JPH0727623Y2 - 電解エッチング装置 - Google Patents

電解エッチング装置

Info

Publication number
JPH0727623Y2
JPH0727623Y2 JP19764287U JP19764287U JPH0727623Y2 JP H0727623 Y2 JPH0727623 Y2 JP H0727623Y2 JP 19764287 U JP19764287 U JP 19764287U JP 19764287 U JP19764287 U JP 19764287U JP H0727623 Y2 JPH0727623 Y2 JP H0727623Y2
Authority
JP
Japan
Prior art keywords
solution
electrode
exchange membrane
ions
electrolytic etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP19764287U
Other languages
English (en)
Japanese (ja)
Other versions
JPH01104025U (enrdf_load_html_response
Inventor
正志 中村
秀智 野尻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissan Motor Co Ltd
Original Assignee
Nissan Motor Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissan Motor Co Ltd filed Critical Nissan Motor Co Ltd
Priority to JP19764287U priority Critical patent/JPH0727623Y2/ja
Publication of JPH01104025U publication Critical patent/JPH01104025U/ja
Application granted granted Critical
Publication of JPH0727623Y2 publication Critical patent/JPH0727623Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Weting (AREA)
JP19764287U 1987-12-28 1987-12-28 電解エッチング装置 Expired - Lifetime JPH0727623Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19764287U JPH0727623Y2 (ja) 1987-12-28 1987-12-28 電解エッチング装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19764287U JPH0727623Y2 (ja) 1987-12-28 1987-12-28 電解エッチング装置

Publications (2)

Publication Number Publication Date
JPH01104025U JPH01104025U (enrdf_load_html_response) 1989-07-13
JPH0727623Y2 true JPH0727623Y2 (ja) 1995-06-21

Family

ID=31488186

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19764287U Expired - Lifetime JPH0727623Y2 (ja) 1987-12-28 1987-12-28 電解エッチング装置

Country Status (1)

Country Link
JP (1) JPH0727623Y2 (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7592570B2 (ja) 2021-09-17 2024-12-02 株式会社東芝 エッチング装置及びエッチング方法

Also Published As

Publication number Publication date
JPH01104025U (enrdf_load_html_response) 1989-07-13

Similar Documents

Publication Publication Date Title
US5762779A (en) Method for producing electrolyzed water
US5833831A (en) Method and system for generating electrolyzed water
WO1997001179A2 (en) Method of producing aluminum foil for electrolytic capacitors and product thereof
JPH07263430A (ja) 半導体基板のウエット処理方法
JP2859081B2 (ja) ウェット処理方法及び処理装置
US9315913B2 (en) Formic acid generation apparatus and method
JPH0727623Y2 (ja) 電解エッチング装置
JPH0761414B2 (ja) 空調方法
TW200534914A (en) Electromembrane process and apparatus
US4026741A (en) Technique for preparation of stoichiometric III-V compound semiconductor surfaces
JP2021044271A (ja) エッチング液およびエッチング方法
KR102690133B1 (ko) 린싱 (rinsing) 액체를 생산하는 방법
Bongenaar et al. A faradaic impedance study of the electrochemical reduction of Cd (II) ions from aqueous 1 M (KF+ KCl) mixed electrolyte solutions at the dropping mercury electrode
JPH10152790A (ja) 水酸化ナトリウム水溶液の製造方法
JP3980518B2 (ja) ウェット洗浄処理装置およびウェット洗浄処理方法
JP3255228B2 (ja) 半導体装置の製造方法
JP3196142B2 (ja) 電解式浄水器
JP2002224674A (ja) 基板洗浄用水の製造装置及び製造方法、それらにより製造された基板洗浄用水、並びに該基板洗浄用水を用いた基板の洗浄方法
JPH1142481A (ja) 基板洗浄用水の製造装置及び製造方法、それらにより製造された基板洗浄用水、並びに該基板洗浄用水を用いた基板の洗浄方法
JP2019214777A (ja) 亜塩素酸を含む水性液体の製造装置
JPH09186133A (ja) シリコンウエファの表面処理方法
JP2002506129A (ja) 酸素還元用修飾型白金基板
JP3191700B2 (ja) ウェット処理方法
JPH11162917A (ja) 半導体装置の製造方法及び処理液の生成装置
JP3305017B2 (ja) 電気透析スタック及び電気透析方法