JPH0754681B2 - Vacuum device - Google Patents
Vacuum deviceInfo
- Publication number
- JPH0754681B2 JPH0754681B2 JP62135671A JP13567187A JPH0754681B2 JP H0754681 B2 JPH0754681 B2 JP H0754681B2 JP 62135671 A JP62135671 A JP 62135671A JP 13567187 A JP13567187 A JP 13567187A JP H0754681 B2 JPH0754681 B2 JP H0754681B2
- Authority
- JP
- Japan
- Prior art keywords
- vacuum
- exhaust port
- foreign matter
- vacuum container
- sealing valve
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000007789 sealing Methods 0.000 claims description 18
- 239000000126 substance Substances 0.000 description 8
- 238000012423 maintenance Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 230000002265 prevention Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000003749 cleanliness Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002500 ions Chemical group 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000003672 processing method Methods 0.000 description 1
- 239000003870 refractory metal Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Landscapes
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Description
【発明の詳細な説明】 〔発明の目的〕 （産業上の利用分野） 本発明は、真空装置に関する。DETAILED DESCRIPTION OF THE INVENTION Object of the Invention (Field of Industrial Application) The present invention relates to a vacuum device.
（従来の技術） 一般に半導体集積回路の形成には、ボロンやリンなどを
シリコンに加え半導体特性を決めるイオン注入や高融点
金属または化合物薄膜を作るスパッタリング等の処理が
高真空中で行なわれている。これらの処理を行うイオン
注入装置やスパッタリング装置等では内部の油回転ポン
プや油拡散ポンプ，クライオポンプ等真空ポンプで処理
室である真空容器内の真空引きを行う。(Prior Art) Generally, in the formation of a semiconductor integrated circuit, processing such as ion implantation for determining semiconductor characteristics by adding boron or phosphorus to silicon and sputtering for forming a refractory metal or compound thin film are performed in a high vacuum. . In an ion implantation apparatus, a sputtering apparatus, or the like that performs these processes, a vacuum pump such as an internal oil rotary pump, an oil diffusion pump, or a cryopump is used to evacuate the inside of a vacuum container that is a processing chamber.
しかし、真空容器の中に真空ポンプで排気してやればす
ぐにポンプの到達真空度に達すわけではなく、特に真空
度が上がる程、種々の要因で真空引きが悪化する。その
主な原因として、容器の材料内部に含まれる気体分子や
表面に付着した異物による放出ガスやリークが考えられ
る。However, if the vacuum pump evacuates the inside of the vacuum container, the ultimate vacuum of the pump is not reached immediately. Especially, as the degree of vacuum increases, the vacuuming becomes worse due to various factors. The main cause of this is considered to be gas molecules contained inside the material of the container and gas released or leaked by foreign substances adhering to the surface.
このような、異物によるリーク等の防止例として実開昭
61-162941号公報に開示されたものがある。As an example of preventing such leakage due to foreign matter,
There is one disclosed in 61-162941.
これによると、真空容器（１）と真空ポンプ（２）間の
排気管（３）に円板状異物流入防止用ネット（４）が回
転可能に設けられている。そして、異物流入防止用ネッ
ト（４）により真空ポンプ（２）側へ流入する異物を捕
捉し、かつ、排気管（３）の遮蔽量を切換え可能として
いる。According to this, a disc-shaped foreign substance inflow prevention net (4) is rotatably provided in the exhaust pipe (3) between the vacuum container (1) and the vacuum pump (2). Then, the foreign matter inflow prevention net (4) captures the foreign matter flowing into the vacuum pump (2) side, and the shielding amount of the exhaust pipe (3) can be switched.
（発明が解決しようとする問題点） しかしながら、上記の真空装置では排気管遮蔽量の変更
に伴い異物捕捉範囲も変化し、異物を捕捉しきれないと
いう問題があった。また、異物流入防止用ネットを回転
させるので、捕捉した異物を放出したり、周辺に付着し
ている異物を巻き上げて、異物によるリークが再発する
という問題があった。(Problems to be Solved by the Invention) However, the above-described vacuum device has a problem that the foreign substance capturing range also changes with the change of the exhaust pipe shielding amount, and the foreign substances cannot be captured. Further, since the foreign matter inflow prevention net is rotated, there is a problem that the captured foreign matter is released or the foreign matter adhering to the surroundings is rolled up, and the foreign matter leaks again.
本発明は、上記点に対処してなされたもので、異物が真
空排気口付近に付着せず、異物によるリークの発生を防
止し、気密封止性を向上することのできる真空装置を提
供するものである。The present invention has been made in consideration of the above points, and provides a vacuum device capable of preventing foreign matter from adhering to the vicinity of a vacuum exhaust port, preventing the occurrence of leakage due to foreign matter, and improving hermetic sealing. It is a thing.
（問題点を解決するための手段） 本願の発明は、真空容器が真空ポンプにより排気される
装置において、前記真空容器内に処理部と、前記真空ポ
ンプに結合された排気口と、この排気口に気密に係合す
る排気口密閉弁と、前記排気口と排気口密閉弁の近傍
に、前記真空容器内を前記処理部と分割する如く配置さ
れた、異物の付着を防止する異物捕捉手段とを設けたこ
とを特徴とし、また、異物捕捉手段を着脱自在としたこ
とを特徴とし、更に、異物捕捉手段はフィン形状のトラ
ップであることを特徴とする。(Means for Solving the Problems) The invention of the present application relates to an apparatus in which a vacuum container is evacuated by a vacuum pump, a processing unit in the vacuum container, an exhaust port connected to the vacuum pump, and the exhaust port. An exhaust port sealing valve that is airtightly engaged with the exhaust port, and a foreign substance capturing unit that is disposed in the vicinity of the exhaust port and the exhaust port sealing valve so as to divide the inside of the vacuum container from the processing unit, and that prevents foreign substances from adhering. Is provided, and the foreign matter capturing means is detachable. Further, the foreign matter capturing means is a fin-shaped trap.
（作用） 本願発明の真空装置では、真空容器内に設けた異物捕捉
手段により、異物の付着を防止し、排気口と排気口密閉
弁による気密性を向上させ、メインテナンス時や被処理
部材の搬入搬出時に真空ポンプ内の真空度を保つことが
でき、真空容器の真空立ち上げ時間を短縮することを可
能とするものである。(Operation) In the vacuum device of the present invention, foreign matter is prevented from adhering by the foreign matter catching means provided in the vacuum container, airtightness is improved by the exhaust port and the exhaust port sealing valve, and at the time of maintenance or carrying-in of a member to be processed. It is possible to maintain the degree of vacuum in the vacuum pump at the time of unloading, and to shorten the vacuum start-up time of the vacuum container.
（実施例） 以下、本発明の真空装置を図面を参照して実施例につい
て説明する。(Example) Hereinafter, the vacuum device of the present invention will be described with reference to the drawings.
種々の処理を行なう真空容器（11）が気密に真空ポンプ
（12）例えば油拡散ポンプと結合され、真空容器（11）
内には円筒状排気口（13）が設けられている。そして、
上記排気口（13）に気密に係合する如く輪状のＯリング
（14）を備えた円板状排気口密閉弁（15）が、真空容器
（11）外の昇降機構（16）により昇降自在に設けられて
いる。また、真空容器（11）内には排気口（13）および
排気口密閉弁（15）の近傍には真空容器（11）内を処理
部（17）と分割する如く、異物捕捉手段として多数の水
平なフィン（18）を備えた方形状トラップ（19）がネジ
等により着脱自在に設けられている。A vacuum container (11) for performing various processes is hermetically connected to a vacuum pump (12), for example, an oil diffusion pump, and the vacuum container (11)
A cylindrical exhaust port (13) is provided inside. And
A disk-shaped exhaust port sealing valve (15) equipped with a ring-shaped O-ring (14) so as to be airtightly engaged with the exhaust port (13) can be lifted and lowered by a lifting mechanism (16) outside the vacuum container (11). It is provided in. Further, in the vicinity of the exhaust port (13) and the exhaust port sealing valve (15) in the vacuum container (11), the interior of the vacuum container (11) is divided into a processing section (17), and a large number of foreign matter capturing means are provided. A rectangular trap (19) having horizontal fins (18) is detachably provided with screws or the like.
次に、上述した真空装置の真空処理方法を説明する。Next, a vacuum processing method of the above-described vacuum device will be described.
昇降機構（16）により排気口密閉弁（15）を下降し、排
気口（13）と排気口密閉弁（15）をＯリング（14）によ
り気密に係合させ、真空ポンプ（12）内の真空度を保つ
ことができる。この時、図示しないバルブにより真空容
器（11）内の圧力を大気圧に戻し、図示しない真空容器
開閉口を開け、被処理部材を搬出搬入したり真空容器内
のメインテナンス作業等を行なう。The evacuation mechanism (16) lowers the exhaust port sealing valve (15), and the exhaust port (13) and the exhaust port sealing valve (15) are hermetically engaged with each other by the O-ring (14), and the inside of the vacuum pump (12) is closed. The degree of vacuum can be maintained. At this time, the pressure in the vacuum container (11) is returned to the atmospheric pressure by a valve (not shown), the opening / closing port of the vacuum container (not shown) is opened, and the member to be processed is carried in / out and maintenance work in the vacuum container is performed.
そして、図示しないバルブと真空容器開閉口を閉じ、昇
降機構（16）により排気口密閉弁（15）を上昇し、真空
ポンプ（12）により真空容器（11）内を所望の真空度に
する。この後、真空容器内の処理部（17）で真空処理を
行う。その時、処理部（17）から発生する異物は、図の
矢印で示す如く上方の排気口密閉弁（15）と下方の排気
口（13）へ向かうものはトラップ（19）のフィン（18）
に捕捉され、水平方向に向かうものは壁面に当たり付着
する。ここで、異物はイオンや微細な粒子なので真空中
で直進運動を行う。つまり、上記異物捕捉手段により排
気口（13）近辺と排気口密閉弁（15）の排気口（13）対
向面に対して異物の付着を防止し、クリーン度を保つこ
とにより、排気口（13）と排気口密閉弁（15）を閉じた
時の気密性が向上する。その結果、異物による放出ガス
やリークが防止され、所望の真空度への到達時間が速く
なり、装置の稼働効率が向上する。Then, a valve (not shown) and a vacuum container opening / closing port are closed, the evacuation mechanism (16) raises the exhaust port closing valve (15), and the vacuum pump (12) brings the inside of the vacuum container (11) to a desired degree of vacuum. After that, vacuum processing is performed in the processing unit (17) in the vacuum container. At that time, foreign matter generated from the processing section (17) is directed toward the upper exhaust port sealing valve (15) and the lower exhaust port (13) as shown by the arrow in the figure, and the fins (18) of the trap (19).
What is caught in the horizontal direction hits the wall surface and adheres. Here, since the foreign matter is ions or fine particles, it moves straight in a vacuum. In other words, the foreign matter trapping means prevents foreign matter from adhering to the vicinity of the exhaust port (13) and the surface of the exhaust port sealing valve (15) facing the exhaust port (13), thereby maintaining the cleanliness of the exhaust port (13). ) And the exhaust port sealing valve (15) are closed, the airtightness is improved. As a result, the released gas and leakage due to foreign matter are prevented, the time required to reach a desired vacuum degree is shortened, and the operation efficiency of the apparatus is improved.
また、真空処理が終了すると、再び真空容器内は大気圧
に戻され、被処理部材を搬出搬入したり、トラップ（1
9）を取り外して清掃するなどのメインテナンス作業を
行なう。When the vacuum processing is completed, the inside of the vacuum container is returned to the atmospheric pressure again, and the member to be processed is carried in and out, or the trap (1
9) Perform maintenance work such as removing and cleaning.
上記実施例では、異物捕捉手段として、水平フィンによ
るトラップで説明したが、排気口（13）と排気口密閉弁
（15）の排気口（13）対向面に飛ぶ異物を捕捉できれば
よく、第２図の如く水平でないフィン構成でもよく、ま
た、フィン形状はハニカム構造でもよく、網状フィルタ
ーでもよく、上記実施例に限定されるものでないことは
言うまでもない。以上述べたようにこの実施例によれ
ば、排気口密閉弁が上昇して、真空容器内で真空処理を
行なう時に、排気口と排気口密閉弁の排気口対向面に飛
ぶ異物を異物捕捉手段であるフィン形状トラップで捕捉
することにより、排気口密閉弁が下降して排気口と形成
する真空ポンプの気密度が向上し、そして、真空容器の
真空立ち上げ時間を速くすることができる。In the above-mentioned embodiment, the trap by the horizontal fin has been described as the foreign matter capturing means, but it is sufficient that foreign matter flying on the surface of the exhaust port (13) facing the exhaust port (13) of the exhaust port sealing valve (15) can be captured. Needless to say, the fin configuration may be non-horizontal as shown in the drawing, the fin shape may be a honeycomb structure, or a mesh filter, and the present invention is not limited to the above embodiment. As described above, according to this embodiment, when the exhaust port closing valve rises and vacuum processing is performed in the vacuum container, the foreign substance trapping means for catching the foreign substances flying to the exhaust port and the exhaust port facing surface of the exhaust port sealing valve. By trapping with the fin-shaped trap, the exhaust port sealing valve is lowered to improve the airtightness of the vacuum pump formed with the exhaust port, and the vacuum rise time of the vacuum container can be shortened.
以上説明したように本発明によれば、異物の付着を防止
する異物捕捉手段を真空容器内に設けたことにより、異
物による放出ガスやリークの発生を防止し、気密封止性
を向上し、その結果、真空到達時間の速い効率的な真空
処理を行うことができる。As described above, according to the present invention, by providing the foreign matter capturing means for preventing the foreign matter from adhering to the inside of the vacuum container, it is possible to prevent the release gas or the leak from being caused by the foreign matter, and to improve the hermetic sealing property. As a result, it is possible to perform an efficient vacuum process in which the vacuum arrival time is short.
【図面の簡単な説明】 第１図は本発明である真空装置の一実施例を示す構成
図、第２図は第１図における異物捕捉手段の他の実施例
を示す図、第３図は従来の真空装置を示す構成図であ
る。 図において、 11……真空容器、13……排気口 15……排気口密閉弁、17……処理部 18……フィン、19……トラップBRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a block diagram showing an embodiment of a vacuum device according to the present invention, FIG. 2 is a view showing another embodiment of the foreign matter capturing means in FIG. 1, and FIG. It is a block diagram which shows the conventional vacuum apparatus. In the figure, 11 ... vacuum container, 13 ... exhaust port 15 ... exhaust port sealing valve, 17 ... processing section 18 ... fin, 19 ... trap
Claims (3)
置において、前記真空容器内に処理部と、前記真空ポン
プに結合された排気口と、この排気口に気密に係合する
排気口密閉弁と、前記排気口と排気口密閉弁の近傍に、
前記真空容器内を前記処理部と分割する如く配置され
た、異物の付着を防止する異物捕捉手段とを設けたこと
を特徴とする真空装置。1. An apparatus in which a vacuum container is evacuated by a vacuum pump, wherein a processing unit in the vacuum container, an exhaust port coupled to the vacuum pump, and an exhaust port sealing valve which is hermetically engaged with the exhaust port. And near the exhaust port and the exhaust port sealing valve,
A vacuum apparatus, comprising: foreign matter capturing means arranged to divide the interior of the vacuum container from the processing section to prevent foreign matter from adhering.
とする特許請求の範囲第１項記載の真空装置。2. The vacuum apparatus according to claim 1, wherein the foreign matter capturing means is detachable.
ることを特徴とする特許請求の範囲第１項記載の真空装
置。3. The vacuum apparatus according to claim 1, wherein the foreign matter capturing means is a fin-shaped trap.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62135671A JPH0754681B2 (en) | 1987-05-29 | 1987-05-29 | Vacuum device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62135671A JPH0754681B2 (en) | 1987-05-29 | 1987-05-29 | Vacuum device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63299036A JPS63299036A (en) | 1988-12-06 |
| JPH0754681B2 true JPH0754681B2 (en) | 1995-06-07 |
Family
ID=15157204
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62135671A Expired - Fee Related JPH0754681B2 (en) | 1987-05-29 | 1987-05-29 | Vacuum device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0754681B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO1999037919A1 (en) * | 1998-01-22 | 1999-07-29 | Ebara Corporation | Trap device and trap system |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60114570A (en) * | 1983-11-25 | 1985-06-21 | Canon Inc | Evacuating system for plasma cvd device |
| JPS61162941U (en) * | 1985-03-29 | 1986-10-08 | ||
| JPS61265815A (en) * | 1985-05-20 | 1986-11-25 | Sharp Corp | Semiconductor manufacturing apparatus |
-
1987
- 1987-05-29 JP JP62135671A patent/JPH0754681B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63299036A (en) | 1988-12-06 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |