JPH0740767U - Electroless tin plating equipment - Google Patents

Electroless tin plating equipment

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Publication number
JPH0740767U
JPH0740767U JP7044193U JP7044193U JPH0740767U JP H0740767 U JPH0740767 U JP H0740767U JP 7044193 U JP7044193 U JP 7044193U JP 7044193 U JP7044193 U JP 7044193U JP H0740767 U JPH0740767 U JP H0740767U
Authority
JP
Japan
Prior art keywords
tin plating
tank
electroless tin
tape
plating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7044193U
Other languages
Japanese (ja)
Inventor
泉好 紅林
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP7044193U priority Critical patent/JPH0740767U/en
Publication of JPH0740767U publication Critical patent/JPH0740767U/en
Pending legal-status Critical Current

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  • Manufacturing Of Printed Wiring (AREA)
  • Wire Bonding (AREA)
  • Chemically Coating (AREA)

Abstract

(57)【要約】 【目的】ウイスカの発生を防止し、TAB用テープの微
細配線パターンのリード間短絡不良の要因を除去するこ
とのできるTAB用テープの無電解錫めっき装置を提供
する。 【構成】TAB用テープ製造方法に使用される無電解錫
めっき装置において、錫めっき層に高周波振動をあたえ
るために、錫めっき槽内に超音波発生装置12を具備さ
せたことを特徴とする。
(57) [Abstract] [PROBLEMS] To provide an electroless tin plating device for a TAB tape, which can prevent the generation of whiskers and eliminate the cause of a short circuit between leads of a fine wiring pattern of the TAB tape. The electroless tin plating apparatus used in the method for producing a tape for TAB is characterized in that an ultrasonic wave generator 12 is provided in the tin plating tank in order to apply high frequency vibration to the tin plating layer.

Description

【考案の詳細な説明】[Detailed description of the device]

【0001】[0001]

【産業上の利用分野】[Industrial applications]

本考案は、Tape Automated Bonding(TABと略称す る)用テープ製造方法に使用される無電解錫めっき装置に係り、錫めっき槽に高 周波振動手段を具備し、液晶ドライバー用のTAB用テープの製造に好適な無電 解錫めっき装置に関するものである。 The present invention relates to an electroless tin plating apparatus used in a tape manufacturing method for Tape Automated Bonding (abbreviated as TAB), which is equipped with a high-frequency vibrating means in a tin plating tank and is used for a TAB tape for a liquid crystal driver. The present invention relates to an electroless tin plating apparatus suitable for manufacturing.

【0002】[0002]

【従来の技術】[Prior art]

従来のTAB用テープ製造方法は、樹脂テープ、例えばポリイミドテープにデ バイスホールなどの開口部を形成するためにパンチングを施し、これに銅箔をラ ミネートする。次いで、前記銅箔にはパターンやリードの形成のために、レジス トコート、露光、現像が施される。次ぎに、前記デバイスホールなど内の銅箔裏 面をエッチングから保護するため裏止めレジストが塗布される。 In the conventional TAB tape manufacturing method, a resin tape, for example, a polyimide tape is punched to form an opening such as a device hole, and a copper foil is laminated on this. Next, the copper foil is subjected to resist coating, exposure and development for forming patterns and leads. Next, a backing resist is applied to protect the backside of the copper foil in the device holes and the like from etching.

【0003】 そののち、前記銅箔にエツチング工程が施され、パターンやリードが形成され 、エツチング後不要となったパターンレジスト、裏止めレジストをアルカリ液に より溶解除去する。After that, the copper foil is subjected to an etching process to form patterns and leads, and the pattern resist and backing resist that are no longer needed after etching are dissolved and removed with an alkaline solution.

【0004】 次ぎに、接合部以外の銅配線パターンの保護、絶縁のため、ソルダーレジスト 印刷が行われ、銅配線パターンには、ボンデイング性を良くさせるため、はんだ めっきが施される。Next, solder resist printing is performed to protect and insulate the copper wiring pattern other than the joint portion, and the copper wiring pattern is subjected to solder plating to improve the bondability.

【0005】 前記はんだめっきの方法には、いわゆるウイスカがなくボンデイング性の安定 したはんだめっきが施されなければならないが、そのめっきのやり方として電解 めっきと、無電解めっきとがある。In the above-mentioned solder plating method, so-called whiskers-free solder bonding with stable bondability must be applied. The plating methods include electrolytic plating and electroless plating.

【0006】 前者の電解めっきは、テープパターン上への給電配線の形成およびめっき後に 前記給電配線を切断加工する必要があり、微細配線パターンを形成する上で、テ ープ有効面積の制限、配線設計自由度の低下等の制約がある。In the former electrolytic plating, it is necessary to cut and process the power supply wiring after the formation and plating of the power supply wiring on the tape pattern. There are restrictions such as a decrease in design flexibility.

【0007】 このため、このような制約がない後者の無電解錫めっきがなされるようになっ てきたが、錫めつきに起因する品質面や信頼性の面で種々の欠点があった。For this reason, the latter electroless tin plating, which does not have such a restriction, has come to be performed, but there are various defects in terms of quality and reliability due to tin plating.

【0008】 上記従来のTAB用テープ製造方法に用いられる無電解錫めっき装置は、材料 送りだし部と、脱脂、酸洗を施す前処理部と、温度調整された錫めっき液の収納 した錫めつき槽と、錫めっき後、めっき液の回収、水洗および製品巻き取り部と から構成される。The electroless tin plating apparatus used in the conventional TAB tape manufacturing method described above includes a material feeding section, a pretreatment section for degreasing and pickling, and a tin plating solution containing a temperature-controlled tin plating solution. It consists of a bath and a tin plating, plating solution recovery, water washing and product winding section.

【0009】 前記各部の内、錫めっき槽は錫めっき液中を被めっき材料を所定の時間をかけ て通過させるものである。この通過中において、酸化還元反応によって錫めっき 液の錫が還元され、被めっき材料の素地表面に錫が析出し、めっきが施されるも のであった。In each of the above-mentioned parts, the tin plating tank is for passing the material to be plated through the tin plating solution for a predetermined time. During this passage, the tin of the tin plating solution was reduced by the oxidation-reduction reaction, and tin was deposited on the surface of the base material of the material to be plated, and plating was performed.

【0010】[0010]

【考案が解決しようとする課題】[Problems to be solved by the device]

上記従来の無電解錫めっき装置にあっては、錫が析出し、めっき層を形成する 際、結晶に方向性を生じ、前記結晶内に物理的歪が生ずると、いわゆるウイスカ を生じ、TAB用テープの微細配線パターンのリード間短絡不良の要因となると いう問題があった。 In the above-mentioned conventional electroless tin plating apparatus, when tin is deposited and a crystal is oriented when forming a plating layer and a physical strain is generated in the crystal, a so-called whisker is generated, which is used for TAB. There is a problem that it causes a short circuit between leads of the fine wiring pattern of the tape.

【0011】 前記結晶内の物理的歪を除去するためには、錫めっきしたのち、できるだけ早 く加熱する方法があるが、完全には除去できない。In order to remove the physical strain in the crystal, there is a method in which after tin plating, heating is performed as soon as possible, but it cannot be completely removed.

【0012】 このように、錫めっきの形成状態が、いわゆるInner Lead Bon ding(ILBと略称する)の特性を左右し、TAB用テープの性能への悪影 響を無視することができないという問題があった。As described above, there is a problem that the formation state of tin plating influences the characteristics of so-called Inner Lead Bonding (abbreviated as ILB), and the adverse influence on the performance of the TAB tape cannot be ignored. there were.

【0013】 本考案は、上記従来技術の問題点を解決するためになされたもので、ウイスカ の発生を防止し、TAB用テープの微細配線パターンのリード間短絡不良の要因 が除去されたTAB用テープの無電解錫めっき装置を提供することをその目的と するものである。The present invention has been made in order to solve the above-mentioned problems of the prior art. For the TAB, the generation of whiskers is prevented and the cause of the short circuit between leads of the fine wiring pattern of the TAB tape is eliminated. It is an object of the present invention to provide an electroless tin plating device for tape.

【0014】[0014]

【課題を解決するための手段】[Means for Solving the Problems]

上記目的を達成するために、無電解錫めっき装置に係る本考案の構成は、TA B用テープ製造方法に使用される無電解錫めっき装置において、錫めっき槽に高 周波振動手段を具備することを特徴とする。 In order to achieve the above object, the configuration of the present invention relating to an electroless tin plating apparatus is such that in the electroless tin plating apparatus used in the TAB tape manufacturing method, the tin plating tank is provided with a high frequency vibrating means. Is characterized by.

【0015】 また、高周波振動手段は、超音波発生装置であることを特徴とする。Further, the high-frequency vibrating means is an ultrasonic wave generator.

【0016】[0016]

【作用】[Action]

上記技術的手段の働きは次のとおりである。 The functions of the above technical means are as follows.

【0017】 本考案の構成によれば、無電解錫めっき装置の錫めっき槽に超音波発生装置を 具備させたので、めっき工程中において、超音波発生装置からの微細振動により 錫めっき結晶層内の物理的歪を除去し、方向性を有する錫めっき結晶の析出を防 止し、ウイスカの発生を防ぐことができる。According to the configuration of the present invention, since the ultrasonic generator is provided in the tin plating tank of the electroless tin plating apparatus, during the plating process, the tin plating crystal layer inside the tin plating crystal layer is generated due to the fine vibration from the ultrasonic generator. It is possible to remove the physical strain of (3), prevent the precipitation of directional tin-plated crystals, and prevent the formation of whiskers.

【0018】[0018]

【実施例】【Example】

以下本考案の実施例を図1を参照して説明する。 An embodiment of the present invention will be described below with reference to FIG.

【0019】 図1は、本考案の一実施例に係る無電解錫めっき装置の略示説明図である。FIG. 1 is a schematic explanatory view of an electroless tin plating apparatus according to an embodiment of the present invention.

【0020】 図1において、1は材料送りだし部、2は脱脂槽、3は回収槽、4は水洗槽、 5は酸洗槽、6は回収槽、7は水洗槽、8は錫めっき槽、9は回収槽、10は水 洗槽、11は製品巻き取り部、12は超音波発生装置である。これらによりTA B用テープ製造に用いられる無電解錫めっき装置を構成している。In FIG. 1, 1 is a material feeding section, 2 is a degreasing tank, 3 is a recovery tank, 4 is a water washing tank, 5 is an acid cleaning tank, 6 is a recovery tank, 7 is a water cleaning tank, 8 is a tin plating tank, Reference numeral 9 is a recovery tank, 10 is a water washing tank, 11 is a product winding section, and 12 is an ultrasonic wave generator. These constitute an electroless tin plating apparatus used for manufacturing TAB tapes.

【0021】 上記無電解錫めっき装置において、材料送りだし部1と、脱脂槽2と、回収槽 3と、水洗槽4と、酸洗槽5と、回収槽6と、水洗槽7とは、公知の装置の前処 理と同じである。In the above electroless tin plating apparatus, the material feeding section 1, the degreasing tank 2, the collecting tank 3, the washing tank 4, the pickling tank 5, the collecting tank 6, and the washing tank 7 are known. This is the same as the pre-treatment of the device of.

【0022】 前記材料送りだし部1は、いわゆるリールツーリールでは、垂直の形でめっき 装置内にTAB用テープ素材が送りだされる。勿論、水平の形で送りだして差し 支えない。In the so-called reel-to-reel, the material feeding section 1 vertically feeds the TAB tape material into the plating apparatus. Of course, you can send it horizontally.

【0023】 送りだされたTAB用テープ素材は、脱脂槽2において、そのめっき対象表面 に付着している油脂が清浄にされる。前記表面の状態によりめつき層と、素材間 の密着力の強弱が定まる。In the degreasing tank 2, the fed TAB tape material is cleaned of oil and fat adhering to the surface to be plated. The strength of the adhesion between the plating layer and the material is determined by the surface condition.

【0024】 脱脂槽2においては、まず、浸漬脱脂がなされる。脱脂液には、公知の脱脂液 、例えば珪酸ソーダ液等を用いて差し支えない。In the degreasing tank 2, first, immersion degreasing is performed. As the degreasing liquid, a known degreasing liquid such as sodium silicate liquid may be used.

【0025】 次いで、水洗槽4にて、清浄水により水洗され、脱脂液が除去された油脂と共 に、洗いながされる。Next, in the washing tank 4, the degreased liquid is rinsed with clean water and rinsed with the degreased liquid.

【0026】 次ぎに、酸洗槽5において、TAB用テープ素材のめっき対象物表面の酸化物 層や変質層を除去するため、酸洗される。Next, in the pickling tank 5, pickling is performed in order to remove the oxide layer and the altered layer on the surface of the object to be plated of the TAB tape material.

【0027】 次いで、回収槽6により酸洗液が回収され、水洗槽7において洗浄される。Next, the pickling solution is recovered in the recovery tank 6 and washed in the water cleaning tank 7.

【0028】 錫めっき槽8は、水素過電圧が高いので、還元剤としては三塩化チタンが用い られ、浴の安定性の向上のため、クエン酸、EDTA、ニトリロ三酢酸を錯化剤 として用いる。Since the tin plating tank 8 has a high hydrogen overvoltage, titanium trichloride is used as a reducing agent, and citric acid, EDTA, and nitrilotriacetic acid are used as complexing agents to improve the stability of the bath.

【0029】 錫めっき浴の一例を示すと、次ぎの通りとなる。クエン酸ナトリウム0.34 、エチレンジアミン0.05、ニトリロ三酢酸ナトリウム0.02、塩化錫0. 05、三塩化チタン0.03等である。単位は、いずれも重量モル濃度である。 pHは9、温度は70〜80℃である。An example of the tin plating bath is as follows. Sodium citrate 0.34, ethylenediamine 0.05, sodium nitrilotriacetate 0.02, tin chloride 0. 05, titanium trichloride 0.03 and the like. All units are molar concentrations. The pH is 9 and the temperature is 70 to 80 ° C.

【0030】 前記錫めっき槽8に超音波発生装置12を取り付ける。超音波発生装置出力は 、対象物にもより異なるが、ほぼ1MHz 、数十Wから数百Wであり、対象物表面 との距離は、ほぼ20cm、大きくても数十cmである。An ultrasonic wave generator 12 is attached to the tin plating bath 8. The output of the ultrasonic generator differs depending on the target object, but is approximately 1 MHz and tens to hundreds of watts, and the distance from the surface of the target object is approximately 20 cm and at most tens of cm.

【0031】 上記のような超音波発生装置12により、錫めっき浴を通過中のTAB用テー プ素材のめっき対象表面に形成されるめっき層に超音波を与えつづける。With the ultrasonic generator 12 as described above, ultrasonic waves are continuously applied to the plating layer formed on the surface to be plated of the TAB tape raw material while passing through the tin plating bath.

【0032】 このようにして、超音波による微細な振動により方向性を持つた錫めっきの析 出を防止し、ウイスカのない平滑なめっき層を形成することができる。In this way, it is possible to prevent the tin plating, which has directionality, from being deposited due to the fine vibration caused by ultrasonic waves, and to form a smooth plating layer without whiskers.

【0033】 なお、公知の回収槽9、水洗槽10により処理され、製品巻き取り部11に巻 き取られ、TAB用テープは完成する。The TAB tape is completed by being processed in the known recovery tank 9 and water washing tank 10 and wound up on the product winding section 11.

【0034】[0034]

【考案の効果】[Effect of device]

以上詳細に説明したように、本考案によれば、ウイスカの発生を防止し、TA B用テープの微細配線パターンのリード間短絡不良の要因を除去することのでき るTAB用テープの無電解錫めっき装置を提供することができる。 As described above in detail, according to the present invention, it is possible to prevent whiskers from occurring and eliminate the cause of the short circuit between leads of the fine wiring pattern of the TAB tape. A plating apparatus can be provided.

【図面の簡単な説明】[Brief description of drawings]

【図1】本考案の一実施例に係る無電解錫めっき装置の
略示説明図である。
FIG. 1 is a schematic explanatory view of an electroless tin plating apparatus according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1 材料送りだし部 2 脱脂槽 3 回収槽 4 水洗槽 5 酸洗槽 6 回収槽 7 水洗槽 8 錫めっき槽 9 回収槽 10 水洗槽 11 製品巻き取り部 12 超音波発生装置 1 Material feeding part 2 Degreasing tank 3 Recovery tank 4 Water washing tank 5 Pickling tank 6 Recovery tank 7 Water washing tank 8 Tin plating tank 9 Recovery tank 10 Water washing tank 11 Product winding section 12 Ultrasonic generator

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】TAB用テープ製造方法に使用される無電
解錫めっき装置において、錫めっき槽に高周波振動手段
を具備することを特徴とする無電解錫めっき装置。
1. An electroless tin plating apparatus used in a method for producing a TAB tape, characterized in that a tin plating tank is provided with a high-frequency vibrating means.
【請求項2】高周波振動手段は、超音波発生装置である
ことを特徴とする請求項1記載の無電解錫めっき装置。
2. The electroless tin plating apparatus according to claim 1, wherein the high frequency vibrating means is an ultrasonic wave generator.
JP7044193U 1993-12-28 1993-12-28 Electroless tin plating equipment Pending JPH0740767U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7044193U JPH0740767U (en) 1993-12-28 1993-12-28 Electroless tin plating equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7044193U JPH0740767U (en) 1993-12-28 1993-12-28 Electroless tin plating equipment

Publications (1)

Publication Number Publication Date
JPH0740767U true JPH0740767U (en) 1995-07-21

Family

ID=13431592

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7044193U Pending JPH0740767U (en) 1993-12-28 1993-12-28 Electroless tin plating equipment

Country Status (1)

Country Link
JP (1) JPH0740767U (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008081637A1 (en) * 2006-12-27 2008-07-10 Japan Pure Chemical Co., Ltd. Reduction-type electroless tin plating solution and tin plating films made by using the same
CN113186478A (en) * 2021-06-03 2021-07-30 常州井芯半导体设备有限公司 Ultrasonic tinning device and tinning method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008081637A1 (en) * 2006-12-27 2008-07-10 Japan Pure Chemical Co., Ltd. Reduction-type electroless tin plating solution and tin plating films made by using the same
CN113186478A (en) * 2021-06-03 2021-07-30 常州井芯半导体设备有限公司 Ultrasonic tinning device and tinning method
CN113186478B (en) * 2021-06-03 2023-05-09 常州井芯半导体设备有限公司 Ultrasonic tinning device and tinning method

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