JPH0714759A - Destaticizing method for semiconductor device - Google Patents

Destaticizing method for semiconductor device

Info

Publication number
JPH0714759A
JPH0714759A JP14875693A JP14875693A JPH0714759A JP H0714759 A JPH0714759 A JP H0714759A JP 14875693 A JP14875693 A JP 14875693A JP 14875693 A JP14875693 A JP 14875693A JP H0714759 A JPH0714759 A JP H0714759A
Authority
JP
Japan
Prior art keywords
semiconductor device
charged
destaticizing
static electricity
section
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP14875693A
Other languages
Japanese (ja)
Inventor
Haruki Hosaka
春樹 保坂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Akita Electronics Systems Co Ltd
Original Assignee
Hitachi Ltd
Akita Electronics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Akita Electronics Co Ltd filed Critical Hitachi Ltd
Priority to JP14875693A priority Critical patent/JPH0714759A/en
Publication of JPH0714759A publication Critical patent/JPH0714759A/en
Pending legal-status Critical Current

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  • Elimination Of Static Electricity (AREA)

Abstract

PURPOSE:To facilitate destaticizing by heating a charged semiconductor device, varying the ambient humidity with respect to that of the charged semiconductor device, or feeding a volatile fluid to the charged semiconductor. CONSTITUTION:A transferred semiconductor device 1 is swept lightly by means of a soot sweeping brush in a laser marking machine and charged. The charged semiconductor device 1 is transferred into a decharging section 4. A low humidity high temperature atmosphere of 150 deg.C or above is kept in the destaticizing section 4 and the charged semiconductor 1 is placed therein for 5min, or a natural pressure high humidity atmosphere of 95%RH is kept in the destaticizing section 4 and the charged semiconductor device 1 is placed therein for 5min thus destaticizing the device 1. The charged semiconductor device 1 is further destaticized by spraying a volatile liquid when the device 1 passes through the destaticizing section 4. Consequently, the semiconductor device can be destaticized by mean of a simple and inexpensive apparatus.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体装置に帯電した
静電気の除去方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for removing static electricity charged in a semiconductor device.

【0002】[0002]

【従来の技術】半導体装置の製造工程で静電気による製
品の不良が発生するため、工程内で高度の温湿度管理を
行うか、イオンブロワーを設置していた。
2. Description of the Related Art Since a product defect due to static electricity occurs in a semiconductor device manufacturing process, a high degree of temperature / humidity control or an ion blower is installed in the process.

【0003】また、静電気を除去する除電器として、電
圧印加式除電器、自己放電式除電器及び放射線式除電器
等が用いられている。
Further, as a static eliminator for removing static electricity, a voltage application type static eliminator, a self-discharge type static eliminator, a radiation type static eliminator and the like are used.

【0004】[0004]

【発明が解決しようとする課題】本発明者は、前記従来
技術を検討した結果、以下の問題点を見い出した。
The present inventor has found the following problems as a result of examining the above-mentioned prior art.

【0005】すなわち、前記従来技術による半導体製造
工程内での温湿度管理では、デバイス搬送部での静電気
発生防止は困難である。また、イオンブロワー等の静電
気を除去する除電器を用いることは高価になるという問
題がある。
That is, it is difficult to prevent the generation of static electricity in the device carrying section by controlling the temperature and humidity in the semiconductor manufacturing process according to the above conventional technique. In addition, it is expensive to use a static eliminator such as an ion blower for removing static electricity.

【0006】本発明の目的は、帯電した半導体装置の静
電気を除去することが可能な除電技術を提供することに
ある。
An object of the present invention is to provide a static elimination technique capable of eliminating static electricity of a charged semiconductor device.

【0007】本発明の前記ならびにその他の目的及び新
規な特徴は、本明細書の記述及び添付図面によって明ら
かになるであろう。
The above and other objects and novel features of the present invention will be apparent from the description of this specification and the accompanying drawings.

【0008】[0008]

【課題を解決するための手段】本願によって開示される
発明のうち代表的なものの概要を簡単に説明すれば、以
下のとおりである。
The outline of the representative ones of the inventions disclosed by the present application will be briefly described as follows.

【0009】すなわち、本発明による半導体装置の除電
方法は、帯電した半導体装置を加熱する。
That is, the method of removing static electricity from a semiconductor device according to the present invention heats the charged semiconductor device.

【0010】また、本発明による半導体装置の除電方法
は、帯電した半導体装置の湿度に対し、周囲の湿度を変
化させる。
Further, in the method of static elimination of a semiconductor device according to the present invention, the ambient humidity is changed with respect to the humidity of the charged semiconductor device.

【0011】また、本発明による半導体装置の除電方法
は、帯電した半導体装置に対し、揮発性の流体を付与す
る。
Further, in the method of static elimination of a semiconductor device according to the present invention, a volatile fluid is applied to the charged semiconductor device.

【0012】[0012]

【作用】前述の手段によれば、帯電した半導体装置を加
熱することにより、帯電物の温度に対してその帯電物の
周囲の温度を変化させるので、この温度変化により静電
気を除去することができた。また、加熱することより水
分が蒸発されるので、その時に除電されることが考えら
れる。
According to the above-mentioned means, by heating the charged semiconductor device, the ambient temperature of the charged object is changed with respect to the temperature of the charged object. Therefore, static electricity can be removed by this temperature change. It was Further, since the water content is evaporated by heating, it is considered that the electricity is removed at that time.

【0013】また、帯電した半導体装置に対し、周囲の
湿度を変化させることにより、静電気を除去することが
できた。
Further, the static electricity could be removed by changing the ambient humidity of the charged semiconductor device.

【0014】また、帯電した半導体装置に対し、揮発性
の流体を付与したので、流体の揮発により静電気を除去
することができた。
Since a volatile fluid is applied to the charged semiconductor device, the static electricity can be removed by volatilizing the fluid.

【0015】[0015]

【実施例】以下、本発明の実施例を図面を用いて詳細に
説明する。
Embodiments of the present invention will now be described in detail with reference to the drawings.

【0016】図1は、本発明による半導体装置の除電方
法の実施例を説明するための模式構成図である。
FIG. 1 is a schematic configuration diagram for explaining an embodiment of a method for eliminating static electricity from a semiconductor device according to the present invention.

【0017】図1において、2は半導体装置1を搬送す
るデバイス搬送部である。搬送されてきた半導体装置1
は、その表面に付着したちり等をはらうためにレーザマ
ーク機のスス取りブラシ3等により、軽く摩擦される。
その時に半導体装置は帯電する。帯電した半導体装置
は、静電気除去部4内へ搬送される。
In FIG. 1, reference numeral 2 is a device carrying section for carrying the semiconductor device 1. Semiconductor device 1 that has been transported
Is lightly rubbed by the soot-removing brush 3 of the laser mark machine in order to adhere to the surface thereof and to remove the dust.
At that time, the semiconductor device is charged. The charged semiconductor device is transported into the static electricity removing unit 4.

【0018】(実施例1)静電気除去部4内を150℃
の高温かつ低湿度に保ち、帯電した半導体装置1を5分
間この雰囲気中に置くことで、静電気が除去された。
(Embodiment 1) The inside of the static electricity removing section 4 is heated to 150 ° C.
The static electricity was removed by keeping the charged semiconductor device 1 in this atmosphere for 5 minutes while maintaining the high temperature and low humidity.

【0019】(実施例2)また、静電気除去部4内を自
然状態の気圧のもとで95%RHの高湿度に保ち、帯電
した半導体装置を5分間この雰囲気中に置くことで静電
気が除去された。
(Embodiment 2) Static electricity is removed by keeping the inside of the static electricity removing section 4 at a high humidity of 95% RH under atmospheric pressure in a natural state and placing the charged semiconductor device in this atmosphere for 5 minutes. Was done.

【0020】これは半導体装置に温湿度変化を与えるこ
とにより、静電気の自然放電を加速させるためである。
This is because the spontaneous discharge of static electricity is accelerated by changing the temperature and humidity of the semiconductor device.

【0021】(実施例3)また、静電気除去部4内を帯
電した半導体装置が通過するとき、メータノール等揮発
性液体のシャワーを通過させることにより、静電気が除
去された。
(Embodiment 3) Further, when the charged semiconductor device passed through the static electricity removing portion 4, the static electricity was removed by passing it through a shower of a volatile liquid such as meteranol.

【0022】半導体装置の製造工程で、製造中の半導体
装置が帯電する恐れがあるのは、リード切断機、マーク
機、レーザマーク機、外観検査機等の工程を通過すると
きである。従って、静電気除去部4はこのような工程の
後に配置する。
In the process of manufacturing a semiconductor device, the semiconductor device being manufactured may be charged when passing through processes such as a lead cutting machine, a marking machine, a laser marking machine, and an appearance inspection machine. Therefore, the static electricity removing unit 4 is arranged after such a process.

【0023】以上、本発明を実施例に基づき具体的に説
明したが、本発明は前記実施例に限定されるものではな
く、その要旨を逸脱しない範囲において、種々変更し得
ることはいうまでもない。
Although the present invention has been specifically described based on the embodiments, the present invention is not limited to the above embodiments, and various modifications can be made without departing from the scope of the invention. Absent.

【0024】[0024]

【発明の効果】本願によって開示される発明のうち代表
的なものによって得られる効果の説明すれば、以下のと
おりである。
The effects obtained by the representative one of the inventions disclosed in the present application will be described as follows.

【0025】すなわち、イオンブロワー等の装置にくら
べ、簡単かつ安価な装置で、半導体装置に帯電した静電
気を容易に除去することができる。
That is, the static electricity charged in the semiconductor device can be easily removed with a simpler and cheaper device than the device such as the ion blower.

【図面の簡単な説明】[Brief description of drawings]

【図1】 本発明による半導体装置の除電方法の実施例
を説明するための模式構成図。
FIG. 1 is a schematic configuration diagram for explaining an embodiment of a method for neutralizing a semiconductor device according to the present invention.

【符号の説明】[Explanation of symbols]

1…半導体装置、2…搬送部、3…スス取りブラシ、4
…静電気除去部。
DESCRIPTION OF SYMBOLS 1 ... Semiconductor device, 2 ... conveyance part, 3 ... soot removal brush, 4
… Static electricity removal unit.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 半導体装置に帯電した静電気の除去方法
において、帯電した半導体装置を加熱することを特徴と
する半導体装置の除電方法。
1. A method of removing static electricity from a semiconductor device, which comprises heating the charged semiconductor device in a method of removing static electricity from the semiconductor device.
【請求項2】 半導体装置に帯電した静電気の除去方法
において、帯電した半導体装置の湿度に対し、周囲の湿
度を変化させることを特徴とする半導体装置の除電方
法。
2. A method of removing static electricity from a semiconductor device, wherein the ambient humidity is changed with respect to the humidity of the charged semiconductor device.
【請求項3】 半導体装置に帯電した静電気の除去方法
において、帯電した半導体装置に対し、揮発性の流体を
付与することを特徴とする半導体装置の除電方法。
3. A method of removing static electricity from a semiconductor device, wherein a volatile fluid is applied to the charged semiconductor device.
JP14875693A 1993-06-21 1993-06-21 Destaticizing method for semiconductor device Pending JPH0714759A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14875693A JPH0714759A (en) 1993-06-21 1993-06-21 Destaticizing method for semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14875693A JPH0714759A (en) 1993-06-21 1993-06-21 Destaticizing method for semiconductor device

Publications (1)

Publication Number Publication Date
JPH0714759A true JPH0714759A (en) 1995-01-17

Family

ID=15459940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14875693A Pending JPH0714759A (en) 1993-06-21 1993-06-21 Destaticizing method for semiconductor device

Country Status (1)

Country Link
JP (1) JPH0714759A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116759883A (en) * 2023-08-10 2023-09-15 长春汽车工业高等专科学校 Vehicle-mounted semiconductor laser auxiliary device capable of reducing strong scattered light interference

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116759883A (en) * 2023-08-10 2023-09-15 长春汽车工业高等专科学校 Vehicle-mounted semiconductor laser auxiliary device capable of reducing strong scattered light interference
CN116759883B (en) * 2023-08-10 2023-10-20 长春汽车工业高等专科学校 Vehicle-mounted semiconductor laser auxiliary device capable of reducing strong scattered light interference

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