JPH07243091A - Electrolytic treatment of metal surface - Google Patents

Electrolytic treatment of metal surface

Info

Publication number
JPH07243091A
JPH07243091A JP7121194A JP7121194A JPH07243091A JP H07243091 A JPH07243091 A JP H07243091A JP 7121194 A JP7121194 A JP 7121194A JP 7121194 A JP7121194 A JP 7121194A JP H07243091 A JPH07243091 A JP H07243091A
Authority
JP
Japan
Prior art keywords
metal
chemical formula
treatment
surface treatment
acid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7121194A
Other languages
Japanese (ja)
Inventor
Hideaki Yamaguchi
秀明 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP7121194A priority Critical patent/JPH07243091A/en
Publication of JPH07243091A publication Critical patent/JPH07243091A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings

Abstract

PURPOSE:To form a coating film excellent in moisture, heat and chemical resistances on a metal surface and to improve wettability with solder by electrolyzing the metal surface in an aq. soln. contg. a specified perimidine compd. as an effective component. CONSTITUTION:The metal surface of a copper plate, etc., is electrolyzed as the cathode or anode by a PR method, an AC method, a DC method, an AC-DC superposing method or a method using AC in combination in an aq. soln. contg. a perimidine compd. represented by one of formulae I-V or its deriv. as an effective component or further contg. an org. acid, a metallic compd., ammonium salts, etc. In the formulae I-V, R1 is H, alkyl, phenylalkyl or allyl, R2 is H, alkyl, phenylalkyl or alkylphenyl, R3 is H, sulfonic acid, alkyl or halogen, (n) is 0-17 and (x) is 0-1. A water-soluble preflux contg. the perimidine compd. is applied to the metal surface and soldering is carried out. after the surface treatment.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、銅、銅合金、はん
だ、無電解はんだ、亜鉛、ニッケル、金、銀、ロジウ
ム、パラジュウム、ルテニウムおよびこれらの合金等の
金属の防錆、はんだ荒れ防止、変色防止、耐アルカリ
性、耐湿性、耐薬品性、耐熱性、はんだ付け性を向上さ
せる処理方法に関するものであり、特にこれら金属のは
んだ付け性を長期間良好な状態に維持することや、プリ
ント配線板製造時のアルカリ性溶液による表面荒れ防止
に好適な方法を提供するものである。また、接合した異
種金属の両者共に処理できるため、めっきのピンホール
の防錆にも最適で無電解はんだのピンホールの防錆や、
コネクターのニッケル・金めっき後の封孔処理剤として
好適なものである。また、高密度表面実装用電子部品の
チップ及びパッケージ等の接続用プリント配線板として
好適なものである。また、はんだ粉のはんだ加熱処理、
アルカリ性エッチング液処理の銅スルーホールプリント
配線板の製造として好適なものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to anticorrosion and solder roughening of metals such as copper, copper alloys, solders, electroless solders, zinc, nickel, gold, silver, rhodium, palladium, ruthenium and their alloys. The present invention relates to a treatment method for improving discoloration prevention, alkali resistance, moisture resistance, chemical resistance, heat resistance, and solderability, and particularly for maintaining the solderability of these metals in a good state for a long period of time, and for printed wiring. It is intended to provide a method suitable for preventing surface roughness due to an alkaline solution during plate production. Also, since both dissimilar metals joined can be treated, it is also ideal for rust prevention of plating pinholes, and rustproofing of electroless solder pinholes,
It is suitable as a sealing agent for nickel / gold plating of connectors. It is also suitable as a printed wiring board for connection of chips and packages of high-density surface mounting electronic components. Also, solder heat treatment of solder powder,
It is suitable for manufacturing a copper through-hole printed wiring board treated with an alkaline etching solution.

【0002】[0002]

【従来の技術】従来、プリント配線板の銅又は銅合金か
らなる回路部を防錆し、はんだ付け性を保持する目的で
使用されているアルキルイミダゾール系プリフラックス
は水溶性であり、作業環境の面でも安全性の面でも優れ
ているが、化学反応したアルキルイミダゾール銅錯体が
高温に曝されると空気中の酸素と銅の触媒作用で変質し
てポストフラックスの作用を阻害して、はんだ付け性を
悪くするという欠点を有している。パターンめっき法に
よるプリント配線板の製造方法は、銅張積層板に穴あ
け、化学銅めっき、電気銅めっき続いてアルカリ水溶液
に可溶のアルカリ現像型感光性フィルムを銅張積層板上
に陰画回路を形成し、次いで電気銅めっき、はんだめつ
き後、アルカリ性水溶液と接触させてアルカリ現像型感
光性フィルムを除く。この時アルカリにより、はんだ表
面が侵され銅素材が露出することがある。この場合後工
程のアルカリエッチング液で銅がエッチングされ回路が
切断される場合もある。また、はんだめっきを残しはん
だスルーホール基板を製造する場合、このままでははん
だ付け性が悪くフュージング処理等を行う必要がある。
プリント配線板のはんだ接合技術の1つとしての無電解
はんだは置換めっきにより行われる。このため多孔質と
なり素材の銅表面が露出している。また、析出も鉛、錫
個別に行われる両者の混合物となっている。このためは
んだ付け性の悪い銅、錫合金の生成や鉛、錫の酸化が起
りやすくめっき後フュージングをしなければ良好なはん
だ付け性を長期間維持できない。ニッケルは強固な酸化
膜を形成しやすくはんだ付け性が悪い。そのためプリン
ト配線板やコネクターでは、はんだ付け性の必要な場合
ニッケル上に金めっきを施し酸化防止している。金、
銀、亜鉛の防錆としてはクロメート処理が行われるが、
有害な6価クロム化合物を使用するため問題がある。ま
た、銀の防錆にはパラフィン等を溶剤に溶解して塗布す
るが溶剤使用の問題がある。
2. Description of the Related Art Alkylimidazole-based preflux, which has been used for the purpose of preventing rust on a circuit portion made of copper or a copper alloy of a printed wiring board and maintaining solderability, is water-soluble and has a It is excellent both in terms of safety and safety, but when the chemically reacted alkyl imidazole copper complex is exposed to high temperatures, it deteriorates due to the catalytic action of oxygen and copper in the air, inhibiting the action of post-flux and soldering. It has the drawback of deteriorating the sex. The method of manufacturing a printed wiring board by the pattern plating method is to drill a hole in a copper clad laminate, chemically copper plating, electrolytic copper plating, and then an alkaline development type photosensitive film soluble in an alkaline aqueous solution, and a negative circuit on the copper clad laminate. After forming, and then electrolytic copper plating and soldering, contact with an alkaline aqueous solution to remove the alkali developing type photosensitive film. At this time, the surface of the solder may be attacked by the alkali and the copper material may be exposed. In this case, the circuit may be cut by etching copper with an alkaline etching solution in a later step. Further, when a solder through-hole substrate is manufactured with the solder plating left, the solderability is poor as it is, and it is necessary to perform a fusing treatment or the like.
Electroless soldering, which is one of the solder joining techniques for printed wiring boards, is performed by displacement plating. Therefore, it becomes porous and the copper surface of the material is exposed. In addition, precipitation is a mixture of both lead and tin, which are performed separately. For this reason, copper and tin alloys having poor solderability are likely to be generated, and lead and tin are likely to be oxidized, so that good solderability cannot be maintained for a long period unless fusing after plating. Nickel easily forms a strong oxide film and has poor solderability. Therefore, in printed wiring boards and connectors, nickel is plated with gold to prevent oxidation when solderability is required. Money,
Chromate treatment is used for rust prevention of silver and zinc,
There is a problem because a harmful hexavalent chromium compound is used. Further, for rust prevention of silver, paraffin or the like is dissolved in a solvent and applied, but there is a problem in using the solvent.

【0003】[0003]

【発明が解決しょうとする課題】近年プリント配線板に
電子部品をはんだ付けする方法として表面実装法が多く
採用されている。この表面実装法、電子部品の仮止め低
融点クリームはんだのリフロー等、プリント配線板が高
温に曝される機会が多くなり、プリント配線板のはんだ
付け性を保持するために用いられるプリフラックスの耐
熱性、即ちプリント配線板が高温に曝された後での低融
点クリームはんだの濡れ性、拡がり性、はんだ付け性が
優れていることがプリフラックスの性能に要求されるよ
うになった。プリント配線板の製造方法では、はんだエ
ッチングレジスト膜としての信頼性に劣り製造不良が発
生しやすい、そこで、アルカリ現像型感光性フイルム剥
離時、アルカリエッチング時のはんだ荒れを防止し、良
好な回路形成を得ると共にはんだ付け性を良好な状態に
保つ。また、無電解はんだにおいては、基板へのサーマ
ルストレスが強いばかりでなくコストも高いフュージン
グを行なわず防錆処理により良好なはんだ付け性を維持
する。ニッケルにおいては高価な金めっきを使用せずに
変色を防止しまた良好なはんだ付け性を維持する。銀、
亜鉛については、有害な6価クロム化合物を含有しない
安全な溶液で処理し、長期間変色を防止したりはんだ付
け性を良好なはんだ付け性を維持する。また、封孔処理
によりコネクター端子の耐食性を維持する。プリント配
線板の製造方法では、クリームはんだ印刷時のずれ、は
んだの膜厚、生産性、コスト等が悪い。そこで金属の露
出部のみ選択的に粘着性化成被膜を反応させた後、はん
だ粉を付着させリフロー処理後の、はんだ膜厚の均一
性、膜厚のコントロールの優れたはんだ基板の開発が切
望されている。
In recent years, the surface mounting method has been widely adopted as a method for soldering electronic components to a printed wiring board. Due to this surface mounting method, reflow of low melting point cream solder for temporary fixing of electronic parts, the printed wiring board is exposed to high temperatures frequently, and the heat resistance of the pre-flux used to maintain the solderability of the printed wiring board. Of the low melting point cream solder after the printed wiring board is exposed to a high temperature, the wettability, spreadability and solderability of the low melting point solder paste are required to be excellent in the performance of the preflux. In the manufacturing method of a printed wiring board, the reliability as a solder etching resist film is poor and manufacturing defects are likely to occur.Therefore, when the alkali development type photosensitive film is peeled off, solder roughening during alkali etching is prevented and good circuit formation is achieved. While maintaining good solderability. Further, in the electroless solder, not only thermal stress to the substrate is strong but also costly fusing is not performed, but good solderability is maintained by rust preventive treatment. Nickel does not use expensive gold plating to prevent discoloration and maintain good solderability. Silver,
Zinc is treated with a safe solution containing no harmful hexavalent chromium compound to prevent discoloration for a long period of time and maintain good solderability. Also, the sealing treatment maintains the corrosion resistance of the connector terminals. In the method of manufacturing a printed wiring board, the deviation during cream solder printing, the solder film thickness, the productivity, the cost, etc. are poor. Therefore, it is earnestly desired to develop a solder substrate that is excellent in the uniformity of the solder film thickness and in the control of the film thickness after the solder powder is adhered and the reflow treatment is performed after selectively reacting the adhesive chemical conversion film only on the exposed metal parts. ing.

【0004】[0004]

【課題を解決するための手段】本発明者は、このような
事情に鑑み、高温に曝された後でも低融点クリームはん
だの濡れ性、拡がり性。リフロー後のはんだ上がり性、
濡れ性の良い耐熱水溶性プリフラックス剤。また、アル
カリ現像型感光性フイルム剥離時、アルカリエッチング
時のはんだ荒れ、変色防止のためのはんだ防錆剤、無電
解はんだ防錆剤。また、コネクター部品、ニッケル基板
等の防錆、耐湿性、耐熱性、はんだ付け性の優れた防錆
剤。また、金属の露出部のみ選択的に粘着膜を反応させ
金属粉を付着させる粘着剤。また、銅の回路部に化成被
膜を形成させアルカリエッチング液に耐える表面保護剤
に関して鋭意検討を重ねた結果、本発明の実施において
用いられる有機酸としては、酢酸、ヨード酢酸、ブロモ
酢酸、ジメチル酢酸、ジエチル酢酸、α−ブロモ酢酸、
パラニトロ安息香酸、パラトルエンスルホン酸、ピクリ
ン酸、蓚酸、蟻酸、コハク酸、マレイン酸、アクリル
酸、フマール酸、酒石酸、アジピン酸、乳酸、オレイン
酸、クエン酸、メタスルホン酸、スルファミン酸等の有
機酸、塩酸、硫酸、亜りん酸、燐酸等の無機酸、その他
のカルボン酸、ハロゲン化脂肪酸、ハロゲン化芳香族カ
ルボン酸等があり水に対して0.01〜20%の割合で
添加すれば良い。有効成分として(化1)〜(化5)で
表わされる化合物を1種類又は2種類以上を酸水溶液に
対して0.1〜5%の割合で添加すれば良い。本発明方
法の実施において使用される金属イオンとしての化合物
の代表的なものとしてはリチウム、ベリリウム、カリウ
ム、マグネシウム、酢酸亜鉛、蟻酸亜鉛、乳酸亜鉛、ク
ウン酸亜鉛、安息香酸亜鉛、蓚酸亜鉛、水酸化亜鉛、臭
化亜鉛、リン酸亜鉛、酸化亜鉛、塩化亜鉛、酢酸鉛、水
酸化鉛、臭化鉛、ヨウ化鉛、蓚酸鉛、ほう酸鉛、塩化第
一鉄、塩化第二鉄、臭化第一銅、臭化第二銅、ヨウ化第
一銅、蟻酸銅、塩化ニッケル、酢酸ニッケル、塩化第一
銅、塩化第二銅、酸化第一銅、酸化第二銅、水酸化銅、
リン酸銅、炭酸銅、酢酸銅、硫酸銅等の金属化合物であ
り、水に対して0.001〜5%の割合で添加すれば良
い。本発明の実施において用いられるハロゲン化芳香族
カルボン酸としては、3−ブロモ−4メチル安息香酸、
4−(ブロモメチル)フェニル酢酸、α−ブロモフェニ
ル酢酸、α−ブロモテトラデカン酸、2−ブロモフェニ
ル酢酸、3−ブロモフェニル酢酸、4−ブロモフェニル
酢酸等であり、水溶液に対して0.01〜20%の範
囲、好ましくは0.1〜5%の割合で添加すれば良い。
本発明の実施において用いられるハロゲン化脂肪酸とし
ては、ブロモ酢酸、3−ブロモ−2−(ブロモメチル)
プロピオン酸、2−ブロモブタン酸、4−ブロモブタン
酸、2−ブロモヘキサンデカン酸、2−ブロモヘキサン
酸、2−ブロモ−3−メチルブタン酸、2−ブロモ2−
メチルプロピオン酸、2−ブロモオクタン酸、8−ブロ
モオクタン酸、2−ブロモプロピオン酸、3−ブロモプ
ロピオン酸、2−ブロモペンタン酸、5−ブロモペンタ
ン酸、クロロ酢酸、クロロ酪酸、クロロプロピオン酸等
であり、水溶液に対して0.01〜20%の範囲、好ま
しくは0.1〜5%の割合で添加すれば良い。本発明の
実施においては、(化1)〜(化5)で表わされる化合
物及び有機酸、金属化合物、ハロゲン化芳香族カルボン
酸、ハロゲン化脂肪酸の溶解が困難となる場合には、メ
タノール、エタノール、イソプロピルアルコール、プタ
ノール、アセトン等の水溶性溶媒を夫々単独に用いるこ
とができる他、任意の割合で混合して使用することも可
能である。例えば上記水溶性溶媒は単独で用いられる他
有機酸等と併用することもでき、特に有機酸等単独で
は、(化1)〜(化5)で表される化合物あるいはその
誘導体の溶解が困難となる場合には、水溶性溶媒を含有
させることが好ましく、この場合の含有率は0.01〜
60%とすることが適当である場合が多い。 乳化分散
剤においては、フミン酸、ニトロフミン酸等であり、水
溶液に対して0.01〜20%の範囲、好ましくは0.
1〜5%の割合で添加すれば良い。本発明方法の実施に
おいて使用されるバリウムイオンとしての化合物の代表
的なものとしては酢酸バリウム、臭化バリウム、塩化バ
リウム、弗化バリウム、炭酸バリウム、水酸化バリウ
ム、硝酸バリウム、燐酸バリウム、酸化バリウム、蓚酸
バリウム等であり、処理液に対して、バリウムイオン濃
度が30ppm以上、好ましくは200〜5000pp
mの割合で添加すれば良い。また、バリウムイオンとハ
ロゲンイオン共存させる場合に、ハロゲンイオン供給源
として使用する化合物は、塩化ナトリウム、塩化カリウ
ム、沃化ナトリウム、弗化ナトリウム、弗化カリウム、
塩化バリウム、臭化バリウム、塩化バリウム、塩化アン
モニウム、臭化アンモニウム等のアルカリ金属、及びア
ンモニウムイオン、のハロゲン化物、塩酸、臭化水素酸
等のハロゲン化水素酸、塩化クロム、塩化亜鉛、臭化亜
鉛、塩化鉛、塩化ニッケル、臭化ニッケル、臭化第一
銅、臭化第二銅、ヨウ化銅、塩化第二銅等の金属のハロ
ゲン化物であり、処理液に対して、ハロゲンイオン濃度
は30ppm以上、好ましくは200〜5000ppm
の割合で添加すれば良い。また、界面活性剤、乳化分散
剤を添加すると有効である。なお処理液には、アンモニ
ア水あるいはアミン類等の緩衝作用を有する物質を添加
することは、水溶液のPHの安定性を高めるばかりでな
く被膜形成速度を速めるために有効である。本発明方法
の実施において使用される(化1)〜(化5)で表され
る化合物及び有機酸、金属化合物並びに約30ppm以
上のバリウムイオンとハロゲンイオンを含む水溶液中
で、電解処理することによって、化成被膜の耐熱性、は
んだ濡れ性、はんだ広がり性がさらに高めることが出来
る。本発明の金属表面処理剤により防錆化成被膜、粘着
性化成膜、耐薬品性化成被膜を金属表面に施すには、金
属表面を処理液と接触させながら電解処理する。また、
金属表面を処理液と接触させながら超音波、電磁波を照
射させると孔の内部まで侵入し寄り効果的である。接触
させる処理液の温度は、0〜100℃の温度範囲で浸漬
時間は数秒〜数十分の処理が適当である。電解処理は、
陰極もしくは陽極で電流密度0.01A/dm〜10
A/dm範囲で浸漬時間は数秒〜数十分の処理が適当
である。また、防錆化成被膜形成後、耐湿性、耐薬品性
をさらに向上させる処理として、赤外線・近赤外線・遠
赤外線・紫外線照射処理を0〜300℃の温度範囲で、
処理時間数秒〜数十分の処理が効果的である。本発明方
法の実施において使用される(化1)〜(化5)で表さ
れる化合物の合成方法はアミンと脂肪酸を加熱反応させ
た後、不純物を除去することにより容易に(化1)〜
(化5)で表される化合物を得ることができる。本発明
方法の実施において使用される(化1)〜(化5)で表
される化合物の用途には特に限定はしないが、金属の表
面処理剤のほかエポキシ樹脂の硬化剤、染色助剤、感光
剤、有機合成中間体等に有用である。
In view of such circumstances, the present inventors have found that the low melting point cream solder has wettability and spreadability even after being exposed to a high temperature. Solderability after reflow,
Heat-resistant water-soluble pre-flux agent with good wettability. Also, a solder rust preventive and an electroless solder rust preventive to prevent solder roughening and discoloration during alkaline etching when peeling an alkaline development type photosensitive film. In addition, it is a rust preventive agent with excellent rust prevention, moisture resistance, heat resistance, and solderability for connector parts and nickel substrates. Also, an adhesive that selectively reacts the adhesive film only on the exposed portion of the metal to attach the metal powder. In addition, as a result of extensive studies on a surface protective agent that forms a chemical conversion film on a circuit portion of copper and resists an alkaline etching solution, as an organic acid used in the practice of the present invention, acetic acid, iodoacetic acid, bromoacetic acid, dimethylacetic acid , Diethyl acetic acid, α-bromoacetic acid,
Organic acids such as para-nitrobenzoic acid, para-toluenesulfonic acid, picric acid, oxalic acid, formic acid, succinic acid, maleic acid, acrylic acid, fumaric acid, tartaric acid, adipic acid, lactic acid, oleic acid, citric acid, metasulfonic acid, sulfamic acid, etc. , Inorganic acids such as hydrochloric acid, sulfuric acid, phosphorous acid, phosphoric acid, and other carboxylic acids, halogenated fatty acids, halogenated aromatic carboxylic acids, etc., and they may be added in a proportion of 0.01 to 20% with respect to water. . One or more compounds represented by (Chemical formula 1) to (Chemical formula 5) may be added as an active ingredient at a ratio of 0.1 to 5% with respect to the acid aqueous solution. Typical compounds used as metal ions in the practice of the method of the present invention include lithium, beryllium, potassium, magnesium, zinc acetate, zinc formate, zinc lactate, zinc counate, zinc benzoate, zinc oxalate, and water. Zinc oxide, zinc bromide, zinc phosphate, zinc oxide, zinc chloride, lead acetate, lead hydroxide, lead bromide, lead iodide, lead oxalate, lead borate, ferrous chloride, ferric chloride, bromide Cuprous, cupric bromide, cuprous iodide, copper formate, nickel chloride, nickel acetate, cuprous chloride, cupric chloride, cuprous oxide, cupric oxide, copper hydroxide,
It is a metal compound such as copper phosphate, copper carbonate, copper acetate, and copper sulfate, and may be added in a proportion of 0.001 to 5% with respect to water. The halogenated aromatic carboxylic acid used in the practice of the present invention includes 3-bromo-4methylbenzoic acid,
4- (bromomethyl) phenylacetic acid, α-bromophenylacetic acid, α-bromotetradecanoic acid, 2-bromophenylacetic acid, 3-bromophenylacetic acid, 4-bromophenylacetic acid, etc., and 0.01 to 20 with respect to the aqueous solution. %, Preferably 0.1 to 5%.
Examples of the halogenated fatty acid used in the practice of the present invention include bromoacetic acid and 3-bromo-2- (bromomethyl).
Propionic acid, 2-bromobutanoic acid, 4-bromobutanoic acid, 2-bromohexanedecanoic acid, 2-bromohexanoic acid, 2-bromo-3-methylbutanoic acid, 2-bromo2-
Methylpropionic acid, 2-bromooctanoic acid, 8-bromooctanoic acid, 2-bromopropionic acid, 3-bromopropionic acid, 2-bromopentanoic acid, 5-bromopentanoic acid, chloroacetic acid, chlorobutyric acid, chloropropionic acid, etc. Therefore, it may be added in the range of 0.01 to 20%, preferably 0.1 to 5% with respect to the aqueous solution. In the practice of the present invention, when it becomes difficult to dissolve the compound represented by (Chemical formula 1) to (Chemical formula 5) and the organic acid, the metal compound, the halogenated aromatic carboxylic acid, or the halogenated fatty acid, methanol or ethanol is used. Water-soluble solvents such as isopropyl alcohol, butanol, and acetone can be used alone, or can be used by mixing them at an arbitrary ratio. For example, the above water-soluble solvent may be used alone or in combination with other organic acids, etc. In particular, when the organic acid alone is used, it is difficult to dissolve the compound represented by (Chemical formula 1) to (Chemical formula 5) or its derivative. In this case, it is preferable to add a water-soluble solvent, and the content ratio in this case is 0.01 to
In many cases, 60% is appropriate. In the emulsifying dispersant, humic acid, nitrohumic acid and the like are used, and are in the range of 0.01 to 20%, preferably 0.
It may be added at a rate of 1 to 5%. Representative of the compounds as barium ions used in the practice of the method of the invention are barium acetate, barium bromide, barium chloride, barium fluoride, barium carbonate, barium hydroxide, barium nitrate, barium phosphate, barium oxide. , Barium oxalate, etc., and the barium ion concentration is 30 ppm or more, preferably 200 to 5000 pp with respect to the treatment liquid.
It may be added at a ratio of m. When barium ions and halogen ions coexist, compounds used as a halogen ion source are sodium chloride, potassium chloride, sodium iodide, sodium fluoride, potassium fluoride,
Alkali metal such as barium chloride, barium bromide, barium chloride, ammonium chloride, ammonium bromide, and ammonium ion, halides, hydrochloric acid, hydrohalic acid such as hydrobromic acid, chromium chloride, zinc chloride, bromide It is a metal halide such as zinc, lead chloride, nickel chloride, nickel bromide, cuprous bromide, cupric bromide, copper iodide, cupric chloride, etc. Is 30 ppm or more, preferably 200 to 5000 ppm
It may be added in the ratio of. Further, it is effective to add a surfactant and an emulsifying dispersant. It should be noted that adding a substance having a buffering action such as aqueous ammonia or amines to the treatment liquid is effective not only for enhancing the stability of PH of the aqueous solution but also for accelerating the film formation rate. By carrying out electrolytic treatment in the aqueous solution containing the compounds represented by (Chemical formula 1) to (Chemical formula 5) and the organic acid, the metal compound and about 30 ppm or more of barium ion and halogen ion used in the method of the present invention. The heat resistance, solder wettability, and solder spreadability of the chemical conversion film can be further enhanced. In order to apply a rust-proof chemical conversion coating film, a tackifying film formation, and a chemical resistance chemical conversion coating film to the metal surface with the metal surface treatment agent of the present invention, electrolytic treatment is carried out while bringing the metal surface into contact with a treatment liquid. Also,
When ultrasonic waves or electromagnetic waves are irradiated while the metal surface is in contact with the treatment liquid, it effectively penetrates into the inside of the holes. It is suitable that the temperature of the treatment liquid to be brought into contact is in the temperature range of 0 to 100 ° C. and the immersion time is several seconds to several tens of minutes. The electrolytic treatment is
Current density of 0.01 A / dm 2 to 10 at cathode or anode
In the A / dm 2 range, it is suitable that the immersion time is several seconds to several tens of minutes. In addition, as a treatment for further improving the moisture resistance and the chemical resistance after forming the rust preventive conversion film, infrared / near-infrared / far-infrared / ultraviolet irradiation treatment is performed in a temperature range of 0 to 300 ° C.
Treatment time of several seconds to several tens of minutes is effective. The method for synthesizing the compounds represented by (Chemical formula 1) to (Chemical formula 5) used in the practice of the method of the present invention can easily be carried out by removing impurities after the amine and the fatty acid are reacted by heating.
A compound represented by (Chemical Formula 5) can be obtained. The use of the compounds represented by (Chemical formula 1) to (Chemical formula 5) used in carrying out the method of the present invention is not particularly limited, but in addition to a metal surface treatment agent, a curing agent for an epoxy resin, a dyeing aid, It is useful as a photosensitizer and an organic synthetic intermediate.

【0005】[0005]

【作用】上記した処理方法によれば、銅、銅合金、はん
だ、無電解はんだ、ニッケル、金、銀、亜鉛等の金属表
面に防錆に有効な、(化1)〜(化5)を主体とする防
錆化成被膜、粘着性化成被膜、耐薬品性化成被膜が形成
される。これらの化成被膜は撥水性で耐湿性、耐熱性、
耐薬品性にも優れ金属表面を長期間保護すると共に、低
融点クリームはんだの濡れ性、拡がり性、リフロー後の
はんだ上がり性、濡れ性が良好である。また、粘着性化
成被膜にはんだ粉を付着させリフロー処理後のはんだ膜
厚の均一性が良好である。また必要な銅回路部に耐薬品
性化成被膜を形成させた後アルカリエッチング液処理し
て銅スルーホール配線板の製造成が良好である。且つ作
業環境、安全性の面からも優れたプリント配線板の製造
ができる。また、電解処理、超音波処理を行なうことに
より短時間で緻密な膜形成ができる。
According to the above-mentioned treatment method, (Chemical formula 1) to (Chemical formula 5) effective for rust prevention are applied to metal surfaces such as copper, copper alloy, solder, electroless solder, nickel, gold, silver and zinc. A rust preventive conversion film, an adhesive conversion film, and a chemical resistance conversion film which are the main components are formed. These chemical conversion coatings are water repellent, moisture resistant, heat resistant,
It has excellent chemical resistance, protects the metal surface for a long time, and has good wettability and spreadability of low melting point cream solder, solderability after reflow, and wettability. Further, the uniformity of the solder film thickness after the solder powder is adhered to the adhesive chemical conversion film and the reflow treatment is performed is good. Further, a chemical resistant chemical conversion film is formed on a required copper circuit portion and then treated with an alkali etching solution, whereby the production of a copper through-hole wiring board is good. In addition, it is possible to manufacture a printed wiring board excellent in terms of work environment and safety. Also, by performing electrolytic treatment and ultrasonic treatment, a dense film can be formed in a short time.

【0006】[0006]

【実施例】(化1)〜(化5)で表される化合物(表1
の記載の化合物)を0.5%、コハク酸、カルボン酸、
アンモニア水、塩化第二銅、イオン交換水等を含む各種
類の水溶液または、乳化水溶液を作り、100ml容器
に入れ、液温を40℃に加熱し調整した。他方、1cm
×5cm×0.3mmの銅板に、硫酸銅めっき、無
電解銅めっき、電気はんだめっき、無電解はんだめ
っき、ニッケルめっき、銀めっきをした。次いで脱
脂、水洗、ソフトエッチング、水洗、酸洗、水洗し表面
を洗浄して、上記(化1)〜(化5)で表される化合物
を有効成分とする各種類の0.5%水溶液中で陰極で1
A/dm1分間電解処理を行なったものと陽極で0.
5A/dm1分間電解処理を行なった。その後水洗し
て〜の試験片を作成し次いで、(1)〜の試験
片を熱風乾燥機に入れ200℃で5分間加熱して測定前
にポストフラックスに浸漬してはんだ濡れ性試験機を用
いて濡れ時間を測定した。(2)〜の試験片にロジ
ン系プリフラックスを塗布した後、試料片を熱風乾燥機
に入れ200℃で5分間加熱して測定前にポストフラッ
クスに浸漬して、はんだ濡れ性試験機を用いて濡れ時間
を測定した。(3)〜の試験片を耐湿(MIL−S
TD−202F−M−106E)処理した後、試験片を
ポストフラックスに浸漬してはんだ濡れ性試験機を用い
て濡れ時間を測定した。(4)アルカリ性溶液、アルカ
リエッチング液を40℃に加熱し、〜試験片を5分
間浸漬した。その後水洗して表面状態(荒れ性、変色
性)を見る。(5)〜の試験片をガス腐食試験(1
±0.3ppmHS、25±2℃、5%RH、10日
間)後の金属の表面状態(荒れ性、変色性)を見る。
(6)〜の試験片にはんだ粉を塗布して粘着性およ
びリフロー後の膜の均一性を見る。この試験結果は表1
に示した。
EXAMPLES Compounds represented by (Chemical formula 1) to (Chemical formula 5) (Table 1
0.5%), succinic acid, carboxylic acid,
An aqueous solution of each type containing aqueous ammonia, cupric chloride, ion-exchanged water, or an emulsified aqueous solution was prepared, placed in a 100 ml container, and the liquid temperature was adjusted to 40 ° C. On the other hand, 1 cm
A copper plate of 5 cm x 5 mm was plated with copper sulfate, electroless copper, electric solder, electroless solder, nickel and silver. Then, degreasing, washing with water, soft etching, washing with water, pickling, washing with water to wash the surface, and in each kind of 0.5% aqueous solution containing the compound represented by the above (Chemical formula 1) to (Chemical formula 5) as an active ingredient. At the cathode 1
A / dm 2 was electrolyzed for 1 minute and the anode had a resistance of 0.
Electrolysis treatment was carried out for 5 minutes at 5 A / dm 2 . After that, it is washed with water to prepare a test piece of (1), and then the test piece of (1) is put in a hot air dryer and heated at 200 ° C. for 5 minutes and immersed in post flux before measurement using a solder wettability tester. And the wetting time was measured. (2) After applying the rosin-based pre-flux to the test piece, put the sample piece in a hot air dryer for 5 minutes at 200 ° C., immerse in the post flux before measurement, and use a solder wettability tester. And the wetting time was measured. Moisture resistance (MIL-S
TD-202F-M-106E), the test piece was immersed in post flux and the wetting time was measured using a solder wettability tester. (4) The alkaline solution and the alkaline etching solution were heated to 40 ° C., and the test piece was immersed for 5 minutes. After that, wash with water and check the surface condition (roughness, discoloration). The gas corrosion test (1
The surface condition (roughness, discoloration) of the metal after ± 0.3 ppm H 2 S, 25 ± 2 ° C., 5% RH, 10 days) is observed.
Solder powder is applied to the test pieces of (6) to check the adhesiveness and the uniformity of the film after reflow. The test results are shown in Table 1.
It was shown to.

【表1】 [Table 1]

【0007】[0007]

【発明の効果】本発明の処理方法によれば、金属表面
に、耐湿性、耐熱性、耐薬品性に優れた化成防錆被膜、
粘着性化成被膜、耐薬品化成被膜が形成し、低融点クリ
ームはんだの濡れ性、拡がり性、また、リフロー後のは
んだ上がり性、濡れ性が良好という効果で、電子部品を
表面実装するのに特に顕著な効果を発揮しうるものであ
る。また、パターンめっき法による、プリント配線板製
造時のアルカリ性水溶液処理時のはんだ荒れ防止、回路
切断の危険性をなくすばかりでなく、はんだ付け部のは
んだを残しフュージング処理なしではんだ付け性を良好
な状態に保ち得るものである。また、コネクターのニッ
ケル・金めっき後の封孔処理剤として好適なものであ
る。また、高密度表面実装用電子部品のチップ及びパッ
ケージ等の接続用プリント配線板として好適なものであ
る。また、はんだ粉のはんだ加熱処理、アルカリ性エッ
チング液処理の銅スルーホールプリント配線板の製造と
して好適なものである。また、粘着性化成被膜は、防
錆、耐熱性に優れ、はんだ粉の付着が良くリフロー後の
はんだ拡がり性、濡れ性及び均一性に優れ、且つ作業環
境、安全性の面からも優れたプリント配線板、金属部品
の製造ができうる。
According to the treatment method of the present invention, a chemical conversion rust-preventive coating excellent in moisture resistance, heat resistance and chemical resistance is formed on a metal surface,
Adhesive chemical conversion coating and chemical resistant chemical conversion coating are formed, and it has the effect of good wettability and spreadability of low melting point cream solder, and solderability after reflow and good wettability. It is possible to exert a remarkable effect. In addition, the pattern plating method not only prevents the solder from becoming rough when processing alkaline aqueous solutions during the manufacture of printed wiring boards and eliminates the risk of circuit disconnection, but also leaves solder at the soldering part and improves solderability without fusing treatment. It can be kept in a state. It is also suitable as a sealing agent for nickel / gold plating of connectors. It is also suitable as a printed wiring board for connection of chips and packages of high-density surface mounting electronic components. Further, it is suitable for producing a solder through heat treatment of solder powder and a copper through hole printed wiring board treated with an alkaline etching solution. In addition, the adhesive chemical conversion coating has excellent rust prevention, heat resistance, good adhesion of solder powder, excellent solder spreadability after reflow, wettability and uniformity, and excellent printing in terms of work environment and safety. It is possible to manufacture wiring boards and metal parts.

Claims (10)

【特許請求の範囲】[Claims] 【請求項1】 (化1)〜(化5)で表される化合物を
含有する水溶液中で金属表面を陰極もしくは陽極と、P
R法、交流法、直流法、交直流重畳法、交流併用法で電
解することを特徴とする金属の表面処理方法。 【化1】 【化2】 【化3】 【化4】 【化5】
1. A metal surface is used as a cathode or an anode in an aqueous solution containing a compound represented by (Chemical formula 1) to (Chemical formula 5), and P
A surface treatment method for a metal, which comprises electrolyzing by an R method, an AC method, a DC method, an AC / DC superposition method, or an AC combined method. [Chemical 1] [Chemical 2] [Chemical 3] [Chemical 4] [Chemical 5]
【請求項2】 (化1)〜(化5)で表される化合物及
び有機酸、金属化合物、アンモニア塩類を含む水溶液中
で金属表面を陰極もしくは陽極と、PR法、交流法、直
流法、交直流重畳法、交流併用法で電解することを特徴
とする金属の表面処理方法。
2. A metal surface is used as a cathode or an anode in an aqueous solution containing a compound represented by (Chemical formula 1) to (Chemical formula 5) and an organic acid, a metal compound, or an ammonia salt, and a PR method, an AC method, a DC method, A surface treatment method for a metal, which comprises electrolyzing by an alternating current superposition method and an alternating current combined method.
【請求項3】 (化1)〜(化5)で表される化合物及
び有機酸並びにバリウムイオンとハロゲンイオンを含む
水溶液中で金属表面を陰極もしくは陽極と、PR法、交
流法、直流法、交直流重畳法、交流併用法で電解するこ
とを特徴とする金属の表面処理方法。
3. A compound represented by (Chemical formula 1) to (Chemical formula 5), an organic acid, and a metal surface in an aqueous solution containing barium ions and halogen ions, with a metal surface serving as a cathode or an anode, a PR method, an AC method, a DC method, A surface treatment method for a metal, which comprises electrolyzing by an alternating current superposition method and an alternating current combined method.
【請求項4】 (化1)〜(化5)で表される化合物及
び有機酸、金属化合物並びにバリウムイオンとハロゲン
イオンを含む水溶液中で金属表面を陰極もしくは陽極
と、PR法、交流法、直流法、交直流重畳法、交流併用
法で電解することを特徴とする金属の表面処理方法。
4. A compound represented by (Chemical formula 1) to (Chemical formula 5), an organic acid, a metal compound, and a metal surface in an aqueous solution containing barium ions and halogen ions, the metal surface being used as a cathode or an anode, a PR method, an AC method, A surface treatment method for a metal, which comprises electrolyzing by a direct current method, an alternating current superposition method, an alternating current combined method.
【請求項5】 請求項1〜請求項4記載の金属の表面処
理後、ロジン系プリフラックス、樹脂系プリフラックス
等のプリフラックスを塗布することを特徴とする金属の
表面処理方法。
5. A surface treatment method for a metal, which comprises applying a preflux such as a rosin-based preflux or a resin-based preflux after the surface treatment of the metal according to any one of claims 1 to 4.
【請求項6】 (化1)〜(化5)で表される化合物及
び有機酸、金属化合物、アンモニア塩類等を含む水溶性
プリフラックスを金属表面に塗布する。または水溶性プ
リフラックス塗布後、ロジン系プリフラックス、樹脂系
プリフラックス等のプリフラックスを塗布することを特
徴とする金属の表面処理方法。
6. A metal surface is coated with a water-soluble preflux containing a compound represented by (Chemical formula 1) to (Chemical formula 5) and an organic acid, a metal compound, an ammonia salt or the like. Alternatively, a surface treatment method for a metal, which comprises applying a pre-flux such as a rosin-based pre-flux or a resin-based pre-flux after applying the water-soluble pre-flux.
【請求項7】 請求項1〜請求項6記載の金属の表面処
理後、はんだ付け処理を行うことを特徴とするプリント
配線板の製造方法。
7. A method of manufacturing a printed wiring board, which comprises performing a soldering treatment after the surface treatment of the metal according to any one of claims 1 to 6.
【請求項8】 請求項1〜請求項6記載の金属の表面処
理後、空気中または窒素雰囲気中で加熱する赤外線リフ
ロー、近赤外線リフロー、遠赤外線リフロー、窒素リフ
ロー、ベーパーリフロー処理を行うことを特徴とするプ
リント配線板の製造方法。
8. After the surface treatment of the metal according to any one of claims 1 to 6, infrared reflow, near infrared reflow, far infrared reflow, nitrogen reflow, vapor reflow treatment of heating in air or a nitrogen atmosphere is performed. A method for manufacturing a characteristic printed wiring board.
【請求項9】 請求項1〜請求項6記載の金属の表面処
理後、はんだ粉を付着させた後、または、はんだ粉を付
着させポストフラックスを塗布した後、赤外線リフロ
ー、近赤外線リフロー、遠赤外線リフロー、窒素リフロ
ー、ベーパーリフロー処理等の加熱処理を行うことを特
徴とするプリント配線板の表面処理方法。
9. After the surface treatment of the metal according to any one of claims 1 to 6, after applying solder powder or applying solder powder and applying post flux, infrared reflow, near infrared reflow, far A surface treatment method for a printed wiring board, which comprises performing heat treatment such as infrared reflow, nitrogen reflow, and vapor reflow treatment.
【請求項10】 請求項1〜請求項6記載の金属の表面
処理後、アルカリ性溶液処理、アルカリ性エッチング液
処理を行うことを特徴とするプリント配線板の製造方
法。
10. A method for manufacturing a printed wiring board, which comprises performing an alkaline solution treatment and an alkaline etching solution treatment after the surface treatment of the metal according to claim 1.
JP7121194A 1994-03-04 1994-03-04 Electrolytic treatment of metal surface Pending JPH07243091A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7121194A JPH07243091A (en) 1994-03-04 1994-03-04 Electrolytic treatment of metal surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7121194A JPH07243091A (en) 1994-03-04 1994-03-04 Electrolytic treatment of metal surface

Publications (1)

Publication Number Publication Date
JPH07243091A true JPH07243091A (en) 1995-09-19

Family

ID=13454128

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7121194A Pending JPH07243091A (en) 1994-03-04 1994-03-04 Electrolytic treatment of metal surface

Country Status (1)

Country Link
JP (1) JPH07243091A (en)

Similar Documents

Publication Publication Date Title
JP4063475B2 (en) Copper or copper alloy etchant
JP3314966B2 (en) Complexing agent for displacement tin plating
US6395329B2 (en) Printed circuit board manufacture
EP0791671B1 (en) Surface treating agent for copper or copper alloy
JP5036216B2 (en) Metal surface treatment agent and use thereof
KR100668129B1 (en) Preflux composition
JP4694251B2 (en) Copper or copper alloy surface treatment agent for lead-free soldering and use thereof
EP1886759A1 (en) Water-soluble preflux and use thereof
JP4647073B2 (en) Method of soldering copper and copper alloy
TW583349B (en) Method for enhancing the solderability of a surface
JP2005068530A (en) Surface-treating agent, printed circuit board, and method for surface-treating metal on printed circuit board
JP4181888B2 (en) Anticorrosive treatment for silver and silver alloys
JPH07243068A (en) Electrolytic treatment of metal surface
JP3668767B2 (en) Surface treatment method for metals such as solder, electroless solder, silver, nickel and zinc
JPH11177218A (en) Component equipped with metal surface for electronic circuit, and surface protecting agent therefor
TWI464299B (en) Surface treating agent for copper or copper alloy and use thereof
JPH07243091A (en) Electrolytic treatment of metal surface
JPH07330738A (en) Protecting agent for metal surface and production using the same
JPH07243069A (en) Electrolytic treatment of metal surface
JPH06299375A (en) Treatment of metallic surface such as solder, electroless solder, ag, ni, zn, cu and cu alloy
JPH06268356A (en) Method for using preflux and manufacture of printed wiring board
JPH04173983A (en) Surface treatment of copper and copper alloy
TWI448581B (en) Surface treating agent for copper or copper alloy and use thereof
JPH07118880A (en) Metal surface protective agent and treatment using the same
JPH0779061A (en) Surface treatment agent for copper and copper alloy