JPH07316793A - Ion plating method and device therefor - Google Patents

Abstract

PURPOSE:To freely control the radiation direction of particles for vapor deposition and to form uniform vapor deposited films in the prescribed position on a substrate to be treated in an ion plating device by mounting an annular magnetism generator at a hearth incorporating a material to be deposited by evaporation and rotating and oscillating this generator. CONSTITUTION:The hearth 21 in which the substrate 31 to be treated and metals, etc., 23 as materials for vapor deposition are housed is arranged in a vacuum chamber 11. The materials 23 for vapor deposition in the hearth 21 are irradiated with a plasma beam from a plasma generator 13 by a converging coil 15 and a steering coil 14 and are thereby evaporated and ionized; thereafter, the ions thereof are adsorbed on the surface of the substrate 31 on which negative potential is impressed. The vapor deposited films are thus formed. In such a case, the radiation direction of the ionized metallic evaporated particles are fluctuated by the change in the current of the cathode 17 of the plasma generator 13, etc., and, therefore, the magnetism generator, such as annular permanent magnet 25, etc., disposed in the hearth 21 is rotated and tilted to control the incident angle of the plasma beam, by which the radiation direction of the ionized metallic evaporated particles is adjusted and the uniform vapor deposited films are formed in the prescribed positions on the substrate 31.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an ion plating method and apparatus for forming a metal film by depositing metal particles produced by evaporation and ionization of a metal material in a vacuum container on the surface of an object to be treated. .

[0002]

2. Description of the Related Art As a conventional ion plating apparatus of this type, an apparatus using a hollow cathode (HCD) gun or a pressure gradient type plasma gun as a plasma source has been used industrially. That is, such an ion plating apparatus includes a vacuum container whose inside is kept airtight, the plasma source is mounted on the side surface of the vacuum container, and the plasma beam generated by the plasma source is generated by the steering coil. Is introduced into the vacuum container.

A hearth containing a vapor deposition material is also disposed on the bottom surface of the vacuum container. A potential is applied to the hearth so that the hearth operates as an anode on which the plasma beam emitted from the plasma source is incident. The hearth as the anode has a permanent magnet embedded in its body for attracting a plasma beam. A substrate, which is an object to be processed, is supported on the upper part of the vacuum container facing the hearth by a transfer device.

[0004]

In the above-described ion plating apparatus, since the plasma beam from the plasma source is incident at an angle with respect to the incident surface of the hearth containing the vapor deposition material, the vapor deposition material is also contained. Is emitted at an angle with respect to the incident surface of. Moreover, since the emission direction changes depending on the magnitude of the current supplied to the cathode portion of the plasma source, the emission angle of the vapor deposition material is not constant, and as a result, a uniform film is formed on the surface of the object to be processed or a predetermined film is formed. It was difficult to form a film on the part.

Therefore, conventionally, the object to be processed is rotated or revolved, the inclination angle of the object to be processed is changed with respect to the hearth entrance plane, or the object to be processed is moved in parallel in the front, rear, left and right directions in the vacuum container. The above problems have been solved by using a driving means such as. However, such a driving means for the object to be processed generally has a complicated structure, and there is a drawback that the entire apparatus becomes large.

Therefore, an object of the present invention is to provide an ion plating method capable of forming a uniform film on the surface of an object to be processed by a small and compact drive system.

Another object of the present invention is to provide an ion plating method capable of forming a film on a desired portion of the surface of an object to be treated.

Still another object of the present invention is to provide an ion plating apparatus suitable for the above method.

[0009]

According to the present invention, a plasma beam is generated from a beam generator, the plasma beam is guided to the entrance surface of the hearth, and the vapor deposition material contained in the hearth is vaporized and ionized. In an ion plating method in which an evaporated / ionized vapor deposition material is radiated toward a substrate disposed opposite to the hearth and adhered to the surface thereof, an annular permanent magnet or a doubly flat surface is provided around the hearth. The vaporized / ionized vapor deposition material is arranged by arranging an annular magnetic force generating means composed of an annular magnetic coil arranged and rotating the annular magnetic force generating means about its central axis while changing its inclination. An ion plating method is obtained which is characterized by controlling the radiation direction of.

According to the present invention, further, around the hearth, an annular magnetic force generating means composed of an annular permanent magnet or an annular electromagnetic coil which is doubly arranged in the same plane is arranged, and the substrate is rotated. Alternatively, an ion plating method is characterized in that the radial direction of the vaporized / ionized vapor deposition material is controlled by changing the inclination of the annular magnetic force generating means while sliding in a plane parallel to the substrate surface. Is obtained.

Further, the ion plating apparatus according to the present invention generates a plasma beam from a beam generator,
The plasma beam is guided to the entrance surface of the hearth, the vapor deposition material contained in the hearth is vaporized and ionized, and the vaporized and ionized vapor deposition material is radiated toward the substrate arranged opposite to the hearth, and the surface thereof is emitted. In the ion plating device to be attached to the magnetic field, an annular magnetic force generating means composed of an annular permanent magnet or an annular electromagnetic coil that is doubly arranged on the same plane is arranged around the hearth, and the annular magnetic force generating means is disposed. By providing the first drive means for changing the inclination while rotating about the central axis,
The emission direction of the vaporized / ionized vapor deposition material is controlled.

According to the present invention, an annular magnetic force generating means composed of an annular electromagnetic coil or an annular permanent magnet that is doubly arranged on the same plane is arranged around the hearth to rotate the substrate. Alternatively, by providing a driving means for sliding in a plane parallel to the substrate surface and a driving means for changing the inclination of the annular magnetic force generating means, the emission direction of the vaporized / ionized vapor deposition substance is controlled. An ion plating device characterized by the above is obtained.

[0013]

Embodiments of the present invention will be described in detail below with reference to the drawings. FIG. 1 is a sectional view showing the structure of an ion plating apparatus used in the ion plating method of the present invention. This ion plating apparatus includes a vacuum container 11 whose inside is kept airtight. A plasma generation source 13 such as a pressure gradient type plasma gun is provided at a mounting port 12 formed on the first side surface of the vacuum container 11. A steering coil 14 for a plasma beam guide is fixed around the outside of the mounting opening 12 of the vacuum container 11. A coil 15 for focusing a plasma beam and an intermediate electrode 16 are concentrically arranged in the plasma generation source 13. The plasma generation source 13 is also provided with a cathode 17. An exciting current is supplied to the steering coil 14 and the plasma beam focusing coil 15 from a DC power supply (not shown).

A hearth 21 which constitutes an anode is installed on the bottom surface of the vacuum container 11. The hearth 21 is a rod-shaped magnet 2 for attracting a plasma beam into its body.
2 is buried. A concave portion 24 for accommodating a vapor deposition substance 23 such as a metal material is formed at the tip of the hearth 21. An annular magnetic force generating means 25 for correcting the incident direction of the plasma beam is installed around the tip of the hearth 21.

The magnetic force generating means 25 described here is not a single winding of an electromagnetic coil but a magnetic force generating means having a strong magnetic field gradient. This is because it is possible to change the incident direction of the beam in a short distance by changing the magnetic field gradient abruptly, which makes it possible to downsize and simplify the device. It has the feature of being small.

As the above-mentioned annular magnetic force generating means, an annular permanent magnet or an annular electromagnetic coil which is doubly arranged on the same plane is used. The current flowing through the annular electromagnetic coil is such that the electromagnetic coil disposed inside is opposite to the electromagnetic coil disposed outside. Hereinafter, the annular magnetic force generating means 25 will be described as an annular permanent magnet 25, since an annular permanent magnet is shown in the drawings.

The magnetic pole surface of the annular permanent magnet 25 can be adjusted so as to make an arbitrary angle with respect to the incident surface of the hearth 21, as described later. The hearth 21 includes a DC power source (not shown) and a cathode 1 of the plasma generation source 13.
A positive potential is applied to 7.

Vacuum container 1 facing the tip of the hearth 21
In the upper part of the inside of the apparatus 1, a substrate 31 which is an object to be processed is provided with a transfer device 3
Supported by 2. The transfer device 32 is a vacuum container 1.
The substrate 31 is rotated within its plane by a motor 33 provided outside the unit 1.

The hearth 21 in the vacuum container 11 and
Alternatively, film thickness meters 36 and 37 are installed near the substrate 31, respectively.

Next, the operation of the thus configured ion plating apparatus will be described with reference to FIG. Figure 2
FIG. 4 is a schematic view of a main part for explaining the operation of the ion plating apparatus used in the present invention. In the vacuum container 11, a discharge is generated between the cathode 17 in the plasma generation source 13 and the hearth 21 that constitutes the anode, whereby a plasma beam 38 is generated. The plasma beam 38 reaches the hearth 21 while being guided by magnetic lines of force determined by the steering coil 14, the rod-shaped magnet 22 of the hearth 21 and the annular permanent magnet 25. As a result, the vapor deposition material 23 stored in the recess 24 at the tip of the hearth 21 is heated and evaporated. The evaporated metal particles are ionized by collision and heating inside the plasma beam 38 and adhere to the surface of the substrate 31 to which a negative voltage is applied to form a film.

The annular permanent magnet 25 arranged around the tip portion of the hearth 21 corrects the incident direction of the plasma beam by the lines of magnetic force as described above. That is, a cusp-shaped magnetic field Ha is formed above the incident surface of the hearth 21 by the magnetic force lines of the annular permanent magnet 25, and the trajectory of the plasma beam is corrected by this cusp-shaped magnetic field Ha. As a result, Haas 2
The radiation direction of the evaporated metal particles evaporated from the recess 24 at the tip of the first end is the direction along the center line of the annular permanent magnet 25 (3 in FIG. 2).
9). Therefore, the annular permanent magnet 25
The radial direction of the evaporated metal particles can be controlled by changing the direction of the central axis of, that is, the angle between the magnetic pole surface of the annular permanent magnet 25 and the plasma beam incident surface of the hearth 21.

FIG. 3 is a conceptual diagram showing a state in which the angle formed by the magnetic pole surface of the annular permanent magnet 25 and the incident surface of the hearth 21 is changed by rotating the annular permanent magnet 25 around a predetermined rotation axis. . In FIG. 3A, the ring-shaped permanent magnet 25 is rotated about a rotation axis 41 perpendicular to the paper surface to change the emission direction 39 of the evaporated metal particles in a plane parallel to the paper surface, and on the surface of the substrate 31. The case where the light is deflected in the left-right direction 42 is shown.

In FIG. 3 (b), the radial permanent magnet 25 is rotated about a rotation axis 43 parallel to the plane of the drawing to change the emission direction 39 of the evaporated metal particles, and the vertical direction 44 on the surface of the substrate 31. The case of deflecting is shown. Furthermore,
In FIG. 3C, the radial permanent magnet 25 is rotated about a rotation axis 45 that makes an angle of 45 ° with respect to the paper surface, so that the radial direction 39 of the evaporated metal particles forms an angle of 45 ° with respect to the paper surface. It shows a case of changing in a plane and deflecting in an oblique direction 46 on the surface of the substrate 31.

4A and 4B are views showing the structure of the rotary drive mechanism for the annular permanent magnet 25. FIG. 4A is a top view and FIG. 4B is a side sectional view thereof. The annular permanent magnet 25 is provided with a rotating shaft 51 protruding from both sides of the outer peripheral surface thereof in the diameter direction of the annular body, and the rotating shaft 51 is fixed to an annular turning table 52 provided at the bottom of the vacuum container 11. It is supported by the bracket 53 that is formed. The first end is attached to one end of the rotary shaft 51.
Gear 54 is fixed, and this gear 54 meshes with an annular gear 55 slidably mounted on the upper surface of the turning table 52. The annular gear 55 has a first tooth 56 (only a part of which is shown) meshing with the gear 54 on the upper surface thereof, and a second tooth 57 on the side surface thereof.
The numeral 7 meshes with the second gear 58. The second gear 58 is fixed to one end of a rotary shaft that is coupled via a clutch 60 to a motor 59 installed outside the bottom of the vacuum container 11.

The turning table 52 is rotatably supported by a bearing mount 62 fixed to the bottom of the vacuum container 11 via a bearing 61. Swivel table 52
A third tooth 63 is formed on the outer periphery of the third tooth 63, and the third tooth 63 meshes with the third gear 64. Third gear 6
The reference numeral 4 is fixed to one end of a rotary shaft that is connected to a motor 65 installed outside the bottom of the vacuum container 11 via a connecting member 66.

As described above, the annular gear 55 is slidably mounted on the upper surface of the revolving table 52, but the friction coefficient between the two is such that the annular permanent magnet 25 is normally fixed to the revolving table 52. However, the motor 59 rotates,
When the clutch 60 is in the engaged state, the second gear 5
It is selected to be rotatable by 8. In addition,
The clutch 60 is normally placed in a disengaged state, and is kept in the second state while the turning table 52 is being turned by the motor 65.
The gear 58 of the wheel is idling.

In the structure of the rotating mechanism of the annular permanent magnet 25 having such a structure, the motor 65 is rotated to rotate the turntable 52 to a predetermined position and then fix the turntable 52. Then, the clutch 60 is engaged and the motor 59 is rotated. By such an operation, the rotation axis of the annular permanent magnet 25 is changed to the axis 4 of FIGS. 3 (a), (b) and (c).
The direction can be set to any one of 1, 43, 45, or any direction.

FIG. 5 is a diagram showing another structure of the rotary drive mechanism for the annular permanent magnet 25. FIG. 5A is a top view and FIG.
Is a side sectional view thereof. 5, the same components as those in FIG. 4 are designated by the same reference numerals, and detailed description thereof will be omitted. The rotating shaft 51 of the annular permanent magnet 25 is supported by a cylindrical rotating body 71 provided at the bottom of the vacuum container 11 so as to surround the hearth 21 and the annular permanent magnet 25. A first bevel gear 72 is fixed to one end of the rotary shaft 51. The cylindrical rotating body 71 is rotatably installed at the bottom of the vacuum container 11 via a bearing 73. Inside the cylindrical rotary body 71, a hearth mounting frame 26 is fixedly provided on the same surface as the bottom of the vacuum container 11.

Hearth mounting frame 2 for cylindrical rotating body 71
An annular gear 75 is formed on the outer peripheral surface below 6 and a gear 76 meshes with the annular gear 75. The gear 76 is rotationally driven by a motor 77 fixed to the lower side of the bottom of the vacuum container 11. In addition, the first bevel gear 7
A second bevel gear 78 meshes with the gear 2. The second bevel gear 78 is provided so as to pass through the hearth mounting frame 26, and is supported by a rotating shaft 80 supported by a bearing 79 projecting from the inner surface of the cylindrical rotating body 71.
It is rotationally driven by a motor 81 and a connecting member 82 which are fixed to the inner wall of the lower cylindrical rotating body 71. The motor 8
Power is supplied to 1 via a slip ring 83 provided inside the bottom surface of the cylindrical rotating body 71.

In the structure of the rotating mechanism of the annular permanent magnet 25 thus constructed, the motor 77 is rotated to rotate the cylindrical rotating body 71 to a predetermined position, and thereafter,
The motor 77 is stopped and fixed. Then, the motor 81
To rotate. By this operation, the rotation axis of the annular permanent magnet 25 is changed to the axes 41, 43, 4 of FIGS. 3 (a), (b), and (c).
It can be set to any of the five directions or to any direction.

6A and 6B are views showing still another structure of the rotary drive mechanism of the annular permanent magnet 25. FIG. 6A is a top view and FIG. 6B is a sectional view thereof. 6, the same components as those in FIG. 4 are designated by the same reference numerals, and detailed description thereof will be omitted. The rotating shaft 51 of the annular permanent magnet 25 is supported by a bracket 53 fixed to an annular turning table 52. The turning table 52 is rotatably supported on the bottom of the vacuum container 11 via a bearing 61. An annular gear 63 is formed on the outer circumference of the turning table 52, and a gear 64 meshes with the annular gear 63. The gear 64 is a motor 6 installed below the bottom of the vacuum container 11.
It is fixed to one end of a rotary shaft that is coupled to 5 via a connecting member 66.

One end of a flexible rotation transmitting member 91 is coupled to one end of the rotary shaft 51 of the annular permanent magnet 25. The rotation transmitting member 91 may be a flexible hose or a coil spring inserted into the hose. Further, the length of the rotation transmitting member 91 is selected to have a margin such that the turning table 52 can be rotated within a limited angular range of about 90 °. The other end of the rotation transmitting member 91 is fixed to one end of a rotating shaft 92 that is connected to a motor 59 installed below the bottom of the vacuum container 11 via a connecting member 60.

In the structure of the rotary drive mechanism for the annular permanent magnet 25 thus constructed, the motor 65 is rotated to rotate the turntable 52 to a predetermined position and then fix the turntable 52. Then, the motor 59 is rotated. By this operation, the rotating shaft of the annular permanent magnet 25 is moved to the position shown in FIG.
It can be set to any of the directions 41, 43, and 45 of (b) and (c), or any direction within a limited angle range of about 90 °.

7A and 7B are views showing still another structure of the rotary drive mechanism of the annular permanent magnet 25. FIG. 7A is a top view, FIG. 7B is a side sectional view thereof, and FIG. It is the principal part enlarged view. 7, the same components as those in FIG. 4 are designated by the same reference numerals, and detailed description thereof will be omitted. Annular permanent magnet 2
The rotary shaft 51 of No. 5 is supported by a bracket 95 fixed to the bottom of the vacuum container 11. One end of a lever 96 is fixed to one end of the rotary shaft 51 of the annular permanent magnet 25. One end of a link 97 is rotatably connected to the other end of the lever 96, and the other end of the link 97 is connected to the vacuum container 1
Rod 99 of the cylinder 98 installed on the lower side of the bottom of 1.
Is rotatably connected to the tip of.

Vacuum container 1 facing the tip of the hearth 21
In the upper part of the inside of the apparatus 1, a substrate 31 which is an object to be processed is provided with a transfer device 3
Supported by 2. The transfer device 32 is the vacuum container 11
The substrate 31 is rotated in the plane by a motor 33 provided outside the substrate.

In the structure of the rotary drive mechanism for the annular permanent magnet 25 thus constructed, the rod 99 of the cylinder 98 is reciprocated to reciprocally move the link 97 and the link 97 rotatably connected to the tip of the rod 99. The rotary shaft 51 of the annular permanent magnet 25 can be rotated and set to a predetermined inclination angle via the lever 96. On the other hand, the substrate 31 arranged in the upper part of the vacuum container 11 is rotated by the motor 33. A uniform coating can be formed on the surface of the substrate 31 by combining the rotation driving mechanism of the annular permanent magnet 25 and the rotation of the substrate 31.

8A and 8B are views showing a mechanism for moving the substrate 31 arranged in the upper part of the vacuum container 11 in a horizontal plane. FIG. 8A is a side sectional view and FIG. 8B is a front sectional view. . In the upper part of the vacuum chamber 11, two roller rows each composed of a plurality of rollers 101 are arranged in parallel to each other over a length approximately twice the length of the substrate 31. The edges of parallel opposite sides of the substrate 31 are placed on these two rows of rollers, and the rotation of these rollers 101 moves the substrate 31 in the roller row direction. A rotary shaft 103 pivotally supported by a roller support 102 is fixed to each of the plurality of rollers 101, and a sprocket 104 is fixed to the rotary shaft 103.

A chain 105 is wound around a sprocket 104 provided on a plurality of rollers 101 arranged in each row, and each roller 101 rotates in synchronization. Of the plurality of rollers 101 arranged in each row, the first bevel gear 106 is fixed to the end of the rotating shaft of the roller 101 arranged at the right end of FIG. 8A. The first bevel gear 106 has a second bevel gear 10
The second bevel gear 107 is engaged with the rotary shaft 1 of the motor 108 provided on the outer side of the upper surface of the vacuum container 11.
It is fixed to the tip of 09.

In such a substrate moving mechanism, the rotation of the roller 101 arranged at the end of the roller arrangement is driven by driving the motor 108 via the second and first bevel gears 107 and 106. It is transmitted to the shaft 103.
This rotation also causes sprocket 104 and chain 10
5 is transmitted to the other roller 101 of the roller arrangement via 5,
This moves the substrate 31 within the horizontal plane. As a rotation mechanism of the annular permanent magnet 25 combined with such a substrate moving mechanism, it is preferable to rotate and tilt the annular permanent magnet 25 in a direction orthogonal to the substrate moving direction.

FIG. 9 illustrates an application example of the present invention.
It is a schematic diagram of an ion plating device. In this ion plating device, a vacuum container (not shown)
A plurality of hearths 211, 212, 21
3 is provided, and the plasma beam 381 from the cathode 171 of the plasma source is three hearths 211, 21.
It is incident on each of 2 and 213. These hearth 21
Different vapor deposition materials are housed in each of 1, 212, and 213.

Further, these hearths 211, 212, 2
Although not shown in the drawing, an annular permanent magnet is arranged at 13, and the rotation and the inclination angle are independently controlled by the rotary drive mechanism of the present invention described above. With this structure, an alloy film containing the vapor deposition material contained in each hearth 211, 212, 213 is formed on the surface of the substrate on a single substrate (not shown) provided in the vacuum container. be able to. 214 to 217 in FIG. 9 are each hearth 211,
The magnets 212 and 213 have a polarity opposite to that of the magnets embedded in the plasma gas 381 and are connected to the three hearths 21.
It has a function of a beam guide for appropriately guiding each of 1, 212, and 213.

Each of the motors shown in FIGS. 4 to 8 has a built-in brake device or a separate brake device provided on the motor shaft. Furthermore, as shown in FIG. 1, near the hearth 21 and / or the substrate 31,
Thickness gauges 36 and 37 are installed, and these thickness gauges 3
6, 37, the film thickness of the substrate 31 is detected, and based on the detection result, the rotation and inclination of the annular permanent magnet 25 and the substrate 31 are detected.
It controls the rotation and slide of the.

[0043]

According to the ion plating method and apparatus of the present invention described above, the ring-shaped permanent magnets are arranged around the tip of the hearth or the ring-shaped electromagnetic coils are doubly arranged on the same plane. By rotating the annular magnetic force generating means while tilting it, or by rotating the object to be processed while tilting the magnetic force generating means or sliding it in a plane parallel to the surface of the object to be processed, the structure of the small and compact drive mechanism allows the object to be processed. A uniform film can be formed on the surface of the object. Further, by the rotation driving mechanism of such an annular magnetic force generating means or by the combination thereof with the moving mechanism of the object to be treated, it becomes possible to form a film on an arbitrary portion of the surface of the object to be treated.

[Brief description of drawings]

FIG. 1 is a side sectional view showing a configuration of an ion plating apparatus used for implementing the present invention.

FIG. 2 is a schematic view of a main part for explaining the operation of the ion plating apparatus used in the present invention.

FIG. 3 shows an ion plating method of the present invention,
It is a conceptual diagram which shows the state which changes the angle which the magnetic pole surface of an annular permanent magnet and the incident surface of a hearth change.

4A and 4B are views showing a rotation driving mechanism of an annular permanent magnet in the ion plating apparatus of the present invention, FIG. 4A is a top view, and FIG. 4B is a side sectional view thereof.

FIG. 5 is a diagram showing another configuration of the rotation drive mechanism of the annular permanent magnet 25 in the ion plating apparatus of the present invention,
The figure (a) is a top view and the figure (b) is a sectional side view.

6A and 6B are views showing another configuration of the rotary drive mechanism of the annular permanent magnet in the ion plating apparatus of the present invention, FIG. 6A is a top view, and FIG. 6B is a side sectional view thereof.

7A and 7B are views showing another configuration of the rotary drive mechanism of the annular permanent magnet in the ion plating apparatus of the present invention, wherein FIG. 7A is a top view, FIG. 7B is a side sectional view thereof, and FIG. (C) is an enlarged view of the main part.

FIG. 8 is a view showing a mechanism for moving a substrate, which is an object to be processed, placed in the upper part of the vacuum container in the ion plating apparatus of the present invention in a horizontal plane, and FIG. 8 (a) is a side sectional view and FIG. (B) is a front sectional view.

FIG. 9 is a schematic view of an ion plating apparatus for explaining an application example of the present invention.

[Explanation of symbols]

 11 Vacuum Container 12 Mounting Port 13 Plasma Source 14 Steering Coil 15 Plasma Beam Focusing Coil 16 Intermediate Electrode 17 Cathode 21 Hearth 22 Rod Magnet 23 Vapor Deposition Material 25 Annular Permanent Magnet (Magnetic Force Generating Means) 31 Substrate 32 Transfer Device 33 Motor 36, 37 Thickness gauge 51 Rotation axis 52 Rotating table 53 Bracket

Claims (4)

[Claims] 1. A plasma beam is generated from a beam generator, the plasma beam is guided to an entrance surface of the hearth, the vapor deposition material contained in the hearth is vaporized and ionized, and the vaporized and ionized vapor deposition material is used as the hearth. In an ion plating method of radiating in the direction of a substrate arranged opposite to and adhering to the surface thereof, an annular permanent magnet or an annular electromagnetic coil arranged in the same plane doubly is provided around the hearth. An annular magnetic force generating means is disposed, and while rotating the annular magnetic force generating means with respect to its central axis, the inclination thereof is changed to control the radiation direction of the vaporized / ionized vapor deposition material. Ion plating method. 2. A plasma beam is generated from a beam generator, the plasma beam is guided to the entrance surface of the hearth, the vapor deposition material contained in the hearth is vaporized and ionized, and the vaporized and ionized vapor deposition material is used for the hearth. In an ion plating method of radiating in the direction of a substrate arranged opposite to and adhering to the surface thereof, an annular permanent magnet or an annular electromagnetic coil arranged in the same plane doubly is provided around the hearth. Radiation of the vaporized / ionized vapor deposition substance is provided by disposing an annular magnetic force generating means and rotating or sliding the substrate in a plane parallel to the substrate surface while changing the inclination of the annular magnetic force generating means. An ion plating method characterized by controlling the direction. 3. A plasma beam is generated from a beam generator, the plasma beam is guided to the incident surface of the hearth, the vapor deposition material contained in the hearth is vaporized and ionized, and the vaporized and ionized vapor deposition material is used as the hearth. In an ion plating device which radiates in the direction of a substrate and is attached to the surface of the hearth, a ring-shaped permanent magnet or a ring-shaped electromagnetic coil that is doubly arranged in the same plane is provided around the hearth. By arranging an annular magnetic force generating means and rotating the annular magnetic force generating means about its central axis and providing a driving means for changing the inclination thereof, the emission direction of the vaporized / ionized vapor deposition substance is controlled. An ion plating device characterized by the above. 4. A plasma beam is generated from a beam generator, the plasma beam is guided to the incident surface of the hearth, the vapor deposition material contained in the hearth is vaporized and ionized, and the vaporized and ionized vapor deposition material is used as the hearth. In an ion plating device which radiates in the direction of a substrate and is attached to the surface of the hearth, a ring-shaped permanent magnet or a ring-shaped electromagnetic coil that is doubly arranged in the same plane is provided around the hearth. The evaporation / ionization is performed by arranging an annular magnetic force generating means and providing driving means for rotating or sliding the substrate in a plane parallel to the substrate surface and driving means for changing the inclination of the annular magnetic force generating means. An ion plating device, characterized in that a radiation direction of the deposited material is controlled.