JPH0734928Y2 - Processed object holding device - Google Patents

Processed object holding device

Info

Publication number
JPH0734928Y2
JPH0734928Y2 JP1988095496U JP9549688U JPH0734928Y2 JP H0734928 Y2 JPH0734928 Y2 JP H0734928Y2 JP 1988095496 U JP1988095496 U JP 1988095496U JP 9549688 U JP9549688 U JP 9549688U JP H0734928 Y2 JPH0734928 Y2 JP H0734928Y2
Authority
JP
Japan
Prior art keywords
rotation
arm
jig
rotation axis
revolving
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1988095496U
Other languages
Japanese (ja)
Other versions
JPH0217553U (en
Inventor
邦治 田上
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissin Electric Co Ltd
Original Assignee
Nissin Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissin Electric Co Ltd filed Critical Nissin Electric Co Ltd
Priority to JP1988095496U priority Critical patent/JPH0734928Y2/en
Publication of JPH0217553U publication Critical patent/JPH0217553U/ja
Application granted granted Critical
Publication of JPH0734928Y2 publication Critical patent/JPH0734928Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Physical Vapour Deposition (AREA)

Description

【考案の詳細な説明】 〔産業上の利用分野〕 この考案は、マルチアークPVDやその他の真空内処理、
あるいは大気中の処理において、処理物を保持して公転
および自転させる処理物保持装置に関するものである。
[Detailed description of the device] [Industrial field of application] This device is designed for multi-arc PVD and other vacuum processing,
Alternatively, the present invention relates to a treated product holding device that retains a treated product and revolves around it in a process in the atmosphere.

〔従来の技術〕[Conventional technology]

従来、PVD法により薄膜を形成する場合に、均一な蒸着
が行われるように、ウェハ等の処理物を真空室内で公転
および自転させることがある。
Conventionally, when a thin film is formed by the PVD method, a processed material such as a wafer may be revolved and rotated in a vacuum chamber so that uniform vapor deposition is performed.

このような公転および自転を行わせる処理物保持装置と
して、例えば特開昭59−190359号公報に示すものがあ
る。第6図ないし第9図は、同公報の装置と同様な原理
で動作する処理物保持装置を示す。
An example of a processed material holding device for causing such revolution and rotation is disclosed in Japanese Patent Laid-Open No. 59-190359. FIGS. 6 to 9 show a processed material holding device that operates on the same principle as the device of the publication.

主軸51と共に回転する公転部材52に4個の自転治具53が
各々軸受54で回転自在に取付けてある。自転治具53は、
処理物(図示せず)を保持するものであり、各々放射状
に延びる複数本のアーム55が設けてある。公転軌道の外
側にキッカ56が固定設置してあり、公転に伴って自転治
具53のアーム55がキッカ56に当たることにより、自転治
具53が90°自転する。そのため、公転部材52を公転駆動
するだけで、自転治具53が公転および自転を行う。
Four revolving jigs 53 are rotatably mounted on bearings 54 on a revolving member 52 that rotates together with the main shaft 51. The rotation jig 53 is
A workpiece (not shown) is held, and a plurality of arms 55 extending radially are provided. The kicker 56 is fixedly installed outside the orbit, and the arm 55 of the rotating jig 53 hits the kicker 56 along with the revolution, whereby the rotating jig 53 rotates 90 °. Therefore, the revolving jig 53 revolves and rotates only by revolving the revolving member 52.

〔考案が解決しようとする課題〕[Problems to be solved by the device]

自転治具53のキッカ56で自転させられる角度は、正しく
90°にならないときがある。例えば、軸受54の摩擦の程
度や、自転治具53に載せられる処理物の重量、処理物の
形状の違いによる重心位置のずれ、公転速度等により自
転角度が変わる。そのため、第8図(A)のように正し
く当たらずに、第8図(B)に示すように、アーム55の
先端がキッカ56に真正面に向いて突き当たることがあ
る。第9図は第8図(B)の部分拡大図である。
The angle that can be rotated by the kicker 56 of the rotation jig 53 is correct.
Sometimes it does not reach 90 °. For example, the rotation angle changes depending on the degree of friction of the bearing 54, the weight of the processed object placed on the rotation jig 53, the shift of the center of gravity due to the difference in the shape of the processed object, the revolution speed, and the like. Therefore, as shown in FIG. 8 (B), the tip of the arm 55 may hit the kicker 56 in a straight front direction without hitting correctly as shown in FIG. 8 (A). FIG. 9 is a partially enlarged view of FIG. 8 (B).

アーム55は自転治具53の半径方向に延びているため、こ
のように真正面に当たると何れの方向にも回転すること
ができず、自転治具53の公転が行えなくなる。そのため
蒸着を中止せざるを得なくなる。
Since the arm 55 extends in the radial direction of the rotation jig 53, it cannot rotate in any direction when it hits the front face in this way, and the rotation jig 53 cannot revolve. Therefore, the vapor deposition has to be stopped.

この考案の目的は、自転治具の自転および公転が常に円
滑に行える処理物保持装置を提供することである。
An object of the present invention is to provide a processed material holding device that can always rotate and revolve the rotating jig smoothly.

〔課題を解決するための手段〕[Means for Solving the Problems]

請求項(1)の処理物保持装置は、回転駆動される公転
部材と、この公転部材の公転軸と平行な自転軸で回転自
在に前記公転部材に設置されて処理物を保持可能な自転
治具と、この自転治具に前記自転軸を中心とする円の略
接線方向に延びて設けられるものであって前記自転軸に
側部を向けて前記自転軸から半径方向に離れた位置に取
付けられた複数本のアームと、前記公転部材の公転に伴
って前記自転治具の前記アームが当たる位置に設けられ
たキッカとを備えたものである。
The treated object holding apparatus according to claim (1) is rotatably driven by a revolution member and a rotation shaft parallel to the revolution shaft of the revolution member, which is rotatably installed on the revolution member to retain the treatment object. And a tool that is provided on the rotation jig so as to extend in a substantially tangential direction of a circle having the rotation axis as a center, and is attached at a position away from the rotation axis in a radial direction with its side portion facing the rotation axis. And a kicker provided at a position where the arm of the rotation jig abuts with the revolution of the revolution member.

請求項(2)の処理物保持装置は、請求項(1)におい
て、前記自転治具の前記自転軸に直交する面上におい
て、前記複数本のアームの軸が前記自転軸に対して直角
となった姿勢で、各アームの一端が一回転方向に隣接す
る他のアームの側面に当接されて、各アームの側面が前
記自転治具の周面に所定間隔置きに固定されているもの
である。
According to a second aspect of the present invention, in the processing object holding apparatus according to the first aspect, the axes of the plurality of arms are perpendicular to the rotation axis on a plane orthogonal to the rotation axis of the rotation jig. In this posture, one end of each arm is abutted against the side surface of the other arm adjacent in one rotation direction, and the side surface of each arm is fixed to the peripheral surface of the rotation jig at predetermined intervals. is there.

〔作用〕[Action]

請求項(1)の処理物保持装置によれば、自転軸を中心
とする円の略接線方向に延びるアームを自転治具に設け
る際に、アームの側部を自転軸に向けてアームを自転軸
から半径方向に離れた位置で取付けているため、アーム
がキッカに正面衝突しても、衝撃力が自転軸に向かわ
ず、回転モーメントとして作用するので、自転治具は自
転可能である。
According to the treatment object holding apparatus of claim 1, when the rotation jig is provided with an arm extending in a substantially tangential direction of a circle about the rotation axis, the side portion of the arm is directed toward the rotation axis to rotate the arm. Since the arm is mounted at a position distant from the axis in the radial direction, even if the arm collides head-on with the kicker, the impact force does not go to the axis of rotation and acts as a rotation moment, so the rotation jig can rotate.

請求項(2)の処理物保持装置によれば、請求項(1)
の作用のほか、アームがキッカに衝突した際のアームへ
の衝撃を2箇所で受けることができ、アーム同志を固定
した場合は3箇所で受けることができるので、強度の点
で有利になる。
According to the processed product holding apparatus of claim (2), claim (1)
In addition to the above action, the impact on the arm when the arm collides with the kicker can be received at two places, and when the arms are fixed, the impact can be received at three places, which is advantageous in terms of strength.

〔実施例〕〔Example〕

この考案の一実施例を第1図ないし第5図に基づいて説
明する。
An embodiment of the present invention will be described with reference to FIGS.

主軸1に固定したこ公転部材2に4個の自転治具3が各
々軸受4で回転自在に取付けてある。自転治具3の自転
軸Qは、主軸1の軸心である公転軸Pと平行である。各
自転治具3は、4本のアーム5を等間隔に有しており、
これらアーム5は、自転軸Qを中心とする所定半径の円
の略接線方向に延びている。そして、アーム5は自転軸
Qに側部を向けて自転軸Qから半径方向に離れた位置で
自転治具3に取付けられており、実施例では自転治具3
の自転軸Qに直交する面上において、複数本のアーム5
の軸が自転軸Qに対して直角となった姿勢で、各アーム
5の一端が一回転方向に隣接する他のアーム5の側面に
当接されて、各アーム5の側面が自転治具3の周面に所
定間隔置きに固定されている。このアーム5に当たるキ
ッカ6が、自転治具3の公転軌道の外側に位置して固定
設置してある。
Four revolving jigs 3 are rotatably mounted on bearings 4 on a revolving member 2 fixed to a main shaft 1. The rotation axis Q of the rotation jig 3 is parallel to the revolution axis P which is the axis of the main shaft 1. Each rotation jig 3 has four arms 5 at equal intervals,
These arms 5 extend in a substantially tangential direction of a circle having a predetermined radius centering on the rotation axis Q. Then, the arm 5 is attached to the rotation jig 3 at a position radially facing away from the rotation axis Q with its side facing the rotation axis Q. In the embodiment, the rotation jig 3 is attached.
On the plane orthogonal to the rotation axis Q of the
In a posture in which the axis of the arm 5 is perpendicular to the rotation axis Q, one end of each arm 5 is brought into contact with the side surface of the other arm 5 adjacent in one rotation direction, and the side surface of each arm 5 is rotated by the rotation jig 3. Are fixed to the peripheral surface of the device at predetermined intervals. The kicker 6 that hits the arm 5 is fixedly installed outside the revolution path of the rotating jig 3.

第2図に示すように、各自転治具3はウェハ等の処理物
7を保持するホルダ部8を設けてある。主軸1は回転駆
動装置(図示せず)に接続してある。
As shown in FIG. 2, each rotating jig 3 is provided with a holder portion 8 for holding a processing object 7 such as a wafer. The main shaft 1 is connected to a rotary drive device (not shown).

上記構成の動作を説明する。公転部材2の公転により、
公転軌道の外にあるキッカ6に自転治具3のアーム5が
当たり、自転治具3が自転する。そのため、自転治具3
は公転および自転を行う。自転治具3は、キッカ6との
接触の都度90°自転するが、正確に90°とならない場合
がある。そのため、第4図および第5図に示すように、
アーム5がキッカ6に真正面に衝突することがある。し
かし、アーム5は自転治具3に対して略接線方向に設
け、かつアーム5の側部を自転軸Qに向けて自転軸Qか
ら半径方向に離れて位置しているため、キッカ6に真正
面に衝突しても、その衝撃力が自転軸Qに向かわず、回
転モーメントとして使用する。そのため、キッカ6によ
る回転力付与が常に円滑に行われる。したがって、自転
治具3は常に円滑に自転および公転を行える。
The operation of the above configuration will be described. By the revolution of the revolution member 2,
The arm 5 of the rotation jig 3 hits the kicker 6 outside the orbit, and the rotation jig 3 rotates. Therefore, the rotation jig 3
Performs revolution and rotation. The rotating jig 3 rotates by 90 ° each time it comes into contact with the kicker 6, but may not be exactly 90 °. Therefore, as shown in FIG. 4 and FIG.
The arm 5 may collide with the kicker 6 directly in front. However, since the arm 5 is provided substantially tangentially to the rotation jig 3 and the side portion of the arm 5 is positioned radially away from the rotation axis Q with the rotation axis Q facing the rotation axis Q, the arm 5 is directly in front of the kicker 6. Even if it collides with, the impact force does not go to the rotation axis Q and is used as a rotation moment. Therefore, the turning force is always applied smoothly by the kicker 6. Therefore, the rotation jig 3 can always rotate and revolve smoothly.

〔考案の効果〕[Effect of device]

請求項(1)の処理物保持装置によれば、自転軸を中心
とする円の略接線方向に延びるアームを自転治具に設け
る際に、アームの側部を自転軸に向けてアームを自転側
から半径方向に離れた位置で取付けているため、アーム
がキッカに正面衝突しても、衝撃力が自転軸に向かわ
ず、回転モーメントとして作用する。そのため、自転治
具は自転可能であり、キッカによる自転力付与が常に円
滑に行なえ円滑な自転および公転が行なえるという効果
がある。
According to the treatment object holding apparatus of claim 1, when the rotation jig is provided with an arm extending in a substantially tangential direction of a circle about the rotation axis, the side portion of the arm is directed toward the rotation axis to rotate the arm. Since the arm is mounted at a position distant from the side in the radial direction, even if the arm collides head-on with the kicker, the impact force does not go to the rotation axis and acts as a rotation moment. Therefore, the rotation jig can rotate, and the rotation force can be applied smoothly by the kicker, and smooth rotation and revolution can be performed.

請求項(2)の処理物保持装置によれば、請求項(1)
の効果のほか、アームがキッカに衝突した際のアームへ
の衝撃を2箇所で受けることができ、アーム同志を固定
した場合は3箇所で受けることができるので、強度の点
で有利になる。
According to the processed product holding apparatus of claim (2), claim (1)
In addition to the effect of, the impact on the arm when the arm collides with the kicker can be received at two places, and when the arms are fixed, the impact can be received at three places, which is advantageous in terms of strength.

【図面の簡単な説明】[Brief description of drawings]

第1図はこの考案の一実施例の平面図、第2図はその側
面図、第3図は同じくその自転治具の平面図、第4図は
同じくその動作説明図、第5図は第4図の部分拡大図、
第6図は従来例の平面図、第7図はその側面図、第8図
は同じくその動作説明図、第9図は同じくその作用説明
図である。 1…主軸、2…公転部材、3…自転治具、5…アーム、
6…キッカ、P…公転軸、Q…自転軸
FIG. 1 is a plan view of an embodiment of the present invention, FIG. 2 is a side view thereof, FIG. 3 is a plan view of the rotation jig thereof, FIG. 4 is a motion explanatory view thereof, and FIG. Partial enlargement of Figure 4,
FIG. 6 is a plan view of a conventional example, FIG. 7 is a side view thereof, FIG. 8 is an operation explanatory view thereof, and FIG. 9 is an operation explanatory view thereof. 1 ... Spindle, 2 ... Revolution member, 3 ... Rotating jig, 5 ... Arm,
6 ... Kicker, P ... Revolution axis, Q ... Rotation axis

Claims (2)

【実用新案登録請求の範囲】[Scope of utility model registration request] 【請求項1】回転駆動される公転部材と、この公転部材
の公転軸と平行な自転軸で回転自在に前記公転部材に設
置されて処理物を保持可能な自転治具と、この自転治具
に前記自転軸を中心とする円の略接線方向に延びて設け
られるものであって前記自転軸に側部を向けて前記自転
軸から半径方向に離れた位置に取付けられた複数本のア
ームと、前記公転部材の公転に伴って前記自転治具の前
記アームが当たる位置に設けられたキッカとを備えた処
理物保持装置。
1. A revolving member that is rotationally driven, a revolving jig that is rotatably mounted on the revolving member and that can hold an object to be processed by a revolving shaft that is parallel to the revolving shaft of the revolving member; A plurality of arms that are provided to extend in a substantially tangential direction of a circle centered on the rotation axis, and that are mounted at positions radially away from the rotation axis with their sides facing the rotation axis. And a kicker provided at a position where the arm of the rotation jig contacts with the revolution of the revolution member.
【請求項2】前記自転治具の前記自転軸に直交する面上
において、前記複数本のアームの軸が前記自転軸に対し
て直角となった姿勢で、各アームの一端が一回転方向に
隣接する他のアームの側面に当接されて、各アームの側
面が前記自転治具の周面に所定間隔置きに固定されてい
る請求項(1)記載の処理物保持装置。
2. A posture in which axes of the plurality of arms are perpendicular to the rotation axis on a surface of the rotation jig orthogonal to the rotation axis, and one end of each arm is rotated in one rotation direction. The processing object holding apparatus according to claim 1, wherein the processing object holding device is in contact with a side surface of another adjacent arm, and the side surface of each arm is fixed to the peripheral surface of the rotating jig at predetermined intervals.
JP1988095496U 1988-07-19 1988-07-19 Processed object holding device Expired - Lifetime JPH0734928Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988095496U JPH0734928Y2 (en) 1988-07-19 1988-07-19 Processed object holding device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988095496U JPH0734928Y2 (en) 1988-07-19 1988-07-19 Processed object holding device

Publications (2)

Publication Number Publication Date
JPH0217553U JPH0217553U (en) 1990-02-05
JPH0734928Y2 true JPH0734928Y2 (en) 1995-08-09

Family

ID=31320164

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988095496U Expired - Lifetime JPH0734928Y2 (en) 1988-07-19 1988-07-19 Processed object holding device

Country Status (1)

Country Link
JP (1) JPH0734928Y2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2019210135A1 (en) * 2018-04-28 2019-10-31 Applied Materials, Inc. In-situ wafer rotation for carousel processing chambers
US11482436B2 (en) * 2018-01-10 2022-10-25 Lam Research Corporation Rotational indexer with additional rotational axes

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005290425A (en) * 2004-03-31 2005-10-20 Tdk Corp Rotation mechanism of substrate in sputtering vapor deposition system
CN112964277B (en) * 2021-03-05 2023-05-30 中国电子科技集团公司第四十八研究所 Multi-station workpiece table of quartz harmonic oscillator flattening equipment

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59190359A (en) * 1983-01-19 1984-10-29 マルチ−ア−ク・バキユ−ム・システムズ・インコ−ポレ−テツド Vacuum evaporation device frame supporting equipment

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59190359A (en) * 1983-01-19 1984-10-29 マルチ−ア−ク・バキユ−ム・システムズ・インコ−ポレ−テツド Vacuum evaporation device frame supporting equipment

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11482436B2 (en) * 2018-01-10 2022-10-25 Lam Research Corporation Rotational indexer with additional rotational axes
US11699610B2 (en) 2018-01-10 2023-07-11 Lam Research Corporation Rotational indexer with additional rotational axes
WO2019210135A1 (en) * 2018-04-28 2019-10-31 Applied Materials, Inc. In-situ wafer rotation for carousel processing chambers
US11798825B2 (en) 2018-04-28 2023-10-24 Applied Materials, Inc. In-situ wafer rotation for carousel processing chambers

Also Published As

Publication number Publication date
JPH0217553U (en) 1990-02-05

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