JPH07142319A - Light source device - Google Patents

Light source device

Info

Publication number
JPH07142319A
JPH07142319A JP5143171A JP14317193A JPH07142319A JP H07142319 A JPH07142319 A JP H07142319A JP 5143171 A JP5143171 A JP 5143171A JP 14317193 A JP14317193 A JP 14317193A JP H07142319 A JPH07142319 A JP H07142319A
Authority
JP
Japan
Prior art keywords
light source
illuminance
light
source device
illuminance ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5143171A
Other languages
Japanese (ja)
Inventor
Shigemi Ishii
重美 石井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP5143171A priority Critical patent/JPH07142319A/en
Publication of JPH07142319A publication Critical patent/JPH07142319A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008Production of exposure light, i.e. light sources
    • G03F7/70016Production of exposure light, i.e. light sources by discharge lamps
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70925Cleaning, i.e. actively freeing apparatus from pollutants, e.g. using plasma cleaning
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Microphotolithographic exposure; Apparatus therefor
    • G03F7/708Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975Assembly, maintenance, transport or storage of apparatus

Abstract

PURPOSE:To provide the light source device of a semiconductor manufacturing device for a stepper and the like, which can accurately measure the performance values of an optical part and can indicate the times of cleaning and replacement. CONSTITUTION:An illuminance sensor 11 is inserted into a light emitting surface of a mercury lamp 1, and the illuminance of the mercury lamp 1 is measured. Then, the illuminance sensor 11 is inserted into the light radiation surface of an elliptical surface mirror 2, the illuminance is measured and the illuminance ratio of the light source is obtained. The illuminance ratios of a lens, a plane mirror and the like are computed based on the luminances of the respective light at the incident side and the emitting side. The illuminance sensor 11 is outputted and inputted on an optical path with a linear actuator. A CPU 18 judges the deterioration of the performance of the optical part based on the illuminance ratio and indicates the times of cleaning, replacement and the like for a CRT, a printer and the like.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体製造用露光装置等
の光源装置に関わり、とくに水銀灯やレーザ光源等の寿
命管理を行なうことのできる光源装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a light source device such as a semiconductor manufacturing exposure apparatus, and more particularly to a light source device capable of managing the life of a mercury lamp, a laser light source or the like.

【0002】[0002]

【従来の技術】半導体製造装置に使用される水銀灯、レ
ーザ等の光源装置には高放射照度、放射照度均一等の性
能が要求され、これらの性能を維持するために、水銀
灯、ザレ−ザ、光学部品等を定期的に交換したり清掃す
るようにしている。このため、露光波長の光フィルタは
その酸化膜等の多層蒸着膜が環境によりが変化しやすい
ため有寿命品として比較的短期間に交換されてきたが、
他の有寿命品と認識されていないレンズや反射鏡等の光
学部品は高価なこともあり長期間使用されている。
2. Description of the Related Art A light source device such as a mercury lamp and a laser used in a semiconductor manufacturing apparatus is required to have high irradiance and uniform irradiance, and in order to maintain these performances, a mercury lamp, laser, The optical parts are regularly replaced and cleaned. For this reason, optical filters with exposure wavelengths have been replaced in a relatively short period of time as long-life products because the multilayer vapor-deposited film such as the oxide film easily changes depending on the environment.
Other optical components such as lenses and reflecting mirrors, which are not recognized as having a limited life, are expensive and have been used for a long time.

【0003】また、清掃が必要な光学部品は周期的に清
掃されてきたが、その中には清掃の必要のないもが含ま
れる場合が多く、さらに清掃によって不要に傷つけたり
する場合もあり、このようなメインテナンスに要する費
用や時間等が大きな負担となっていた。また、部品が突
発的に劣化した場合には劣化部品の特定に多大の時間を
要し、これもまた装置使用者にとって大きな負担となっ
ていた。また、ステッパにおいては投影レンズの物体面
あるいは結像面の放射照度を手動または自動で測定し光
学系全体の特性を把握するようにしていたが、光学部品
個々の特性変化は把握できなかった。
Further, although the optical parts which need to be cleaned have been periodically cleaned, there are many cases in which those which do not need to be cleaned are included, and further, the cleaning may cause unnecessary damage. The cost and time required for such maintenance has been a heavy burden. Further, when a part suddenly deteriorates, it takes a lot of time to specify the deteriorated part, which also imposes a heavy burden on the user of the apparatus. Further, in the stepper, the irradiance of the object plane or the image plane of the projection lens is manually or automatically measured to grasp the characteristics of the entire optical system, but the characteristic change of each optical component cannot be grasped.

【0004】なお、特開昭61−176115号公報に
は、露光用ランプの他に予備ランプを備え、露光用ラン
プの照射強度が所定値を割ったときに予備ランプに切り
替え、これを所定の位置に移動することが開示されてい
る。また、特開平3−6011号公報には、露光用光源
の光を波長別に測定して露光用光源の光エネルギを制御
することが開示されている。また、特開昭60−198
724号公報には、投影露光用光源と露光用原版間に出
し入れ可能な照度分布測定装置を配置することが開示さ
れている。また、特開昭61−267323号公報に
は、半導体製造装置の光学系内に設けた光ファイバによ
り露光照度をモニタ、制御することが開示されている。
In Japanese Patent Laid-Open No. 61-176115, a spare lamp is provided in addition to the exposure lamp, and when the irradiation intensity of the exposure lamp falls below a predetermined value, the spare lamp is switched to the predetermined lamp. Moving to a position is disclosed. Further, Japanese Patent Laid-Open No. 3-6011 discloses that the light energy of the exposure light source is controlled by measuring the light of the exposure light source for each wavelength. In addition, JP-A-60-198
Japanese Patent Publication No. 724 discloses that an illuminance distribution measuring device that can be put in and taken out is arranged between a projection exposure light source and an exposure original plate. Further, Japanese Patent Application Laid-Open No. 61-267323 discloses that the exposure illuminance is monitored and controlled by an optical fiber provided in the optical system of the semiconductor manufacturing apparatus.

【0005】[0005]

【発明が解決しようとする課題】本発明の目的は、光学
部品の特性を個々に把握して上記の問題点を解消し、光
学部品の交換、清掃等の費用を削減することのできる半
導体製造装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to manufacture a semiconductor in which the characteristics of optical components can be individually grasped to solve the above problems, and the costs for replacement and cleaning of optical components can be reduced. To provide a device.

【0006】[0006]

【課題を解決するための手段】上記課題を解決するため
に、光源装置内の反射鏡やレンズ等の光学部品の入射光
と出射光の照度比、または、上記光源を構成するランプ
の出射光と楕円面鏡の出射光の照度比を測定し、測定さ
れた照度比がその許容範囲を外れた場合に警報を発生す
るようにする。また、上記照度比の許容範囲値と現在の
照度比または測定された照度比の経時変化値を表示す
る。また、照度センサを上記光源装置の光路内に出し入
れして上記照度比を測定するようにする。
In order to solve the above-mentioned problems, the illuminance ratio between the incident light and the emitted light of an optical component such as a reflecting mirror or a lens in the light source device, or the emitted light of a lamp constituting the above-mentioned light source. And the illuminance ratio of the light emitted from the ellipsoidal mirror is measured, and an alarm is generated when the measured illuminance ratio is out of the allowable range. Also, the allowable range value of the illuminance ratio and the current change value of the illuminance ratio or the measured illuminance ratio are displayed. Further, the illuminance sensor is put in and taken out of the optical path of the light source device to measure the illuminance ratio.

【0007】[0007]

【作用】上記照度比の測定では光学部品の入射光と出射
光の比が求まるので、照度センサの絶対感度の影響が除
去される。したがって、照度センサの絶対感度の経時変
動の影響が緩和される。または、上記警報、または上記
照度比の許容範囲と現在の照度比または測定された照度
比の経時変化値の表示により、光源装置の使用者に光源
装置の保守、清掃、交換時期等を通知する。また、上記
照度センサの移動手段は、照度比の測定時には照度セン
サを光学部品の入射光内および出射光内に挿入し、照度
比の非測定時には上記光路内から引き出すように移動す
る。
In the measurement of the illuminance ratio, the ratio between the incident light and the emitted light of the optical component is obtained, so that the influence of the absolute sensitivity of the illuminance sensor is eliminated. Therefore, the influence of the temporal change of the absolute sensitivity of the illuminance sensor is mitigated. Alternatively, the user of the light source device is notified of the maintenance, cleaning, replacement time, etc. of the light source device by displaying the above-mentioned alarm or the allowable range of the illuminance ratio and the time-dependent change value of the current illuminance ratio or the measured illuminance ratio. . Further, the moving means of the illuminance sensor inserts the illuminance sensor into the incident light and the emitted light of the optical component when measuring the illuminance ratio, and moves so as to pull out from the optical path when the illuminance ratio is not measured.

【0008】[0008]

【実施例】図1は本発明による光源装置を備えたステッ
パの露光光学系の基本的構成図である。水銀灯(一次光
源)1の光は楕円面鏡2により集光され、その第2焦点
近傍に設けたレンズ3によりほぼ平行光にされる。この
平行光はフィルタ4を透過後、原画面8を均一に照射す
るためのフライアイレンズ5を通り、さらに可干渉性を
決定するアパーチャ6を通過後、レンズ7を介しコリメ
ーションレンズ9に入射される。コリメーションレンズ
9は縮小投影レンズ10の入射瞳にフライアイ像(二次
光源像)を結像させる。20、21は光路を曲げるため
の平面鏡である。なお、上記光源装置の内部に原画パタ
ーンの露光領域を制限するマスキングブレードの結像光
学系を設ける場合もある。また、上記各光学部品には透
過率、反射率を改善するための蒸着が施されている。
FIG. 1 is a basic block diagram of an exposure optical system of a stepper equipped with a light source device according to the present invention. The light from the mercury lamp (primary light source) 1 is condensed by the ellipsoidal mirror 2 and made into substantially parallel light by the lens 3 provided near the second focal point. After passing through the filter 4, the parallel light passes through the fly-eye lens 5 for uniformly illuminating the original screen 8, and further passes through the aperture 6 that determines the coherence, and then enters the collimation lens 9 through the lens 7. It The collimation lens 9 forms a fly-eye image (secondary light source image) on the entrance pupil of the reduction projection lens 10. Reference numerals 20 and 21 are plane mirrors for bending the optical path. An imaging optical system of a masking blade for limiting the exposure area of the original image pattern may be provided inside the light source device. Further, each of the above optical components is vapor-deposited to improve the transmittance and the reflectance.

【0009】本発明では、上記レンズや平面鏡等の光学
部品の入射光側と出射光側の照度を測定してその照度比
を求め、経時劣化等によりこの照度比が所定の範囲を逸
脱した場合に警報を発生し、また、上記照度比の経時特
性を上記所定の範囲と合わせて表示するようにして、使
用者が当該光学部品を適切に点検、清掃、交換できるよ
うにする。
In the present invention, when the illuminance ratio between the incident light side and the outgoing light side of the optical component such as the lens or the plane mirror is measured to obtain the illuminance ratio, and the illuminance ratio deviates from a predetermined range due to deterioration with time or the like. A warning is generated, and the temporal characteristics of the illuminance ratio are displayed together with the predetermined range so that the user can properly inspect, clean and replace the optical component.

【0010】また、図1に示すように、上記光学部品が
水銀灯1と楕円面鏡2で構成される光源の場合には、水
銀灯1の水平放射照度と楕円面鏡2の集光光の照度を測
定してその比を上記照度比とする。上記照度比の測定に
おいては照度センサの絶対感度やその経時変動が問題と
ならないので、照度センサの性能管理が容易という利点
が得られる。
Further, as shown in FIG. 1, when the optical component is a light source composed of a mercury lamp 1 and an ellipsoidal mirror 2, the horizontal irradiance of the mercury lamp 1 and the illuminance of condensed light of the ellipsoidal mirror 2. Is measured and the ratio is defined as the illuminance ratio. In the measurement of the illuminance ratio, the absolute sensitivity of the illuminance sensor and its variation with time do not pose a problem, so that there is an advantage that the performance management of the illuminance sensor is easy.

【0011】本発明では光源装置の組立、調整が完了し
た時点の上記照度比を初期値として記憶し、その後の照
度比が当該光学部品の特性変化の許容範囲を超えた場合
に警報を発生し、また、CRT、プリンタ等に表示させ
るようにする。
In the present invention, the illuminance ratio at the time of completion of assembly and adjustment of the light source device is stored as an initial value, and an alarm is generated when the illuminance ratio thereafter exceeds the allowable range of the characteristic change of the optical component. Also, it is displayed on a CRT, a printer, or the like.

【0012】初期における当該光学部品の介在前の照度
をA,介在後の照度をBとするとその照度比Cは、 C
=B/A である。同様に特性変化後の照度比をC’と
すると、照度比の変化量DはD=C/C’で表せる。本
発明ではこのDの値が許容値以下になったときに警報ま
たはメッセージを表示する。例えば、Cの初期値を10
0とし、C’が95以下になったとき、すなわち、D≧
1.05となったときに清掃、交換を喚起するメッセー
ジをCRT上に表示する。また、このDの許容値は個々
の光源装置、光学部品毎に決定する。
When the illuminance before the intervention of the optical component is A and the illuminance after the intervention is B in the initial stage, the illuminance ratio C is C
= B / A. Similarly, when the illuminance ratio after the characteristic change is C ′, the change amount D of the illuminance ratio can be expressed by D = C / C ′. In the present invention, an alarm or message is displayed when the value of D becomes less than the allowable value. For example, the initial value of C is 10
0 and when C ′ is 95 or less, that is, D ≧
When 1.05 is reached, a message prompting cleaning and replacement is displayed on the CRT. The allowable value of D is determined for each light source device and optical component.

【0012】また、上記Dは一般に徐々に変化するが、
途中で急激に変化する場合も考えられるので、上記Dの
値を定期的に記録してその変化率が所定値を超えた場合
に警報またはメッセージを表示するようにすることもで
きる。また、Dの値とその変化率の双方を監視してメッ
セージを発するようにしてもよい。
Further, although D generally changes gradually,
Since it is possible that the value changes abruptly on the way, the value of D may be recorded periodically and an alarm or a message may be displayed when the rate of change exceeds a predetermined value. Alternatively, the message may be issued by monitoring both the value of D and the rate of change thereof.

【0013】図1において、楕円面鏡2の中央部には水
銀灯1の水平放射照度を測定するための小孔2aを設
け、光ファイバー16により水銀灯1の光を照度センサ
11に導くようにする。照度センサ11の出力はアンプ
17により増幅後A/D変換され、CPU18に記憶さ
れる。また、楕円面鏡2からの反射光を測定するときに
は照度センサ11を上記光ファイバー16の出射位置よ
り楕円面鏡2の反射光位置に移動する。
In FIG. 1, a small hole 2a for measuring the horizontal irradiance of the mercury lamp 1 is provided in the center of the ellipsoidal mirror 2 and an optical fiber 16 guides the light of the mercury lamp 1 to the illuminance sensor 11. The output of the illuminance sensor 11 is amplified and A / D converted by the amplifier 17, and stored in the CPU 18. When measuring the reflected light from the ellipsoidal mirror 2, the illuminance sensor 11 is moved from the emission position of the optical fiber 16 to the reflected light position of the ellipsoidal mirror 2.

【0014】図2は上記放射照度比の測定機構図であ
る。水銀灯1の放射照度を測定する場合には、リニアア
クチュエータ12によりガイド13の先端部に取り付け
た照度センサ11を水銀灯1の光軸と直交する方向に移
動して水銀灯1の光路中に進入させ、楕円面鏡2の放射
照度を測定する場合には、リニアアクチュエータ12に
より照度センサ11を楕円面鏡2の光軸方向に移動して
その放射照度を測定する。なお、水銀灯1の位置は原画
面上の照度が高く、対称な均一度が得られるようにステ
ージにより予めX、Y、Z方向に位置調整される。
FIG. 2 is a diagram showing the mechanism for measuring the irradiance ratio. When measuring the irradiance of the mercury lamp 1, the illuminance sensor 11 attached to the tip of the guide 13 by the linear actuator 12 is moved in the direction orthogonal to the optical axis of the mercury lamp 1 to enter the optical path of the mercury lamp 1, When measuring the irradiance of the ellipsoidal mirror 2, the illuminance sensor 11 is moved by the linear actuator 12 in the optical axis direction of the ellipsoidal mirror 2 to measure the irradiance. The position of the mercury lamp 1 is adjusted in advance in the X, Y, and Z directions by the stage so that the illuminance on the original screen is high and symmetrical uniformity is obtained.

【0015】照度センサ11はリニアアクチュエータ1
2の先端部に取り付けられ、光電変換素子11aと測定
波長を透過するフィルタ11bにより構成されている。
リニアアクチュエータ12は照度比測定時に照度センサ
11を露光光学系の光軸に対して直交する方向に移動し
て光路中に進入させる。リニアアクチュエータ12は台
車14に取り付けられ光軸と平行に設置された一対のガ
イド13に取り付けられている。ガイド13上の台車1
4は駆動源14cの回転をベルト14bにより4個の車
輪14aのうちの2個の車軸にに伝達し移動する。
The illuminance sensor 11 is a linear actuator 1.
The photoelectric conversion element 11a is attached to the tip of the second electrode, and is composed of a filter 11b that transmits the measurement wavelength.
The linear actuator 12 moves the illuminance sensor 11 in the direction orthogonal to the optical axis of the exposure optical system to enter the optical path when measuring the illuminance ratio. The linear actuator 12 is mounted on a carriage 14 and is mounted on a pair of guides 13 installed parallel to the optical axis. Truck 1 on the guide 13
Reference numeral 4 transmits the rotation of the drive source 14c to two axles of the four wheels 14a by means of the belt 14b and moves.

【0016】フォトインタラプタ15は台車14の移動
量を検出し、台車14を所定の位置に停止させる。ま
た、フォトインタラプタ15は台車14の位置をコ−ド
化して検出するようにしてもよい。
The photo interrupter 15 detects the movement amount of the carriage 14 and stops the carriage 14 at a predetermined position. The photo interrupter 15 may detect the position of the carriage 14 by coding it.

【0017】[0017]

【発明の効果】本発明により、照度センサの絶対感度の
変動の影響を受けずに光学部品の性能を測定することの
できる光源装置を提供することができる。また、上記光
学部品の性能値を表示することにより光学部品の清掃、
交換時期等を装置使用者に通知することができる。ま
た、上記光源装置を用いて光学部品のメインテナンス性
を向上したステッパ等の半導体製造装置を提供すること
ができる。
According to the present invention, it is possible to provide a light source device capable of measuring the performance of an optical component without being affected by the fluctuation of the absolute sensitivity of the illuminance sensor. Also, by displaying the performance values of the optical components, cleaning of the optical components,
It is possible to notify the device user of the replacement time and the like. Further, it is possible to provide a semiconductor manufacturing apparatus such as a stepper in which the maintainability of optical components is improved by using the above light source device.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明による光源装置の構成図出ある。FIG. 1 is a block diagram of a light source device according to the present invention.

【図2】図1における照度センサの移動機構の部分図で
ある。
FIG. 2 is a partial view of a moving mechanism of the illuminance sensor in FIG.

【符号の説明】[Explanation of symbols]

1…水銀灯、2…楕円面鏡、3、7…レンズ、4…フィ
ルタ、5…フライアイレンズ、9…コリメーションレン
ズ、11…照度センサ、12…リニアアクチュエータ、
13…ガイド。
1 ... Mercury lamp, 2 ... Ellipsoidal mirror, 3, 7 ... Lens, 4 ... Filter, 5 ... Fly eye lens, 9 ... Collimation lens, 11 ... Illuminance sensor, 12 ... Linear actuator,
13 ... Guide.

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 光源の出射光を反射鏡やレンズ等の光学
部品により導いて利用する光源装置において、上記光学
部品の入射光と出射光の照度比を測定する手段を備えた
ことを特徴とする光源装置。
1. A light source device for guiding and utilizing emitted light of a light source by an optical component such as a reflecting mirror or a lens, comprising means for measuring an illuminance ratio of incident light and emitted light of the optical component. Light source device.
【請求項2】 光源の出射光を反射鏡やレンズ等の光学
部品により導いて利用する光源装置において、上記光源
をランプと楕円面鏡で構成し、上記ランプの出射光と楕
円面鏡の出射光の照度比を測定する手段を備えたことを
特徴とする光源装置。
2. In a light source device which uses the light emitted from a light source by guiding it through optical parts such as a reflecting mirror and a lens, the light source is composed of a lamp and an ellipsoidal mirror, and the light emitted from the lamp and the ellipsoidal mirror are emitted. A light source device comprising means for measuring the illuminance ratio of the emitted light.
【請求項3】 請求項1または2において、上記照度比
の測定手段の少なくとも照度センサを上記光源装置の光
路内に出し入れする移動手段を備えたことを特徴とする
光源装置。
3. The light source device according to claim 1, further comprising moving means for moving at least an illuminance sensor of the illuminance ratio measuring means into and out of an optical path of the light source device.
【請求項4】 請求項1ないし3のいずれかにおいて、
上記照度比の許容範囲値を記憶するメモリと、上記測定
された照度比が上記照度比の許容範囲を外れた場合に警
報を発生する手段を備えたことを特徴とする光源装置。
4. The method according to any one of claims 1 to 3,
A light source device comprising: a memory that stores an allowable range value of the illuminance ratio; and a unit that issues an alarm when the measured illuminance ratio is outside the allowable range of the illuminance ratio.
【請求項5】 請求項4において、上記照度比の許容範
囲値と現在の照度比または測定された照度比の経時変化
値を表示する手段を備えたことを特徴とする光源装置。
5. The light source device according to claim 4, further comprising means for displaying an allowable range value of the illuminance ratio and a current illuminance ratio or a temporal change value of the measured illuminance ratio.
JP5143171A 1993-06-15 1993-06-15 Light source device Pending JPH07142319A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5143171A JPH07142319A (en) 1993-06-15 1993-06-15 Light source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5143171A JPH07142319A (en) 1993-06-15 1993-06-15 Light source device

Publications (1)

Publication Number Publication Date
JPH07142319A true JPH07142319A (en) 1995-06-02

Family

ID=15332571

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5143171A Pending JPH07142319A (en) 1993-06-15 1993-06-15 Light source device

Country Status (1)

Country Link
JP (1) JPH07142319A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999027568A1 (en) * 1997-11-21 1999-06-03 Nikon Corporation Projection aligner and projection exposure method
WO2020012744A1 (en) * 2018-07-11 2020-01-16 株式会社島津製作所 Light emission analysis device and maintenance method for same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999027568A1 (en) * 1997-11-21 1999-06-03 Nikon Corporation Projection aligner and projection exposure method
US6496257B1 (en) 1997-11-21 2002-12-17 Nikon Corporation Projection exposure apparatus and method
US7061575B2 (en) 1997-11-21 2006-06-13 Nikon Corporation Projection exposure apparatus and method
WO2020012744A1 (en) * 2018-07-11 2020-01-16 株式会社島津製作所 Light emission analysis device and maintenance method for same
JPWO2020012744A1 (en) * 2018-07-11 2021-04-30 株式会社島津製作所 Luminescent analyzer and its maintenance method

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