JP2856599B2 - Method for producing lead zirconate titanate thin film - Google Patents

Method for producing lead zirconate titanate thin film

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Publication number
JP2856599B2
JP2856599B2 JP4150010A JP15001092A JP2856599B2 JP 2856599 B2 JP2856599 B2 JP 2856599B2 JP 4150010 A JP4150010 A JP 4150010A JP 15001092 A JP15001092 A JP 15001092A JP 2856599 B2 JP2856599 B2 JP 2856599B2
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JP
Japan
Prior art keywords
zirconate titanate
thin film
lead zirconate
solution
heat treatment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP4150010A
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Japanese (ja)
Other versions
JPH05319826A (en
Inventor
眞一 平野
透 森
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
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Priority to JP4150010A priority Critical patent/JP2856599B2/en
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Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【産業上の利用分野】本発明は高純度で組成が化学量論
比に制御された低温で焼成できる、特に厚さが数100
オングストロームないし数μmのジルコン酸チタン酸鉛
薄膜の製造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention can be fired at a low temperature with a high purity and a controlled composition at a stoichiometric ratio.
The present invention relates to a method for manufacturing a thin film of lead zirconate titanate having a thickness of angstrom to several μm.

【0002】[0002]

【従来の技術】ジルコン酸チタン酸鉛は強誘電性、圧電
性、焦電性を示し、種々の応用が期待されている。ま
た、強誘電素子、圧電素子、焦電素子などの電子デバイ
スの小型化,集積化に伴い、薄膜化が試みられている。
これまでジルコン酸チタン酸鉛の薄膜はスパッタ法やC
VD法などによって合成されているが、これらの方法で
はジルコン酸チタン酸鉛が鉛、ジルコニウム、チタン、
酸素からなる4元系であるため膜面内で組成を均一に制
御することが非常に困難であった。また、減圧下ないし
は低酸素分圧雰囲気下で合成するため酸素欠陥が非常に
多く、絶縁不良等の問題点が生じていた。これらの問題
点を解決するため、構成金属元素を含む溶液を出発物質
に用いたゾルゲル法によるジルコン酸チタン酸鉛薄膜を
合成する試みがなされてきた。ゾルゲル法は狭義には金
属アルコキシド法とも呼ばれ、実際には以下のようなジ
ルコン酸チタン酸鉛の合成例が報告されている。例えば
J.Fukushimaらによると、金属源として鉛−
2−エチルヘキサノエート、ジルコニウムアセチルアセ
トネートおよびチタンブトキシドをモル比1:0.5:
0.5となるように秤量し、アルコール中で溶解還流
し、ジルコン酸チタン酸鉛の前駆体溶液を得る。この溶
液を基板に塗布して乾燥ゲル膜を作製し、これを大気中
で500〜800℃の加熱処理を行うことにより結晶性
のジルコン酸チタン酸鉛薄膜を得る。この方法によって
得られた薄膜の組成は出発溶液の組成とほぼ一致してお
り、組成均一性が非常によいという報告がある(J.Mate
rial science.,19(1984)599-606)。
2. Description of the Related Art Lead zirconate titanate exhibits ferroelectricity, piezoelectricity, and pyroelectricity, and is expected to have various applications. Further, with the miniaturization and integration of electronic devices such as ferroelectric elements, piezoelectric elements, and pyroelectric elements, thinning has been attempted.
Until now, thin films of lead zirconate titanate have been deposited by sputtering or C
In these methods, lead zirconate titanate is synthesized by lead, zirconium, titanium,
Since it is a quaternary system composed of oxygen, it was very difficult to control the composition uniformly in the film plane. In addition, since synthesis is performed under reduced pressure or a low oxygen partial pressure atmosphere, the number of oxygen vacancies is extremely large, and problems such as poor insulation have occurred. In order to solve these problems, attempts have been made to synthesize a lead zirconate titanate thin film by a sol-gel method using a solution containing a constituent metal element as a starting material. The sol-gel method is also called the metal alkoxide method in a narrow sense, and the following synthesis examples of lead zirconate titanate are actually reported. For example, According to Fukushima et al., Lead-
2-ethylhexanoate, zirconium acetylacetonate and titanium butoxide in a molar ratio of 1: 0.5:
It is weighed so as to be 0.5 and dissolved and refluxed in alcohol to obtain a precursor solution of lead zirconate titanate. This solution is applied to a substrate to form a dried gel film, which is subjected to a heat treatment at 500 to 800 ° C. in the air to obtain a crystalline lead zirconate titanate thin film. The composition of the thin film obtained by this method is almost the same as the composition of the starting solution, and it has been reported that the composition uniformity is very good (J. Mate
rial science., 19 (1984) 599-606).

【0003】[0003]

【発明が解決しようとする課題】しかしながら、上記の
ゾルゲル法によるジルコン酸チタン酸鉛薄膜の製造方法
では、前駆体溶液中に金属源である金属アルコキシド等
から分解した有機物が残留しており、溶液中の前駆体が
溶液保管中に再度有機物と反応して分解する現象が生
じ、溶液の安定性に問題があった。また、これら残留有
機物を加熱分解して完全に除去し誘電率の高いペロブス
カイト単相の薄膜を得るためには少なくとも600℃以
上の加熱処理が必要であった。本発明の目的は、このよ
うな従来の問題点を解決して、安定な前駆体溶液を用い
て、低温の加熱処理で結晶性のジルコン酸チタン酸鉛薄
膜を製造する方法を提供することにある。
However, in the above-mentioned method for producing a lead zirconate titanate thin film by the sol-gel method, an organic substance decomposed from a metal alkoxide or the like as a metal source remains in a precursor solution. During storage of the solution, a phenomenon occurs in which the precursor reacts again with the organic matter and decomposes, and there is a problem in the stability of the solution. In addition, heat treatment at least at 600 ° C. or more was required in order to completely decompose and remove these residual organic substances and obtain a thin film of perovskite single phase having a high dielectric constant. An object of the present invention is to solve such a conventional problem and to provide a method for producing a crystalline lead zirconate titanate thin film by a low-temperature heat treatment using a stable precursor solution. is there.

【0004】[0004]

【課題を解決するための手段】本発明は、酢酸鉛あるい
は鉛アルコキシドと、ジルコニウムアルコキシドと、チ
タンアルコキシドとをそのモル比が1:(1−x):x
(ただし0<x<1)となるように低級アルコール中で
混合・反応させて得られた溶液に、前記低級アルコール
と共沸混合物を作らない多価アルコールまたはその誘導
体を添加した後、濃縮して前駆体溶液を作製する工程
と、該前駆体溶液を基板に塗布し乾燥させた後、加熱焼
成する工程を少なくとも一回以上繰り返すことよりなる
ジルコン酸チタン酸鉛薄膜の製造方法であって、加熱焼
成工程として450℃以上の温度でオゾン−酸素混合気
流中で加熱焼成を行うことを特徴とするジルコン酸チタ
ン酸鉛薄膜の製造方法である。
According to the present invention, a molar ratio of lead acetate or lead alkoxide, zirconium alkoxide, and titanium alkoxide is 1: (1-x): x.
(However, a polyhydric alcohol or a derivative thereof that does not form an azeotrope with the lower alcohol is added to a solution obtained by mixing and reacting in a lower alcohol such that 0 <x <1), and then concentrated. A method for producing a lead zirconate titanate thin film, comprising repeating the step of preparing a precursor solution, and applying and drying the precursor solution on a substrate, and then heating and firing at least once, This is a method for producing a lead zirconate titanate thin film, characterized in that the heating and sintering is performed in an ozone-oxygen mixed gas stream at a temperature of 450 ° C. or higher.

【0005】さらに詳しく本発明の方法を述べると次の
通りである。出発原料としてジルコニウムのアルコキシ
ドとチタンのアルコキシドをモル比が(1−x):xと
なるように秤量し、脱水、精製したアルコールに混合し
て溶解させる。アルコールは常温で液体であればよく、
好ましくはエタノールを用いる。この溶液に酢酸鉛ある
いは鉛アルコキシドをモル比でPb:(Zr+Ti)=
1:1となるように添加し、還流してジルコン酸チタン
酸鉛の前駆体を作成し、得られた溶液に、多価アルコー
ルあるいはその誘導体で、蒸気圧が低くかつ反応溶媒で
ある低級アルコールと共沸混合物を作らない溶媒を添加
した後濃縮し、コーティング溶液を作製する。この溶液
に結晶基板を浸漬し、一定速度で引き上げることにより
基板表面にコーティング膜を形成する。これらの操作は
金属アルコキシドが空気中の水分で容易に加水分解する
ため、乾燥した窒素雰囲気中で行う。数分間乾燥させた
後、オゾンと酸素の混合気流中で加熱処理することによ
ってジルコン酸チタン酸鉛単相の薄膜を得ることができ
る。この後、コーティング溶液への浸漬、引き上げ、乾
燥、加熱処理の工程を数回繰り返すことにより、所望の
厚さのジルコン酸チタン酸鉛薄膜が得られる。
The method of the present invention will be described in more detail as follows. As a starting material, an alkoxide of zirconium and an alkoxide of titanium are weighed so that the molar ratio becomes (1-x): x, mixed with dehydrated and purified alcohol, and dissolved. Alcohol may be liquid at room temperature,
Preferably, ethanol is used. Pb: (Zr + Ti) = lead acetate or lead alkoxide in a molar ratio to this solution.
The mixture was refluxed to prepare a precursor of lead zirconate titanate, and the resulting solution was mixed with a polyhydric alcohol or a derivative thereof, a lower alcohol having a low vapor pressure and being a reaction solvent. After adding a solvent that does not form an azeotrope, the mixture is concentrated to prepare a coating solution. The crystal substrate is immersed in this solution and pulled up at a constant speed to form a coating film on the substrate surface. These operations are performed in a dry nitrogen atmosphere because the metal alkoxide is easily hydrolyzed by moisture in the air. After drying for several minutes, a heat treatment is performed in a mixed gas stream of ozone and oxygen to obtain a thin film of a lead zirconate titanate single phase. Thereafter, the steps of dipping in the coating solution, lifting, drying, and heat treatment are repeated several times to obtain a lead zirconate titanate thin film having a desired thickness.

【0006】[0006]

【作用】本発明によれば、反応溶媒である低級アルコー
ルが、多価アルコールあるいはその誘導体とほとんど共
沸混合物を作らないので、濃縮時に前駆体作製の反応課
程で生じた有機物(例えばエステル等)と共にアルコー
ル溶媒を蒸発させることができ、前駆体溶液を安定に保
つことができると共に、前駆体溶液の溶媒の沸点が高く
なるので、成膜した時の乾燥がゆっくりと行われ均一な
膜が得られる。また、オゾン−酸素混合気流中で加熱処
理を行うことによって、500℃以下の低温でペロブス
カイト単相のジルコン酸チタン酸鉛薄膜を得ることがで
きるため、従来のような高温の加熱処理が不可能なもの
に対してもジルコン酸チタン酸鉛薄膜を形成することが
できる。
According to the present invention, a lower alcohol as a reaction solvent hardly forms an azeotrope with a polyhydric alcohol or a derivative thereof, so that an organic substance (eg, ester, etc.) generated in the reaction process of preparing a precursor at the time of concentration. In addition, the alcohol solvent can be evaporated, the precursor solution can be kept stable, and the boiling point of the solvent of the precursor solution increases, so that the film is dried slowly to form a uniform film. Can be In addition, by performing the heat treatment in an ozone-oxygen mixed gas stream, a perovskite single-phase lead zirconate titanate thin film can be obtained at a low temperature of 500 ° C. or less, so that a conventional high-temperature heat treatment cannot be performed. A thin film of lead zirconate titanate can be formed on any of these.

【0007】[0007]

【実施例】以下、本発明の実施例によりさらに詳細に説
明する。ただし、本発明の範囲は下記の実施例により何
等限定されるものではない。テトラエトキシジルコニウ
ム(Zr(OC254)とテトラエトキシチタン(T
i(OC254)をZr:Tiの比が(1−x):x
(ただし0<x<1)となるようにそれぞれ秤取し、脱
水、精製したエタノール中に混合、溶解した。この溶液
を24時間攪拌、還流した。この溶液に酢酸鉛をPb:
(Zr+Ti)=1:1となるように添加し、還流し、
PbZr1-xTix3の組成式で表されるジルコン酸チ
タン酸鉛前駆体を作製した。この後、エチレングリコー
ルを所定量添加し、酢酸基とエタノールを蒸発させてジ
ルコン酸チタン酸鉛前駆体溶液を作成した。ただし、添
加する溶媒はエチレングリコール以外にセルソルブ系や
カルビトール系で室温での飽和蒸気圧が低く、エタノー
ルと共沸混合物を作りにくい多価アルコールあるいはそ
の誘導体であれば良い。これらの操作は金属アルコキシ
ドが空気中の水分で容易に加水分解するため、乾燥した
窒素雰囲気中で行った。
The present invention will be described below in more detail with reference to examples. However, the scope of the present invention is not limited at all by the following Examples. Tetraethoxy zirconium (Zr (OC 2 H 5) 4) and tetraethoxytitanium (T
i (OC 2 H 5 ) 4 ) when the ratio of Zr: Ti is (1-x): x
(However, 0 <x <1), each was weighed, mixed and dissolved in dehydrated and purified ethanol. The solution was stirred and refluxed for 24 hours. Pb:
(Zr + Ti) = 1: 1, refluxed,
A lead zirconate titanate precursor represented by a composition formula of PbZr 1-x Ti x O 3 was produced. Thereafter, a predetermined amount of ethylene glycol was added, and the acetic acid groups and ethanol were evaporated to prepare a lead zirconate titanate precursor solution. However, the solvent to be added may be a polyhydric alcohol or a derivative thereof that is low in saturated vapor pressure at room temperature and hard to form an azeotrope with ethanol, in addition to ethylene glycol, such as cellosolve or carbitol. These operations were performed in a dry nitrogen atmosphere because the metal alkoxide is easily hydrolyzed by moisture in the air.

【0008】得られたジルコン酸チタン酸鉛前駆体溶液
に白金を蒸着したシリコン(100)基板を浸漬し一定
の速度で引き上げ塗布を行い、乾燥させた。この後得ら
れたジルコン酸チタン酸鉛の前駆体のコーティング膜を
400℃,450℃,500℃,600℃の4種類の温
度条件下でオゾンと酸素の混合雰囲気中(オゾン5%)
で1時間保持し加熱処理を行った。この浸漬、引き上
げ、乾燥、加熱処理(400℃,450℃,500℃,
600℃)の工程を繰り返して、緻密な結晶性のジルコ
ン酸チタン酸鉛薄膜を合成することができた。
[0008] A silicon (100) substrate on which platinum was deposited was immersed in the obtained lead zirconate titanate precursor solution, pulled up at a constant speed, applied, and dried. Thereafter, the coating film of the precursor of lead zirconate titanate obtained is placed in a mixed atmosphere of ozone and oxygen (ozone 5%) under four kinds of temperature conditions of 400 ° C., 450 ° C., 500 ° C., and 600 ° C.
For 1 hour to perform a heat treatment. This immersion, lifting, drying, and heat treatment (400 ° C, 450 ° C, 500 ° C,
(600 ° C.), a dense crystalline lead zirconate titanate thin film could be synthesized.

【0009】以上のようにして得られた薄膜を、Cuを
ターゲットとした粉末X線回折法によって調べた結果、
乾燥酸素気流中で加熱処理した場合には600℃の加熱
処理でもペロブスカイト単相は得られなかった。それに
対して、オゾン−酸素混合気流中では、400℃加熱処
理ではペロブスカイト相はみられなかったものの、45
0℃加熱処理ではペロブスカイト、パイクロア混合相と
なり、500℃、600℃の加熱処理ではほぼ完全なペ
ロブスカイト単相が得られていることが確認された。な
お加熱処理温度が700℃でもオゾン−酸素混合気流中
では600℃熱処理の場合とほぼ同等のX線回折ピーク
が得られた。
The thin film obtained as described above was examined by a powder X-ray diffraction method using Cu as a target.
When heat treatment was performed in a dry oxygen stream, a perovskite single phase could not be obtained even with heat treatment at 600 ° C. On the other hand, in the ozone-oxygen mixed gas flow, the perovskite phase was not observed in the heat treatment at 400 ° C.
It was confirmed that a perovskite-pyrochlore mixed phase was obtained by the heat treatment at 0 ° C., and a substantially complete perovskite single phase was obtained by the heat treatment at 500 ° C. and 600 ° C. Even at a heat treatment temperature of 700 ° C., an X-ray diffraction peak almost equivalent to that of the heat treatment at 600 ° C. was obtained in an ozone-oxygen mixed gas stream.

【0010】図1は本実施例にてオゾン−酸素混合気流
中で、加熱処理温度を変えて最終的に得られた薄膜のX
線回折ピークを示した図であり、図2は乾燥酸素気流中
で500〜700℃の加熱処理を行って得られた薄膜の
X線回折ピークを示した図である。図1、2において、
○印はPbZr1-xTix3薄膜のペロブスカイト相の
ピークを、●印はパイロクロア相のピークを、△印は基
板の白金回折線のピークを、さらに▲印は基板のシリコ
ン回折線のピークを示すものである。なお、原料のZ
r:Tiの比が(1−x):xで0<x<1であれば、
すべて同様の結果が得られた。
FIG. 1 shows an X-ray of a thin film finally obtained in this embodiment by changing the heat treatment temperature in an ozone-oxygen mixed gas stream.
FIG. 2 is a diagram showing a line diffraction peak, and FIG. 2 is a diagram showing an X-ray diffraction peak of a thin film obtained by performing a heat treatment at 500 to 700 ° C. in a dry oxygen stream. 1 and 2,
○ indicates the peak of the perovskite phase of the PbZr 1-x Ti x O 3 thin film, ● indicates the peak of the pyrochlore phase, △ indicates the peak of the platinum diffraction line of the substrate, and ▲ indicates the peak of the silicon diffraction line of the substrate. It shows a peak. The raw material Z
If the ratio of r: Ti is (1-x): x and 0 <x <1,
All gave similar results.

【0011】[0011]

【発明の効果】以上説明したように、本発明の方法によ
ればジルコン酸チタン酸鉛薄膜製造用の安定な前駆体溶
液を用いて、従来よりも低い加熱処理温度でペロブスカ
イト単相のジルコン酸チタン酸鉛薄膜の作製が可能にな
った。従って、本発明の方法はジルコン酸チタン酸鉛を
用いた圧電素子や焦電素子等の種々の応用にその活用が
期待される。
As described above, according to the method of the present invention, using a stable precursor solution for producing a lead zirconate titanate thin film, a perovskite single-phase zirconate at a lower heat treatment temperature than before. The production of lead titanate thin films has become possible. Therefore, the method of the present invention is expected to be utilized for various applications such as piezoelectric elements and pyroelectric elements using lead zirconate titanate.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例においてオゾン−酸素混合気流
中で加熱処理することにより得られたジルコン酸チタン
酸鉛薄膜のX線回折図である。
FIG. 1 is an X-ray diffraction diagram of a lead zirconate titanate thin film obtained by performing a heat treatment in an ozone-oxygen mixed gas stream in an example of the present invention.

【図2】乾燥酸素気流中で加熱処理して得られたジルコ
ン酸チタン酸鉛薄膜のX線回折図である。
FIG. 2 is an X-ray diffraction diagram of a lead zirconate titanate thin film obtained by performing a heat treatment in a dry oxygen stream.

───────────────────────────────────────────────────── フロントページの続き (58)調査した分野(Int.Cl.6,DB名) C01G 25/00 C04B 35/49──────────────────────────────────────────────────続 き Continued on front page (58) Field surveyed (Int.Cl. 6 , DB name) C01G 25/00 C04B 35/49

Claims (1)

(57)【特許請求の範囲】(57) [Claims] 【請求項1】 酢酸鉛あるいは鉛アルコキシドと、ジル
コニウムアルコキシドと、チタンアルコキシドとをその
モル比が1:(1−x):x(ただし0<x<1)とな
るように低級アルコール中で混合・反応させて得られた
溶液に、前記低級アルコールと共沸混合物を作らない多
価アルコールまたはその誘導体を添加した後、濃縮して
前駆体溶液を作製する工程と、該前駆体溶液を基板に塗
布し乾燥させた後、加熱焼成する工程を少なくとも一回
以上繰り返すことよりなるジルコン酸チタン酸鉛薄膜の
製造方法であって、加熱焼成工程として450℃以上の
温度でオゾン−酸素混合気流中で加熱焼成を行うことを
特徴とするジルコン酸チタン酸鉛薄膜の製造方法。
1. A mixture of lead acetate or lead alkoxide, zirconium alkoxide, and titanium alkoxide in a lower alcohol such that the molar ratio thereof is 1: (1-x): x (where 0 <x <1). A step of adding a polyhydric alcohol or a derivative thereof that does not form an azeotrope with the lower alcohol to a solution obtained by the reaction, and then concentrating the solution to prepare a precursor solution; and applying the precursor solution to a substrate. After coating and drying, a method for producing a lead zirconate titanate thin film comprising repeating a heating and firing step at least once or more, wherein the heating and firing step is performed at a temperature of 450 ° C. or higher in an ozone-oxygen mixed gas stream. A method for producing a lead zirconate titanate thin film, which comprises heating and firing.
JP4150010A 1992-05-19 1992-05-19 Method for producing lead zirconate titanate thin film Expired - Fee Related JP2856599B2 (en)

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WO1998002378A1 (en) * 1996-07-17 1998-01-22 Citizen Watch Co., Ltd. Ferroelectric element and process for producing the same
JP2007161502A (en) * 2005-12-09 2007-06-28 Gifu Univ Solution for making titanium-containing multiple oxide, method of preparing the same, method of manufacturing titanium-containng multiple oxide, precursor for titanium-containng multiple oxide, dielectric material and method of manufacturing dielectric material

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