JPH0719488B2 - Method for producing copper plated fine pitch heat seal connector member based on copper vapor deposition film - Google Patents

Method for producing copper plated fine pitch heat seal connector member based on copper vapor deposition film

Info

Publication number
JPH0719488B2
JPH0719488B2 JP14427992A JP14427992A JPH0719488B2 JP H0719488 B2 JPH0719488 B2 JP H0719488B2 JP 14427992 A JP14427992 A JP 14427992A JP 14427992 A JP14427992 A JP 14427992A JP H0719488 B2 JPH0719488 B2 JP H0719488B2
Authority
JP
Japan
Prior art keywords
copper
film
powder
weight
plated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP14427992A
Other languages
Japanese (ja)
Other versions
JPH05342916A (en
Inventor
勝弘 村田
光正 芝田
哲也 直木
忠昭 磯野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Graphite Industries Ltd
Original Assignee
Nippon Graphite Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Graphite Industries Ltd filed Critical Nippon Graphite Industries Ltd
Priority to JP14427992A priority Critical patent/JPH0719488B2/en
Publication of JPH05342916A publication Critical patent/JPH05342916A/en
Publication of JPH0719488B2 publication Critical patent/JPH0719488B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/02Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061Etching masks
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/30Assembling printed circuits with electric components, e.g. with resistor
    • H05K3/32Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits
    • H05K3/321Assembling printed circuits with electric components, e.g. with resistor electrically connecting electric components or wires to printed circuits by conductive adhesives
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/36Assembling printed circuits with other printed circuits
    • H05K3/361Assembling flexible printed circuits with other printed circuits

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、液晶表示管、ECD、
太陽電池等の電子素子の電極部分及びプリント回路基板
端子部分を、それぞれこれと対向する各端子部分に、機
械的並びに電気的にそれぞれ接続するための、所望の長
さ横幅と各導電路間隔幅とを有する銅蒸着フィルムをベ
ースとした銅メッキファインピッチヒートシールコネク
タ部材の製造方法に関するものである。
BACKGROUND OF THE INVENTION The present invention relates to a liquid crystal display tube, an ECD,
A desired length, lateral width and conductive path spacing width for mechanically and electrically connecting the electrode portion of an electronic element such as a solar cell and the printed circuit board terminal portion to the respective terminal portions facing each other. The present invention relates to a method for producing a copper-plated fine pitch heat seal connector member based on a copper vapor deposition film having

【0002】[0002]

【従来の技術】従来のこの種ファインピッチヒートシー
ルコネクタの一つの製造方法としては、可撓性絶縁フィ
ルムの上に導電性懸濁液塗料を用いて、ヒートシールコ
ネクタパターンをスクリュー印刷にて塗布し、加熱、乾
燥し、導電性回路を形成し、これによって形成された導
電性回路及びその周囲のフィルム部分全体にわたって絶
縁性熱圧着懸濁液塗料をスクリーン印刷にて全面塗布
し、加熱、乾燥して熱圧着層を最上層に形成し、所望の
幅、寸法に切断する方法がある。
2. Description of the Related Art As a conventional method for manufacturing a fine pitch heat seal connector of this type, a heat conductive seal paint is applied onto a flexible insulating film and a heat seal connector pattern is applied by screw printing. Then, it is heated and dried to form a conductive circuit, and the insulating thermocompression-bonding suspension paint is applied over the entire surface of the conductive circuit formed by this and the surrounding film portion by screen printing, and then heated and dried. Then, a thermocompression bonding layer is formed on the uppermost layer and then cut into a desired width and size.

【0003】また他の方法として可撓性絶縁フィルム上
に15〜35μm の銅箔層を有するヒートシールコネクタの
製造方法がある。この方法では、最初のベースフィルム
となる可撓性絶縁フィルムと銅薄膜とを熱硬化型の接着
剤を用いて貼り合わせ、このベースフィルム上に導電性
懸濁液塗料を用いて、ヒートシールコネクタパターンを
スクリュー印刷にて塗布し、加熱、乾燥する。次にフィ
ルム上の露出した銅部分をエッチング除去し、水洗、乾
燥する。こうして形成された導電性回路及びその周囲の
フィルム全体にわたって、絶縁性熱圧着懸濁液塗料をス
クリーン印刷にて全面塗布し、加熱、乾燥して熱圧着層
を最上層に形成し、所望の長さ幅、寸法に切断する。
Another method is to manufacture a heat seal connector having a copper foil layer of 15 to 35 μm on a flexible insulating film. In this method, a flexible insulating film to be the first base film and a copper thin film are bonded together using a thermosetting adhesive, and a conductive suspension paint is used on this base film to form a heat seal connector. The pattern is applied by screw printing, heated and dried. Next, the exposed copper portion on the film is removed by etching, washed with water and dried. The insulating thermocompression-bonding suspension coating is applied over the entire surface of the conductive circuit thus formed and the surrounding film by screen printing, heated and dried to form the thermocompression-bonded layer on the uppermost layer, and the desired length is obtained. Cut into width and dimensions.

【0004】[0004]

【発明が解決しようとする課題】このような従来法で可
撓性絶縁フィルム上に導電性懸濁液塗料を用いて導電性
回路を形成し、絶縁熱圧着懸濁塗料を用いて熱圧力層を
形成しファインピッチヒートシールコネクタを製造する
方法では、安定した低電気抵抗値が得られず、電気的信
頼性に欠けるという問題点がある。また、可撓性絶縁フ
ィルム上に15〜35μm の銅箔層を有するヒートシールコ
ネクタの製造方法によると可撓性絶縁フィルムと銅皮膜
層との密着を改善することが課題として残されている。
A conductive circuit is formed on the flexible insulating film by the conventional method, and a conductive circuit is formed by using the insulating thermocompression suspension coating. However, the method of manufacturing a fine pitch heat seal connector by forming the above-described method has a problem in that a stable low electric resistance value cannot be obtained and electrical reliability is lacking. Further, according to the method for manufacturing the heat seal connector having the copper foil layer of 15 to 35 μm on the flexible insulating film, there remains a problem to improve the adhesion between the flexible insulating film and the copper film layer.

【0005】従って本発明の目的は、従来のファインピ
ッチヒートシールコネクタより更に品質並びに信頼性に
優れたファインピッチヒートシールコネクタ部材の製造
方法を提供することにある。
Therefore, it is an object of the present invention to provide a method of manufacturing a fine pitch heat seal connector member which is superior in quality and reliability to the conventional fine pitch heat seal connector.

【0006】[0006]

【課題を解決するための手段】上記目的を達成した本発
明の第1の方法は、図面にも見られるように、電子素
子、例えば液晶表示管、ECD、太陽電池等の電極部分
及びプリント回路基板部分をそれぞれこれと対向する各
端子部分に、機械的並びに電気的にそれぞれ接続するた
めの、所望の長さ横幅と各導電路間隔幅とを有する銅蒸
着フィルムをベースとした銅メッキファインピッチヒー
トシールコネクタ部材の製造方法において、(A)可撓
性絶縁フィルム、例えばポリエステル、ポリイミド、ア
ラミド、ポリカーボネイトのフィルムの表面に銅を膜厚
0.1〜0.5 μm に蒸着させ、この蒸着銅表面に、電界銅
メッキ処理により 1.0〜10.0μm の厚さに銅皮膜を析出
・表面処理し、その後水洗にてメッキ液をよく洗い落
し、フィルムを40〜100 ℃の温度で乾燥させる工程と、
(B)工程(A)で得られた銅皮膜の表面上に、(イ)
粒度 0.1〜60μm の黒鉛粉末、銀粉末及び粒度 0.1μm
以下のカーボンブラック粉末の1種又は2種以上からな
る導電性微粉末10〜60重量%と、(ロ)クロロプレンゴ
ム、クロロスルホン化ゴム、ポリウレタン樹脂及びポリ
エステル樹脂の1種又は2種以上から成るゴム系及び熱
可塑性樹脂系の結合剤5〜30重量%と、(ハ)ジメチル
ホルムアミド、ジアセトンアルコール、イソホロン、ジ
エチルカルビトール、ブチルカルビトール及びテレビン
油の1種又は2種以上から成る有機溶剤30〜50重量%
と、(ニ)粒度 1.0〜50.0μm の黒鉛粉末、銀粉末、銅
粉末、ニッケル粉末、パラジウム粉末、錫粉末、ハンダ
粉末、ニッケルメッキした上にさらに金メッキを施した
銅粉末、金メッキニッケル粉末、金メッキ錫粉末、ニッ
ケルメッキした上にさらに金メッキを施した樹脂ビー
ズ、例えばフェノールビーズ、カーボンビーズ、スチレ
ンビーズ、ガラスビーズの粉末のうちの1種又は2種以
上から成る導電性微粉末5〜70重量%とを混合(イ+ロ
+ハ+ニ)溶解し、均一に分散せしめた見掛け比重 0.9
〜2.3 、粘度 300〜12000 ポイズの導電異方性懸濁液塗
料を用いて、電子素子、例えば液晶表示管、ECD、太
陽電池等の電極部分及びプリント回路基板端子部分を、
それぞれこれと対向する各端子部分に機械的並びに電気
的にそれぞれ接続するための、所望の長さと横幅と各導
電路間隔幅とを有する縦縞細条形ヒートシールコネクタ
パターンをスクリーン印刷にて塗布し、加熱、乾燥する
工程と、(C)該ヒートシールコネクタパターンを備え
るフィルム上の露出した銅部分を、塩化第二鉄、塩酸を
用いてパターンエッチングにて除去し、その後水洗にて
エンチング液を良く洗い落し、フィルムを40℃〜100 ℃
の温度で乾燥させる工程と、(D)前記工程(A+B+
C)にて形成された、導電異方性塗料層を銅表面に被着
したまま残した所望の縦縞細条形パターン、及びその周
囲の残余の露出したフィルム部分の全体にわたって、
(i)酸化チタン、タルク、水和アルミナ及びコロイダ
ルシリカの1種又は2種以上から成る粉末5〜30重量%
と、 (ii) クロロプレン合成ゴム、ポリエステル樹脂、
エチレン酢酸ビニル共重合体樹脂及びポリメチルメタク
リレート樹脂の1種又は2種以上から成る熱可塑性樹脂
結合剤20〜60重量%と、(iii) イソホロン、ジアセトン
アルコール、メチルイソブチルケトン、キシレン、トル
エン及びジエチルカルビトールの1種又は2種以上から
成る有機溶剤10〜70重量%と、 (iv) テルペン系樹脂及
び脂肪族炭化水素系樹脂の1種又は2種から成る粘着付
与剤 0.1〜20重量%とを混合(i+ii+iii +iv)溶解
し、均一に分散せしめた見掛け比重0.8 〜1.4 、粘度15
0 〜5000ポイズの絶縁性熱圧着懸濁液塗料を用いてスク
リーン印刷にて全面塗布し、加熱乾燥して熱圧着層を最
上層に形成する工程と、(E)前記工程(A+B+C+
D)にて形成され最上層に熱圧着層を有しその下層に所
望の導電回路パターンを有するフィルムを、所望の長さ
幅寸法に切断する工程とから成ることを特徴とする。
The first method of the present invention, which has achieved the above object, is, as shown in the drawings, electronic elements such as liquid crystal display tubes, ECDs, electrode portions of solar cells and printed circuits. Copper-plated fine pitch based on a copper-deposited film having a desired length lateral width and a conductive path interval width for mechanically and electrically connecting the substrate portion to each terminal portion opposed thereto In the method for manufacturing a heat seal connector member, (A) a flexible insulating film, for example, a film of copper on the surface of a film of polyester, polyimide, aramid, or polycarbonate
Evaporate to a thickness of 0.1 to 0.5 μm, deposit a copper film on the deposited copper surface to a thickness of 1.0 to 10.0 μm by electrolytic copper plating, and then surface-treat it. Drying at a temperature of ~ 100 ° C,
(B) On the surface of the copper film obtained in the step (A), (a)
Graphite powder with a particle size of 0.1 to 60 μm, silver powder and particle size of 0.1 μm
10 to 60% by weight of conductive fine powder consisting of one or more of the following carbon black powders, and (b) one or more of chloroprene rubber, chlorosulfonated rubber, polyurethane resin and polyester resin An organic solvent comprising 5 to 30% by weight of a rubber-based or thermoplastic resin-based binder and one or more of (c) dimethylformamide, diacetone alcohol, isophorone, diethylcarbitol, butylcarbitol and turpentine oil 30 ~ 50% by weight
And (d) graphite powder, silver powder, copper powder, nickel powder, palladium powder, tin powder, solder powder, nickel-plated copper powder, gold-plated nickel powder, gold-plated with a grain size of 1.0-50.0 μm. 5 to 70% by weight of conductive fine powder made of one or more of tin beads, nickel beads, and gold-plated resin beads, such as phenol beads, carbon beads, styrene beads, and glass beads. Apparent specific gravity of 0.9 mixed with (a + b + c + d)
~ 2.3, viscosity 300 ~ 12000 poise of conductive anisotropic suspension paint, electronic elements such as liquid crystal display tube, ECD, electrode parts of solar cells and printed circuit board terminal part,
A vertical striped strip heat seal connector pattern having a desired length and width and a width of each conductive path for mechanically and electrically connecting to the respective terminal portions facing each other is applied by screen printing. , Heating and drying, and (C) the exposed copper portion on the film provided with the heat seal connector pattern is removed by pattern etching using ferric chloride and hydrochloric acid, and then washed with water to remove the enching solution. Thoroughly wash the film and keep the film at 40 ℃ to 100 ℃
And the step (D) of the above step (A + B +
The desired vertical striped striped pattern formed by depositing the conductive anisotropic coating layer on the copper surface, which is formed in C), and the entire remaining exposed film portion around it.
(I) 5 to 30% by weight of powder composed of one or more of titanium oxide, talc, hydrated alumina and colloidal silica
And (ii) chloroprene synthetic rubber, polyester resin,
20-60 wt% of a thermoplastic resin binder comprising one or more of ethylene vinyl acetate copolymer resin and polymethylmethacrylate resin, and (iii) isophorone, diacetone alcohol, methyl isobutyl ketone, xylene, toluene and 10 to 70% by weight of an organic solvent consisting of one or more of diethylcarbitol, and (iv) a tackifier consisting of one or two of a terpene resin and an aliphatic hydrocarbon resin 0.1 to 20% by weight. And (i + ii + iii + iv) were dissolved and uniformly dispersed to give an apparent specific gravity of 0.8 to 1.4 and a viscosity of 15
0-5000 poise of the insulating thermocompression-bonding suspension coating is applied to the entire surface by screen printing and heat-drying to form a thermocompression-bonding layer on the uppermost layer, and (E) the above-mentioned step (A + B + C +).
And (d) forming a film having a thermocompression bonding layer on the uppermost layer and having a desired conductive circuit pattern on the lower layer thereof into a desired length and width.

【0007】上記工程(A)において、蒸着銅表面上に
電気メッキ処理により析出させる銅皮膜のメッキ厚さ
は、1.0 μm 未満では電気抵抗値が高くて許容電流量が
小さく、一方10μm より厚いと耐折性における信頼性が
低下する。また乾燥温度は、40℃より低いと乾燥が不足
し、100 ℃より高いと銅表面の酸化、変色が著しいので
40〜100 ℃の範囲とする。
In the above step (A), when the plating thickness of the copper coating deposited on the surface of the vapor-deposited copper by electroplating is less than 1.0 μm, the electric resistance value is high and the allowable current amount is small, while when it is thicker than 10 μm. The reliability of folding endurance decreases. If the drying temperature is lower than 40 ° C, the drying will be insufficient, and if it is higher than 100 ° C, the copper surface will be significantly oxidized and discolored.
It shall be in the range of 40 to 100 ℃.

【0008】上記工程(B)において、(イ)の導電性
微粉末は、10重量%未満では導電性が不足し、電気抵抗
が高くなりすぎ、60重量%を越えると塗膜の密着性が悪
くなり、耐折性も低下する。(ロ)の結合剤が5重量%
未満では耐折性が低下するとともに塗膜の密着性が低下
し、一方30重量%より多くなると電気抵抗が上昇し好ま
しくない。(ハ)の有機溶剤が30重量%未満では印刷性
が低下し、乾燥が著しく速くなり、一方50重量%より多
くなると印刷性が低下し好ましくない。(ニ)の導電性
微粒子の粒度は 1.0μm 未満では市場での入手が困難
で、コストが高くなり、一方50.0μm より大では均質な
塗膜が得られにくく、電気抵抗値が不安定になる。また
該導電性微粉末の含有量は5重量%未満では導電性が不
足し、70重量%より多くなると塗膜がもろくなり、耐折
性が低下し好ましくない。
In the above step (B), if the conductive fine powder of (a) is less than 10% by weight, the conductivity will be insufficient and the electric resistance will be too high, and if it exceeds 60% by weight, the adhesion of the coating film will be poor. It becomes worse and the folding endurance is also reduced. 5% by weight of (b) binder
If it is less than 60% by weight, the folding resistance is lowered and the adhesion of the coating film is lowered, and if it exceeds 30% by weight, the electric resistance is increased, which is not preferable. When the organic solvent (c) is less than 30% by weight, the printability is deteriorated and the drying becomes extremely fast, while when it is more than 50% by weight, the printability is deteriorated, which is not preferable. If the particle size of the conductive fine particles of (d) is less than 1.0 μm, it is difficult to obtain on the market and the cost becomes high, while if it is larger than 50.0 μm, it is difficult to obtain a uniform coating film and the electric resistance value becomes unstable. . If the content of the conductive fine powder is less than 5% by weight, the conductivity is insufficient, and if it is more than 70% by weight, the coating film becomes brittle and the folding durability is deteriorated, which is not preferable.

【0009】上記(D)工程において、(i)の粉末の
配合量は5重量%未満では塗膜厚が満足されず、一方30
重量%を越えると得られる塗料の接着力が低下し、印刷
レベリング性が低下する。 (ii) の熱可塑性樹脂結合剤
の配合量は20重量%未満では塗料の接着力が低下し、ま
た60重量%を越えると印刷塗膜厚が低下し、接着力も低
下する。(iii) の有機溶剤の配合量は10重量%未満では
印刷ができず、また乾燥が速すぎて好ましくなく、70重
量%を越えると接着力が低下して好ましくない。
In the step (D), if the amount of the powder of (i) is less than 5% by weight, the coating thickness is not satisfied, while
If the content is more than 10% by weight, the adhesive force of the resulting coating composition is reduced and the printing leveling property is reduced. If the blending amount of the thermoplastic resin binder (ii) is less than 20% by weight, the adhesive force of the coating material will be reduced, and if it exceeds 60% by weight, the printed coating film thickness will be reduced and the adhesive force will also be reduced. If the compounding amount of the organic solvent (iii) is less than 10% by weight, printing cannot be performed and drying is too fast, which is not preferable, and if it exceeds 70% by weight, the adhesive force is lowered, which is not preferable.

【0010】又、本発明の第2の方法は、(a)可撓性
絶縁フィルム、例えばポリエステル、ポリイミド、アラ
ミド、ポリカーボネイトのフィルムに膜厚0.1 〜0.5 μ
m に銅を蒸着させ、この銅蒸着銅表面に電気銅メッキ処
理により、1.0 〜10.0μm の銅皮膜を析出・表面処理
し、その後水洗にてメッキ液を良く洗い落し、フィルム
を40〜100 ℃の温度で乾燥させる工程と、(b)上記工
程(a)で得られた銅皮膜上に、粒度 1.0〜50.0μm の
銀粉末、銅粉末、ニッケル粉末、パラジウム粉末、錫粉
末、ハンダ粉末、ニッケルメッキした上にさらに金メッ
キを施したガラスまたは銅粉末、金メッキニッケル粉
末、金メッキ錫粉末、ニッケルメッキした上にさらに金
メッキを施した樹脂ビーズ粉末のうちの1種又は2種以
上から成る導電性微粉末1〜40重量%を、フォトレジス
トとして用いられる感光性のアクリル系ポリマー樹脂及
びアクリルエステル、又は感光性のエポキシ系ポリマー
樹脂を主成分とするフォトエッチングレジストインク60
〜99重量%を混合し、均一に分散せしめた見掛け比重
0.9〜2.0 、粒度 0.1〜1000ポイズの導電性を持たせた
フォトエッチングレジスト塗料を、厚さ5〜30μm にコ
ーティングし、20〜70℃の温度にて10分〜12時間乾燥を
行う塗布・乾燥工程と、(c)該塗布・乾燥工程(b)
を終えた塗布面に、所望寸法の縦縞細条パターンを描い
てあるネガフィルムを載置し、紫外線露光を行い、所望
のパターン部分を硬化させる紫外線露光工程と、(d)
該紫外線露光工程(c)を終えた導電性フォトエッチン
グレジスト塗膜の硬化されていない部分を弱アルカリ水
溶液にて洗い流して除去し、30〜120℃の温度にて乾燥
させ、硬化させたフォトエッチングレジスト塗膜を被着
した所望部分のパターン形成する工程と、(e)該工程
(d)を終えたフィルム上の露出した銅部分をすべてエ
ッチング除去し、その後水洗にてエッチング液を良く洗
い落し、フィルムを40〜100 ℃の温度で乾燥させる工程
と、(f)前記工程(a+b+c+d+e)にて形成さ
れ、前記紫外線硬化させたフォトエッチングレジスト層
を銅皮膜表面に被着したまま残した所望のパターン、及
びその周囲の残余の露出したフィルム部分の全体にわた
って、見掛け比重 0.8〜1.4 、粘度150 〜5000ポイズの
絶縁性熱圧着懸濁液塗料を用いて、スクリーン印刷にて
全面塗布し、加熱乾燥して熱圧着層を最上層に形成する
工程と、(g)前記工程(a+b+c+d+e+f)に
て形成され最上層に熱圧着層を有しその下層に所望の導
電回路パターンを有する銅蒸着フィルムを、所望の長さ
及び幅寸法に切断する工程とから成ることを特徴とす
る。
In the second method of the present invention, (a) a flexible insulating film such as polyester, polyimide, aramid or polycarbonate film having a thickness of 0.1 to 0.5 μm is used.
Copper is vapor-deposited on m, and a copper film of 1.0 to 10.0 μm is deposited and surface-treated on this copper-deposited copper surface by electrolytic copper plating, and then the plating solution is thoroughly washed off with water and the film is cooled to 40 to 100 ° C. And (b) silver powder, copper powder, nickel powder, palladium powder, tin powder, solder powder, nickel having a grain size of 1.0 to 50.0 μm on the copper film obtained in the above step (a). Conductive fine powder made of one or more of glass or copper powder plated and then gold-plated, gold-plated nickel powder, gold-plated tin powder, and nickel-plated and further gold-plated resin bead powder Photoetchin containing 1 to 40% by weight as a main component of a photosensitive acrylic polymer resin and acrylic ester used as a photoresist or a photosensitive epoxy polymer resin Gresist ink 60
Apparent specific gravity of ~ 99 wt% mixed and evenly dispersed
Apply a photo-etching resist paint with conductivity of 0.9 to 2.0 and grain size of 0.1 to 1000 poise to a thickness of 5 to 30 μm, and dry at a temperature of 20 to 70 ° C for 10 minutes to 12 hours. And (c) the coating and drying step (b)
An ultraviolet exposure step of placing a negative film on which a vertical striped strip pattern having a desired dimension is drawn on the coated surface, and performing ultraviolet exposure to cure the desired pattern portion, (d)
The uncured portion of the conductive photo-etching resist coating film that has undergone the ultraviolet exposure step (c) is washed away with a weak alkaline aqueous solution to remove, dried at a temperature of 30 to 120 ° C., and cured photo-etching. A step of forming a pattern on a desired portion coated with a resist coating film, and (e) all exposed copper portions on the film after the step (d) are removed by etching, and then the etching solution is thoroughly washed off with water. , A step of drying the film at a temperature of 40 to 100 ° C., and (f) a desired photo-etching resist layer formed in the above step (a + b + c + d + e) and left on the surface of the copper film, which is left as deposited. Use an insulating thermocompression suspension paint with an apparent specific gravity of 0.8 to 1.4 and a viscosity of 150 to 5000 poise over the entire pattern and the remaining exposed film. Then, the whole surface is applied by screen printing, and heat-dried to form a thermocompression-bonding layer on the uppermost layer, and (g) the thermocompression-bonding layer is formed on the uppermost layer formed in the above step (a + b + c + d + e + f) A step of cutting a copper vapor deposition film having a desired conductive circuit pattern into desired length and width dimensions.

【0011】上記工程(b)においてフォトエッチング
レジスト塗料を構成する導電性微粉末が1重量%未満
で、フォトエッチングレジストインクが99重量%より多
くなると導電性が不足し、一方導電性微粉末が40重量%
より多く、フォトエッチングレジストインクが60重量%
未満では露光して光硬化させるのに悪影響を及ぼす。ま
たフォトエッチングレジスト塗料は5〜30μm の厚さで
コーティングするが、これは塗膜厚が5μm より薄いと
塗膜の屈曲、折り曲げに対する性能が低下し、30μm よ
り厚くなると紫外線露光しにくく、現像が満足に行えな
いためである。
In the step (b), if the conductive fine powder constituting the photoetching resist coating is less than 1% by weight and the photoetching resist ink is more than 99% by weight, the conductivity is insufficient, while the conductive fine powder is 40% by weight
More, 60% by weight photo-etching resist ink
When the amount is less than the above, it has an adverse effect on photocuring by exposure. The photo-etching resist coating is coated with a thickness of 5 to 30 μm. If the coating thickness is less than 5 μm, the performance of bending and bending of the coating decreases, and if it exceeds 30 μm, it is hard to be exposed to ultraviolet rays and the development is difficult. This is because it cannot be done satisfactorily.

【0012】本発明の方法により得られたヒートシール
コネクタ部材は、銅蒸着フィルムの片面の一端の熱圧着
層を、液晶表示管、ECD、太陽電池等の電子素子の電
極部分及びプリント回路基板端子部分に接触させ、他端
の熱圧着層を、それぞれこれと対向する各端子部分に接
触させ、前記コネクタフィルムの片面の両端部分を加熱
温度 100〜200 ℃、加圧力10〜70kg/cm2 で熱圧着し
て、それぞれ一体にヒートシールすることができる。上
記加熱温度は、100 ℃より低いと接触せず、200℃より
高いと熱圧着懸濁液塗料が分解され、また可撓性フィル
ムが収縮するので100 〜200 ℃の範囲とするのが好まし
く、また加圧力は10kg/cm2 未満では接着せず、70kg/
cm2 より大では導電回路の破断が生ずるので10〜70kg/
cm2 とするのが好ましい。
The heat seal connector member obtained by the method of the present invention has a thermocompression bonding layer at one end of a copper vapor deposition film, an electrode portion of an electronic element such as a liquid crystal display tube, an ECD, a solar cell and a printed circuit board terminal. Part of the connector film, and the thermocompression-bonding layer at the other end is brought into contact with each of the terminal parts facing each other, and both end parts of one side of the connector film are heated at a temperature of 100 to 200 ° C and a pressure of 10 to 70 kg / cm 2 . They can be thermocompression bonded and heat-sealed integrally. If the heating temperature is lower than 100 ° C., it does not come into contact, and if it is higher than 200 ° C., the thermocompression-bonding suspension paint is decomposed, and the flexible film shrinks, so it is preferably in the range of 100 to 200 ° C. the pressure did not adhere is less than 10kg / cm 2, 70kg /
If it is larger than cm 2 , the conductive circuit may break, so 10-70 kg /
It is preferably cm 2 .

【0013】[0013]

【実施例】第1図に本発明の一実施例のヒートシールコ
ネクタ部材を拡大して示し、そのII−II′線で切断した
断面を第2図に示す。1は可撓性絶縁フィルム、2は銅
皮膜層(銅蒸着層+銅メッキ層)、3は導電異方性回
路、4は絶縁熱圧着層を示す。また第3図に上記ヒート
シールコネクタ部材の熱圧着後の要部を断面で示し、更
に第4図に上記ヒートシールコネクタ部材の使用例を示
す。5は各種のディスプレ、6はプリント回路基板、7
は上記ヒートシールコネクタ部材、8は液晶表示管の電
極部分、9はプリント回路基板端部分を示す。以下本発
明をさらに実施例について説明する。 実施例1 (1.スクリーン印刷法による) 厚さ25μm のポリエステルフィルムに、銅を厚さ0.5 μ
m 蒸着させた銅蒸着フィルムの銅表面上に、電気硫酸銅
メッキ浴にて、銅皮膜を 1.0〜1.5 μm 析出し、防錆処
理を行い、その後水洗し、エアーブロワーにて水分を切
った後、85℃の遠赤外線乾燥機中で2分間乾燥させた
(工程A)。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIG. 1 is an enlarged view of a heat seal connector member according to an embodiment of the present invention, and FIG. 2 is a sectional view taken along line II-II '. Reference numeral 1 is a flexible insulating film, 2 is a copper coating layer (copper vapor deposition layer + copper plating layer), 3 is a conductive anisotropic circuit, and 4 is an insulating thermocompression bonding layer. Further, FIG. 3 shows a cross section of a main part of the heat seal connector member after thermocompression bonding, and FIG. 4 shows an example of use of the heat seal connector member. 5 is various displays, 6 is a printed circuit board, 7
Is the heat seal connector member, 8 is the electrode portion of the liquid crystal display tube, and 9 is the end portion of the printed circuit board. Hereinafter, the present invention will be described with reference to Examples. Example 1 (1. By screen printing method) A 25 μm thick polyester film was coated with copper to a thickness of 0.5 μm.
m After depositing a copper film of 1.0 to 1.5 μm on the copper surface of the vapor-deposited copper vapor-deposited film in an electrolytic copper sulfate plating bath, applying rust-prevention treatment, then washing with water and removing water with an air blower And dried in a far infrared dryer at 85 ° C. for 2 minutes (step A).

【0014】前記の銅皮膜を析出した銅蒸着フィルムの
銅面上に、(イ)粒度 0.1〜60μmの黒鉛粉末30重量
%、 0.1μm 以下のカーボンブラック5重量%、(ロ)
ポリウレタン樹脂20重量%、(ハ)イソホロン20重量
%、ジメチルホルムアミド5重量%、(ニ)粒度20〜30
μm のニッケルメッキした上にさらに金メッキを施した
ガラスビーズ粉末20重量%とを混合(イ+ロ+ハ+ニ)
溶解し、均一に分散せしめた見掛け比重1.4 、粘度6500
ポイズの導電異方性懸濁液塗料を用いて所望のパターン
をスクリーン印刷にて塗布し、115 ℃の遠赤炉にて加熱
・乾燥した(工程B)。
On the copper surface of the copper vapor-deposited film having the copper coating deposited thereon, (a) 30% by weight of graphite powder having a particle size of 0.1-60 μm, 5% by weight of carbon black having a particle size of 0.1 μm or less, (b)
Polyurethane resin 20% by weight, (C) Isophorone 20% by weight, Dimethylformamide 5% by weight, (D) Particle size 20-30
Mixed with 20% by weight of glass bead powder, which was plated with μm nickel and further plated with gold (a + b + c + d)
Dissolved and uniformly dispersed, apparent specific gravity 1.4, viscosity 6500
A desired pattern was applied by screen printing using Poise's conductive anisotropic suspension paint, and heated and dried in a far-infrared oven at 115 ° C (step B).

【0015】印刷・乾燥工程(B)を終えた銅蒸着フィ
ルムを、1Lの水に100 mLの塩化第二鉄液、1〜0.5 mL
の塩酸を添加した混合溶液を用いて処理し、露出した銅
部分をすべてエッチング除去し、その後水洗にてエッチ
ング液を良く洗い流し、100℃の温風中で2分間乾燥さ
せた(工程C)。
The copper vapor-deposited film that has undergone the printing / drying process (B) is added to 1 L of water to 100 mL of ferric chloride solution, 1 to 0.5 mL.
Then, the exposed copper portion was completely removed by etching, and then the etching solution was thoroughly washed with water and dried in warm air at 100 ° C. for 2 minutes (step C).

【0016】前記工程(A+B+C)にて形成された、
導電異方性塗料層と銅皮膜層から成る所望の導電回路パ
ターンと、その周囲の残余の露出したフィルム全体にわ
たって絶縁性熱圧着懸濁液塗料を塗布した。この塗料の
組成は、酸化チタン10重量%、クロロプレン合成ゴム45
重量%、キシレン25重量%、メチルイソブチルケトン10
重量%、イソホロン 7.5重量%、テルペン系樹脂 2.5重
量%から成り、見掛け比重1.0 、粘度 500ポイズであっ
た。加熱乾燥して熱圧着層を形成した(工程D)。
Formed in the above step (A + B + C),
The insulative thermocompression suspension paint was applied over the desired conductive circuit pattern consisting of the conductive anisotropic paint layer and the copper coating layer and the remaining exposed film around it. The composition of this paint is titanium oxide 10% by weight, chloroprene synthetic rubber 45
Wt%, xylene 25 wt%, methyl isobutyl ketone 10
% Of isophorone and 2.5% by weight of terpene resin, and had an apparent specific gravity of 1.0 and a viscosity of 500 poises. It was dried by heating to form a thermocompression bonding layer (step D).

【0017】次に、こうして形成されたヒートシールコ
ネクタフィルムを所望の長さ、及び寸法に切断した(工
程E)。
Next, the heat-sealed connector film thus formed was cut into desired lengths and dimensions (step E).

【0018】このようにして、銅蒸着フィルムをベース
とした銅メッキファインピッチヒートシールコネクタ部
材を得た。得られた部材のコネクタフィルムの片面の一
端の熱圧着層を、液晶表示管の電極に接触させ、他端の
熱圧着層をプリント回路基板端子部分に接触させ、前記
コネクタフィルムの片面の両端部を加熱温度 180℃、圧
力45kg/cm2 で熱圧着して、それぞれ一体にした。実用
に際しても、電気的並びに機械的に満足すべき結果が得
られ、本発明の顕著な効果が認められた。
Thus, a copper plated fine pitch heat seal connector member based on the copper vapor deposition film was obtained. The thermocompression-bonding layer at one end of the connector film of the obtained member was brought into contact with the electrodes of the liquid crystal display tube, and the thermocompression-bonding layer at the other end was brought into contact with the printed circuit board terminal portion, and both end portions of the one surface of the connector film were contacted. Were thermocompressed at a heating temperature of 180 ° C. and a pressure of 45 kg / cm 2 to integrate them. In practical use, satisfactory results were obtained electrically and mechanically, and the remarkable effect of the present invention was recognized.

【0019】 実施例2 (2.フォトエッチング法による) 厚さ25μm のポリエステルに、銅を厚さ 0.3μm 蒸着さ
せた銅蒸着フィルムの銅表面上に、電気硫酸銅メッキ浴
にて、銅皮膜を 1.0〜1.5 μm 析出し、防錆処理を行
い、その後水洗にてメッキ液等を良く洗い落し、エアー
ブロウにて水分をよく切った後、85℃の遠赤外線乾燥機
中で、2分間乾燥させた(工程a)。
Example 2 (2. By Photo Etching Method) A copper film was formed on a copper surface of a copper vapor-deposited film obtained by vapor-depositing copper on a polyester having a thickness of 25 μm by a thickness of 0.3 μm in an electrolytic copper sulfate plating bath. 1.0 to 1.5 μm is deposited, anticorrosion treatment is performed, then the plating solution is washed off with water, the water is well removed with an air blower, and then dried in a far infrared dryer at 85 ° C for 2 minutes. (Step a).

【0020】前記の銅皮膜を析出した銅蒸着フィルムの
銅面側に、粒度10〜15μm のニッケルメッキした上にさ
らに金メッキを施したガラスビーズ粉末5重量%、フォ
トレジスト用の光硬化型アクリル系ポリマー樹脂25重量
%、アクリルエステル光重合開始剤10重量%、エチルセ
ロソルブアセテート40重量%、トルエン20重量%、キシ
レン3重量%、メチルエチルケトン2重量%を配合して
調製したインク原液、すなわちフォトレジストインク95
重量%に対して前記樹脂ビーズ粉末を添加混合し、均一
に分散せしめた見掛け比重0.9 、粒度15ポイズのフォト
エッチングレジスト導電性塗料を、厚さ20μm にコーテ
ィングし、70℃の温度にて2時間乾燥した(工程b)。
5% by weight of glass bead powder in which the copper surface of the copper-deposited film on which the copper coating is deposited is nickel-plated with a grain size of 10 to 15 μm and further gold-plated, 5% by weight of a photocurable acrylic resin for photoresist. Ink stock solution prepared by blending 25% by weight of polymer resin, 10% by weight of acrylic ester photopolymerization initiator, 40% by weight of ethyl cellosolve acetate, 20% by weight of toluene, 3% by weight of xylene and 2% by weight of methyl ethyl ketone, that is, photoresist ink 95
The above resin bead powder was added to and mixed with the weight% of the mixture, and a photoetching resist conductive paint having an apparent specific gravity of 0.9 and a particle size of 15 poise that was uniformly dispersed was coated to a thickness of 20 μm, and the temperature was 70 ° C. for 2 hours. Dried (step b).

【0021】乾燥を終えた銅皮膜上のレジスタ塗布面に
所望のパターンのネガを描いてあるネガフィルムを載置
し、真空密着させ紫外線露光( 45 mJ/cm2 )し、パタ
ーン部分を紫外線硬化させた(工程c)。
A negative film having a negative pattern of a desired pattern is placed on the surface of the resist coated on the dried copper film, vacuum-contacted and exposed to ultraviolet light (45 mJ / cm 2 ), and the pattern portion is ultraviolet-cured. (Step c).

【0022】紫外線露光を終えた銅皮膜上のフォトエッ
チングレジスト導電性塗料の紫外線硬化されていない部
分(パターン以外の部分)を弱アルカリ水溶液にて現像
除去し、良く水洗し、その後エアーブロウにて銅皮膜上
の水を吹き落し、60℃の温度にて60分間乾燥した(工程
d)。
Photoetching resist on the copper film which has been exposed to ultraviolet rays The portion of the conductive coating which is not ultraviolet-cured (the portion other than the pattern) is developed and removed with a weak alkaline aqueous solution, washed thoroughly with water, and then blown with air. The water on the copper film was blown off and dried at a temperature of 60 ° C for 60 minutes (step d).

【0023】この銅蒸着フィルムの銅が直接表面に露出
した部分をすべてエッチング除去し、その後水洗にてエ
ッチング液を充分に洗い去り、140 ℃の温風中で1分間
乾燥させた(工程e)。
All the portions of the copper-deposited film where the copper was directly exposed on the surface were removed by etching, after which the etchant was thoroughly washed off with water and dried in warm air at 140 ° C. for 1 minute (step e). .

【0024】前記の紫外線硬化させたフォトエッチング
レジスト層を表面に被着したまま残した所望のパターン
と、その周囲の残余の露出したフィルム部分との全体に
わたって絶縁性熱圧着懸濁液塗料を塗布し、熱圧着層を
形成した。この塗料の組成は、水和アルミナ20重量%、
エチレン−酢酸ビニル共重合体樹脂40重量%、トルエン
10重量%、メチルイソブチルケトン5重量%、イソホロ
ン10重量%、テルペン系樹脂15重量%であり、見掛け比
重1.3 、粘度1000ポイズであった(工程f)。
An insulative thermocompression suspension paint is applied over the entire desired pattern in which the above-mentioned UV-cured photo-etching resist layer is left deposited on the surface and the remaining exposed film portion around it. Then, a thermocompression bonding layer was formed. The composition of this paint is 20% by weight of hydrated alumina,
Ethylene-vinyl acetate copolymer resin 40% by weight, toluene
It was 10% by weight, 5% by weight of methyl isobutyl ketone, 10% by weight of isophorone, and 15% by weight of terpene resin, and had an apparent specific gravity of 1.3 and a viscosity of 1000 poises (step f).

【0025】次に、こうして熱圧着層を形成した基板フ
ィルムを所望の長さ、及び幅寸法に切断した(工程
g)。
Next, the substrate film thus formed with the thermocompression bonding layer was cut into a desired length and width (step g).

【0026】こうして銅蒸着フィルムをベースとした銅
メッキファインピッチヒートシールコネクタ部材を得
た。このコネクタ部材のコネクタフィルムの片面の一端
の熱圧着層を、液晶表示管電極端子部(ピッチ0.3mm )
に接触させ、他端の熱圧着層をプリント回路基板端子部
に接触させ、前記コネクタフィルムの片面の両端部を加
熱温度160 ℃、圧力40kg/cm2 で、熱圧着してそれぞれ
一体にした。上記部材は実用において、電気的並びに機
械的接続に関して充分に満足すべき結果が得られ、本発
明の顕著な効果が認められた。
Thus, a copper plated fine pitch heat seal connector member based on the copper vapor deposition film was obtained. The thermocompression-bonded layer on one end of the connector film of this connector member is attached to the liquid crystal display tube electrode terminal (pitch 0.3 mm)
, And the thermocompression bonding layer at the other end was brought into contact with the printed circuit board terminal portion, and both ends of one surface of the connector film were thermocompression bonded at a heating temperature of 160 ° C. and a pressure of 40 kg / cm 2 to be integrated with each other. In practical use, the above-mentioned members have sufficiently satisfactory results in terms of electrical and mechanical connections, and the remarkable effects of the present invention have been confirmed.

【0027】 実施例3 (1.スクリーン印刷法による) 厚さ25μm のポリエステルフィルムに、銅を厚さ 0.3μ
m 蒸着させた銅蒸着フィルムの銅表面上に、電気硫酸銅
メッキ浴にて、銅皮膜を 2.5〜3.5 μm 析出させ、防錆
処理を行い、その後水洗し、エアーブロワーにて水分を
充分切った後、110 ℃の遠赤外線乾燥機中で5分間乾燥
させた。
Example 3 (1. by screen printing method) A polyester film having a thickness of 25 μm and copper having a thickness of 0.3 μm
m On the copper surface of the vapor-deposited copper vapor-deposited film, deposit a copper film of 2.5 to 3.5 μm in an electrolytic copper sulfate plating bath, perform rust-prevention treatment, then wash with water and sufficiently remove water with an air blower. Then, it was dried in a far infrared dryer at 110 ° C. for 5 minutes.

【0028】前記の銅皮膜を析出した銅蒸着フィルムの
銅面上に、(イ)粒度0.1 〜60μmの黒鉛粉末40重量
%、(ロ)クロロスルホン化ゴム20重量%、(ハ)イソ
ホロン15重量%、ジアセトンアルコール5重量%、
(ニ)粒度10〜15μm のニッケルメッキした上にさらに
金メッキを施したスチレン樹脂ビーズ粉末20重量%とを
混合(イ+ロ+ハ+ニ)溶解し、均一に分散せしめた見
掛け比重1.2 、粘度5000ポイズの導電異方性懸濁液塗料
を用いて所望のパターンをスクリーン印刷にて塗布し、
120 ℃の遠赤炉にて加熱・乾燥した(工程B)。
On the copper surface of the copper vapor-deposited film having the copper coating deposited thereon, (a) 40% by weight of graphite powder having a particle size of 0.1 to 60 μm, (b) 20% by weight of chlorosulfonated rubber, and (c) 15% by weight of isophorone. %, Diacetone alcohol 5% by weight,
(D) Mix 20% by weight of styrene resin bead powder that is nickel-plated with a particle size of 10 to 15 μm and further gold-plated (a + b + c + d), and dissolve and evenly disperse it to give an apparent specific gravity of 1.2 and viscosity. Apply a desired pattern by screen printing using 5000 poise of conductive anisotropic suspension paint,
It was heated and dried in a far-infrared oven at 120 ° C (process B).

【0029】印刷・乾燥工程(B)を終えた銅蒸着フィ
ルムを、実施例1と同様の塩化第二鉄液、塩酸の混合溶
液を用いて処理し、露出した銅部分をすべてエッチング
除去し、その水洗にてエッチング液を良く洗い落し、11
0 ℃の温風中で3分間乾燥させた(工程C)。
The copper vapor-deposited film that has undergone the printing / drying step (B) is treated with the same mixed solution of ferric chloride solution and hydrochloric acid as in Example 1 to remove all exposed copper portions by etching. Rinse the etchant well with the water,
It was dried in warm air of 0 ° C. for 3 minutes (step C).

【0030】前記工程(A+B+C)にて形成された、
導電異方性塗料層と銅皮膜層から成る所望の導電回路パ
ターンと、その周囲の残余の露出したフィルム全体にわ
たって絶縁性熱圧着懸濁液塗料を塗布した。この塗料の
組成は、(i)酸化チタン10重量%、 (ii) クロロプレ
ン合成ゴム45重量%、(iii) キシレン25重量%、メチル
イソブチルケトン10重量%、イソホロン 7.5重量%、
(iv) テルペン系樹脂2.5 重量%から成り(i+ii+iii
+iv)、見掛け比重1.0 、粘度700 ポイズであった。
加熱乾燥して熱圧着層を形成した(工程D)。
Formed in the step (A + B + C),
The insulative thermocompression suspension paint was applied over the desired conductive circuit pattern consisting of the conductive anisotropic paint layer and the copper coating layer and the remaining exposed film around it. The composition of this paint is (i) titanium oxide 10% by weight, (ii) chloroprene synthetic rubber 45% by weight, (iii) xylene 25% by weight, methyl isobutyl ketone 10% by weight, isophorone 7.5% by weight,
(iv) Consists of 2.5% by weight of terpene resin (i + ii + iii
+ Iv), the apparent specific gravity was 1.0, and the viscosity was 700 poise.
It was dried by heating to form a thermocompression bonding layer (step D).

【0031】それ以下の工程は、実施例1と略々同様な
方法にて、銅蒸着フィルムをベースとした銅メッキファ
インピッチヒートシールコネクタ部材を得、同様の熱圧
着を行った。このものは実用に際しても、電気的並びに
機械的接続において、実施例1と略々同様な満足すべき
結果が得られ、本発明の顕著な効果が認められた。
In the subsequent steps, a copper plated fine pitch heat seal connector member based on a copper vapor deposition film was obtained in the same manner as in Example 1, and the same thermocompression bonding was performed. In the case of practical use, the same satisfactory results as in Example 1 were obtained in electrical and mechanical connection, and the remarkable effect of the present invention was confirmed.

【0032】 実施例4 (1.スクリーン印刷法による) 厚さ38μm のポリエステルフィルムに、銅を厚さ 0.5μ
m 蒸着させた銅蒸着フィルムの銅表面上に、電気硫酸銅
メッキ浴にて、銅皮膜を5μm 析出させ、防錆処理を行
い、その後水洗にてメッキ液等を良く洗い流し、エアー
ブロワーにて水分を充分切った後、120 ℃の遠赤外線乾
燥機中で5分間乾燥させた(工程A)。(
Example 4 (1. By screen printing method) A polyester film having a thickness of 38 μm and copper having a thickness of 0.5 μm
m On the copper surface of the vapor-deposited copper vapor-deposited film, deposit a copper film of 5 μm in an electrolytic copper sulfate plating bath, perform rust-prevention treatment, then rinse off the plating solution etc. well with water and dry with an air blower. After being sufficiently cut, it was dried in a far infrared dryer at 120 ° C. for 5 minutes (step A). (

【0033】前記の銅皮膜を析出した銅蒸着フィルムの
銅面上に、(イ)粒度 0.1〜60μmの銀粉末45重量%、
粒度0.1 〜60μm の黒鉛粉末10重量%、(ロ)クロロプ
レンゴム7重量%、(ハ)イソホロン10重量%、ジアセ
トンアルコール8重量%、(ニ)粒度20〜30μm の金メ
ッキしたニッケル粉末20重量%とを混合(イ+ロ+ハ+
ニ)溶解し、均一に分散せしめた見掛け比重1.7 、粒度
8000ポイズの導電異方性懸濁液塗料を用いて所望のパタ
ーンをスクリーン印刷にて塗布し、100 ℃の遠赤炉にて
加熱乾燥した(工程B)。
On the copper surface of the copper vapor-deposited film having the copper coating deposited thereon, (a) 45% by weight of silver powder having a grain size of 0.1 to 60 μm,
10% by weight of graphite powder having a particle size of 0.1 to 60 μm, (B) 7% by weight of chloroprene rubber, (C) 10% by weight of isophorone, 8% by weight of diacetone alcohol, (D) 20% by weight of gold-plated nickel powder having a particle size of 20 to 30 μm And mixed (I + B + C +
D) Dissolved and evenly dispersed apparent specific gravity of 1.7, particle size
A desired pattern was applied by screen printing using a conductive anisotropic suspension paint of 8000 poise, and heated and dried in a far-infrared oven at 100 ° C (step B).

【0034】印刷・乾燥工程(B)を終えた銅蒸着フィ
ルムを、実施例1と同様の混合溶液を用いて処理し、露
出した部分をすべてエッチング除去し、その後水洗に
て、エッチング液を良く洗い落し、120 ℃の温風中で3
分間乾燥させた(工程C)。
The copper vapor-deposited film that has undergone the printing / drying step (B) is treated with the same mixed solution as in Example 1 to remove all exposed portions by etching, and then rinsed with water to remove the etching solution. Wash off and wash in warm air at 120 ° C for 3
Dry for minutes (step C).

【0035】前記工程(A+B+C)にて形成された、
導電異方性塗料層と銅皮膜層から成る所望の導電回路パ
ターンと、その周囲の残余の露出したフィルム全体にわ
たって絶縁性熱圧着懸濁液塗料を塗布した。この塗料の
組成は、(i)タルク5重量%、 (ii) ポリエチルメタ
クリレート樹脂60重量%、(iii) トルエン10重量%、ジ
アセトンアルコール10重量%、メチルイソブチルケトン
15重量%から成り、見掛け比重1.4 、粘度 500ポイズで
あった。加熱乾燥して熱圧着層を形成した(工程D)。
Formed in the step (A + B + C),
The insulative thermocompression suspension paint was applied over the desired conductive circuit pattern consisting of the conductive anisotropic paint layer and the copper coating layer and the remaining exposed film around it. The composition of this paint is (i) talc 5% by weight, (ii) polyethylmethacrylate resin 60% by weight, (iii) toluene 10% by weight, diacetone alcohol 10% by weight, methyl isobutyl ketone.
It had an apparent specific gravity of 1.4 and a viscosity of 500 poise. It was dried by heating to form a thermocompression bonding layer (step D).

【0036】それ以下の工程は、実施例2と略々同様な
方法にて、銅蒸着フィルムをベースとした銅メッキファ
インピッチヒートシールコネクタ部材を得、同様の熱圧
着を行った。このものは実用に際しても、電気的並びに
機械的接続において、実施例1と略々同様な満足すべき
結果が得られ、本発明の顕著な効果が認められた。
In the subsequent steps, a copper-plated fine pitch heat seal connector member based on a copper vapor deposition film was obtained by substantially the same method as in Example 2, and the same thermocompression bonding was performed. In the case of practical use, the same satisfactory results as in Example 1 were obtained in electrical and mechanical connection, and the remarkable effect of the present invention was confirmed.

【0037】 実施例5 (1.スクリーン印刷法による) 厚さ25μm のポリイミドフィルムに銅を厚さ 0.3μm 蒸
着させた銅蒸着フィルムの銅表面上に、電気硫酸銅メッ
キ浴にて、銅皮膜を 3.0〜5.0 μm 析出し、防錆処理を
行い、その後水洗し、エアーブロワーにて水分を切った
後、85℃の遠赤外線乾燥機中で3分間乾燥させた (工程
A)。
Example 5 (1. By screen printing method) A copper film was formed on a copper surface of a copper vapor-deposited film obtained by vapor-depositing copper on a polyimide film having a thickness of 25 μm to a thickness of 0.3 μm in an electrolytic copper sulfate plating bath. 3.0 to 5.0 μm was deposited, treated with rust, washed with water, drained with an air blower, and then dried in a far infrared dryer at 85 ° C. for 3 minutes (step A).

【0038】前記の銅皮膜を析出した銅蒸着フィルムの
銅面上に、(イ)粒度 0.1〜60μmの黒鉛粉末30重量
%、 0.1μm 以下のカーボンブラック5重量%、(ロ)
クロロプレンゴム20重量%、(ハ)イソホロン20重量
%、ジメチルホルムアミド5重量%、(ニ)粒度5〜15
μm のニッケルメッキした上にさらに金メッキを施した
ポリスチレンビーズ粉末20重量%とを混合(イ+ロ+ハ
+ニ)溶解し、均一に分散せしめた見掛け比重 1.6、粘
度5500ボイズの導電異方性懸濁塗料を用いて所望のパタ
ーンをスクリーン印刷にて塗布し、 100℃の遠赤炉にて
加熱・乾燥した(工程B)。
On the copper surface of the copper vapor-deposited film having the copper coating deposited thereon, (a) 30% by weight of graphite powder having a particle size of 0.1 to 60 μm, 5% by weight of carbon black of 0.1 μm or less, (b)
Chloroprene rubber 20% by weight, (C) isophorone 20% by weight, dimethylformamide 5% by weight, (D) particle size 5 to 15
Conductive anisotropy with apparent specific gravity of 1.6 and viscosity of 5500 vise mixed with 20% by weight of polystyrene bead powder plated with μm nickel and gold plated further (a + b + c + d) A desired pattern was applied by screen printing using a suspension paint, and heated and dried in a far-infrared oven at 100 ° C (step B).

【0039】印刷・乾燥工程(B)を終えた銅蒸着フィ
ルムを、1リットルの水に100 mlの塩化第二鉄液、 1.0
〜0.5ml の塩酸を添加した混合溶液を用いて処理し、露
出した銅部分をすべてエッチング除去し、その後水洗に
てエッチング液を良く洗い流し、80℃の温風中で2分間
乾燥させた(工程C)。
The copper vapor-deposited film that has undergone the printing / drying step (B) is added to 1 liter of water in an amount of 100 ml of ferric chloride solution, 1.0
It was treated with a mixed solution containing ~ 0.5 ml of hydrochloric acid to remove all exposed copper parts by etching, and then the etchant was thoroughly rinsed with water and dried in warm air at 80 ° C for 2 minutes (step C).

【0040】前記工程(A+B+C)にて形成された、
導電異方性塗料層と銅皮膜層から成る所望の導電回路パ
ターンと、その周囲の残余の露出したフィルム全体にわ
たって絶縁性熱圧着懸濁液塗料を塗布した。この塗料の
組成は、ニトリルゴム/変性フェノール樹脂40重量%、
イソホロン30重量%、キシレン20重量%、酸化チタン10
重量%から成り、見掛け比重 1.2、粘度 650ポイズであ
った。加熱乾燥して熱圧着層を形成した(工程D)。
Formed in the step (A + B + C),
The insulative thermocompression suspension paint was applied over the desired conductive circuit pattern consisting of the conductive anisotropic paint layer and the copper coating layer and the remaining exposed film around it. The composition of this coating is 40% by weight of nitrile rubber / modified phenolic resin,
Isophorone 30% by weight, xylene 20% by weight, titanium oxide 10
It had an apparent specific gravity of 1.2 and a viscosity of 650 poise. It was dried by heating to form a thermocompression bonding layer (step D).

【0041】次に、こうして形成されたヒートシールコ
ネクタフィルムを所望の長さ、及び寸法に切断した(工
程E)。
Next, the heat-sealed connector film thus formed was cut into desired lengths and dimensions (step E).

【0042】このようにして、銅蒸着フィルムをベース
とした銅メッキファインピッチヒートシールコネクタ部
材を得た。得られた部材のコネクタフィルムの片面の一
端の熱圧着層を、液晶表示管の電極に接触させ、他端の
熱圧着層をプリント回路基板端子部分に接触させ、前記
コネクタフィルムの片面の両端部を加熱温度 185℃、圧
力40kg/cm2 で熱圧着してそれぞれ一体にした。実用に
際しても、電気的並びに機械的に満足すべき結果が得ら
れ、本発明の顕著な効果が認められた。
Thus, a copper plated fine pitch heat seal connector member based on the copper vapor deposition film was obtained. The thermocompression-bonding layer at one end of the connector film of the obtained member was brought into contact with the electrodes of the liquid crystal display tube, and the thermocompression-bonding layer at the other end was brought into contact with the printed circuit board terminal portion, and both end portions of the one surface of the connector film were contacted. Were thermocompression-bonded at a heating temperature of 185 ° C. and a pressure of 40 kg / cm 2 to integrate them. In practical use, satisfactory results were obtained electrically and mechanically, and the remarkable effect of the present invention was recognized.

【0043】 実施例6 (1.スクリーン印刷法による) 厚さ16μm のアラミドフィルムに銅を厚さ 0.3μm 蒸着
させた銅蒸着フィルムの銅表面上に、電気硫酸銅メッキ
浴にて、銅皮膜を 2.0〜3.0 μm 析出し、防錆処理を行
い、その後水洗し、エアブロワーにて水分を切った後、
85℃の遠赤外線乾燥機中で3分間乾燥させた(工程
A)。
Example 6 (1. By Screen Printing Method) A copper film was formed on a copper surface of a copper vapor-deposited film in which copper was vapor-deposited on an aramid film having a thickness of 16 μm to a thickness of 0.3 μm with an electrolytic copper sulfate plating bath. 2.0 ~ 3.0 μm deposited, rustproofed, washed with water and drained with an air blower,
It was dried in a far infrared dryer at 85 ° C. for 3 minutes (step A).

【0044】前記の銅皮膜を析出した銅蒸着フィルムの
銅面上に、(イ)粒度 0.1〜60μmの黒鉛粉末30重量
%、 0.1μm 以下のカーボンブラック5重量%、(ロ)
クロロプレンゴム20重量%、(ハ)イソホロン20重量
%、ジメチルホルムアミド5重量%、(ニ)粒度10〜20
μm のニッケルメッキした上にさらに金メッキを施した
フェノール樹脂粉末20重量%とを混合(イ+ロ+ハ+
ニ)溶解し、均一に分散せしめた見掛け比重 1.8、粒度
7800ポイズの導電異方性懸濁液塗料を用いて所望のパタ
ーンをスクリーン印刷にて塗布し、110 ℃の遠赤炉にて
加熱乾燥した(工程B)。
On the copper surface of the copper vapor-deposited film having the copper coating deposited thereon, (a) 30% by weight of graphite powder having a particle size of 0.1 to 60 μm, 5% by weight of carbon black of 0.1 μm or less, (b)
Chloroprene rubber 20% by weight, (C) isophorone 20% by weight, dimethylformamide 5% by weight, (D) particle size 10 to 20
Mixed with 20% by weight of phenol resin powder, which was plated with μm nickel and further plated with gold (a + b + c +
D) Apparent specific gravity of 1.8 after dissolution and uniform dispersion, particle size
A desired pattern was applied by screen printing using a conductive anisotropic suspension paint of 7800 poise, and dried by heating in a far infrared oven at 110 ° C (step B).

【0045】印刷・乾燥工程(B)を終えた銅蒸着フィ
ルムを、1リットルの水に100 mlの塩化第二鉄液、 1.0
〜0.5 mlの塩酸を添加した混合溶液を用いて処理し、露
出した銅部分をすべてエッチング除去し、その後水洗し
てエッチング液を良く洗い流し、 100℃の温風中で1分
間乾燥させた(工程C)。
The copper vapor-deposited film that has undergone the printing / drying process (B) is added to 1 liter of water with 100 ml of ferric chloride solution, 1.0
It was treated with a mixed solution containing ~ 0.5 ml hydrochloric acid to remove all exposed copper parts by etching, and then rinsed with water to thoroughly wash away the etching solution, and dried in warm air at 100 ° C for 1 minute (step C).

【0046】前記工程(A+B+C)にて形成された、
導電異方性塗料層と、銅皮膜層から成る所望の導電回路
パターンと、その周囲の残余の露出したフィルム全体に
わたって絶縁性熱圧着懸濁液材料を塗布した。この塗料
の組成は、エポキシ系樹脂35重量%、メチルエチルケト
ン25重量%、キシレン25重量%、イソホロン10重量%、
レオシン10重量%から成り、見掛け比重 1.4、粘度 400
ポイズであった。加熱乾燥して熱圧着層を形成した(工
程D)。
Formed in the step (A + B + C),
The insulating thermocompression suspension material was applied over the conductive anisotropic paint layer, the desired conductive circuit pattern consisting of the copper coating layer, and the remaining exposed film around it. The composition of this paint is: epoxy resin 35% by weight, methyl ethyl ketone 25% by weight, xylene 25% by weight, isophorone 10% by weight,
Consists of 10% by weight of leosin, apparent specific gravity 1.4, viscosity 400
It was a poise. It was dried by heating to form a thermocompression bonding layer (step D).

【0047】次に、こうして形成されたヒートシールコ
ネクタフィルムを所望の長さ及び寸法に切断した(工程
E)。
Next, the heat-sealed connector film thus formed was cut into desired lengths and dimensions (step E).

【0048】このようにして得た銅蒸着フィルムをベー
スとした銅メッキファインピッチヒートシールコネクタ
部材を、実施例6と同様に熱圧着し、加熱温度 175℃、
圧力35kg/cm2 、20秒間それぞれ一体にした。実用に際
しても、電気的並びに機械的に満足すべき結果が得ら
れ、本発明の顕著な効果が認められた。
The copper plated fine pitch heat seal connector member based on the copper vapor deposition film thus obtained was thermocompression bonded in the same manner as in Example 6, and the heating temperature was 175 ° C.
The pressure was 35 kg / cm 2 , and they were integrated for 20 seconds. In practical use, satisfactory results were obtained electrically and mechanically, and the remarkable effect of the present invention was recognized.

【0049】 実施例7 (2.フォトエッチング法による) 厚さ25μm のポリイミドフィルムに、銅を厚さ 0.5μm
蒸着させた銅蒸着フィルムの銅表面上に、電気硫酸銅メ
ッキ浴にて、銅皮膜を 1.0〜2.0 μm 析出し、防錆処理
を行い、その後水洗にてメッキ液等を良く洗い流し、エ
アーブロワにて水分をよく切った後、80℃の遠赤外線乾
燥機中で、3分間乾燥させた(工程a)。
Example 7 (2. By Photo Etching Method) A polyimide film having a thickness of 25 μm and copper having a thickness of 0.5 μm
On the copper surface of the vapor-deposited copper vapor-deposited film, deposit a copper film of 1.0 to 2.0 μm in an electrolytic copper sulfate plating bath, perform anticorrosion treatment, and then rinse with water to thoroughly wash off the plating solution, etc., and use an air blower. After removing water well, it was dried in a far infrared dryer at 80 ° C. for 3 minutes (step a).

【0050】前記の銅皮膜を析出した銅蒸着フィルムの
銅面側に、粒度5〜20μm のニッケルメッキした上にさ
らに金メッキを施した銅粉末3重量%、フォトレジスト
用の光硬化型アクリル系ポリマー樹脂25重量%、アクリ
ルエステル光重合開始剤10重量%、エチルセロソルブア
セテート40重量%、トルエン20重量%、キシレン5重量
%、メチルエチルケトン2重量%を配合して調整したイ
ンク原液、すなわちフォトレジストインク97重量%に対
して導電性フィラー3重量%を添加混合し、均一に分散
せしめた見掛け比重 1.1、粘度30ポイズのフォトエッチ
ングレジスト導電性塗料を厚さ10μm にコーティング
し、80℃の温度にて60分間乾燥した(工程b)。
On the copper surface side of the copper vapor deposition film on which the copper coating is deposited, 3% by weight of nickel powder having a grain size of 5 to 20 μm and further gold plating, 3% by weight of a photocurable acrylic polymer for photoresists are used. Ink stock solution prepared by blending 25% by weight of resin, 10% by weight of acrylic ester photopolymerization initiator, 40% by weight of ethyl cellosolve acetate, 20% by weight of toluene, 5% by weight of xylene and 2% by weight of methyl ethyl ketone, that is, photoresist ink 97 3% by weight of conductive filler was added to and mixed by weight, and a photoetching resist conductive paint with an apparent specific gravity of 1.1 and a viscosity of 30 poise that was evenly dispersed was coated to a thickness of 10 μm, and the temperature was 60 ° C at 80 ° C. Dry for minutes (step b).

【0051】乾燥を終えた銅皮膜上のレジスト塗布面に
所望のパターンのネガを描いてあるネガフィルムを載置
し、真空密着させ紫外線露光(30mJ/cm2)し、パターン
部分を紫外線硬化させた(工程c)。紫外線露光を終え
た銅皮膜上のフォトエッチングレジスト導電性塗料の紫
外線硬化されていない部分(パターン以外の部分)を弱
アルカリ水溶液にて現像除去し、良く水洗し、その後エ
アーブロワにて銅皮膜上の水を吹き落とし、80℃の温度
にて60分間乾燥した(工程d)。
A negative film on which a negative of a desired pattern is drawn is placed on the resist-coated surface of the dried copper film, which is vacuum-contacted and exposed to ultraviolet rays (30 mJ / cm 2 ) to cure the pattern portion with ultraviolet rays. (Step c). Photo-etching resist on the copper film that has been exposed to UV light The part of the conductive paint that is not UV-cured (the part other than the pattern) is developed and removed with a weak alkaline aqueous solution, rinsed well, and then on the copper film with an air blower. Water was blown off, and it was dried at a temperature of 80 ° C. for 60 minutes (step d).

【0052】この銅蒸着フィルムの銅が直接表面に露出
した部分をすべてエッチング除去し、その後水洗にてエ
ッチング液を充分に洗い去り、 120℃の温風中で1分間
乾燥させた(工程e)。
All parts of the copper-deposited film where the copper was directly exposed on the surface were removed by etching, and then the etching solution was thoroughly washed off with water and dried in warm air at 120 ° C. for 1 minute (step e). .

【0053】前記の紫外線硬化させたフォトエッチング
レジスト層を表面に被着したまま残した所望のパターン
と、その周囲の残余の露出したフィルム部分との全体に
わたって絶縁性熱圧着懸濁液塗料を塗布し、熱圧着層を
形成した。この塗料の組成は、ニトリルゴム特殊合成樹
脂40重量%、フェノール系樹脂粉末20重量%、トルエン
10重量%、イソホロン10重量%、メチルイソブチルケト
ン5重量%、イソシアネート15重量%であり、見掛け比
重 1.2、粘度 750ポイズであった(工程f)。
An insulating thermocompression suspension paint is applied over the entire desired pattern in which the above-mentioned UV-cured photo-etching resist layer is left deposited on the surface and the remaining exposed film portion around it. Then, a thermocompression bonding layer was formed. The composition of this paint is 40% by weight of nitrile rubber special synthetic resin, 20% by weight of phenolic resin powder, and toluene.
The content was 10% by weight, 10% by weight of isophorone, 5% by weight of methyl isobutyl ketone, 15% by weight of isocyanate, an apparent specific gravity of 1.2 and a viscosity of 750 poise (step f).

【0054】次に、こうして熱圧着層を形成したヒート
シールコネクタフィルムを所望の長さ、及び幅寸法に切
断した(工程g)。こうして銅蒸着フィルムをベースと
した銅メッキファインピッチヒートシールコネクタ部材
を得た。
Next, the heat seal connector film having the thermocompression bonding layer thus formed was cut into desired lengths and widths (step g). Thus, a copper plated fine pitch heat seal connector member based on the copper vapor deposition film was obtained.

【0055】このコネクタ部材を実施例6と同様に熱圧
着し(加熱温度 180℃, 圧力40kg/cm2, 20 秒間) 、そ
れぞれ一体にした。上記部材は実用において、電気的並
びに機械的接続に関して充分に、満足すべき結果が得ら
れ、本発明の顕著な効果が認められた。
This connector member was thermocompression bonded in the same manner as in Example 6 (heating temperature 180 ° C., pressure 40 kg / cm 2 , 20 seconds) and integrated into each. In practical use, the above-mentioned members were sufficiently satisfactory in terms of electrical and mechanical connections, and the remarkable effects of the present invention were recognized.

【0056】[0056]

【発明の効果】本発明の銅蒸着層をベースとした銅皮膜
層を有するファインピッチヒートシールコネクタ部材
は、従来のファインピッチヒートシールコネクタが、可
撓性絶縁フィルムの上に導電性懸濁液塗料からなる導電
性回路及び絶縁熱圧着層から構成されるのに対して導電
異方性懸濁液塗料から成る導電性回路の下に銅皮膜層を
有することにより、安定した低電気抵抗値が得られる。
これにより、従来のファインピッチヒートシールコネク
タよりさらに電気的信頼性が高くなり、ファインピッチ
対応により一層良好かつ確実な効果が見られる。
The fine pitch heat seal connector member having the copper coating layer based on the copper vapor deposition layer of the present invention is a conventional fine pitch heat seal connector member having a conductive suspension on a flexible insulating film. A stable low electric resistance value is obtained by having a copper film layer under the conductive circuit composed of the conductive anisotropic suspension paint, while it is composed of the conductive circuit composed of the paint and the insulating thermocompression bonding layer. can get.
As a result, the electrical reliability becomes higher than that of the conventional fine-pitch heat seal connector, and a better and more reliable effect can be seen due to the fine pitch correspondence.

【0057】また本発明の上記ヒートシールコネクタ部
材は、従来の可撓性絶縁フィルム上に銅箔層15〜35μm
を有するヒートシールコネクタ部材がフィルムと銅箔層
との間にバインダー層を有した三層構造をもつベースフ
ィルムであるのに対して可撓性絶縁フィルムに直ちに銅
皮膜層が密着した二層構造のベースフィルムであること
により可撓性絶縁フィルムと銅皮膜との密着性が著しく
優れ、またヒートシールコネクタの薄膜化への対応を可
能にする。
Further, the heat seal connector member of the present invention has a copper foil layer of 15 to 35 μm on a conventional flexible insulating film.
The heat seal connector member having a base film having a three-layer structure having a binder layer between the film and the copper foil layer has a two-layer structure in which the copper film layer is immediately adhered to the flexible insulating film. Since it is a base film, the adhesiveness between the flexible insulating film and the copper film is remarkably excellent, and the heat seal connector can be made thinner.

【0058】かくして本発明によって得られるヒートシ
ールコネクタ部材は、広く電気電子機器、ワードプロセ
ッサー、時計、カメラ等に用いることができる。
Thus, the heat seal connector member obtained by the present invention can be widely used in electric and electronic equipment, word processors, watches, cameras and the like.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例のヒートシールコネクタ部材
を拡大して示す模式正面図である。
FIG. 1 is an enlarged schematic front view showing a heat seal connector member of an embodiment of the present invention.

【図2】図1のII−II′線で切断して示す拡大模式断面
図である。
FIG. 2 is an enlarged schematic cross-sectional view taken along the line II-II ′ of FIG.

【図3】本発明によるヒートシールコネクタ部材の熱圧
着後の要部を拡大して示す模式断面図である。
FIG. 3 is a schematic cross-sectional view showing an enlarged main part of the heat seal connector member according to the present invention after thermocompression bonding.

【図4】本発明によるヒートシールコネクタ部材の一使
用例を示す斜視図である。
FIG. 4 is a perspective view showing a usage example of the heat seal connector member according to the present invention.

【符号の説明】[Explanation of symbols]

1 可撓性絶縁フィルム 2 銅皮膜層(銅蒸着層+銅メッキ層) 3 導電異方性回路 4 絶縁熱圧着層 5 各種のディスプレイ 6 プリント回路基板 7 本発明の一実施例によるヒートシールコネクタ部材 8 液晶表示管の電極部分 9 プリント回路基板端子部分 DESCRIPTION OF SYMBOLS 1 Flexible insulating film 2 Copper film layer (copper vapor deposition layer + copper plating layer) 3 Conductive anisotropic circuit 4 Insulation thermocompression bonding layer 5 Various displays 6 Printed circuit board 7 Heat seal connector member according to an embodiment of the present invention 8 Electrode part of liquid crystal display tube 9 Printed circuit board terminal part

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 電子素子の電極部分及びプリント回路基
板部分をそれぞれこれと対向する各端子部分に、機械的
並びに電気的にそれぞれ接続するための銅蒸着フィルム
をベースとした銅メッキファインピッチヒートシールコ
ネクタ部材を製造するに当り、 (A)可撓性絶縁フィルムの表面に銅を膜厚 0.1〜0.5
μm に蒸着させ、銅蒸着フィルムの銅表面に、電解銅メ
ッキによって 1.0〜10.0μm の厚さに銅皮膜を析出・表
面処理する工程と、 (B)工程(A)で得られた銅皮膜の表面上に、 (イ)粒度 0.1〜60μm の黒鉛粉末、銀粉末及び粒度
0.1μm 以下のカーボンブラック粉末の1種又は2種以
上からなる導電性微粉末10〜60重量%と、 (ロ)クロロプレンゴム、クロロスルホン化ゴム、ポリ
ウレタン樹脂及びポリエステル樹脂の1種又は2種以上
から成るゴム系及び熱可塑性樹脂系の結合剤5〜30重量
%と、 (ハ)ジメチルホルムアミド、ジアセトンアルコール、
イソホロン、ジエチルカルビトール、ブチルカルビトー
ル及びテレビン油の1種又は2種以上から成る有機溶剤
30〜50重量%と、 (ニ)粒度1.0 〜50.0μm の黒鉛粉末、銀粉末、銅粉
末、ニッケル粉末、パラジウム粉末、錫粉末、ハンダ粉
末、ニッケルメッキした上にさらに金メッキを施した銅
粉末、金メッキニッケル粉末、金メッキ錫粉末、ニッケ
ルメッキした上にさらに金メッキを施した樹脂ビーズ粉
末のうちの1種又は2種以上から成る導電性微粉末5〜
70重量%とを混合(イ+ロ+ハ+ニ)溶解し、均一に分
散せしめた見掛け比重 0.9〜2.3 、粘度 300〜12000 ポ
イズの導電異方性懸濁液塗料を用いて、電子素子の電極
部分及びプリント回路基板端子部分を、それぞれこれと
対向する各端子部分に機械的並びに電気的にそれぞれ接
続するための、所望の長さと横幅と各導電路間隔幅とを
有する縦縞細条形ヒートシールコネクタパターンをスク
リーン印刷にて塗布し、加熱、乾燥する工程と、 (C)該ヒートシールコネクタパターンを備えるフィル
ム上の露出した銅部分を、塩化第二鉄、塩酸を用いてパ
ターンエッチングにて除去し、その後水洗にてエンチン
グ液を良く洗い落し、フィルムを40℃〜100 ℃の温度で
乾燥させる工程と、 (D)前記工程(A+B+C)にて形成された、導電性
塗料層を銅表面に被着したまま残した所望の縦縞細条形
パターン、及びその周囲の残余の露出したフィルム部分
の全体にわたって、(i)酸化チタン、タルク、水和ア
ルミナ及びコロイダルシリカの1種又は2種以上から成
る粉末5〜30重量%と、 (ii) クロロプレン合成ゴム、
ポリエステル樹脂、エチレン−酢酸ビニル共重合体樹脂
及びポリメチルメタクリレート樹脂の1種又は2種以上
から成る熱可塑性樹脂結合剤又はフェノール樹脂及びエ
ポキシ樹脂の1種又は2種以上から成る熱硬化性樹脂結
合剤20〜60重量%と、(iii) イソホロン、ジアセトンア
ルコール、メチルイソブチルケトン、キシレン、トルエ
ン及びジエチルカルビトールの1種又は2種以上から成
る有機溶剤10〜70重量%と、 (iv) テルペン系樹脂及び
脂肪族炭化水素系樹脂の1種又は2種から成る粘着付与
剤0.1 〜20重量%とを混合(i+ii+iii +iv)溶解
し、均一に分散せしめた見掛け比重 0.8〜1.4 、粘度15
0 〜5000ポイズの絶縁性熱圧着懸濁液塗料を用いてスク
リーン印刷にて全面塗布し、加熱乾燥して熱圧着層を最
上層に形成する工程と、 (E)前記工程(A+B+C+D)にて形成され最上層
に熱圧着層を有しその下層に所望の導電回路パターンを
有するフィルムを、所望の長さ幅寸法に切断する工程 とから成ることを特徴とする銅蒸着フィルムをベースと
した銅メッキファインピッチヒートシールコネクタ部材
の製造方法。
1. A copper-plated fine pitch heat seal based on a copper vapor-deposited film for mechanically and electrically connecting an electrode portion of an electronic element and a printed circuit board portion to respective terminal portions facing each other. When manufacturing the connector member, (A) a copper film having a thickness of 0.1 to 0.5 is formed on the surface of the flexible insulating film.
of the copper film obtained in the step (B) and the step (A) in which the copper film is deposited and surface-treated to a thickness of 1.0 to 10.0 μm by electrolytic copper plating on the copper surface of the copper vapor deposition film. (A) Graphite powder with a particle size of 0.1 to 60 μm, silver powder and particle size on the surface.
10 to 60% by weight of conductive fine powder consisting of one or more kinds of carbon black powder of 0.1 μm or less, and (b) one or more kinds of chloroprene rubber, chlorosulfonated rubber, polyurethane resin and polyester resin 5 to 30% by weight of a rubber-type and thermoplastic resin-type binder consisting of (C) dimethylformamide, diacetone alcohol,
Organic solvent consisting of one or more of isophorone, diethyl carbitol, butyl carbitol and turpentine oil.
30 to 50% by weight, (d) graphite powder with a particle size of 1.0 to 50.0 μm, silver powder, copper powder, nickel powder, palladium powder, tin powder, solder powder, nickel-plated copper powder with gold plating, Conductive fine powder consisting of one or more of gold-plated nickel powder, gold-plated tin powder, and resin-bead powder plated with nickel and then gold-plated 5
70% by weight was mixed (I + B + C + D) to be dissolved and uniformly dispersed, using an electrically conductive anisotropic suspension paint with an apparent specific gravity of 0.9 to 2.3 and a viscosity of 300 to 12000 poises A vertical striped strip-shaped heat having a desired length, a lateral width, and a width between conductive paths for mechanically and electrically connecting the electrode portion and the printed circuit board terminal portion to respective terminal portions facing each other. A step of applying a seal connector pattern by screen printing, heating and drying, and (C) pattern-exposing the exposed copper portion on the film having the heat seal connector pattern using ferric chloride and hydrochloric acid. The step of removing, then thoroughly washing off the enching solution by washing with water, and drying the film at a temperature of 40 ° C to 100 ° C, and (D) the conductive paint layer formed in the step (A + B + C) on the copper surface. (I) one or two of titanium oxide, talc, hydrated alumina and colloidal silica over the entire desired striped striped pattern left on the surface and the remaining exposed film portion around it. 5 to 30% by weight of powder composed of the above, (ii) chloroprene synthetic rubber,
Thermoplastic resin binder comprising one or more of polyester resin, ethylene-vinyl acetate copolymer resin and polymethylmethacrylate resin, or thermosetting resin binder comprising one or more of phenol resin and epoxy resin. 20-60% by weight of the agent, (iii) 10-70% by weight of an organic solvent consisting of one or more of isophorone, diacetone alcohol, methyl isobutyl ketone, xylene, toluene and diethyl carbitol, and (iv) terpene 0.1 to 20% by weight of a tackifier consisting of one or two of a resin and an aliphatic hydrocarbon resin are mixed (i + ii + iii + iv), dissolved and uniformly dispersed to give an apparent specific gravity of 0.8 to 1.4 and a viscosity of 15
In the process of applying the whole surface by screen printing using an insulating thermocompression-bonding suspension paint of 0 to 5000 poise, and drying by heating to form the thermocompression-bonding layer on the uppermost layer, (E) In the process (A + B + C + D) Forming a thermocompression-bonded layer as an uppermost layer and cutting a film having a desired conductive circuit pattern as an underlying layer into desired length and width dimensions; Method for manufacturing plated fine pitch heat seal connector member.
【請求項2】 (a)可撓性絶縁フィルムに膜厚0.1 〜
0.5 μm に銅を蒸着させ、この蒸着銅表面に電解銅メッ
キによって1.0 〜10.0μm の銅皮膜を析出・表面処理
し、その後水洗浄にてメッキ液を良く洗い落し、フィル
ムを40〜100 ℃の温度で乾燥させる工程と、 (b)工程(a)で得られた銅皮膜の表面上に、粒度1.
0 〜50.0μm の銀粉末、銅粉末、ニッケル粉末、パラジ
ウム粉末、錫粉末、ハンダ粉末、ニッケルメッキした上
にさらに金メッキを施したガラスまたは銅粉末、金メッ
キニッケル粉末、金メッキ錫粉末、ニッケルメッキした
上にさらに金メッキを施した樹脂ビーズ粉末のうちの1
種又は2種以上から成る導電性微粉末1〜40重量%を、
フォトレジストとして用いられる感光性のアクリル系ポ
リマー樹脂及びアクリルエステル、又は感光性のエポキ
シ系ポリマー樹脂を主成分とするフォトエッチングレジ
ストインク60〜99重量%と混合し、均一に分散せしめた
見掛け比重0.9 〜2.0 、粒度0.1 〜1000ポイズの導電性
を持たせたフォトエッチングレジスト塗料を、厚さ5〜
30μm にコーティングし、20〜70℃の温度にて10分〜12
時間乾燥を行う塗布・乾燥工程と、 (c)該塗布・乾燥工程(b)を終えた塗布面に、所望
寸法の縦縞細条形パターンを描いてあるネガフィルムを
載置し、紫外線露光を行い、所望のパターン部分を硬化
させる紫外線露光工程と、 (d)該紫外線露光工程(c)を終えた導電性フォトエ
ッチングレジスト塗膜の硬化されていない部分を弱アル
カリ水溶液にて洗い流して除去し、30〜120 ℃の温度に
て乾燥させ、硬化させたフォトエッチングレジスト塗膜
を被着した所望部分のパターン形成する工程と、 (e)該工程(d)を終えたフィルム上の露出した銅部
分をすべてエッチング除去し、その後水洗にてエッチン
グ液を良く洗い落し、フィルムを40〜100 ℃の温度で乾
燥させる工程と、 (f)前記工程(a+b+c+d+e)にて形成され、
前記紫外線硬化させたフォトエッチングレジスト層を銅
皮膜表面に被着したまま残した所望のパターン、及びそ
の周囲の残余の露出したフィルム部分の全体にわたっ
て、見掛け比重0.8 〜1.4 、粘度150 〜5000ポイズの絶
縁性熱圧着懸濁液塗料を用いて、スクリーン印刷にて全
面塗布し、加熱乾燥して熱圧着層を最上層に形成する工
程と、 (g)前記工程(a+b+c+d+e+f)にて形成さ
れ最上層に熱圧着層を有しその下層に所望の導電回路パ
ターンを有する銅蒸着フィルムを、所望の長さ及び幅寸
法に切断する工程 とから成ることを特徴とする請求項1記載の銅蒸着フィ
ルムをベースとした銅メッキファインピッチヒートシー
ルコネクタ部材の製造方法。
2. A flexible insulating film having a thickness of 0.1 to
Copper is vapor-deposited to 0.5 μm, and a copper film of 1.0 to 10.0 μm is deposited and surface-treated on this vapor-deposited copper surface by electrolytic copper plating, and then the plating solution is thoroughly washed off with water to remove the film at 40 to 100 ° C. Grain size 1. on the surface of the copper film obtained in the step of drying at temperature and (b) step (a).
0 to 50.0 μm silver powder, copper powder, nickel powder, palladium powder, tin powder, solder powder, nickel-plated glass or copper powder, gold-plated nickel powder, gold-plated tin powder, nickel-plated One of the resin bead powders which is further gold plated
1 to 40% by weight of conductive fine powder composed of two or more kinds,
Photosensitive acrylic polymer resin and acrylic ester used as a photoresist, or 60 to 99% by weight of a photo-etching resist ink containing a photosensitive epoxy polymer resin as a main component, and an apparent specific gravity of 0.9 evenly dispersed. ~ 2.0, grain size 0.1 ~ 1000 Poise conductive photo-etching resist paint with a thickness of 5 ~
Coat to 30 μm and keep at a temperature of 20 to 70 ℃ for 10 to 12 minutes.
A coating / drying step of time-drying, and (c) a negative film on which a striped stripe pattern of a desired size is drawn is placed on the coating surface that has undergone the coating / drying step (b), and exposed to ultraviolet light. And an ultraviolet exposure step of curing a desired pattern portion, and (d) an uncured portion of the conductive photoetching resist coating film which has completed the ultraviolet exposure step (c) is washed away with a weak alkaline aqueous solution to remove it. , A step of forming a pattern of a desired portion on which a cured photo-etching resist coating film is applied by drying at a temperature of 30 to 120 ° C., and (e) exposed copper on the film which has finished the step (d). All the parts are removed by etching, and then the etching solution is thoroughly washed off with water, and the film is dried at a temperature of 40 to 100 ° C., and (f) is formed in the step (a + b + c + d + e),
A desired pattern left by depositing the UV-cured photo-etching resist layer on the copper film surface, and the entire remaining exposed film portion around it, an apparent specific gravity of 0.8 to 1.4 and a viscosity of 150 to 5000 poise. A step of applying an insulating thermocompression-bonding suspension paint on the entire surface by screen printing and heating and drying to form a thermocompression-bonding layer on the uppermost layer; and (g) the uppermost layer formed in the step (a + b + c + d + e + f). 2. A copper-deposited film having a thermocompression-bonding layer and a copper-deposited film having a desired conductive circuit pattern as an underlying layer is cut into desired length and width dimensions. A method for manufacturing a copper-plated fine-pitch heat seal connector member used as a base.
JP14427992A 1992-06-04 1992-06-04 Method for producing copper plated fine pitch heat seal connector member based on copper vapor deposition film Expired - Lifetime JPH0719488B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14427992A JPH0719488B2 (en) 1992-06-04 1992-06-04 Method for producing copper plated fine pitch heat seal connector member based on copper vapor deposition film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14427992A JPH0719488B2 (en) 1992-06-04 1992-06-04 Method for producing copper plated fine pitch heat seal connector member based on copper vapor deposition film

Publications (2)

Publication Number Publication Date
JPH05342916A JPH05342916A (en) 1993-12-24
JPH0719488B2 true JPH0719488B2 (en) 1995-03-06

Family

ID=15358389

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14427992A Expired - Lifetime JPH0719488B2 (en) 1992-06-04 1992-06-04 Method for producing copper plated fine pitch heat seal connector member based on copper vapor deposition film

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JPH05342916A (en) 1993-12-24

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