discharge unit 22 and a chemical liquid supply port 59 connected to the chemical liquid supply pipe 17 are arranged.

Inside the valve body 50, as shown in FIG. 8, first and second fluid passages 63 and 64 that are long in the left-right direction of FIG. 8 are formed. One end of the first fluid passage 63 is connected to the suction connection port 60. The secondary passages of the chemical liquid supply / circulation valve 51 and the chemical liquid recovery valve 52 are open to the first fluid passage 63. One end of the second fluid passage 64 is connected to the discharge connection port 61. In the second fluid passage 64, secondary side flow passages of the chemical liquid supply valve 53, the chemical liquid circulation / recovery valve 54, and the drainage valve 55 are opened.

The primary side flow path of the chemical liquid supply / circulation valve 51 is connected to the chemical liquid supply port 59 as shown in FIG. The primary flow path of the drain valve 55 is connected to the drain connection port 58. Further, the primary side flow path of the chemical liquid circulation / recovery valve 54 is connected to the circulation connection port 57 as shown in FIG. Then, as shown in FIG. 11, the primary side flow paths of the chemical liquid recovery valve 52 and the chemical liquid supply valve 53 are collectively connected to the chemical liquid inlet 56. The connection of these five valves 51 to 55 is represented by a circuit diagram as shown in FIG.

Further, the substrate processing apparatus 1 has a control unit 70 composed of a microcomputer. As shown in FIG. 13, the control unit 70 includes the air actuators 35a to 37a of the valves 35 to 37 in the processing liquid supply / discharge unit 22 and the valves 51 to 55 in the processing liquid supply / collection unit 23. A valve drive unit 71 for individually operating the air actuators 51a to 55a, a pump drive unit 72 for driving the pump 24, and a heater drive unit 73 for turning on and off the heater 16 arranged in the temperature raising tank 15. And are connected. Further, various sensors and other input / output units are connected to the control unit 70.

Next, the operation of the substrate processing apparatus 1 will be described with reference to the control flowcharts shown in FIGS. First, initial setting is performed in step S1 (described later). In step S2, it is determined whether or not the carrier C accommodating the substrate has been loaded into the substrate loading / unloading section 2. When the substrate is loaded, the process proceeds to step S3, and the carrier C is loaded into the substrate transfer device 3 by the substrate transfer robot 10. In the substrate transfer device 3, a plurality of substrates are collectively received from the carrier C and held by the arm 11 of the substrate transfer robot 6. Then, the received plurality of substrates are delivered to the substrate holder 12 of the substrate processing bath 4.

Next, in step S4, various surface treatments and cleaning treatments are performed on the substrate in the substrate treatment tank 13 (described later). When the series of processes is completed, the process proceeds to step S5. In step S5, the substrate is transferred from the substrate processing tank 13 to the drying device 5 to be dried. The substrate for which the drying process has been completed is carried out to the outside by the carrying-out process of step S6.

In the initial setting, in step S21 of FIG. 15, temperature control circulation processing of the temperature raising tank 15 is performed. In this temperature control circulation process, as shown in FIG. 17, the chemical liquid supply / circulation valve 51 and the chemical liquid recovery valve 52 are opened, and the other valves are closed. In FIG. 17, the open state of the valve is represented by “O” and the closed state thereof is represented by “C”. As a result, in the temperature control circulation process, the chemical liquid heated by the heater 16 is sucked up by the pump 24 via the chemical liquid supply pipe 17, the chemical liquid supply port 59 and the chemical liquid supply / circulation valve 51, and the filter 25 and discharge connection. It is discharged to the circulation connection port 57 and the chemical liquid circulation / recovery pipe 18 through the port 61 and the chemical liquid circulation / recovery valve 54, and returned to the temperature raising tank 15. By circulating through this path, the temperature of the chemical solution is raised and the chemical solution is continuously filtered by the filter 25. Therefore, the temperature of the chemical liquid 7 becomes constant, and the foreign matter contained in the chemical liquid 7 is removed.

In step S22, the processing liquid filled in the processing tank 13 is discharged. At the time of this discharge, as shown in FIG. 17, the drain valve 36 is opened while performing temperature control circulation. As a result, the liquid in the processing tank 13 is discharged to the drainage pipe 32 through the processing liquid supply port 29 and the drainage valve 36. In this treatment tank drainage treatment, as shown in FIG. 18 (A), since the drainage discharge port 45 of the treatment liquid supply / discharge section 22 is open at the lower end of the fluid passage 44, it was discharged from the treatment tank 13. The liquid does not stay in the fluid passage 44. For this reason, it is possible to prevent contamination when the chemical liquid is added next or when pure water is added. In step S23, another general initialization process is performed and the process returns to the main routine.

In the substrate processing of step S4, the chemical solution is introduced in step S31 of FIG. At the time of this chemical liquid charging process, as shown in FIG. 17, the chemical liquid supply valve 37, the chemical liquid supply valve 53, and the chemical liquid supply / circulation valve 51 are opened. As a result, the chemical solution stored in the temperature raising tank 15 is sucked into the pump 24 via the chemical solution supply pipe 17, the chemical solution supply port 59, the chemical solution supply / circulation valve 51, the suction connection port 60 and the suction pipe 62, and the pump. The liquid is supplied from 24 to the processing liquid supply port 29 of the substrate processing bath 13 through the filter 25, the discharge connection port 61, the chemical liquid supply valve 53, the chemical liquid injection port 56, and the chemical liquid supply valve 37. At this time, in the processing liquid supply / discharge section 22, as shown in FIG. 18C, the chemical liquid is supplied from the chemical liquid supply valve 37 through the left side portion of the fluid passage 44 in the drawing.

When the injection of the chemical solution into the substrate processing bath 13 is completed, the process proceeds to step S32. In step S32, the substrate cleaning process is executed. Here, as shown in FIG. 17, all valves are closed. Then, it waits for a predetermined time. When the predetermined time has elapsed, the process proceeds to step S33. In step S33, a chemical solution recovery process is executed. In this chemical solution recovery process, as shown in FIG. 17, the chemical solution supply valve 37, the chemical solution recovery valve 52, and the chemical solution circulation / recovery valve 54 are opened. As a result, the chemical liquid in the processing tank 13 is sucked into the pump 24 through the chemical liquid supply valve 37, the chemical liquid inlet 56, and the chemical liquid recovery valve 52, and the filter 24, the discharge connection port 61, the chemical liquid circulation / recovery from the pump 24. The chemical liquid is discharged to the circulation / recovery pipe through the valve 54 and the circulation connection port 57 and is collected in the temperature raising tank 15.

When the recovery process is completed and the processing liquid in the substrate processing bath 13 is recovered in the temperature raising bath 15, the process proceeds to step S 34. In step S34, a water washing process is executed. In this washing process, as shown in FIG. 17, the pure water supply valve 35, the chemical solution supply / circulation valve 51, and the chemical solution circulation / recovery valve 54 are opened. As a result, the chemical solution in the temperature raising tank 15 is circulated, and pure water is supplied from the pure water supply pipe 33 to the processing tank 13 via the pure water supply valve 35. Here, as shown in FIG. 18B, in the processing liquid supply / discharge unit 22, the pure water supplied from the pure water supply pipe 33 is connected to the connection port via the pure water supply port 41 and the pure water supply valve 35. It is supplied to the processing tank 13 from 42. For this reason, the entire fluid passage 44 is washed with pure water, and it is possible to prevent contamination when the chemical liquid is next introduced. During each of these processes, the drain valve 38 is opened in an appropriate amount, so that the pure water in the pure supply pipe 33 is constantly discharged through the drain flow path 47. Therefore, dead water does not occur in the pure water supply pipe 33.

When the washing with water is completed, the process proceeds to step S35. In step S35, it is determined whether or not it is necessary to perform the treatment tank drainage treatment. Normally, when another substrate is to be subsequently processed, the processing tank drainage process is required in order to newly add the chemical liquid, so this determination becomes “YES”, and the process proceeds to step S36. At the end of the day's work, a small amount of pure water continues to overflow into the processing tank 13 to prevent the processing tank 13 from being contaminated. Therefore, the determination in step S35 becomes "NO", and the process proceeds to step S37.

In step S36, a treatment tank drainage process is executed. In the treatment tank drainage treatment, as shown in FIG. 17, the chemical liquid supply valve 37, the chemical liquid recovery valve 52, and the chemical liquid circulation / recovery valve 54 are opened. As a result, the liquid in the processing tank 13 is sucked by the pump 24 via the processing liquid supply port 29, the chemical liquid supply valve 37, and the chemical liquid recovery valve 52, and is drained from the pump 24 via the filter 25 and the drain valve 55. It is discharged to the pipe 32. At this time, the liquid may be discharged to the drain pad 21 via the rapid discharge port 28. In this case, the plug 27 may be retracted by the air cylinder 26. When the liquid is discharged by the rapid discharge or the liquid is discharged by the treatment tank discharge treatment, pure water is sprayed from the nozzle device 31. This prevents the processing tank 13 and the substrate from being contaminated.

In step S37, it is necessary to judge the fatigue of the chemical solution by whether or not the recovered chemical solution in the temperature increase tank 15 has been used for a predetermined number of treatments, and to drain the temperature increase tank 15. Determine whether or not. If it is necessary to dispose of the chemical liquid, the process proceeds to step S38, and the temperature raising tank draining process is executed. In the temperature raising tank drainage process, as shown in FIG. 17, the chemical liquid supply / circulation valve 51 and the drainage valve 55 are opened. As a result, the chemical solution in the temperature raising tank 15 is sucked into the pump 24 via the chemical solution supply pipe 17, the chemical solution supply port 59, and the chemical solution supply / circulation valve 51, and then from the pump 24 via the filter 25 and the drainage valve 55. It is discharged to the drainage pipe 32. When these processes are completed, the process returns to the main routine.

Here, in the processing liquid supply / discharge section 22, since the liquid discharge outlet 45 is open at the lower end of the fluid passage 44, no liquid remains in the fluid passage 44 during liquid discharge. Therefore, it is possible to prevent contamination when the liquid is supplied to the substrate processing tank 13 again. Further, since the pure supply port 41 and the connection port 42 are arranged at both ends of the valve body 40, and the entire fluid passage 44 is washed when the pure water is supplied, the contamination of the processing liquid can be prevented more reliably.

Further, in the processing liquid supply / recovery section 23, since the processing liquid can be recovered / circulated / supplied by using the pump 24 and the liquid in the temperature raising tank 15 and the substrate processing tank 13 can be discharged, the aspirator is provided. These five functions can be realized compactly without using other means such as. [Other Embodiments] (a) The five two-way valves of the processing liquid supply / recovery section 23 may be separate bodies and connected by piping. However, in this case, the number of pipes and joints is increased, and the space is inferior to that in the above-mentioned embodiment. (B) The treatment liquid supply / recovery section 23 may be composed of a four-way valve 81 and a three-way valve 82 as shown in FIG. 19, instead of being composed of a two-way valve. In this case, the air actuator that drives the four-way valve 81 needs to be capable of intermediate stop, but the number of air actuators can be reduced from five to two. (C) The treatment liquid supply / recovery valve 23 may be composed of two three-way valves 83 and 84 and one two-way valve 85 as shown in FIG. 20, instead of being composed of a two-way valve. In this case, it is not necessary to stop the air actuator in the middle. As a result, the number of air actuators can be reduced from five to three.

[0035]

[Effect of device]

 In the processing liquid supply / collection device according to the present invention, the same pumping means pumps the processing liquid during the supply / collection / circulation of the processing liquid, which simplifies the structure and restricts the layout of the device when using the aspirator. Is eliminated, and the degree of freedom in equipment layout is expanded. Further, the piping space is reduced, and the device can be downsized.

[Brief description of drawings]

FIG. 1 is a perspective outline view of a substrate processing apparatus adopting an embodiment of the present invention.

FIG. 2 is a piping circuit diagram of the substrate cleaning apparatus.

FIG. 3 is a schematic sectional view of a substrate processing bath.

FIG. 4 is a plan view of a processing liquid supply / discharge unit.

FIG. 5 is a partially cutaway side view thereof.

6 is a sectional view taken along line VI-VI of FIG.

FIG. 7 is a plan view of a processing liquid supply / collection unit.

FIG. 8 is a partially cutaway side view thereof.

9 is a sectional view taken along line IX-IX in FIG.

10 is a sectional view taken along line XX of FIG.

11 is a sectional view taken along line XI-XI of FIG.

FIG. 12 is a piping circuit diagram of a processing liquid supply / collection unit.

FIG. 13 is a block schematic diagram showing a control configuration of the substrate processing apparatus.

FIG. 14 is a control flowchart thereof.

FIG. 15 is a control flowchart thereof.

FIG. 16 is a control flowchart thereof.

FIG. 17 is a diagram showing an open / closed state of each valve in each process.

FIG. 18 is a schematic diagram showing the flow of liquid in the processing liquid supply / discharge unit.

FIG. 19 is a view corresponding to FIG. 2 of another embodiment.

FIG. 20 is a view corresponding to FIG. 2 of still another embodiment.

[Explanation of symbols]

 13 Substrate processing tank 14 Processing liquid supply device 15 Temperature rising tank 23 Processing liquid supply / collection unit 24 Pump 51 Chemical liquid supply / circulation valve 52 Chemical liquid recovery valve 53 Chemical liquid supply valve 54 Chemical liquid circulation / collection valve

Claims (1)

[Scope of utility model registration request] 1. A processing liquid supply / recovery device for a substrate processing device for supplying / recovering a processing liquid to / from a substrate processing tank of a substrate processing device, wherein a storage tank for storing the processing liquid, and the processing liquid being pressure-fed. And a supply unit configured to supply the processing liquid from the storage tank to the substrate processing tank by the pressure supply unit, and the processing liquid to be collected from the substrate processing tank to the storage tank by the pressure supply unit. A processing liquid supply / recovery device for a substrate processing apparatus, comprising: a recovery unit that performs the processing, and a circulation unit that circulates the processing liquid from the storage tank to the storage tank by the pumping unit.