JPH07282476A - Developer applying method and device therefor - Google Patents

Abstract

PURPOSE:To obtain a developer applying method and device therefor capable of improving development accuracy and productivity and simplifying developing equipment. CONSTITUTION:The surface of a glass plate 5 rotating horizontally is spin coated with a developer by spraying this developer onto this glass plate by a first nozzle 11. The spin coated surface is washed by a washing liquid sprayed from a second nozzle 12. The developer applying device is provided with a nozzle section 4 which arranges the first nozzle 11 and the second nozzle 12 double on each other and integrating these nozzles to one so that the developer and the washing liquid are alternately sprayed without individually moving the respective nozzles 11, 12.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a developing solution coating apparatus and a coating method suitable for making a master of an optical disk, for example.

[0002]

2. Description of the Related Art In the process of making a master disc of a leather disc, a well-polished glass plate is rotated horizontally,
A developing solution, which is a substance (photoresist) sensitive to light, is sprayed on this glass plate from a nozzle to form a uniform film of about 0.1 μm, and then a cleaning liquid (pure water) is sprayed from the nozzle. Then, the method of washing is adopted. Also,
The nozzle for spraying the developing solution and the nozzle for spraying the cleaning solution are individually made. As shown in the operation flow in FIG. 6, when the spraying instruction of the developing solution is received, the nozzle for spraying the developing solution is placed on the glass plate (scattering position). ) To spray the developer, and then return to the standby position when spraying is completed.The cleaning solution spray nozzle then moves to the glass plate (spraying position) to spray the cleaning solution, and when spraying is complete, move to the standby position. The operation of returning and waiting for the next developer spraying command is repeated.

[0003]

However, in the above-mentioned conventional method, the movement of the developing solution spraying nozzle and the cleaning solution spraying nozzle between the completion of the spraying of the developing solution and the spraying of the cleaning solution are performed. The move is done. For this reason, there is a problem that a time lag occurs and development accuracy and productivity are poor. In addition, after spraying the developer, the developer may remain attached to the tip of the nozzle for spraying the developer, which may deteriorate, and may adhere to the work side during the next spraying to cause defective products. Furthermore, in order to prevent the occurrence of this defective product, a means for cleaning the tip of the developer spraying nozzle each time is required, which complicates the structure and makes the equipment expensive, which rebounds to the cost and raises the product price. There was a problem.

The present invention has been made in view of the above problems, and an object thereof is to improve the developing accuracy and productivity and to simplify the developing equipment, and a developing solution coating method. To provide a device. Furthermore, other purposes will be clarified one after another in the content described below.

[0005]

The object of the present invention is to provide a developing solution on a rotating body that is horizontally rotating, which is a main part of the present invention.
In the developing solution applying apparatus, the first nozzle and the second nozzle are duplicated with each other in a developing solution application apparatus in which the first nozzle and the second nozzle are sprayed and spin-coated, and the spin-coated surface is washed with the cleaning solution sprayed from the second nozzle. This is achieved by providing nozzles that are arranged and integrated into one, and the developer and the cleaning liquid can be sprayed alternately without moving the nozzle. Further, in practice, it is preferable that the developing solution is sprayed from the inner nozzle and the cleaning solution is sprayed from the outer nozzle.

[0006]

According to this, since the first nozzle and the second nozzle are doubly arranged and integrated into one to have a double structure, the developing solution is not moved individually. The cleaning liquid and the cleaning liquid can be sprayed alternately, and the time lag between the spraying of the developing liquid and the spraying of the cleaning liquid can be eliminated. Also, spray the developer from the inner nozzle,
When the cleaning liquid is sprayed from the outer nozzle, the developer nozzle can be cleaned at the same time as the cleaning liquid is sprayed, so that the deteriorated developer is sprayed without separately providing a mechanism for cleaning the developer nozzle. Will disappear.

[0007]

Embodiments of the present invention will be described in detail below with reference to the drawings. 1 to 4 show an embodiment of the present invention. FIG. 1 is a schematic overall structural layout view of a developing device, and FIG.
FIG. 3 is an enlarged side view of the nozzle portion with a part broken away, FIG. 3 is a plan view of the nozzle tip, and FIG. 4 is a bottom view of the cheese portion.

1 to 4, the developing device is
A process chamber 1, a turntable 2 provided in the process chamber 1, a nozzle arm unit 3 provided outside the process chamber 1, and a nozzle portion 4 piped from the nozzle arm unit 3.
Etc.

More specifically, the process chamber 1
An opening 1 having a size that allows a glass plate 5 formed as a master of an optical disc to be taken in and out is formed on the top surface of
a is provided.

The turntable 2 is rotated by a motor (not shown), and a chuck mechanism 6 for vacuum chucking the glass plate 5 is formed on the upper surface thereof. Then, the glass plate 5 is chucked by the chuck mechanism 6, and the glass plate 5 is horizontally rotated together with the chuck mechanism 6.

The nozzle portion 4 includes a pipe-shaped first nozzle 11 and a pipe-shaped second nozzle 12 which is arranged so as to cover the outside of the first nozzle 11.
It is formed as a double tube structure. Also, the second
Nozzle 12 is made of stainless steel, and a bracket 13 is attached to the tip of the nozzle 12 in a screwed manner. With this bracket 13, the first nozzle portion of the second nozzle 12 does not have a perfect circular opening. The three openings 13a, 13b, 13c (see FIG. 3) are formed on the outer periphery of the nozzle 11 of the first nozzle 11 through the openings 13a to 13c.
A large amount of water is sprinkled between the second nozzle 12 and the second nozzle 12. Then, the first nozzle 11 is the cheese portion 1
4 is formed integrally with a developer supply tube 7 communicating with a developer supply device (not shown) through 4, that is, a single Teflon tube, and each base end of the second nozzle 12 is not shown. The cheese portion 14 is connected to a pure water supply tube (Teflon tube) 8 leading to the pure water supply device.

The nozzle arm unit 3 holds the nozzle portion 4 and moves the nozzle portion 4 to a standby position where it does not interfere when setting and replacing the glass plate 5 on the chuck mechanism 6 of the turntable 2. After the setting, the structure is such that it can be moved again onto the glass plate 5 (dispersion position).

FIG. 5 is a flow chart showing the operation flow in the developing solution coating apparatus. Therefore, the operation of the developing solution applying apparatus shown in FIGS. 1 to 4 will be described next with reference to FIG. When further received (step S1), the nozzle arm unit 3 moves the nozzle portion 4 to the spraying position, and when the movement is completed, the nozzle arm unit 3 stops at that position (steps S2 and S3).

Next, the turntable 2 is rotated together with the glass plate 5, and a developing solution supply device (not shown) is driven so that the developing solution is sent through the developing solution supply tube 7 and rotated horizontally. The developing solution is sprayed from the first nozzle 11 onto the glass plate 5 (step S4). Then, this developing solution is spin-coated and a photoresist film is uniformly formed on the glass plate 5.

After spraying the developing solution for a predetermined time, the spraying of the developing solution is stopped (step S5), and then a deionized water supply device (not shown) is driven to supply deionized water (cleaning liquid) with deionized water. The cleaning liquid is sent through the tube 8 and is discharged from the second nozzle 12 onto the horizontally rotating glass plate 5 (step S6). Then, the glass plate 5 that has been spin-coated with this cleaning solution is cleaned. At this time, at the same time, the cleaning liquid flows on the outer circumference of the first nozzle 11, and the developer adhering to the outer circumference of the first nozzle 11 is also cleaned.

When the cleaning liquid is sprayed for a certain period of time, the spraying is stopped (step S7), the nozzle arm unit 3 moves the nozzle portion 4 to the standby position, and when the movement is completed, the next developing liquid spraying command is issued at that position. It waits until it comes out (steps S8, S9, S10). At the same time, the turntable 2 is stopped and the glass plate 5 is replaced.

Therefore, according to the apparatus of this embodiment, the first
The nozzle 11 and the second nozzle 12 of No. 1 are doubled and integrated into one to form a double pipe structure.
Developer and cleaning solution (pure water) without moving 1 and 12 individually
Can be sprayed alternately, and a time lag between spraying the developing solution and spraying the cleaning solution can be eliminated. Further, since the developing solution is sprayed from the inner first nozzle 11 and the cleaning solution is sprayed from the outer second nozzle 12, the first nozzle 11 for the developing solution is cleaned when the cleaning solution is sprayed. It is also possible to prevent the developing solution from remaining in the first nozzle 11 and to prevent the degenerated developing solution from being sprayed during the next spraying.

In the above embodiment, the case where the invention is applied to the manufacture of the master of the optical disk has been described. However, in addition to this, in the case of forming the photoresist film by spraying the developing solution on the wafer in the semiconductor device. Is also applicable.

[0019]

As described above, according to the present invention,
Since the first nozzle and the second nozzle are doubled and integrated into one, the developer and the cleaning liquid can be sprayed alternately without moving the nozzle, and the cleaning liquid can be sprayed from the spraying liquid. It is possible to eliminate the time lag between spraying, and improve the development accuracy and productivity.
The development equipment can be simplified. Further, when the developing solution is sprayed from the inner nozzle and the cleaning solution is sprayed from the outer nozzle, the developing solution nozzle can be cleaned by spraying the cleaning solution, and thus the deteriorated developing solution may be sprayed. Therefore, the development accuracy can be improved. Further, since it is not necessary to separately provide a mechanism for cleaning the nozzle of the developing solution, the structure can be simplified.

[Brief description of drawings]

FIG. 1 is a schematic overall configuration layout diagram of a developing device shown as an embodiment of the present invention.

FIG. 2 is an enlarged side view of a nozzle portion in the apparatus of this embodiment.

FIG. 3 is a plan view of a tip of a nozzle in the apparatus of this embodiment.

FIG. 4 is a bottom view of the cheese portion in the device of this embodiment.

FIG. 5 is an operation flowchart in the apparatus of this embodiment.

FIG. 6 is an operation flowchart in a conventional device.

[Explanation of symbols]

 1 Process Chamber 2 Turntable 3 Nozzle Arm Unit 4 Nozzle Part 5 Glass Plate 6 Chuck Mechanism 11 First Nozzle 12 Second Nozzle 14 Cheese Part

Claims (5)

[Claims] 1. A developing solution in which a developing solution is sprinkled from a first nozzle onto a horizontally rotating rotating body for spin coating, and the spin coated surface is washed with a washing solution sprinkled from a second nozzle. A developing solution coating apparatus comprising: a coating apparatus, wherein the first nozzle and the second nozzle are doubly arranged and combined into one nozzle. 2. The developing solution coating apparatus according to claim 1, wherein the first nozzle is arranged inside and the second nozzle is arranged outside. 3. An optical disc master in which a developing solution is sprayed from a first nozzle onto a horizontally rotating glass plate to spin-coat the surface, and the spin-coated surface is washed with a cleaning solution sprayed from a second nozzle. A developing solution coating apparatus for manufacturing, wherein the first nozzle and the second nozzle are provided in a doubled manner and combined into one nozzle to coat the developing solution. apparatus. 4. A developing solution in which a developing solution is sprinkled from a first nozzle and spin-coated on a horizontally rotating rotating body, and the spin-coated surface is washed with a cleaning solution sprinkled from a second nozzle. In the coating method, the first nozzle and the second nozzle are doubly arranged so as to be combined into one nozzle so that the developing solution and the cleaning solution can be sprayed alternately without moving the nozzle. A method for applying a developing solution, characterized in that 5. The developing solution coating method according to claim 4, wherein the developing solution is sprayed from an inner nozzle and the cleaning solution is sprayed from an outer nozzle.