JPH0731778B2 - Method of manufacturing thin film magnetic head - Google Patents

Method of manufacturing thin film magnetic head

Info

Publication number
JPH0731778B2
JPH0731778B2 JP60018092A JP1809285A JPH0731778B2 JP H0731778 B2 JPH0731778 B2 JP H0731778B2 JP 60018092 A JP60018092 A JP 60018092A JP 1809285 A JP1809285 A JP 1809285A JP H0731778 B2 JPH0731778 B2 JP H0731778B2
Authority
JP
Japan
Prior art keywords
substrate
coil
groove
magnetic head
thin film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60018092A
Other languages
Japanese (ja)
Other versions
JPS61178709A (en
Inventor
東郷 西山
克彦 小栗
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Victor Company of Japan Ltd
Original Assignee
Victor Company of Japan Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Victor Company of Japan Ltd filed Critical Victor Company of Japan Ltd
Priority to JP60018092A priority Critical patent/JPH0731778B2/en
Priority to US06/823,252 priority patent/US4743988A/en
Priority to DE3644921A priority patent/DE3644921C2/de
Priority to DE19863603039 priority patent/DE3603039A1/en
Publication of JPS61178709A publication Critical patent/JPS61178709A/en
Publication of JPH0731778B2 publication Critical patent/JPH0731778B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は薄膜磁気ヘッドの、特に巻線数の多い高効率の
薄膜磁気ヘッドの製造方法に関する。
Description: TECHNICAL FIELD The present invention relates to a method for manufacturing a thin film magnetic head, particularly a highly efficient thin film magnetic head having a large number of windings.

(従来の技術) 第13図は従来の製造方法による薄膜磁気ヘッドの要部構
成を示す断面図であり、同図において、絶縁材よりなる
基板20上に、Cu等の導電材を蒸着してコイルパターン21
を形成し、そのコイルパターン21上部とその間隙間を樹
脂により埋め絶縁層22を形成し、その上部からパーマロ
イ等の磁性材を蒸着等により付着させ下部コア23を形成
する。
(Prior Art) FIG. 13 is a cross-sectional view showing the structure of a main part of a thin film magnetic head manufactured by a conventional manufacturing method. In FIG. 13, a conductive material such as Cu is deposited on a substrate 20 made of an insulating material. Coil pattern 21
An insulating layer 22 is formed by filling the upper part of the coil pattern 21 and a gap therebetween with a resin, and a magnetic material such as permalloy is attached from the upper part by vapor deposition or the like to form a lower core 23.

更に、下部コア23上からギャップ層24、コイルパターン
25を配設した樹脂によって絶縁層26を形成し、更にこの
絶縁層26の上部にパーマロイ等の磁性材からなる上部コ
ア27、保護層28を順次形成する。上記従来例になる製造
方法により得られた薄膜磁気ヘッドは下部コア23の磁気
回路に凹凸があり、その為磁気特性が劣化するという問
題点があった。
Furthermore, the gap layer 24 and the coil pattern are arranged from above the lower core 23.
An insulating layer 26 is formed of a resin in which 25 is disposed, and an upper core 27 and a protective layer 28 made of a magnetic material such as permalloy are sequentially formed on the insulating layer 26. The thin-film magnetic head obtained by the above-described conventional manufacturing method has a problem that the magnetic circuit of the lower core 23 has irregularities, which deteriorates the magnetic characteristics.

そこで、この従来の方法を改良したものとして、第14図
示の如くの断面構成を有する薄膜磁気ヘッドがある。こ
の第14図示の薄膜磁気ヘッドは次のようにして製造す
る。
Then, as an improvement of this conventional method, there is a thin film magnetic head having a sectional structure as shown in the fourteenth drawing. The thin film magnetic head shown in FIG. 14 is manufactured as follows.

第14図において、強磁性体である例えばフェライトの基
板30上に逆台形状の溝31を形成し、その溝31の底部にA
l,Cu等の導電材のコイルパターン32を蒸着等で付着さ
せ、その上部より無機絶縁材であるガラスを所定の温度
(450℃〜750℃)で溶融して溝31内に充填し、絶縁層33
を形成後、基板30の表面を研磨することにより基板30お
よび絶縁層33の表面を同一平面にする。しかる後、その
上部から逆台形状の溝を覆う如くAl,Cu等のコイルパタ
ーン34を形成し、更に、その上部より非磁性絶縁層35,
強磁性材よりなる例えばフェライトの磁性層36を順次形
成する。
In FIG. 14, an inverted trapezoidal groove 31 is formed on a substrate 30 made of, for example, ferrite, which is a ferromagnetic material, and A is formed at the bottom of the groove 31.
A coil pattern 32 made of a conductive material such as l, Cu is attached by vapor deposition or the like, and glass, which is an inorganic insulating material, is melted at a predetermined temperature (450 ° C. to 750 ° C.) from the top of the coil pattern 32 to fill the groove 31 with insulation. Layer 33
After forming, the surfaces of the substrate 30 and the insulating layer 33 are made flush with each other by polishing the surface of the substrate 30. After that, a coil pattern 34 of Al, Cu or the like is formed from the upper portion so as to cover the inverted trapezoidal groove, and the nonmagnetic insulating layer 35 is formed from the upper portion.
A magnetic layer 36 made of a ferromagnetic material, such as ferrite, is sequentially formed.

尚、コイルパターン32および34を形成するに際しては通
常、フォトレジストを均一に塗布し、パターンのフォト
マスクで覆い、光照射及び現像をし、蒸着等で導電体を
形成後、残りのフォトレジストを除去する方法で行な
う。
Incidentally, when forming the coil patterns 32 and 34, usually, a photoresist is uniformly applied, covered with a photomask of the pattern, light irradiation and development are performed, a conductor is formed by vapor deposition or the like, and then the remaining photoresist is removed. Use the removal method.

(発明が解決しようとする問題点) しかるに、この第14図の従来例においても、導電性のコ
イルパターン32を形成後、その上部より溝31内を無機絶
縁材であるガラスを溶融充填するものであるから、ガラ
スの溶融温度(450℃〜750℃)によりコイルパターン32
の金属が酸化により劣化し、著しい場合は切断の怒れが
ある。また、基板30のフェライトとコイルパターン32の
金属との温度膨張係数が異なる為、ガラスの溶融温度に
よってコイルパターンが剥れる恐れもある。
(Problems to be Solved by the Invention) However, also in the conventional example of FIG. 14, after forming the conductive coil pattern 32, the groove 31 is melt-filled from the upper part to the inside of the groove 31. Therefore, the coil pattern 32 depends on the melting temperature of the glass (450 ° C to 750 ° C).
The metal is deteriorated by oxidation, and in extreme cases, there is anger of cutting. Further, since the ferrite of the substrate 30 and the metal of the coil pattern 32 have different coefficients of thermal expansion, the coil pattern may be peeled off depending on the melting temperature of the glass.

一方コイルパターン32は溝31の底部にあるので、その形
成時、フォトレジストの塗布が均一になり難く、さらに
フォトマスクは基板30上に置き露光するので溝31の底部
では露光パターンの焦点がぼける。これらの原因により
コイルパターン32の仕上り精度が良くなく、コイルの本
数を多く取る異は困難である等の問題点があった。
On the other hand, since the coil pattern 32 is at the bottom of the groove 31, it is difficult to uniformly apply the photoresist when forming the coil pattern 32. Further, since the photomask is placed on the substrate 30 and exposed, the focus of the exposure pattern is defocused at the bottom of the groove 31. . Due to these reasons, the finish accuracy of the coil pattern 32 is not good, and it is difficult to obtain a large number of coils.

(問題点を解決するための手段) 本発明は上記問題点を解決する為に、溝が形成された強
磁性材の基板上の前記溝に非磁性無機質の絶縁材を充填
し、しかる後、前記基板上および前記絶縁材上を研磨し
て同一平面状にし、一本の前記溝に対応する前記絶縁材
上に複数のコイル部用溝を形成し、この複数のコイル部
用溝に導電材を充填してコイル部を形成した基板上を研
磨して同一平面にし、この基板のコイル部上に少なくと
も強磁性材よりなるコアを配設したことを特徴とする薄
膜磁気ヘッドの製造方法を提供するものである。
(Means for Solving the Problems) In order to solve the above problems, the present invention fills the groove on the substrate of the ferromagnetic material in which the groove is formed with a non-magnetic inorganic insulating material, and thereafter, The substrate and the insulating material are polished to be in the same plane, a plurality of coil portion grooves are formed on the insulating material corresponding to one groove, and a conductive material is provided in the plurality of coil portion grooves. A method for manufacturing a thin-film magnetic head, characterized in that a substrate on which a coil portion is formed by polishing is ground to be flush with the substrate, and at least a core made of a ferromagnetic material is disposed on the coil portion of the substrate. To do.

(実施例) 第1図〜第8図は本発明による薄膜磁気ヘッドの製造方
法による第1の実施例の工程図をそれぞれ示す。
(Embodiment) FIGS. 1 to 8 are process diagrams of a first embodiment of a method of manufacturing a thin film magnetic head according to the present invention.

1はセンダストまたはフェライト等の強磁性材よりなる
基板で、基板1上には逆台形状の溝2が加工される(第
1図参照)。この溝2の加工法は機械加工によるダイヤ
モンドカッティング、化学加工によるケミカルエッチン
グまたは物理加工によるスパッタエッチングなどにより
可能である。溝2に非磁性材かつ無機質の絶縁体3、例
えば、鉛ガラスであれば、これを基板1の表面より若干
高くなるように溶融充填する。また、絶縁体3はAl2O3
またはSiO2を蒸着等で形成してもよい。絶縁体3を充填
後、その表面を研磨して基板1と鉛ガラスとの表面を同
一面にする(第2図参照)。
Reference numeral 1 is a substrate made of a ferromagnetic material such as sendust or ferrite, and an inverted trapezoidal groove 2 is formed on the substrate 1 (see FIG. 1). The groove 2 can be processed by diamond cutting by mechanical processing, chemical etching by chemical processing, sputter etching by physical processing, or the like. In the case of a non-magnetic and inorganic insulator 3, for example, lead glass, the groove 2 is melt-filled so as to be slightly higher than the surface of the substrate 1. The insulator 3 is Al 2 O 3
Alternatively, SiO 2 may be formed by vapor deposition or the like. After filling the insulator 3, the surface thereof is polished to make the surfaces of the substrate 1 and the lead glass flush with each other (see FIG. 2).

このように研磨された基板1の上部にフォトレジストを
均一に塗布し、フォトマスクで覆い、光照射,現像等の
工程をへて、絶縁体3の表面にコイル用のパターンを描
き、例えばエッチング等によりコイル下半部用の溝4を
形成する(第3図参照)。溝4は溝2に対して長手方向
に設けられている。この溝4のそれぞれの数は磁気ヘッ
ドのコイルの巻数を決定するものである。
A photoresist is evenly coated on the substrate 1 polished in this way, covered with a photomask, and a pattern for a coil is drawn on the surface of the insulator 3 through steps such as light irradiation and development. Etc. to form the groove 4 for the lower half of the coil (see FIG. 3). The groove 4 is provided in the longitudinal direction with respect to the groove 2. The number of each groove 4 determines the number of turns of the coil of the magnetic head.

第4図は第3図のA−A面での断面図を示し、溝4の深
さはdである。溝4の加工後、基板1上にAl、またはCu
等の非磁性導電性金属をスパッタリングまたは蒸着等で
堆積させる。その厚さは溝4の深さdより大きく堆積さ
せた後、表面を研磨して鏡面仕上げをすることにより溝
4の深さの最初の深さdより小さいd′にし、基板1上
の表面を平坦にし、コイル下半部5を形成する(第5図
参照)。
FIG. 4 is a sectional view taken along the line AA of FIG. 3, in which the depth of the groove 4 is d. After processing the groove 4, Al or Cu on the substrate 1
A non-magnetic conductive metal such as is deposited by sputtering or vapor deposition. The thickness of the groove 4 is made larger than the depth d of the groove 4, and then the surface is polished to a mirror finish to be d'which is smaller than the initial depth d of the groove 4 to obtain a surface on the substrate 1. Is flattened to form the coil lower half 5 (see FIG. 5).

そして、その上部から磁気ヘッドのギャップを形成する
為に所定の厚さの非磁性の絶縁層(図示せず)をスパッ
タリングまたは蒸着等で形成し、更にコイル下半部5の
上部に磁気コア用にセンダストまたはフェライト等の強
磁性材を公知の方法によりコア6を形成する(第6図参
照)。コア6の幅6aはコイル下半部5の長さ5aより小さ
く設定する。そして、コア6の表面に絶縁材(図示せ
ず)を配設し、更にコイル上半部7を公知の方法で配設
する。コイル上半部7はコイル下半部5とでコア6を巻
回する様に配設されており、コイル上半部7は上部から
見るとジグザグ状にコイル下半部5と接続されている
(第7図参照)。第8図は第7図B−B面での断面図を
示す。
Then, a non-magnetic insulating layer (not shown) having a predetermined thickness is formed by sputtering or vapor deposition to form a gap of the magnetic head from above the magnetic head. Then, the core 6 is formed by a known method using a ferromagnetic material such as sendust or ferrite (see FIG. 6). The width 6a of the core 6 is set smaller than the length 5a of the lower coil half 5. Then, an insulating material (not shown) is arranged on the surface of the core 6, and further the coil upper half portion 7 is arranged by a known method. The coil upper half 7 and the coil lower half 5 are arranged so as to wind the core 6, and the coil upper half 7 is connected to the coil lower half 5 in a zigzag shape when viewed from above. (See FIG. 7). FIG. 8 is a sectional view taken along the line BB of FIG.

第9図および第10図は本発明の薄膜磁気ヘッドの製造方
法による第2の実施例の工程略図を示し、特に、コイル
をスパイラル状に巻いた時の製造例で、第9図はその平
面図、第10図は第9図C−C面での断面図をそれぞれ示
す。
9 and 10 are schematic process diagrams of a second embodiment of the method for manufacturing a thin film magnetic head according to the present invention. Particularly, a manufacturing example when a coil is wound in a spiral shape, and FIG. FIG. 10 and FIG. 10 are sectional views taken along the plane CC of FIG. 9, respectively.

製造方法は第1の実施例の場合と略同様であり、センダ
ストまたはフェライト等の強磁性材よりなる基板8に第
1の実施例の場合と同様に逆台形状の溝9が形成され、
その溝9を無機質の絶縁材10で充填し、その表面を同一
平面化し、スパイラル状の溝11a,11bがフォトエッチン
グ等により加工される。溝11aは絶縁材10の上部に形成
された部分、溝11bは直接基板8の上部に形成された部
分をそれぞれ示す。そして、溝11bには絶縁用の無機質
絶縁材(図示せず)の薄膜を付着させる。
The manufacturing method is substantially the same as in the case of the first embodiment, and the reverse trapezoidal groove 9 is formed in the substrate 8 made of a ferromagnetic material such as sendust or ferrite as in the case of the first embodiment.
The groove 9 is filled with an inorganic insulating material 10, the surface thereof is made flat, and the spiral grooves 11a and 11b are processed by photoetching or the like. The groove 11a is a portion formed on the insulating material 10 and the groove 11b is a portion directly formed on the substrate 8. Then, a thin film of an insulating inorganic insulating material (not shown) is attached to the groove 11b.

溝11a,11bの上部から非磁性の導電性の金属、例えば、A
lまたはCu等を溝11aおよび11bにその溝面より高めに充
填しコイル12を形成する。そして、その表面を研磨し、
同一平面化し、ギャップ層(図示せず)、磁性体よりな
る上部コア13を順次形成する。
From the top of the grooves 11a and 11b, a non-magnetic conductive metal such as A
The coil 12 is formed by filling the grooves 11a and 11b with l or Cu or the like higher than the groove surface. Then, polish the surface,
The same plane is formed, and a gap layer (not shown) and an upper core 13 made of a magnetic material are sequentially formed.

第11図および第12図は前記実施例と異なるベースとなる
基板の製法を示すものである。
11 and 12 show a method of manufacturing a base substrate which is different from the above embodiment.

第11図において、14は非磁性体よりなる例えばセラミッ
ク板で逆台形状の溝15が形成されており、セラミック板
14上に強磁性体であるセンダスト等をスパッタリング等
によって付着させ、磁性層16を形成する。第12図は例え
ば、フェライトのような酸化磁性体よりなる基板17(第
1図の基板1と同様)のその一部、例えばテープ摺動面
近傍を除去し、その後に金属磁性材層18を固着して複数
の磁性材により基板を形成する。
In FIG. 11, 14 is a non-magnetic material, for example, a ceramic plate in which an inverted trapezoidal groove 15 is formed.
A magnetic layer 16 is formed by depositing sendust or the like, which is a ferromagnetic material, on 14 by sputtering or the like. FIG. 12 shows, for example, a part of a substrate 17 (similar to the substrate 1 of FIG. 1) made of an oxide magnetic material such as ferrite, for example, the vicinity of the tape sliding surface is removed, and then the metal magnetic material layer 18 is formed. A substrate is formed of a plurality of magnetic materials that are fixed to each other.

(効 果) 本発明の製造方法によれば、磁気回路に凹凸がなく、更
に、精度の高いコイルパターンが得られる為、コイルの
ターン数を多くすることが出来、従って、コイルに流す
電流値が小さくてすむので電流による発熱によるトラブ
ルが解決し、高効率かつ高信頼性の薄膜磁気ヘッドが製
造出来る特長を有する。
(Effect) According to the manufacturing method of the present invention, since the magnetic circuit has no irregularities and a highly accurate coil pattern can be obtained, the number of turns of the coil can be increased, and accordingly, the value of the current flowing through the coil can be increased. Since the size of the thin film magnetic head is small, problems due to heat generation due to electric current can be solved, and a highly efficient and highly reliable thin film magnetic head can be manufactured.

【図面の簡単な説明】[Brief description of drawings]

第1図〜第8図は本発明の薄膜磁気ヘッドの製造方法に
よる第1の実施例の工程図、第9図,第10図は本発明の
薄膜磁気ヘッドの製造方法による第2の実施例の工程略
図、第11図、第12図は第1及び第2の実施例とは異なる
製造方法による基板の斜視図、第13図および第14図は従
来の製造方法による薄膜磁気ヘッドの要部構成を示す断
面図をそれぞれ示す。 1,8,17……基板(磁性材)、2,4,9,11a,11b,15……溝、
3,10……絶縁体、5……コイル下半部、6,13……コア、
7……コイル上半部、12……コイル、14……セラミック
板、16,18……磁性層。
1 to 8 are process drawings of the first embodiment of the method for manufacturing a thin film magnetic head of the present invention, and FIGS. 9 and 10 are the second embodiment of the method of manufacturing a thin film magnetic head of the present invention. 11 and 12 are perspective views of a substrate manufactured by a manufacturing method different from those of the first and second embodiments, and FIGS. 13 and 14 are main parts of a thin film magnetic head manufactured by a conventional manufacturing method. Sectional drawing which shows a structure is shown, respectively. 1,8,17 …… Substrate (magnetic material), 2,4,9,11a, 11b, 15 …… Groove,
3,10 ... Insulator, 5 ... Lower half of coil, 6,13 ... Core,
7 ... coil upper half, 12 ... coil, 14 ... ceramic plate, 16, 18 ... magnetic layer.

フロントページの続き (56)参考文献 特開 昭54−40619(JP,A) 特開 昭57−113411(JP,A) 特開 昭57−179927(JP,A) 実開 昭55−128227(JP,U)Continuation of the front page (56) Reference JP 54-40619 (JP, A) JP 57-113411 (JP, A) JP 57-179927 (JP, A) Actual development 55-128227 (JP , U)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】溝が形成された強磁性材の基板上の前記溝
に非磁性無機質の絶縁材を充填し、しかる後、前記基板
上および前記絶縁材上を研磨して同一平面状にし、一本
の前記溝に対応する前記絶縁材上に複数のコイル部用溝
を形成し、この複数のコイル部用溝に導電材を充填して
コイル部を形成した基板上を研磨して同一平面にし、こ
の基板のコイル部上に少なくとも強磁性材よりなるコア
を配設したことを特徴とする薄膜磁気ヘッドの製造方
法。
1. A non-magnetic inorganic insulating material is filled in the groove on a ferromagnetic material substrate in which grooves are formed, and then the substrate and the insulating material are polished to be flush with each other. A plurality of coil part grooves are formed on the insulating material corresponding to one of the grooves, and the plurality of coil part grooves are filled with a conductive material to polish the substrate on which the coil parts are formed to be flush with the same surface. And a core made of at least a ferromagnetic material is disposed on the coil portion of the substrate.
JP60018092A 1985-02-01 1985-02-01 Method of manufacturing thin film magnetic head Expired - Lifetime JPH0731778B2 (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP60018092A JPH0731778B2 (en) 1985-02-01 1985-02-01 Method of manufacturing thin film magnetic head
US06/823,252 US4743988A (en) 1985-02-01 1986-01-28 Thin-film magnetic head
DE3644921A DE3644921C2 (en) 1985-02-01 1986-01-31
DE19863603039 DE3603039A1 (en) 1985-02-01 1986-01-31 THIN FILM MAGNETIC HEAD AND METHOD FOR THE PRODUCTION THEREOF

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60018092A JPH0731778B2 (en) 1985-02-01 1985-02-01 Method of manufacturing thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS61178709A JPS61178709A (en) 1986-08-11
JPH0731778B2 true JPH0731778B2 (en) 1995-04-10

Family

ID=11961989

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60018092A Expired - Lifetime JPH0731778B2 (en) 1985-02-01 1985-02-01 Method of manufacturing thin film magnetic head

Country Status (1)

Country Link
JP (1) JPH0731778B2 (en)

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5440619A (en) * 1977-09-05 1979-03-30 Matsushita Electric Ind Co Ltd Magnetic head of thin film
JPS55128227U (en) * 1979-03-05 1980-09-10

Also Published As

Publication number Publication date
JPS61178709A (en) 1986-08-11

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