JPH07319152A - Production of intaglio printing plate for printing on glass-base brittle substrate - Google Patents

Abstract

PURPOSE:To provide a process for producing a intaglio printing plate for printing on a glass-base brittle substrate which has a good mass-productivity and high industrial productivity, is low in cost and forms fine patterns of excellent quality. CONSTITUTION:Borosilicate glass is used as the substrate 1 and a metallic thin film 2 is formed on this base body 1. Desired resin patterns 3 consisting of a photoresist are formed on this metallic thin film 2. Metallic patterns 2a consisting of the metallic thin film 2 are formed by wet process etching. Patterns are formed on the substrate 1 by immersion etching using the resin patterns 3 and the metallic patterns 2a as an etching mask 4. The glass intaglio printing 6 for printing is obtd. by removing the resin patterns 3 and the metallic pattens 2a over the entire surface. Since the etching mask 4 consisting of the metallic patterns 2a and the resin patterns 2a is used, micropinholes 7 are closed by the resin patterns 2a and the metallic thin films 2 act as the good etching mask even if such micropinholes exist at these films. The excellent fine processing quality of the glass intaglio printing 6 for printing produced in such a manner is obtd.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a glass-based brittle substrate printing intaglio plate used for offset printing and the like.

[0002]

2. Description of the Related Art Conventionally, metal has been used as a material for an intaglio plate used for offset printing or the like, but in recent years, a glass-based brittle substrate such as glass or quartz is used because it is easy to manufacture and is inexpensive. It has also occurred when using. When patterning is performed as the surface processing of these glass-based brittle substrates such as glass and quartz, a dry method such as a sandblast method or an excimer laser method is used, and a wet method such as an etching solution dipping method has been put into practical use. It was

[0003]

Among the methods described above as a method for processing an intaglio plate used for offset printing, the sandblast method is a method for spraying fine solid particles under pressure to form a pattern. Since the pattern can be formed depending on the position of the nozzle, it is not necessary to use a photomask or the like. Therefore, the cost associated with the photomask and the photoprocess are not required, so that the cost is low. However, when a plurality of pattern-etched substrates having the same pattern are manufactured, the time required for the number is required, and the mass productivity is poor. Further, there is a drawback that a fine pattern cannot be formed.

The excimer laser method forms a pattern by melting and evaporating a substrate by heat generated by laser beam irradiation. Since the pattern can be formed by controlling the position of the laser beam, it is not necessary to use a photomask or the like, and a photo The cost for the mask and the cost for the photo process are unnecessary, and the cost is low. Moreover, the beam can be finely adjusted, and extremely fine processing can be performed by controlling the XY directions. However, when a plurality of pattern-etched substrates having the same pattern are produced, the required time for the number is required, so that mass productivity is poor. Further, since a high temperature portion is locally formed and thermal strain occurs, surface defects such as cracking, chipping and chipping are likely to occur during processing, and fine processing quality is not excellent.

Further, the wet etching method, which is an etching solution immersion method, allows fine processing, uses a photomask, and requires a photomask-related cost and a photoprocess-related cost. In the case of manufacturing a plurality of photomasks, the photomask can be duplicated as many as masters, and therefore, it is highly producible. Further, since the pattern formation depends on the immersion etching, the material cost, the equipment cost, the number of production steps are small, and the industrial productivity is high,
It is also advantageous in terms of cost. However, when the metal thin film is used as an etching mask, minute pinholes cannot be avoided, and irregular corrosion, peeling of the etching mask, side etching, etc. due to these are generated, and the processing quality is degraded. When trying to avoid minute pinholes, it is necessary to improve the adhesion force when forming a metal thin film, and to take measures such as multiple times film deposition. To improve the adhesion, special surface treatment, high temperature heating, etc. are required, which requires extra man-hours and equipment costs. In addition, the multiple-time deposition increases the man-hours and reduces the number of facilities to be manufactured, which results in a large cost for reducing the pinholes of the etching mask. FIG. 2 is a cross-sectional view of a glass-based brittle substrate printing intaglio plate manufactured by the conventional etching solution dipping method.
Reference numeral 21 is a glass substrate, 22 is a regular etching portion, and 23 is an irregular corrosion portion due to a pinhole in the etching mask.

Therefore, an object of the present invention is to provide a method for producing a glass-based brittle substrate printing intaglio plate, which is excellent in mass productivity, high in industrial productivity, low in cost, and capable of forming fine patterns of excellent quality. is there.

[0007]

A method for producing a glass-based brittle substrate printing intaglio according to claim 1, comprising a step of forming a metal thin film on the glass-based brittle substrate and forming a resin layer on the metal thin film, and a resin. A step of processing the layer and the metal thin film into a desired pattern, that is, a step of developing the resin layer into a desired pattern and etching the metal thin film into the desired pattern, and a glass using the resin layer and the metal thin film having the desired pattern formed as an etching mask And a step of etching the brittle substrate by an etching solution dipping method.

The method for producing a glass-based brittle substrate printing intaglio according to claim 2 is characterized in that, in the method for producing a glass-based brittle substrate printing intaglio according to claim 1, the resin layer is formed using a photosensitive resin. To do.

[0009]

According to the manufacturing method of the present invention, since the glass-based brittle substrate is etched using the etching mask having the multilayer structure of the metal thin film and the resin layer, even if the metal thin film has minute pinholes, the resin layer It can be blocked by the effect of pinholes and can function as a good etching mask against a highly corrosive etching solution.
This etching mask can be easily formed. In addition, since the isotropic reaction proceeds in the etching solution, thermal strain does not occur, and surface defects such as cracks, chips, and chipping due to processing are less likely to occur. The microfabrication quality will be excellent. Also,
Since it is an etching solution dipping method, a photomask (above etching mask) is used, and there are costs related to the photomask and the photo process, but the fine processing quality is excellent and the glass-based brittleness of the same pattern In the case of producing a plurality of substrate printing intaglio plates, the photomask can be used as a master in any number of duplications, which is highly producible in mass production. Moreover, according to this method, since the pattern formation of the glass-based brittle substrate depends on the immersion etching, the material cost, the equipment cost, the number of production steps are small, and the industrial productivity is high,
It is also advantageous in terms of cost.

[0010]

DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described with reference to FIG. FIG. 1 is a process sectional view showing a method for producing a glass-based brittle substrate printing intaglio plate according to the present invention. As shown in FIG. 1A, the manufacturing method of this embodiment uses a borosilicate glass substrate having a thickness of 1.1 mm and a length of 100 mm and a width of 100 mm as a substrate 1. First, 1000 Å chromium is placed on the substrate 1. The thin metal film 2 is formed. At this time, minute pinholes 7 are present in the metal thin film 2.

Next, as shown in FIG. 1B, a resin layer made of photoresist and having a thickness of 2 μm is applied onto the metal thin film 2 and exposed and developed to form a desired resin pattern 3. Next, as shown in FIG. 1C, a metal pattern 2a made of the metal thin film 2 is formed by wet etching using a cerium oxide-based etchant. As a result, the etching mask 4 having a two-layer structure including the resin pattern 3 and the metal pattern 2a is formed.

Thereafter, as shown in FIG. 1D, a pattern is formed on the substrate 1 by dip etching with a hydrofluoric acid type etchant using the resin pattern 3 and the metal pattern 2a as an etching mask 4. Reference numeral 5 indicates an etched portion. Next, the resin pattern 3 is entirely removed using a resist remover or the like. Then, the metal pattern 2a is entirely removed using a cerium oxide-based etchant or the like to obtain the glass printing intaglio plate 6 shown in FIG. 1 (e).

According to this embodiment, the etching mask 4
Has a multilayer structure composed of the metal pattern 2a of the metal thin film 2 and the resin pattern 2a of the resin layer.
Even if there is a minute pinhole 7, the resin pattern 2a closes the pinhole 7 so that the irregular corrosion portion 23 as shown in FIG. 2 is not formed and the influence of the pinhole 7 can be avoided. In this way, it functions as a good etching mask by resisting a highly corrosive etching solution. In addition, since the isotropic reaction proceeds in the etching solution, thermal distortion does not occur, and surface defects such as cracks, chips, and chipping due to processing are less likely to occur. The quality will be excellent.

Further, since it is a wet etching solution dipping method, a photomask (etching mask 4) is used, and a photomask-related cost and a photoprocess-related cost are required, but the fine processing quality is excellent, and When a plurality of glass-printed intaglio plates 6 having the same pattern are manufactured, a number of photomasks can be used as masters, and therefore, mass production is excellent. Further, since the pattern formation depends on the immersion etching, the material cost, the equipment cost, the number of production steps are small, and the like, the industrial productivity is high and the cost is advantageous.

As described above, a glass printing intaglio plate having excellent overall characteristics such as good etching shape quality, ease of production correlated with production yield, high productivity and expected to be reflected in cost. 6 (Glass-based brittle substrate printing intaglio)
Is obtained. Although glass is used for the substrate 1 in this embodiment, a structure of a glass-based brittle material such as quartz can be used. Although many metals can be used as the metal thin film 2, chromium and nickel are most effective if desired. The thickness of the metal thin film 2 is considered to be effective at 500 Å or more, but from 1000 Å to 30 due to durability and economy.
00Å is desirable.

The desired thickness of the resin pattern 3 is
It is considered to be effective if it is 0.5 μm or more, but it is desirable to be about 1 μm to 3 μm from the viewpoint of durability and economy. The etchant for the metal thin film 2 is the metal thin film 2 other than those shown in the examples.
Other types of etchants can be selected according to the material. Further, as the etchant for the substrate 1, other types of etchant corresponding to the material of the substrate 1 can be selected other than those shown in the examples.

[0017]

According to the method for producing an intaglio plate for printing on a glass-based brittle substrate of the present invention, a metal thin film is formed on a glass-based brittle substrate, a resin layer made of a photosensitive resin is formed on the metal thin film, and then a resin layer is formed. And processing the metal thin film into a desired pattern (that is, developing the resin layer into a desired pattern and etching the metal thin film into a desired pattern), and using the resin layer and the metal thin film having the desired pattern as an etching mask, a glass system Etching a brittle substrate by an etching solution dipping method to produce an intaglio plate used for offset printing, etc., for etching a glass-based brittle substrate using an etching mask composed of a multilayer structure of a metal thin film and a resin layer. Even if there are minute pinholes in the metal thin film, they are blocked by the resin layer, and the influence of pinholes can be avoided. In this way, it functions as a good etching mask by resisting a highly corrosive etching solution. This etching mask can be easily formed. In addition, since the isotropic reaction proceeds in the etching solution, thermal distortion does not occur, and surface defects such as cracks, chips, and chipping due to processing are less likely to occur. The microfabrication quality of will be excellent. Also, since it is an etching solution dipping method, a photomask (the above-mentioned etching mask) is used, and there are costs associated with the photomask and the photoprocess, but the fine processing quality is excellent, and the glass with the same pattern is used. In the case of producing a plurality of intaglio printing plates for printing a brittle substrate, the photomask can be used as a master for any number of duplications, and thus the mass production is excellent. In addition, according to this method, since the pattern formation of the glass-based brittle substrate depends on the immersion etching, the material cost, the equipment cost, the number of the production steps are small, and the industrial productivity is high and the cost is advantageous. .

As described above, a glass-based brittleness having excellent overall characteristics such as good etching shape quality, ease of production correlated with production yield, high productivity and expected to be reflected in cost. A substrate printing intaglio is obtained.

[Brief description of drawings]

FIG. 1 is a process sectional view showing a method for producing a glass-based brittle substrate printing intaglio plate according to the present invention.

FIG. 2 is a cross-sectional view of a glass-based brittle substrate printing intaglio plate manufactured by a method of an etching liquid immersion method of a conventional example.

[Explanation of symbols]

 1 Base 2 Metal Thin Film 2a Metal Pattern 3 Resin Pattern 4 Etching Mask 6 Glass Printing Intaglio (Glass Brittle Substrate Printing Intaglio) 7 Pinhole

 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Katsuhide Tsukamoto 1006 Kadoma, Kadoma City, Osaka Prefecture Matsushita Electric Industrial Co., Ltd.

Claims (2)

[Claims] 1. A step of forming a metal thin film on a glass-based brittle substrate and forming a resin layer on the metal thin film, and a step of processing the resin layer and the metal thin film into a desired pattern.
And a step of etching the glass-based brittle substrate by an etching solution dipping method using the resin layer and the metal thin film having the desired pattern as an etching mask. 2. The method for producing a glass-based brittle substrate printing intaglio according to claim 1, wherein the resin layer is formed by using a photosensitive resin.