JPH0757580A - Transferring conductive bump, conductive bump transferring base material, transferring method for conductive bump - Google Patents

Transferring conductive bump, conductive bump transferring base material, transferring method for conductive bump

Info

Publication number
JPH0757580A
JPH0757580A JP19737493A JP19737493A JPH0757580A JP H0757580 A JPH0757580 A JP H0757580A JP 19737493 A JP19737493 A JP 19737493A JP 19737493 A JP19737493 A JP 19737493A JP H0757580 A JPH0757580 A JP H0757580A
Authority
JP
Japan
Prior art keywords
conductive
conductive bump
transfer
bump
transferring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19737493A
Other languages
Japanese (ja)
Inventor
Takashi Oda
高司 小田
Munekazu Tanaka
宗和 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nitto Denko Corp
Original Assignee
Nitto Denko Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nitto Denko Corp filed Critical Nitto Denko Corp
Priority to JP19737493A priority Critical patent/JPH0757580A/en
Publication of JPH0757580A publication Critical patent/JPH0757580A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To easily and accurately form an electric circuit or an electric circuit section by providing a transfer section and a plurality of conductive projections not located on the same straight line. CONSTITUTION:Three or more conductive projections 11 having the taper angle of 20 deg. or below and not located on the same straight line are provided on a transfer section 1 having a low-melting point metal layer on the surface to obtain a transferring conductive bump B. The transfer section 1 of the conductive bump B of a conductive bump transfer base material is brought into contact with the electrode section of an object to be transferred, the conductive bump B is heat-pressed to the electrode section 4, then the carrier of the conductive bump transfer base material is peeled from the conductive bump B, and the conductive bump B is transferred and formed on the object to be transferred.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、電気回路または電気回
路部品等に容易にかつ高精度で形成することが可能な導
電性バンプおよびこの導電性バンプを保持する基材、な
らびに該導電性バンプの形成方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a conductive bump which can be easily and highly accurately formed on an electric circuit or an electric circuit component, a base material for holding the conductive bump, and the conductive bump. And a method of forming the same.

【0002】[0002]

【従来の技術・発明が解決しようとする課題】近年の技
術の進歩に伴って、電子機器の軽薄短小化が年々進めら
れており、半導体実装の技術分野においては、基板上に
半導体素子を高密度で実装することが強く要望されてい
る。従来、当該分野においては、半導体素子に金属より
なる突起部(バンプ)を形成して接続端子とし、これに
より実装を行っている。このようなバンプによる実装方
法は、半導体素子以外にも各種電気・電子部品の実装密
度を向上させる方法として有用なものである。
2. Description of the Related Art With the progress of technology in recent years, electronic devices have been made lighter and thinner and smaller and smaller. There is a strong demand for dense packaging. 2. Description of the Related Art Conventionally, in this field, a semiconductor element is provided with a protrusion (bump) made of metal to serve as a connection terminal, and mounting is performed by this. Such a mounting method using bumps is useful as a method for improving the mounting density of various electric / electronic components other than semiconductor elements.

【0003】ところが、上記のようなバンプを半導体素
子その他の電気・電子部品に直接形成することは技術的
に困難であり、電子機器製造における歩留りの原因とな
るという問題がある。
However, it is technically difficult to directly form the bump as described above on a semiconductor element or other electric / electronic parts, and there is a problem that it causes a yield in manufacturing electronic equipment.

【0004】そこで、バンプを電気・電子部品に転写法
によって形成することが提案されている。しかしなが
ら、この転写法として現在主に行われている、ITOガ
ラス上にバンプを形成する方法は、製造コスト、製造方
法、バンプの転写方法等の点で未だ満足できるものでは
ない。
Therefore, it has been proposed to form bumps on electric / electronic components by a transfer method. However, the method of forming bumps on ITO glass, which is currently mainly used as this transfer method, is still unsatisfactory in terms of manufacturing cost, manufacturing method, bump transfer method, and the like.

【0005】また、半導体素子を回路基板に実装する際
のアライメントとしては、該基板上のアライメントマー
クを用いるということが行われているが、これによって
は十分な接続信頼性が得られない。
In addition, alignment marks on the circuit board are used for alignment when mounting the semiconductor element on the circuit board, but this does not provide sufficient connection reliability.

【0006】本発明の目的は、上記のような問題を解消
し、電気回路または電気回路部品等に容易にかつ高精度
で形成することが可能であるとともに、半導体等の実装
における接続信頼性に優れる導電性バンプおよびこの導
電性バンプを保持する基材を提供することにある。ま
た、本発明の他の目的は、導電性バンプを電気回路また
は電気回路部品等に容易にかつ高精度で形成しうる方法
を提供することにある。
An object of the present invention is to solve the above problems and to easily and highly accurately form an electric circuit or electric circuit component, and to improve connection reliability in mounting semiconductors and the like. An object is to provide an excellent conductive bump and a base material that holds the conductive bump. Another object of the present invention is to provide a method capable of easily and highly accurately forming a conductive bump on an electric circuit or electric circuit component.

【0007】[0007]

【課題を解決するための手段】上記目的は、本発明、即
ち転写部と、同一直線上に位置しない3個以上の導電性
突起部とを有する転写用導電性バンプであって、望まし
くは該導電性突起部が、支持体を貫通しえ、かつ該支持
体に離脱可能に保持されえ、また被接続体のバンプ状導
電性突出体を3点以上の支持点で支持するセルフアライ
メント部となっているものであり、さらに転写部表面に
低融点金属層を有するものである転写用導電性バンプ、
および上記転写用導電性バンプの導電性突起部を離脱可
能に支持体に保持してなる導電性バンプ転写用基材、な
らびに上記導電性バンプ転写用基材の導電性バンプを被
転写体に接合した後、支持体を離脱させることを特徴と
する導電性バンプの転写方法により達成される。
SUMMARY OF THE INVENTION The above-mentioned object is the present invention, that is, a transfer conductive bump having a transfer portion and three or more conductive protrusions which are not located on the same straight line. And a self-alignment part that has a conductive protrusion that can penetrate the support and can be detachably held by the support, and that supports the bump-shaped conductive protrusion of the connected body at three or more support points. And a conductive bump for transfer, which has a low melting point metal layer on the surface of the transfer portion,
And a conductive bump transfer base material in which the conductive protrusions of the transfer conductive bump are detachably held by a support, and the conductive bumps of the conductive bump transfer base material are bonded to a transfer target. After that, the method is achieved by a method for transferring conductive bumps, which is characterized in that the support is released.

【0008】[0008]

【作用】上記転写用導電性バンプにおいては、同一直線
上に位置しない3個以上の導電性突起部によって、被接
続体のバンプ状導電性突出体が3点以上の支持点で支持
され、これによりセルフアライメントが可能となってい
る。また、上記バンプの導電性突起部を離脱可能に支持
体に保持してなる導電性バンプ転写用基材によって、バ
ンプの転写形成が容易なものとなっている。
In the above conductive bump for transfer, the bump-shaped conductive protrusions of the connected body are supported at three or more supporting points by the three or more conductive protrusions which are not collinear. Allows self-alignment. In addition, the conductive bump transfer base material in which the conductive protrusions of the bumps are detachably held by the support facilitates the transfer formation of the bumps.

【0009】[0009]

【実施例】以下、実施例を示し本発明を具体的に説明す
る。図1は、本発明の転写用導電性バンプの一実施例を
示す模式斜視図である。同図において、Bは転写用導電
性バンプを示し、転写部1と、同一直線上に位置しない
3個の導電性突起部11とを有する構成となっている。
EXAMPLES The present invention will be described in detail below with reference to examples. FIG. 1 is a schematic perspective view showing an embodiment of the transfer conductive bump of the present invention. In the figure, B indicates a conductive bump for transfer, which is configured to have a transfer portion 1 and three conductive protrusions 11 which are not located on the same straight line.

【0010】本発明の転写用導電性バンプは、その転写
部が電気回路または電気回路部品等の被転写体に接合・
転写されるものであり、一方、同一直線上に位置しない
3個以上の導電性突起部が半導体素子等の被接続体のバ
ンプ状導電性突出体との接続部となっているものであ
る。
In the conductive bump for transfer of the present invention, the transfer portion is bonded to a transfer target such as an electric circuit or an electric circuit component.
On the other hand, three or more conductive protrusions that are not located on the same straight line serve as a connection portion with a bump-shaped conductive protrusion of a connected body such as a semiconductor element.

【0011】上記転写用導電性バンプは、導電性の物質
で構成され、この導電性物質としては、半田、インジウ
ム、錫、鉛等の低融点金属またはこれらよりなる合金等
が好適に使用される。なお、図2の模式断面図に示すよ
うに、上記導電性バンプの転写部表面を上記のような低
融点金属121で構成し、それ以外の部分を上記低融点
金属以外の金属122で構成して2層構造とすると、転
写部表面の低融点金属121により被転写体への接合・
転写がなされるとともに、低融点金属以外の金属122
により圧着されることが可能となり好ましい。上記低融
点金属以外の金属122としては、該低融点金属121
に対しぬれ性の良好な金属が好適に使用され、このよう
な金属として例えば銅、ニッケル等が挙げられる。
The conductive bumps for transfer are made of a conductive substance, and as the conductive substance, low melting point metal such as solder, indium, tin, lead, or an alloy made of these is preferably used. . As shown in the schematic sectional view of FIG. 2, the surface of the transfer portion of the conductive bump is made of the low melting point metal 121 as described above, and the other portions are made of the metal 122 other than the low melting point metal. If a two-layer structure is adopted, the low melting point metal 121 on the surface of the transfer portion will bond to the transfer target.
When the transfer is performed, the metal 122 other than the low melting point metal is used.
This is preferable because it can be pressure bonded. As the metal 122 other than the low melting point metal, the low melting point metal 121
On the other hand, a metal having good wettability is preferably used, and examples of such a metal include copper and nickel.

【0012】上記導電性バンプの転写部の形状は特に限
定されるものではないが、図1に示すようなマッシュル
ーム状とすると、被転写体への接合・転写が行い易いた
め好ましい。
The shape of the transfer portion of the conductive bump is not particularly limited, but a mushroom shape as shown in FIG. 1 is preferable because bonding and transfer to a transfer target can be easily performed.

【0013】一方、上記導電性突起部は、導電性バンプ
の転写部以外の部位(例えば図1に示す導電性バンプB
の平面部)に3個以上形成されるが、被接続体のバンプ
状導電性突出体を安定して支持できるよう、これら導電
性突起部が同一円周上に位置していることが好ましい。
On the other hand, the conductive protrusions are parts other than the transfer parts of the conductive bumps (for example, the conductive bump B shown in FIG. 1).
Three or more on the same plane), it is preferable that these conductive protrusions are located on the same circumference so that the bump-shaped conductive protrusions of the connected body can be stably supported.

【0014】また、上記導電性突起部は、図1に示すよ
うな、被接続体のバンプ状導電性突出体を3点で支持す
る態様以外にも、図3に示すような4点支持型の態様も
可能であるが、突起部の数が多すぎるとその形成が困難
となるため、突起部数は3〜6が好ましい。
Further, the conductive protrusions have a four-point support type as shown in FIG. 3 in addition to the mode in which the bump-shaped conductive protrusions of the connected body are supported at three points as shown in FIG. However, if the number of protrusions is too large, it becomes difficult to form the protrusions. Therefore, the number of protrusions is preferably 3 to 6.

【0015】さらに、上記導電性突起部は、導電性バン
プ転写用基材の支持体に離脱可能に保持されるようにす
るため、支持体を貫通する形状を有することが好まし
く、このような導電性突起部の形状として、例えば図1
に示すような、特定のテーパ角を有する柱状、針状等の
形状が好ましい。なお、本明細書でいうテーパ角とは、
図1に示すような、導電性突起部11の長さ方向と側面
との角度αのことをいう。このように導電性突起部がテ
ーパ角を有する形状であると、導電性バンプを被転写体
に接合した後に支持体を容易に剥離することができて好
ましい。なお上記テーパ角は、20°以下、好ましくは
5〜15°程度であることが望ましい。上記テーパ角が
20°を越えると、導電性突起部が転写される前に支持
体から離脱するおそれがあるため好ましくない。
Further, the conductive protrusion preferably has a shape penetrating the support in order to be detachably held by the support of the conductive bump transfer base material. As the shape of the sex protrusion, for example, as shown in FIG.
A columnar shape, a needle shape, or the like having a specific taper angle as shown in is preferable. The taper angle in this specification means
It refers to the angle α between the length direction and the side surface of the conductive protrusion 11 as shown in FIG. 1. When the conductive protrusion has a taper angle in this manner, the support can be easily peeled off after the conductive bump is bonded to the transfer target, which is preferable. The taper angle is preferably 20 ° or less, preferably about 5 to 15 °. When the taper angle exceeds 20 °, the conductive protrusion may be separated from the support before being transferred, which is not preferable.

【0016】上記転写用導電性バンプは、上記のように
その導電性突起部が支持体に離脱可能に保持されて導電
性バンプ転写用基材とされる。図4はこの導電性バンプ
転写用基材の一例を示す模式断面図であり、転写用導電
性バンプBの導電性突起部11が支持体2に保持されて
いる。
As described above, the conductive bumps for transfer have the conductive protrusions releasably held by the support to serve as a conductive bump transfer base material. FIG. 4 is a schematic cross-sectional view showing an example of the conductive bump transfer base material, in which the conductive protrusions 11 of the transfer conductive bump B are held by the support 2.

【0017】上記支持体としては、電気絶縁性および適
度な可撓性を有するものであればよく、例えばポリエス
テル系樹脂、エポキシ系樹脂、ウレタン系樹脂、ポリス
チレン系樹脂、ポリアミド系樹脂、ポリイミド系樹脂、
ABS樹脂、ポリカーボネート樹脂、シリコン系樹脂、
フッ素系樹脂等が挙げられる。これらの樹脂のうち、透
明性の樹脂を用いるとバンプ転写時の位置合わせが行い
易く、さらにそのなかでも、ポリイミド系樹脂が耐熱性
や機械的強度に優れるため好適に使用される。
The support may be any one having electrical insulation and appropriate flexibility, for example, polyester resin, epoxy resin, urethane resin, polystyrene resin, polyamide resin, polyimide resin. ,
ABS resin, polycarbonate resin, silicone resin,
Fluorine-based resins and the like can be mentioned. If a transparent resin is used among these resins, the alignment at the time of bump transfer can be easily performed, and among them, a polyimide resin is preferably used because it has excellent heat resistance and mechanical strength.

【0018】また、上記支持体の厚さは、5〜500μ
m程度とすることが好ましい。支持体の厚さが5μm未
満であると、支持体の耐熱性や機械的強度が不十分とな
り、一方500μmを越えると、支持体の可撓性が不十
分となる。
The thickness of the support is 5 to 500 μm.
It is preferably about m. When the thickness of the support is less than 5 μm, the heat resistance and mechanical strength of the support become insufficient, while when it exceeds 500 μm, the flexibility of the support becomes insufficient.

【0019】図4においては、導電性突起部11が支持
体2を貫通した状態で離脱可能に保持されているが、導
電性突起部は通常、これを形成すると同時に支持体に保
持される。即ち、支持体に貫通孔を形成し、この貫通孔
に前記導電性物質を該貫通孔の開口部より突出するまで
充填することにより、導電性バンプの導電性突起部およ
び転写部が形成され、同時にこの導電性突起部が支持体
に保持される。
In FIG. 4, the conductive protrusion 11 is removably held while penetrating the support 2. However, the conductive protrusion 11 is usually held by the support at the same time when it is formed. That is, a through-hole is formed in the support, and the through-hole is filled with the conductive substance until it protrudes from the opening of the through-hole to form the conductive protrusion and the transfer portion of the conductive bump. At the same time, the conductive protrusion is held by the support.

【0020】なおその際、上記貫通孔は、前記したよう
な導電性突起部の形状に対応する形状に形成するように
する。この貫通孔の形成は、機械加工、プラズマ加工、
レーザー加工、光反応性を付与した支持体を用いるリソ
グラフィー等によりなされ、またこの貫通孔への導電性
物質の充填は、CVD法、メッキ法等によりなされる。
At this time, the through hole is formed in a shape corresponding to the shape of the conductive protrusion as described above. This through hole is formed by machining, plasma processing,
Laser processing, lithography using a support having photoreactivity, and the like are performed, and the through holes are filled with a conductive substance by a CVD method, a plating method, or the like.

【0021】上記導電性バンプ転写用基材においては、
導電性バンプの転写部を被転写体に接合させた後、導電
性バンプから支持体を離脱させることにより、上記被転
写体上に導電性バンプが転写形成される。図5は、上記
導電性バンプの転写形成方法を示す模式図である。
In the above conductive bump transfer substrate,
After the transfer portion of the conductive bump is bonded to the transfer target, the support is separated from the conductive bump, whereby the conductive bump is transferred and formed on the transfer target. FIG. 5 is a schematic diagram showing a method of transferring and forming the conductive bumps.

【0022】以下、同図に基づいて上記導電性バンプの
転写形成方法をさらに具体的に説明する。まず、図5
(a)に示すように、上記導電性バンプ転写用基材Sの
導電性バンプBの転写部を被転写体3の電極部4に接触
させる。ここで、前記したように導電性バンプBの転写
部が図1に示すようなマッシュルーム状であると、電極
部4への接触および以下に述べる接合が容易に行える。
ついで、図5(b)に示すように、導電性バンプBを電
極部4に加熱圧着により接合する。ここで、導電性バン
プBの少なくとも転写部表面が前記したように低融点金
属で構成されているので、上記加熱圧着が容易に行え
る。この後、図5(c)に示すように、導電性バンプ転
写用基材Sの支持体2を導電性バンプBから剥離する。
The conductive bump transfer forming method will be described in more detail with reference to FIG. First, FIG.
As shown in (a), the transfer portion of the conductive bump B of the conductive bump transfer base material S is brought into contact with the electrode portion 4 of the transferred body 3. Here, as described above, when the transfer portion of the conductive bump B has a mushroom shape as shown in FIG. 1, the contact with the electrode portion 4 and the bonding described below can be easily performed.
Then, as shown in FIG. 5B, the conductive bump B is bonded to the electrode portion 4 by thermocompression bonding. Here, since at least the surface of the transfer portion of the conductive bump B is made of the low melting point metal as described above, the thermocompression bonding can be easily performed. After that, as shown in FIG. 5C, the support 2 of the conductive bump transfer base material S is separated from the conductive bumps B.

【0023】上記のような方法によって、被転写体上に
導電性バンプを容易に転写形成することができる。
By the method as described above, the conductive bumps can be easily transferred and formed on the transferred object.

【0024】上記方法により形成された導電性バンプ
は、半導体素子等の被接続体に接続される。図6は、こ
の接続方法を示す模式図である。同図に基づいてこの接
続方法を以下に説明する。まず、図6(a)に示すよう
に、被転写体上に前記方法により形成された導電性バン
プの上方に、被接続体のバンプ状導電性突出体を位置さ
せる。このとき、被接続体のバンプ状導電性突出体と被
転写体上の導電性バンプとの位置合わせは厳密に行う必
要はなく、これらが上方から見て部分的に重なりあって
いればよい。ついで、図6(a)中の矢印で示すよう
に、被接続体のバンプ状導電性突出体を直下方向に移動
させて被転写体上の導電性バンプの導電性突起物と接触
させた後、水平方向にずらすようにしてアライメントを
行う。この後、図6(b)に示すように、被接続体のバ
ンプ状導電性突出体と被転写体上の導電性バンプとを加
熱圧着により接合する。
The conductive bump formed by the above method is connected to a connected body such as a semiconductor element. FIG. 6 is a schematic diagram showing this connection method. This connection method will be described below with reference to FIG. First, as shown in FIG. 6A, the bump-shaped conductive protrusions of the connection target are positioned above the conductive bumps formed by the above method on the transfer target. At this time, it is not necessary to strictly align the bump-shaped conductive protrusions of the connected body with the conductive bumps on the transferred body, as long as they are partially overlapped when viewed from above. Then, as shown by the arrow in FIG. 6A, after the bump-shaped conductive protrusions of the connected body are moved in the direct downward direction and brought into contact with the conductive protrusions of the conductive bumps on the transferred body, , Perform alignment by shifting horizontally. After that, as shown in FIG. 6B, the bump-shaped conductive protrusions of the connected body and the conductive bumps on the transferred body are bonded by thermocompression bonding.

【0025】本発明においては、前記したように被転写
体上に転写形成される導電性バンプが同一直線上に位置
しない3個以上の導電性突起部を有するので、この導電
性突起部により上記のように半導体等の実装を容易に行
うことができる。
In the present invention, as described above, the conductive bumps transferred and formed on the transferred material have three or more conductive protrusions which are not located on the same straight line. As described above, it is possible to easily mount a semiconductor or the like.

【0026】なお、図7に示すように、半導体素子等の
側に本発明の導電性バンプを転写形成し、電気回路また
は電気回路部品の側にバンプ状導電性突出体を形成する
ようにしてもよい。この場合も、前記と同様にして半導
体素子等の実装を容易に行うことができる。
As shown in FIG. 7, the conductive bumps of the present invention are transferred and formed on the semiconductor element side, and bump-like conductive protrusions are formed on the electric circuit or electric circuit component side. Good. Also in this case, the semiconductor element or the like can be easily mounted in the same manner as described above.

【0027】また、本発明の転写用導電性バンプ、導電
性バンプ転写用基材および導電性バンプの転写方法は、
半導体素子等の電気・電子部品の実装以外にも、該電気
・電子部品や回路基板等の導通検査を行うテストヘッド
およびその製造方法にも適用することができる。
Further, the conductive bump for transfer, the conductive bump transfer base material and the conductive bump transfer method of the present invention are as follows:
In addition to the mounting of electric / electronic components such as semiconductor elements, the present invention can be applied to a test head for conducting a continuity inspection of the electric / electronic components, a circuit board, etc. and a manufacturing method thereof.

【0028】[0028]

【発明の効果】本発明の転写用導電性バンプにおいて
は、同一直線上に位置しない3個以上の導電性突起部に
よってセルフアライメントがなされ、該バンプと半導体
素子等との接続がより確実かつ容易となっている。ま
た、本発明の導電性バンプ転写用基材は、上記導電性バ
ンプの導電性突起部を離脱可能に支持体に保持してなる
ものであるので、バンプの転写形成が容易なものとなっ
ている。したがって、本発明によって、導電性バンプを
電気回路または電気回路部品等に容易にかつ高精度で形
成できるとともに、半導体等の実装を確実かつ容易に行
うことができる。
In the conductive bumps for transfer of the present invention, self-alignment is performed by three or more conductive protrusions that are not located on the same straight line, and the connection between the bumps and the semiconductor element is more reliable and easy. Has become. Further, since the conductive bump transfer base material of the present invention is such that the conductive protrusions of the conductive bumps are detachably held on the support, the transfer transfer of the bumps is facilitated. There is. Therefore, according to the present invention, the conductive bump can be easily and highly accurately formed on the electric circuit or the electric circuit component, and the semiconductor or the like can be surely and easily mounted.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の転写用導電性バンプの一実施例を示す
模式斜視図である。
FIG. 1 is a schematic perspective view showing one embodiment of a transfer conductive bump of the present invention.

【図2】本発明の転写用導電性バンプの他の実施例を示
す模式断面図である。
FIG. 2 is a schematic cross-sectional view showing another embodiment of the transfer conductive bump of the present invention.

【図3】本発明の転写用導電性バンプの他の実施例を示
す模式斜視図である。
FIG. 3 is a schematic perspective view showing another embodiment of the transfer conductive bump of the present invention.

【図4】本発明の導電性バンプ転写用基材の一例を示す
模式断面図である。
FIG. 4 is a schematic cross-sectional view showing an example of a conductive bump transfer base material of the present invention.

【図5】本発明の導電性バンプの転写方法の一例を示す
模式断面図である。
FIG. 5 is a schematic cross-sectional view showing an example of a conductive bump transfer method of the present invention.

【図6】導電性バンプを被接続体に接続する方法を示す
模式図である。
FIG. 6 is a schematic diagram showing a method of connecting the conductive bumps to the body to be connected.

【図7】半導体素子の側に導電性バンプを転写形成し、
電気回路または電気回路部品の側にバンプ状導電性突出
体を形成した例を示す模式図である。
FIG. 7: Conductive bumps are transferred and formed on the semiconductor element side,
It is a schematic diagram which shows the example which formed the bump-shaped electroconductive protrusion on the electric circuit or the electric circuit component side.

【符号の説明】[Explanation of symbols]

1 転写部 11 導電性突起部 B 転写用導電性バンプ 1 Transfer Part 11 Conductive Protrusion Part B Transfer Conductive Bump

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 転写部と、同一直線上に位置しない3個
以上の導電性突起部とを有する転写用導電性バンプ。
1. A conductive bump for transfer having a transfer portion and three or more conductive protrusions which are not located on the same straight line.
【請求項2】 導電性突起部が、支持体を貫通しえ、か
つ該支持体に離脱可能に保持されうるものである請求項
1記載の転写用導電性バンプ。
2. The conductive bump for transfer according to claim 1, wherein the conductive protrusion is capable of penetrating the support and being releasably held by the support.
【請求項3】 導電性突起部が、被接続体のバンプ状導
電性突出体を3点以上の支持点で支持するセルフアライ
メント部となっている請求項1記載の転写用導電性バン
プ。
3. The conductive bump for transfer according to claim 1, wherein the conductive protrusion is a self-alignment portion that supports the bump-shaped conductive protrusion of the connected body at three or more supporting points.
【請求項4】 転写部表面に低融点金属層を有するもの
である請求項1記載の転写用導電性バンプ。
4. The conductive bump for transfer according to claim 1, which has a low melting point metal layer on the surface of the transfer portion.
【請求項5】 請求項1記載の転写用導電性バンプの導
電性突起部を離脱可能に支持体に保持してなる導電性バ
ンプ転写用基材。
5. A substrate for transfer of conductive bumps, wherein the conductive protrusion of the conductive bump for transfer according to claim 1 is detachably held by a support.
【請求項6】 請求項5記載の導電性バンプ転写用基材
の導電性バンプを被転写体に接合した後、支持体を離脱
させることを特徴とする導電性バンプの転写方法。
6. A method for transferring a conductive bump, comprising bonding the conductive bump of the conductive bump transfer base material according to claim 5 to a transfer target and then removing the support.
JP19737493A 1993-08-09 1993-08-09 Transferring conductive bump, conductive bump transferring base material, transferring method for conductive bump Pending JPH0757580A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19737493A JPH0757580A (en) 1993-08-09 1993-08-09 Transferring conductive bump, conductive bump transferring base material, transferring method for conductive bump

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19737493A JPH0757580A (en) 1993-08-09 1993-08-09 Transferring conductive bump, conductive bump transferring base material, transferring method for conductive bump

Publications (1)

Publication Number Publication Date
JPH0757580A true JPH0757580A (en) 1995-03-03

Family

ID=16373446

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19737493A Pending JPH0757580A (en) 1993-08-09 1993-08-09 Transferring conductive bump, conductive bump transferring base material, transferring method for conductive bump

Country Status (1)

Country Link
JP (1) JPH0757580A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100446142C (en) * 2004-10-20 2008-12-24 松下电器产业株式会社 Switch and manufacturing method thereof

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN100446142C (en) * 2004-10-20 2008-12-24 松下电器产业株式会社 Switch and manufacturing method thereof

Similar Documents

Publication Publication Date Title
EP0751565B1 (en) Film carrier for semiconductor device
US4472876A (en) Area-bonding tape
JP3898891B2 (en) Via plug adapter
JP3393755B2 (en) Interconnection structure by reflow solder ball with low melting point metal cap
KR20000035210A (en) Semiconductor device, connecting substrate therefor, and process of manufacturing connecting substrate
KR20010023027A (en) Method for forming bump electrode and method for manufacturing semiconductor device
US6413102B2 (en) Center bond flip chip semiconductor carrier and a method of making and using it
EP0327399A1 (en) Method of manufacturing an uniaxially electrically conductive article
EP0544305A2 (en) Method of forming a contact bump using a composite film
US6667542B2 (en) Anisotropic conductive film-containing device
JPH0757580A (en) Transferring conductive bump, conductive bump transferring base material, transferring method for conductive bump
US7414417B2 (en) Contact sheet for testing electronic parts, apparatus for testing electronic parts, method for testing electronic parts, method for manufacturing electronic parts and electronic parts
KR100294835B1 (en) Semiconductor device test board and semiconductor device test method
JP3019091B1 (en) Component connection structure using solder bumps and method of forming the same
US9673063B2 (en) Terminations
JP2007036022A (en) Jointing structure and its manufacturing method
JP2827965B2 (en) Ball grid array mounting method
JP3015709B2 (en) Film carrier, semiconductor device using the same, and semiconductor element mounting method
JP3704229B2 (en) Method and apparatus for manufacturing semiconductor device
JPH10275965A (en) Electronic-component assembly and its manufacture
JPH05259221A (en) Electronic part mounting device
JPH10335388A (en) Ball grid array
US20030161123A1 (en) Bonding structure for bonding substrates by metal studs
JP2000306953A (en) Wiring board for mounting bare chip and manufacture thereof
JPH08213748A (en) Board and manufacture thereof