JPS61201733A - Manufacture of shadow mask - Google Patents

Manufacture of shadow mask

Info

Publication number
JPS61201733A
JPS61201733A JP4122785A JP4122785A JPS61201733A JP S61201733 A JPS61201733 A JP S61201733A JP 4122785 A JP4122785 A JP 4122785A JP 4122785 A JP4122785 A JP 4122785A JP S61201733 A JPS61201733 A JP S61201733A
Authority
JP
Japan
Prior art keywords
less
shadow mask
cold rolling
grain size
annealing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP4122785A
Other languages
Japanese (ja)
Inventor
Morinori Kamio
守則 神尾
Norio Yuki
典夫 結城
Masahiro Tsuji
正博 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eneos Corp
Original Assignee
Nippon Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Mining Co Ltd filed Critical Nippon Mining Co Ltd
Priority to JP4122785A priority Critical patent/JPS61201733A/en
Priority to DE19853545354 priority patent/DE3545354A1/en
Publication of JPS61201733A publication Critical patent/JPS61201733A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/14Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • CCHEMISTRY; METALLURGY
    • C22METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22CALLOYS
    • C22C38/00Ferrous alloys, e.g. steel alloys
    • C22C38/18Ferrous alloys, e.g. steel alloys containing chromium
    • C22C38/40Ferrous alloys, e.g. steel alloys containing chromium with nickel
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/02Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
    • H01J29/06Screens for shielding; Masks interposed in the electron stream
    • H01J29/07Shadow masks for colour television tubes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/07Shadow masks
    • H01J2229/0727Aperture plate
    • H01J2229/0733Aperture plate characterised by the material

Abstract

PURPOSE:To manufacture shadow mask having good press formability and superior resistances for buckling and resonance, by cold rolling iron base alloy having a specified compsn. composed mainly of Fe-Ni-Cr finally by high draft. CONSTITUTION:Iron base alloy composed of <=0.10wt% C, <=0.30% Si, <=0.30% Al, 0.1-1.0% Mn, 30-45% Ni, 2.0-10.0% Cr, if necessary further 0.01-1.0% of >=1 kind among Ti, Zr, Mo, Nb, B, V, Be, and the balance Fe with inevitable impurities is cold rolled finally by >=20% draft, to obtain shadow mask material having good press formability, high stiffness and superior resistances for buckling and resonance. In said method, before the final cold rolling, the alloy is cold rolled by >=40% draft, or without said rolling, next, grain size is controlled to >=7.0 size number by annealing, thereby, press formability can be further improved.

Description

【発明の詳細な説明】 本発明はカラーテレビ用受像管に用いられるシャドウマ
スク材に関する。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a shadow mask material used in a color television picture tube.

用が提案され砿業上の使用も試みられている。Its use in the milling industry has also been proposed.

カラー受像管を動作させた際、シャドウマスクの開孔を
通過する電子ビームは全体の173以下であり、残りの
電子ビームはシャドウマスクに射突してシャドウマスク
は時として80℃にも達する程加熱される。この際熱膨
張による色純度の低下が生じるわけであるが、Fe −
Ni系アンバー合金の使用によりこの熱膨張が軽減され
るというものである、 しかし、このFe−Ni系アンバー合金もシャドウマス
ク材として全ての条件を具備しているとは言い難い。
When the color picture tube is operated, the total number of electron beams passing through the apertures of the shadow mask is less than 173, and the remaining electron beams impinge on the shadow mask, causing the shadow mask to sometimes reach temperatures as high as 80 degrees Celsius. heated. At this time, a decrease in color purity occurs due to thermal expansion, but Fe −
The use of a Ni-based amber alloy reduces this thermal expansion. However, it is difficult to say that this Fe--Ni-based amber alloy satisfies all the requirements as a shadow mask material.

まず、その第1がプレス成型性の悪さである。First of all, the press moldability is poor.

一般にシャドウマスク材よりシャドウマスクを製造する
には、おおよそエツチングによる穿孔する工程とプレス
成型性を付与するための焼鈍と所定の形状にプレス成型
する工程と、その他黒化処理り1通常の焼鈍では十分に
耐力が低下しないという問題が生じる。その結果、弾性
によるスプリングバックが生じ形状に微妙な狂いを生じ
る上に局部的な歪みが残留するため、球面成型性が劣っ
てしまう。Fe−Ni系アンバー合金の場合、1000
℃以上の高温で焼鈍を行なっても24〜25 kg /
 mm2位までしか耐力が低下せず、金型等のプレス条
件の変更でも成型性を補うなうことが難しい。経験的に
工業的に安定してプレス成型し、良好なシャドウマスク
を得るためにはプレス成型前に20 kg/nu”以下
の耐力であるひとが望まれており、これを満足する材料
が望まれていた。
In general, manufacturing a shadow mask from shadow mask material involves a process of perforation by etching, annealing to impart press formability, a process of press molding into a predetermined shape, and other blackening treatments. A problem arises in that the yield strength is not reduced sufficiently. As a result, springback occurs due to elasticity, causing slight deviations in shape, and local distortion remains, resulting in poor spherical formability. In the case of Fe-Ni-based amber alloy, 1000
Even if annealing is performed at a high temperature of ℃ or higher, 24 to 25 kg/
The yield strength decreases only up to about 2 mm, and it is difficult to compensate for the moldability even by changing the press conditions of the mold, etc. Experience has shown that in order to achieve industrially stable press molding and obtain a good shadow mask, a material with a yield strength of 20 kg/nu" or less is desired before press molding, and a material that satisfies this is desired. It was rare.

もう1つの問題点は腰の弱さである。腰の弱さは耐力の
低下を狙うあまり高温での焼鈍を行なわざるを得ないた
め、結晶粒が粗大化してしまうためと、Fe−Ni系ア
ンバー合金のヤング率がもともと低いことの2点による
。この腰の弱さによって生じる問題とは共振現象と座屈
である。共振現象とは、シャドウマスクをカラー受像管
に組立てた際スピーカーの音等の外部振動により、シャ
ドウマスク自体が共振してしまう現象であり、その結果
、シャドウマスクの孔と電子ビームの微妙な位置関係が
ずれ色純度の低下につながるものであり。
Another problem is weak hips. The weak stiffness is due to two factors: annealing at high temperatures to reduce yield strength, which results in coarse grains, and the fact that the Fe-Ni amber alloy has a low Young's modulus to begin with. . The problems caused by this weak back are resonance phenomena and buckling. Resonance is a phenomenon in which when a shadow mask is assembled into a color picture tube, the shadow mask itself resonates due to external vibrations such as the sound of a speaker, and as a result, the delicate position of the hole in the shadow mask and the electron beam The relationship is misaligned and leads to a decrease in color purity.

ヤング率が低いつまり腰の弱い材料はど低振動数で共振
する、つまりは耐共振性に劣るというものである。座屈
というのは特にシャドウマスクが大型の場合に問題とさ
れており、腰の弱さのために成型後シャドウマスクの特
に中央部の強度が不十分となりカラー受像管組立て時の
わずかな衝撃や応力でヘタリを生じるものである。
A material with a low Young's modulus, that is, a weak material, resonates at a low frequency, or in other words, has poor resonance resistance. Buckling is a problem especially when the shadow mask is large, and due to the weakness of the back, the strength of the shadow mask after molding, especially in the center, is insufficient, resulting in a slight shock or shock when assembling the color picture tube. It is something that causes it to buckle due to stress.

これらの腰の弱さに起因する現象は、シャドウマスクに
用いる合金板の板厚を厚くすることでも防止できるが、
これではコスト高となってしまい、やはり腰の強いつま
りヤング率の十分に高い材料。
These phenomena caused by weak hips can be prevented by increasing the thickness of the alloy plate used for the shadow mask, but
This would result in high costs, and the material would still be strong, that is, a material with a sufficiently high Young's modulus.

経験的にヤング率が17000 kg / nu 2以
上の材料が望まれていた。
Experience has shown that a material with a Young's modulus of 17,000 kg/nu2 or more is desired.

以上2点の問題つまりプレス成型性の悪さと腰の弱さを
同時に解決するためにはヤング率が17000kg/m
m2以上の材料を用い、プレス成型前にその耐力を20
 kg / mu 2以下にしたシャドウマスクよりカ
ラー受像管を組立てることが必要であるが、その際Fe
−Ni系アンバー合金の持っている良好な低熱膨張特性
を大きく損なうことがないことが必要であり、実用上3
0〜1(10℃で6.OX 10’ /’C以下の熱膨
張係数が保持されていることが必要である。
In order to solve the above two problems at the same time, that is, poor press formability and weak stiffness, the Young's modulus must be 17,000 kg/m.
Use a material with a size of 2 m2 or more, and increase its yield strength to 20 m2 or more before press forming.
It is necessary to assemble a color picture tube using a shadow mask with kg / mu 2 or less, but in this case Fe
- It is necessary that the good low thermal expansion properties of the Ni-based amber alloy are not significantly impaired, and in practical terms 3.
It is necessary to maintain a thermal expansion coefficient of 0 to 1 (6.OX 10'/'C or less at 10°C).

本発明者らは、Fe−Ni−Crを主成分とする鉄基合
金をシャドウマスクとして用いることでこれらの問題点
を解決でき、その結果ドーミングによる色むらがなくシ
ャドウマスクとしての特性及び製造性に優れたシャドウ
マスク材を提案しているが。
The present inventors have found that these problems can be solved by using an iron-based alloy containing Fe-Ni-Cr as a main component as a shadow mask, and as a result, there is no color unevenness due to doming, and the characteristics and manufacturability of the shadow mask are improved. We are proposing an excellent shadow mask material.

このシャドウマスク材も適正な製造方法で製造すること
でより偏れた特性を引出すことが可能であることを見出
したものである。
We have discovered that this shadow mask material can also be manufactured with a proper manufacturing method to bring out more biased characteristics.

即ち本発明の要旨とするところは重量%でC0010%
以下、 Si 0.30%以下、Al 0.30%以下
、 Mn 0.1〜1.0%、 Ni 30〜45%、
 Cr 2.0〜L0.0%、残部Fe及び不可避的不
純物からなる鉄基合金を圧下率20%以上で最終冷間圧
延することを特徴とするシャドウマスクの製造方法、並
びに重量%でC0.10%以下、 Si 0.30%以
下、Al 0.30%以下、Mn 0.1〜1.0%。
That is, the gist of the present invention is C0010% by weight.
Below, Si 0.30% or less, Al 0.30% or less, Mn 0.1-1.0%, Ni 30-45%,
A method for producing a shadow mask, characterized in that an iron-based alloy consisting of 2.0 to 0.0% Cr, the balance Fe and unavoidable impurities is subjected to final cold rolling at a reduction ratio of 20% or more, and a C0. 10% or less, Si 0.30% or less, Al 0.30% or less, Mn 0.1-1.0%.

Ni30〜45%、 Cr 2.O〜l0.0%、残部
Fe及び不可避的不純物からなる鉄基合金を焼鈍で結晶
粒度を結晶粒度番号で7.0以上に調整しひきつづき圧
下率20%以上で最終冷間圧延することを特徴とするシ
ャドウマスクの製造方法、並びに重量%でC0.102
以下、Si 0.30%以下、 Al 0.30%以下
、Mn 0.1〜1゜囲、N130−45%、Cr 2
.0−10.0%、残部Fe及び不可避的不純物からな
る鉄基合金を圧下率40%以上で冷間圧延後、焼鈍で結
晶粒度を結晶粒度番号で7.0以上に調整しひきつづき
圧下率20%以上で最終冷間圧延することを特徴とする
シャドウマスクの製造方法、及び重量%でC0.10%
以下、Si 0.30%以下、Al 0.30%以下、
 Mn 0.1−1.0%、Ni 30−45%、Cr
 2.O〜10.0%、及びTi、 Zr、 Mo、N
b、 B、 V、Beのうち1種又は2種以上を合計で
0.01〜1.0%含み残部Fe及び不可避的不純物か
らなる鉄基合金板を圧下率20%以上で最終冷間圧延す
ることを特徴とするシャドウマスクの製造方法、並びに
重量%テc 0.10%以下、Si 0.30%以下、
AI 0.30%以下1Mn 0.1〜1.0%、Ni
 30〜45%、 Cr 2.0〜10.0%、及びT
i、 Zr、 Mo、 Nb、 B、 V、 Beのう
ち1種又は2種以上を合計で0.01〜11部含み残部
Fe及び不可避的不純物からなる鉄基合金を焼鈍で結晶
粒度を結晶粒度番号で7.0以上に調整しひきつづき圧
下率20%以上で最終冷間圧延することを特徴とするシ
ャドウマスクの製造方法、並びに重量%でC0.10%
以下、Si 0.30%以下、AI 0.30%以下、
Mn 0.1〜1.0%、N130−45%、Cr 2
.O〜l0.0%、及びTi、 Zr、Mo、 Nb、
 Il、 V、 Beのうち1種又は2種以上を合計で
0.01〜1.0%含み残部Fe及び不可避的不純物か
らなる鉄基合金を圧下率40%以上で冷間圧延後、焼鈍
で結晶粒度を結晶粒度番号で7.0以上に調Mしひきつ
づき圧下率20%以上で最終冷間圧延することを特徴と
するシャドウマスクの製造方法、及び最終冷間圧延後3
00〜1000℃の温度で再結晶させない熱処理を行な
う記載のシャドウマスクの製造方法にある。
Ni30-45%, Cr2. The iron-based alloy consisting of O~l0.0%, the balance Fe and unavoidable impurities is annealed to adjust the grain size to 7.0 or more in terms of grain size number, and then final cold rolled at a reduction rate of 20% or more. A method for producing a shadow mask with C0.102 in weight%
Below, Si 0.30% or less, Al 0.30% or less, Mn 0.1-1°, N130-45%, Cr2
.. After cold rolling an iron-based alloy consisting of 0-10.0%, the balance being Fe and unavoidable impurities at a reduction rate of 40% or more, the grain size is adjusted to a grain size number of 7.0 or more by annealing, followed by a reduction rate of 20%. % or more, and a method for producing a shadow mask characterized by final cold rolling at a C of 0.10% or more by weight.
Below, Si 0.30% or less, Al 0.30% or less,
Mn 0.1-1.0%, Ni 30-45%, Cr
2. O~10.0%, and Ti, Zr, Mo, N
Final cold rolling of an iron-based alloy sheet containing one or more of B, B, V, and Be in a total of 0.01 to 1.0% and the balance consisting of Fe and unavoidable impurities at a reduction rate of 20% or more. A method for producing a shadow mask, and a method for manufacturing a shadow mask, which is characterized in that the weight % TEC is 0.10% or less, Si is 0.30% or less,
AI 0.30% or less 1Mn 0.1-1.0%, Ni
30-45%, Cr 2.0-10.0%, and T
An iron-based alloy containing a total of 0.01 to 11 parts of one or more of i, Zr, Mo, Nb, B, V, and Be, with the remainder being Fe and unavoidable impurities, is annealed to adjust the crystal grain size. A method for producing a shadow mask characterized by adjusting the number to 7.0 or higher and then final cold rolling at a rolling reduction rate of 20% or higher, and a method for manufacturing a shadow mask, which is C0.10% by weight.
Below, Si 0.30% or less, AI 0.30% or less,
Mn 0.1-1.0%, N130-45%, Cr2
.. O~l0.0%, and Ti, Zr, Mo, Nb,
An iron-based alloy containing one or more of Il, V, and Be in a total of 0.01 to 1.0% and the remainder Fe and unavoidable impurities is cold rolled at a reduction rate of 40% or more and then annealed. A method for producing a shadow mask, characterized in that the grain size is adjusted to 7.0 or more in terms of grain size number, and then final cold rolling is performed at a reduction rate of 20% or more, and 3 after the final cold rolling.
The method of manufacturing a shadow mask includes performing heat treatment without recrystallization at a temperature of 00 to 1000°C.

次に本発明の限定理由を述べる。Next, the reasons for the limitations of the present invention will be described.

C;Cが0.1吋を超えると熱膨張係数が高くなる。C: When C exceeds 0.1 inch, the coefficient of thermal expansion increases.

また、鉄炭化物の生成のためエツチング性が阻害されシ
ャドウマスクに適さない。よってCは0.10%以下と
する。
Furthermore, the etching properties are inhibited due to the formation of iron carbides, making it unsuitable for shadow masks. Therefore, C should be 0.10% or less.

si; siは脱酸目的に添加するものであるが、0.
30%を超えて含有すると合金の硬さを増し、焼鈍後の
耐力の低下が十分でない。よってSiは0.30%以下
とする。
si; si is added for the purpose of deoxidizing, but 0.
If the content exceeds 30%, the hardness of the alloy increases and the yield strength after annealing is not sufficiently reduced. Therefore, Si should be 0.30% or less.

Al; AlもSiと同様に脱酸目的であり、 0.3
0%を超えて含有すると焼鈍後に十分に低い耐力が得ら
れない。よってAlは0.30%以下とする。
Al: Like Si, Al also has a deoxidizing purpose, and is 0.3
If the content exceeds 0%, a sufficiently low yield strength cannot be obtained after annealing. Therefore, Al should be 0.30% or less.

Mn; Mnは脱酸目的と熱間加工性を付与する目的と
で添加するが、0.1%より少ないと効果がなく、1゜
部を超えて含有すると熱膨張係数が上昇し、焼鈍後の耐
力の低下が十分でない。よってその成分範囲を0.1〜
11部とする。
Mn; Mn is added for the purpose of deoxidizing and imparting hot workability, but if it is less than 0.1%, it has no effect, and if it is contained in excess of 1%, the coefficient of thermal expansion increases, and after annealing. The reduction in yield strength is not sufficient. Therefore, the component range is 0.1~
There will be 11 parts.

Ni: Niが30%より少ないと熱膨張係数が極めて
高くなり、カラーブラウン管の色純度の低下につながる
。Niを45%を超えて含有しても熱膨張係数が高くな
る。よってその成分範囲を30〜45%とする。
Ni: If Ni is less than 30%, the coefficient of thermal expansion becomes extremely high, leading to a decrease in the color purity of the color cathode ray tube. Even if the Ni content exceeds 45%, the coefficient of thermal expansion becomes high. Therefore, the component range is set at 30 to 45%.

Cr; Crはヤング率の上昇を目的にするが、適性量
を含有することで焼鈍後の耐力も低下する。Crの含有
量が2.0%より少ないとヤング率の上昇が十分でなく
、焼鈍後の耐力の低下も十分でない。Crを10.0%
より多く含有すると熱膨張の上昇が著しくなる。よって
その成分範囲を2.0〜10.0%とする。
Cr: The purpose of Cr is to increase Young's modulus, but if it is contained in an appropriate amount, the yield strength after annealing will also decrease. If the Cr content is less than 2.0%, the Young's modulus will not increase sufficiently, and the yield strength after annealing will not decrease enough. 10.0% Cr
If it is contained in a larger amount, the thermal expansion will increase significantly. Therefore, the component range is set to 2.0 to 10.0%.

Ti、 Zr、 Mo、 Nb、 B、 V、 Be;
 これらの元素はヤング率の上昇及び結晶粒の微細化を
目的とし、耐共振性、耐座屈性を向上せしめる。その効
果が0.01%以上で現れる。また、合計で1.0%を
超えて含有すると合金が硬度を増し、その結果、焼鈍後
の耐力の低下も十分でなく、プレス成型性が悪化し、熱
膨張係数も上昇する。よってその成分範囲を0゜01〜
1.0%とする。
Ti, Zr, Mo, Nb, B, V, Be;
These elements aim to increase Young's modulus and refine crystal grains, and improve resonance resistance and buckling resistance. The effect appears at 0.01% or more. Moreover, if the content exceeds 1.0% in total, the alloy will increase in hardness, and as a result, the yield strength after annealing will not be sufficiently reduced, press formability will deteriorate, and the coefficient of thermal expansion will also increase. Therefore, the component range is 0°01 ~
It shall be 1.0%.

前述した様にシャドウマスクは一般に板厚0.2m以下
程度のシャドウマスク材をエツチング穿孔し、フラット
マスクを製造した後焼鈍を施しプレス成型性を付与した
上でシャドウマスクの形状に球面成型され、その後黒化
処理等を施され製造される。シャドウマスク材の製造工
程において最終冷間圧延の圧下率が十分でない場合シャ
ドウマスクの製造工程中のプレス成型性を付与する焼鈍
で同一の焼鈍条件では十分に0.2%耐力が低下しない
As mentioned above, a shadow mask is generally made by etching and perforating a shadow mask material with a thickness of about 0.2 m or less, producing a flat mask, annealing it to give it press moldability, and then molding it into a spherical shape in the shape of a shadow mask. After that, it is manufactured after being subjected to blackening treatment, etc. In the manufacturing process of the shadow mask material, if the rolling reduction ratio in the final cold rolling is not sufficient, the 0.2% proof stress will not be sufficiently lowered under the same annealing conditions during the annealing that imparts press formability during the manufacturing process of the shadow mask.

この限界が圧下率20%である。さらに圧下率20%以
上で最終冷間圧延したシャドウマスク材を用いたシャド
ウマスクは同一条件での焼鈍後も圧下率が小さいものに
くらべ耐座屈性、耐共振性にも優れる。
This limit is a rolling reduction rate of 20%. Furthermore, a shadow mask using a shadow mask material that is finally cold-rolled at a rolling reduction of 20% or more has better buckling resistance and resonance resistance than a shadow mask material that has a smaller rolling reduction even after annealing under the same conditions.

又、最終冷間圧延前の焼鈍で結晶粒を結晶粒度番号で7
.0以上に調整することで上記シャドウマスク製造工程
中の焼鈍後の0.2%耐力は低下しプレス成型性が改善
される。加えて結晶粒が微細化していることでエツチン
グ穿孔時の均質性にも優れている。さらに圧下率40%
以上の冷間圧延後、焼鈍により結晶粒度を調整、最終冷
間圧延を施すことで熱間圧延等で生じた優先方位の悪影
響を低減することができ、その結果プレス成型性に優れ
たシャドウマスクの製造が可能となる。本発明による製
造方法は通常のFe −Ni系アンバー合金の製造方法
にくらべ高圧下率の冷間圧延を施すことになるためエツ
チング穿孔後の形状不良発生の可能性がある。そこで最
終冷間圧延後に再結晶をさせない熱処理を施すことがよ
り望ましい。その際の温度は300℃より低いと効果が
なく 1000℃を超えると実際上再結晶させない熱処
理を施すことが難しa 尚本発明で用いる合金中には不純物として0、S。
In addition, the grain size is changed to 7 by annealing before final cold rolling.
.. By adjusting it to 0 or more, the 0.2% proof stress after annealing during the shadow mask manufacturing process is reduced and press moldability is improved. In addition, the finer crystal grains provide excellent homogeneity during etching and perforation. Furthermore, the rolling reduction rate is 40%
After the above cold rolling, the grain size is adjusted by annealing, and by final cold rolling, it is possible to reduce the negative effects of preferred orientation caused by hot rolling, etc., resulting in a shadow mask with excellent press formability. It becomes possible to manufacture Since the manufacturing method according to the present invention involves cold rolling at a higher rolling reduction than the usual manufacturing method for Fe--Ni-based invar alloys, there is a possibility that shape defects may occur after etching and perforation. Therefore, it is more desirable to perform a heat treatment that does not cause recrystallization after the final cold rolling. If the temperature at that time is lower than 300°C, it will not be effective, and if it exceeds 1000°C, it will be difficult to perform a heat treatment that does not actually cause recrystallization.The alloy used in the present invention contains 0 and S as impurities.

Nが含まれており、そのうちのどれか1つでもOは0.
010%、Nは0.0050%、Sは0.020%を超
えて含有するとエツチング穿孔性を害す。
N is included, and any one of them is 0.
If the content exceeds 0.010%, N 0.0050%, and S 0.020%, etching perforation properties will be impaired.

従って本発明内容はO0.010%以下、N 0000
50%以下、50.020%以下を含んだものであるこ
とは当然である。
Therefore, the content of the present invention is O0.010% or less, N0000
Naturally, it contains 50% or less and 50.020% or less.

失11 供試材は真空溶解、鋳造後、鍛造、熱間圧延、酸洗、冷
間圧延、焼鈍、最終冷間圧延又は、熱間圧延までは同一
でそれ以降酸洗、冷間圧延、焼鈍、冷間圧延、焼鈍、最
終冷間圧延なる工程で板厚0.15mmの冷延板とした
ものであり、4種の成分のものを用いた。又一部のもの
は最終冷間圧延後、再結晶をさせない熱処理を施した。
Loss 11 The test materials were vacuum melted, cast, forged, hot rolled, pickled, cold rolled, annealed, final cold rolled, or the same up to hot rolling, and then pickled, cold rolled, and annealed. A cold-rolled plate having a thickness of 0.15 mm was obtained through the steps of cold rolling, annealing, and final cold rolling, and four types of components were used. In addition, some of the samples were subjected to heat treatment to prevent recrystallization after the final cold rolling.

供試材の成分を第1表に示す。The components of the sample materials are shown in Table 1.

以下余白 第1表 又、供試材の冷間圧延の圧下率、焼鈍後の結晶粒度を第
2表に示す。供試材を脱脂後レジスト液を湿布、乾燥、
現像焼付は等の工程を経てエツチング穿孔により多数の
開孔を設けた後850℃×10分、25%H2−残N2
の雰囲気中で焼鈍を行ない、プレス成型性、耐座屈性、
耐共振性を調査した。調査結果は第2表に併記した。
Table 1 below shows the margin, and Table 2 shows the rolling reduction ratio during cold rolling and the grain size after annealing of the test materials. After degreasing the test material, apply the resist solution to a compress, dry it,
After developing and baking, a large number of holes were formed by etching and baking, followed by etching at 850°C for 10 minutes, 25% H2 - residual N2.
Annealing is performed in an atmosphere of
The resonance resistance was investigated. The survey results are also listed in Table 2.

第2表より明らかな様に本発明例1〜14の製造条件に
従って製造したシャドウマスク材はプレス成型性、耐座
屈性、耐共振性に優れており本合金の特性をよりよく引
出す製造方法である。特に冷間圧延を圧下率40%以上
で行ない焼鈍で結晶粒度を結晶粒度番号で7.0以上と
し圧下率20%以上で最終冷間圧延を施した本発明例1
〜10は特に優れた結果を得ている。尚、最終冷間圧延
後再結晶させない熱処理を施すことで、プレス成型性、
耐座屈性、耐共振性を損なうことなくより形状の優れた
フラットマスクを製造することが可能であった。
As is clear from Table 2, the shadow mask materials manufactured according to the manufacturing conditions of Examples 1 to 14 of the present invention have excellent press formability, buckling resistance, and resonance resistance, and the manufacturing method brings out the characteristics of this alloy better. It is. In particular, Example 1 of the present invention in which cold rolling was performed at a reduction rate of 40% or more, the grain size was set to 7.0 or more in grain size number by annealing, and final cold rolling was performed at a reduction rate of 20% or more.
-10 obtained particularly excellent results. In addition, by applying heat treatment that does not cause recrystallization after the final cold rolling, press formability,
It was possible to manufacture a flat mask with a better shape without impairing buckling resistance and resonance resistance.

比較例15は最終冷間圧延での圧下率が低いため、プレ
ス成型性、耐共振性がやや劣り、比較例16.18は焼
鈍で結晶粒が若干粗大化しており最終冷間圧延での圧下
率も低いためプレス成型性、耐共振性がやや劣る。比較
例17.19は冷間圧延の圧下率も十分でなく、焼鈍に
より結晶粒も粗大化したためプレス成型性、耐座屈性、
耐共振性で劣る。
Comparative Example 15 has a low rolling reduction in the final cold rolling, so its press formability and resonance resistance are slightly inferior, and Comparative Examples 16 and 18 have slightly coarse grains due to annealing, and the rolling reduction in the final cold rolling is poor. Since the ratio is also low, press moldability and resonance resistance are slightly inferior. In Comparative Examples 17 and 19, the reduction rate in cold rolling was not sufficient and the crystal grains became coarse due to annealing, resulting in poor press formability, buckling resistance,
Poor resonance resistance.

以下余白Margin below

Claims (7)

【特許請求の範囲】[Claims] (1)重量%でC0.10%以下、Si0.30%以下
、Al0.30%以下、Mn0.1〜1.0%、Ni3
0〜45%、Cr2.0〜10.0%、残部Fe及び不
可避的不純物からなる鉄基合金を圧下率20%以上で最
終冷間圧延することを特徴とするシャドウマスクの製造
方法。
(1) By weight: C0.10% or less, Si0.30% or less, Al0.30% or less, Mn0.1-1.0%, Ni3
A method for manufacturing a shadow mask, which comprises final cold rolling an iron-based alloy consisting of 0 to 45% Cr, 2.0 to 10.0% Cr, the remainder Fe and unavoidable impurities at a reduction ratio of 20% or more.
(2)重量%でC0.10%以下、Si0.30%以下
、Al0.30%以下、Mn0.1〜1.0%、Ni3
0〜45%、Cr2.0〜10.0%、残部Fe及び不
可避的不純物からなる鉄基合金を焼鈍で結晶粒度を結晶
粒度番号で7.0以上に調整しひきつづき圧下率20%
以上で最終冷間圧延することを特徴とするシャドウマス
クの製造方法。
(2) C0.10% or less, Si 0.30% or less, Al 0.30% or less, Mn 0.1-1.0%, Ni3 in weight%
An iron-based alloy consisting of 0 to 45% Cr, 2.0 to 10.0% Cr, and the balance Fe and unavoidable impurities is annealed to adjust the grain size to 7.0 or more in terms of grain size number, followed by a reduction rate of 20%.
A method for producing a shadow mask, which comprises performing final cold rolling as described above.
(3)重量%でC0.10%以下、Si0.30%以下
、Al0.30%以下、Mn0.1〜1.0%、Ni3
0〜45%、Cr2.0〜10.0%、残部Fe及び不
可避的不純物からなる鉄基合金を圧下率40%以上で冷
間圧延後、焼鈍で結晶粒度を結晶粒度番号で7.0以上
に調整しひきつづき圧下率20%以上で最終冷間圧延す
ることを特徴とするシャドウマスクの製造方法。
(3) C0.10% or less, Si 0.30% or less, Al 0.30% or less, Mn 0.1-1.0%, Ni3 in weight%
After cold rolling an iron-based alloy consisting of 0 to 45% Cr, 2.0 to 10.0% Cr, the balance Fe and unavoidable impurities at a reduction rate of 40% or more, the grain size is reduced to 7.0 or more in grain size number by annealing. A method for manufacturing a shadow mask, which comprises adjusting the shadow mask to a final cold rolling at a reduction rate of 20% or more.
(4)重量%でC0.10%以下、Si0.30%以下
、Al0.30%以下、Mn0.1〜1.0%、Ni3
0〜45%、Cr2.0〜10.0%、及びTi、Zr
、Mo、Nb、B、V、Beのうち1種又は2種以上を
合計で0.01〜1.0%含み残部Fe及び不可避的不
純物からなる鉄基合金板を圧下率20%以上で最終冷間
圧延することを特徴とするシャドウマスクの製造方法。
(4) C0.10% or less, Si 0.30% or less, Al 0.30% or less, Mn 0.1-1.0%, Ni3 in weight%
0-45%, Cr2.0-10.0%, and Ti, Zr
, Mo, Nb, B, V, and Be in a total of 0.01 to 1.0%, and the balance is Fe and unavoidable impurities. A method for producing a shadow mask, characterized by cold rolling.
(5)重量%でC0.10%以下、Si0.30%以下
、Al0.30%以下、Mn0.1〜1.0%、Ni3
0〜45%、Cr2.0〜10.0%、及びTi、Zr
、Mo、Nb、B、V、Beのうち1種又は2種以上を
合計で0.01〜1.0%含み残部Fe及び不可避的不
純物からなる鉄基合金を焼鈍で結晶粒度を結晶粒度番号
で7.0以上に調整しひきつづき圧下率20%以上で最
終冷間圧延することを特徴とするシャドウマスクの製造
方法。
(5) C0.10% or less, Si 0.30% or less, Al 0.30% or less, Mn 0.1-1.0%, Ni3 in weight%
0-45%, Cr2.0-10.0%, and Ti, Zr
, Mo, Nb, B, V, Be in a total of 0.01 to 1.0% of one or more of them, and the balance is Fe and unavoidable impurities. A method for producing a shadow mask, which comprises adjusting the rolling stock to 7.0 or higher and then final cold rolling at a rolling reduction of 20% or higher.
(6)重量%でC0.10%以下、Si0.30%以下
、Al0.30%以下、Mn0.1〜1.0%、Ni3
0〜45%、Cr2.0〜10.0%、及びTi、Zr
、Mo.Nb、B、V、Beのうち1種又は2種以上を
合計で0.01〜1.0%含み残部Fe及び不可避的不
純物からなる鉄基合金を圧下率40%以上で冷間圧延後
、焼鈍で結晶粒度を結晶粒度番号で7.0以上に調整し
ひきつづき圧下率20%以上で最終冷間圧延することを
特徴とするシャドウマスクの製造方法。
(6) C0.10% or less, Si 0.30% or less, Al 0.30% or less, Mn 0.1-1.0%, Ni3 in weight%
0-45%, Cr2.0-10.0%, and Ti, Zr
, Mo. After cold rolling an iron-based alloy consisting of a total of 0.01 to 1.0% of one or more of Nb, B, V, and Be and the remainder Fe and unavoidable impurities at a reduction rate of 40% or more, A method for producing a shadow mask, which comprises adjusting the grain size to 7.0 or more in terms of grain size number by annealing, and then final cold rolling at a reduction rate of 20% or more.
(7)最終冷間圧延後300〜1000℃の温度で再結
晶させない熱処理を行なう特許請求の範囲(1)〜(6
)記載のシャドウマスクの製造方法。
(7) Claims (1) to (6) in which heat treatment without recrystallization is performed at a temperature of 300 to 1000°C after final cold rolling.
) The method for manufacturing the shadow mask described in .
JP4122785A 1984-12-28 1985-03-04 Manufacture of shadow mask Pending JPS61201733A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP4122785A JPS61201733A (en) 1985-03-04 1985-03-04 Manufacture of shadow mask
DE19853545354 DE3545354A1 (en) 1984-12-28 1985-12-20 Shadow mask and method for making shadow masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4122785A JPS61201733A (en) 1985-03-04 1985-03-04 Manufacture of shadow mask

Publications (1)

Publication Number Publication Date
JPS61201733A true JPS61201733A (en) 1986-09-06

Family

ID=12602523

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4122785A Pending JPS61201733A (en) 1984-12-28 1985-03-04 Manufacture of shadow mask

Country Status (1)

Country Link
JP (1) JPS61201733A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6421037A (en) * 1987-07-16 1989-01-24 Nippon Casting Co Ltd Free-cutting high-temperature low-thermal expansion casting alloy and its production
FR2641796A1 (en) * 1988-08-19 1990-07-20 Nippon Yakin Kogyo Co Ltd Process for producing alloys of the Fe-Ni-B series having an improved moderator effect on the presence of streaks (trails) during engraving
US5325911A (en) * 1988-08-19 1994-07-05 Nippon Yakin Kogyo Co., Ltd. Method of producing Fe-Ni series alloys having improved effect for restraining streaks during etching

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6421037A (en) * 1987-07-16 1989-01-24 Nippon Casting Co Ltd Free-cutting high-temperature low-thermal expansion casting alloy and its production
FR2641796A1 (en) * 1988-08-19 1990-07-20 Nippon Yakin Kogyo Co Ltd Process for producing alloys of the Fe-Ni-B series having an improved moderator effect on the presence of streaks (trails) during engraving
US5325911A (en) * 1988-08-19 1994-07-05 Nippon Yakin Kogyo Co., Ltd. Method of producing Fe-Ni series alloys having improved effect for restraining streaks during etching

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