JPH07318716A - Photosensitive color resin film, liquid crystal electrooptical device and its production - Google Patents

Abstract

PURPOSE:To obtain a photosensitive color resin film with which a liquid crystal electrooptical device having such a structure that diffusion of impurities from a colored resin layer to liquid crystal can be prevented can be produced without increasing the number of production processes by forming the film of a structure comprising a first colored photosensitive resin layer and a second photosensitive resin layer on the principal plane of the first layer. CONSTITUTION:The photosensitive colored film 101 has a protective photosensitive resin layer 13 between a colored photosensitive resin layer 12 and a surface protective film 15. The resin layer 13 can be patterned by photoengraving technique and prevents elusion of the coloring agent into a liquid crystal. Therefore, when a light-shielding film is formed on the substrate where a nonlinear element array of an active matrix liquid crystal display device is formed, patterning of the protective photosensitive resin layer 13 by photoengraving technique can be easily done while the photosensitive color resin layer 12 to be formed as the light-shielding film is patterned. Further, since the surface of the protective photosensitive resin layer 13 is coated with an oxygen-cutting film 14, the time for exposure for these resin layers 12 and 13 can be decreased.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light-sensitive colored resin film, a liquid crystal electro-optical device and a method for manufacturing the same, and in particular, colored light widely used for manufacturing color filters and light-shielding films of liquid crystal display devices. The present invention relates to a structure of a sensitive colored resin film, a liquid crystal electro-optical device manufactured using the film, and a manufacturing method thereof.

[0002]

2. Description of the Related Art Conventionally, a light-shielding film and a color filter used in a liquid crystal display device or the like are obtained by applying a dye, a pigment, or carbon dispersed in a photoresist varnish onto a substrate by spin coating, and further applying oxygen. It is formed by the process of exposing, developing, and baking after applying the blocking film, and in particular, the color filter is formed by repeating the process for each color of the color filter.

The oxygen barrier layer is required to prevent the photoreaction from being hindered by oxygen during the exposure of the photoresist, which is a photosensitive resin. That is, a wavelength of 40 is used as a color filter for liquid crystal display devices.
It is possible to transmit 50% or more of light in a specific wavelength range of visible light of 0 to 700 nm and absorb 80% or more of light of other wavelengths. Since the minimum requirement is 20% or less in the entire wavelength region of visible light of 700 nm to 700 nm, the amount of the colorant dispersed in the resin is inevitably large, and as a result, the photosensitivity of the photosensitive resin is increased. Is reduced. For this reason, when the oxygen barrier layer is not provided, the exposure time of the photosensitive resin becomes too long due to the influence of oxygen inhibition of the photoreaction.

For example, Japanese Patent Application Laid-Open No. 5-119210 discloses a method of manufacturing a color filter using the above-mentioned oxygen barrier layer.

Further, in the method using the oxygen barrier film as described above, the process is long and the material is wasteful.
A photosensitive colored resin film has been developed in which both sides of a colored photosensitive resin layer are sandwiched by protective films, and especially by forming an oxygen barrier layer on the photosensitive resin layer, the manufacturing process of color filters etc. Those that can be shortened are commercially available. Such a light-sensitive colored resin film, after peeling off the protective film attached to both sides,
It is possible to form a patterned colored resin layer on the substrate by performing a process of performing pressure bonding on the substrate, exposing, developing, and baking, and waste of material in the manufacturing process of the color filter and the like. Less,
It has the advantage that the process can be shortened.

[0006]

However, the colored photosensitive resin layer of such a photosensitive resin film is
When used as a colored layer formed inside the cell of a liquid crystal display device, dyes, pigments, carbon, etc. mixed in the colored photosensitive resin layer may elute into the liquid crystal. Elution of such as lowers the specific resistance of the liquid crystal,
Since it causes display defects such as unevenness and flicker on the liquid crystal screen, it is necessary to form a protective film on the colored layer to prevent the impurities from eluting into the liquid crystal.

This protective film is usually obtained by spin-coating a resin such as polyimide or acryl on a substrate on which a color filter or the like is formed and baking it. However, such a protective film forming method is wasteful of materials. However, the number of processes was increased.

For this, for example, Japanese Patent Laid-Open No. 5-9380
There has been proposed a method in which a thermoplastic resin sheet as shown in Japanese Patent Laid-Open No. 6 is independently attached as a protective film on a color filter. However, in this method, when the colored photosensitive resin layer is formed as a light-shielding film on the substrate on the side of the non-linear element array of the active matrix type liquid crystal display device, the above-mentioned sheet (protective film) is formed. Since it is necessary to pattern along the shielded film,
The implementation was very difficult. That is, the patterning of this sheet (protective film) by photolithography and selective etching, specifically, the process of etching the sheet using the photoresist mask formed thereon is performed by removing the resist or removing the sheet. It was difficult from the viewpoint of etching characteristics, and it was a factor to further increase the number of processes.

The present invention has been made to solve the above-mentioned problems, and a manufacturing process of a liquid crystal electro-optical device having a structure capable of preventing diffusion of impurities from the colored resin layer into the liquid crystal. It is an object of the present invention to provide a light-sensitive colored resin film for manufacturing without causing an increase in

The present invention was made in order to solve the above problems, and it is possible to prevent the diffusion of impurities from the colored resin film formed in the cell into the liquid crystal, and to manufacture It is an object of the present invention to provide a liquid crystal electro-optical device having a simple process, low cost and high performance, and a manufacturing method thereof.

[0011]

The light-sensitive colored resin film of the present invention is formed on a colored first light-sensitive resin layer and one main surface of the first light-sensitive resin layer. The first
Second photosensitive resin layer having a light transmittance greater than that of the second photosensitive resin layer, and another main surface of the first photosensitive resin layer and the second photosensitive resin layer. On the surface of the resin layer, there is provided a protective film which is formed so as to sandwich these light-sensitive resin layers and which can be peeled off, whereby the above object is achieved.

The liquid crystal electro-optical device of the present invention is arranged so as to face each other, and has first and second substrates having electrodes formed on respective facing main surfaces, and the first and second substrates. Provided on the main surface of one or both of the first and second substrates, which is sandwiched between them, and which is made of a substance exhibiting liquid crystallinity and has an optical property varying body in which the optical properties of the liquid crystal substance are changed by application of an electric field. A colored layer formed by patterning a colored first photosensitive resin layer containing a dye, a pigment or carbon, and the first photosensitive resin provided on the colored layer so as to cover the colored layer. And a protective film formed by patterning a second photosensitive resin film having a light transmittance greater than that of the layer, thereby achieving the above object.

The method of manufacturing a liquid crystal electro-optical device according to the present invention comprises:
A colored first photosensitive resin layer and a light transmittance which is formed on one main surface of the first photosensitive resin layer and is higher than the light transmittance of the first photosensitive resin layer. The second photosensitive resin layer which it has, and these photosensitive resin layers are sandwiched on the other main surface of the first photosensitive resin layer and on the surface of the second photosensitive resin layer. And a peelable protective film is used, and the first photosensitive resin layer is patterned by its exposure, development and baking to form the liquid crystal electro-optical device. Forming a colored layer,
The second photosensitive resin layer is patterned by its exposure, development and baking to form a protective film for covering the colored layer of the liquid crystal electro-optical device, and the above-mentioned object is achieved thereby. .

[0014]

In the present invention, the light-sensitive colored resin film has a structure in which the second light-sensitive resin layer is provided on one main surface of the colored first light-sensitive resin layer. The elution of impurities from the first photosensitive resin layer is suppressed by the second photosensitive resin layer, and the second photosensitive resin layer can be patterned by exposure and development. The liquid crystal electro-optical device having a structure capable of preventing the diffusion of impurities from the colored resin layer into the liquid crystal can be manufactured without increasing the manufacturing process.

As a result, it is possible to prevent the reliability of the liquid crystal electro-optical device having the colored layer inside the cell from being deteriorated and the liquid crystal alignment from being disturbed, while suppressing a large increase in the manufacturing process.

In particular, by setting the softening temperature of the second photosensitive resin layer to be lower than the softening temperature of the colored first photosensitive resin layer, the second photosensitive resin layer is formed. It is possible to generate heat dripping of the resin,
The side surface of the colored layer formed of the photosensitive resin layer can also be coated. Furthermore, since the tapered portions can be formed on the side surfaces of the first and second photosensitive resin layers due to the heat sag of the second photosensitive resin layer, the liquid crystal in the peripheral portion of the photosensitive resin layers can be formed. There is a merit that the disordered orientation of the molecules is less likely to occur.

[0017]

EXAMPLES Examples of the present invention will be described below.

(Embodiment 1) FIG. 1 is a sectional view for explaining a photosensitive colored resin film according to a first embodiment of the present invention, in which 101 is used in a method for manufacturing a liquid crystal electro-optical device. A light-sensitive colored resin film (hereinafter, also referred to as a light-sensitive colored film) of the present embodiment, which is a photosensitive colored resin layer 12, a protective photosensitive resin layer 13, and an oxygen barrier on a base film 11. The layers 14 are sequentially laminated, and the surface of the oxygen barrier layer 14 is covered with a protective film layer 15. Here, the photosensitive colored resin layer 12 and the protective photosensitive resin layer 13 are a negative type,
Any type of positive type may be used, but it is necessary that the types of both layers are the same. In addition, the above-mentioned photosensitive colored resin layer 1
As the colorant of No. 2, a dye or a pigment can be used for the color filter, and a dye, a pigment or carbon can be used for the light shielding film.

Next, a method for producing the above-mentioned light-sensitive colored film will be described.

First, on a base film 11 made of a roll-shaped plastic film, a resin in which a pigment is dispersed in a negative photoresist made of a polymethacrylic acid ester resin is applied to a film thickness of 2 μm and dried to form a photosensitive film. The colored resin layer 12 is formed.

Subsequently, a polymethacrylic acid ester resin having a softening temperature lower than that of the resin in which the above-mentioned pigment is dispersed and a coloring agent is not added and therefore has a large light transmittance is applied to a film thickness of 2 μm and dried. , Protective photosensitive resin layer 13
To form. Here, the softening temperature of the polymethacrylic acid ester resin can be adjusted by the degree of polymerization of the resin, and the smaller the softening temperature, the lower the softening temperature.

Then, a layer of polyvinyl alcohol having a film thickness of 1 μm is coated on the resin layer 13 and dried to form an oxygen-blocking film 14, which is further covered with a protective plastic film 15 so as to have photosensitivity. Coloring film 101
To get

Next, the function and effect will be described.

The light-sensitive colored film of this embodiment has a colorant which can be patterned between the colored light-sensitive resin layer 12 and the protective film 15 for protecting the surface thereof by photolithography. Since the structure has the protective photosensitive resin layer 13 for preventing elution into the liquid crystal,
When the light-shielding film is formed on the substrate on the side of the non-linear element array of the active matrix type liquid crystal display device using the light-sensitive colored film, a photosensitive resin layer for protection of the light-sensitive colored film is formed by photolithography. The patterning of 13 can be easily performed together with the patterning of the photosensitive colored resin layer 12 serving as the light shielding film.

Further, since the surface of the protective photosensitive resin layer 13 is covered with the oxygen barrier film 14, the photoreaction of the photosensitive resin is not hindered by oxygen, and the resin layer 13 and the layer below it are prevented. The exposure time of the photosensitive colored resin layer 12 on the side can be shortened.

(Embodiment 2) FIG. 2 is a sectional view for explaining a liquid crystal electro-optical device according to a second embodiment of the present invention, showing a liquid crystal cell portion of the device. FIG. 3 is a cross-sectional view for explaining the method of manufacturing the liquid crystal electro-optical device.

In the figure, reference numeral 102 denotes a liquid crystal cell which constitutes the liquid crystal electro-optical device of this embodiment, and the liquid crystal electro-optical device is manufactured by using the light-sensitive colored film of the first embodiment. A plurality of thin film transistors 24 and transparent electrodes 22a are arranged on the transparent substrate 21a of the active element substrate 102a. Further, the thin film transistor 24 is covered with a light shielding film 12a, and the light shielding film 12a is further covered with a protective film 13a for preventing the colorant contained therein from being eluted into the liquid crystal. An alignment film 23a is formed on the protective film 13a and the transparent electrode 22a.

On the other hand, the transparent substrate 21b of the counter substrate 102b
A transparent electrode 22b is formed on the transparent electrode 22b, and an alignment film 23b is further formed thereon. The substrate 21b is separated from the substrate 21a by a spacer 25 for a certain period of time,
Liquid crystal 27 is injected into the region between the two substrates, which is disposed on a and is sealed by the sealing member 26.

Next, a method of manufacturing the above liquid crystal electro-optical device will be described.

First, tantalum, titanium, molybdenum, aluminum, copper, indium tin oxide (hereinafter referred to as ITO) is formed on a substrate 21a made of glass, quartz, plastic or the like.
Is abbreviated. 2) is formed, and then a gate insulating film made of an insulating material such as silicon oxide, silicon nitride, or tantalum oxide is formed. After that, the amorphous silicon semiconductor film and the n ⁺ amorphous silicon film are patterned into a predetermined shape, and tantalum, titanium, molybdenum, aluminum, copper, ITO
Source and drain electrodes are formed using a conductive material such as, and the amorphous silicon thin film transistor 24 is formed.

Further, the pixel electrode 22 is formed by using ITO.
By forming a, an active element substrate 102a using an amorphous silicon thin film transistor is manufactured.

Next, a light-shielding film is formed on the transparent substrate 21a using the light-sensitive colored film described in Example 1 in which the pigment of iron oxide-manganese is dispersed in the photosensitive colored resin layer 12. .

That is, as shown in FIG. 3A, the light-sensitive coloring film 1 of FIG.
01 is attached on the active element substrate 102a, and then the protective film 15 of the colored film 101 is peeled off.

In this state, the photosensitive resin layers 12 and 13 on the substrate 102a are exposed by using an ultraviolet exposure mask 120 (FIG. 3B), and the resin layer is developed with an aqueous sodium carbonate solution and oxygen is added. The blocking film 14 is removed (see FIG.
(C)) Then, after washing with pure water, the photosensitive resin layer is baked to obtain an active element substrate in which the light shielding film 12a is formed in a portion other than the pixel electrode in the display area.

By setting the softening temperature of the protective layer 13a on the light-shielding layer 12a lower than the firing temperature by 10 to 20 ° C., the protective layer 13a melts during firing,
It is possible to obtain a structure in which the side surface of the light shielding layer 12a is also covered with the protective layer 13a. Incidentally, 121 is a substrate constituting the photomask 120, and 122 is the photomask 120.
It is a light-shielding layer formed on the substrate 121.

After that, alignment films 23a and 23b made of polyimide are formed on both the active element substrate 102a and the counter substrate 102b on which the ITO transparent electrode 22b is formed, and the alignment films are aligned by a rubbing method. After the treatment, both substrates are bonded together by a seal member 26 with spacers having a diameter of 5 μm sandwiched therebetween, and a liquid crystal 27 is injected to form a liquid crystal cell.

Finally, a polarizing plate was attached to this liquid crystal cell,
A liquid crystal driver is mounted and connected to a drive circuit to complete a liquid crystal electro-optical device.

As described above, in this embodiment, the light-sensitive colored film in which the pigment of iron oxide-manganese is dispersed is used in the photosensitive colored resin layer 12 to form the light-shielding film on the substrate 21a. A highly reliable light-shielding film can be formed with a high yield by a simple process.

In this embodiment, as the liquid crystal cell,
Although an active matrix type liquid crystal cell using an amorphous silicon thin film transistor has been taken as an example, it may be an active matrix type liquid crystal cell using a non-linear element such as a thin film transistor or MIM element using polysilicon or single crystal silicon. , A simple matrix type liquid crystal cell driven by an electric field between intersecting upper and lower data signal lines, and a surface-stabilized ferroelectric type liquid crystal cell using a ferroelectric type liquid crystal in the simple matrix type. A liquid crystal cell may be used, and has the same effect as that of the above embodiment.

(Embodiment 3) FIG. 4 is a sectional view for explaining a liquid crystal electro-optical device according to a third embodiment of the present invention, showing the structure of a liquid crystal cell substrate constituting the liquid crystal electro-optical device. ing.

The liquid crystal electro-optical device according to this embodiment uses a counter substrate 103 having a color filter and a light-shielding film, instead of the counter substrate 102b according to the second embodiment. In this counter substrate 103, red, blue, and green filters 30a, 30b, and 30 are provided on the transparent substrate 21b in regions corresponding to the respective pixel electrodes of the active element substrate.
c is arranged together with the light-shielding film 30, and the protective film 3 for preventing the colorant from being eluted into the liquid crystal is provided on each filter and the light-shielding film.
1 is formed. A transparent electrode 32 is formed on the entire surface of the protective film 31, and the transparent electrode 32 and the protective film 31 are covered with an alignment film 33.

Next, the manufacturing method will be described.

First, the photosensitive colored film of Example 1 in which a red pigment is dispersed in the photosensitive colored resin layer is used, and the base film 11 is peeled off to form the transparent substrate 21b.
Paste on top. After removing the protective film 15,
Exposure, development, and baking are performed in the same manner as in Example 2 to form the red color filter 30a. Subsequently, similarly to the above-mentioned red color filter, the green color filter 30b and the blue color filter 30c are formed, and further, the light shielding film 30 is formed in the same manner.

After that, the transparent conductive film 32 and the alignment film 33 are formed.
Are formed to complete the substrate 103 of the liquid crystal cell. Then, the substrate 103 and the active element substrate 102a shown in FIG. 2 are bonded to each other as described in Example 2 to complete the liquid crystal electro-optical device of this example.

As described above, in this embodiment, the photosensitive colored resin layer 12 of the light-sensitive colored film of the first embodiment in which the red, green and blue pigments are dispersed is used on the transparent substrate 21b. Since the red, green, and blue color filters are formed, a highly reliable color filter can be formed with a high yield by a simple process.

In the above embodiment, the light shielding film 30 is formed together with the color filter, but the light shielding film may be omitted if not necessary.

Further, as described in the third embodiment, the light-shielding film is not limited to the one formed by the photolithography technique, and the light-shielding film may be formed by self-alignment using a color filter as a mask. Briefly, after forming a color filter in a predetermined portion on a transparent substrate, a photosensitive colored resin layer for a light-shielding film is formed thereon, and then the resin layer is irradiated with exposure light from the back side of the transparent substrate. Alternatively, the light-shielding film may be formed by selectively removing the non-exposed portion of the resin layer on the color filter.

Further, when the entire display area is covered with a plurality of colored resin layers by forming a light-shielding film as in the third embodiment, the light-sensitive coloring corresponding to the last resin layer to be formed. For light-sensitive colored films other than the film, the baking temperature of the protective film is set lower than the softening temperature, and the baking treatment of the light-sensitive resin layer of the last light-sensitive colored film is performed by the softening temperature of the protective film. By baking at a higher temperature, it is possible to obtain a state in which the protective films of the respective photosensitive color films are in close contact with each other.

The color of the color filter is not limited to those shown in the above embodiment, but may be cyan, magenta, yellow, or any other color, and the number of colors need not be three. Further, a colorless color filter region may be provided, and even in that case, there is an advantage that the color filter can be flattened. Further, the liquid crystal electro-optical device may be configured by combining these color filter substrates and the active matrix substrate of Example 2 having the light shielding film.

[0050]

As described above, according to the present invention, a structure having a light-sensitive colored film and a second light-sensitive resin layer on one main surface of the colored first light-sensitive resin layer. Therefore, by using the light-sensitive colored film, a liquid crystal electro-optical device having a structure capable of preventing the diffusion of impurities from the colored resin layer into the liquid crystal can be produced without increasing the manufacturing process. There is an effect that can be manufactured.

That is, by using the above-mentioned photosensitive colored film, a highly reliable light-shielding film and colored film can be manufactured by a simple process with good yield, and a liquid crystal cell manufactured using this film is Even if a light-shielding film or a color filter is formed inside the liquid crystal electro-optical device, the reliability is not deteriorated and the liquid crystal alignment is not disturbed. Obtainable.

[Brief description of drawings]

FIG. 1 is a cross-sectional view illustrating a light-sensitive colored film according to a first embodiment of the present invention.

FIG. 2 is a sectional view showing a liquid crystal cell portion of a liquid crystal electro-optical device according to a second embodiment of the present invention.

FIG. 3 is a cross-sectional view illustrating the method of manufacturing the liquid crystal electro-optical device according to the second embodiment.

FIG. 4 is a sectional view illustrating a liquid crystal electro-optical device according to a third embodiment of the present invention.

[Explanation of symbols]

 11 Base Film 12 Photosensitive Colored Resin Layer 12a, 30 Light-shielding Film 13 Protective Photosensitive Resin Layer 13a, 31 Protective Layer 14 Oxygen Shielding Layer 15 Protective Film 21a, 21b Transparent Substrate 22a, 22b Transparent Electrode 23a, 23b, 33 Orientation Film 24 Thin film transistor 25 Spacer 26 Sealing member 27 Liquid crystal 30a Red color filter 30b Green color filter 30c Blue color filter 32 Transparent conductive film 101 Photosensitive coloring film 102 Liquid crystal electro-optical device 103 Liquid crystal cell substrate 120 Photomask 121 Photomask substrate 122 Light-shielding layer of photomask

Claims (11)

[Claims] 1. A colored first photosensitive resin layer, and a light transmittance of the first photosensitive resin layer formed on one main surface of the first photosensitive resin layer. A second photosensitive resin layer having a higher light transmittance, and the light on the other main surface of the first photosensitive resin layer and on the surface of the second photosensitive resin layer. A photo-sensitive colored resin film comprising a protective film which is formed so as to be sandwiched between the sensitive resin layers and capable of being peeled off. 2. The second photosensitive resin layer is the first photosensitive resin layer.
The light-sensitive colored resin film according to claim 1, which has a softening temperature lower than that of the light-sensitive resin layer. 3. An oxygen blocking layer for preventing oxygen from entering the first and second photosensitive resin layers, between the second photosensitive resin layer and the protective film. The light-sensitive colored resin film described. 4. The first photosensitive resin layer has a wavelength of 40
The photosensitivity according to claim 1, wherein 50% or more of light in a specific wavelength range of visible light of 0 to 700 nm is transmitted, and light of the visible light having a wavelength other than the specific wavelength range is absorbed. Colored resin film. 5. The photosensitive material according to claim 1, wherein the first photosensitive resin layer has a light transmittance of 20% or less over the entire wavelength range of visible light having a wavelength of 400 to 700 nm. Colored resin film. 6. A first and a second substrate, which are arranged so as to face each other and have electrodes formed on respective facing main surfaces, and a liquid crystallinity, which is sandwiched between the first and the second substrate. And a variable optical property in which the optical property of the liquid crystalline substance is changed by application of an electric field, and a dye, a pigment or a carbon provided on one or both main surfaces of the first and second substrates. And a colored layer formed by patterning a colored first photosensitive resin layer, and light having a light transmittance higher than that of the first photosensitive resin layer, which is provided on the colored layer so as to cover the colored layer. A liquid crystal electro-optical device comprising: a protective film formed by patterning a second photosensitive resin layer having a transmittance. 7. The second photosensitive resin layer is the first photosensitive resin layer.
7. The liquid crystal electro-optical device according to claim 6, which has a softening temperature lower than the softening temperature of the photosensitive resin layer. 8. The first photosensitive resin layer has a wavelength of 40 nm.
7. A color filter which transmits 50% or more of light in a specific wavelength range of visible light of 0 to 700 nm and absorbs 80% or more of light of the visible light having a wavelength other than the specific wavelength range. The liquid crystal electro-optical device described. 9. The liquid crystal electricity according to claim 6, wherein the first photosensitive resin layer has a light transmittance of 20% or less over the entire wavelength range of visible light having a wavelength of 400 to 700 nm. Optical device. 10. A colored first photosensitive resin layer,
The first photosensitive resin layer is formed on one main surface of the first photosensitive resin layer;
Second photosensitive resin layer having a light transmittance greater than that of the second photosensitive resin layer, and another main surface of the first photosensitive resin layer and the second photosensitive resin layer. A method for producing a liquid crystal electro-optical device, using a photosensitive resin film having a protective film formed on the surface of the resin layer so as to sandwich these photosensitive resin layers and capable of peeling, The first photosensitive resin layer is patterned by exposure, development, and baking to form a colored layer that constitutes the liquid crystal electro-optical device, and the second photosensitive resin layer is exposed, developed, and A method for manufacturing a liquid crystal electro-optical device, comprising patterning by firing to form a protective film for covering the colored layer of the liquid crystal electro-optical device. 11. In the step of sequentially forming a plurality of colored layers by using a plurality of the photosensitive resin films, the treatment other than baking of the finally formed colored layer is the same as that of the second photosensitive resin layer. 11. The method for manufacturing a liquid crystal electro-optical device according to claim 10, wherein the firing is performed at a temperature lower than the softening temperature, and the firing of the coloring layer formed last is performed at a temperature higher than the softening temperature of the second photosensitive resin layer.