JPH07223878A - Production of joined body composed of ceramics and metal - Google Patents

Production of joined body composed of ceramics and metal

Info

Publication number
JPH07223878A
JPH07223878A JP1763994A JP1763994A JPH07223878A JP H07223878 A JPH07223878 A JP H07223878A JP 1763994 A JP1763994 A JP 1763994A JP 1763994 A JP1763994 A JP 1763994A JP H07223878 A JPH07223878 A JP H07223878A
Authority
JP
Japan
Prior art keywords
metal
ceramics
circuit
units
spacer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1763994A
Other languages
Japanese (ja)
Inventor
Nobuhiro Watabe
信弘 渡部
Yoshiyuki Nakamura
美幸 中村
Katsunori Terano
克典 寺野
Akira Miyai
明 宮井
Koichi Uchino
紘一 内野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denka Co Ltd
Original Assignee
Denki Kagaku Kogyo KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Denki Kagaku Kogyo KK filed Critical Denki Kagaku Kogyo KK
Priority to JP1763994A priority Critical patent/JPH07223878A/en
Publication of JPH07223878A publication Critical patent/JPH07223878A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/10Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/20Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern
    • H05K3/202Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by affixing prefabricated conductor pattern using self-supporting metal foil pattern

Landscapes

  • Laminated Bodies (AREA)
  • Ceramic Products (AREA)

Abstract

PURPOSE:To remarkably enhance the productivity and produce a joined body of ceramics to a metal without impairing the surface conditions of the metal and joining strength of the metal to the ceramics. CONSTITUTION:This method for producing a joined body composed of ceramics and a metal is to superimpose 2 or 3 or more units comprising each laminate prepared by superimposing ceramics to a metallic circuit and/or a metallic plate for forming the metallic circuit with or without interposing a brazing filler material containing an active metal as one unit through spacers composed of ceramics having a nonoxide layer on the surface thereof and heat the resultant superposed units comprising the laminates in thermally joining the superimposed units comprising the laminates.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、セラミックスと金属回
路及び/又は金属回路形成用金属板の金属からなる接合
体の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a joined body composed of ceramics and a metal circuit and / or a metal plate for forming a metal circuit.

【0002】[0002]

【従来の技術】従来、セラミックス基板に金属回路又は
金属回路形成用金属板を接合する方法としては、活性金
属を含むろう材を介在させたセラミックス基板と金属回
路及び/又は金属回路形成用金属板との積層体を高真空
下で加熱接合する活性金属法(特開昭60−17763
4号公報)、酸化物セラミックス基板又は表面を酸化処
理してなる窒化アルミニウム基板と銅回路及び/又は銅
回路形成用銅板との直接積層体を銅の融点以下、Cu−
Oの共晶温度以上で加熱接合するDBC法(特開昭56
−163093号公報)が一般的に採用されている。更
には、セラミックス基板にSi、Al、Mg、Ca、F
e等の金属酸化物を介してMo、Mn、W等の高融点金
属によるメタライズ処理を行ってから活性金属を含まな
いろう材を介して金属回路及び/又は金属回路形成用金
属板を積層しそれを高真空下で加熱接合するメタライズ
法もある。
2. Description of the Related Art Conventionally, as a method for joining a metal circuit or a metal plate for forming a metal circuit to a ceramic substrate, a ceramic substrate and a metal plate for forming a metal circuit and / or a metal circuit for interposing a brazing material containing an active metal have been used. The active metal method of heating and bonding a laminate with and under high vacuum (JP-A-60-17763).
No. 4), a direct laminate of an oxide ceramic substrate or an aluminum nitride substrate obtained by oxidizing the surface and a copper circuit and / or a copper plate for forming a copper circuit is formed at a temperature not higher than the melting point of copper by Cu-
DBC method in which heat bonding is performed at a temperature higher than the eutectic temperature of O (Japanese Patent Laid-Open No. Sho 56-56)
No. 163093) is generally adopted. Furthermore, Si, Al, Mg, Ca, F on the ceramic substrate
Metallization treatment with a refractory metal such as Mo, Mn, and W is performed through a metal oxide such as e, and then a metal circuit and / or a metal plate for forming a metal circuit is laminated through a brazing material containing no active metal. There is also a metallizing method in which it is heated and joined under high vacuum.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、上記活
性金属法又はDBC法は、セラミックス基板と金属回路
及び/又は金属回路形成用金属板との積層体を1ユニッ
トとして加熱接合されるものであるため生産性が劣っ
た。この欠点を解決するには、2又は3以上のユニット
を積層し加熱処理をすればよいが、この場合には、金属
同士が融着し剥離が困難になるという問題がある。
However, in the active metal method or the DBC method, the laminated body of the ceramic substrate and the metal circuit and / or the metal plate for forming the metal circuit is heat-bonded as one unit. Productivity was poor. In order to solve this drawback, two or more units may be laminated and heat treated, but in this case, there is a problem that the metals are fused and peeling becomes difficult.

【0004】そこで、ユニット間にスペーサを挟んで加
熱すればよいとの考えのもとに、そのスペーサーの要求
特性として、容積が小さい、加熱処理温度において変形
しないか又は変形しても著しく小さい変形である、化学
的に安定である、繰り返し使用ができる、ズレない、入
手が容易である等の観点から種々検討した結果、非酸化
物層を表面にもつセラッミクスがスペーサーとして好適
であることを見いだし、本発明を完成させたものであ
る。
Therefore, based on the idea that a spacer may be sandwiched between the units and heated, the required properties of the spacer are that the volume is small, it does not deform at the heat treatment temperature, or it does not deform significantly even if it deforms. As a result of various studies from the standpoints of chemical stability, repeated use, no deviation, easy availability, etc., it was found that ceramics having a non-oxide layer on the surface is suitable as a spacer. The present invention has been completed.

【0005】[0005]

【課題を解決するための手段】すなわち、本発明は、セ
ラミックスと金属回路及び/又は金属回路形成用金属板
とを活性金属を含むろう材を介在させ又は介在させない
で積層された積層体を加熱接合するにあたり、上記積層
体を1ユニットとする2又は3以上のユニットを非酸化
物層を表面にもつセラミックスからなるスペーサーを介
して積層し、それを加熱することを特徴とするセラミッ
クスと金属の接合体の製造方法である。
That is, according to the present invention, a laminated body in which ceramics and a metal circuit and / or a metal plate for forming a metal circuit are laminated with or without a brazing material containing an active metal is heated. In joining, two or three or more units each having the above-mentioned laminated body as one unit are laminated through a spacer made of ceramics having a non-oxide layer on the surface, and the laminated body is heated. It is a manufacturing method of a joined body.

【0006】以下、更に詳しく本発明を説明すると、本
発明で使用されるセラミックス基板、金属回路又は金層
回路形成用金属板、活性金属を含むろう材等について
は、従来のもので充分であり、それらの概要を説明すれ
ば以下のとおりである。
The present invention will be described in more detail below. As for the ceramic substrate, the metal plate for forming the metal circuit or the gold layer circuit, the brazing material containing the active metal, etc. used in the present invention, the conventional one is sufficient. , And their outlines are as follows.

【0007】セラミックス基板としては、窒化アルミニ
ウム基板、アルミナ基板、ムライト基板等が用いられ、
中でも活性金属法とメタライズ法においては窒化アルミ
ニウム基板、DBC法においてはアルミナ基板、ムライ
ト基板及び表面が酸化処理された窒化アルミニウム基板
が一般的である。セラミックス基板の厚みは0.3〜
0.8mmであることが望ましく、0.3mmよりも薄
いと熱衝撃に対する耐久性が小さくなり、また0.8m
mをこえると熱抵抗が低下する。
Aluminum nitride substrates, alumina substrates, mullite substrates, etc. are used as ceramic substrates.
Among them, an aluminum nitride substrate is generally used in the active metal method and the metallizing method, an alumina substrate, a mullite substrate, and an aluminum nitride substrate whose surface is oxidized in the DBC method. The thickness of the ceramic substrate is 0.3-
0.8 mm is desirable, and if it is thinner than 0.3 mm, the durability against thermal shock is reduced, and it is 0.8 m.
If it exceeds m, the thermal resistance decreases.

【0008】金属回路及び/又は金属回路形成用金属板
の材質としては、DBC法の場合は銅であり、活性金属
法とメタライズ法の場合には、銅、アルミニウム、タン
グステン、モリブデン等であるが、銅が一般的である。
金属回路又は金属回路形成用金属板の厚みとしては、近
年、電流密度が向上していく傾向から0.3mmよりも
厚いことが好ましい。通常、金属回路及び/又は金属回
路形成用金属板は、セラミックス基板の一方の面に接合
され、他方の面には金属放熱板が接合されるが、金属放
熱板を設けない構造もある。金属放熱板の材質について
も上記のものが使用され、またその厚みは0.2mm以
下であることが好ましい。
The material of the metal circuit and / or the metal plate for forming the metal circuit is copper in the case of the DBC method, and copper, aluminum, tungsten, molybdenum, etc. in the case of the active metal method and the metallizing method. , Copper is common.
The thickness of the metal circuit or the metal plate for forming the metal circuit is preferably thicker than 0.3 mm from the tendency that the current density is improved in recent years. Usually, the metal circuit and / or the metal plate for forming the metal circuit is bonded to one surface of the ceramic substrate and the metal heat radiating plate is bonded to the other surface, but there is a structure in which the metal heat radiating plate is not provided. The above-mentioned materials are used as the material of the metal radiator plate, and the thickness thereof is preferably 0.2 mm or less.

【0009】活性金属法におけるろう材の金属成分は、
銀と銅を主成分とし、溶融時のセラミックス基板との濡
れ性を確保するために活性金属を副成分とする。この活
性金属成分の具体例をあげれば、チタン、ジルコニウ
ム、ハフニウム、ニオブ、タンタル、バナジウム及びこ
れらを成分とする化合物、合金である。これらの金属成
分の割合としては、銀69〜75重量部と銅25〜31
重量部の合計量100重量部あたり活性金属3〜35重
量部である。
The metal component of the brazing filler metal in the active metal method is
It contains silver and copper as main components, and an active metal as a sub-component in order to ensure wettability with the ceramic substrate during melting. Specific examples of the active metal component include titanium, zirconium, hafnium, niobium, tantalum, vanadium and compounds and alloys containing these components. The ratio of these metal components is 69 to 75 parts by weight of silver and 25 to 31 of copper.
3 to 35 parts by weight of the active metal per 100 parts by weight of the total weight part.

【0010】活性金属法又はメタライズ法で使用される
ろう材は、通常、ペーストとして用いられ、それはろう
材の金属成分に有機溶剤及び必要に応じて有機結合剤を
加え、ロール、ニーダ、バンバリミキサー、万能混合
器、らいかい機等で混合することによって調製すること
ができる。有機溶剤としては、メチルセルソルブ、エチ
ルセルソルブ、テルピネオール、イソホロン、トルエン
等、また有機結合剤としては、エチルセルロース、メチ
ルセルロース、ポリメチルメタクリレート等が使用され
る。
The brazing filler metal used in the active metal method or the metallizing method is usually used as a paste, which is prepared by adding an organic solvent and, if necessary, an organic binder to the metal component of the brazing filler metal, and using a roll, kneader or Banbury mixer. It can be prepared by mixing with a universal mixer, a ladle machine or the like. As the organic solvent, methyl cellosolve, ethyl cellosolve, terpineol, isophorone, toluene, etc., and as the organic binder, ethyl cellulose, methyl cellulose, polymethyl methacrylate, etc. are used.

【0011】活性金属法又はメタライズ法の場合には、
ろう材ペーストは、スクリーン印刷、ロールコーター
法、刷毛塗り等によってセラミックス基板の両面に塗布
され、次いでその一方の面に金属回路及び/又は金属回
路形成用金属板が、また他方の面には金属放熱板が通常
は積層されて積層体の1ユニットが形成される。DBC
法の場合には、ろう材ペーストを用いることなく直接銅
回路及び/又は銅回路形成用銅板とセラミックス基板と
が積層されて積層体の1ユニットが形成される。
In the case of the active metal method or the metallizing method,
The brazing material paste is applied to both sides of the ceramic substrate by screen printing, roll coater method, brush coating, etc., then a metal circuit and / or a metal plate for forming a metal circuit is formed on one surface thereof, and a metal plate is formed on the other surface thereof. The heat sinks are typically stacked to form one unit of stack. DBC
In the case of the method, a copper circuit and / or a copper plate for forming a copper circuit and a ceramics substrate are directly laminated without using a brazing paste to form one unit of a laminated body.

【0012】本発明は、活性金属法又はメタライズ法で
形成された積層体を1ユニットとする2又は3以上のユ
ニット同士又はDBC法で形成された積層体を1ユニッ
トとする2又は3以上のユニット同士を非酸化物層を表
面にもつセラミックスからなるスペーサーを介して積層
し、それを加熱処理して接合するものである。加熱処理
条件は、活性金属法又はメタライズ法によるユニットの
積層体の場合には、1×10-5 Torrの高真空下、
温度800〜950℃、0.1〜1時間であり、一方、
DBC法によるユニットの積層体の場合には、N2 等の
非酸化性雰囲気中、温度1063〜1083℃で0.1
〜1時間である。
According to the present invention, two or more units each having a laminate formed by the active metal method or the metallization method as one unit or two or more units having a laminate formed by the DBC method as one unit are used. The units are stacked with a spacer made of ceramics having a non-oxide layer on the surface, and the units are heat-treated and bonded. The heat treatment conditions are, under the high vacuum of 1 × 10 −5 Torr, in the case of a laminated body of units by the active metal method or the metallization method,
The temperature is 800 to 950 ° C. for 0.1 to 1 hour, while
In the case of a laminated body of units by the DBC method, 0.1 at a temperature of 1063 to 1083 ° C. in a non-oxidizing atmosphere such as N 2.
~ 1 hour.

【0013】本発明は、スペーサーとして非酸化物層を
表面にもつセラミックスを用いたことが大きな特徴であ
る。具体的には、窒化アルミニウム製、窒化ケイ素製、
炭化ケイ素製等の非酸化物系のセラミックスや、これら
の非酸化物系セラミックス又はアルミナ、ムライト等の
酸化物系セラミックス表面に、黒鉛又はBNをスプレー
法、化学気相熱分解法等によってコーティングしたもの
である。スペーサーの広さについては、積層体の広さと
同程度でよく、あまりにも狭いと荷重不足により周囲部
分に接合不良が生じ、またあまりにも広くなると積層体
自体又は積層体間同士にズレが生じて接合不良ができた
り崩れを起こしたりする。また、厚みについては、取扱
い性、繰り返し使用における耐久性、容積効率の点から
0.2〜1mmであることが好ましい。なお、本発明に
おいては、荷重ムラを防ぐためにスペーサーを挟んで積
層された複数ユニットの最上面にタングステン、タンタ
ル、モリブデン、BN、Si3 4 等の重しを載せるこ
とは好ましい。
A major feature of the present invention is that a ceramic having a non-oxide layer on its surface is used as a spacer. Specifically, aluminum nitride, silicon nitride,
Non-oxide ceramics such as those made of silicon carbide, or surfaces of these non-oxide ceramics or oxide ceramics such as alumina and mullite are coated with graphite or BN by a spray method, a chemical vapor decomposition method, or the like. It is a thing. The size of the spacer may be about the same as the width of the laminated body. If it is too narrow, joint failure may occur in the surrounding area due to insufficient load, and if it is too wide, there may be a gap between the laminate itself or between the laminates. Poor bonding or breakage. Further, the thickness is preferably 0.2 to 1 mm from the viewpoints of handleability, durability in repeated use, and volume efficiency. In the present invention, it is preferable to place a weight of tungsten, tantalum, molybdenum, BN, Si 3 N 4 or the like on the uppermost surface of a plurality of units stacked with a spacer interposed therebetween in order to prevent uneven load.

【0014】[0014]

【実施例】以下、実施例、比較例、参考例をあげて更に
具体的に本発明を説明する。
EXAMPLES The present invention will be described more specifically with reference to Examples, Comparative Examples and Reference Examples.

【0015】実施例1 窒化アルミニウム基板(60mm×40mm×厚さ0.
635mm)の両面に、銀粉末72重量部、銅粉末28
重量部、チタン粉末20重量部、テレピネオール15重
量部および有機結合剤としてエチルセルロースのトルエ
ン溶液を固形分で1重量部混合して得られた活性金属を
含むろう材ペーストを回路パターンに塗布してから乾燥
し、そこに回路パターンと同一形状に打ち抜かれた銅回
路を積層した。
Example 1 Aluminum nitride substrate (60 mm × 40 mm × thickness: 0.
635 mm) on both sides, silver powder 72 parts by weight, copper powder 28
Parts by weight, 20 parts by weight of titanium powder, 15 parts by weight of terpineol and 1 part by weight of a toluene solution of ethyl cellulose as an organic binder in a solid content are mixed, and a brazing material paste containing an active metal is applied to a circuit pattern. After drying, a copper circuit punched into the same shape as the circuit pattern was laminated thereon.

【0016】得られた積層体を1ユニットとする20ユ
ニットを各ユニット間に上記窒化アルミニウム基板と同
一寸法の窒化アルミニウム板をスペーサーとして介在さ
せて積層し、その最上面に8g/cm2 のタングステン
重しを載せてから、温度850℃、真空度1×10-5
orrの雰囲気下で30分間の熱処理を行った。
20 units of the obtained laminated body as one unit are laminated by interposing an aluminum nitride plate having the same size as the above-mentioned aluminum nitride substrate as a spacer between the units, and 8 g / cm 2 of tungsten is placed on the uppermost surface thereof. After placing the weight, the temperature is 850 ° C and the degree of vacuum is 1 × 10 -5 t
Heat treatment was performed for 30 minutes in an atmosphere of orr.

【0017】得られた20枚の接合体について、ピール
強度(最大値、最小値、平均値)、銅回路の表面状態、
スペーサーの付着状態と繰り返し使用寿命、更には積層
体を積層する際のスペーサーのズレを以下に従って測定
した。それらの結果を表1に示す。
The peel strength (maximum value, minimum value, average value), surface condition of the copper circuit, and
The adhered state of the spacers, the repeated service life, and the displacement of the spacers when laminating the laminate were measured as follows. The results are shown in Table 1.

【0018】(1)ピール強度:市販の測定機器を用い
引張速度50mm/分で測定した。 (2)銅回路の表面状態:目視観察により行い、◎:接
合の前後で差はなし、○:銅回路表面に付着物あり、
×:銅回路表面に凹凸ありで評価した。 (3)スペーサーの付着状態:スペーサーの付着枚数を
測定した。 (4)スペーサーの繰り返し使用寿命:スペーサーを1
00回繰り返し使用したときの状況を目視観察し、◎:
異常なし、○:80回までに異常発生、×:10回まで
に異常発生で評価した。 (5)積層時のズレ:荷重をかけたときの積層体のズレ
の有無を目視観察した。
(1) Peel strength: Measured at a pulling speed of 50 mm / min using a commercially available measuring instrument. (2) Surface condition of copper circuit: Visual observation, ⊚: No difference before and after joining, ◯: Adhesion on copper circuit surface,
Poor: The copper circuit surface was evaluated for unevenness. (3) Spacer adhesion state: The number of spacers adhered was measured. (4) Repeated use life of spacer: 1 spacer
Visual observation of the situation after repeated use of 00 times, ◎:
There was no abnormality, ∘: occurrence of abnormality by 80 times, and x: occurrence of abnormality by 10 times. (5) Deviation during lamination: The presence or absence of deviation of the laminate when a load is applied was visually observed.

【0019】実施例2 スペーサーとして、窒化アルミニウム板にカーボンスプ
レー(日本船舶工具社製商品名「DGF」)をコーティ
ングしたものを用いたこと以外は、実施例1と同様にし
て接合体を製造した。
Example 2 A bonded body was manufactured in the same manner as in Example 1 except that an aluminum nitride plate coated with carbon spray (trade name "DGF" manufactured by Nippon Ship Tool Co., Ltd.) was used as the spacer. .

【0020】実施例3 スペーサーとして、窒化アルミニウム板にBNスプレー
(電気化学工業社製商品名「ボロンスプレー」)をコー
ティングしたものを用いたこと以外は、実施例1と同様
にして接合体を製造した。
Example 3 A joined body was produced in the same manner as in Example 1 except that an aluminum nitride plate coated with BN spray (product name "Boron Spray" manufactured by Denki Kagaku Kogyo Co., Ltd.) was used as the spacer. did.

【0021】実施例4 スペーサーとして、アルミナ板(60mm×40mm×
厚さ0.635mm)にBNスプレーをコーティングし
たものを用いたこと以外は、実施例1と同様にして接合
体を製造した。
Example 4 As a spacer, an alumina plate (60 mm × 40 mm ×
A joined body was produced in the same manner as in Example 1 except that a BN spray was applied to a thickness of 0.635 mm).

【0022】実施例5 スペーサーとして、窒化アルミニウム板の周囲約5mm
にのみBNスプレーをコーティングしたものを用いたこ
と以外は、実施例1と同様にして接合体を製造した。
Example 5 As a spacer, about 5 mm around an aluminum nitride plate
A joined body was produced in the same manner as in Example 1 except that only the BN spray-coated one was used.

【0023】実施例6 窒化アルミニウム基板に回路パターンと同一形状に打ち
抜かれたタフピッチ銅回路を直接積層して得られた積層
体を用いたこと以外は、実施例1と同様にして接合体を
製造した。
Example 6 A bonded body was manufactured in the same manner as in Example 1 except that a laminated body obtained by directly laminating a tough pitch copper circuit punched into the same shape as a circuit pattern on an aluminum nitride substrate was used. did.

【0024】実施例7 窒化アルミニウム基板を酸化処理してAl23 層を形
成させ、その表面にMo−Mn法によりメタライズ処理
を行ってから上記ろう材ペーストからチタン粉末を除い
て調製されたペーストを介して銅回路を積層して得られ
た積層体を用いたこと以外は、実施例1と同様にして接
合体を製造した。
Example 7 An aluminum nitride substrate was subjected to an oxidation treatment to form an Al 2 O 3 layer, the surface of which was subjected to a metallization treatment by the Mo-Mn method, and the titanium powder was removed from the brazing material paste. A bonded body was manufactured in the same manner as in Example 1 except that a laminated body obtained by laminating copper circuits via a paste was used.

【0025】比較例1 スペーサーを用いなかったこと以外は、実施例1と同様
にして接合体を製造した。
Comparative Example 1 A bonded body was manufactured in the same manner as in Example 1 except that no spacer was used.

【0026】比較例2 スペーサーをアルミナ板(60mm×40mm×厚さ
0.635mm)としたこと以外は、実施例1と同様に
して接合体を製造した。
Comparative Example 2 A bonded body was manufactured in the same manner as in Example 1 except that the spacer was an alumina plate (60 mm × 40 mm × thickness 0.635 mm).

【0027】比較例3 スペーサーをカーボンペーパー(UCAR Carbo
n Company製)としたこと以外は、実施例1と
同様にして接合体を製造した。
Comparative Example 3 A spacer is made of carbon paper (UCAR Carbo).
A bonded body was manufactured in the same manner as in Example 1 except that the product was manufactured by N Company.

【0028】参考例(従来例) スペーサーを用いないで1ユニットのみの積層体を用い
たこと以外は、実施例1と同様にして接合体を製造し
た。
Reference Example (Conventional Example) A bonded body was manufactured in the same manner as in Example 1 except that a laminated body of only one unit was used without using a spacer.

【0029】[0029]

【表1】 [Table 1]

【0030】[0030]

【発明の効果】本発明によれば、金属の表面状態、金属
とセラミックスの接合強度を損なわせることなく生産性
を著しく高めてセラミックスと金属の接合体を製造する
ことができる。
According to the present invention, it is possible to manufacture a bonded body of ceramics and metal with significantly improved productivity without deteriorating the surface condition of metal and the bonding strength of metal and ceramics.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 宮井 明 福岡県大牟田市新開町1 電気化学工業株 式会社大牟田工場内 (72)発明者 内野 紘一 福岡県大牟田市新開町1 電気化学工業株 式会社大牟田工場内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Akira Miyai 1 Shinkai-cho, Omuta-shi, Fukuoka Prefecture Electrochemical Industry Co., Ltd. Omuta Factory (72) Inventor Koichi Uchino 1 Shinkai-machi, Omuta-shi, Fukuoka Electrochemical Industry Co., Ltd. Omuta Factory

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 セラミックスと金属回路及び/又は金属
回路形成用金属板とを活性金属を含むろう材を介在させ
又は介在させないで積層された積層体を加熱接合するに
あたり、上記積層体を1ユニットとする2又は3以上の
ユニットを非酸化物層を表面にもつセラッミクスからな
るスペーサーを介して積層し、それを加熱することを特
徴とするセラミックスと金属からなる接合体の製造方
法。
1. A unit of the above-mentioned laminated body for heating and joining a laminated body in which ceramics and a metal plate for forming a metal circuit and / or a metal circuit are laminated with or without interposing a brazing material containing an active metal. 2. A method for producing a bonded body made of ceramics and metal, comprising laminating 2 or 3 or more units of the above through a spacer made of ceramics having a non-oxide layer on the surface and heating it.
JP1763994A 1994-02-14 1994-02-14 Production of joined body composed of ceramics and metal Pending JPH07223878A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1763994A JPH07223878A (en) 1994-02-14 1994-02-14 Production of joined body composed of ceramics and metal

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1763994A JPH07223878A (en) 1994-02-14 1994-02-14 Production of joined body composed of ceramics and metal

Publications (1)

Publication Number Publication Date
JPH07223878A true JPH07223878A (en) 1995-08-22

Family

ID=11949441

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1763994A Pending JPH07223878A (en) 1994-02-14 1994-02-14 Production of joined body composed of ceramics and metal

Country Status (1)

Country Link
JP (1) JPH07223878A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003055059A (en) * 2001-08-20 2003-02-26 Denki Kagaku Kogyo Kk Method of manufacturing joined body
WO2022259708A1 (en) * 2021-06-11 2022-12-15 Ngkエレクトロデバイス株式会社 Method for manufacturing bonded substrate, method for manufacturing circuit substrate, and circuit substrate

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003055059A (en) * 2001-08-20 2003-02-26 Denki Kagaku Kogyo Kk Method of manufacturing joined body
JP4668476B2 (en) * 2001-08-20 2011-04-13 電気化学工業株式会社 Manufacturing method of joined body
WO2022259708A1 (en) * 2021-06-11 2022-12-15 Ngkエレクトロデバイス株式会社 Method for manufacturing bonded substrate, method for manufacturing circuit substrate, and circuit substrate

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