JPH07232961A - Preparation of oxide thin film - Google Patents

Preparation of oxide thin film

Info

Publication number
JPH07232961A
JPH07232961A JP6308433A JP30843394A JPH07232961A JP H07232961 A JPH07232961 A JP H07232961A JP 6308433 A JP6308433 A JP 6308433A JP 30843394 A JP30843394 A JP 30843394A JP H07232961 A JPH07232961 A JP H07232961A
Authority
JP
Japan
Prior art keywords
thin film
formula
hydrocarbon group
solution
represented
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP6308433A
Other languages
Japanese (ja)
Other versions
JP2964893B2 (en
Inventor
Hiroaki Moriyama
弘朗 森山
Keiichi Nashimoto
恵一 梨本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208Oxides, e.g. ceramics
    • C23C18/1216Metal oxides

Abstract

PURPOSE:To stably prepare a uniform oxide ferroelectric thin film or oxide dielectric thin film useful for a thin film capacitor, a piezoelectric body, and a pyroelectric body, etc., and excellent in stoichiometry. CONSTITUTION:In this preparing method of an oxide thin film expressed by the formula (BaxSr1-x)TiO3 (0<=x<=1), each of metallic alkoxide compds. expressed by the formula Ba(OR<3>)2, Ti(OR<4>)4 and Sr(OR<5>)2 (in the formula, R<3>, R<4> and R<5> are respectively an aliphat. hydrocarbon groups) is added and mixed simultaneously or in a arbitrary order to and with a solvent expressed by the formula R<1>OR<2>OH (in the formula, R<1> is the aliphat. hydrocarbon group, R<2> is a divalent aliphat. hydrocarbon group which may have an ether bond), and the result is subjected to heating reaction, and the obtained soln. of mixture is applied on a substrate to form the thin film, then heat treated. When R<1> is methyl group, the metallic alkoxide compd. of the formula Ba(OR<3>)2 is added, allowed to react, then other metallic alkoxide compd. is added.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、薄膜キャパシター、圧
電体、焦電体等に利用可能な酸化物強誘電体薄膜または
酸化物常誘電体薄膜の作製方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an oxide ferroelectric thin film or an oxide paraelectric thin film which can be used for a thin film capacitor, a piezoelectric body, a pyroelectric body and the like.

【0002】[0002]

【従来の技術】強誘電体薄膜は、強誘電体のもつ強誘電
性、圧電性、焦電性、電気光学効果などの多くの性質に
よりエレクトロニクスの多くの分野で用いられ、また近
年ではDRAMのメモリセルへの適用が集積化の急速な
展開とともに注目を集めている。この中でもチタン酸バ
リウム・ストロンチウムは、チタン酸ストロンチウムよ
り比誘電率が高く、またバリウムとストロンチウムの組
成比によりキュリー温度を変化させることが可能であ
り、デバイスの使用温度で常誘電体として使用できるの
で特に有望な材料である。従来、酸化物薄膜の製造方法
としては、スパッタリング法や真空蒸着法などのドライ
プロセスによる成膜や、ゾルゲル法などのウエットプロ
セスによる成膜等の方法が採用されている。
2. Description of the Related Art Ferroelectric thin films are used in many fields of electronics due to many properties of ferroelectrics such as ferroelectricity, piezoelectricity, pyroelectricity and electro-optic effect, and in recent years, they have been used in DRAMs. The application to memory cells is drawing attention with the rapid development of integration. Among these, barium strontium titanate has a higher relative permittivity than strontium titanate, and it is possible to change the Curie temperature by the composition ratio of barium and strontium, so that it can be used as a paraelectric at the operating temperature of the device. It is a particularly promising material. Conventionally, as a method for manufacturing an oxide thin film, a method such as film formation by a dry process such as a sputtering method or a vacuum evaporation method, or film formation by a wet process such as a sol-gel method has been adopted.

【0003】しかしながら、ドライプロセスによる成膜
の場合、使用する装置は非常に高価な上、元素ごとに蒸
気圧が異なるため、化学的量論性に優れた薄膜を安定し
て製造することができない、結晶性が悪くなってしま
う、生産性が低くコストが高いという欠点があり、実用
化には程遠い状態にある。一方、ウエットプロセスによ
り成膜する場合、例えば、有機金属化合物を用いたゾル
ゲル法は、精密な化学組成制御、分子レベルの均一性、
プロセスの低温化、大面積化、低設備コストなどの面で
利点がある。しかしながら、従来のゾルゲル法では溶媒
として主にメタノールや、エタノールなどの低級アルコ
ールを用いるために、有機金属化合物の溶液が極めて不
安定であり、大気中の水分を吸収して容易に加水分解さ
れるために、均質な薄膜を作製することが困難であっ
た。さらに、これらの低級アルコールが蒸気圧が高いた
めに、スピン・コートなどにおいては塗布後の膜の乾燥
が速く、均一な膜厚の薄膜を作製することが困難であっ
た。また近年、例えばJ.Am.Ceram.So
c.,71,(5),C−280(1988)等には、
チタン酸鉛などの強誘電体薄膜の作製においてエチレン
グリコールモノメチルエーテルを用いることが示されて
いるが、これを一般式(Bax Sr1-x )TiO3 (0
≦x≦1)で表される酸化物薄膜の合成のための溶媒と
して用いた場合、Baの有機金属化合物とTiの有機金
属化合物が選択的に反応し、沈殿が生ずるという問題が
あった。更に、Advanced Ceramic M
aterials,3,(2),183(1988)等
には、バリウムアセテートを酢酸水溶液に溶解してチタ
ニウムイソプロポキシドと混合することが記載されてい
るが、この方法ではチタニウムイソプロポキシドと酢酸
が反応して析出物が生成しやすい。また、組成の精密な
制御と均一性を達成するためには、金属原子比を制御し
た複合アルコキシドを前駆体として合成する必要がある
が、水を原料に添加しているために前駆体の溶液が不安
定であり、前駆体の化学組成の制御が困難であった。
However, in the case of film formation by a dry process, the apparatus used is very expensive, and the vapor pressure is different for each element, so that a thin film excellent in stoichiometry cannot be stably manufactured. However, there are drawbacks such as poor crystallinity, low productivity and high cost, which are far from practical use. On the other hand, when a film is formed by a wet process, for example, the sol-gel method using an organometallic compound, precise chemical composition control, molecular level uniformity,
There are advantages in terms of low process temperature, large area, and low equipment cost. However, in the conventional sol-gel method, since a lower alcohol such as methanol or ethanol is mainly used as a solvent, the solution of the organometallic compound is extremely unstable and easily absorbs water in the atmosphere to be hydrolyzed. Therefore, it is difficult to form a uniform thin film. Further, since the vapor pressure of these lower alcohols is high, it is difficult to form a thin film having a uniform thickness because the film after coating is dried quickly in spin coating or the like. In recent years, for example, J. Am. Ceram. So
c. , 71, (5), C-280 (1988), etc.
It has been shown to use ethylene glycol monomethyl ether in the preparation of a ferroelectric thin film of lead titanate or the like, which is represented by the general formula (Ba x Sr 1-x ) TiO 3 (0
When used as a solvent for synthesizing an oxide thin film represented by ≦ x ≦ 1), there is a problem that an organometallic compound of Ba and an organometallic compound of Ti selectively react with each other to cause precipitation. In addition, Advanced Ceramic M
materials, 3, (2), 183 (1988) and the like describe that barium acetate is dissolved in an aqueous acetic acid solution and mixed with titanium isopropoxide, but in this method, titanium isopropoxide and acetic acid are mixed. A reaction product is likely to form a precipitate. In addition, in order to achieve precise control and uniformity of composition, it is necessary to synthesize a complex alkoxide with a controlled metal atom ratio as a precursor, but since water is added to the raw material, the precursor solution Was unstable and it was difficult to control the chemical composition of the precursor.

【0004】[0004]

【発明が解決しようとする課題】本発明は、以上のよう
な実情に鑑みてなされたものである。すなわち、本発明
の目的は、有機金属化合物を用いて基板上に薄膜キャパ
シター、圧電体、焦電体等に利用可能な、均一で化学的
量論性に優れた酸化物強誘電体薄膜または酸化物常誘電
体薄膜を安定して作製する方法を提供することにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances. That is, an object of the present invention is to use an organometallic compound on a substrate to form a thin film capacitor, a piezoelectric body, a pyroelectric body, or the like, which is a uniform and highly stoichiometric oxide ferroelectric thin film or oxide. It is to provide a method for stably producing a paraelectric thin film.

【0005】[0005]

【課題を解決するための手段】本発明者等は、検討の結
果、一般式(Bax Sr1-x )TiO3 (0≦x≦1)
で表される酸化物薄膜の作製方法において、Ba、S
r、Ti成分を各々含む有機金属化合物を特定の溶媒に
溶解するか、またはそれらを特定の順序で特定の溶媒に
溶解し、得られた混合溶液を基板上に塗布して薄膜を形
成し、次いで熱分解に続いて結晶化させることにより、
均一で化学量論性に優れた酸化物薄膜を作製できること
を見いだした。
DISCLOSURE OF THE INVENTION As a result of investigations, the present inventors have found that the general formula (Ba x Sr 1-x ) TiO 3 (0 ≦ x ≦ 1)
In the method for producing an oxide thin film represented by
r, an organometallic compound each containing a Ti component are dissolved in a specific solvent, or they are dissolved in a specific solvent in a specific order, the resulting mixed solution is applied on a substrate to form a thin film, Then by pyrolysis followed by crystallization,
It was found that an oxide thin film having a uniform and excellent stoichiometry can be prepared.

【0006】本発明の第1のものは、一般式(Bax
1-x )TiO3 (0<x≦1)で表される酸化物薄膜
の作製方法に関するものであって、下記一般式(I-A)
で示される溶媒に、 R1 ′OR2 OH (I-A) (式中、R1 ′は炭素数2以上の脂肪族炭化水素基を表
し、R2 はエーテル結合を有していてもよい2価の脂肪
族炭化水素基を表す。)下記一般式(II)および(III
)で示される2種の金属アルコキシド化合物または一
般式(II)ないし(IV)で示される3種の金属アルコキ
シド化合物を、 Ba(OR3 2 (II) Ti(OR4 4 (III ) Sr(OR5 2 (IV) (式中、R3 、R4 およびR5 は、それぞれ脂肪族炭化
水素基を表す。)同時または任意の順序で添加して混合
した後、加熱反応させ、得られた混合溶液を基板上に塗
布して薄膜を形成し、次いで熱処理することを特徴とす
る.
The first aspect of the present invention is the general formula (Ba x S
r 1-x ) TiO 3 (0 <x ≦ 1), which relates to a method for producing an oxide thin film represented by the following general formula (IA)
R 1 ′ OR 2 OH (IA) (wherein R 1 ′ represents an aliphatic hydrocarbon group having 2 or more carbon atoms, and R 2 may have an ether bond). Represents a divalent aliphatic hydrocarbon group.) The following general formulas (II) and (III
) Or two metal alkoxide compounds represented by the general formulas (II) to (IV) as Ba (OR 3 ) 2 (II) Ti (OR 4 ) 4 (III) Sr. (OR 5 ) 2 (IV) (In the formula, each of R 3 , R 4 and R 5 represents an aliphatic hydrocarbon group.) Either simultaneously or in any order, added and mixed, and then reacted by heating to obtain The method is characterized in that the obtained mixed solution is applied onto a substrate to form a thin film, and then heat treatment is performed.

【0007】本発明の第2のものは、一般式(Bax
1-x )TiO3 (0<x<1)で表される酸化物薄膜
の作製方法に関するものであって、下記一般式(I-B)
で示される溶媒に、 CH3 OR2 ′OH (I-B) (式中、R2 ′は2価の脂肪族炭化水素基を表す。)下
記一般式(II)で示されるバリウムアルコキシド化合物
を溶解して加熱反応させ、 Ba(OR3 2 (II) (式中、R3 は脂肪族炭化水素基を表す。)次いで、下
記一般式(III )および(IV)で示される2種の金属ア
ルコキシド化合物を添加して反応させ、 Ti(OR4 4 (III ) Sr(OR5 2 (IV) (式中、R4 およびR5 は、それぞれ脂肪族炭化水素基
を表す。)得られた混合溶液を基板上に塗布して薄膜を
形成し、次いで熱処理することを特徴とする。
The second aspect of the present invention is the general formula (Ba x S
r 1-x ) TiO 3 (0 <x <1), which relates to a method for producing an oxide thin film represented by the following general formula (IB)
CH 3 OR 2 ′ OH (IB) (wherein R 2 ′ represents a divalent aliphatic hydrocarbon group) in a solvent represented by a barium alkoxide compound represented by the following general formula (II): After dissolution and heating reaction, Ba (OR 3 ) 2 (II) (In the formula, R 3 represents an aliphatic hydrocarbon group.) Then, two kinds of compounds represented by the following general formulas (III) and (IV) are represented. A metal alkoxide compound is added and reacted to obtain Ti (OR 4 ) 4 (III) Sr (OR 5 ) 2 (IV) (in the formula, R 4 and R 5 each represent an aliphatic hydrocarbon group). It is characterized in that the obtained mixed solution is applied onto a substrate to form a thin film, and then heat treatment is performed.

【0008】本発明の第3のものは、SrTiO3 で示
される酸化物薄膜の作製方法に関するものであって、下
記一般式(I) R1 OR2 OH (I) (式中、R1 は脂肪族炭化水素基を表し、R2 はエーテ
ル結合を有していてもよい2価の脂肪族炭化水素基を表
す。) 下記一般式(III )および(IV)で示される2種の金属
アルコキシド化合物を同時または任意の順序で添加して
混合した後、加熱反応させ、 Ti(OR4 4 (III ) Sr(OR5 2 (IV) (式中、R4 およびR5 は、それぞれ脂肪族炭化水素基
を表す。)得られた混合溶液を基板上に塗布して薄膜を
形成し、次いで熱処理することを特徴とする。
A third aspect of the present invention relates to a method for producing an oxide thin film represented by SrTiO 3 , which comprises the following general formula (I) R 1 OR 2 OH (I) (wherein R 1 is Represents an aliphatic hydrocarbon group, and R 2 represents a divalent aliphatic hydrocarbon group which may have an ether bond.) Two metal alkoxides represented by the following general formulas (III) and (IV) The compounds are added simultaneously or in any order and mixed, and then reacted by heating to produce Ti (OR 4 ) 4 (III) Sr (OR 5 ) 2 (IV) (wherein R 4 and R 5 are each a fat It represents a group hydrocarbon group.) The obtained mixed solution is applied onto a substrate to form a thin film, and then heat treated.

【0009】以下本発明を詳細に説明する。本発明にお
いて、使用される金属アルコキシド化合物は、下記一般
式(II)、(III )および(IV)で示されるものから選
択される。 Ba(OR3 2 (II) Ti(OR4 4 (III ) Sr(OR5 2 (IV) (式中、R3 、R4 およびR5 は、それぞれ脂肪族炭化
水素基を表す。) 上記一般式(II)、(III )および(IV)における
3 、R4 およびR5 としては、炭素数1〜4のアルキ
ル基が好ましく、具体的な金属アルコキシド化合物とし
ては、バリウムジメトキシド、バリウムジエトキシド、
バリウムジプロポキシド、バリウムジブトキシド、スト
ロンチウムジメトキシド、ストロンチウムジエトキシ
ド、ストロンチウムジプロポキシド、ストロンチウムジ
ブトキシド、チタニウムテトラメトキシド、チタニウム
テトラエトキシド、チタニウムテトラプロポキシド、チ
タニウムテトラブトキシド等が例示できる。しかしなが
ら、本発明においてはこれらに限定されるものではな
い。
The present invention will be described in detail below. In the present invention, the metal alkoxide compound used is selected from those represented by the following general formulas (II), (III) and (IV). Ba (OR 3 ) 2 (II) Ti (OR 4 ) 4 (III) Sr (OR 5 ) 2 (IV) (In the formula, R 3 , R 4 and R 5 each represent an aliphatic hydrocarbon group. ) As R 3 , R 4 and R 5 in the general formulas (II), (III) and (IV), an alkyl group having 1 to 4 carbon atoms is preferable, and specific metal alkoxide compounds include barium dimethoxide. , Barium diethoxide,
Examples include barium dipropoxide, barium dibutoxide, strontium dimethoxide, strontium diethoxide, strontium dipropoxide, strontium dibutoxide, titanium tetramethoxide, titanium tetraethoxide, titanium tetrapropoxide, titanium tetrabutoxide and the like. However, the present invention is not limited to these.

【0010】本発明において使用される溶媒は、下記一
般式(I)で示されるものである。 R1 OR2 OH (I) (式中、R1 は脂肪族炭化水素基を表し、R2 は、エー
テル結合を有してもよい二価の脂肪族炭化水素基を表
す。) R1 の脂肪族炭化水素基としては、炭素数1〜4のアル
キル基が好ましく、R2 は、エーテル結合を有してもよ
い二価の脂肪族炭化水素基としては、炭素数2〜4のア
ルキレン基、炭素数2〜4のアルキレン基が、エーテル
結合によって結合している全炭素数4〜8の二価の基が
好ましい。具体的には、例えば、エチレングリコールモ
ノメチルエーテル、エチレングリコールモノエチルエー
テル、エチレングリコールモノプロピルエーテル、エチ
レングリコールモノブチルエーテル等のエチレングリコ
ールのモノアルキルエーテル類、ジエチレングリコール
モノメチルエーテル、ジエチレングリコールモノエチル
エーテル、ジエチレングリコールモノプロピルエーテル
等のジエチレングリコールのモノアルキルエーテル類、
1,2−プロピレングリコールモノメチルエーテルなど
の1,2−プロピレングリコールモノアルキルエーテル
類、1,3−プロピレングリコールモノメチルエーテ
ル、1,3−プロピレングリコールモノエチルエーテ
ル、1,3−プロピレングリコールモノプロピルエーテ
ル等の1,3−プロピレングリコールのモノアルキルエ
ーテル類等があげられるが、これらに限定されるもので
はない。またこれらは単独でまたは2種以上併用して使
用してもよい。この中で、上記一般式(I-B)で示され
る溶媒としては、エチレングリコールモノメチルエーテ
ル、1,3−プロピレングリコールモノメチルエーテル
等があげられる。
The solvent used in the present invention is represented by the following general formula (I). R 1 OR 2 OH (I) (In the formula, R 1 represents an aliphatic hydrocarbon group, and R 2 represents a divalent aliphatic hydrocarbon group which may have an ether bond.) Of R 1 As the aliphatic hydrocarbon group, an alkyl group having 1 to 4 carbon atoms is preferable, and as R 2 , a divalent aliphatic hydrocarbon group which may have an ether bond is an alkylene group having 2 to 4 carbon atoms. , A divalent group having a total of 4 to 8 carbon atoms in which an alkylene group having 2 to 4 carbon atoms is bonded by an ether bond is preferable. Specifically, for example, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, ethylene glycol monobutyl ether and other ethylene glycol monoalkyl ethers, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monopropyl ether. Diethylene glycol monoalkyl ethers such as ethers,
1,2-propylene glycol monoalkyl ethers such as 1,2-propylene glycol monomethyl ether, 1,3-propylene glycol monomethyl ether, 1,3-propylene glycol monoethyl ether, 1,3-propylene glycol monopropyl ether, etc. 1,3-Propylene glycol monoalkyl ethers and the like, but are not limited thereto. These may be used alone or in combination of two or more. Among these, examples of the solvent represented by the general formula (IB) include ethylene glycol monomethyl ether and 1,3-propylene glycol monomethyl ether.

【0011】本発明において、上記一般式(II)、(II
I )および(IV)で示される金属アルコキシド化合物
は、上記一般式(I)で示される溶媒に、同時に、或い
は任意の順序で添加、溶解し、加熱して反応させる。こ
の場合、溶媒として、一般式(I)におけるR1 がメチ
ル基を示す場合、すなわち上記一般式(I-B)で示され
る溶媒を用いる場合には、上記金属アルコキシドの添加
順序に注意を払わなければならない。すなわち、まず一
般式(II)で示されるバリウムアルコキシド化合物を添
加して溶解し、加熱反応させておく。それによりBaの
配位子が溶媒と置換される。次いで、この溶液に上記一
般式(III )で示されるTiを含む金属アルコキシド化
合物と一般式(IV)で示されるSrを含む金属アルコキ
シド化合物を加える。この様な添加順序にしない場合に
は、溶液に沈殿が生じ、均質な混合溶液を得ることがで
きなくなる。BaTiO3 で示される酸化物薄膜の作製
の場合には、上記一般式(II)および(III )で示され
る2種の金属アルコキシド化合物を用い、SrTiO3
で示される酸化物薄膜の作製の場合には、上記一般式
(III )および(IV)で示される2種の金属アルコキシ
ド化合物を用いればよい。上記のようにして得られた混
合溶液は、さらに蒸留や還流によって処理し、前駆体で
ある複合アルコキシドを形成させておくことが有効であ
る。
In the present invention, the above general formulas (II) and (II
The metal alkoxide compounds represented by I) and (IV) are added to and dissolved in the solvent represented by the general formula (I) at the same time or in any order, and heated to react. In this case, when R 1 in the general formula (I) represents a methyl group as the solvent, that is, when the solvent represented by the general formula (IB) is used, pay attention to the addition order of the metal alkoxide. There must be. That is, first, the barium alkoxide compound represented by the general formula (II) is added and dissolved, and the mixture is heated and reacted. As a result, the Ba ligand is replaced with the solvent. Then, the metal alkoxide compound containing Ti represented by the general formula (III) and the metal alkoxide compound containing Sr represented by the general formula (IV) are added to this solution. If the addition order is not as described above, precipitation occurs in the solution and it becomes impossible to obtain a homogeneous mixed solution. In the case of producing an oxide thin film represented by BaTiO 3 , SrTiO 3 is prepared by using two kinds of metal alkoxide compounds represented by the general formulas (II) and (III).
In the case of producing the oxide thin film represented by, the two kinds of metal alkoxide compounds represented by the general formulas (III) and (IV) may be used. It is effective that the mixed solution obtained as described above is further treated by distillation or reflux to form a composite alkoxide as a precursor.

【0012】上記のように金属アルコキシド化合物を反
応させることにより得られた混合溶液を基板上に塗布し
て薄膜を形成し、次いで熱処理する。この場合、上記混
合溶液は加水分解をした後に、基板上に塗布することも
可能である。基板としては、目的とする素子に適用でき
るものであれば、如何なるものでも使用でき、例えば、
ITO/SiO2 ガラス、Pt/Ti/SiO2 /Si
等が使用できる。この溶液を基板上に塗布する方法とし
ては、スピンコート法、ディッピング法、スプレー法、
スクリーン印刷法、インクジェット法などを用いること
ができる。
The mixed solution obtained by reacting the metal alkoxide compound as described above is coated on a substrate to form a thin film, and then heat treated. In this case, the mixed solution may be hydrolyzed and then applied on the substrate. As the substrate, any substrate can be used as long as it can be applied to the intended element, for example,
ITO / SiO 2 glass, Pt / Ti / SiO 2 / Si
Etc. can be used. As a method of applying this solution onto a substrate, a spin coating method, a dipping method, a spray method,
A screen printing method, an inkjet method, or the like can be used.

【0013】塗布された基板は、加熱処理される。すな
わち、0.1〜500℃/秒の昇温速度で基板を加熱
し、100℃〜500℃の結晶化の起こらない温度範囲
で塗布層を熱分解し、次いで0.1〜500℃/秒の昇
温速度で基板を加熱し、300℃〜1200℃の温度範
囲で酸化物薄膜を結晶化させる。塗布を繰り返す場合に
は、塗布した後に、0.1〜500℃/秒の昇温速度で
基板を加熱し、100℃〜500℃の結晶化の起こらな
い温度範囲で塗布層を熱分解する。この塗布と熱分解を
所定の回数繰り返した後、300℃〜1200℃の温度
範囲で酸化物薄膜を結晶化させる。この加熱処理により
酸化物薄膜が形成される。
The coated substrate is heat-treated. That is, the substrate is heated at a heating rate of 0.1 to 500 ° C./sec, the coating layer is thermally decomposed in a temperature range of 100 ° C. to 500 ° C. where crystallization does not occur, and then 0.1 to 500 ° C./sec. The substrate is heated at a heating rate of 1 to crystallize the oxide thin film in the temperature range of 300 ° C to 1200 ° C. When the coating is repeated, the substrate is heated at a heating rate of 0.1 to 500 ° C./second after the coating, and the coating layer is thermally decomposed in a temperature range of 100 ° C. to 500 ° C. where crystallization does not occur. After repeating this coating and thermal decomposition a predetermined number of times, the oxide thin film is crystallized in the temperature range of 300 ° C to 1200 ° C. An oxide thin film is formed by this heat treatment.

【0014】なお、成膜時の熱処理温度が500〜12
00℃の範囲である場合には、上記のようにして得られ
た混合溶液は、水または触媒を添加していない状態(す
なわち、加水分解していない状態)で基板に塗布し、熱
処理するのが好ましい。なぜならば、加水分解していな
い状態で使用する方が、電気特性、特にリーク電流特性
の点でより好ましいからである。
The heat treatment temperature during film formation is 500 to 12
When the temperature is in the range of 00 ° C., the mixed solution obtained as described above is applied to the substrate in a state where water or a catalyst is not added (that is, in a state where it is not hydrolyzed) and heat treatment is performed. Is preferred. This is because it is more preferable to use it in a non-hydrolyzed state in terms of electrical characteristics, especially leakage current characteristics.

【0015】[0015]

【実施例】以下、本発明を実施例により具体的に説明す
るが、本発明はこれら実施例によって何ら制限されるも
のではない。 実施例1 Ba(OC2 5 2 をモレキュラー・シーブで脱水し
たエチレングリコールモノメチルエーテルに溶解して
0.6M濃度の溶液を得た。この溶液を、攪拌しつつ1
25℃で2時間蒸留し、さらに22時間還流を行い、B
a(OC2 4 OCH3 2 を得た。この溶液にBaと
SrとTiのモル比が0.5:0.5:1となるように
Sr(OC2 5 2 とTi(O−i-C3 7 4 を加
えて0.6M濃度の溶液とした。次にこの溶液を、攪拌
しつつ125℃で2時間蒸留し、さらに22時間の還流
を行い、複合アルコキシド:(Ba0.5 Sr0.5 )Ti
(OC2 4 OCH3 6 を得た。このアルコール置換
反応は、 1H NMRスペクトルによって確認した。こ
の溶液は析出物がなく、均一で薄茶色の透明な液体であ
った。この溶液をITO/SiO2 ガラス基板上にスピ
ンコートし、続いて10℃/秒の速度にて加熱し、30
0℃で2分間および700℃で1時間保持した。得られ
たペロブスカイト単相よりなる(Ba0.5 Sr0.5 )T
iO3 薄膜の表面は、光学的に平滑で且つ透明であっ
た。
EXAMPLES The present invention will be specifically described below with reference to examples, but the present invention is not limited to these examples. Example 1 Ba (OC 2 H 5 ) 2 was dissolved in ethylene glycol monomethyl ether dehydrated with molecular sieves to obtain a 0.6 M concentration solution. 1 with stirring this solution
Distill at 25 ° C for 2 hours, reflux for another 22 hours,
a (OC 2 H 4 OCH 3 ) 2 was obtained. To this solution, Sr (OC 2 H 5 ) 2 and Ti (Oi-C 3 H 7 ) 4 were added so that the molar ratio of Ba, Sr, and Ti was 0.5: 0.5: 1. A solution having a concentration of 0.6M was prepared. Next, this solution was distilled at 125 ° C. for 2 hours while stirring, and refluxed for another 22 hours to obtain a complex alkoxide: (Ba 0.5 Sr 0.5 ) Ti.
(OC 2 H 4 OCH 3 ) 6 was obtained. This alcohol substitution reaction was confirmed by 1 H NMR spectrum. This solution was a uniform, light brown, transparent liquid without any precipitate. This solution was spin-coated on an ITO / SiO 2 glass substrate and subsequently heated at a rate of 10 ° C./sec for 30
Hold at 0 ° C. for 2 minutes and 700 ° C. for 1 hour. (Ba 0.5 Sr 0.5 ) T composed of the obtained perovskite single phase
The surface of the iO 3 thin film was optically smooth and transparent.

【0016】比較例1 Ba(OC2 5 2 とSr(OC2 5 2 とTi
(O−i-C3 7 4 をBaとSrとTiのモル比が
0.5:0.5:1となるように、モレキュラー・シー
ブで脱水したエチレングリコールモノメチルエーテル
に、同時に溶解して0.6M濃度の溶液とし、攪拌しつ
つ125℃で2時間蒸留し、さらに22時間の還流を行
った。この溶液は室温でしばらく静置すると析出物が生
成し、均一な溶液にはならなかった。分析の結果、析出
物にはBaとTiが多く検出され、また溶液中には仕込
みの組成比よりもSrが多く検出された。この分析結果
から、この比較例の方法によっては化学量論性に優れた
前駆体を合成することができないことがわかった。
Comparative Example 1 Ba (OC 2 H 5 ) 2 , Sr (OC 2 H 5 ) 2 and Ti
(O-i-C 3 H 7) 4 and Ba and Sr and the molar ratio of Ti is 0.5: 0.5: to be 1, ethylene glycol monomethyl ether which had been dehydrated by molecular sieve, and dissolved at the same time To give a solution having a concentration of 0.6 M, which was then distilled with stirring at 125 ° C. for 2 hours and further refluxed for 22 hours. When this solution was allowed to stand at room temperature for a while, a precipitate was formed and a uniform solution was not obtained. As a result of the analysis, a large amount of Ba and Ti was detected in the precipitate, and a large amount of Sr was detected in the solution rather than the composition ratio of the charge. From this analysis result, it was found that the precursor of excellent stoichiometry could not be synthesized by the method of this comparative example.

【0017】実施例2 Ti(O−i-C3 7 4 をモレキュラー・シーブで脱
水したエチレングリコールモノエチルエーテルに溶解し
て0.6M濃度の溶液とし、この溶液を、攪拌しつつ1
35℃で2時間蒸留した。この溶液にBaとSrとTi
のモル比が0.6:0.4:1となるようにBa(O−
i-C3 7 2 とSr(OC2 5 2を加えて0.6
Mの溶液を得た。次にこの溶液を、攪拌しつつ135℃
で2時間蒸留し、さらに22時間の還流を行い、複合ア
ルコキシド:(Ba0.6 Sr0.4)Ti(OC2 4
2 5 6 を得た。このアルコール置換反応は 1
NMRスペクトルによって確認した。この溶液は析出物
がなく均一で薄茶色の透明な液体であった。この溶液を
ITO/SiO2 ガラス基板上にスピンコートし、続い
て10℃/秒の速度にて加熱し、300℃で2分間およ
び700℃で1時間保持した。得られた膜厚0.1μm
の(Ba0.6 Sr0.4 )TiO3 薄膜は、ペロブスカイ
ト単相よりなり、その表面は光学的に平滑で且つ透明で
あった。
[0017] with a solution of 0.6M concentration by dissolving Example 2 Ti (O-i-C 3 H 7) 4 ethylene glycol monoethyl ether which had been dehydrated by molecular sieve, the solution, with stirring 1
Distilled at 35 ° C. for 2 hours. Ba, Sr and Ti in this solution
So that the molar ratio of Ba (O−) becomes 0.6: 0.4: 1.
i-C 3 H 7 ) 2 and Sr (OC 2 H 5 ) 2 are added to 0.6
A solution of M was obtained. This solution is then stirred at 135 ° C.
The mixture was distilled for 2 hours, and refluxed for another 22 hours to obtain a complex alkoxide: (Ba 0.6 Sr 0.4 ) Ti (OC 2 H 4 O
C 2 H 5 ) 6 was obtained. This alcohol substitution reaction is 1 H
Confirmed by NMR spectrum. This solution was a transparent liquid that was uniform and light brown with no precipitate. This solution was spin-coated on an ITO / SiO 2 glass substrate, subsequently heated at a rate of 10 ° C./sec, and held at 300 ° C. for 2 minutes and 700 ° C. for 1 hour. Obtained film thickness 0.1 μm
The (Ba 0.6 Sr 0.4 ) TiO 3 thin film was composed of a perovskite single phase, and its surface was optically smooth and transparent.

【0018】比較例2 Ba(OC2 5 2 とSr(OC2 5 2 とTi
(O−i-C3 7 4 を、BaとSrとTiのモル比が
0.6:0.4:1となるように、モレキュラー・シー
ブで脱水したエチレングリコールモノメチルエーテルに
同時に溶解して、0.6M濃度の溶液とし、攪拌しつつ
125℃で2時間蒸留し、さらに22時間の還流を行っ
た。この溶液は室温でしばらく静置しておくと金属色の
析出物が生成してしまい、均一な溶液にはならなかっ
た。分析の結果、析出物にはBaとTiが多く検出さ
れ、また溶液中には仕込みの組成比よりもSrが多く検
出された。この分析結果から、この比較例の方法によっ
ては、化学量論性に優れた前駆体を合成することができ
ないことが分った。
Comparative Example 2 Ba (OC 2 H 5 ) 2 , Sr (OC 2 H 5 ) 2 and Ti
The (O-i-C 3 H 7) 4, the molar ratio of Ba and Sr and Ti 0.6: 0.4: to be 1, was dissolved at the same time ethylene glycol monomethyl ether which had been dehydrated by molecular sieve As a result, a solution having a concentration of 0.6 M was prepared, distilled with stirring at 125 ° C. for 2 hours, and further refluxed for 22 hours. When this solution was allowed to stand at room temperature for a while, a metal-colored precipitate was formed, and a uniform solution was not obtained. As a result of the analysis, a large amount of Ba and Ti was detected in the precipitate, and a large amount of Sr was detected in the solution rather than the composition ratio of the charge. From this analysis result, it was found that the precursor of excellent stoichiometry could not be synthesized by the method of this comparative example.

【0019】実施例3 Ti(O−i-C3 7 4 をモレキュラー・シーブで脱
水したエチレングリコールモノエチルエーテルに溶解し
0.6M濃度の溶液とした。この溶液を、攪拌しつつ1
35℃で2時間蒸留した。この溶液にBaとTiのモル
比が1:1となるようにBa(O−i-C3 7 2 を加
え、0.6M濃度の溶液を得た。次にこの溶液を、攪拌
しつつ135℃で2時間蒸留し、さらに18時間の還流
を行い複合アルコキシド:BaTi(OC2 4 OC2
5 6 を得た。このアルコール置換反応は 1H NM
Rスペクトルによって確認した。この溶液は析出物がな
く均一で薄茶色の透明な液体であった。さらに、この溶
液にBaとのモル比が1:1となるように水を加えて均
一な部分加水分解溶液を得た。この溶液をPt/Ti/
SiO2 /Si基板上にスピンコートし、続いて10℃
/秒の速度にて加熱し、350℃で2分間および700
℃で30分間保持した。得られた膜厚0.1μmの強誘
電体薄膜BaTiO3 はペロブスカイト単相よりなり、
その表面は光学的に平滑で且つ透明であった。
[0019] and Example 3 Ti (O-i-C 3 H 7) 4 was dissolved in ethylene glycol monoethyl ether which had been dehydrated by molecular sieve of 0.6M concentrated solutions. 1 with stirring this solution
Distilled at 35 ° C. for 2 hours. The molar ratio of Ba and Ti in the solution is 1: 1 so as to Ba (O-i-C 3 H 7) 2 was added to obtain a solution of 0.6M concentration. Next, this solution was distilled at 135 ° C. for 2 hours with stirring, and further refluxed for 18 hours to perform complex alkoxide: BaTi (OC 2 H 4 OC 2
H 5 ) 6 was obtained. This alcohol substitution reaction is 1 H NM
Confirmed by R spectrum. This solution was a transparent liquid that was uniform and light brown with no precipitate. Further, water was added to this solution so that the molar ratio with Ba was 1: 1 to obtain a uniform partial hydrolysis solution. This solution is Pt / Ti /
Spin coating on SiO 2 / Si substrate followed by 10 ° C
Heating at a speed of s / sec, 350 ° C. for 2 minutes and 700
Hold at 30 ° C for 30 minutes. The obtained ferroelectric thin film BaTiO 3 having a film thickness of 0.1 μm consists of a perovskite single phase,
The surface was optically smooth and transparent.

【0020】比較例3 Ba(OC2 5 2 とTi(O−i-C3 7 4 をB
aとTiのモル比が1:1となるように、モレキュラー
・シーブで脱水したエチレングリコールモノメチルエー
テルに同時に溶解して、0.6M濃度の溶液とし、攪拌
しつつ125℃で2時間蒸留し、さらに22時間の還流
を行った。この溶液は室温でしばらく静置すると多量の
析出物が生成し、均一な溶液にはならなかった。
Comparative Example 3 Ba (OC 2 H 5 ) 2 and Ti (Oi-C 3 H 7 ) 4 were added to B
Simultaneously dissolve in ethylene glycol monomethyl ether dehydrated with molecular sieves so that the molar ratio of a to Ti is 1: 1 to obtain a solution of 0.6M concentration, and distill at 125 ° C. for 2 hours with stirring, Reflux for an additional 22 hours. When this solution was allowed to stand at room temperature for a while, a large amount of precipitate was formed, and a uniform solution was not obtained.

【0021】実施例4 Sr(OC2 5 2 とTi(O−i-C3 7 4 をS
rとTiのモル比が1:1となるように、モレキュラー
・シーブで脱水したエチレングリコールモノメチルエー
テルに同時に溶解して、0.5M濃度の溶液とし、攪拌
しつつ125℃で2時間蒸留し、さらに22時間の還流
を行い、複合アルコキシド:SrTi(OC2 4 OC
3 6 を得た。このアルコール置換反応は 1H NM
Rスペクトルによって確認した。この溶液は析出物がな
く均一で薄茶色の透明な液体であった。この溶液をSi
基板上にスピンコートし、続いて10℃/秒の速度にて
加熱し、300℃で2分間および700℃で1時間保持
した。得られた膜厚0.1μmのSrTiO3 薄膜はペ
ロブスカイト単相よりなり、その表面は光学的に平滑で
且つ透明であった。
Example 4 Sr (OC 2 H 5 ) 2 and Ti (Oi-C 3 H 7 ) 4 were added to S
Simultaneously dissolved in ethylene glycol monomethyl ether dehydrated with molecular sieves so that the molar ratio of r and Ti is 1: 1 to obtain a 0.5 M concentration solution, which is distilled for 2 hours at 125 ° C. with stirring, The mixture was refluxed for another 22 hours, and the composite alkoxide: SrTi (OC 2 H 4 OC
H 3 ) 6 was obtained. This alcohol substitution reaction is 1 H NM
Confirmed by R spectrum. This solution was a transparent liquid that was uniform and light brown with no precipitate. This solution is Si
The substrate was spin-coated, then heated at a rate of 10 ° C./sec and held at 300 ° C. for 2 minutes and 700 ° C. for 1 hour. The obtained SrTiO 3 thin film having a thickness of 0.1 μm consisted of a perovskite single phase, and its surface was optically smooth and transparent.

【0022】実施例5 実施例4において得られた複合アルコキシド:SrTi
(OC2 4 OCH36 を含む溶液を、ITO/ガラ
ス基板上にスピンコートし、続いて10℃/秒の速度に
て加熱し、300℃で2分間および600℃で30分間
保持した。さらにこの薄膜状にPtを付着し、リーク電
流を測定したところ、印加電圧2Vにおいて、およそ1
×10-6A/cm2 であった。
Example 5 Composite alkoxide obtained in Example 4: SrTi
A solution containing (OC 2 H 4 OCH 3 ) 6 was spin-coated on an ITO / glass substrate, subsequently heated at a rate of 10 ° C./sec, and held at 300 ° C. for 2 minutes and 600 ° C. for 30 minutes. . Furthermore, when Pt was attached to this thin film and the leak current was measured, it was about 1 at an applied voltage of 2V.
It was × 10 -6 A / cm 2 .

【0023】実施例6 上記実施例4において得られた複合アルコキシド:Sr
Ti(OC2 4 OCH3 6 を含む溶液に、Tiとの
モル比が1:1となるように水を加えて均一な部分加水
分解溶液を得た。この溶液をITO/ガラス基板上にス
ピンコートし、続いて10℃/秒の速度にて加熱し、3
00℃で2分間および600℃で30分間保持した。さ
らにこの薄膜上にPtを付着し、リーク電流を測定した
ところ、印加電圧2Vにおいて、およそ1×10-5A/
cm2 であった。
Example 6 Composite alkoxide obtained in Example 4 above: Sr
Water was added to a solution containing Ti (OC 2 H 4 OCH 3 ) 6 so that the molar ratio with Ti was 1: 1 to obtain a uniform partially hydrolyzed solution. This solution was spin-coated on an ITO / glass substrate and subsequently heated at a rate of 10 ° C./sec for 3 times.
Hold at 00 ° C for 2 minutes and 600 ° C for 30 minutes. Further, Pt was attached on this thin film, and the leak current was measured. At an applied voltage of 2 V, about 1 × 10 −5 A /
It was cm 2 .

【0024】実施例7 Sr(OC2 5 2 とTi(O−i-C3 7 4 をS
rとTiのモル比が1:1となるように、モレキュラー
・シーブで脱水したエチレングリコールモノエチルエー
テルに同時に溶解して、0.6M濃度の溶液とし、攪拌
しつつ135℃で2時間蒸留し、さらに22時間の還流
を行い、複合アルコキシド:SrTi(OC2 4 OC
2 5 6 を得た。このアルコール置換反応は 1H N
MRスペクトルによって確認した。この溶液は析出物が
なく均一で薄茶色の透明な液体であった。この溶液をI
TO/ガラス上にスピンコートし、続いて10℃/秒の
速度にて加熱し、300℃で2分間および600℃で3
0分保持した。さらに、得られた薄膜上にPtを付着
し、リーク電流を測定したところ、印加電圧2Vにおい
て、およそ5×10-7A/cm2 であった。
Example 7 Sr (OC 2 H 5 ) 2 and Ti (Oi-C 3 H 7 ) 4 were added to S
Simultaneously dissolve in ethylene glycol monoethyl ether dehydrated by molecular sieve so that the molar ratio of r and Ti is 1: 1 to obtain a solution of 0.6M concentration, and distill at 135 ° C for 2 hours with stirring. After refluxing for another 22 hours, the composite alkoxide: SrTi (OC 2 H 4 OC
2 H 5 ) 6 was obtained. This alcohol substitution reaction is 1 H N
Confirmed by MR spectrum. This solution was a transparent liquid that was uniform and light brown with no precipitate. This solution is I
Spin coating on TO / glass followed by heating at a rate of 10 ° C / sec for 2 minutes at 300 ° C and 3 at 600 ° C.
Hold for 0 minutes. Further, when Pt was attached to the obtained thin film and the leak current was measured, it was about 5 × 10 −7 A / cm 2 at an applied voltage of 2V.

【0025】実施例8 実施例7において得られた複合アルコキシド:SrTi
(OC2 4 OC2 5 6 を含む溶液に、Tiとのモ
ル比が1:1となるように水を加えて均一な部分加水分
解溶液を得た。この溶液をITO/ガラス基板上にスピ
ンコートし、続いて10℃/秒の速度にて加熱し、30
0℃で2分間および600℃で30分間保持した。さら
にこの薄膜上にPtを付着し、リーク電流を測定したと
ころ、印加電圧2Vにおいて、およそ5×10-6A/c
2 であった。
Example 8 Composite alkoxide obtained in Example 7: SrTi
Water was added to the solution containing (OC 2 H 4 OC 2 H 5 ) 6 so that the molar ratio with Ti was 1: 1 to obtain a uniform partially hydrolyzed solution. This solution was spin-coated on an ITO / glass substrate and subsequently heated at a rate of 10 ° C./sec to give 30
Hold at 0 ° C for 2 minutes and 600 ° C for 30 minutes. Further, Pt was attached to this thin film, and the leak current was measured. As a result, at an applied voltage of 2 V, about 5 × 10 −6 A / c
It was m 2 .

【0026】[0026]

【発明の効果】本発明は、上記のように上記一般式
(I)で示される溶媒に、Ba、Sr、Ti成分を含む
金属アルコキシド化合物を添加して作製された混合溶液
を用い、そして溶媒として上記一般式(I-B)で示され
るものを用いる場合には、上記金属アルコキシド化合物
を特定の順序で添加して作製された混合溶液を用いるか
ら、形成される一般式(Bax Sr1-x )TiO3 (0
≦x≦1)で表される酸化物薄膜は、均一で、化学量論
性に優れており、薄膜キャパシター、圧電体、焦電体等
に利用可能な酸化物薄膜として使用することができる。
INDUSTRIAL APPLICABILITY The present invention uses a mixed solution prepared by adding a metal alkoxide compound containing Ba, Sr, and Ti components to the solvent represented by the general formula (I) as described above, and using a solvent When the compound represented by the general formula (IB) is used as the compound, a mixed solution prepared by adding the metal alkoxide compounds in a specific order is used, and thus the compound represented by the general formula (Ba x Sr 1 -x ) TiO 3 (0
The oxide thin film represented by ≦ x ≦ 1) is uniform and excellent in stoichiometry, and can be used as an oxide thin film that can be used for a thin film capacitor, a piezoelectric body, a pyroelectric body and the like.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 H01L 21/314 A 7352−4M 21/316 S 7352−4M ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 6 Identification code Office reference number FI technical display location H01L 21/314 A 7352-4M 21/316 S 7352-4M

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 一般式(Bax Sr1-x )TiO3 (0
<x≦1)で表される酸化物薄膜の作製方法において、
下記一般式(I-A)で示される溶媒に、 R1 ′OR2 OH (I-A) (式中、R1 ′は炭素数2以上の脂肪族炭化水素基を表
し、R2 はエーテル結合を有していてもよい2価の脂肪
族炭化水素基を表す。)下記一般式(II)および(III
)で示される2種の金属アルコキシド化合物または一
般式(II)ないし(IV)で示される3種の金属アルコキ
シド化合物を、 Ba(OR3 2 (II) Ti(OR4 4 (III ) Sr(OR5 2 (IV) (式中、R3 、R4 およびR5 は、それぞれ脂肪族炭化
水素基を表す。)同時または任意の順序で添加して混合
した後、加熱反応させ、得られた混合溶液を基板上に塗
布して薄膜を形成し、次いで熱処理することを特徴とす
る酸化物薄膜の作製方法。
1. A general formula (Ba x Sr 1-x ) TiO 3 (0
In the method for producing an oxide thin film represented by <x ≦ 1),
R 1 ′ OR 2 OH (I-A) (in the formula, R 1 ′ represents an aliphatic hydrocarbon group having 2 or more carbon atoms, and R 2 is an ether). Represents a divalent aliphatic hydrocarbon group which may have a bond.) The following general formulas (II) and (III
) Or two metal alkoxide compounds represented by the general formulas (II) to (IV) as Ba (OR 3 ) 2 (II) Ti (OR 4 ) 4 (III) Sr. (OR 5 ) 2 (IV) (In the formula, each of R 3 , R 4 and R 5 represents an aliphatic hydrocarbon group.) Either simultaneously or in any order, added and mixed, and then reacted by heating to obtain A method for producing an oxide thin film, which comprises applying the obtained mixed solution onto a substrate to form a thin film, and then performing heat treatment.
【請求項2】 一般式(Bax Sr1-x )TiO3 (0
<x<1)で表される酸化物薄膜の作製方法において、
下記一般式(I-B)で示される溶媒に、 CH3 OR2 ′OH (I-B) (式中、R2 ′は2価の脂肪族炭化水素基を表す。)下
記一般式(II)で示されるバリウムアルコキシド化合物
を溶解して加熱反応させ、 Ba(OR3 2 (II) (式中、R3 は脂肪族炭化水素基を表す。)次いで、下
記一般式(III )および(IV)で示される2種の金属ア
ルコキシド化合物を添加して反応させ、 Ti(OR4 4 (III ) Sr(OR5 2 (IV) (式中、R4 およびR5 は、それぞれ脂肪族炭化水素基
を表す。)得られた混合溶液を基板上に塗布して薄膜を
形成し、次いで熱処理することを特徴とする酸化物薄膜
の作製方法。
2. The general formula (Ba x Sr 1-x ) TiO 3 (0
In the method for producing an oxide thin film represented by <x <1),
CH 3 OR 2 ′ OH (I-B) (wherein R 2 ′ represents a divalent aliphatic hydrocarbon group) in a solvent represented by the following general formula (IB): A barium alkoxide compound represented by the formula (1) is dissolved and reacted by heating, and Ba (OR 3 ) 2 (II) (in the formula, R 3 represents an aliphatic hydrocarbon group), and then the following general formulas (III) and ( IV) two kinds of metal alkoxide compounds are added and reacted, and Ti (OR 4 ) 4 (III) Sr (OR 5 ) 2 (IV) (in the formula, R 4 and R 5 are each an aliphatic group). It represents a hydrocarbon group.) A method for producing an oxide thin film, which comprises applying the obtained mixed solution onto a substrate to form a thin film, and then performing heat treatment.
【請求項3】 SrTiO3 で示される酸化物薄膜の作
製方法において、下記一般式(I)で示される溶媒に、 R1 OR2 OH (I) (式中、R1 は脂肪族炭化水素基を表し、R2 はエーテ
ル結合を有していてもよい2価の脂肪族炭化水素基を表
す。)下記一般式(III )および(IV)で示される2種
の金属アルコキシド化合物を同時または任意の順序で添
加して混合した後、加熱反応させ、 Ti(OR4 4 (III ) Sr(OR5 2 (IV) (式中、R4 およびR5 は、それぞれ脂肪族炭化水素基
を表す。)得られた混合溶液を基板上に塗布して薄膜を
形成し、次いで熱処理することを特徴とする酸化物薄膜
の作製方法。
3. A method of producing an oxide thin film represented by SrTiO 3 , wherein R 1 OR 2 OH (I) (wherein R 1 is an aliphatic hydrocarbon group) in a solvent represented by the following general formula (I): And R 2 represents a divalent aliphatic hydrocarbon group which may have an ether bond.) Two kinds of metal alkoxide compounds represented by the following general formulas (III) and (IV) are simultaneously or optionally used. And mixed by heating in the following order: Ti (OR 4 ) 4 (III) Sr (OR 5 ) 2 (IV) (In the formula, R 4 and R 5 are each an aliphatic hydrocarbon group; The method for producing an oxide thin film is characterized in that the obtained mixed solution is applied onto a substrate to form a thin film, and then heat treatment is performed.
JP6308433A 1993-12-21 1994-11-18 Preparation method of oxide thin film Expired - Fee Related JP2964893B2 (en)

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JP34466393 1993-12-21
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