JPH0768691A - Transparent conductive film - Google Patents

Transparent conductive film

Info

Publication number
JPH0768691A
JPH0768691A JP5217776A JP21777693A JPH0768691A JP H0768691 A JPH0768691 A JP H0768691A JP 5217776 A JP5217776 A JP 5217776A JP 21777693 A JP21777693 A JP 21777693A JP H0768691 A JPH0768691 A JP H0768691A
Authority
JP
Japan
Prior art keywords
film
transparent conductive
glass transition
heat
laminated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5217776A
Other languages
Japanese (ja)
Other versions
JP3310409B2 (en
Inventor
Akifumi Katsumura
明文 勝村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP21777693A priority Critical patent/JP3310409B2/en
Publication of JPH0768691A publication Critical patent/JPH0768691A/en
Application granted granted Critical
Publication of JP3310409B2 publication Critical patent/JP3310409B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Abstract

PURPOSE:To continuously apply function imparting processing containing a heating process to the rear surface of the transparent conductive membrane forming surface of a heat-resistant transparent conductive film by a roll process. CONSTITUTION:A transparent conductive membrane is laminated to a plastic film substrate with a glass transition temp. of 120 deg.C or higher and a protective film wherein a self-adhesive layer with a thermal decomposition temp. of 120 deg.C or higher and tackiness of 50g/cm or less is provided on a plastic film substrate with a glass transition temp. of 120 deg.C or higher is further laminated to the membrane through the self-adhesive layer. By this constitution, the processing enhancing the quality and function of a film liquid crystal display element, a dispersion type electroluminescent element or a transparent touch panel input device can be applied by continuous process good in productivity.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、フィルム液晶表示素子
や有機分散型エレクトロルミネッセンス素子や透明タッ
チパネル入力装置などに用いられる透明導電性フィルム
に関わる。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a transparent conductive film used for a film liquid crystal display device, an organic dispersion type electroluminescence device, a transparent touch panel input device and the like.

【0002】[0002]

【従来の技術】従来より、ポリエステルフィルムなどの
表面に、インジウムと錫の酸化物薄膜などを、スパッタ
リングなどの方法により積層した透明導電性フィルム
が、フィルム液晶表示素子や有機分散型エレクトロルミ
ネッセンス素子や透明タッチパネル入力装置の透明電極
基板用材料として使用されている。しかし、透明導電性
の機能を発現する薄膜は、通常0.1μm以下の厚みし
かなく、機械的なこすれや打撃に弱いために、取り扱い
には細心の注意が必要であった。輸送や保存においては
保護フィルムを貼り合わせることで、この薄膜を損傷か
ら防ぐことが可能であるが、素子や装置に加工するうえ
では高温に加熱される工程を含むことがあり、保護フィ
ルムには耐熱性の高いものが無いために、透明導電性薄
膜の面がこすれたり、打撃をうけたりしないようにカッ
トシートに切断してガラス板などに固定し、枚葉で加工
されている。また、万一こすれたり打撃をうけても損傷
しないように透明導電性薄膜と基材フィルムの間にアン
ダーコート層を施したり、透明導電性薄膜の種類や組
成、結晶構造で改良がはかられている。しかし、枚葉で
加工するのは、フィルムが連続体としてロールプロセス
での加工を可能にせしめる最大の長所を失うことにな
り、ロールプロセスでの移送ロールに接触しても問題な
い透明導電性フィルムの開発が熱望されている。一方、
アンダーコートや薄膜の検討では、いまだ十分な成果は
えられていない。従来より加工プロセスで120℃以上
の加熱工程を加えても熱による損傷のない透明導電性フ
ィルムを開発されてきた。これにより、透明導電性薄膜
を積層したフィルムの裏面にバリアー層を加熱プロセス
で形成したり、耐熱性偏光板や位相差フィルムを熱工程
で積層することが可能となった。しかし、フィルムをロ
ールプロセスで連続的に加工するには、透明導電性薄膜
の損傷の問題があった。
2. Description of the Related Art Conventionally, a transparent conductive film obtained by laminating an oxide thin film of indium and tin on the surface of a polyester film by a method such as sputtering has been used as a film liquid crystal display element or an organic dispersion type electroluminescence element. It is used as a material for transparent electrode substrates of transparent touch panel input devices. However, since a thin film exhibiting a transparent conductive function usually has a thickness of 0.1 μm or less and is vulnerable to mechanical rubbing or hitting, careful handling is required. It is possible to prevent this thin film from being damaged by bonding a protective film during transportation and storage, but in processing the element or device, it may include a step of heating to a high temperature. Since there is nothing with high heat resistance, the surface of the transparent conductive thin film is cut into cut sheets so as not to be scratched and fixed to a glass plate or the like, and then processed into single sheets. In addition, an undercoat layer may be applied between the transparent conductive thin film and the base material film so that it will not be damaged even if it is rubbed or hit, and the type, composition and crystal structure of the transparent conductive thin film can be improved. ing. However, the single-wafer processing loses the maximum advantage of allowing the film to be processed in the roll process as a continuous body, and there is no problem even if it comes into contact with the transfer roll in the roll process. Is eager to develop. on the other hand,
Examination of undercoats and thin films has not yet yielded sufficient results. Conventionally, a transparent conductive film has been developed which is not damaged by heat even if a heating step of 120 ° C. or more is added in the processing process. This makes it possible to form a barrier layer on the back surface of a film having a transparent conductive thin film laminated thereon by a heating process and to laminate a heat resistant polarizing plate and a retardation film at a thermal process. However, continuous processing of the film by a roll process has a problem of damage to the transparent conductive thin film.

【0003】[0003]

【発明が解決しようとする課題】本発明は、加工プロセ
スで120℃以上の加熱工程を加えても熱による損傷も
なく、透明導電性薄膜の損傷もないロールプロセスで連
続的に加工できる耐熱性透明導電性フィルムを提供する
ことににある。
DISCLOSURE OF THE INVENTION The present invention provides a heat-resistant material which can be continuously processed by a roll process in which a heating step of 120 ° C. or higher is not added to the working process and the transparent conductive thin film is not damaged. It is to provide a transparent conductive film.

【0004】[0004]

【課題を解決するための手段】本発明は、上記の問題に
対し、ガラス転移温度が120℃以上のプラスチックフ
ィルム2基体に透明導電性を有する薄膜1を積層した耐
熱性透明導電性フィルムの薄膜上に、ガラス転移温度が
120℃以上のプラスチックフィルム3基体に熱分解温
度が120℃以上で、かつ粘着力が50g/cm以下で
ある粘着材層4を設けた保護フィルムを粘着材層を介し
て貼り合わせることで解決したものである。
Means for Solving the Problems In order to solve the above problems, the present invention is a thin film of a heat-resistant transparent conductive film obtained by laminating a thin film 1 having transparent conductivity on a plastic film 2 substrate having a glass transition temperature of 120 ° C. or higher. A plastic film 3 having a glass transition temperature of 120 ° C. or higher and a pressure-sensitive adhesive layer 4 having a thermal decomposition temperature of 120 ° C. or higher and an adhesive force of 50 g / cm or less is provided on the base of the protective film via the adhesive layer. It was solved by sticking together.

【0005】ガラス転移温度が120℃以上のプラスチ
ックフィルム2、3としては、ポリカーボネート、ポリ
アリレート、ポリスルホン、ポリエーテルスルホン、ポ
リエーテルイミド、ポリエーテルエーテルケトン等の樹
脂からなるフィルムがあげられる。熱分解温度が120
℃以上で、粘着力が50g/cm以下である粘着材層4
に使用する粘着材には、アクリル系粘着材、シリコーン
系粘着材、EVA樹脂系粘着材等から選ばれる。粘着材
をプラスチックフィルム表面に設けるには、コーティン
グや押し出しラミネートの手法が使われる。プラスチッ
クフィルム表面と粘着材の密着力は透明導電性薄膜1と
粘着材層4の密着力より十分大きくなければならない。
そのためには、プラスチックフィルム表面をコロナ処理
したりプライマーコーティングすることが有効である。
透明導電性薄膜1と粘着材層4の粘着力が50g/cm
以上になると、剥し難くなり、ロールプロセスでの自動
剥離機構に特別な設計が必要となり生産性にも支障をき
たし、また剥す際に透明導電性薄膜を損傷するおそれも
出てくるので好ましくない。プラスチックフィルムの厚
さは、コスト的には薄いほうが有利であるが、貼り合わ
せた状態での透明導電性フィルムの補強効果においては
厚いほうが有利となる。粘着材層4の厚さは薄いほうが
基材のプラスチックフィルムの耐熱性を損ないにくいの
で好ましい。なお、粘着材のガラス転移温度は120℃
以下であっても、粘着機能は高温でも損なわれないので
差し支えない。
Examples of the plastic films 2 and 3 having a glass transition temperature of 120 ° C. or higher include films made of resins such as polycarbonate, polyarylate, polysulfone, polyethersulfone, polyetherimide and polyetheretherketone. Pyrolysis temperature is 120
Adhesive layer 4 having an adhesive force of 50 g / cm or less at a temperature of ℃ or more
The adhesive material used for is selected from acrylic adhesive material, silicone adhesive material, EVA resin adhesive material and the like. A coating or extrusion laminating method is used to provide the adhesive material on the surface of the plastic film. The adhesive force between the surface of the plastic film and the adhesive must be sufficiently larger than the adhesive force between the transparent conductive thin film 1 and the adhesive layer 4.
For that purpose, corona treatment or primer coating on the surface of the plastic film is effective.
The adhesive force between the transparent conductive thin film 1 and the adhesive layer 4 is 50 g / cm.
In the case of the above, it becomes difficult to peel off, a special design is required for the automatic peeling mechanism in the roll process, the productivity is hindered, and the transparent conductive thin film may be damaged during peeling, which is not preferable. The thickness of the plastic film is preferably thin in terms of cost, but is thicker in terms of the reinforcing effect of the transparent conductive film in a laminated state. It is preferable that the thickness of the pressure-sensitive adhesive layer 4 is thin because the heat resistance of the plastic film of the base material is not easily impaired. The glass transition temperature of the adhesive is 120 ° C.
Even if it is less than the following, the adhesive function is not impaired even at high temperature, so that there is no problem.

【0006】本発明における透明導電性薄膜1として
は、錫を5〜10wt%含んだインジウムの酸化物(I
TO)が最も適しているが、金、銀、パラジウム、ニッ
ケルやカドミウム、アンチモン、亜鉛等の酸化物も選ぶ
ことができる。プラスチックフィルムにこれらの薄膜を
積層する方法としは、真空蒸着法やスパッタリング法、
イオンプレーティング法が選ばれる。透明導電性薄膜を
形成する前に、プラスチックフィルム表面に、密着力向
上のためにアンダーコーティングを施すのも有効であ
る。
As the transparent conductive thin film 1 in the present invention, an indium oxide (I) containing 5 to 10 wt% of tin is used.
TO) is most suitable, but oxides such as gold, silver, palladium, nickel, cadmium, antimony and zinc can also be selected. As a method for laminating these thin films on a plastic film, a vacuum vapor deposition method, a sputtering method,
The ion plating method is selected. Before forming the transparent conductive thin film, it is also effective to apply an undercoat to the surface of the plastic film to improve the adhesion.

【0007】[0007]

【実施例】 (実施例1)ロール状のポリエーテルイミドフィルム
(住友ベークライト(株)製スミライトFS−1450、
ガラス転移温度216℃、厚み25μm)にアクリル系
粘着材を5μmの厚みにコーティングし、耐熱性保護フ
ィルムを作成した。この耐熱性保護フィルムを、同じく
ロール状の、ポリエーテルスルホンフィルム(住友ベー
クライト(株)製スミライトFS−5300、ガラス転移
温度223℃、厚み100μm)にアンダーコートを施
しその表面上にITOをスパッタリング法で厚さ0.0
3μmに形成した透明導電性フィルムのITO面に貼り
合わせた。この積層フィルムのロールを、巻出しながら
耐熱性保護フィルムを貼っていない面に、ポリビニルア
ルコールを主成分とするバリアー性付与ワニスをリバー
スコーターで塗布し、150℃で10分間乾燥機の中を
連続的に移送して乾燥させたのち再び巻取った。乾燥機
の中でも耐熱性保護フィルムが剥がれたり、変形したり
することはなかった。この塗布乾燥機には耐熱性保護フ
ィルム側の面に接触する支持ロールが50本存在した
が、巻取った積層フィルムの耐熱性保護フィルムを剥し
てITO面を微分干渉装置付き偏光顕微鏡で100倍で
観察しても、ITO面に傷は観察されなかった。
Example 1 A roll-shaped polyetherimide film (Sumilite FS-1450 manufactured by Sumitomo Bakelite Co., Ltd.,
A glass transition temperature of 216 ° C. and a thickness of 25 μm) was coated with an acrylic pressure-sensitive adhesive material to a thickness of 5 μm to prepare a heat resistant protective film. This heat-resistant protective film was also undercoated on a polyether sulfone film (Sumilite FS-5300 manufactured by Sumitomo Bakelite Co., Ltd., glass transition temperature 223 ° C., thickness 100 μm) in the same roll shape, and ITO was sputtered onto the surface of the film. And thickness is 0.0
The transparent conductive film having a thickness of 3 μm was attached to the ITO surface. A roll of this laminated film is unrolled, and a barrier property imparting varnish containing polyvinyl alcohol as a main component is applied by a reverse coater on the surface on which the heat-resistant protective film is not attached, and the roll is continuously dried in a dryer at 150 ° C. for 10 minutes. It was transferred, dried and then wound again. Even in the dryer, the heat-resistant protective film was not peeled off or deformed. There were 50 supporting rolls in contact with the heat-resistant protective film side of this coating and drying machine, but the heat-resistant protective film of the wound laminated film was peeled off and the ITO surface was magnified 100 times with a polarizing microscope equipped with a differential interference device. No scratches were observed on the ITO surface even when observed with.

【0008】(実施例2)ポリカーボネート樹脂(GE
P製レキサン141、ガラス転移点145℃)を押出製
膜法で300μmのフィルムに成形し、さらにこの一方
の表面上にEVA樹脂(三井デュポン(株)製エバフレッ
クス)を押し出しラミネートして耐熱性保護フィルムを
作成し、ロール状に巻取った。この耐熱性保護フィルム
を、同じく押し出し製膜したロール状の、ポリカーボネ
ートフィルム(ガラス転移温度145℃、厚み300μ
m)にアンダーコートを施しその表面上にITOをスパ
ッタリング法で厚さ0.1μmに形成した透明導電性フ
ィルムのITO面に貼り合わせた。この積層フィルムの
ロールを、巻出しながら耐熱性保護フィルムを貼ってい
ない面に、エポキシ樹脂系接着剤を塗布しポリカーボネ
ートフィルムを1軸延伸して作成した位相差板(厚さ1
00μm)を重ね合わせて、ベルト式連続加熱プレスで
120℃、2Kg/cm2 、5分の加熱条件で接着し、
再び巻取った。プレス後も耐熱性保護フィルムが剥がれ
たり、変形したりすることはなかった。ベルト面は耐熱
性保護フィルム側の面に全面において接触していたが、
巻取った積層フィルムの耐熱性保護フィルムを剥してI
TO面を微分干渉装置付き偏光顕微鏡で100倍で観察
しても、ITO面に傷は観察されなかった。
(Example 2) Polycarbonate resin (GE
Heat resistance by extruding and laminating EVA resin (Evaflex manufactured by Mitsui DuPont Co., Ltd.) on one of the surfaces of Pexan 141 made of P and glass transition point 145 ° C. to form a film of 300 μm by the extrusion film forming method. A protective film was prepared and wound into a roll. This heat-resistant protective film was also extruded into a roll-shaped polycarbonate film (glass transition temperature 145 ° C., thickness 300 μm).
m) was undercoated, and ITO was attached to the ITO surface of a transparent conductive film having a thickness of 0.1 μm formed on the surface by sputtering. A phase difference plate (thickness 1 was prepared by uniaxially stretching a polycarbonate film by applying an epoxy resin adhesive to the surface of the laminated film which is unrolled and having no heat-resistant protective film attached thereto while unrolling.
00 μm) and they are bonded by a belt type continuous heating press under heating conditions of 120 ° C., 2 Kg / cm 2 , and 5 minutes,
I wound up again. The heat-resistant protective film was not peeled or deformed even after pressing. The belt surface was in full contact with the surface on the heat resistant protective film side,
Peel off the heat-resistant protective film of the wound laminated film I
No scratches were observed on the ITO surface even when the TO surface was observed at 100 times with a polarizing microscope equipped with a differential interference device.

【0009】(比較例1)実施例1のバリアーコーティ
ングを、ITO面に耐熱性保護フィルムを貼らないでお
こなった。コーティング後のITO面を微分干渉装置付
き偏光顕微鏡で100倍で観察したところ、ITO面に
塗布乾燥機の支持ロールとの接触で発生したと考えられ
る傷が無数に観測された。 (比較例2)実施例1のバリアーコーティングを、ガラ
ス転移温度が80℃のポリエステルフィルムを基体とし
アクリル系粘着材が塗布されている保護フィルム(サン
エー化学工業(株)製 サニテクトE)を耐熱性保護フィ
ルムの代わりに用いて行ったところ乾燥機内部でポリエ
ステルフィルムが収縮し塗布膜の塗りむらが発生した。 (比較例3)実施例1のバリアーコーティングを、ガラ
ス転移温度が−125℃のポリエチレンフィルムを基体
としEVA樹脂が共押し出し積層されている保護フィル
ム(サンエー化学工業(株)製 サニテクトPAC)を耐
熱性保護フィルムの代わりに用いて行ったところ乾燥機
を出てからポリエチレンフィルムが収縮し積層フィルム
全体が大きくカールし支持ロールで折れ曲がり損傷し
た。
Comparative Example 1 The barrier coating of Example 1 was applied without attaching a heat resistant protective film on the ITO surface. When the ITO surface after coating was observed with a polarizing microscope equipped with a differential interference device at a magnification of 100 times, numerous scratches that were considered to be caused by contact with the supporting roll of the coating dryer were observed on the ITO surface. (Comparative Example 2) The barrier coating of Example 1 was heat-resistant with a protective film (Sanitec E manufactured by San-A Chemical Industry Co., Ltd.) having a polyester film having a glass transition temperature of 80 ° C. as a base and an acrylic adhesive applied thereto. When it was used instead of the protective film, the polyester film contracted inside the drier, causing uneven coating of the coating film. (Comparative Example 3) The barrier coating of Example 1 was heat-resistant with a protective film (Sanitec PAC manufactured by San-A Chemical Co., Ltd.) in which EVA resin was co-extruded and laminated on a polyethylene film having a glass transition temperature of -125 ° C. When it was used instead of the protective film, the polyethylene film contracted after leaving the dryer, the whole laminated film curled greatly, and it was bent and damaged by the support roll.

【0010】[0010]

【発明の効果】この発明により、耐熱性の高い透明導電
性フィルムの透明導電性薄膜が形成されている面の裏面
に、加熱工程を必要とする加工が、ロール形状のまま連
続プロセスで可能となる。
EFFECTS OF THE INVENTION According to the present invention, it is possible to perform a process requiring a heating step on a back surface of a transparent conductive film having a high heat resistance on which a transparent conductive thin film is formed, in a continuous process in a roll shape. Become.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の1実施例要部断面図である。FIG. 1 is a sectional view of an essential part of an embodiment of the present invention.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 ガラス転移温度が120℃以上のプラス
チックフィルム基体に、透明導電性を有する薄膜を積層
し、さらに該薄膜上に、ガラス転移温度が120℃以上
のプラスチックフィルム基体に、熱分解温度が120℃
以上で、かつ粘着力が50g/cm以下である粘着材層
を設けた保護フィルムを粘着材層を介して貼り合わせた
ことを特徴とする透明導電性フィルム。
1. A plastic film substrate having a glass transition temperature of 120 ° C. or higher is laminated with a transparent conductive thin film, and a plastic film substrate having a glass transition temperature of 120 ° C. or higher is further deposited on the thin film, and a thermal decomposition temperature is set. Is 120 ° C
A transparent conductive film, characterized in that the protective film provided with an adhesive material layer having an adhesive force of 50 g / cm or less is bonded via the adhesive material layer.
JP21777693A 1993-09-01 1993-09-01 Transparent conductive film Expired - Fee Related JP3310409B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP21777693A JP3310409B2 (en) 1993-09-01 1993-09-01 Transparent conductive film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP21777693A JP3310409B2 (en) 1993-09-01 1993-09-01 Transparent conductive film

Publications (2)

Publication Number Publication Date
JPH0768691A true JPH0768691A (en) 1995-03-14
JP3310409B2 JP3310409B2 (en) 2002-08-05

Family

ID=16709557

Family Applications (1)

Application Number Title Priority Date Filing Date
JP21777693A Expired - Fee Related JP3310409B2 (en) 1993-09-01 1993-09-01 Transparent conductive film

Country Status (1)

Country Link
JP (1) JP3310409B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003032332A1 (en) * 2001-10-05 2003-04-17 Bridgestone Corporation Transparent electroconductive film, method for manufacture thereof, and touch panel
JP2008004501A (en) * 2006-06-26 2008-01-10 Sumitomo Metal Mining Co Ltd Film with transparent conductive layer, flexible distributed electroluminescent element, and electronic device using it

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003032332A1 (en) * 2001-10-05 2003-04-17 Bridgestone Corporation Transparent electroconductive film, method for manufacture thereof, and touch panel
KR100905478B1 (en) * 2001-10-05 2009-07-02 가부시키가이샤 브리지스톤 Transparent conductive Film and Touch panel
JP2008004501A (en) * 2006-06-26 2008-01-10 Sumitomo Metal Mining Co Ltd Film with transparent conductive layer, flexible distributed electroluminescent element, and electronic device using it

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