JPH0727754U - Equipment for polishing - Google Patents

Abstract

(57) [Summary] [Structure] A plurality of segments 1 made of a solid grindstone or an abrasive material holder are attached to a lapping platen 3 via a cushioning material 2 so that their working surfaces form the same surface. [Effect] The surface of a work having a gentle curved surface or undulation can be efficiently and uniformly polished. The time required for processing is significantly shorter than in the past, and stable processing quality can be obtained.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to a polishing apparatus, and more particularly to a polishing apparatus for uniformly and efficiently polishing an object to be polished having a flat plate-like surface with relatively undulating surfaces and a gently curved surface. It is a thing.

[0002]

[Prior art]

 When the surface of the object to be polished (hereinafter referred to as "work") is not a uniform flat surface but a gently curved surface, it is a flat plate, but the surface has relief patterns, letters, patterns, etc. Or, in the case where the surface has a gentle undulation, when polishing such a surface, it is necessary to use a processing means capable of following an uneven surface shape.

Conventionally, the surface polishing of a work is a so-called buffing process in which an abrasive material holding body that supports or holds abrasive grains is pressed against the surface of the work, and a loose abrasive is supplied while sliding on the surface of the work. It is done by processing. As the abrasive carrier used here, a non-woven fabric such as leather or felt, a laminate of fabrics, or a relatively hard sponge is usually used.

By the way, when polishing an uneven surface as described above, the abrasive material holder must be made to sufficiently follow the surface shape of the work, and therefore the abrasive material holder used is extremely flexible and soft. Or else it will be done manually. However, when the abrasive material holder is extremely soft and soft, there are problems that sufficient shape accuracy cannot be obtained in the polishing process, and sagging or the like easily occurs at the end of the work. Further, since the processing amount is generally small, if the processing pressure is increased to increase the processing amount, the abrasive material holder is likely to be clogged or deformed. Further, the polishing process using a solid whetstone cannot be applied to the surface shape of the work and is practically impossible.

[0005]

[Problems to be solved by the device]

 The inventors of the present invention have completed the present invention as a result of intensive studies in view of the above-mentioned problems, and the purpose of the present invention is to form a gently curved surface or a flat plate-like surface having a relatively rough surface. A polishing apparatus for uniformly and efficiently processing a workpiece having the above.

[0006]

[Means for Solving the Problems]

 The polishing apparatus of the present invention is a polishing apparatus in which a plurality of segments made of a solid grindstone or a polishing material holder are attached to a lapping platen such that the working surfaces thereof are the same. It is characterized in that the solid grindstone or the abrasive holder is attached via a buffer material having elasticity.

The solid grindstone used in the present invention is not particularly limited as long as it is a grindstone for polishing, and may be appropriately selected from conventionally known solid grindstones. As a solid grindstone suitable for the purpose of the present invention, for example, a synthetic grindstone in which at least one of abrasive grains composed of silicon carbide, aluminum oxide, chromium oxide, cerium oxide, garnet, silicon oxide, etc. is bonded with a synthetic resin. Can be mentioned.

The abrasive material holder used in the present invention temporarily supports or holds an abrasive material (abrasive grains) in a free state. For example, synthetic leather, non-woven fabric such as felt, and laminated body of cloth, A fiber bundle such as a laminated body of yarns may be mentioned, but for the purpose of the present invention, a porous body of synthetic resin and a porous body of composite of synthetic resin and fiber are preferable. .

The lapping plate used in the present invention may be a hard metal plate that is generally used, but may be made of a material having appropriate flexibility. As such a material, for example, a material obtained by hardening a non-woven fabric with a synthetic resin can be mentioned.

The cushioning material used in the present invention quickly absorbs non-uniform stress applied to the working surface of the solid grindstone or the abrasive material holder, and has appropriate hardness and impact resilience (rubber elasticity). I have. In the present invention, those having a rubber hardness C scale value of 30 to 80 specified in Japanese Rubber Association Standard SRIS-0101 are preferable. The thickness of the cushioning material is not particularly limited, and may be appropriately set in consideration of the shape and thickness of the solid grindstone or the abrasive material holder, the surface shape of the work, and the like. The planar shape of the shock-absorbing material is usually the same as that of the solid whetstone or abrasive carrier to be bonded, but is not particularly limited to this, and it can be larger or smaller than the solid whetstone or abrasive carrier to be bonded. May be. Examples of the cushioning material used in the present invention include rubber, synthetic resin elastic body, and the like, and synthetic resin elastic body is particularly preferable in terms of physical properties and durability.

FIG. 1 is a perspective view for explaining the configuration of the main part of the polishing apparatus of the present invention. In the device of the present invention, a solid grindstone or an abrasive holder is attached to a lapping platen via the cushioning material. A segment 1 made of a solid grindstone or a polishing material holder is fixed to a shock absorbing material 2, and is arranged and fixed on a lapping platen 3. The method of adhesively fixing the solid whetstone or polishing material holder to the cushioning material is, for example, a method of using an adhesive, a method of using a double-sided adhesive tape, a method of mechanically fixing with some kind of receiver, a method of using a fastener, etc. However, the present invention is not limited to these.

In the present invention, the method of arranging the segments fixed to the lapping platen may be such that the working surfaces of the segments fixed to the lapping platen form the same plane as a whole. The working surface to be formed is usually a flat surface, but may be a curved surface according to the shape of the work.

The size, shape and arrangement method of the segments in the present invention may be appropriately set according to the size of the work or the undulation state of the work surface. As a specific method of arranging the segments in the present invention, for example, the methods shown in FIGS. 4 to 9 can be mentioned. Among them, the arrangement method as shown in FIG. 6 can deal with fine surface undulations. The arrangement method shown in the other figures is suitable for polishing the surface of a work having a gently curved surface.

In order to polish the work surface with the polishing apparatus of the present invention, for example, the working surface is pressed against the work surface and the lapping platen is rotated to slide the working surface onto the work surface. Good. In the case of the polishing process, in the case of the solid whetstone segment, the polishing liquid is appropriately supplied, and in the case of the abrasive carrier segment, the free abrasive grains are supplied as in the conventional case. Further, it is preferable to perform the polishing process while moving the work, for example, reciprocating motion or rotating motion, instead of fixing the work, because a more uniform processed surface can be obtained.

[0015]

[Action]

 2 and 3 are conceptual cross-sectional views for explaining the action of the cushioning material during the polishing operation of the polishing apparatus of the present invention. The lapping platen 3 is rotated by rotating the rotary shaft 5 with a drive motor (not shown). In the apparatus shown in FIG. 2, the rotary shaft 5 is urged downward to press the segment 1 made of a solid grindstone or an abrasive carrier against the surface of the work 4 with a predetermined pressure. Further, in the apparatus shown in FIG. 3, the work holding member 7 connected to the support shaft 6 is configured to be rotatable, firmly holds the work 4, and the support shaft 6 is urged downward to move the work. The surface is pressed against the segment 1. On the working surface of each segment, a stress that moves to correspond to the surface shape of the work that changes with the rotation of the lapping plate is generated, but the cushioning material quickly absorbs the stress and Since the working surface quickly follows the surface shape of the work, the protruding part of the work surface is not polished or the recessed part is not polished, and the work surface is uniformly processed.

[0016]

【Example】

 Hereinafter, the polishing apparatus of the present invention will be described in detail with reference to Examples. Example 1 As a solid whetstone, cerium oxide particles (abrasive grains) having an average particle size of about 2μ were combined with a mixture of a melamine resin and a phenol resin, and the abrasive grain ratio was 77% by weight, the porosity was 40%, and the hardness was Rockwell. 60 synthetic whetstones were prepared with a hardness scale of 15Y scale. The above-mentioned synthetic whetstone was arranged and fixed through a cushioning material in the arrangement as shown in Fig. 4 on a metal hard surface plate of a polishing apparatus (trade name: HYPREX EJ-380 type, manufactured by Nippon Engis). The cushioning material used here is a polyurethane resin foam with a rubber hardness C scale of about 50, and has a plate shape with a thickness of 5 mm and is bonded to the solid whetstone with an adhesive and has the same planar shape as the solid whetstone. Met.

Each segment was attached so that its working surface was at the same height from the base of the surface plate, and the working surfaces to be formed were formed to be flush with each other as a whole.

Next, as a work, a circular plate glass with a gentle curved surface and a bulging central portion was prepared. This work had already been subjected to roughing and sanding, and had a so-called frosted glass-like semi-gloss.

The work was attached to the polishing apparatus, and the work was polished by setting the polishing pressure to 120 g / cm ² while supplying a predetermined amount of water as a polishing liquid. The surface of the work after processing became a glossy surface close to a mirror surface, and no difference in gloss between the central part and the peripheral part was observed, and the entire surface was subjected to uniform polishing.

Comparative Example 1 Polishing was performed in the same manner as in Example 1 except that the solid grindstone was directly attached to the surface plate without using the cushioning material used in Example 1. As a result, the center part of the work piece was cleanly polished, but the peripheral part of the work piece was not processed at all.

Example 2 A buffing material (trade name: Kristalbuff KH, manufactured by Kanebo Co., Ltd.) in which vinylon short fibers are fixedly integrated with a binder mainly composed of polyvinyl acetal resin and a phenolic resin as an abrasive carrier Prepared. The buff members were fixed to each other with a cushioning member having the same plane shape with an adhesive, and then fixed and arranged on the surface plate in an arrangement as shown in FIG. The same buffer material as that used in Example 1 was used. The surface plate used here was a non-woven fabric hardened with urethane resin, had a thickness of about 6 mm, and was flexible. .

Similar to the first embodiment, each segment is attached such that its working surface is at the same height from the base of the surface plate, and the working surfaces formed are configured to form the same plane as a whole. .

Next, a plate-shaped work having a gentle hill-shaped undulation regularly repeated was prepared as a work. The maximum difference between the top and bottom of the hill-shaped relief was about 3 mm. A continuous pattern was formed on the surface of the work, and there were variations in shape, burrs, scratches, and minute bubbles (shear marks) on the surface, but there was no sharp edge-like step.

The above-prepared work was attached to a polishing apparatus, and polishing was performed for 60 seconds at a gauge pressure of 15 kgf and a platen rotation speed of 90 rpm while supplying a predetermined amount of red iron oxide (ferric oxide) slurry as an abrasive. The surface of the work after processing was a uniform one with regular hill-shaped undulations, with the variations, burrs, scratches, shear marks, etc. that were seen before processing being completely removed. In addition, the surface became a frosted glass-like semi-glossy surface, and defects such as glossy spots and scratches were not recognized. The average polishing removal amount on the work surface was 45 μ.

Comparative Example 2 Polishing was performed in the same manner as in Example 2 except that the buff material was directly attached to the surface plate without using the cushioning material used in Example 2. As a result, the amount of polishing removal on the hill-shaped top of the workpiece was about 60μ on average, and the work was finely processed to give a frosted glass-like semi-gloss. It was

[0026]

[Effect of device]

 In the polishing apparatus of the present invention, the segment consisting of the solid grindstone or the polishing material holder is attached to the lapping platen via the cushioning material having an appropriate elasticity. It is possible to follow the surface shape of the sample very quickly and perform uniform polishing. For this reason, it has become possible to easily and efficiently polish a non-planar work, which has hitherto been extremely difficult to uniformly machine, such as an optical lens or a decorative plate having a gentle undulation on the surface. .

Therefore, with the device of the present invention, it is possible to mechanize these polishing processes that have hitherto relied on manual work, and also the time required for the process is significantly shortened, and stable process quality is obtained. be able to.

[Brief description of drawings]

FIG. 1 is a perspective view illustrating a main part of a polishing apparatus of the present invention.

FIG. 2 is a conceptual cross-sectional view illustrating an example of a usage state of the polishing apparatus of the present invention.

FIG. 3 is a conceptual cross-sectional view illustrating an example of a usage state of the polishing apparatus of the present invention.

FIG. 4 is an explanatory plan view showing a working surface of the lapping plate according to the first embodiment of the present invention.

FIG. 5 is an explanatory plan view showing a working surface of a lapping plate according to a second embodiment of the present invention.

FIG. 6 is a plan view showing an example of a lapping platen working surface according to the present invention.

FIG. 7 is a plan view showing an example of a lapping platen working surface according to the present invention.

FIG. 8 is a plan view showing an example of a lapping plate working surface according to the present invention.

FIG. 9 is an explanatory plan view showing an example of a lapping platen working surface according to the present invention.

[Explanation of symbols]

 1 segment consisting of a solid grindstone or abrasive material holder 2 cushioning material 3 lapping surface plate 4 work (workpiece) 5 rotary shaft 6 support shaft 7 work holding member

Claims (5)

[Scope of utility model registration request] 1. A plurality of segments made of a solid grindstone,
A lapping machine attached to a lapping plate so that its working surface forms the same surface, wherein the solid grindstone is attached to the lapping plate via a buffer material having elasticity. Equipment for polishing. 2. A polishing apparatus in which a plurality of segments made of an abrasive material holder are attached to a lapping platen such that their working surfaces are the same surface, and the abrasive material holder has elasticity. An apparatus for polishing, wherein the polishing apparatus is attached to a lapping platen through a cushioning material included therein. 3. The polishing apparatus according to claim 2, wherein the abrasive support is made of a synthetic resin porous body or a synthetic resin / fiber composite porous body. 4. The polishing apparatus according to claim 1, wherein the cushioning material having elasticity is a synthetic resin elastic body. 5. The hardness of the cushioning material having elasticity is such that the value on the rubber hardness C scale defined by the Japan Rubber Association Standard SRIS-0101 is 30 to 80.
The polishing processing apparatus according to any one of claims 1 to 4.