JPH0760914B2 - エキシマーレーザーガスの精製法並びにその装置 - Google Patents

エキシマーレーザーガスの精製法並びにその装置

Info

Publication number
JPH0760914B2
JPH0760914B2 JP1020284A JP2028489A JPH0760914B2 JP H0760914 B2 JPH0760914 B2 JP H0760914B2 JP 1020284 A JP1020284 A JP 1020284A JP 2028489 A JP2028489 A JP 2028489A JP H0760914 B2 JPH0760914 B2 JP H0760914B2
Authority
JP
Japan
Prior art keywords
gas
laser
metal
fluorine
laser gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP1020284A
Other languages
English (en)
Japanese (ja)
Other versions
JPH02201984A (ja
Inventor
稔 荒牧
伸介 中川
久治 中野
広志 市丸
正弘 田井中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Central Glass Co Ltd
Original Assignee
Central Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Central Glass Co Ltd filed Critical Central Glass Co Ltd
Priority to JP1020284A priority Critical patent/JPH0760914B2/ja
Priority to US07/466,930 priority patent/US4964137A/en
Priority to CA002008294A priority patent/CA2008294C/en
Priority to DE4002642A priority patent/DE4002642A1/de
Publication of JPH02201984A publication Critical patent/JPH02201984A/ja
Publication of JPH0760914B2 publication Critical patent/JPH0760914B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/036—Means for obtaining or maintaining the desired gas pressure within the tube, e.g. by gettering, replenishing; Means for circulating the gas, e.g. for equalising the pressure within the tube
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
JP1020284A 1989-01-30 1989-01-30 エキシマーレーザーガスの精製法並びにその装置 Expired - Fee Related JPH0760914B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP1020284A JPH0760914B2 (ja) 1989-01-30 1989-01-30 エキシマーレーザーガスの精製法並びにその装置
US07/466,930 US4964137A (en) 1989-01-30 1990-01-18 Method of refining rare gas fluoride excimer laser gas
CA002008294A CA2008294C (en) 1989-01-30 1990-01-22 Method of refining rare gas fluoride excimer laser gas
DE4002642A DE4002642A1 (de) 1989-01-30 1990-01-30 Verfahren zum raffinieren von in excimerlasern verwendetem edelgas-fluorid-gas

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1020284A JPH0760914B2 (ja) 1989-01-30 1989-01-30 エキシマーレーザーガスの精製法並びにその装置

Publications (2)

Publication Number Publication Date
JPH02201984A JPH02201984A (ja) 1990-08-10
JPH0760914B2 true JPH0760914B2 (ja) 1995-06-28

Family

ID=12022871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1020284A Expired - Fee Related JPH0760914B2 (ja) 1989-01-30 1989-01-30 エキシマーレーザーガスの精製法並びにその装置

Country Status (4)

Country Link
US (1) US4964137A (esLanguage)
JP (1) JPH0760914B2 (esLanguage)
CA (1) CA2008294C (esLanguage)
DE (1) DE4002642A1 (esLanguage)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69200250T2 (de) * 1991-03-06 1994-10-27 Air Liquide Verfahren zur verlängerung der gaslebensdauer von excimer-lasern.
US5307364A (en) * 1993-05-24 1994-04-26 Spectra Gases, Inc. Addition of oxygen to a gas mix for use in an excimer laser
US6030591A (en) * 1994-04-06 2000-02-29 Atmi Ecosys Corporation Process for removing and recovering halocarbons from effluent process streams
US5622682A (en) * 1994-04-06 1997-04-22 Atmi Ecosys Corporation Method for concentration and recovery of halocarbons from effluent gas streams
JP3986597B2 (ja) * 1996-10-15 2007-10-03 関東電化工業株式会社 三フッ化窒素含有ガスの処理方法及びそのための処理剤
US6128323A (en) * 1997-04-23 2000-10-03 Cymer, Inc. Reliable modular production quality narrow-band high REP rate excimer laser
US5982795A (en) * 1997-12-22 1999-11-09 Cymer, Inc. Excimer laser having power supply with fine digital regulation
US6330261B1 (en) 1997-07-18 2001-12-11 Cymer, Inc. Reliable, modular, production quality narrow-band high rep rate ArF excimer laser
WO1999031773A1 (en) * 1997-12-15 1999-06-24 Cymer, Inc. High pulse rate pulse power system
US6526085B2 (en) 1998-10-05 2003-02-25 Lambda Physik Ag Performance control system and method for gas discharge lasers
US6212214B1 (en) * 1998-10-05 2001-04-03 Lambda Physik Ag Performance control system and method for gas discharge lasers
DE19942455A1 (de) 1998-10-05 2000-04-06 Lambda Physik Gmbh Leistungssteuersystem und -verfahren für Gasentladungslaser
US6069909A (en) * 1999-03-08 2000-05-30 Xmr, Inc. Excimer laser with improved window mount
US6727731B1 (en) 1999-03-12 2004-04-27 Lambda Physik Ag Energy control for an excimer or molecular fluorine laser
BRPI0302019B1 (pt) * 2002-06-03 2017-02-21 Praxair Technology Inc método para produzir um gás de ressonador de laser de dióxido de carbono, e, método para cortar, modificar superfície, ou soldar um artigo
KR20020096026A (ko) * 2002-10-16 2002-12-28 장성진 고순도의 염기성／불활성 가스 제조를 위한 정제방법 및장치
US6843830B2 (en) * 2003-04-15 2005-01-18 Advanced Technology Materials, Inc. Abatement system targeting a by-pass effluent stream of a semiconductor process tool
US7074378B2 (en) * 2004-01-23 2006-07-11 Air Products And Chemicals, Inc. Process for the purification of NF3
JP6175471B2 (ja) * 2015-10-30 2017-08-02 日本エア・リキード株式会社 ネオン回収精製システムおよびネオン回収精製方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4674090A (en) * 1985-01-28 1987-06-16 Signetics Corporation Method of using complementary logic gates to test for faults in electronic components
US4722090A (en) * 1985-03-18 1988-01-26 Mitsubishi Denki Kabushiki Kaisha Excimer laser equipment
JPH0624605B2 (ja) * 1986-05-29 1994-04-06 セントラル硝子株式会社 希ガスハライドエキシマ−レ−ザ−ガスの精製法
CA1298959C (en) * 1985-09-28 1992-04-21 Kohzo Hakuta Method of refining rare gas halide excimer laser gas
JPS6274430A (ja) * 1985-09-28 1987-04-06 Central Glass Co Ltd 希ガスハライドエキシマ−レ−ザ−ガスの精製法
JPH0199272A (ja) * 1987-10-13 1989-04-18 Hamamatsu Photonics Kk ガス精製装置

Also Published As

Publication number Publication date
CA2008294A1 (en) 1990-07-30
DE4002642C2 (esLanguage) 1992-02-06
DE4002642A1 (de) 1990-08-02
CA2008294C (en) 1996-03-19
JPH02201984A (ja) 1990-08-10
US4964137A (en) 1990-10-16

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Legal Events

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LAPS Cancellation because of no payment of annual fees