JPH07169220A - Magnetic disk - Google Patents

Magnetic disk

Info

Publication number
JPH07169220A
JPH07169220A JP31509493A JP31509493A JPH07169220A JP H07169220 A JPH07169220 A JP H07169220A JP 31509493 A JP31509493 A JP 31509493A JP 31509493 A JP31509493 A JP 31509493A JP H07169220 A JPH07169220 A JP H07169220A
Authority
JP
Japan
Prior art keywords
magnetic
magnetic disk
radial direction
less
recording layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP31509493A
Other languages
Japanese (ja)
Inventor
Yasunari Yamanobe
康徳 山野辺
Shinichi Yasuda
晋一 保田
Tadahito Kanaizuka
唯人 金井塚
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Metal Mining Co Ltd
Original Assignee
Sumitomo Metal Mining Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Metal Mining Co Ltd filed Critical Sumitomo Metal Mining Co Ltd
Priority to JP31509493A priority Critical patent/JPH07169220A/en
Publication of JPH07169220A publication Critical patent/JPH07169220A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To obtain a magnetic disk hard to be scratched even in the case of a small height of levitation of a magnetic head from the magnetic disk. CONSTITUTION:A magnetic recording layer is formed on a nonmagnetic substrate with minute grooves almost circularly formed on the surface to obtain the objective magnetic disk. The grooves have <=3 deg. parallelism to the circumferential direction, <=50Angstrom surface roughness Ra in the radial direction and <=20nm average radius of curvature in the radial direction at the peaks.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、CSS(コンタクト・
スタート・ストップ)方式を採用した磁気ディスク装置
等に適用される磁気ディスクに関する。
BACKGROUND OF THE INVENTION The present invention relates to a CSS (contact
The present invention relates to a magnetic disk applied to a magnetic disk device or the like adopting a start / stop system.

【0002】[0002]

【従来の技術】上記磁気ディスクとしては、ラップ加
工、ポリッシュ加工、テクスチャ加工等の表面処理を施
して表面に略円周状に微細な加工溝が形成された非磁性
基板上に、磁気記録層が形成され、該磁気記録層上にこ
れを保護するためのカーボン,SiO2等からなる保護
層が形成され、更に、該保護層上に潤滑層が形成された
ものが知られている。
2. Description of the Related Art As the above magnetic disk, a magnetic recording layer is formed on a non-magnetic substrate having a finely machined groove formed on its surface by subjecting it to a surface treatment such as lapping, polishing or texturing. It is known that a protective layer made of carbon, SiO 2 or the like for protecting the magnetic recording layer is formed on the magnetic recording layer, and a lubricating layer is further formed on the protective layer.

【0003】ところで、近年、磁気ディスクの高密度化
に伴い、磁気ディスクと磁気ヘッドの間隔は益々狭くな
る傾向にある。そこで、上記磁気ディスクに対し磁気ヘ
ッドの浮上量を低く設定するためには、上記加工溝の粗
さの程度を低くしなければならない。すると、磁気ディ
スクと磁気ヘッドの接触面積が増加しこの部分の摺動が
増加するため、磁気ディスクに傷が付き易くなって長期
間の使用に耐えられなくなるという問題点があった。
By the way, in recent years, with the increase in density of magnetic disks, the distance between the magnetic disk and the magnetic head tends to become narrower. Therefore, in order to set the flying height of the magnetic head lower than that of the magnetic disk, the roughness of the processed groove must be lowered. Then, the contact area between the magnetic disk and the magnetic head increases and the sliding of this portion increases, so that the magnetic disk is easily scratched and cannot be used for a long period of time.

【0004】[0004]

【発明が解決しようとする課題】本発明の目的は、上記
問題点を解消し、磁気ディスク面からの磁気ヘッドの浮
上量を低く設定しても、傷が付き難い磁気ディスクを提
供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve the above problems and to provide a magnetic disk which is not easily scratched even when the flying height of the magnetic head from the magnetic disk surface is set low. is there.

【0005】[0005]

【課題を解決するための手段】本発明は、上記目的を達
成するものとして、前記磁気ディスクにおいて、前記加
工溝が、円周方向に対する平行度を3゜以下、半径方向
の表面粗さRaを500nm以下およびその山部先端に
おける半径方向の平均曲率半径を20nm以下とされて
いることを特徴とする磁気ディスクである。
In order to achieve the above object, the present invention provides a magnetic disk in which the machined groove has a degree of parallelism with the circumferential direction of 3 ° or less and a surface roughness Ra in the radial direction. The magnetic disk is characterized in that the average radius of curvature in the radial direction is 500 nm or less and the tip of the peak portion is 20 nm or less.

【0006】[0006]

【作用】本発明の磁気ディスクにおいて、非磁性基板
は、アルミニウム合金の如き非磁性金属、ガラス、樹脂
等の剛性を有する基板に対して、その全面に亘って硬度
が高く、切削性の良好な硬化層が形成されたものであ
る。このような硬化層が設けられた非磁性基板には、平
面化研磨加工が施された後、その表面の粗面化がテクス
チャ加工によって行なわれ、表面に略円周状に微細な加
工溝が形成される。
In the magnetic disk of the present invention, the non-magnetic substrate has high hardness over its entire surface and excellent machinability as compared with a substrate having rigidity such as non-magnetic metal such as aluminum alloy, glass and resin. The cured layer is formed. A non-magnetic substrate provided with such a hardened layer is subjected to flattening and polishing, and then roughening of the surface is performed by texture processing, so that finely processed grooves are formed in a substantially circular shape on the surface. It is formed.

【0007】本発明において、この際形成される加工溝
が、円周方向に対する平行度を3゜以下、半径方向の表
面粗さRa(中心線平均粗さ)を500nm以下および
その山部先端における半径方向の平均曲率半径を20n
m以下とされている。
In the present invention, the machined grooves formed at this time have a parallelism with respect to the circumferential direction of 3 ° or less, a surface roughness Ra (center line average roughness) of 500 nm or less in the radial direction, and the tip of the crest portion. 20n average radius of curvature in the radial direction
It is set to m or less.

【0008】円周方向に対する平行度が3゜を超える
と、加工溝の交点近傍において異常な切削痕が発生し易
く、ヘッドヒット特性が低下する。また、Raが500
nmを超えると、半径方向における微小なうねりが大き
くなり、やはりヘッドヒット特性が低下する。更に、山
部先端における半径方向の平均曲率半径が20nmを超
えると、磁気ヘッドに対する接触面積が大きくなりCS
S試験による耐久性が低下する。
If the parallelism with respect to the circumferential direction exceeds 3 °, abnormal cutting marks are likely to occur in the vicinity of the intersections of the machining grooves, and the head hit characteristics deteriorate. Also, Ra is 500
When the thickness exceeds nm, a minute waviness in the radial direction becomes large, and the head hit characteristic also deteriorates. Furthermore, when the average radius of curvature in the radial direction at the tip of the crest exceeds 20 nm, the contact area with the magnetic head becomes large and CS
The durability by the S test decreases.

【0009】このような状態の加工溝を形成するには、
例えば、次のように行なう。即ち、粒径が4μm以下の
ダイヤモンド、アルミナ、シリコンカーバイドまたは酸
化クロムの砥粒を水溶液中に分散させたスラリーを加工
液として用い、この加工液を含浸した研磨布を回転する
基板の硬化層面上に押し付ける。この際、基板の回転
数、硬化層面上への押し付け力、研磨布の巻取り速度、
研磨布を基板の半径方向に微小揺動させる振動の周期な
どを適宜調整する。
To form a machined groove in such a state,
For example, do as follows. That is, a slurry in which abrasive grains of diamond, alumina, silicon carbide or chromium oxide having a particle size of 4 μm or less are dispersed in an aqueous solution is used as a working fluid, and a polishing cloth impregnated with the working fluid is applied to the surface of a hardened layer of a rotating substrate. Press on. At this time, the number of rotations of the substrate, the pressing force on the surface of the cured layer, the winding speed of the polishing cloth,
The period of vibration for slightly swinging the polishing cloth in the radial direction of the substrate is appropriately adjusted.

【0010】上記加工溝が形成された非磁性基板には、
必要により磁気記録層の磁気特性を調整する等のためC
r,Cr合金等からなる下地層が形成された後、例え
ば、Co系、Co−Ni系、Co−Cr−Ta系のよう
な磁気記録層が形成される。次に、この磁気記録層上
に、これを保護するためのカーボン、SiO2 等からな
る保護層が形成され、更に、この保護層上に潤滑層が形
成され、以て目的とする磁気ディスクとされる。
The non-magnetic substrate having the above-mentioned processed grooves is
If necessary, C may be used to adjust the magnetic characteristics of the magnetic recording layer.
After the underlayer made of r, Cr alloy or the like is formed, a magnetic recording layer of, for example, Co-based, Co-Ni-based, or Co-Cr-Ta-based is formed. Next, a protective layer made of carbon, SiO 2 or the like for protecting the magnetic recording layer is formed on the magnetic recording layer, and a lubricating layer is further formed on the protective layer to form the desired magnetic disk. To be done.

【0011】[0011]

【実施例】【Example】

実施例1〜4、比較例1〜6 基板に外径95mm、内径25mm、厚さ1.27mm
のアルミニウム合金材料を用い、その両面に公知の無電
解メッキ法によりNi−P合金層を15μmの厚みで形
成した後、ラップ加工およびポリッシュ加工によりRa
が5nmの鏡面とした。
Examples 1 to 4 and Comparative Examples 1 to 6 A substrate has an outer diameter of 95 mm, an inner diameter of 25 mm, and a thickness of 1.27 mm.
Aluminum alloy material is used to form Ni—P alloy layers on both surfaces of the aluminum alloy material by a known electroless plating method to a thickness of 15 μm, and then Ra and La are processed by lapping and polishing.
Was a 5 nm mirror surface.

【0012】次に、この鏡面加工された基板を500r
pmで回転させながら、研磨布に対して加工液をノズル
より滴下して供給し、更にロールにより研磨布を基板に
押し付けてテクスチャ加工を行なった。なお、上記加工
液は、粒径が90重量%が1〜3μmの範囲に入るダイ
ヤモンド砥粒と粒径が90重量%が3〜7μmの範囲に
入るダイヤモンド砥粒とをスラリーに調整して使用し
た。また、上記テクスチャ加工は、形成される加工溝の
平行度、Raおよび山部先端における半径方向の平均曲
率半径を種々変えて行なった。
Then, the mirror-finished substrate is subjected to 500r.
While rotating at pm, the working liquid was dropped and supplied from the nozzle to the polishing cloth, and the polishing cloth was pressed against the substrate by a roll to perform texture processing. The working liquid is prepared by adjusting a diamond abrasive grain having a particle size of 90% by weight in the range of 1 to 3 μm and a diamond abrasive grain having a particle size of 90% by weight in the range of 3 to 7 μm into a slurry. did. Further, the above-mentioned texture processing was performed by changing the parallelism of the processed grooves, Ra and the average radius of curvature in the radial direction at the tip of the crest portion variously.

【0013】このようにして得られた種々の基板につい
て、円周方向に対する平行度、半径方向の表面粗さRa
および加工溝山部先端における半径方向の平均曲率半径
を走査電子トンネル型顕微鏡によって測定した。これら
の結果を表1に示す。
For the various substrates thus obtained, the parallelism with respect to the circumferential direction and the surface roughness Ra in the radial direction are obtained.
The average radius of curvature in the radial direction at the tip of the processed groove crest was measured by a scanning electron tunneling microscope. The results are shown in Table 1.

【0014】その後、これらの基板上に、DCマグネト
ロンスパッタリング法によりCr下地膜を成膜し、次に
この下地膜上に上記法によりCoCrTa磁気記録層を
成膜した。更に、この磁気記録層上に上記Cr下地膜の
成膜と同様の条件でカーボン保護膜を成膜し、その上に
スピンコート法により潤滑層を成膜した。このようにし
て得られた種々の磁気ディスクについて、ヘッドヒット
特性、CSS試験による耐久性および吸着特性の評価を
行った。
Then, a Cr underlayer film was formed on these substrates by the DC magnetron sputtering method, and then a CoCrTa magnetic recording layer was formed on this underlayer film by the above method. Further, a carbon protective film was formed on this magnetic recording layer under the same conditions as the formation of the Cr underlayer film, and a lubricating layer was formed thereon by spin coating. The various magnetic disks thus obtained were evaluated for head hit characteristics, durability by a CSS test, and adsorption characteristics.

【0015】ヘッドヒット特性は、振動センサを取り付
けた磁気ヘッドを浮上させて磁気ディスクと磁気ヘッド
との接触回数を10枚(20面)につき測定し、磁気ヘ
ッドの浮上高さが0.05μm以上でヘッドヒットが生
じなかったものを◎、そして、磁気ヘッドの浮上高さが
0.09μm以上、0.07μm以上0.09μm未
満、0.05μm以上0.07μm未満でヘッドヒット
が生じたものを夫々×、△、○とした。
For the head hit characteristic, the magnetic head equipped with a vibration sensor is levitated and the number of contact between the magnetic disk and the magnetic head is measured for 10 sheets (20 sides). The flying height of the magnetic head is 0.05 μm or more. No head hits were produced, and those in which the flying height of the magnetic head was 0.09 μm or more, 0.07 μm or more and less than 0.09 μm, and 0.05 μm or more and less than 0.07 μm were produced. They were marked with x, Δ, and ◯, respectively.

【0016】また、CSS試験による耐久性は、磁気デ
ィスクに磁気ヘッドをおいた後、0rpm→3600r
pm→0rpmの工程を30秒周期で行なった。10,
000回毎に工程を中断して4枚(8面)の磁気ディス
ク面における摺動傷の有無を観察した。摺動傷が観察さ
れないものは試験を継続し、観察されたものは試験を中
止した。
The durability of the CSS test is 0 rpm → 3600 r after the magnetic head is placed on the magnetic disk.
The process of pm → 0 rpm was performed in a cycle of 30 seconds. 10,
The process was interrupted every 000 times, and the presence or absence of sliding scratches on the surfaces of four (8) magnetic disks was observed. If no sliding scratch was observed, the test was continued, and if observed, the test was stopped.

【0017】更に、吸着特性は、磁気ディスクに磁気ヘ
ッドをおき、30℃、相対湿度80%の環境下に100
時間放置した後の磁気ヘッド−磁気ディスク間の静止摩
擦係数と放置する前の磁気ヘッド−磁気ディスク間の静
止摩擦係数との比を4枚(8面)につき求めた。この比
が1.2未満、1.2以上3未満、3以上のものを夫々
◎、○、×とした。以上の結果を表1に示す。
Further, the adsorption characteristic is that the magnetic head is placed on a magnetic disk and the magnetic head is 100 at an environment of 30 ° C. and a relative humidity of 80%.
The ratio of the static friction coefficient between the magnetic head and the magnetic disk after being left for a period of time and the static friction coefficient between the magnetic head and the magnetic disk before being left was determined for four sheets (8 surfaces). Those having a ratio of less than 1.2, 1.2 or more and less than 3 and 3 or more were marked as ⊚, ◯ and ×, respectively. The above results are shown in Table 1.

【0018】[0018]

【表1】 [Table 1]

【0019】[0019]

【発明の効果】本発明は、磁気ディスクからの磁気ヘッ
ドの浮上高さを0.05μm程度まで低く設定しても傷
が付き難い磁気ディスクを提供することができる。
The present invention can provide a magnetic disk that is not easily scratched even when the flying height of the magnetic head from the magnetic disk is set as low as about 0.05 μm.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 表面に略円周状に微細な加工溝が形成さ
れた非磁性基板上に、磁気記録層が形成されてなる磁気
ディスクにおいて、前記加工溝が、円周方向に対する平
行度を3゜以下、半径方向の表面粗さRaを500nm
以下およびその山部先端における半径方向の平均曲率半
径を20nm以下とされていることを特徴とする磁気デ
ィスク。
1. A magnetic disk in which a magnetic recording layer is formed on a non-magnetic substrate on the surface of which fine processed grooves are formed in a substantially circular shape, and the processed grooves have a parallelism in the circumferential direction. Surface roughness Ra in the radial direction of 3 ° or less, 500 nm
A magnetic disk characterized in that the average radius of curvature in the radial direction below and at the tip of the peak is 20 nm or less.
JP31509493A 1993-12-15 1993-12-15 Magnetic disk Pending JPH07169220A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP31509493A JPH07169220A (en) 1993-12-15 1993-12-15 Magnetic disk

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP31509493A JPH07169220A (en) 1993-12-15 1993-12-15 Magnetic disk

Publications (1)

Publication Number Publication Date
JPH07169220A true JPH07169220A (en) 1995-07-04

Family

ID=18061343

Family Applications (1)

Application Number Title Priority Date Filing Date
JP31509493A Pending JPH07169220A (en) 1993-12-15 1993-12-15 Magnetic disk

Country Status (1)

Country Link
JP (1) JPH07169220A (en)

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