JPH04318324A - Polishing tape - Google Patents

Polishing tape

Info

Publication number
JPH04318324A
JPH04318324A JP8668091A JP8668091A JPH04318324A JP H04318324 A JPH04318324 A JP H04318324A JP 8668091 A JP8668091 A JP 8668091A JP 8668091 A JP8668091 A JP 8668091A JP H04318324 A JPH04318324 A JP H04318324A
Authority
JP
Japan
Prior art keywords
abrasive
tape
polishing
polishing tape
disks
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP8668091A
Other languages
Japanese (ja)
Inventor
Kyoji Noda
恭司 野田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP8668091A priority Critical patent/JPH04318324A/en
Publication of JPH04318324A publication Critical patent/JPH04318324A/en
Pending legal-status Critical Current

Links

Abstract

PURPOSE:To provide the polishing tape which is used for texturing of various kinds of rigid disks, can texture the disks without generating extraordinarily deep scratch flaws in the disks in spite of reducing the adrasive grain sizes of the polishing tape and is suitable for productin of the rigid disks having excellent high-density recording characteristics. CONSTITUTION:This polishing tape consists of the constitution formed by laminating a resin layer 11 which is softer than the above-mentioned finder resin 3 and is interposed between the abrasive grain layer 2 which is the mixture of a binder resin 3 and polishing abrasive grains 4 and face film 1 consisting of a polyethylene terephthalate resin, etc.

Description

【発明の詳細な説明】[Detailed description of the invention]

【0001】0001

【産業上の利用分野】本発明は高密度記録特性に優れた
金属磁性薄膜媒体であるリジッドディスク(以下、磁気
ディスクという)のテキスチャ加工に特に好適な研磨テ
ープに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an abrasive tape particularly suitable for texturing rigid disks (hereinafter referred to as magnetic disks), which are metal magnetic thin film media with excellent high-density recording characteristics.

【0002】0002

【従来の技術】近年、パーソナルコンピュータの外部記
憶装置として磁気ディスクが主流になってきた。磁気デ
ィスクには、塗布型、メッキ型、スパッタ型の3種類が
あり、最近では塗布型から高密度記録特性の優れたメッ
キ型およびスパッタ型に推移してきている。
2. Description of the Related Art In recent years, magnetic disks have become mainstream as external storage devices for personal computers. There are three types of magnetic disks: coating type, plating type, and sputtering type. Recently, there has been a shift from coating type to plated type and sputtering type, which have excellent high-density recording characteristics.

【0003】スパッタ型の磁気ディスクは、研磨テープ
を使用してテキスチャ加工を施し、表面粗さRaを80
〜100Åにすることにより、浮動式磁気ヘッド(以下
、磁気ヘッドと略す)を磁気ディスクの表面から0.2
〜0.3μm程度の高さで浮上させることができるため
、高密度記録特性の優れた磁気ディスクドライブ装置が
実現できる。
Sputter type magnetic disks are textured using an abrasive tape to achieve a surface roughness Ra of 80.
~100 Å, the floating magnetic head (hereinafter abbreviated as magnetic head) can be moved 0.2 Å from the surface of the magnetic disk.
Since it can be levitated at a height of about 0.3 μm, a magnetic disk drive device with excellent high-density recording characteristics can be realized.

【0004】テキスチャ加工を施す目的は、磁気ヘッド
と磁気ディスクが吸着(スティック)するのを防止する
ためと、磁気ディスクの磁気特性を向上させるためであ
る。一般にテキスチャ加工は、ラッピングテープと呼ば
れる研磨テープを鏡面に磨かれたNiPメッキ膜の表面
に接触させ、磁気ディスクを回転させることにより、磁
気ディスクの円周方向に研磨加工を施すのである。この
ときに使用する研磨テープの砥粒の大きさを選択するこ
とによりテキスチャ加工面の表面粗さを制御することが
できる。
The purpose of texturing is to prevent the magnetic head and the magnetic disk from sticking together and to improve the magnetic properties of the magnetic disk. Generally, texturing is performed by bringing an abrasive tape called a lapping tape into contact with the mirror-polished surface of the NiP plating film and rotating the magnetic disk, thereby polishing the magnetic disk in the circumferential direction. By selecting the size of the abrasive grains of the polishing tape used at this time, the surface roughness of the textured surface can be controlled.

【0005】以下に従来の研磨テープについて説明する
。図5は従来のテキスチャ加工用研磨テープの表面状態
を示す斜視図であり、図6は従来の研磨テープの要部断
面図である。
[0005] Conventional abrasive tapes will be explained below. FIG. 5 is a perspective view showing the surface condition of a conventional abrasive tape for texturing, and FIG. 6 is a sectional view of a main part of the conventional abrasive tape.

【0006】1はポリエチレンテレフタレート等の合成
樹脂からなるベースフィルム、2はバインダ樹脂3と研
磨砥粒4とを溶媒中に混合懸濁させた樹脂液をベースフ
ィルム1上に塗布乾燥して形成した砥粒層である。研磨
砥粒4としては酸化アルミニウム、酸化クロム、シリコ
ンカーバイド、ダイヤモンド等が用いられる。
[0006] 1 is a base film made of a synthetic resin such as polyethylene terephthalate, and 2 is formed by coating and drying a resin liquid in which a binder resin 3 and abrasive grains 4 are mixed and suspended in a solvent on the base film 1. This is an abrasive layer. As the polishing abrasive grains 4, aluminum oxide, chromium oxide, silicon carbide, diamond, etc. are used.

【0007】研磨砥粒の種類や粒度、形状により研磨テ
ープの表面形状としてフラット型(a)、亀甲型(b)
、ドーナツ型(c)がある。
Depending on the type, particle size, and shape of the abrasive grains, the surface shape of the abrasive tape can be flat (a) or hexagonal (b).
, donut shape (c).

【0008】以上のように構成された研磨テープについ
て、以下その動作について説明する。図7は磁気ディス
クの要部断面図である。
The operation of the polishing tape constructed as described above will be explained below. FIG. 7 is a sectional view of the main part of the magnetic disk.

【0009】5はアルミニウム合金基板、6はアルミニ
ウム合金基板5の表面に施されたNiPメッキ膜である
。研磨テープはこのNiPメッキ膜6の表面を鏡面に磨
き、更に磁気ディスクの円周方向に研磨する際に使用さ
れる。
5 is an aluminum alloy substrate, and 6 is a NiP plating film applied to the surface of the aluminum alloy substrate 5. The polishing tape is used to polish the surface of the NiP plating film 6 to a mirror surface and further polish it in the circumferential direction of the magnetic disk.

【0010】円周方向に研磨する加工方法は一般にテキ
スチャ加工と言われている。このテキスチャ加工処理さ
れ表面粗さRaが80〜100Åに研磨されたNiPメ
ッキ膜6の上にCr膜7、Co系合金磁性膜8、保護膜
(Cr膜)9、潤滑膜(C膜)10が順次スパッタ法に
て成膜され浮上量が0.2〜0.3μmの磁気ディスク
が製造される。
The processing method of polishing in the circumferential direction is generally called texture processing. On this NiP plating film 6 which has been textured and polished to a surface roughness Ra of 80 to 100 Å, a Cr film 7 , a Co-based alloy magnetic film 8 , a protective film (Cr film) 9 , and a lubricating film (C film) 10 are sequentially deposited by sputtering to produce a magnetic disk with a flying height of 0.2 to 0.3 μm.

【0011】[0011]

【発明が解決しようとする課題】しかしながら上記従来
の構成では、磁気ヘッドの浮上量を0.2μm以下にす
ることが困難という問題点があり、その結果、低浮上量
で高密度記録可能な磁気ディスクの提供が不可能であっ
た。磁気ヘッドの浮上量を下げるためには磁気ディスク
の表面粗さRaを可能な限り小さくする必要がある。R
aを小さくするためには、テキスチャ加工用研磨テープ
の砥粒径を小さくすることが有効であるが、従来の研磨
テープでは、ところどころに異常に深いスクラッチ痕が
発生するという問題点があった。このような異常に深い
スクラッチ痕があると、浮上量が0.1μmである磁気
ヘッドを使用するとき、磁気ヘッドが磁気ディスクに接
触して破損(クラッシュ)をきたす確率が高くなること
から、単純に砥粒径を小さくするだけでは実用化ができ
なかった。
[Problems to be Solved by the Invention] However, with the above conventional configuration, there is a problem that it is difficult to reduce the flying height of the magnetic head to 0.2 μm or less. It was not possible to provide the disc. In order to reduce the flying height of the magnetic head, it is necessary to reduce the surface roughness Ra of the magnetic disk as much as possible. R
In order to reduce a, it is effective to reduce the abrasive grain size of the abrasive tape for texturing, but conventional abrasive tapes have the problem of producing abnormally deep scratch marks in some places. If there are such abnormally deep scratch marks, when using a magnetic head with a flying height of 0.1 μm, there is a high probability that the magnetic head will come into contact with the magnetic disk and cause damage (crash). However, it was not possible to put it into practical use simply by reducing the abrasive grain size.

【0012】本発明は上記従来の問題点を解決するもの
で、研磨テープの砥粒径を小さくしても、異常に深いス
クラッチ痕を発生させずにテキスチャ加工を行うことが
できる研磨テープを提供することを目的とする。
The present invention solves the above conventional problems, and provides an abrasive tape that can be textured without producing abnormally deep scratch marks even when the abrasive grain diameter of the abrasive tape is reduced. The purpose is to

【0013】[0013]

【課題を解決するための手段】この目的を達成するため
に本発明の研磨テープは、バインダ樹脂と研磨砥粒の混
合物である砥粒層とベースフィルムとの間に、前記バイ
ンダ樹脂よりも軟質の樹脂層を積層した構成を有してい
る。
[Means for Solving the Problems] In order to achieve this object, the abrasive tape of the present invention has an abrasive grain layer which is a mixture of a binder resin and abrasive grains, and a base film, which is a mixture of binder resin and abrasive grains. It has a structure in which resin layers are laminated.

【0014】[0014]

【作用】この構成によって、テキスチャ加工面の表面粗
さRaが小さくても軟質樹脂の緩衝作用によって異常に
深いスクラッチの発生を防止したテキスチャ加工を行う
ことができる。また、その結果、磁気ヘッドの浮上量を
0.2μm以下にした超高密度記録特性を有する磁気デ
ィスクを実現できる。
[Operation] With this structure, even if the surface roughness Ra of the textured surface is small, texture processing can be performed while preventing the occurrence of abnormally deep scratches due to the buffering action of the soft resin. Furthermore, as a result, it is possible to realize a magnetic disk having ultra-high density recording characteristics in which the flying height of the magnetic head is 0.2 μm or less.

【0015】[0015]

【実施例】以下本発明の一実施例について、図面を参照
しながら説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings.

【0016】図1は本発明の一実施例における研磨テー
プの要部断面図であり、図2は本発明の研磨テープを用
いてテキスチャ加工を行っているときの研磨テープの要
部断面図である。
FIG. 1 is a sectional view of a main part of an abrasive tape according to an embodiment of the present invention, and FIG. 2 is a sectional view of a main part of an abrasive tape when texture processing is performed using the abrasive tape of the present invention. be.

【0017】1は25〜50μm厚のベースフィルム、
2は5〜15μm厚のバインダ樹脂中に固定された研磨
砥粒とからなる砥粒層、3はバインダ樹脂、4は研磨砥
粒であり、これらは従来例と同様なので同一の番号を付
して説明を省略する。
1 is a base film having a thickness of 25 to 50 μm;
2 is an abrasive grain layer consisting of abrasive grains fixed in a binder resin with a thickness of 5 to 15 μm, 3 is a binder resin, and 4 is an abrasive grain; these are the same as in the conventional example, so they are given the same numbers. The explanation will be omitted.

【0018】11は10〜50μmの軟質樹脂層、12
はディスク基板である。軟質樹脂層11は、前記バイン
ダ樹脂3よりも柔軟性が大きく、図2(a)に示すよう
に砥粒層2の表面の異常突出部に荷重が集中した場合に
、(b)に示すように突出部がベースフィルムの方に沈
み込み、加工物であるNiPメッキ膜6を施したディス
ク基板12には異常に深いスクラッチを発生させないこ
とがわかった。
11 is a soft resin layer of 10 to 50 μm; 12
is the disk substrate. The soft resin layer 11 has greater flexibility than the binder resin 3, and when a load is concentrated on the abnormal protrusion on the surface of the abrasive layer 2 as shown in FIG. It was found that the protruding portion sank into the base film and did not cause abnormally deep scratches on the processed disk substrate 12 coated with the NiP plating film 6.

【0019】(実施例1)ベースフィルム1として厚さ
30μmのポリエチレンテレフタレート製フィルムの片
面に、15μm厚の軟質樹脂層11を積層したものに、
研磨砥粒として平均粒径2μmのAl2O3粒(不二見
研磨材工業(株)製)50重量部とバインダ樹脂3とし
て30〜50重量部をエタノールに均一分散させ、その
懸濁液を軟質樹脂層11上に塗布した後、砥粒層2が1
0μm厚に塗着させ砥粒層2の形状がフラット型の研磨
テープ(a)を得た。この研磨テープ(a)を用い、外
径3.5インチのNiPメッキ膜を施したアルミニウム
合金基板で鏡面ポリッシュ加工を施した磁気ディスク5
0枚についてテキスチャ加工を行い、異常スクラッチの
発生頻度を求めた。
(Example 1) A 15 μm thick soft resin layer 11 was laminated on one side of a 30 μm thick polyethylene terephthalate film as the base film 1.
50 parts by weight of Al2O3 grains (manufactured by Fujimi Abrasives Industry Co., Ltd.) with an average particle diameter of 2 μm as abrasive grains and 30 to 50 parts by weight as a binder resin 3 are uniformly dispersed in ethanol, and the suspension is used as a soft resin layer. After coating on 11, abrasive layer 2
The polishing tape (a) was coated to a thickness of 0 μm to obtain a polishing tape (a) in which the abrasive grain layer 2 had a flat shape. Using this polishing tape (a), a magnetic disk 5 was mirror-polished on an aluminum alloy substrate coated with a NiP plating film with an outer diameter of 3.5 inches.
Texture processing was performed on 0 sheets, and the frequency of occurrence of abnormal scratches was determined.

【0020】発生頻度は検査した磁気ディスクの面数と
異常に深いスクラッチを目視で検出した面数の百分率で
表示した。
The frequency of occurrence was expressed as a percentage of the number of surfaces of the magnetic disks inspected and the number of surfaces on which abnormally deep scratches were visually detected.

【0021】その結果を(表1)に示す。 (実施例2,3)砥粒層2の形状を亀甲型、ドーナツ型
とした他は実施例1と同様にして研磨テープ(b)、(
c)を得、実施例1と同一の条件でテキスチャ加工を行
い異常スクラッチの発生頻度を求めた。その結果を(表
1)に示す。
The results are shown in (Table 1). (Examples 2 and 3) Polishing tapes (b), (
c) was obtained, texture processing was performed under the same conditions as in Example 1, and the frequency of occurrence of abnormal scratches was determined. The results are shown in (Table 1).

【0022】(実施例4)研磨砥粒4として平均粒径1
μmのAl2O3粒(不二見研磨材工業(株)製)50
重量部を用い、砥粒層2の形状をフラット型にした他は
実施例1と同様にして研磨テープ(d)を得、実施例1
と同一の条件でテキスチャ加工を行い異常スクラッチの
発生頻度を求めた。その結果を(表1)に示す。
(Example 4) As the polishing abrasive grains 4, the average particle size was 1
μm Al2O3 grains (manufactured by Fujimi Abrasives Industry Co., Ltd.) 50
A polishing tape (d) was obtained in the same manner as in Example 1 except that the weight part was used and the shape of the abrasive layer 2 was made flat.
Texture processing was performed under the same conditions as above, and the frequency of occurrence of abnormal scratches was determined. The results are shown in (Table 1).

【0023】(比較例1〜4)軟質樹脂層を設けなかっ
た他は実施例1〜4と同様にして、砥粒層の形状がフラ
ット型(a)、亀甲型(b)、ドーナツ型(c)、フラ
ット型(d)の従来の研磨テープを製造した。
(Comparative Examples 1 to 4) Examples 1 to 4 were repeated except that the soft resin layer was not provided. c), flat type (d) conventional abrasive tapes were manufactured.

【0024】これらの研磨テープ(a)〜(d)を用い
て実施例1と同一の条件でテキスチャ加工を行い異常ス
クラッチの発生頻度を求めた。その結果を(表1)に示
す。
Using these polishing tapes (a) to (d), texture processing was carried out under the same conditions as in Example 1, and the frequency of occurrence of abnormal scratches was determined. The results are shown in (Table 1).

【0025】[0025]

【表1】[Table 1]

【0026】この(表1)から明らかなように、本実施
例では砥粒層の形状や砥粒径にかかわらず異常に深いス
クラッチの発生は認められなかった。
As is clear from Table 1, no abnormally deep scratches were observed in this example, regardless of the shape of the abrasive layer or the diameter of the abrasive grains.

【0027】これに対し、比較例に示す従来の研磨テー
プは5〜20%と高い確率で異常に深いスクラッチが発
生していることがわかった。
On the other hand, it was found that in the conventional abrasive tape shown in the comparative example, abnormally deep scratches occurred with a high probability of 5 to 20%.

【0028】次に、実施例1〜4、比較例1〜4の研磨
テープでテキスチャ加工を行った磁気ディスクの信頼性
試験を行った。
Next, a reliability test was conducted on magnetic disks textured with the abrasive tapes of Examples 1 to 4 and Comparative Examples 1 to 4.

【0029】ここで信頼性試験はグライド浮上保証とな
る浮上量0.06μmでのAE(Acoustic.E
mission)出力電圧にて評価を行った。AE出力
電圧の測定は、図3に示すように、磁気ヘッド13の支
持部であるフレクシャ14の固定部(マウント)15に
AE素子16を取り付け、スピンドル17に装着された
磁気ディスク18を回転させ、磁気ディスク18のスク
ラッチ痕部で磁気ヘッド13が受ける衝撃力をAE素子
16が電圧に変換したものを測定し、ノイズレベルの2
倍以上になる出力電圧の回数をカウントすることで、磁
気ヘッド13と磁気ディスク18の接触回数を評価した
Here, the reliability test was conducted using AE (Acoustic.
(mission) Evaluation was performed using the output voltage. As shown in FIG. 3, the AE output voltage is measured by attaching the AE element 16 to the fixed part (mount) 15 of the flexure 14, which is the supporting part of the magnetic head 13, and rotating the magnetic disk 18 mounted on the spindle 17. The AE element 16 measures the impact force that the magnetic head 13 receives from the scratch marks on the magnetic disk 18 and converts it into a voltage, and the noise level is 2.
The number of contacts between the magnetic head 13 and the magnetic disk 18 was evaluated by counting the number of times the output voltage was doubled or more.

【0030】尚、グライド浮上保証とは、磁気ディスク
ドライブ装置で使用される磁気ヘッドの浮上量(例えば
、0.1μm)に対して、その60〜80%の浮上量(
例えば、0.06μm)を保証することをいう。
[0030] The glide flying guarantee means that the flying height (for example, 0.1 μm) of the magnetic head used in a magnetic disk drive device is 60 to 80% of the flying height (for example, 0.1 μm).
For example, 0.06 μm).

【0031】信頼性試験をした磁気ディスクの領域は半
径の内20〜46mmの範囲で行った。その結果を(表
2)に示す。
The reliability test was carried out over a radius of 20 to 46 mm on the magnetic disk. The results are shown in (Table 2).

【0032】[0032]

【表2】[Table 2]

【0033】この(表2)から明らかなように、本実施
例では、グライド浮上保証の下限浮上量である0.06
μmに対するAEカウント数が4〜20回であったのに
対し、比較例ではその10倍〜230倍もカウントされ
ている。
As is clear from this (Table 2), in this example, the lower limit flying height for glide flying guarantee is 0.06
While the number of AE counts per μm was 4 to 20 times, in the comparative example, the number of AE counts was 10 to 230 times that number.

【0034】これは、肉眼では判断できない程度の深い
スクラッチ痕が、多数存在しているためと考えられる。 一般に、深いスクラッチが入ると塑性変形が起こり図4
に示すように深いスクラッチ痕19の両端が盛り上がり
突起部20が形成されるという現象が発生することはよ
く知られている。このことから肉眼では判断できない程
度の深いスクラッチが存在し、磁気ヘッドに接触する異
常突起部が磁気ディスク上に発生しているものと考えら
れる。これに対して、本実施例の研磨テープを用いてテ
キスチャ加工した磁気ディスクは、(表2)に示すよう
にAE素子によるカウント数が20回以下となっており
、明らかに本発明の研磨テープによるテキスチャ加工の
方が優れていることが判る。
This is thought to be due to the presence of many deep scratch marks that cannot be seen with the naked eye. Generally, when a deep scratch occurs, plastic deformation occurs, as shown in Figure 4.
It is well known that a phenomenon occurs in which both ends of a deep scratch mark 19 bulge and a protrusion 20 is formed as shown in FIG. This suggests that there are deep scratches that cannot be seen with the naked eye, and that abnormal protrusions that come into contact with the magnetic head have occurred on the magnetic disk. On the other hand, the magnetic disk textured using the abrasive tape of this example has a count number of 20 times or less by the AE element, as shown in (Table 2), and it is clear that the abrasive tape of the present invention is It can be seen that the texture processing is superior.

【0035】[0035]

【発明の効果】以上のように本発明は、砥粒層とベース
フィルムの間に砥粒層のバインダ樹脂よりも軟質な合成
樹脂層を積層したことにより、研磨時砥粒によるスクラ
ッチの発生率を大幅に減少させたので、低浮上量でかつ
安定な浮上状態を与える磁気ディスクを高い歩留りで提
供することができる優れた研磨テープを実現できるもの
である。
As described above, the present invention has a synthetic resin layer that is softer than the binder resin of the abrasive layer and is laminated between the abrasive layer and the base film, thereby reducing the occurrence of scratches caused by abrasive particles during polishing. By significantly reducing the amount of friction, it is possible to realize an excellent abrasive tape that can provide magnetic disks with a low flying height and a stable flying state at a high yield.

【図面の簡単な説明】[Brief explanation of drawings]

【図1】本発明の研磨テープの要部断面図[Fig. 1] Cross-sectional view of essential parts of the abrasive tape of the present invention

【図2】(a
)研磨テープの砥粒層表面の要部断面図(b)テキスチ
ャ加工時の研磨テープの要部断面図
[Figure 2] (a
) Cross-sectional view of the main part of the abrasive layer surface of the polishing tape (b) Cross-sectional view of the main part of the polishing tape during texture processing

【図3】AE出力電
圧の測定装置の原理図
[Figure 3] Principle diagram of AE output voltage measurement device

【図4】磁気ディスク表面のスク
ラッチ痕部の拡大図
[Figure 4] Enlarged view of scratch marks on the magnetic disk surface

【図5】従来の研磨テープの斜視図[Figure 5] Perspective view of conventional polishing tape

【図6】従来の研磨テープの要部断面図[Figure 6] Cross-sectional view of main parts of conventional polishing tape

【図7】磁気デ
ィスクの要部断面図
[Figure 7] Cross-sectional view of main parts of a magnetic disk

【符号の説明】[Explanation of symbols]

1  ベースフィルム 2  砥粒層 3  バインダ樹脂 4  研磨砥粒 5  アルミニウム合金基板 6  NiPメッキ膜 7  Cr膜 8  Co系合金磁性膜 9  保護膜 10  潤滑膜 11  軟質樹脂層 12  ディスク基板 19  スクラッチ痕 20  突起部 1 Base film 2 Abrasive grain layer 3 Binder resin 4. Abrasive grains 5 Aluminum alloy substrate 6 NiP plating film 7 Cr film 8 Co-based alloy magnetic film 9 Protective film 10 Lubricating film 11 Soft resin layer 12 Disc board 19 Scratch marks 20 Protrusion

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】研磨砥粒とバインダ樹脂の混合物からなる
砥粒層とベースフィルムとの間に前記バインダ樹脂より
軟質の合成樹脂層が積層されていることを特徴とする研
磨テープ。
1. An abrasive tape characterized in that a synthetic resin layer softer than the binder resin is laminated between an abrasive grain layer made of a mixture of abrasive grains and a binder resin and a base film.
JP8668091A 1991-04-18 1991-04-18 Polishing tape Pending JPH04318324A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8668091A JPH04318324A (en) 1991-04-18 1991-04-18 Polishing tape

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8668091A JPH04318324A (en) 1991-04-18 1991-04-18 Polishing tape

Publications (1)

Publication Number Publication Date
JPH04318324A true JPH04318324A (en) 1992-11-09

Family

ID=13893733

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8668091A Pending JPH04318324A (en) 1991-04-18 1991-04-18 Polishing tape

Country Status (1)

Country Link
JP (1) JPH04318324A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5633068A (en) * 1994-10-14 1997-05-27 Fuji Photo Film Co., Ltd. Abrasive tape having an interlayer for magnetic head cleaning and polishing

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5633068A (en) * 1994-10-14 1997-05-27 Fuji Photo Film Co., Ltd. Abrasive tape having an interlayer for magnetic head cleaning and polishing

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