JPH07199168A - Liquid crystal optical element - Google Patents

Liquid crystal optical element

Info

Publication number
JPH07199168A
JPH07199168A JP33453093A JP33453093A JPH07199168A JP H07199168 A JPH07199168 A JP H07199168A JP 33453093 A JP33453093 A JP 33453093A JP 33453093 A JP33453093 A JP 33453093A JP H07199168 A JPH07199168 A JP H07199168A
Authority
JP
Japan
Prior art keywords
liquid crystal
optical element
crystal material
voltage
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP33453093A
Other languages
Japanese (ja)
Inventor
Tomohisa Goto
智久 五藤
Hideya Murai
秀哉 村井
Daisaku Nakada
大作 中田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP33453093A priority Critical patent/JPH07199168A/en
Publication of JPH07199168A publication Critical patent/JPH07199168A/en
Pending legal-status Critical Current

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  • Liquid Crystal (AREA)

Abstract

PURPOSE:To provide a liquid crystal optical element which is easily and precisely controllable in electro-optic characteristics, such as transmission and scattering, and is free from defects, such as air bubbles, within a driving plate. CONSTITUTION:This liquid crystal optical element is formed by holding a liquid crystal material between two sheets of substrates with electrode layers and at l.east one substrate thereof have projections 4 which scatter orientation of the liquid crystal. These projections 4 exist on the liquid crystal material 3 side of the substrates 1 and the directors of the liquid crystal material 3 are scattered by the three-dimensional hindrances of the projections 4, by which a scattered state is obtd. when voltage is not impressed to the element. The directors of the liquid crystal material 3 are unified in one direction by an electric field and, therefore, a transparent state is obtd. when the voltage is impressed to the element. The liquid crystal optical element of a guest-host type is obtainable as well by dispersing dichromatic dyestuff materials into the liquid crystal material.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、文字、図形等を表示す
る表示装置、入射光量を調節する調光ガラス、光シャッ
ター等に利用される、電界により光の透過−散乱等を制
御する液晶光学素子に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal for controlling transmission / scattering of light by an electric field, which is used for a display device for displaying characters, figures and the like, a light control glass for adjusting the amount of incident light, an optical shutter and the like. Regarding optical elements.

【0002】[0002]

【従来の技術】液晶表示素子は、従来、ネマチック液晶
を使用したTN型や、STN型のものが実用化されてい
る。また近年、強誘電液晶や反強誘電液晶の開発も行わ
れている。しかし、これらの液晶光学素子は偏光板を要
するため、明るさ、コントラストにおいて制限を受ける
という欠点を有している。
2. Description of the Related Art Conventionally, liquid crystal display elements of TN type or STN type using nematic liquid crystal have been put into practical use. In recent years, ferroelectric liquid crystals and anti-ferroelectric liquid crystals have been developed. However, since these liquid crystal optical elements require a polarizing plate, they have the drawback of being limited in brightness and contrast.

【0003】特表昭58−501631号公報に開示さ
れたカプセル化した液晶材料を、高分子樹脂中に分散す
る方法では、偏光板を要しないため光の利用効率が大き
いという利点を有している。この高分子分散液晶素子に
おいては、カプセル内の液晶材料の屈折率が電界の有無
によって変化することを利用し、カプセル材の屈折率を
電圧印加下の液晶材料の屈折率と等しく設定することに
より電圧印加下では透明へ、電圧を除いた時には光を散
乱し不透明となる光学素子が得られている。ここで高分
子物質としては、ポリビニルアルコール、ゼラチン等が
提案されている。しかし、これらは一方の基板上に高分
子分散液晶の膜をスピンコート等で作製した後、対向基
板を張り合わせて作製するため、多量の液晶材料が必要
であるとともに、膜厚の制御が難しい等の製造上の欠点
がある。また、カプセル化した液晶材料の粒径や粒径分
布の精密制御が困難なため、透過散乱特性を自由に制御
できないという欠点もある。
The method of dispersing the encapsulated liquid crystal material disclosed in Japanese Patent Publication No. 58-501631 in a polymer resin has the advantage of high light utilization efficiency because no polarizing plate is required. There is. In this polymer-dispersed liquid crystal element, by utilizing the fact that the refractive index of the liquid crystal material in the capsule changes depending on the presence or absence of an electric field, the refractive index of the capsule material is set equal to that of the liquid crystal material under voltage application. An optical element is obtained which becomes transparent when a voltage is applied and becomes opaque by scattering light when the voltage is removed. Here, polyvinyl alcohol, gelatin and the like have been proposed as the polymer substance. However, since these are manufactured by spin-coating a polymer-dispersed liquid crystal film on one substrate and then adhering the counter substrate, a large amount of liquid crystal material is required, and it is difficult to control the film thickness. There is a manufacturing defect. Further, since it is difficult to precisely control the particle size and particle size distribution of the encapsulated liquid crystal material, there is a drawback that the transmission and scattering characteristics cannot be freely controlled.

【0004】高分子材料と液晶材料の屈折率差を利用し
た同様の素子として、紫外線硬化性化合物中に液晶材料
を分散したものが知られている。特開昭63−2712
33号公報に開示された技術では液晶材料と紫外線硬化
性化合物の均一溶液をギャップの定まった基板間に注入
した後、紫外線照射により紫外線硬化性化合物を硬化さ
せて高分子分散液晶素子を得るため、膜厚を容易に制御
でき、大面積化が可能となるという利点を有している。
しかし、この開示技術においては、作製時の紫外線照射
による液晶材料の劣化や未硬化の紫外線硬化性化合物の
残存等より素子特性の信頼性に問題が残る。さらに、こ
の高分子分散液晶素子を構成する紫外線硬化性化合物は
紫外線硬化前の前駆体の状態では沸点が低く、減圧下で
基板間に注入した場合、蒸発を起こしてしまう。このた
め、液晶材料と紫外線硬化性化合物の組成比が変化し特
性が劣化する。また、この開示技術では常圧下での注入
に限定されるが、常圧下での注入は気泡の混入が避けら
れないという欠点がある。
As a similar device utilizing the difference in refractive index between a polymer material and a liquid crystal material, one in which a liquid crystal material is dispersed in an ultraviolet curable compound is known. JP-A-63-2712
According to the technique disclosed in Japanese Patent No. 33, a polymer-dispersed liquid crystal device is obtained by injecting a uniform solution of a liquid crystal material and an ultraviolet curable compound between substrates having a defined gap, and then curing the ultraviolet curable compound by ultraviolet irradiation. Further, it has an advantage that the film thickness can be easily controlled and the area can be increased.
However, in this disclosed technique, there remains a problem in reliability of device characteristics due to deterioration of the liquid crystal material due to irradiation of ultraviolet rays at the time of manufacturing, remaining of an uncured ultraviolet curable compound, and the like. Furthermore, the UV-curable compound that constitutes this polymer-dispersed liquid crystal element has a low boiling point in the precursor state before UV-curing, and will evaporate when injected between substrates under reduced pressure. Therefore, the composition ratio of the liquid crystal material and the ultraviolet curable compound changes, and the characteristics deteriorate. Further, in the disclosed technique, the injection is limited to normal pressure, but the injection under normal pressure has a drawback that air bubbles cannot be avoided.

【0005】[0005]

【発明が解決しようとする課題】本発明は以上の従来技
術を鑑みてなされたものであり、本発明の目的は、透過
散乱または透過吸収特性を自由にかつ高度に制御できる
液晶光学素子を提供することである。さらに、本発明の
目的はギャップの定まった空パネルに減圧下で液晶材料
を注入するという簡易な手段で製造できる素子を提供す
ることにある。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned prior art, and an object of the present invention is to provide a liquid crystal optical element capable of freely and highly controlling transmission / scattering or transmission / absorption characteristics. It is to be. Further, an object of the present invention is to provide an element which can be manufactured by a simple means of injecting a liquid crystal material into an empty panel having a fixed gap under reduced pressure.

【0006】[0006]

【課題を解決するための手段】本発明は、液晶材料が二
枚の電極層付き基板間に挟持された液晶光学素子におい
て、少なくとも一方の基板が突起物を有することを特徴
とする液晶光学素子に関する。
SUMMARY OF THE INVENTION The present invention is a liquid crystal optical element in which a liquid crystal material is sandwiched between two substrates with electrode layers, at least one of the substrates having a projection. Regarding

【0007】なお、本発明は、基板の調光部に、液晶の
配向を乱す突起物を有することを特徴とした透過散乱あ
るいは透過吸収型の液晶光学素子であり、特開平5−2
41133号公報等に開示された位相格子に関する技術
や、特開平5−107527号公報や特開平5−232
452号公報等に開示された画素の隔壁に関する技術と
は異なることを、以下に説明する。
The present invention is a transmission-scattering or transmission-absorption type liquid crystal optical element characterized in that the light control section of the substrate has a projection that disturbs the alignment of the liquid crystal.
A technique relating to a phase grating disclosed in Japanese Patent No. 41133, etc., Japanese Patent Laid-Open No. 5-107527 and Japanese Patent Laid-Open No. 5-232.
What is different from the technique relating to the partition wall of the pixel disclosed in Japanese Patent No. 452 etc. will be described below.

【0008】本発明に使用される液晶材料としては、ネ
マチック液晶、スメクチック液晶が使用できる。また、
光散乱を増大させるためにカイラルネマチック液晶を用
いることもできし、印加周波数により△εの符号が変わ
る2周波駆動液晶でも構わない。2色性色素を混入した
ゲスト−ホスト型も可能である。
As the liquid crystal material used in the present invention, nematic liquid crystal and smectic liquid crystal can be used. Also,
A chiral nematic liquid crystal may be used to increase light scattering, or a dual frequency drive liquid crystal whose sign of Δε changes depending on the applied frequency may be used. A guest-host type in which a dichroic dye is mixed is also possible.

【0009】本発明に使用される二枚の電極層付き基板
は少なくとも一方がガラス、プラスチック等の透明性を
有するものであれば良く、もう一方の基板は光反射板あ
るいは光吸収板を兼ねているものでも構わない。また、
液晶材料と接する基板表面は突起物表面の配向処理と同
様に配向処理を行うこともできるし、突起物とは別に異
なる配向処理をすることもできる。
At least one of the two substrates with electrode layers used in the present invention may be one having transparency such as glass or plastic, and the other substrate also serves as a light reflecting plate or a light absorbing plate. It doesn't matter what you have. Also,
The surface of the substrate that is in contact with the liquid crystal material may be subjected to the same alignment treatment as that of the surface of the protrusion, or may be subjected to an alignment treatment different from the protrusion.

【0010】電極層としてはITO(インジウム−スズ
−酸化物)等の透明性の高い材料が利用できるが、光反
射材料または光吸収材料が導電性を有している場合はこ
れらを電極として利用することもできる。この場合には
電極層は調光層と密着した状態で設置されている。
As the electrode layer, a highly transparent material such as ITO (indium-tin-oxide) can be used, but when the light reflecting material or the light absorbing material has conductivity, these are used as the electrode. You can also do it. In this case, the electrode layer is placed in close contact with the light control layer.

【0011】光反射板を使用する場合、光反射板は光を
反射する材料で構成されていれば無機材料でも有機材料
でも構わない。また、反射強度または反射波長は目的と
する素子特性により任意に変更できる。その構造は光反
射材料が光反射板全体を形成しているものであっても良
いし、光反射材料が別の材質の基板上にコーティングさ
れていても良い。
When a light reflecting plate is used, the light reflecting plate may be an inorganic material or an organic material as long as it is made of a material that reflects light. Further, the reflection intensity or the reflection wavelength can be arbitrarily changed according to the intended element characteristics. The structure may be such that the light reflecting material forms the entire light reflecting plate, or the light reflecting material may be coated on a substrate made of another material.

【0012】光吸収板を使用する場合、光吸収板は光を
吸収する材料で構成されていれば無機材料でも有機材料
でも構わない。吸収強度または吸収波長は目的とする素
子特性により任意に変更できる。その構造は光吸収材料
が光吸収板全体を形成しているものであっても良いし、
光吸収材料が別の材質の基板上にコーティングされてい
ても良い。
When the light absorbing plate is used, the light absorbing plate may be an inorganic material or an organic material as long as it is made of a material that absorbs light. The absorption intensity or the absorption wavelength can be arbitrarily changed according to the intended device characteristics. The structure may be such that the light absorbing material forms the entire light absorbing plate,
The light absorbing material may be coated on a substrate made of another material.

【0013】基板の間隔設定には、通常の液晶デバイス
に用いられるスペーサーを使用することもができるし、
突起物自体を利用することもできる。その間隔は、3μ
m〜50μm程度が望ましい。
Spacers used in ordinary liquid crystal devices can be used to set the distance between the substrates,
The protrusion itself can also be used. The interval is 3μ
It is preferably about m to 50 μm.

【0014】また、本発明の液晶光学素子をディスプレ
イとして使用する場合は、白黒表示の他、カラーフィル
ターを用いてカラー化することもできる。
When the liquid crystal optical element of the present invention is used as a display, not only black and white display but also color display using a color filter is possible.

【0015】本発明の液晶光学素子の駆動方法としては
単純マトリックス方式の他、TFT、MIM等の制御素
子を用いたアクティブマトリックス方式によることも可
能である。
As a method of driving the liquid crystal optical element of the present invention, an active matrix method using a control element such as TFT or MIM can be used in addition to the simple matrix method.

【0016】本発明の液晶光学素子において、突起物は
基板の液晶材料と接する側に位置し、また基板の調光部
に位置する。電圧無印加時では液晶材料のダイレクター
が突起物の立体障害により乱され結果として散乱状態が
得られ、電圧印加時には電界により液晶材料のダイレク
ターは一方向に揃うため透明状態が得られる。なお、本
発明では少なくとも一方の基板が突起物を有していれば
良いが、二枚の基板が突起物を有していても良い。この
際、二枚の基板上の突起物が連結していても構わない。
また、突起物の数、密度、位置、規則性、不規則性は液
晶のダイレクターの配向が乱されるように決定されてい
れば特に限定されない。さらに突起物は基板の光透過部
あるいは液晶材料の駆動部だけでなく、光が透過しない
部分や液晶材料が駆動しない部分にあっても問題はな
い。
In the liquid crystal optical element of the present invention, the protrusion is located on the side of the substrate which is in contact with the liquid crystal material, and is also located on the light control section of the substrate. When no voltage is applied, the director of the liquid crystal material is disturbed by the steric hindrance of the projections, and as a result, a scattering state is obtained. When a voltage is applied, the director of the liquid crystal material is aligned in one direction by the electric field, and thus a transparent state is obtained. In the present invention, at least one of the substrates needs to have a protrusion, but two substrates may have a protrusion. At this time, the protrusions on the two substrates may be connected.
Further, the number, density, position, regularity, and irregularity of the protrusions are not particularly limited as long as they are determined so that the orientation of the director of the liquid crystal is disturbed. Further, there is no problem if the protrusion is not only in the light transmitting portion of the substrate or the driving portion of the liquid crystal material, but also in the portion where light is not transmitted or the portion where the liquid crystal material is not driven.

【0017】本発明の突起物の形状および表面の凹凸は
液晶材料の配向を乱すことができれば任意のものが選択
できる。形状としては例えば円錐形、円柱形、立方体、
直方体、四角錘、三角錘等があるがこの限りでは無い。
また、液晶の配向を乱すという点から、側面に凹凸を有
する突起物が好ましく、この凹凸は必ずしも周期的であ
る必要はない。
The shape and surface irregularities of the protrusions of the present invention can be selected arbitrarily as long as they can disturb the alignment of the liquid crystal material. As the shape, for example, a conical shape, a cylindrical shape, a cube,
There are rectangular parallelepiped, quadrangular pyramid, triangular pyramid, etc., but not limited to this.
Further, from the viewpoint of disturbing the alignment of the liquid crystal, it is preferable to use a protrusion having unevenness on the side surface, and this unevenness does not necessarily have to be periodic.

【0018】突起物は必ずしも、基板に対し垂直に位置
する必要は無く、傾いて位置しても構わない。突起物の
高さは、特に限定されず、基板のギャップと同一であっ
ても良く、それ以下であっても良い。また、高さは均一
である必要はない。突起物の径も限定されないが、基板
のギャップ以下であることが望ましい。
The protrusion does not necessarily have to be positioned perpendicular to the substrate, but may be tilted. The height of the protrusion is not particularly limited, and may be the same as the gap of the substrate or may be less than that. Also, the height does not have to be uniform. Although the diameter of the protrusion is not limited, it is preferably equal to or smaller than the gap of the substrate.

【0019】突起物の材質は無機物であっても有機物で
あってもよく、屈折率は必ずしも液晶材料の常光屈折率
あるいは異常光屈折率に合わせる必要は無い。また、必
ずしも光学的に透明である必要は無く、絶縁体でも導電
体でも構わない。さらに、突起物は一成分の化合物から
形成されていても良く、強度、基板との密着性向上等の
ため複合体や層状物とであっても構わない。
The material of the protrusion may be an inorganic material or an organic material, and the refractive index does not necessarily need to match the ordinary or extraordinary refractive index of the liquid crystal material. Further, it does not necessarily have to be optically transparent, and may be an insulator or a conductor. Furthermore, the protrusions may be formed of a one-component compound, and may be a composite or a layered product for the purpose of improving strength, adhesion to a substrate, and the like.

【0020】突起物の形成方法としては、印刷法、蒸着
法、スッパッタ法、モレキュラービームエピタキシャル
(MBE)法等、各種の方法が可能であるが、特にレジ
スト法によるのが好ましい。レジスト法としては、レジ
スト材料の耐ドライエッチング特性を利用しガラス等の
他の材料を加工して突起を形成しても良いし、加工した
レジスト材料そのものを突起物として使用しても構わな
い。レジスト材料としてはフォトレジスト材料、ディー
プUV用レジスト材料、電子線用レジスト材料等いずれ
の材料も使用でき、また、ネガ型であってもポジ型であ
っても構わない。
As the method of forming the protrusions, various methods such as a printing method, a vapor deposition method, a sputter method, and a molecular beam epitaxial (MBE) method can be used, but a resist method is particularly preferable. As the resist method, the dry etching resistance of the resist material may be used to process another material such as glass to form the protrusions, or the processed resist material itself may be used as the protrusions. As the resist material, any of a photoresist material, a deep UV resist material, an electron beam resist material and the like can be used, and it may be a negative type or a positive type.

【0021】レジスト材料としては、一般に市販されて
いるものが使用できる。例えばネガ型フォトレジストと
しては、ポリメチルイソプロペニルケトン+ビスアジ
ド、ポリビニルフェノール+ビスアジド等が、ネガ型デ
ィープレジストとしてはポリクロルスチレン、ポリ(4
−アセトキシメチルスチレン−co−ビニルフェノー
ル)+オニウム塩等が、ネガ型電子線レジストとして
は、ポリグリシジルメタクリレート、ポリ(ジアリル−
o−フタレート)、ポリ(2、3−ジクロロプロピルア
クリレート)等が、ポジ型フォトレジストとしては、o
−キノンジアジド+ノボラック等が、ポジ型ディープレ
ジストとしては、ポリメチルメタクリレート、ポリメチ
ルイソプロペニルケトン、ポリ t−ブチルイソプロペ
ニルケトン等が、ポジ型電子線レジストとしては、ポリ
(ヘキサフルオロブチルアクリレート)、ポリ(エチル
α−シアノアクリレート)、ポリ(α−メチルスチレ
ン)等がある。
As the resist material, commercially available products can be used. For example, negative photoresists include polymethylisopropenyl ketone + bisazide, polyvinylphenol + bisazide, and the like, and negative photoresists include polychlorostyrene and poly (4).
-Acetoxymethylstyrene-co-vinylphenol) + onium salt and the like are used as negative electron beam resists such as polyglycidyl methacrylate and poly (diallyl-
o-phthalate), poly (2,3-dichloropropyl acrylate), etc.
-Quinonediazide + novolak, positive-type deep resist, polymethylmethacrylate, polymethylisopropenylketone, poly-t-butylisopropenylketone, etc., positive-type electron beam resist, poly (hexafluorobutylacrylate), Examples include poly (ethyl α-cyanoacrylate) and poly (α-methylstyrene).

【0022】本発明の調光部とは、基板中で、透過散
乱、透過吸収等の光学特性に寄与する部分を示し、さら
に詳しくは、液晶材料に電界がかかる電極部分を示す。
例えば、ITO等の透明電極部がある。またTFTで使
用されるブラックマトリックス等の光遮蔽部は調光部と
は異なる。
The light control section of the present invention refers to a portion of the substrate that contributes to optical characteristics such as transmission and scattering and transmission and absorption, and more specifically, refers to an electrode portion to which an electric field is applied to the liquid crystal material.
For example, there is a transparent electrode portion such as ITO. In addition, the light shielding portion such as the black matrix used in the TFT is different from the light control portion.

【0023】本発明では、突起物の配向処理を行うこと
により、散乱特性に優れ、コントラストが向上した液晶
光学素子を得ることができ、配向剤の種類は素子の特性
を考慮して任意に選択できる。配向の方向は、使用され
る液晶材料の誘電率異方性あるいは突起物の形状等によ
り任意に選択できる。処理プロセスは溶液塗布、プラズ
マ重合、スパッタリング等がある。配向剤は大きく分け
て垂直配向剤と水平配向剤がある。例えば、垂直配向剤
としては、レシチン、ステアリン酸、ヘキサデシルトリ
メチルアンモニウムブロマイド、オクタデシルアミンハ
イドロクロライド、ミリスチン酸クロム錯体、パーフル
オロノナン酸クロム錯体、ヘキサメチルジシロキサン、
パーフルオロジメチルジシクロヘキサン、テトラフルオ
ロエチレン、ポリテトラフルオロエチレン等が、水平配
向剤としては、カーボン、ポリオキシエチレン、ポリビ
ニルアルコール、ポリイミド、ブラシル酸クロム錯体、
アセチレン等がある。また配向剤として、上記のものの
他、一般に市販されているものをそのまま使用できる。
In the present invention, a liquid crystal optical element having excellent scattering characteristics and improved contrast can be obtained by subjecting the projections to an alignment treatment, and the type of the aligning agent is arbitrarily selected in consideration of the characteristics of the elements. it can. The orientation direction can be arbitrarily selected depending on the dielectric anisotropy of the liquid crystal material used, the shape of the protrusions, or the like. Treatment processes include solution coating, plasma polymerization, sputtering and the like. The aligning agent is roughly classified into a vertical aligning agent and a horizontal aligning agent. For example, as the vertical alignment agent, lecithin, stearic acid, hexadecyltrimethylammonium bromide, octadecylamine hydrochloride, chromium myristate complex, chromium perfluorononanoate complex, hexamethyldisiloxane,
Perfluorodimethyldicyclohexane, tetrafluoroethylene, polytetrafluoroethylene, etc., as the horizontal aligning agent, carbon, polyoxyethylene, polyvinyl alcohol, polyimide, chromium brassylic acid complex,
There is acetylene. Further, as the aligning agent, in addition to the above-mentioned ones, those generally commercially available can be used as they are.

【0024】[0024]

【作用】本発明の液晶光学素子によれば、透過散乱また
は透過吸収等の特性を自由にかつ高度に制御することが
できる。さらに、本発明の液晶光学素子においては、減
圧下で液晶材料を注入することができるため簡易にかつ
気泡等の欠陥の無い均一な素子が製造できる。
According to the liquid crystal optical element of the present invention, the characteristics such as transmission scattering or transmission absorption can be controlled freely and highly. Further, in the liquid crystal optical element of the present invention, since the liquid crystal material can be injected under reduced pressure, it is possible to easily manufacture a uniform element having no defects such as bubbles.

【0025】[0025]

【実施例】以下、本発明を実施例を用いて詳細に説明す
るが、本発明はその要旨を越えない限り以下の実施例に
限定されるものではない。
EXAMPLES The present invention will now be described in detail with reference to examples, but the present invention is not limited to the following examples as long as the gist thereof is not exceeded.

【0026】(実施例1)インジウム−スズ−酸化物
(ITO)付きガラス基板に、ポリメチルイソプロペニ
ルケトンと2,6−ジ−(4´アジドベンザル)シクロ
ヘキサノンのエチルセルソルブアセテート溶液(濃度1
0%)をスピンコートし、厚さ5μmの膜を得た。ディ
ープUV露光機(キャノン製PLA−501F)を用い
てフォトリソグラフィーを行った。マスクは2μmφの
パターンでピッチは5μmのクロミウムマスクを用い、
現像液にはメチルエチルケトンを用いた。電子顕微鏡写
真より、得られた突起物はマスクのパターンを写し取っ
た円柱体であることが確認できた。対向基板も同様の方
法で作製した。作製した二枚の基板を12μmのスペー
サーを介して張り合わせて空セルを作製し、20mmT
orrの減圧下で正の誘電異方性を持つネマチック液晶
材料TL205(メルク社製:常光屈折率=1.52
7、異常光屈折率=1.744、N−I転移点=87.
4℃ )を注入して作製した。素子の駆動面内には気泡
は全く観察されなかった。
Example 1 On a glass substrate with indium-tin-oxide (ITO), a solution of polymethylisopropenyl ketone and 2,6-di- (4'azidobenzal) cyclohexanone in ethylcellosolve acetate (concentration 1
0%) was spin-coated to obtain a film having a thickness of 5 μm. Photolithography was performed using a deep UV exposure machine (PLA-501F manufactured by Canon). The mask is a 2 μmφ pattern and a 5 μm pitch chromium mask is used.
Methyl ethyl ketone was used as the developing solution. From the electron micrograph, it was confirmed that the obtained protrusions were cylindrical bodies in which the mask pattern was copied. The counter substrate was also manufactured by the same method. The two substrates thus produced are bonded together via a 12 μm spacer to produce an empty cell, and the 20 mmT
Nematic liquid crystal material TL205 (manufactured by Merck & Co., Inc .: ordinary light refractive index = 1.52) having a positive dielectric anisotropy under a reduced pressure of orr.
7, extraordinary light refractive index = 1.744, NI transition point = 87.
4 ° C.) was injected. No bubbles were observed in the driving surface of the device.

【0027】作製した液晶光学素子の電気光学特性は、
光源としてHe−Neレーザー、検出器としてフォトダ
イオードを用いて測定した。測定系のF値は15であっ
た。素子には矩形交流電圧(周波数1kHz)を印加し
た。25℃での駆動電圧は6.5Vで、ヒステリシスは
0.1Vであった。電圧無印加時の光透過率は1%で、
電圧印加時の飽和透過率は80%でコントラストは80
であった。電圧オン時(10V)の応答時間は15ms
で、電圧OFF時は20msであった。素子の電荷保持
率は95%であった。
The electro-optical characteristics of the produced liquid crystal optical element are as follows.
The measurement was carried out using a He-Ne laser as a light source and a photodiode as a detector. The F value of the measurement system was 15. A rectangular alternating voltage (frequency 1 kHz) was applied to the element. The driving voltage at 25 ° C. was 6.5 V, and the hysteresis was 0.1 V. Light transmittance is 1% when no voltage is applied,
When the voltage is applied, the saturated transmittance is 80% and the contrast is 80.
Met. The response time when the voltage is on (10V) is 15ms
Then, it was 20 ms when the voltage was OFF. The charge retention rate of the device was 95%.

【0028】(実施例2)インジウム−スズ−酸化物
(ITO)付きガラス基板に、ポリメチルメタクリレー
トと2,6−ジ−(4´アジドベンザル)シクロヘキサ
ノンのエチルセルソルブアセテート溶液(濃度10%)
をスピンコートし、厚さ5μmの膜を得た。ディープU
V露光機(キャノン製PLA−501F)を用いてフォ
トリソグラフィーを行った。マスクは2μm角のパター
ンでピッチは5μmのクロミウムマスクを用い、現像液
にはメチルイソブチルケトンとイソプロパノールの混合
液を用いた。電子顕微鏡写真より、得られた突起物はマ
スクのパターンを写し取った直方体であることが確認で
きた。対向基板も同様の方法で作製した。作製した二枚
の基板を12μmのスペーサーを介して張り合わせて空
セルを作製し、20mmTorrの減圧下で正の誘電異
方性を持つネマチック液晶材料RDP71120−1
(ロディック社製:常光屈折率=1.511、異常光屈
折率=1.725、N−I転移点=90.4℃ )を注
入した。作製した素子の駆動面内には気泡は全く観察さ
れなかった。
Example 2 On a glass substrate with indium-tin-oxide (ITO), a solution of polymethylmethacrylate and 2,6-di- (4'azidobenzal) cyclohexanone in ethylcellosolve acetate (concentration 10%).
Was spin-coated to obtain a film having a thickness of 5 μm. Deep U
Photolithography was performed using a V exposure machine (PLA-501F made by Canon). The mask used was a chromium mask having a pattern of 2 μm square and a pitch of 5 μm, and a mixed solution of methyl isobutyl ketone and isopropanol was used as a developing solution. From the electron micrograph, it was confirmed that the obtained protrusion was a rectangular parallelepiped in which the mask pattern was copied. The counter substrate was also manufactured by the same method. A nematic liquid crystal material RDP71120-1 having a positive dielectric anisotropy under a reduced pressure of 20 mmTorr is produced by adhering the two produced substrates together via a 12 μm spacer.
(Manufactured by Rodick: ordinary light refractive index = 1.511, extraordinary light refractive index = 1.725, NI transition point = 90.4 ° C.) was injected. No bubbles were observed in the driving surface of the manufactured device.

【0029】作製した液晶光学素子の電気光学特性は実
施例1と同様の測定系で測定した。25℃での駆動電圧
は5Vで、ヒステリシスは0.07Vであった。電圧無
印加時の光透過率は2%で、電圧印加時の飽和透過率は
78%でコントラストは39であった。電圧オン時(7
V印加)の応答時間は25msで、電圧オフ時は20m
sであった。素子の電荷保持率は90%を示した。
The electro-optical characteristics of the produced liquid crystal optical element were measured by the same measurement system as in Example 1. The driving voltage at 25 ° C. was 5V, and the hysteresis was 0.07V. The light transmittance when no voltage was applied was 2%, the saturated transmittance when a voltage was applied was 78%, and the contrast was 39. When voltage is on (7
V application) has a response time of 25 ms and 20 m when the voltage is off.
It was s. The charge retention of the device was 90%.

【0030】(実施例3)一方の基板にアルミ板を使用
する以外は実施例2と同様の方法で突起物を有した基板
を作製した。次に二枚の基板の表面(突起物を有した
面)に垂直配向剤であるレシチンを塗布した。この二枚
の基板を12μmのスペーサーを介して張り合わせて空
セルを作製し、20mmTorrの減圧下で正の誘電異
方性を持つネマチック液晶材料TL202(メルク社
製:常光屈折率=1.511、異常光屈折率=1.72
5、N−I転移点=90.4℃)98wt%と二色性色
素S344(三井東圧社製)2wt%の混合物を注入し
た。作製した素子の駆動面内には気泡は全く観察されな
かった。
(Example 3) A substrate having a protrusion was produced in the same manner as in Example 2 except that an aluminum plate was used for one substrate. Next, lecithin, which is a vertical aligning agent, was applied to the surfaces of the two substrates (the surfaces having the protrusions). These two substrates were bonded together via a 12 μm spacer to form an empty cell, and a nematic liquid crystal material TL202 (manufactured by Merck: ordinary light refractive index = 1.511) having a positive dielectric anisotropy under a reduced pressure of 20 mmTorr. Extraordinary light refractive index = 1.72
5, a mixture of 98 wt% of N-I transition point = 90.4 ° C.) and 2 wt% of dichroic dye S344 (manufactured by Mitsui Toatsu) was injected. No bubbles were observed in the driving surface of the manufactured device.

【0031】作製した液晶光学素子の反射特性の測定
は、光源としてD光源、検出器としてBM−5輝度計を
用いて行った。素子には矩形交流電圧(周波数1kH
z)を印加した。25℃での駆動電圧は10Vであっ
た。電圧無印加時の光反射率は1%(硫酸バリウム標準
白色板を100%とする)、電圧印加時の光反射率は1
5%でコントラストは15であった。ヒステリシスは
0.10Vであった。。電圧オン時(12V印加)の応
答時間は30msで、電圧オフ時は25msであった。
素子の電荷保持率は93%を示した。
The reflection characteristics of the produced liquid crystal optical element were measured using a D light source as a light source and a BM-5 luminance meter as a detector. Rectangular AC voltage (frequency 1kHz)
z) was applied. The driving voltage at 25 ° C. was 10V. The light reflectance when no voltage is applied is 1% (barium sulfate standard white plate is 100%), and the light reflectance when voltage is applied is 1
The contrast was 15 at 5%. The hysteresis was 0.10V. . The response time when the voltage was on (12 V applied) was 30 ms, and when the voltage was off, it was 25 ms.
The charge retention of the device was 93%.

【0032】(実施例4)突起物の高さを6μmとする
以外は実施例2と同様の方法で突起物を有した基板を作
製した。作製した二枚の基板を12μmのスペーサーを
介して張り合わせて空セルを作製し、20mmTorr
の減圧下で正の誘電異方性を持つカイラルネマチック液
晶材料(GR−63(チッソ社製:常光屈折率=1.5
25、異常光屈折率=1.748)、カイラルドーパン
トCM−33(チッソ社製)の混合物。ドーパント濃度
5%)を注入した。作製した素子の駆動面内には気泡は
全く観察されなかった。
Example 4 A substrate having projections was prepared in the same manner as in Example 2 except that the height of the projections was 6 μm. The two substrates thus prepared are bonded together via a 12 μm spacer to form an empty cell, and the empty cell is prepared at 20 mmTorr.
Chiral nematic liquid crystal material having positive dielectric anisotropy under reduced pressure (GR-63 (manufactured by Chisso Corporation: ordinary light refractive index = 1.5
25, extraordinary light refractive index = 1.748), a mixture of chiral dopant CM-33 (manufactured by Chisso Corporation). (Dopant concentration 5%). No bubbles were observed in the driving surface of the manufactured device.

【0033】作製した液晶光学素子の電気光学特性は実
施例1と同様の測定系で測定した。25℃での駆動電圧
は12Vで、ヒステリシスは0.25Vであった。電圧
無印加時の光透過率は0.3%で、電圧印加時の飽和透
過率は55%でコントラストは183であった。電圧オ
ン時(15V印加)の応答時間は25msで、電圧オフ
時は20msであった。
The electro-optical characteristics of the produced liquid crystal optical element were measured by the same measurement system as in Example 1. The driving voltage at 25 ° C. was 12V, and the hysteresis was 0.25V. The light transmittance when no voltage was applied was 0.3%, the saturated transmittance when voltage was applied was 55%, and the contrast was 183. The response time when the voltage was on (15 V applied) was 25 ms, and when the voltage was off, it was 20 ms.

【0034】(比較例1)突起物が無い以外は、実施例
1と同様の液晶光学素子を作製し、電気光学特性を測定
した。その結果、電圧オフ状態での散乱強度は弱く、コ
ントラストは2以下であった。
(Comparative Example 1) A liquid crystal optical element similar to that of Example 1 was prepared except that there were no protrusions, and the electro-optical characteristics were measured. As a result, the scattering intensity in the voltage-off state was weak and the contrast was 2 or less.

【0035】[0035]

【発明の効果】以上説明したように、本発明によれば、
透過散乱および透過吸収等の特性を高度にかつ自由に制
御することができる。さらに、減圧下で液晶材料を注入
することができるため気泡の無い均一な素子が作製でき
る。
As described above, according to the present invention,
Properties such as transmission scattering and transmission absorption can be controlled highly and freely. Furthermore, since the liquid crystal material can be injected under reduced pressure, a uniform element without bubbles can be manufactured.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の液晶光学素子の断面図である。FIG. 1 is a sectional view of a liquid crystal optical element of the present invention.

【図2】本発明の実施例1に係わる液晶光学素子の光透
過率のグラフである。
FIG. 2 is a graph of light transmittance of the liquid crystal optical element according to Example 1 of the present invention.

【符号の説明】[Explanation of symbols]

1 基板 2 電極層 3 液晶材料 4 突起物 5 スペーサー 1 Substrate 2 Electrode Layer 3 Liquid Crystal Material 4 Projection 5 Spacer

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 液晶材料が二枚の電極層付き基板間に挟
持された液晶光学素子において、少なくとも一方の基板
が液晶の配向を乱す突起物を有することを特徴とする液
晶光学素子。
1. A liquid crystal optical element in which a liquid crystal material is sandwiched between two substrates with electrode layers, wherein at least one substrate has a protrusion that disturbs the alignment of liquid crystals.
【請求項2】 突起物が基板の調光部にあることを特徴
とする請求項1記載の液晶光学素子。
2. The liquid crystal optical element according to claim 1, wherein the protrusion is provided on the light control section of the substrate.
【請求項3】 突起物が配向処理されていることを特徴
とする請求項1、2記載の液晶光学素子。
3. The liquid crystal optical element according to claim 1, wherein the protrusions are oriented.
【請求項4】 電極層付き基板の少なくとも一方が配向
処理されていることを特徴とする請求項1、2、3記載
の液晶光学素子。
4. The liquid crystal optical element according to claim 1, wherein at least one of the substrates with electrode layers is subjected to alignment treatment.
JP33453093A 1993-12-28 1993-12-28 Liquid crystal optical element Pending JPH07199168A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP33453093A JPH07199168A (en) 1993-12-28 1993-12-28 Liquid crystal optical element

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP33453093A JPH07199168A (en) 1993-12-28 1993-12-28 Liquid crystal optical element

Publications (1)

Publication Number Publication Date
JPH07199168A true JPH07199168A (en) 1995-08-04

Family

ID=18278438

Family Applications (1)

Application Number Title Priority Date Filing Date
JP33453093A Pending JPH07199168A (en) 1993-12-28 1993-12-28 Liquid crystal optical element

Country Status (1)

Country Link
JP (1) JPH07199168A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100794889B1 (en) * 2000-03-27 2008-01-14 휴렛-팩커드 컴퍼니(델라웨어주법인) Liquid crystal alignment

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6278530A (en) * 1985-10-02 1987-04-10 Seiko Epson Corp Liquid crystal display unit
JPH04250418A (en) * 1991-01-28 1992-09-07 Nec Corp Liquid crystal optical element and its manufacture

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6278530A (en) * 1985-10-02 1987-04-10 Seiko Epson Corp Liquid crystal display unit
JPH04250418A (en) * 1991-01-28 1992-09-07 Nec Corp Liquid crystal optical element and its manufacture

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100794889B1 (en) * 2000-03-27 2008-01-14 휴렛-팩커드 컴퍼니(델라웨어주법인) Liquid crystal alignment

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