JPH075628Y2 - 真空成膜装置 - Google Patents
真空成膜装置Info
- Publication number
- JPH075628Y2 JPH075628Y2 JP5695490U JP5695490U JPH075628Y2 JP H075628 Y2 JPH075628 Y2 JP H075628Y2 JP 5695490 U JP5695490 U JP 5695490U JP 5695490 U JP5695490 U JP 5695490U JP H075628 Y2 JPH075628 Y2 JP H075628Y2
- Authority
- JP
- Japan
- Prior art keywords
- chamber
- plate
- electrode unit
- gas
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5695490U JPH075628Y2 (ja) | 1990-05-30 | 1990-05-30 | 真空成膜装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5695490U JPH075628Y2 (ja) | 1990-05-30 | 1990-05-30 | 真空成膜装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0415832U JPH0415832U (enrdf_load_stackoverflow) | 1992-02-07 |
| JPH075628Y2 true JPH075628Y2 (ja) | 1995-02-08 |
Family
ID=31581239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5695490U Expired - Fee Related JPH075628Y2 (ja) | 1990-05-30 | 1990-05-30 | 真空成膜装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH075628Y2 (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB0021815D0 (en) * | 2000-09-06 | 2000-10-18 | Lofting Marcus J | Plasma enhanced gas reactor |
-
1990
- 1990-05-30 JP JP5695490U patent/JPH075628Y2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0415832U (enrdf_load_stackoverflow) | 1992-02-07 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |