JPH0758282A - Power semiconductor module and inverter device for vehicle - Google Patents
Power semiconductor module and inverter device for vehicleInfo
- Publication number
- JPH0758282A JPH0758282A JP19968493A JP19968493A JPH0758282A JP H0758282 A JPH0758282 A JP H0758282A JP 19968493 A JP19968493 A JP 19968493A JP 19968493 A JP19968493 A JP 19968493A JP H0758282 A JPH0758282 A JP H0758282A
- Authority
- JP
- Japan
- Prior art keywords
- synthetic resin
- case
- resin layer
- power semiconductor
- rubber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/44—Structure, shape, material or disposition of the wire connectors prior to the connecting process
- H01L2224/45—Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
- H01L2224/45001—Core members of the connector
- H01L2224/45099—Material
- H01L2224/451—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
- H01L2224/45117—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
- H01L2224/45124—Aluminium (Al) as principal constituent
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/4805—Shape
- H01L2224/4809—Loop shape
- H01L2224/48091—Arched
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/48—Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
- H01L2224/484—Connecting portions
- H01L2224/4847—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond
- H01L2224/48472—Connecting portions the connecting portion on the bonding area of the semiconductor or solid-state body being a wedge bond the other connecting portion not on the bonding area also being a wedge bond, i.e. wedge-to-wedge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/42—Wire connectors; Manufacturing methods related thereto
- H01L2224/47—Structure, shape, material or disposition of the wire connectors after the connecting process
- H01L2224/49—Structure, shape, material or disposition of the wire connectors after the connecting process of a plurality of wire connectors
- H01L2224/491—Disposition
- H01L2224/4911—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain
- H01L2224/49111—Disposition the connectors being bonded to at least one common bonding area, e.g. daisy chain the connectors connecting two common bonding areas, e.g. Litz or braid wires
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1301—Thyristor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/10—Details of semiconductor or other solid state devices to be connected
- H01L2924/11—Device type
- H01L2924/13—Discrete devices, e.g. 3 terminal devices
- H01L2924/1304—Transistor
- H01L2924/1305—Bipolar Junction Transistor [BJT]
- H01L2924/13055—Insulated gate bipolar transistor [IGBT]
Landscapes
- Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
Abstract
Description
【0001】[0001]
【産業上の利用分野】本発明は、絶縁容器による合成樹
脂封止構造のパワー半導体素子に係り、特に比較的高電
圧の車両用インバータ装置に好適なパワー半導体モジュ
ールに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a power semiconductor element having a synthetic resin sealing structure with an insulating container, and more particularly to a power semiconductor module suitable for a vehicle inverter device having a relatively high voltage.
【0002】[0002]
【従来の技術】鉄道車両用のインバータ装置など、比較
的高電圧で大電力の装置に使用するダイオード、トラン
ジスタ、IGBT(絶縁ゲート・バイポーラトランジス
タ)、GTO(ゲート・ターンオフ・サイリスタ)などの
パワー半導体素子としては、従来から平型素子が主流を
占めていたが、近年、絶縁容器に封入してモジュール化
した、いわゆるパワー半導体モジュールが提案され、使
用されるようになってきており、その例を特開昭60−
178650号公報や特開昭61−218151号公
報、或いは特開昭63−143850号公報などにみる
ことができる。2. Description of the Related Art Power semiconductors such as diodes, transistors, IGBTs (insulated gate bipolar transistors) and GTOs (gate turn-off thyristors) used in relatively high voltage and high power devices such as inverters for railway vehicles. As the element, a flat element has conventionally been the mainstream, but in recent years, a so-called power semiconductor module that is encapsulated in an insulating container to be modularized has been proposed and used, and an example thereof is being used. JP-A-60-
It can be found in JP-A-178650, JP-A-61-218151, JP-A-63-143850 and the like.
【0003】このパワー半導体モジュールの従来例につ
いて図3により説明すると、通常、銅板からなるモジュ
ールの取付基板203を備え、これに、ダイオードなど
の半導体素子207がモリブデンなどの板を介してロウ
付けされた銅板などからなる通電部201を、アルミナ
或いはAlN(窒化アルミニウム)などのセラミックスか
らなる絶縁板202を介してロウ付け接合し、これを合
成樹脂製のケース204で封止したものである。A conventional example of this power semiconductor module will be described with reference to FIG. 3. Usually, a module mounting substrate 203 made of a copper plate is provided, to which a semiconductor element 207 such as a diode is brazed via a plate made of molybdenum or the like. A conductive portion 201 made of a copper plate or the like is brazed and joined via an insulating plate 202 made of ceramics such as alumina or AlN (aluminum nitride), and this is sealed with a case 204 made of synthetic resin.
【0004】このケース204は、取付基板203の周
辺部に接着して取付けられ、内部には、通電部201を
覆うようにしてゲル状合成樹脂205が封入される。ま
た、通電部201には電極端子が設けてあり、これによ
り、通電部201の必要な部分への外部からの接続が行
なえるようになっている。The case 204 is attached to the peripheral portion of the mounting substrate 203 by adhesion, and a gel-like synthetic resin 205 is enclosed inside so as to cover the current-carrying portion 201. Further, the current-carrying part 201 is provided with an electrode terminal, which allows external connection to necessary parts of the current-carrying part 201.
【0005】半導体素子207としては、上記したよう
に、ダイオードなど、必要に応じて任意の素子が搭載さ
れるが、中でもIGBTは、電圧制御素子であるため制
御が容易であり、且つ電流容量の大きなものが得やすい
上、高い周波数でも動作可能であるなどの利点があるた
め、広く用いられている。As described above, as the semiconductor element 207, an arbitrary element such as a diode is mounted as necessary. Above all, the IGBT is a voltage control element, so that it is easy to control and has a large current capacity. It is widely used because it is easy to obtain a large one and can operate at a high frequency.
【0006】[0006]
【発明が解決しようとする課題】上記従来技術は、高耐
圧半導体素子のモジュール化について充分な配慮がされ
いるとはいえず、高耐圧で高信頼性の付与の点で問題が
あった。例えば、鉄道車両用のインバータ装置などへの
適用に際しては、電源電圧が600V、或いは1500
Vなどの高電圧であるため、モジュールの通電部と取付
基板の間には、実効電圧5400V耐圧が耐湿特性など
についての高い信頼性のもとで要求される。The above-mentioned prior art cannot be said to give sufficient consideration to modularization of a high breakdown voltage semiconductor element, and has a problem in providing high breakdown voltage and high reliability. For example, when applied to an inverter device for railway vehicles, etc., the power supply voltage is 600 V or 1500
Since it is a high voltage such as V, an effective voltage of 5400V withstand voltage is required between the current-carrying part of the module and the mounting substrate with high reliability such as humidity resistance.
【0007】しかるに、上記従来技術では、以下に説明
するように、高耐圧特性と高信頼性の両立の面で、充分
な対応が困難なのである。すなわち、まず、特開昭60
−178650号公報の技術では、取付基板203に対
するケース204の接着部が、素子の温度上昇による内
圧増加などにより剥離し易く、また、絶縁板202に対
するゲル状合成樹脂205の接着性不良などもあり、こ
の結果、水分が侵入し、取付基板203とゲル状合成樹
脂205の界面を通って絶縁板202の表面の絶縁耐圧
保持部206、更には半導体素子207にまで達して絶
縁特性や素子特性の劣化を起こし易くなり、従って、充
分な耐圧特性と信頼性の付与が困難なのである。However, in the above-mentioned conventional technique, as described below, it is difficult to sufficiently cope with both high withstand voltage characteristics and high reliability. That is, first,
In the technique of Japanese Patent Laid-Open No. 178650, the adhesive portion of the case 204 to the mounting substrate 203 is easily peeled off due to an increase in internal pressure due to the temperature rise of the element, and the adhesiveness of the gel synthetic resin 205 to the insulating plate 202 is poor. As a result, moisture penetrates, passes through the interface between the mounting substrate 203 and the gel-like synthetic resin 205, reaches the withstand voltage holding portion 206 on the surface of the insulating plate 202, and further reaches the semiconductor element 207 to reach the insulation characteristic and the element characteristic. Deterioration is likely to occur, and thus it is difficult to provide sufficient withstand voltage characteristics and reliability.
【0008】一方、特開昭61−218151号公報に
記載の技術では、絶縁基板及び取付基板と、ケースの間
に硬質の合成樹脂を充填しており、従って、この技術に
よれば、取付基板からのケースの剥離についての問題は
少なくなるが、この充填された硬質の合成樹脂がケース
の角部で亀裂を生じ易く、この亀裂部分で放電が起こる
ようになり、やはり絶縁特性の劣化が避けられないとい
う問題があった。On the other hand, in the technique described in Japanese Patent Laid-Open No. 61-218151, a hard synthetic resin is filled between the insulating substrate and the mounting substrate and the case. Therefore, according to this technique, the mounting substrate is Although the problem of peeling the case from the case is reduced, this filled hard synthetic resin is likely to crack at the corners of the case, and discharge will occur at this crack part, and also deterioration of insulation characteristics is avoided. There was a problem that I could not.
【0009】本発明の目的は、必要な高耐圧特性を備
え、しかも充分に高い信頼性を容易にもたせることがで
きる合成樹脂モールドによるパワー半導体モジュールを
提供することにある。また、本発明の他の目的は、上記
したパワー半導体モジュールを用いることにより、信頼
性の高い車両用インバータ装置を提供することにある。An object of the present invention is to provide a power semiconductor module using a synthetic resin mold which has the necessary high withstand voltage characteristics and can easily have sufficiently high reliability. Another object of the present invention is to provide a highly reliable vehicle inverter device by using the above power semiconductor module.
【0010】[0010]
【課題を解決するための手段】上記目的は、半導体素子
と電極端子が取付けられた通電部を、絶縁基板を介して
取付基板に積層し、該取付基板の周辺部にケースを接着
して通電部を封止する方式のパワー半導体モジュールに
おいて、取付基板に対するケースの接着部分の内面にゴ
ム状合成樹脂の被覆を設けることにより達成される。SUMMARY OF THE INVENTION The above-mentioned object is to energize a current-carrying portion, to which a semiconductor element and an electrode terminal are attached, by stacking it on an attachment substrate via an insulating substrate and adhering a case to the periphery of the attachment substrate. This is achieved by providing a rubber-like synthetic resin coating on the inner surface of the bonding portion of the case to the mounting substrate in the power semiconductor module of the type in which the parts are sealed.
【0011】更に、上記目的は、ゴム状合成樹脂の被覆
を、取付基板の周辺部から絶縁基板の周辺部の端面を経
て少なくとも通電部の周辺部の端面に至る沿面に設ける
ことにより達成される。Further, the above object is achieved by providing a rubber-like synthetic resin coating on the creeping surface extending from the peripheral portion of the mounting substrate to the peripheral portion of the insulating substrate to at least the peripheral portion of the conducting portion. .
【0012】[0012]
【作用】取付基板の周辺部から絶縁基板の周辺部の端面
を経て少なくとも通電部の周辺部の端面に至る沿面に設
けたゴム状合成樹脂は、取付基板に対するケースの接着
部分の内面を覆うので、この部分での剥離を抑えるよう
に働く。従って、ケースの剥離による信頼性の低下の虞
れは無くなる。Since the rubber-like synthetic resin provided on the surface extending from the peripheral portion of the mounting substrate to the peripheral end face of the insulating substrate to at least the peripheral end face of the conducting portion covers the inner surface of the adhesive portion of the case to the mounting substrate. , It works to suppress peeling in this part. Therefore, there is no fear that the reliability may decrease due to the peeling of the case.
【0013】また、このゴム状合成樹脂は弾力性に富む
ので、ケースの角部でも亀裂発生の虞れが無く、さらに
また、絶縁基板の表面にも確実に接着するので、この部
分での耐圧特性劣化の虞れは無くなる。従って、高耐圧
で、しかも高信頼性のパワー半導体モジュールを確実に
得ることができる。Further, since this rubber-like synthetic resin is rich in elasticity, there is no fear of cracking even at the corners of the case, and furthermore, it adheres surely to the surface of the insulating substrate, so that the pressure resistance at this part is high. There is no fear of characteristic deterioration. Therefore, it is possible to reliably obtain a highly reliable power semiconductor module having a high breakdown voltage.
【0014】さらに、本発明では、モジュールの内部の
半導体素子の表面を覆うようにゲル状合成樹脂を封入し
てやることにより、ボンディングワイヤなど半導体素子
との接続部分に、封止用の合成樹脂による熱応力が加わ
る虞れを無くすことができるので、ワイヤ接合部での剥
離発生の虞れが無く、また、ワイヤの腐食なども起こり
難くくなり、さらに信頼性の向上が図れる。Further, according to the present invention, by encapsulating the gel-like synthetic resin so as to cover the surface of the semiconductor element inside the module, the connecting portion such as the bonding wire with the semiconductor element is heated by the synthetic resin for sealing. Since it is possible to eliminate the risk of stress being applied, there is no risk of peeling at the wire bonding portion, and corrosion of the wire is less likely to occur, further improving reliability.
【0015】また、このとき、ゴム状合成樹脂で被覆さ
れた絶縁基板の表面での絶縁耐圧保持部における通電部
から取付基板までの沿面距離を少なくとも2mmにする
ことにより、実効電圧5400V以上の絶縁耐力を容易
に付与することができる。Further, at this time, by setting the creepage distance from the current-carrying portion in the dielectric strength holding portion on the surface of the insulating substrate covered with the rubber-like synthetic resin to the mounting substrate to be at least 2 mm, insulation of an effective voltage of 5400 V or more is obtained. Proof strength can be easily imparted.
【0016】[0016]
【実施例】以下、本発明によるパワー半導体モジュール
について、図示の実施例により詳細に説明する。図1と
図2は、本発明によるパワー半導体モジュールをダイオ
ードとして実施した場合の一実施例で、図1は断面図、
図2は同じく内部の平面図で、図1のA−A'線による
断面であり、これらの図において、101は取付基板、
102は絶縁基板、103は通電部、104は半導体素
子、105は金属板、106は電極端子、107はAl
ワイヤ、108は接着剤、109は合成樹脂製のケー
ス、110はゴム状合成樹脂層、111はゲル状合成樹
脂層、112は硬質合成樹脂層、113は接着部、そし
て114は絶縁耐圧保持部をそれぞれ表わす。The power semiconductor module according to the present invention will be described in detail below with reference to the embodiments shown in the drawings. 1 and 2 show an embodiment in which the power semiconductor module according to the present invention is implemented as a diode. FIG. 1 is a sectional view,
FIG. 2 is also a plan view of the inside, which is a cross section taken along the line AA ′ of FIG. 1. In these figures, 101 is a mounting substrate,
102 is an insulating substrate, 103 is a conducting part, 104 is a semiconductor element, 105 is a metal plate, 106 is an electrode terminal, and 107 is Al.
A wire, 108 is an adhesive, 109 is a synthetic resin case, 110 is a rubber-like synthetic resin layer, 111 is a gel-like synthetic resin layer, 112 is a hard synthetic resin layer, 113 is an adhesive portion, and 114 is a dielectric strength holding portion. Respectively.
【0017】取付基板101は、銅(Cu)などの熱伝導
性に富んだ材料で作られ、その一方の面には、アルミナ
或いはAlN(窒化アルミニウム)などのセラミックスか
らなる絶縁基板102を介して通電部103が、半田や
銀ロウなどのろう材によりロウ付け接合されている。The mounting substrate 101 is made of a material having a high thermal conductivity such as copper (Cu), and one surface of the mounting substrate 101 is covered with an insulating substrate 102 made of ceramics such as alumina or AlN (aluminum nitride). The current-carrying portion 103 is brazed and joined with a brazing material such as solder or silver solder.
【0018】通電部103は、銅などの材料からなる金
属板105と、その表面にロウ付けされた半導体素子1
04、それに電極端子106とで構成されている。そし
て、半導体素子104と一方の電極端子106の間は、
複数本のAlワイヤ107でボンディングされている。
なお、このため、図示のように、この一方の電極端子1
06はは、絶縁物の台を介して金属板105に取付けて
ある。そして、Alワイヤ107が複数本用いられてい
るのは、電流容量を増すためである。The current-carrying portion 103 is a metal plate 105 made of a material such as copper, and the semiconductor element 1 brazed to the surface thereof.
04, and the electrode terminal 106. Then, between the semiconductor element 104 and the one electrode terminal 106,
Bonding is performed with a plurality of Al wires 107.
Therefore, as shown in the figure, the electrode terminal 1
06 is attached to the metal plate 105 via an insulator base. The reason why a plurality of Al wires 107 are used is to increase the current capacity.
【0019】図2は、上記したように、内部の平面図で
あるが、ここでは、ゲル状合成樹脂層111は除いて示
されている。そして、この図2から明らかなように、こ
の実施例では、半導体素子104が3個搭載され、これ
により電流容量を大きくしたモジュールとなっている。As described above, FIG. 2 is a plan view of the inside, but the gel-like synthetic resin layer 111 is omitted here. Then, as is apparent from FIG. 2, in this embodiment, three semiconductor elements 104 are mounted to form a module having a large current capacity.
【0020】なお、この実施例では、金属板105の、
図では上になる面が台形に作られ、この台形の部分に半
導体素子104がロウ付けされているが、これは、必ず
しも必要条件ではない。また、この金属板105として
は、銅板にモリブデンの板を接合したものを用いても良
いことは、言うまでもない。In this embodiment, the metal plate 105 is
In the figure, the upper surface is made trapezoidal, and the semiconductor element 104 is brazed to this trapezoidal portion, but this is not necessarily a necessary condition. Further, it goes without saying that a metal plate 105 joined to a molybdenum plate may be used as the metal plate 105.
【0021】ケース109は、例えばPPS(ポリフェ
ニレン・サルファイト)、或いはPBT(ポリブチレン・
テレフタレート)などの合成樹脂で作られ、取付基板1
01の周辺部にある接着部113に、接着剤108によ
り接着されている。なお、このケース109には電極端
子106が通る孔が設けてあり、この孔に電極端子10
6を挿入した状態で取付基板101に接着し、その後、
電極端子106の外部に出ている部分を折り曲げて図示
の状態に成形するのである。The case 109 is, for example, PPS (polyphenylene sulfite) or PBT (polybutylene.
Mounting board 1 made of synthetic resin such as terephthalate)
The adhesive portion 108 is adhered to the adhesive portion 113 in the peripheral portion of 01. The case 109 is provided with a hole through which the electrode terminal 106 passes, and the electrode terminal 10 is inserted into this hole.
6 is attached to the mounting substrate 101 with the inserted state, and then
The portion of the electrode terminal 106 that is exposed to the outside is bent and molded into the state shown in the figure.
【0022】そして、この実施例では、このようにして
ケース109の接着を終わった後、内部に、例えばシリ
コーンゴムなどからなるゴム状合成樹脂と、シリコーン
ゲルなどからなるゲル状合成樹脂、それにエポキシ樹脂
などからなる硬質合成樹脂を順次、注入し、それぞれゴ
ム状合成樹脂層110と、ゲル状合成樹脂層111、そ
れに硬質合成樹脂層112を設け、必要な部分への被覆
と封止を行なう。In this embodiment, after the case 109 has been bonded in this way, a rubber-like synthetic resin made of, for example, silicone rubber, a gel-like synthetic resin made of silicone gel, and an epoxy resin are provided inside. A hard synthetic resin such as a resin is sequentially injected, and a rubber-like synthetic resin layer 110, a gel-like synthetic resin layer 111, and a hard synthetic resin layer 112 are respectively provided to cover and seal necessary parts.
【0023】これらの合成樹脂の封入は、注入された樹
脂量を、例えば光や音波などにより検出しながら、それ
ぞれ適正な量に制御するようにした注入装置を用いて行
なうのであるが、まず、最初にゴム状合成樹脂を注入し
て、ゴム状合成樹脂層110を形成し、取付基板101
とケース109との接着部113と、絶縁基板102の
表面の絶縁耐圧保持部114とが被覆されるようにす
る。The encapsulation of these synthetic resins is carried out by using an injecting device which controls the injected resin amount to an appropriate amount while detecting it by, for example, light or sound waves. First, a rubber-like synthetic resin is injected to form a rubber-like synthetic resin layer 110, and the mounting substrate 101
The adhesion portion 113 between the case 109 and the case 109 is covered with the withstand voltage holding portion 114 on the surface of the insulating substrate 102.
【0024】次に、ゲル状合成樹脂をゴム状合成樹脂層
110の上に注入し、ゲル状合成樹脂層111を形成
し、半導体素子104とワイヤ107、それに電極端子
106などが覆われるようにする。そして、その後、エ
ポキシ樹脂を注入して硬化させることにより硬質合成樹
脂層112を形成して、残った空間を充填し、電極端子
106を固定するのである。Next, a gel-like synthetic resin is injected onto the rubber-like synthetic resin layer 110 to form a gel-like synthetic resin layer 111 so that the semiconductor element 104, the wire 107, and the electrode terminal 106 are covered. To do. Then, after that, an epoxy resin is injected and cured to form a hard synthetic resin layer 112, fill the remaining space, and fix the electrode terminal 106.
【0025】図4は、絶縁基板102の絶縁耐圧保持部
114の近傍を拡大してゴム状合成樹脂層110の充填
状態を示した拡大図で、この実施例における絶縁耐圧
は、通電部103と取付基板101との間の絶縁距離に
よって定まるが、このとき、この絶縁距離が最小になる
のは、通電部103の直下の部分になる。FIG. 4 is an enlarged view showing the filled state of the rubber-like synthetic resin layer 110 by enlarging the vicinity of the withstand voltage holding portion 114 of the insulating substrate 102. The withstand voltage in this embodiment is the same as that of the conducting portion 103. It depends on the insulation distance from the mounting substrate 101, but at this time, the insulation distance is minimized in the portion directly below the current-carrying portion 103.
【0026】しかしながら、この部分には絶縁基板10
2があるので、その厚さを、例えば0.635mmとする
ことにより、この部分での絶縁耐圧としては、実効電圧
で10000V以上を容易に得ることができる。However, the insulating substrate 10 is provided in this portion.
Since there are two, by setting the thickness to, for example, 0.635 mm, it is possible to easily obtain an effective voltage of 10,000 V or more as the withstand voltage in this portion.
【0027】一方、次に、この実施例で、必要な絶縁耐
圧を得るために考慮しなければならない部分は、通電部
103と取付基板101との間の沿面距離である。そし
て、この沿面距離をLとすれば、これは、図示したよう
に、通電部103の端部から露出した絶縁基板102の
端部の長さL1と、その厚さL2との和、つまり、L=
L1+L2となる。On the other hand, in this embodiment, the creeping distance between the current-carrying part 103 and the mounting substrate 101 is a part to be taken into consideration in order to obtain the necessary withstand voltage. If this creepage distance is L, this is the sum of the length L1 of the end portion of the insulating substrate 102 exposed from the end portion of the conducting portion 103 and the thickness L2 thereof, that is, L =
It becomes L1 + L2.
【0028】そして、この実施例では、ここにはゴム状
合成樹脂層110が被覆されているので、この材質を上
記したように、シリコーンゴムとした場合、沿面距離L
として、2mm以上を設定することにより、実効電圧54
00V以上の絶縁耐圧を安定して得ることができる。従
って、上記したように、絶縁基板102の厚さL2を
0.635mmとした場合には、長さL1として、1.36
5mm以上が与えられるようにしてやればよいことにな
る。In this embodiment, since the rubber-like synthetic resin layer 110 is covered here, when the material is silicone rubber as described above, the creeping distance L
As a result, by setting 2 mm or more, the effective voltage 54
A withstand voltage of 00 V or higher can be stably obtained. Therefore, as described above, when the thickness L2 of the insulating substrate 102 is 0.635 mm, the length L1 is 1.36.
It should be done so that 5 mm or more is given.
【0029】また、この実施例では、図1、図2、それ
に図4から明らかなように、ゴム状合成樹脂層110
は、ケース109と取付基板101の接着部113をも
覆って設けられており、しかも、その接着強度が高いの
で、モジュールの組立工程、或いは完成品を使用してい
るときでの温度変化によるケース109の内圧変化に際
しても、ケース109と取付基板101の接着部113
で剥離が発生する虞れがほとんど無く、また、多少の剥
離に際しても、ゴム状合成樹脂層110に亀裂を生じる
ことはないから、水分が侵入する虞れは無く、従って、
耐湿性が充分に保持されるので、絶縁特性や素子特性の
劣化が無く、確実に高い信頼性を得ることができる。Further, in this embodiment, as is clear from FIGS. 1, 2 and 4, the rubber-like synthetic resin layer 110.
Is also provided so as to cover the case 109 and the adhesive portion 113 of the mounting substrate 101, and since the adhesive strength is high, the case due to temperature changes during the module assembly process or when the finished product is used. Even when the internal pressure of 109 changes, the adhesive portion 113 between the case 109 and the mounting substrate 101
There is almost no possibility that peeling will occur, and since the rubber-like synthetic resin layer 110 will not crack even when peeling a little, there is no risk of water intrusion, and therefore,
Since the moisture resistance is sufficiently maintained, the insulation characteristics and element characteristics are not deteriorated, and high reliability can be reliably obtained.
【0030】一方、この実施例では、ゴム状合成樹脂層
110が金属板105の周辺部に限定して設けてあり、
半導体素子104の表面には施されていない。このた
め、温度変化に際して、このゴム状合成樹脂層110に
応力が発生しても、ワイヤ107に応力が与えられるこ
とは無く、従って、ワイヤの剥離による断線故障の虞れ
を充分に除くことができる。On the other hand, in this embodiment, the rubber-like synthetic resin layer 110 is provided only in the peripheral portion of the metal plate 105,
It is not applied to the surface of the semiconductor element 104. Therefore, even if stress is generated in the rubber-like synthetic resin layer 110 when the temperature changes, stress is not applied to the wire 107, and therefore the risk of disconnection failure due to peeling of the wire can be sufficiently eliminated. it can.
【0031】なお、このめには、ゴム状合成樹脂の注入
量を厳密に管理する必要があるが、この実施例によれ
ば、金属板105が設けられているので、その厚みを、
例えば1mm以上にしてやれば、半導体素子104の位置
や、この金属板105に対する電極端子106の取付位
置は、絶縁基板102よりも充分に高い位置にすること
ができるので、ゴム状合成樹脂層110の厚さが多少変
動しても問題がなく、従って、ゴム状合成樹脂の注入量
の管理に厳密さが要求されず、適当な注入作業によって
も充分に所期の性能を得ることができるという利点があ
る。For this purpose, it is necessary to strictly control the injection amount of the rubber-like synthetic resin, but according to this embodiment, since the metal plate 105 is provided, its thickness is
For example, if the distance is set to 1 mm or more, the position of the semiconductor element 104 and the mounting position of the electrode terminal 106 to the metal plate 105 can be set to a position sufficiently higher than the insulating substrate 102. There is no problem even if the thickness fluctuates a little, and therefore strict control of the injection amount of the rubber-like synthetic resin is not required, and it is possible to obtain the desired performance even with an appropriate injection work. There is.
【0032】ところで、この実施例におけるゴム状合成
樹脂層110の材質としては、上記したように、シリコ
ーン系の合成樹脂を用いればよいが、ポリイミド系の合
成樹脂を用いて実施してもよい。By the way, as the material of the rubber-like synthetic resin layer 110 in this embodiment, a silicone type synthetic resin may be used as described above, but a polyimide type synthetic resin may be used.
【0033】また、上記実施例では、ゲル状合成樹脂層
111の上に更に硬質合成樹脂層112が封入されてい
るが、本発明は、この硬質合成樹脂層112を省いた構
成にしても実施可能である。Further, in the above embodiment, the hard synthetic resin layer 112 is further enclosed on the gel synthetic resin layer 111, but the present invention can be implemented even if the hard synthetic resin layer 112 is omitted. It is possible.
【0034】次に、図5は、本発明の他の一実施例で、
この実施例では、図1、図2の実施例における絶縁基板
102と金属板105に代えて、絶縁基板上に予め金属
板をロウ付けした、いわゆるDBC(ダイレクト・ボン
デッド・カッパー)基板102Aを用いたものである。Next, FIG. 5 shows another embodiment of the present invention.
In this embodiment, a so-called DBC (Direct Bonded Copper) substrate 102A in which a metal plate is previously brazed on the insulating substrate is used in place of the insulating substrate 102 and the metal plate 105 in the embodiment of FIGS. It was what I had.
【0035】そして、この結果、この実施例では、半導
体素子104がロウ付けされた金属板が台形になってい
ない平坦な形状になっていて、しかも、その厚さが薄く
なっているので、ゴム状合成樹脂層110の断面の形状
を、図示のように成形したものである。As a result, in this embodiment, since the metal plate to which the semiconductor element 104 is brazed is not trapezoidal but has a flat shape and the thickness thereof is thin, the rubber is reduced. The cross-sectional shape of the synthetic resin layer 110 is molded as illustrated.
【0036】次に、図6と図7は、本発明をIGBTパ
ワーモジュールとして実施した場合の一実施例で、図6
は断面図で、そのB−B'線による断面で示した平面図
が図7である。この実施例は、例えばインバータ装置の
スイッチング素子として好適なIGBTパワーモジュー
ルであり、このため、特に図7から明らかなように、6
個のIGBT半導体素子104Aと、2個のダイオード
半導体素子104Bが搭載されており、ここで半導体素
子104Aがスイッチング素子用で、半導体素子104
Bがフライホィールダイオード用である。Next, FIGS. 6 and 7 show an embodiment in which the present invention is implemented as an IGBT power module.
Is a sectional view, and FIG. 7 is a plan view showing a section taken along the line BB ′. This embodiment is, for example, an IGBT power module suitable as a switching element of an inverter device. Therefore, as apparent from FIG.
One IGBT semiconductor element 104A and two diode semiconductor elements 104B are mounted. Here, the semiconductor element 104A is for a switching element, and the semiconductor element 104
B is for the flywheel diode.
【0037】そして、この実施例でも、その他の構成
は、図1と図2で説明した実施例と同じで、ゴム状合成
樹脂層110が設けてあり、従って、この実施例によっ
ても、モジュールの組立工程、或いは完成品を使用して
いるときでの温度変化によるケース109の内圧変化に
際しても、ケース109と取付基板101の接着部11
3で剥離が発生する虞れがほとんど無く、また、多少の
剥離に際しても、ゴム状合成樹脂層110に亀裂を生じ
ることはないから、水分が侵入する虞れは無く、このた
め、耐湿性が充分に保持されるので、絶縁特性や素子特
性の劣化が無く、確実に高い信頼性を得ることができ
る。Also, in this embodiment, the other structure is the same as that of the embodiment described with reference to FIGS. 1 and 2, and the rubber-like synthetic resin layer 110 is provided. Therefore, according to this embodiment, the module of the module is also provided. Even when the internal pressure of the case 109 changes due to temperature changes during the assembly process or when using the finished product, the adhesive portion 11 between the case 109 and the mounting substrate 101
There is almost no risk of peeling in No. 3, and even when peeling a little, there is no risk of cracks in the rubber-like synthetic resin layer 110, so there is no risk of water intrusion, and therefore moisture resistance is high. Since it is sufficiently held, there is no deterioration in insulation characteristics and element characteristics, and high reliability can be reliably obtained.
【0038】次に、図8と図9は、図1と図2で説明し
た実施例の一部を変更した場合の一実施例で、図8は断
面図で、そのC−C'線による断面で示した平面図が図
9である。そして、この図8と図9の実施例が、図1と
図2の実施例と異なる点は、ゴム状合成樹脂層110を
設けた範囲が金属板105の周辺部までに限定されてい
ないで、図示のように、半導体素子104の周辺端部か
ら上面の一部にまで及んでいて、そこにもゴム状合成樹
脂層110Aが設けられている点だけで、その他の構成
は、図1、図2の実施例と同じである。Next, FIGS. 8 and 9 show an embodiment in which a part of the embodiment described with reference to FIGS. 1 and 2 is modified, and FIG. 8 is a sectional view taken along the line CC ′. FIG. 9 is a plan view showing a cross section. The embodiment of FIGS. 8 and 9 differs from the embodiment of FIGS. 1 and 2 in that the range in which the rubber-like synthetic resin layer 110 is provided is not limited to the peripheral portion of the metal plate 105. As shown in the figure, only the point that the peripheral edge portion of the semiconductor element 104 extends to a part of the upper surface, and the rubber-like synthetic resin layer 110A is also provided there, the other configuration is as shown in FIG. This is the same as the embodiment of FIG.
【0039】半導体素子104は、図1、図2の実施例
で説明したように、ダイオード素子であり、従って、そ
の周辺端面にpn接合からなるプレーナーターミネーシ
ョン領域を有する。そして、このプレーナーターミネー
ション領域の厚さ寸法は、素子の耐圧値によって異なっ
ているが、通例、1mm前後であり、この領域で1000
Vから4000Vの素子耐圧を受け持っており、従っ
て、水分などによる影響が著しく、素子耐圧の劣化が極
めて生じ易い。The semiconductor element 104 is a diode element as described in the embodiments of FIGS. 1 and 2, and therefore has a planar termination region formed of a pn junction on its peripheral end face. The thickness of the planar termination region varies depending on the breakdown voltage of the element, but is usually around 1 mm, and the thickness of this region is 1000 mm.
The device withstands a device breakdown voltage of from V to 4000 V, and is therefore significantly affected by moisture and the like, and the breakdown voltage of the device is extremely likely to deteriorate.
【0040】しかるに、この実施例では、ゴム状合成樹
脂層110が半導体素子104のプレーナーターミネー
ション領域から、その上の面にまで達していて、そこに
ゴム状合成樹脂層110Aが形成されており、従って、
このプレーナーターミネーション領域は水分などの侵入
から充分に保護されることになり、このため、さらに高
い信頼性を得ることができる。However, in this embodiment, the rubber-like synthetic resin layer 110 extends from the planar termination region of the semiconductor element 104 to the upper surface thereof, and the rubber-like synthetic resin layer 110A is formed there. Therefore,
This planar termination region is sufficiently protected from intrusion of moisture and the like, and therefore, higher reliability can be obtained.
【0041】次に、図12は、本発明の更に別の一実施
例で、図において、120は仕切部材で、その他の構成
は図1、図2に示した実施例と同じである。Next, FIG. 12 shows still another embodiment of the present invention. In the figure, reference numeral 120 is a partition member, and other structures are the same as those of the embodiment shown in FIGS.
【0042】仕切部材120は、例えばケース109と
同じ材質の合成樹脂材料により、図で上から見た平面形
状が金属板105とほぼ同じ形状の枠状に作られてお
り、これにより金属板105の周辺部の外側と内側を区
画する働きをするようにしてある。そして、この仕切部
材120は、金属板105の上に載置され、その外側に
ゴム状合成樹脂を選択的に注入してゴム状合成樹脂層1
10を形成することにより、モジュールの中に固定され
るようになっている。The partition member 120 is made of, for example, a synthetic resin material of the same material as that of the case 109 so as to have a frame shape whose plan view seen from above is substantially the same as that of the metal plate 105. It is designed to partition the outside and inside of the peripheral part. The partition member 120 is placed on the metal plate 105, and the rubber-like synthetic resin is selectively injected into the outer side of the metal plate 105 to form the rubber-like synthetic resin layer 1.
By forming 10, it is adapted to be fixed in the module.
【0043】そして、この後、仕切部材120の内側に
ゲル状合成樹脂を注入して、半導体素子104を含む通
電部全体をゲル状合成樹脂層111で覆い、さらにその
後、硬質合成樹脂層112を形成してモジュールを完成
するのである。Then, after that, a gel-like synthetic resin is injected into the inside of the partition member 120 to cover the entire conducting portion including the semiconductor element 104 with the gel-like synthetic resin layer 111, and thereafter, the hard synthetic resin layer 112 is formed. Form it to complete the module.
【0044】この実施例によれば、ゲル状合成樹脂層1
11の注入範囲が限定できるので、熱膨張係数の大きな
ゴム状合成樹脂層110とゲル状合成樹脂層111の総
量(体積)を減らすことができ、この結果、半導体素子
104の発熱による内部温度上昇時での内圧の増加が抑
えられ、半田接合部などへの応力が緩和されることによ
る信頼性の向上が得られる。According to this embodiment, the gel-like synthetic resin layer 1
Since the injection range of 11 can be limited, the total amount (volume) of the rubber-like synthetic resin layer 110 and the gel-like synthetic resin layer 111 having a large thermal expansion coefficient can be reduced, and as a result, the internal temperature rise due to the heat generation of the semiconductor element 104. The increase of the internal pressure at the time is suppressed, and the stress on the solder joint portion is relieved, so that the reliability is improved.
【0045】なお、この実施例でも、図8、図9の実施
例と同様に、半導体素子104の周辺部までゴム状合成
樹脂層110を設けるようにしてもよい。また、硬質合
成樹脂層112を設けないようにして実施してもよい。In this embodiment as well, similar to the embodiment of FIGS. 8 and 9, the rubber-like synthetic resin layer 110 may be provided up to the peripheral portion of the semiconductor element 104. Alternatively, the hard synthetic resin layer 112 may be omitted.
【0046】ところで、以上の説明では、特に言及しな
かったが、取付基板101と絶縁基板102の表面、そ
れにケース109の内面で、少なくともゲル状合成樹脂
に触れる部分の面を粗く加工しておくようにしてもよ
い。この場合には、ゲル状合成樹脂層との接合状態が良
好になるため、さらに優れた保護特性を得ることができ
る。Incidentally, although not particularly mentioned in the above description, at least the surfaces of the mounting substrate 101 and the insulating substrate 102 and the inner surface of the case 109, which are in contact with the gel synthetic resin, are roughened. You may do it. In this case, the state of joining with the gel-like synthetic resin layer becomes good, and thus more excellent protection characteristics can be obtained.
【0047】また、上記実施例においては、ゴム状合成
樹脂層110が金属板105の周辺部の端面にまで設け
られているが、本発明の実施例としては、取付基板10
1とケース109の接合部108の内面にだけゴム状合
成樹脂層を設け、他の部分には、硬質合成樹脂を被覆し
た構造にしても良い。この実施例の場合には、モジュー
ルの機械的強度が大きく向上するので、後述する縦置き
配置に適したものとすることができる。Further, in the above-mentioned embodiment, the rubber-like synthetic resin layer 110 is provided up to the end face of the peripheral portion of the metal plate 105, but in the embodiment of the present invention, the mounting substrate 10 is used.
A rubber-like synthetic resin layer may be provided only on the inner surface of the joint portion 108 between the case 1 and the case 109, and the other portion may be covered with a hard synthetic resin. In the case of this embodiment, since the mechanical strength of the module is greatly improved, it can be made suitable for the vertical arrangement described later.
【0048】以上の説明から明らかなように、本発明に
よるパワー半導体モジュールによれば、モジュールの内
部で安定した高耐圧絶縁特性と耐湿性が得られているの
で、電力装置などに組み込んだとき、従来の平型素子な
どのように、素子外部に必要とした絶縁構造が不要にな
り、このため、システム構成が単純化され、組立が簡略
化されると共に、保守も容易になるという利点が得られ
る。例えば、車両用インバータ装置に本発明のパワー半
導体モジュールを適用した場合には、従来の平型素子で
必要とした圧接構造及び圧接組立工程が不要になる。As is clear from the above description, according to the power semiconductor module of the present invention, stable high-voltage insulation characteristics and moisture resistance are obtained inside the module. It eliminates the need for an insulation structure outside of the element, such as with conventional flat elements, which simplifies the system configuration, simplifies assembly, and facilitates maintenance. To be For example, when the power semiconductor module of the present invention is applied to a vehicle inverter device, the pressure contact structure and the pressure contact assembly process required for the conventional flat element are not necessary.
【0049】次に、図11は、本発明によるパワー半導
体モジュールMを、インバータ装置などのシステムに適
用した場合の配置状態を示す一実施例で、図において、
HSはヒートシンクである。なお、101は、上記した
ように、パワー半導体モジュールMの取付基板である。
従来のパワー半導体モジュールでは、通常、モジュール
の取付基板を下にして水平に配置している。従って、こ
の場合には、取付基板の底面は、重力方向に対して直角
に配置されている。Next, FIG. 11 is an embodiment showing the arrangement state when the power semiconductor module M according to the present invention is applied to a system such as an inverter device.
HS is a heat sink. In addition, 101 is a mounting substrate of the power semiconductor module M as mentioned above.
In a conventional power semiconductor module, the module mounting substrate is normally placed horizontally. Therefore, in this case, the bottom surface of the mounting substrate is arranged at a right angle to the direction of gravity.
【0050】しかして、この図11の実施例では、図示
のように、パワー半導体モジュールMの取付基板101
が、縦になっているヒートシンクSMの取付面に固定さ
れていて、取付基板101の底面は、重力方向と平行に
なっている。Therefore, in the embodiment of FIG. 11, the mounting substrate 101 of the power semiconductor module M is, as shown in the figure.
However, it is fixed to the mounting surface of the vertical heat sink SM, and the bottom surface of the mounting substrate 101 is parallel to the direction of gravity.
【0051】そして、このように、取付基板101の底
面が重力方向と平行にして配置した場合、従来技術によ
るモジュールでは、半田接合された通電部など、モジュ
ール内部の構成部品がゲル状合成樹脂で被覆されている
だけなので、重力による力が半田接合部分に対して剪断
応力として常時作用した結果、半田のクリープにより接
合部で亀裂が発生する虞れがあり、信頼性の低下につな
がってしまう。When the bottom surface of the mounting substrate 101 is arranged in parallel with the direction of gravity as described above, in the module according to the prior art, the components inside the module such as the solder-bonded current-carrying parts are made of gel-like synthetic resin. Since it is only covered, the force due to gravity always acts on the solder joint portion as shear stress, and as a result, there is a possibility that cracks may occur at the joint portion due to creep of the solder, leading to a decrease in reliability.
【0052】一方、本発明によるパワー半導体モジュー
ルMの場合には、上記したように、ゴム状合成樹脂層1
10が設けてあるため、これによる固定作用が得られる
ことになり、モジュール内部の構成部品の固定が充分に
与えられている。そこで、この結果、半田接合された通
電部などでの重力による剪断応力の発生が充分に抑えら
れるので、縦配置した場合でも充分に高い信頼性を保つ
ことができ、従って、本発明によるパワー半導体モジュ
ールを用いた場合には、縦配置により車両用インバータ
装置を充分に小型化することができる。On the other hand, in the case of the power semiconductor module M according to the present invention, as described above, the rubber-like synthetic resin layer 1 is used.
Since 10 is provided, the fixing action by this is obtained, and the components inside the module are sufficiently fixed. As a result, as a result, the generation of shear stress due to gravity in the current-carrying parts joined by soldering can be sufficiently suppressed, so that it is possible to maintain sufficiently high reliability even in the case of vertical arrangement, and therefore the power semiconductor according to the present invention. When the module is used, the vehicle inverter device can be sufficiently miniaturized by the vertical arrangement.
【0053】[0053]
【発明の効果】以上説明したように、本発明によれば、
取付基板とケースの接着部分での剥離発生が充分に抑え
られるので、水分の侵入などによる絶縁耐圧特性や素子
特性の劣化を生じすることがなくなり、高い信頼性を備
えた高耐圧半導体装置を容易にモジュール化することが
できる。As described above, according to the present invention,
Since the occurrence of peeling between the mounting substrate and the case where the case is bonded can be sufficiently suppressed, deterioration of dielectric strength characteristics and element characteristics due to moisture intrusion will not occur, and high-voltage semiconductor devices with high reliability can be easily manufactured. It can be modularized.
【図1】本発明によるパワー半導体モジュールの一実施
例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of a power semiconductor module according to the present invention.
【図2】図1のA−A'線から見た内部の平面図であ
る。FIG. 2 is a plan view of the inside as seen from the line AA ′ in FIG.
【図3】パワー半導体モジュールの従来例を示す断面図
である。FIG. 3 is a sectional view showing a conventional example of a power semiconductor module.
【図4】本発明の一実施例の一部を拡大して示した断面
図である。FIG. 4 is a sectional view showing a part of an embodiment of the present invention in an enlarged manner.
【図5】本発明の第二の実施例を示す断面図である。FIG. 5 is a sectional view showing a second embodiment of the present invention.
【図6】本発明の第三の実施例を示す断面図である。FIG. 6 is a sectional view showing a third embodiment of the present invention.
【図7】図6のB−B'線から見た内部の平面図であ
る。FIG. 7 is a plan view of the inside viewed from the line BB ′ of FIG.
【図8】本発明の第四の実施例を示す断面図である。FIG. 8 is a sectional view showing a fourth embodiment of the present invention.
【図9】図8のC−C'線から見た内部の平面図であ
る。FIG. 9 is a plan view of the inside viewed from the line CC ′ in FIG. 8.
【図10】本発明の第五の実施例を示す断面図である。FIG. 10 is a sectional view showing a fifth embodiment of the present invention.
【図11】本発明によるパワー半導体モジュールの配置
状態の一例を示す説明図である。FIG. 11 is an explanatory diagram showing an example of an arrangement state of power semiconductor modules according to the present invention.
101 取付基板 102 絶縁基板 103 通電部 104 半導体素子 105 金属板 106 電極端子 107 ワイヤ 108 接着剤 109 ケース 110 ゴム状合成樹脂層 111 ゲル状合成樹脂層 112 硬質合成樹脂 101 Mounting Substrate 102 Insulating Substrate 103 Conductor 104 Semiconductor Element 105 Metal Plate 106 Electrode Terminal 107 Wire 108 Adhesive 109 Case 110 Rubber-like Synthetic Resin Layer 111 Gel-like Synthetic Resin Layer 112 Hard Synthetic Resin
───────────────────────────────────────────────────── フロントページの続き (72)発明者 脇澤 祐二 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Yuji Wakizawa 7-1-1 Omika-cho, Hitachi-shi, Ibaraki Hitachi Ltd. Hitachi Research Laboratory
Claims (6)
電部を、絶縁基板を介して取付基板に積層し、該取付基
板の周辺部に合成樹脂製のケースを接着して上記通電部
を封止する方式のパワー半導体モジュールにおいて、上
記取付基板に対する上記ケースの接着部分の内面にゴム
状合成樹脂の被覆が設けられていることを特徴とするパ
ワー半導体モジュール。1. A conductive element, to which a semiconductor element and an electrode terminal are attached, is laminated on an attachment substrate via an insulating substrate, and a synthetic resin case is adhered to the peripheral portion of the attachment substrate to seal the conduction portion. A power semiconductor module of a stopping type, wherein a rubber-like synthetic resin coating is provided on an inner surface of an adhesive portion of the case to the mounting substrate.
成樹脂の被覆が、上記取付基板の周辺部から上記絶縁基
板の周辺部の端面を経て少なくとも上記通電部の周辺部
の端面に至る沿面に設けられていることを特徴とするパ
ワー半導体モジュール。2. The creeping surface of the invention as set forth in claim 1, wherein the rubber-like synthetic resin coating extends from the peripheral portion of the mounting substrate through the peripheral end face of the insulating substrate to at least the peripheral end face of the conducting portion. A power semiconductor module, which is provided in.
上記通電部の少なくとも上記半導体素子の表面を覆うよ
うにして上記ケース内にゲル状合成樹脂が封入されてい
ることを特徴とするパワー半導体モジュール。3. In the invention of claim 1 or 2,
A power semiconductor module, wherein a gel-like synthetic resin is enclosed in the case so as to cover at least the surface of the semiconductor element of the energizing portion.
成樹脂の被覆が、少なくとも上記半導体素子のプレーナ
ーターミネーション領域にまで達していることを特徴と
するパワー半導体モジュール。4. The power semiconductor module according to claim 2, wherein the coating of the rubber-like synthetic resin reaches at least the planar termination region of the semiconductor element.
さが少なくとも2mmになるように構成されていることを
特徴とするパワー半導体モジュール。5. The power semiconductor module according to claim 2, wherein the creeping surface has a length of at least 2 mm.
ー半導体モジュールを用いて構成したことを特徴とする
車両用インバータ装置。6. An inverter device for a vehicle, comprising the power semiconductor module according to any one of claims 1 to 5.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5199684A JP2913247B2 (en) | 1993-08-11 | 1993-08-11 | Power semiconductor module and inverter device for vehicle |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP5199684A JP2913247B2 (en) | 1993-08-11 | 1993-08-11 | Power semiconductor module and inverter device for vehicle |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0758282A true JPH0758282A (en) | 1995-03-03 |
JP2913247B2 JP2913247B2 (en) | 1999-06-28 |
Family
ID=16411897
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---|---|---|---|
JP5199684A Expired - Fee Related JP2913247B2 (en) | 1993-08-11 | 1993-08-11 | Power semiconductor module and inverter device for vehicle |
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JP (1) | JP2913247B2 (en) |
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