JPH07161653A - Heat-treating device - Google Patents

Abstract

PURPOSE:To prevent a jig and a material on the periphery of a matter to be treated from being heated by a method wherein a container, in which the matter to be treated is inserted, or support stands to support the matter to be treated is formed of a material which transmits infrared rays. CONSTITUTION:A matter 1 to be treated is supported in a tube 2 made of calcium fluoride using support stands 3 made of the calcium fluoride. Gas, such as oxygen gas, nitrogen gas or argon gas, is fed through a gas introducing port 5 and the matter 1 to be treated is subjected to heating treatment by infrared lamps 4. As the calcium fluoride transmits infrared rays, temperature rise of the tube and the stands is less than in the case where the tube and the support stands are made of quartz, and a heat-up and a cooling-down of the matter 1 can be attained in a short time. Moreover, metal contamination due to Fe, Cr, Ni and the like from the material on the periphery of the matter 1 to the matter 1 is not encountered.

Description

Detailed Description of the Invention

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a heat treatment apparatus using radiation, especially infrared rays.

[0002]

2. Description of the Related Art In the manufacture of semiconductor devices, various heat treatments such as oxidation, diffusion and annealing are performed. Conventionally, these heat treatments have been mainly performed by a heater. In recent years, infrared rays have been used as a heating means in place of the heater by shortening the heat treatment time for shallowing the diffusion layer, heat treatment in a closed space for keeping an object to be cleaned, and single-wafer heat treatment by increasing the diameter of the wafer. Radiation has come to be used.

[0003]

However, when radiation is used, not only the object to be processed but also a jig around the object to be processed,
The material is heated. As a result, there is a problem that the temperature of the object to be processed cannot be raised or lowered in a short time due to radiation from the heated peripheral material to the object to be processed, and the object to be processed is contaminated from the heated peripheral material. .

An object of the present invention is to provide a heat treatment apparatus which prevents heating of jigs and materials around the object to be treated.

[0005]

In order to achieve the above object, the heat treatment method and apparatus of the present invention cover an object to be processed with a material that transmits infrared rays. A material that transmits infrared rays is used for the support base of the object to be processed.

[0006]

By making the jigs and materials around the object to be processed from materials that transmit infrared rays, even if the jigs and materials around the object to be processed are irradiated with infrared rays, the temperature rise of these materials is small and The time for raising and lowering the temperature of the processed material can be shortened.
Moreover, since the temperature rise of the peripheral material of the object to be processed is small, the contamination of the object to be processed from the peripheral material is small.

[0007]

EXAMPLE 1 FIG. 1 is a sectional view of the present invention.
An object to be processed 1 is supported in a tube 2 made of calcium fluoride using a support base 3 made of calcium fluoride, and a gas such as oxygen, nitrogen, or argon is supplied from a gas inlet 5, and an object to be processed is set by an infrared lamp 4. Is heat treated. The tube or support of the present invention has a lower temperature rise than calcium fluorescein which is transmitted through the infrared rays of calcium fluoride, and the temperature rise and fall of the object to be treated are about the same as quartz. It was able to be completed in 1/2 time. Further, metal contamination of Fe, Cr, Ni, etc. from the peripheral materials to the object to be treated was not seen.

(Embodiment 2) FIG. 2 is a sectional view showing a case where the support base of Embodiment 1 is used as the support arm 6. There was little particle generation because the tube and the support did not come into contact with each other when attaching or removing the object to be processed.

(Embodiment 3) FIG. 3 shows a third embodiment of the present invention. In this embodiment, the object 1 to be treated is supported in a calcium fluoride container 2 using a calcium fluoride support base 3. The container can be filled with a gas necessary for processing the object to be processed, or the gas inside the container can be exhausted. This makes it possible to easily control the atmosphere (oxidation, inertness, reduced pressure, etc.) of the object to be processed.

(Embodiment 4) FIG. 4 is a sectional view showing the case where an infrared reflection film 7 of gold, aluminum or the like is applied to the outside of the calcium fluoride container 2 of Embodiment 3. The infrared rays emitted from the infrared lamp were suppressed from escaping out of the container, and the object to be processed was efficiently heated. Similar results were obtained when an infrared reflecting plate was used instead of the infrared reflecting film.

(Embodiment 5) FIG. 5 is a sectional view showing a case where the inner surface of the calcium fluoride container 2 and the surface of the support base 3 are coated with silicon dioxide. The infrared rays emitted from the infrared lamp were partially absorbed by the silicon dioxide coated on the inner surface of the container, but the loss due to the small thickness of the silicon dioxide was small, and the object to be treated was efficiently heated by the infrared lamp. In addition, by coating the container and the support with high-purity silicon dioxide containing few impurities by chemical vapor deposition, sputtering, etc., contamination of the object to be treated from the calcium fluoride material itself is suppressed, and a cleaner environment is obtained. You can build a process. The film thickness of the silicon dioxide to be coated is preferably thick from the viewpoint of preventing contamination, but is preferably thin from the viewpoint of infrared absorption. As a result of experiments, it has been found that this object can be achieved if the coating thickness of silicon dioxide is 0.5 to 5 μm.

In the above embodiment, the tube, the container, the support,
Although calcium fluoride was used as the material that transmits infrared rays such as the support arm, other material such as magnesium fluoride may be used as the material that transmits infrared rays.

[0013]

According to the present invention, the jig around the object to be processed,
Since the material is made of a material that transmits infrared rays, the temperature of the jig and the material around the object to be processed does not rise, and the temperature of the object to be processed can be raised and lowered in a short time. Further, since the temperature rise of the peripheral material of the object to be processed is small, the contamination of the object to be processed from the peripheral material can be reduced.

[Brief description of drawings]

FIG. 1 is a sectional view of an embodiment of the present invention.

FIG. 2 is a sectional view of a second embodiment of the present invention.

FIG. 3 is a sectional view of a third embodiment of the present invention.

FIG. 4 is a sectional view of a fourth embodiment of the present invention.

FIG. 5 is a sectional view of a fifth embodiment of the present invention.

[Explanation of symbols]

1 ... Object to be treated, 2 ... Tube, container, 3 ... Supporting base, 4 ...
Infrared lamp, 5 ... Gas inlet, 6 ... Support arm, 7 ...
Infrared reflecting film, 8 ... Silicon dioxide film.

Continuation of front page (51) Int.Cl. ⁶ Identification number Reference number in the agency FI Technical indication location H01L 21/324 D (72) Inventor Shizuka Oyu 1-280 Higashi Koikeku, Kokubunji, Tokyo Hitachi Central Research Institute In-house

Claims (4)

[Claims] 1. An apparatus for heat-treating an object to be processed using infrared rays, characterized in that a container for inserting the object to be processed or a support for supporting the object to be processed is formed of a material which transmits infrared rays. Heat treatment equipment. 2. The heat treatment apparatus according to claim 1, wherein the inner surface of the container into which the object to be processed is inserted or the surface of a support table that supports the object to be processed is coated with silicon dioxide. 3. The heat treatment apparatus according to claim 2, wherein the film thickness of the silicon dioxide to be coated is 0.5 to 5 μm. 4. The heat treatment apparatus according to claim 1, wherein the material that transmits infrared rays contains either calcium fluoride or magnesium fluoride.