JPH07180072A - Production of etched parts - Google Patents

Production of etched parts

Info

Publication number
JPH07180072A
JPH07180072A JP28414594A JP28414594A JPH07180072A JP H07180072 A JPH07180072 A JP H07180072A JP 28414594 A JP28414594 A JP 28414594A JP 28414594 A JP28414594 A JP 28414594A JP H07180072 A JPH07180072 A JP H07180072A
Authority
JP
Japan
Prior art keywords
etching
etched
alloy
carbon content
nickel
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP28414594A
Other languages
Japanese (ja)
Inventor
Tsunenori Kato
藤 凡 典 加
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Dai Nippon Printing Co Ltd
Original Assignee
Dai Nippon Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dai Nippon Printing Co Ltd filed Critical Dai Nippon Printing Co Ltd
Priority to JP28414594A priority Critical patent/JPH07180072A/en
Publication of JPH07180072A publication Critical patent/JPH07180072A/en
Pending legal-status Critical Current

Links

Landscapes

  • Lead Frames For Integrated Circuits (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE:To produce high-precision and high-quality etched parts without any roughness at 5 high rate by forming a resist pattern on a thin cold-rolled Ni-Fe alloy sheet having a specified content of carbon and etching the sheet at a high rate. CONSTITUTION:A 42% Ni-Fe alloy or a 36% Ni-Fe alloy is cold-rolled into a sheet having 0.02-0.40mm thickness to obtain an Ni-Fe alloy material to be etched. The carbon content of the material is controlled to <=0.1%, a resist pattern is formed on the surface, and the sheet is etched. In this case, the etching rate is increased by 25-30% as compared with a material to be treated contg. 0.02% C.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明はエッチング加工用素材に
係り、更に詳しくはIC用リードフレーム等のエッチン
グ加工部品の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a material for etching processing, and more particularly to a method for manufacturing an etching processed component such as an IC lead frame.

【0002】[0002]

【従来の技術】IC用リードフレームの多くは板厚0.
10〜0.30mmの42合金と呼ばれる42%−ニッ
ケル−鉄合金をプレス打ち抜き加工、あるいはエッチン
グ加工によって製造されている。また、表示管等の各種
電子部品用素材として50%ニッケル−鉄合金や52%
ニッケル−鉄合金等のニッケル−鉄合金が用いられてい
る。
2. Description of the Related Art Most lead frames for ICs have a thickness of 0.
It is manufactured by press punching or etching a 42% -nickel-iron alloy called a 42 alloy of 10 to 0.30 mm. Also, as a material for various electronic parts such as display tubes, 50% nickel-iron alloy and 52%
Nickel-iron alloys such as nickel-iron alloys have been used.

【0003】しかしながら、ニッケル−鉄合金よりなる
素材をエッチング加工する場合、比較的長いエッチング
時間を要し、特に細かいパターンをエッチング加工する
ときにエッチング時間が長くなることから、フォトレジ
ストと素材の密着力が低下し、エッチングによって形成
される製品の加工部の直線性等が損なわれるという問題
があった。
However, when etching a material made of a nickel-iron alloy, a relatively long etching time is required, and particularly when etching a fine pattern, the etching time becomes long. There is a problem that the force is reduced and the linearity of the processed portion of the product formed by etching is impaired.

【0004】また、エッチングによって形成される断面
がアラビと呼ばれる状態になり、ガサツキが生じてしま
うという問題があった。
Further, there has been a problem that a cross section formed by etching becomes a state called arabi, which causes rasping.

【0005】[0005]

【発明が解決しようとする課題】そこで本発明は、上記
の従来の欠点を解消したエッチング加工部品を提供する
ことにある。
SUMMARY OF THE INVENTION Therefore, the present invention is to provide an etching-processed component which eliminates the above-mentioned conventional drawbacks.

【0006】[0006]

【課題を解決するための手段】本発明者は上記の問題点
を解決すべく研究の結果、素材中の炭素含有量を0.0
1%以下にすることにより、初期の目的を達成し得るこ
とを見いだし、かかる知見に基づいて本発明を完成した
ものである。
As a result of research to solve the above problems, the present inventor found that the carbon content in the material was 0.0
It was found that the initial purpose can be achieved by setting the content to 1% or less, and the present invention has been completed based on such findings.

【0007】すなわち、本発明の第1の態様に係るエッ
チング加工部品の製造方法は、冷間圧延によって製造さ
れる板厚0.020〜0.40mmの42%Ni−Fe
合金よりなるエッチング加工用のニッケル−鉄合金素材
であって、該素材中の炭素含有量が0.01%以下のエ
ッチング加工用素材の表面にレジストパターンを形成
し、次いで、前記エッチング加工用素材をエッチングす
るに際して、前記炭素含有量が0.02%のエッチング
加工用素材をエッチングする場合と比較して25〜30
%速いエッチング速度で前記エッチング加工用素材のエ
ッチングを行うようにしたことを特徴とするものであ
る。
That is, in the method for manufacturing an etched part according to the first aspect of the present invention, 42% Ni-Fe having a plate thickness of 0.020 to 0.40 mm manufactured by cold rolling is used.
A nickel-iron alloy material for etching, which is made of an alloy, wherein a resist pattern is formed on the surface of the material for etching, which has a carbon content of 0.01% or less, and then the material for etching. When etching the material, the carbon content is 25 to 30 compared with the case of etching the material for etching processing having a carbon content of 0.02%.
%, The material for etching is etched at a high etching rate.

【0008】更に、本発明の第2の態様に係るエッチン
グ加工部品の製造方法は、冷間圧延によって製造される
板厚0.020〜0.40mmの36%Ni−Fe合金
よりなるエッチング加工用のニッケル−鉄合金素材であ
って、該素材中の炭素含有量が0.01%以下のエッチ
ング加工用素材の表面にレジストパターンを形成し、次
いで、前記エッチング加工用素材をエッチングするに際
して、前記炭素含有量が0.02%のエッチング加工用
素材をエッチングする場合と比較して25〜30%速い
エッチング速度で前記エッチング加工用素材のエッチン
グを行うようにしたことを特徴とするものである。
Further, the method for manufacturing an etched part according to the second aspect of the present invention is for etching process which is made of a 36% Ni-Fe alloy having a plate thickness of 0.020 to 0.40 mm manufactured by cold rolling. A nickel-iron alloy material, wherein a carbon content of the material is 0.01% or less, a resist pattern is formed on the surface of the material for etching, and then the material for etching is etched, It is characterized in that the material for etching processing is etched at an etching rate which is 25 to 30% faster than that in the case of etching a material for etching processing having a carbon content of 0.02%.

【0009】[0009]

【作用】しかして本発明において炭素含有量を0.01
%以下にすることによりエッチング速度は早められると
ともにアラビが解消されるものである。
In the present invention, however, the carbon content is 0.01
By setting the content to be not more than%, the etching rate is increased and the arabic is eliminated.

【0010】ニッケル−鉄合金のエッチング速度はニッ
ケル含有量によって変わり、ニッケル含有量が少ないほ
ど早くなる傾向はあるが、ニッケル含有量が50%以下
のニッケル−鉄合金について調べた結果、複数のニッケ
ル含有量が異なるニッケル−鉄合金について炭素含有量
が0.01%以下のときエッチング速度が早いという共
通の現象が認められた。
The etching rate of a nickel-iron alloy changes depending on the nickel content, and the smaller the nickel content, the faster the etching rate. For nickel-iron alloys having different contents, a common phenomenon was observed that the etching rate was high when the carbon content was 0.01% or less.

【0011】なお、上記のようなエッチング加工用素材
は、通常、所定の板厚に加工するために、熱間圧延、冷
間圧延、焼鈍等の工程が繰り返して行われるが、特に冷
間圧延はIC用リードフレームやシャドウマスク等のエ
ッチング加工用素材に必須の工程である。また、これら
のエッチング加工用素材としては、一般に0.020〜
0.40mmの範囲の板厚に加工され、所定のエッチン
グが施される。板厚が0.020mm未満では、素材形
状の維持、強度の点からエッチング加工用素材として不
利であり、一方、板厚が0.40mmを超えるとエッチ
ング時間が増大し、レジストの強度も不足して寸法精度
が勢い悪くなるので好ましくない。
The above-mentioned material for etching processing is usually subjected to repeated steps such as hot rolling, cold rolling and annealing in order to process it into a predetermined plate thickness, but particularly cold rolling. Is an essential step for etching processing materials such as IC lead frames and shadow masks. Moreover, as a material for these etching processes, generally 0.020 to
The plate is processed into a plate thickness in the range of 0.40 mm and subjected to predetermined etching. If the plate thickness is less than 0.020 mm, it is disadvantageous as a material for etching processing from the viewpoint of maintaining the shape of the material and strength, while if the plate thickness exceeds 0.40 mm, the etching time increases and the resist strength becomes insufficient. This is not preferable because the dimensional accuracy becomes poor.

【0012】図1は42%ニッケル−鉄合金について求
めた炭素含有量によるエッチング速度の変化を示す。
FIG. 1 shows the change in etching rate depending on the carbon content determined for a 42% nickel-iron alloy.

【0013】この図から明らかなように炭素含有量が
0.02%のときのエッチング速度を1とすると0.0
1%以下の炭素含有量のときには1.25〜1.30と
炭素含有量が0.02%の場合に比して25%〜30%
早くなる。
As is clear from this figure, when the etching rate is 1 when the carbon content is 0.02%, it is 0.0
1.25 to 1.30 when the carbon content is 1% or less, and 25% to 30% as compared with the case where the carbon content is 0.02%.
Get faster

【0014】また、図2は、36%ニッケル−鉄合金に
ついて求めた炭素含有量によるエッチング速度の変化を
示す。
FIG. 2 also shows the change in etching rate depending on the carbon content obtained for the 36% nickel-iron alloy.

【0015】36%ニッケル−鉄合金についても42%
ニッケル−鉄合金の場合も同様に炭素含有量が0.01
%以下のときにエッチング速度が早くなっている。
42% for 36% nickel-iron alloy
Similarly, in the case of nickel-iron alloy, the carbon content is 0.01
When it is less than%, the etching rate becomes faster.

【0016】[0016]

【実施例】板厚0.15mmのNi%;41.5%、C
%;0.007%であるニッケル−鉄合金よりなる素材
の両面に100ピンのリードフレームのレジストパター
ンを設け、液温70℃の48°B′eFeCl腐食液
を用い、2.0Kg/cm2 のスプレイ圧で両面からス
プレイエッチングして、製品を得た。比較例 板厚0.15mmのNi%;41.8%、C%;0.0
23%であるニッケル−鉄合金よりなる素材に対して実
施例と同様にしてレジスト製版したのち、液温70℃の
48°B′eFeCl腐食液を用い、2.0Kg/c
2 のスプレイ圧で両面からスプレイエッチングし、製
品を得た。
[Example] Ni% having a plate thickness of 0.15 mm; 41.5%, C
%; 0.007% nickel-iron alloy material with a 100-pin lead frame resist pattern on both sides, and using a 48 ° B'eFeCl 3 corrosive liquid at a liquid temperature of 70 ° C., 2.0 Kg / cm The product was obtained by spray etching from both sides with a spray pressure of 2 . Comparative Example Plate thickness 0.15 mm Ni%; 41.8%, C%; 0.0
A resist plate was prepared in the same manner as in the example with respect to a material composed of 23% nickel-iron alloy, and then 2.0 Kg / c was used using a 48 ° B'eFeCl 3 corrosive solution at a liquid temperature of 70 ° C.
A product was obtained by performing spray etching from both sides with a spray pressure of m 2 .

【0017】表1に実施例および比較例の結果を示す。Table 1 shows the results of Examples and Comparative Examples.

【0018】 表 1 Ni% C % エッチング速度 エッチング状態 実施例 41.5 0.007 1.25 良好 比較例 41.8 0.023 1.0 アラビ有り (注) エッチング速度は炭素含有量が0.023%の
素材をエッチングした時所定の寸法に達するまでの速度
を1としたものである。
Table 1 Ni% C% etching rate Etching state Example 41.5 0.007 1.25 Good comparative example 41.8 0.023 1.0 With arabic (Note) The etching rate is such that the carbon content is 0. The rate at which a predetermined size is reached when 023% of the material is etched is defined as 1.

【0019】表1に示すように本願発明によるものは従
来のものよりも早く、精度良く、エッチング加工するこ
とができ、また、アラビは見られなかった。図3は上記
比較例におけるエッチング断面部のSEM写真(400
倍)であり、図4は上記実施例における同様の写真であ
る。この写真から比較例においてはエッチング断面にア
ラビが認められ、実施例においてはアラビが存在しない
ことが確認できる。
As shown in Table 1, the one according to the present invention can be etched more quickly and more accurately than the conventional one, and no arabi was observed. FIG. 3 is a SEM photograph (400
4), and FIG. 4 is a similar photograph in the above example. From this photograph, it can be confirmed that in the comparative example, arabic was observed in the etched cross section, and in the example, no arabic was present.

【0020】[0020]

【発明の効果】以上詳記した通り、本発明の方法によれ
ば早く、精度良くエッチング加工することができ、アラ
ビは見られず、品質の良いエッチング製品を製造するこ
とができる。
As described above in detail, according to the method of the present invention, it is possible to perform etching processing quickly and accurately, without producing arabia, and to manufacture an etching product of high quality.

【図面の簡単な説明】[Brief description of drawings]

【図1】42%Ni−Fe合金について求めた炭素量に
よるエッチング速度の変化を示すグラフ。
FIG. 1 is a graph showing changes in etching rate depending on the amount of carbon, which was obtained for a 42% Ni—Fe alloy.

【図2】36%Ni−Fe合金について求めた炭素量に
よるエッチング速度の変化を示すグラフ。
FIG. 2 is a graph showing a change in etching rate depending on the amount of carbon, which was obtained for a 36% Ni—Fe alloy.

【図3】比較例におけるエッチング断面部の金属組織の
SEM写真(400倍)。
FIG. 3 is a SEM photograph (400 times) of a metal structure of an etched cross section in a comparative example.

【図4】実施例におけるエッチング断面部の金属組織の
SEM写真(400倍)。
FIG. 4 is a SEM photograph (400 times) of a metal structure of an etched cross section in an example.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】冷間圧延によって製造される板厚0.02
0〜0.40mmの42%Ni−Fe合金よりなるエッ
チング加工用のニッケル−鉄合金素材であって、該素材
中の炭素含有量が0.01%以下のエッチング加工用素
材の表面にレジストパターンを形成し、 次いで、前記エッチング加工用素材をエッチングするに
際して、前記炭素含有量が0.02%のエッチング加工
用素材をエッチングする場合と比較して25〜30%速
いエッチング速度で前記エッチング加工用素材のエッチ
ングを行うようにしたことを特徴とする、エッチング加
工部品の製造方法。
1. A plate thickness of 0.02 produced by cold rolling.
A nickel-iron alloy material for etching, which is made of a 0% to 0.40 mm 42% Ni-Fe alloy, and has a carbon content in the material of 0.01% or less. And then etching the material for etching, the material for etching is 25 to 30% faster than that for etching the material having carbon content of 0.02%. A method for producing an etched part, characterized in that the material is etched.
【請求項2】冷間圧延によって製造される板厚0.02
0〜0.40mmの36%Ni−Fe合金よりなるエッ
チング加工用のニッケル−鉄合金素材であって、該素材
中の炭素含有量が0.01%以下のエッチング加工用素
材の表面にレジストパターンを形成し、 次いで、前記エッチング加工用素材をエッチングするに
際して、前記炭素含有量が0.02%のエッチング加工
用素材をエッチングする場合と比較して25〜30%速
いエッチング速度で前記エッチング加工用素材のエッチ
ングを行うようにしたことを特徴とする、エッチング加
工部品の製造方法。
2. A plate thickness 0.02 produced by cold rolling.
A nickel-iron alloy material for etching, which is composed of a 0-0.40 mm 36% Ni-Fe alloy, and has a carbon content of 0.01% or less in the material. And then etching the material for etching, the material for etching is 25 to 30% faster than that for etching the material having carbon content of 0.02%. A method for producing an etched part, characterized in that the material is etched.
JP28414594A 1994-10-25 1994-10-25 Production of etched parts Pending JPH07180072A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28414594A JPH07180072A (en) 1994-10-25 1994-10-25 Production of etched parts

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28414594A JPH07180072A (en) 1994-10-25 1994-10-25 Production of etched parts

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP20477684A Division JPS6182453A (en) 1984-09-29 1984-09-29 Etching material

Publications (1)

Publication Number Publication Date
JPH07180072A true JPH07180072A (en) 1995-07-18

Family

ID=17674757

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28414594A Pending JPH07180072A (en) 1994-10-25 1994-10-25 Production of etched parts

Country Status (1)

Country Link
JP (1) JPH07180072A (en)

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033337A (en) * 1983-08-05 1985-02-20 Nisshin Steel Co Ltd High ni-fe alloy for electronic parts
JPS6164853A (en) * 1984-09-06 1986-04-03 Toshiba Corp Base material for pipe parts and its manufacture
JPS61117856A (en) * 1984-11-14 1986-06-05 Sumitomo Electric Ind Ltd Heat sink

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033337A (en) * 1983-08-05 1985-02-20 Nisshin Steel Co Ltd High ni-fe alloy for electronic parts
JPS6164853A (en) * 1984-09-06 1986-04-03 Toshiba Corp Base material for pipe parts and its manufacture
JPS61117856A (en) * 1984-11-14 1986-06-05 Sumitomo Electric Ind Ltd Heat sink

Similar Documents

Publication Publication Date Title
JPH0443980B2 (en)
JPH07180072A (en) Production of etched parts
JPH1060525A (en) Production of low thermal expansion alloy thin sheet excellent in sheet shape and thermal shrinkage resistance
JP3268369B2 (en) High precision rolled metal sheet manufacturing equipment
JPH03267320A (en) Production of shadow mask material
JPH09118959A (en) Stock for etching
JPS6182453A (en) Etching material
JP2909088B2 (en) Fe-Ni alloy with excellent etching processability
US6024809A (en) Fe-Ni alloy materials for electronic parts
JPH0995740A (en) Production of low thermal expansion alloy thin sheet excellent in sheet shape and thermal shrinkage resistance
JPH07811B2 (en) Method for manufacturing shadow mask material
JP3022573B2 (en) Fe-Ni alloy excellent in etching processability and method for producing the same
JPH10219400A (en) Fe-ni shadow mask stock excellent in etching characteristic, and fe-ni shadow mask material excellent in press formability
JPH06100982A (en) Production of lead frame material and lead frame using the same
JP2000144338A (en) Iron-nickel alloy thin sheet and its production
JPH09118963A (en) Base stock for fine etching work
JPH0495329A (en) Manufacture of shadow mask
JPH0987741A (en) Production of iron-nickel base invar alloy thin sheet for shadow mask excellent in sheet shape and heat shrinkage resistance
TW494142B (en) Fe-Ni alloy for shadow mask
JPS63128119A (en) Manufacture of metallic sheet for shadow mask
JPS61201733A (en) Manufacture of shadow mask
Sawada et al. Development of austenitic stainless steel sheets for micro-fabrication
JPH04224630A (en) Manufacture of lead frame material
JP2003003244A (en) Stainless steel sheet for photoetching and production method therefor
JPS62149851A (en) Electronic parts material and its production