JPH07201673A - Manufacture of aluminum material for electrolytic capacitor electrode - Google Patents

Manufacture of aluminum material for electrolytic capacitor electrode

Info

Publication number
JPH07201673A
JPH07201673A JP35502193A JP35502193A JPH07201673A JP H07201673 A JPH07201673 A JP H07201673A JP 35502193 A JP35502193 A JP 35502193A JP 35502193 A JP35502193 A JP 35502193A JP H07201673 A JPH07201673 A JP H07201673A
Authority
JP
Japan
Prior art keywords
aluminum foil
heating
surface layer
oxide film
annealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP35502193A
Other languages
Japanese (ja)
Inventor
Kiyoshi Tada
清志 多田
Akira Hashimoto
明 橋本
Tadao Fujihira
忠雄 藤平
Eizo Isoyama
永三 礒山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Showa Aluminum Can Corp
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP35502193A priority Critical patent/JPH07201673A/en
Publication of JPH07201673A publication Critical patent/JPH07201673A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To acquire an aluminum material for an electrolytic capacitor electrode which makes possible the increase of electrostatic capacity by removing a surface layer of an aluminum foil, by heating and oxidizing it under specified conditions thereafter and by annealing it under non-oxidizing atmosphere. CONSTITUTION:After a surface layer of an aluminum foil is removed, it is heated and oxidized under conditions of a temperature of 40 to 350 deg.C, a dew point of 0 to 80 deg.C for 30 to 1800sec. After heating and oxidation, it is annealed in non-oxidizing atmosphere. The surface layer removal of an aluminum foil is carried out for exposing a fresh surface by cleaning it using alkaline solution and acid solution. The heating and oxidation after the surface layer removal are carried out for generating a thin oxide film of high OH-group content on a foil surface. The annealing after the heating and oxidation is carried out for improving etching characteristic by making a structure of an aluminum foil an aggregate structure of much cube orientation. As for non-oxidizing atmosphere, vacuum of 10-Torr or below and inert gas atmosphere of a dew point of -30 deg.C or lower are desirable.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、アルミニウム電解コ
ンデンサ用電極箔として用いられる電解コンデンサ電極
用アルミニウム材料の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing an aluminum material for electrolytic capacitor electrodes used as an electrode foil for aluminum electrolytic capacitors.

【0002】[0002]

【従来の技術及び解決しようとする課題】アルミニウム
電解コンデンサ用電極材として一般に用いられるAl箔
には、その実効面積を拡大して単位面積当たりの静電容
量を増大するため、通常、電気化学的あるいは化学的エ
ッチング処理が施される。
2. Description of the Related Art Al foil, which is generally used as an electrode material for aluminum electrolytic capacitors, usually has an electrochemical area because its effective area is enlarged to increase the capacitance per unit area. Alternatively, a chemical etching process is performed.

【0003】かかるエッチングの適性が優れている箔ほ
ど大きな拡面率が得られるが、このエッチング適性に対
して箔表面の酸化膜が大きな影響を及ぼすことが知られ
ている。
A foil having a better etching suitability has a larger surface expansion ratio, but it is known that an oxide film on the foil surface has a great influence on the etching suitability.

【0004】そして、最近では、上記酸化膜がエッチン
グを阻害する要因として作用する場合が多いことがわか
ってきており、エッチング処理中においては早く溶解除
去できた方が望ましいと考えられている。そのために
は、酸化膜は薄くてかつエッチング液(酸性水溶液)中
で溶解速度の速いことがより望ましいと推察される。
Recently, it has been found that the above oxide film often acts as a factor that inhibits etching, and it is considered desirable that the oxide film can be dissolved and removed early during the etching process. For that purpose, it is more desirable that the oxide film be thin and have a high dissolution rate in the etching solution (acidic aqueous solution).

【0005】しかしながら、箔製造工程においては一般
に、(100)占有率を向上させる目的で、高温加熱焼
鈍が実施されており、この焼鈍中に数nmの酸化膜の成
長が余儀無くされるため、この酸化膜がエッチングを阻
害する方向に作用する結果、静電容量の増大には限界が
あった。
However, in the foil manufacturing process, generally, high temperature annealing is carried out for the purpose of improving the (100) occupancy, and an oxide film of several nm is inevitably grown during this annealing. As a result of the oxide film acting in the direction of inhibiting etching, there is a limit to the increase in capacitance.

【0005】この発明は、かかる技術的背景に鑑みてな
されたものであって、静電容量を増大し得る電解コンデ
ンサ電極用アルミニウム材料の製造方法の提供を目的と
する。
The present invention has been made in view of the above technical background, and an object of the present invention is to provide a method for producing an aluminum material for an electrolytic capacitor electrode which can increase electrostatic capacitance.

【0006】[0006]

【課題を解決するための手段】上記目的を達成するため
に、発明者は鋭意研究の結果、焼鈍後の膜厚を薄くで
き、かつエッチング液中で速やかに溶解除去できる酸化
膜生成条件を見出だし、この発明を完成し得たものであ
る。
In order to achieve the above object, the inventor, as a result of diligent research, found that an oxide film forming condition that the film thickness after annealing can be made thin and can be rapidly dissolved and removed in an etching solution. The invention was completed and the invention was completed.

【0007】即ち、この発明は、アルミニウム箔の表面
層を除去する工程と、除去後、温度:40〜350℃、
露点:0〜80℃、時間:30〜1800秒の条件で加
熱酸化する工程と、加熱酸化後、非酸化性雰囲気で焼鈍
する工程を実施することを特徴とする電解コンデンサ電
極用アルミニウム材料の製造方法を要旨とする。
That is, according to the present invention, the step of removing the surface layer of the aluminum foil and the temperature after removal: 40 to 350 ° C.
Manufacture of an aluminum material for electrolytic capacitor electrodes, which comprises performing a step of heating and oxidizing under conditions of dew point: 0 to 80 ° C. and time: 30 to 1800 seconds and a step of annealing in a non-oxidizing atmosphere after heating and oxidizing The method is the gist.

【0008】上記アルミニウム箔は純度99.99%の
高純度のものが望ましいが、これに限定されることはな
く電解コンデンサに使用される範囲内の純度のものであ
れば良い。
The above-mentioned aluminum foil is preferably a high-purity aluminum alloy having a purity of 99.99%, but is not limited to this and may be any aluminum foil having a purity within the range used for electrolytic capacitors.

【0009】アルミニウム箔の表面層の除去は、箔表面
の不均一層を除去して、フレッシュな表面を露出させる
ことを目的として実施する。即ち、箔圧延後のアルミニ
ウム箔表面には、油分、圧延で形成された不均質な酸化
膜が存在する。また、アルミニウム箔の表面近傍には、
圧延変質層や圧延時のロールコーティング等による汚染
層が不均一に存在する。これらが次いで行う加熱酸化工
程での酸化膜の不均一性をもたらし、一様な薄い酸化膜
の生成を阻害する。従って、箔表面の不均一層を除去す
る。除去の具体的手段は特に限定するものではなく、一
例としてNaOH等のアルカリ溶液、酸溶液を用いた洗
浄を挙げ得る。表面層の除去は、その目的のためにはこ
れを厚さ1nm以上に亘って行うのが良く、特に5nm
以上とするのが良い。
The removal of the surface layer of the aluminum foil is carried out for the purpose of removing the non-uniform layer on the surface of the foil to expose a fresh surface. That is, oil and a heterogeneous oxide film formed by rolling exist on the aluminum foil surface after foil rolling. Also, near the surface of the aluminum foil,
There is a non-uniform contamination layer due to rolling deterioration or a roll coating during rolling. These cause non-uniformity of the oxide film in the subsequent thermal oxidation step, and hinder the formation of a uniform thin oxide film. Therefore, the non-uniform layer on the foil surface is removed. The specific means of removal is not particularly limited, and examples thereof include washing with an alkaline solution such as NaOH and an acid solution. For the purpose of removing the surface layer, it is preferable to perform it over a thickness of 1 nm or more, especially 5 nm.
The above is better.

【0010】箔表面層の除去後、低温、高露点、短時間
処理による加熱酸化工程を実施する。具体的には、温
度:40〜350℃、露点:0〜80℃、時間:30〜
1800秒の条件とする。かかる加熱酸化処理により、
箔の表面に、厚さ2.5nm以下(ハンターホール法)
あるいは3.3nm以下(ESCA法)の薄くてかつO
H基の含有率の多い酸化膜を生成するために実施するも
のである。このような酸化膜を形成しておくことで、次
段の焼鈍処理での酸化膜の成長を抑制できるとともに、
焼鈍後もOH基の含有率の多い酸化膜となしうる。そし
て、酸化膜中のOH基が多いと酸性水溶液からなるエッ
チング液に速く溶解するものと考えられる。しかしなが
ら、上記温度範囲、露点、加熱時間の各範囲を逸脱する
場合は、その目的を達成することができない。特に好ま
しい処理条件は、温度:40〜100℃、露点:20〜
80℃、時間:30〜120秒である。
After the removal of the foil surface layer, a heating and oxidation process is carried out by a low temperature, high dew point and short time treatment. Specifically, temperature: 40 to 350 ° C, dew point: 0 to 80 ° C, time: 30 to
The condition is 1800 seconds. By such heat oxidation treatment,
Thickness of 2.5 nm or less on the surface of the foil (Hunter hole method)
Alternatively, the thickness is 3.3 nm or less (ESCA method), and is thin.
This is carried out to form an oxide film having a high H group content. By forming such an oxide film, it is possible to suppress the growth of the oxide film in the subsequent annealing treatment, and
Even after annealing, an oxide film having a high OH group content can be obtained. It is considered that if the oxide film has a large number of OH groups, the oxide film dissolves quickly in an etching solution composed of an acidic aqueous solution. However, if the temperature, dew point, and heating time ranges deviate from the above ranges, the object cannot be achieved. Particularly preferable processing conditions are temperature: 40 to 100 ° C., dew point: 20 to
80 ° C., time: 30 to 120 seconds.

【0011】上記の加熱酸化処理後、焼鈍を実施する。
この焼鈍は、アルミニウム箔の組織を立方体方位を多く
有する集合組織にしてエッチング特性を向上させること
を主目的とするものである。この焼鈍は、さらなる酸化
膜の生成を抑制するとともに、酸化膜をOH基の含有率
の多い状態ままに維持すべく、非酸化性雰囲気で行う必
要がある。非酸化性雰囲気としては、10−4Torr
以下の真空とか露点−30℃以下の不活性ガス雰囲気を
挙げることができる。他の焼鈍条件は規定されることは
ないが、温度は350〜600℃、時間は5秒〜24時
間に設定するのが良い。このような条件で処理すること
により、酸化膜厚さを4.0nm以下(ハンターホール
法)あるいは4.8nm以下(ESCA法)の薄いもの
とすることができる。
After the above thermal oxidation treatment, annealing is carried out.
The main purpose of this annealing is to improve the etching characteristics by making the texture of the aluminum foil a texture having many cubic orientations. This annealing needs to be performed in a non-oxidizing atmosphere in order to suppress the formation of a further oxide film and maintain the oxide film in a state where the content of OH groups is high. The non-oxidizing atmosphere is 10 −4 Torr.
The following vacuum and an inert gas atmosphere with a dew point of −30 ° C. or lower can be mentioned. Other annealing conditions are not specified, but it is preferable to set the temperature to 350 to 600 ° C. and the time to 5 seconds to 24 hours. By treating under such conditions, the oxide film thickness can be made as thin as 4.0 nm or less (hunter hole method) or 4.8 nm or less (ESCA method).

【0012】上記により製作したアルミニウム材料は、
その後主として酸性液からなるエッチング液を用いて電
気化学的あるいは化学的エッチング処理したのち、電解
コンデンサ用電極材として使用する。エッチングに際し
て、箔表面の酸化膜は厚さが極めて薄いのみならず、多
くのOH基が含有された状態となされており、エッチン
グ液に速やかに溶解し、エッチングを阻害する不都合が
軽減され、深くて太いエッチングピットが形成される。
The aluminum material produced as described above is
After that, it is used as an electrode material for an electrolytic capacitor after being subjected to electrochemical or chemical etching treatment using an etching solution mainly composed of an acid solution. During etching, the oxide film on the foil surface is not only extremely thin, but also contains a large amount of OH groups, which quickly dissolves in the etching solution and reduces the inconvenience of inhibiting etching. And a thick etching pit is formed.

【0013】なお、この発明に用いるアルミニウム箔
は、その製造工程についてはこれを限定するものではな
く、圧延工程の途中において中間焼鈍されたものであっ
ても良い。
The aluminum foil used in the present invention is not limited to the manufacturing process thereof, and may be annealed in the middle of the rolling process.

【0014】[0014]

【作用】アルミニウム箔の表面除去後、低温、高露点、
短時間処理による加熱酸化工程を実施して焼鈍処理を行
うから、酸化膜の成長が抑制されて厚さの薄いものとな
るとともに、OH基を多く含んだ膜となり、これに起因
してエッチング液に速やかに溶解し、エッチングピット
の発生、成長を促進するものと推測される。
[Function] After removing the surface of the aluminum foil, low temperature, high dew point,
Since the annealing process is performed by performing the thermal oxidation process by the short-time process, the growth of the oxide film is suppressed and the thickness becomes thin, and the film contains a large amount of OH groups. It is presumed that it rapidly dissolves in water and promotes the generation and growth of etching pits.

【0015】[0015]

【実施例】純度99.99%のアルミニウムからなる厚
さ100μmの複数枚のアルミニウム箔を用意した。
Example A plurality of 100 μm thick aluminum foils made of aluminum having a purity of 99.99% were prepared.

【0016】そして各アルミニウム箔の表面を、0.0
1%NaOH溶液(30℃)を用いて洗浄した。洗浄に
よるアルミニウム箔の表面除去厚さは、いずれも10n
mであった。
Then, the surface of each aluminum foil is 0.0
It was washed with a 1% NaOH solution (30 ° C.). The surface removal thickness of the aluminum foil by washing is 10 n
It was m.

【0017】次に、各アルミニウム箔に対し表1に示す
条件で加熱酸化処理を行ったのち、続いて露点−30℃
のAr雰囲気中で温度:500℃、時間:6時間の最終
焼鈍を行った。加熱酸化処理後及び最終焼鈍後のハンタ
ーホール法による酸化膜厚さを表1に示す。
Next, each aluminum foil was subjected to a heat oxidation treatment under the conditions shown in Table 1, and then the dew point was -30 ° C.
The final annealing was performed in the Ar atmosphere at a temperature of 500 ° C. for a time of 6 hours. Table 1 shows the oxide film thickness by the Hunter Hall method after the heat oxidation treatment and after the final annealing.

【0018】こうして得られた各試料について、5%ホ
ウ酸液中で250Vに化成したときの静電容量を測定し
た。その結果を、試料No4の静電容量を100%とし
たときの相対比較にて表1に示す。
The capacitance of each of the samples thus obtained was measured when it was converted to 250 V in a 5% boric acid solution. The results are shown in Table 1 as a relative comparison when the capacitance of Sample No. 4 is 100%.

【0019】[0019]

【表1】 [Table 1]

【0020】表1の結果からわかるように、本発明範囲
の条件で加熱酸化処理を行った本発明実施品は、範囲を
逸脱する比較品に較べて大きな静電容量を有することが
分かる。これは、本発明実施品が、酸化膜の厚さが薄い
うえ、酸化膜中に多くのOH基が含まれているため、エ
ッチング時に酸化膜が速やかに溶解したためと推測され
る。
As can be seen from the results shown in Table 1, the product of the present invention, which has been subjected to the thermal oxidation treatment under the conditions of the range of the present invention, has a larger capacitance than the comparative product which deviates from the range. This is presumably because the product of the present invention has a thin oxide film and contains many OH groups in the oxide film, so that the oxide film was rapidly dissolved during etching.

【0021】[0021]

【発明の効果】この発明は、上述の次第で、アルミニウ
ム箔の表面層を除去する工程と、除去後、温度:40〜
350℃、露点:0〜80℃、時間:30〜1800秒
の条件で加熱酸化する工程と、加熱酸化後、非酸化性雰
囲気で焼鈍する工程を実施することを特徴とするから、
エッチング性能に優れ多数のエッチングピットを形成し
得て拡面率ひいては静電容量の大きな電解コンデンサ電
極材を提供することができる。
According to the present invention, depending on the above, the step of removing the surface layer of the aluminum foil, and the temperature after removal: 40 to 40
Since it is characterized by performing a step of heating and oxidizing under conditions of 350 ° C., dew point: 0 to 80 ° C., time: 30 to 1800 seconds, and a step of annealing in a non-oxidizing atmosphere after heating and oxidizing.
It is possible to provide an electrolytic capacitor electrode material having excellent etching performance, capable of forming a large number of etching pits, and having a large surface area ratio and thus a large capacitance.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 礒山 永三 堺市海山町6丁224番地 昭和アルミニウ ム 株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Inventor Isoyama Eizo 6-224, Kaiyamacho, Sakai City Showa Aluminum Co., Ltd.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 アルミニウム箔の表面層を除去する工程
と、 除去後、温度:40〜350℃、露点:0〜80℃、時
間:30〜1800秒の条件で加熱酸化する工程と、 加熱酸化後、非酸化性雰囲気で焼鈍する工程を実施する
ことを特徴とする電解コンデンサ電極用アルミニウム材
料の製造方法。
1. A step of removing the surface layer of the aluminum foil, a step of heating and oxidizing after the removal under the conditions of temperature: 40 to 350 ° C., dew point: 0 to 80 ° C., time: 30 to 1800 seconds, Then, a step of annealing in a non-oxidizing atmosphere is carried out, which is a method for manufacturing an aluminum material for electrolytic capacitor electrodes.
JP35502193A 1993-12-29 1993-12-29 Manufacture of aluminum material for electrolytic capacitor electrode Pending JPH07201673A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP35502193A JPH07201673A (en) 1993-12-29 1993-12-29 Manufacture of aluminum material for electrolytic capacitor electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35502193A JPH07201673A (en) 1993-12-29 1993-12-29 Manufacture of aluminum material for electrolytic capacitor electrode

Publications (1)

Publication Number Publication Date
JPH07201673A true JPH07201673A (en) 1995-08-04

Family

ID=18441442

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35502193A Pending JPH07201673A (en) 1993-12-29 1993-12-29 Manufacture of aluminum material for electrolytic capacitor electrode

Country Status (1)

Country Link
JP (1) JPH07201673A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006098445A1 (en) * 2005-03-17 2006-09-21 Showa Denko K.K. Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, process for producing electrolytic capacitor electrode material, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
JP2006291354A (en) * 2005-03-17 2006-10-26 Showa Denko Kk Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, anode material for aluminum electrolytic capacitor, process for producing anode material for electrolytic capacitor, and aluminum electrolytic capacitor
JP2007016281A (en) * 2005-07-07 2007-01-25 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
JP2007039733A (en) * 2005-08-02 2007-02-15 Showa Denko Kk Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, process for producing electrolytic capacitor electrode material, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
JP2007046137A (en) * 2005-08-12 2007-02-22 Showa Denko Kk Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, process for producing electrolytic capacitor electrode material, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
JP2011252229A (en) * 2005-03-17 2011-12-15 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, anode material for aluminum electrolytic capacitor, method for producing anode material for electrolytic capacitor, and aluminum electrolytic capacitor

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006098445A1 (en) * 2005-03-17 2006-09-21 Showa Denko K.K. Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, process for producing electrolytic capacitor electrode material, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
JP2006291354A (en) * 2005-03-17 2006-10-26 Showa Denko Kk Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, anode material for aluminum electrolytic capacitor, process for producing anode material for electrolytic capacitor, and aluminum electrolytic capacitor
JP2011252229A (en) * 2005-03-17 2011-12-15 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, anode material for aluminum electrolytic capacitor, method for producing anode material for electrolytic capacitor, and aluminum electrolytic capacitor
KR101283824B1 (en) * 2005-03-17 2013-07-08 쇼와 덴코 가부시키가이샤 Aluminum material for electrolytic capacitor electrode, electrolytic capacitor electrode material, and aluminum electrolytic capacitor
JP2014031586A (en) * 2005-03-17 2014-02-20 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, anode material for aluminum electrolytic capacitor, method for producing anode material for electrolytic capacitor, and aluminum electrolytic capacitor
JP2007016281A (en) * 2005-07-07 2007-01-25 Showa Denko Kk Method for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, method for producing electrode material for electrolytic capacitor, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
JP2007039733A (en) * 2005-08-02 2007-02-15 Showa Denko Kk Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, process for producing electrolytic capacitor electrode material, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor
JP2007046137A (en) * 2005-08-12 2007-02-22 Showa Denko Kk Process for producing aluminum material for electrolytic capacitor electrode, aluminum material for electrolytic capacitor electrode, process for producing electrolytic capacitor electrode material, anode material for aluminum electrolytic capacitor, and aluminum electrolytic capacitor

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