JPH0712890A - Socket for testing semiconductor integrated circuit - Google Patents

Socket for testing semiconductor integrated circuit

Info

Publication number
JPH0712890A
JPH0712890A JP5151811A JP15181193A JPH0712890A JP H0712890 A JPH0712890 A JP H0712890A JP 5151811 A JP5151811 A JP 5151811A JP 15181193 A JP15181193 A JP 15181193A JP H0712890 A JPH0712890 A JP H0712890A
Authority
JP
Japan
Prior art keywords
integrated circuit
semiconductor integrated
electrode
under test
cap
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5151811A
Other languages
Japanese (ja)
Other versions
JP2526489B2 (en
Inventor
Toshihide Suzuki
俊秀 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp filed Critical NEC Corp
Priority to JP5151811A priority Critical patent/JP2526489B2/en
Publication of JPH0712890A publication Critical patent/JPH0712890A/en
Application granted granted Critical
Publication of JP2526489B2 publication Critical patent/JP2526489B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Testing Of Individual Semiconductor Devices (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)

Abstract

PURPOSE:To facilitate electrical connection work between a semiconductor integrated circuit under test and a tester. CONSTITUTION:A semiconductor integrated circuit 8 under test is set with the electrodes 9 directing upward. A cap 12 is applied to the integrated circuit 8 and the position of the electrodes 9 is confirmed through the cap 12 before the contacts 4 on the cap 12 are superposed on the electrodes 9. Since the position of the electrode 9 can be confirmed, accuracy is enhanced in the alignment of the electrodes 9 and the contacts 4.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、半導体チップやFTC
(Flipped TAB Carrier)等の半導
体集積回路と試験装置とを電気的に接続するソケットに
関する。
BACKGROUND OF THE INVENTION The present invention relates to a semiconductor chip and FTC.
The present invention relates to a socket for electrically connecting a semiconductor integrated circuit such as (Flipped TAB Carrier) and a test device.

【0002】[0002]

【従来の技術】この種の半導体集積回路についてバーン
イン等の試験を行うにあたっては、ソケットが用いられ
る。
2. Description of the Related Art Sockets are used for conducting tests such as burn-in on semiconductor integrated circuits of this type.

【0003】従来のソケットでは図2に示すように、ポ
ゴピン11は、BT基板10及びソケット基体1を貫通
して、上向きに突き出してあるため、被試験半導体集積
回路(Device Under Test,以下DU
Tという)8の電極9を下方に向けて、DUT8をソケ
ットにセットし、DUT8の電極9とポゴピン11とを
1対1で突き合わせた後、ヒートシンク6を介してDU
T8の上面をフック7により圧下していた。
In the conventional socket, as shown in FIG. 2, the pogo pin 11 penetrates the BT substrate 10 and the socket base 1 and projects upward, so that a semiconductor integrated circuit under test (Device Under Test, hereinafter referred to as DU) is used.
The DUT 8 is set in a socket with the electrode 9 of 8) directed downward, and the electrode 9 of the DUT 8 and the pogo pin 11 are butted against each other in a one-to-one correspondence, and then the DU is inserted through the heat sink 6.
The upper surface of T8 was pressed down by hook 7.

【0004】[0004]

【発明が解決しようとする課題】図2に示すポゴピンを
用いて電気的に接続する方法では、ポゴピン11は、あ
る程度の強度を維持するため、500μmφ程度の直径
をもつ必要があり、しかも、ポゴピンは、基板に貫通さ
せて固定するため、ポゴピン間の間隔は加工上、少なく
とも250μmは必要であり、試験されるFTCの電極
間距離が250μm以下である場合には、FTCと試験
装置とを電気的に接続することができなかった。
In the method of electrically connecting using the pogo pin shown in FIG. 2, the pogo pin 11 needs to have a diameter of about 500 μmφ in order to maintain a certain degree of strength. Requires a distance of at least 250 μm between the pogo pins in order to fix it by penetrating the substrate. If the distance between the electrodes of the FTC to be tested is 250 μm or less, the FTC and the test equipment are electrically Couldn't connect successfully.

【0005】また、図2に示すソケットでは、DUT8
の電極9とポゴピン11との位置関係を目視して、位置
合わせを行うことができないため、その位置合わせに細
心の注意が必要であり、DUT8の電極9とポゴピン1
1との位置合わせ作業には、熟練を要していた。
Further, in the socket shown in FIG. 2, the DUT8
Since it is impossible to perform the alignment by visually observing the positional relationship between the electrode 9 of the DUT 8 and the pogo pin 11, the alignment of the electrode 9 of the DUT 8 and the pogo pin 1 is required.
Skilledness was required for the alignment work with 1.

【0006】従来のソケットにおいて、DUT8の電極
9とポゴピン11との位置合わせを目視により行う方法
としては、ソケット基体1とBT基板10とを透明な素
材にて構成することが考えられる(例えば、特開昭60
−10735号公報参照)。しかしながら、この場合、
ポゴピン11は、上向きに突き出しているため、DUT
8の電極9を下方に向けて電極9とポゴピン11との位
置合わせが行われるため、ヒートシンク6の上方から見
下ろして位置合わせをすることが不可能であり、その位
置合わせは、BT基板10の下方から上方を見上げて行
わなければならず、目視は無理な姿勢で行うこととな
り、位置合わせ作業が厄介である。これを解決するに
は、何らかの技術的手段を講じる必要がある。
In the conventional socket, as a method for visually aligning the electrode 9 of the DUT 8 and the pogo pin 11, it is conceivable to form the socket base 1 and the BT substrate 10 with transparent materials (for example, JP-A-60
-10735 gazette). However, in this case
Since the pogo pin 11 protrudes upward, the DUT
Since the electrode 9 and the pogo pin 11 are aligned with the electrode 9 of 8 facing downward, it is impossible to perform the alignment by looking down from above the heat sink 6, and the alignment is performed on the BT substrate 10. Since it is necessary to look up from the lower side to the upper side, it is necessary to perform the visual inspection in an unnatural posture, which makes the alignment work difficult. To solve this, some technical means must be taken.

【0007】また、図2に示すソケットでは、DUT8
を圧下して、下面電極9をポゴピン11に突き当てるた
め、下面電極9の高さ位置がμmオーダで均一でない
と、電極9とポゴピン11とを接触させることができな
くなり、そのため、電極9の高さをμmオーダで管理す
る必要がある。
Further, in the socket shown in FIG. 2, the DUT8
Since the lower surface electrode 9 is abutted against the pogo pin 11 by pressing down, if the height position of the lower surface electrode 9 is not uniform on the order of μm, the electrode 9 and the pogo pin 11 cannot be brought into contact with each other. It is necessary to manage the height on the order of μm.

【0008】本発明の目的は、DUTの電極とソケット
の電極端子との位置合わせを楽な姿勢で目視して行うよ
うにした半導体集積回路ソケットを提供することにあ
る。
It is an object of the present invention to provide a semiconductor integrated circuit socket in which the electrodes of the DUT and the electrode terminals of the socket are visually aligned in a comfortable posture.

【0009】[0009]

【課題を解決するための手段】前記目的を達成するた
め、本発明に係る半導体集積回路ソケットは、キャップ
を有し、被試験半導体集積回路の電極と試験装置とを電
気的に接続する半導体集積回路試験用ソケットであっ
て、被試験半導体集積回路は、試験を行う際に、電極が
上方を向いた姿勢に保持されるものであり、キャップ
は、被試験半導体集積回路の上方から電極を覆うもので
あり、覆板と電極部とを有し、覆板は、被試験半導体集
積回路の電極を透視し得る透明の耐熱性絶縁材であり、
キャップの電極部は、高さズレ吸収体と接点とを有し、
高さズレ吸収体は、被試験半導体集積回路の電極を透視
し得る圧縮変形可能な透明の耐熱性絶縁材であり、覆板
の下面に取付けられ、接点は、高さズレ吸収体の下面
に、被試験半導体集積回路の電極と向き合わせに設けら
れ、該被試験半導体集積回路の電極の高さ位置に応じて
高さズレ吸収体を圧縮変形させ、上下に変位して被試験
半導体集積回路の電極に接触するものである。
To achieve the above object, a semiconductor integrated circuit socket according to the present invention has a cap, and a semiconductor integrated circuit for electrically connecting an electrode of a semiconductor integrated circuit under test and a test apparatus. A circuit test socket, wherein a semiconductor integrated circuit under test is held in a posture in which an electrode faces upward when performing a test, and a cap covers the electrode from above the semiconductor integrated circuit under test. It has a cover plate and an electrode portion, the cover plate is a transparent heat-resistant insulating material through which the electrodes of the semiconductor integrated circuit under test can be seen through,
The electrode portion of the cap has a height deviation absorber and a contact,
The height deviation absorber is a compressible and deformable transparent heat-resistant insulating material that allows the electrodes of the semiconductor integrated circuit under test to be seen through. , The semiconductor integrated circuit to be tested is provided so as to face the electrodes of the semiconductor integrated circuit to be tested, and the height deviation absorber is compressed and deformed according to the height position of the electrode of the semiconductor integrated circuit to be tested and vertically displaced. It comes into contact with the electrode.

【0010】また、キャップの接点は、バンプを有する
ものである。
The contacts of the cap have bumps.

【0011】また、ヒートシンクを有し、該ヒートシン
クは、被試験半導体集積回路が発する熱を拡散するもの
であり、上端面に、被試験半導体集積回路を受け入れて
支える支持部を有するものである。
Further, it has a heat sink, which diffuses heat generated by the semiconductor integrated circuit under test, and has a support portion for receiving and supporting the semiconductor integrated circuit under test on its upper end surface.

【0012】[0012]

【作用】被試験半導体集積回路は、試験を行う際に、電
極が上方を向いた姿勢に保持する。そして、被試験半導
体集積回路を上方から透明なキャップで覆い、被試験半
導体集積回路の電極とキャップの接点とを透明なキャッ
プを介して上方から見下ろした姿勢で位置合わせする。
The semiconductor integrated circuit under test holds the electrode in a posture in which the electrode faces upward during the test. Then, the semiconductor integrated circuit under test is covered with a transparent cap from above, and the electrodes of the semiconductor integrated circuit under test and the contacts of the cap are aligned in a posture looking down from above through the transparent cap.

【0013】[0013]

【実施例】以下、本発明の一実施例を図により説明す
る。図1は、本発明の一実施例を示す断面図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a sectional view showing an embodiment of the present invention.

【0014】図1において、BT基板10の中央部に開
口10aを設け、開口10a内にヒートシンク6を嵌合
保持する。ヒートシンク6は、BT基板10より上方に
突き出た上端面に、DUT8を受け入れる溝部6aが設
けられている。また、BT基板10の上面には、ヒート
シンク6を取り囲んでソケット基体1が取付けられ、ソ
ケット基体1には、キャップ12を圧下するフック7が
起倒可能に取付けられている。DUT8は、上下を反転
させて、その上面がヒートシンク6の溝部8に支えら
れ、下面の電極9が上方を向いて保持される。
In FIG. 1, an opening 10a is provided in the central portion of a BT substrate 10, and a heat sink 6 is fitted and held in the opening 10a. The heat sink 6 is provided with a groove portion 6 a for receiving the DUT 8 on the upper end surface protruding above the BT substrate 10. Further, the socket base 1 is attached to the upper surface of the BT substrate 10 so as to surround the heat sink 6, and the hook 7 for pressing down the cap 12 is attached to the socket base 1 so as to be able to rise and fall. The DUT 8 is turned upside down, its upper surface is supported by the groove portion 8 of the heat sink 6, and the electrode 9 on the lower surface is held facing upward.

【0015】キャップ12は、覆板2と電極部とを有し
ている。覆板2は、DUT8の電極9を透視し得る透明
の耐熱性絶縁材である。電極部は、高さズレ吸収体3と
接点4と給電接点4’とを備えている。高さズレ吸収体
3は、DUTの電極を透視し得る圧縮変形可能な透明の
耐熱性絶縁材であり、覆板2の下面に取付けられてい
る。接点4は、高さズレ吸収体3の下面に、DUT8の
電極9と向き合わせて設けられ、DUT8の電極9の高
さ位置に応じて高さズレ吸収体3を圧縮変形させ、上下
に変位してDUT8の電極9と接触するようになってい
る。尚、高さズレ吸収体3の内部には、接点4を図示し
ない試験装置に接続するための透明な導体配線が施して
ある。
The cap 12 has a cover plate 2 and an electrode portion. The cover plate 2 is a transparent heat-resistant insulating material through which the electrodes 9 of the DUT 8 can be seen. The electrode portion includes a height deviation absorber 3, a contact 4, and a power feeding contact 4 '. The height deviation absorber 3 is a transparent heat-resistant insulating material that can be compressed and deformed so that the electrodes of the DUT can be seen through, and is attached to the lower surface of the cover plate 2. The contact point 4 is provided on the lower surface of the height deviation absorber 3 so as to face the electrode 9 of the DUT 8, and the height deviation absorber 3 is compressed and deformed according to the height position of the electrode 9 of the DUT 8 to be vertically displaced. Then, it comes into contact with the electrode 9 of the DUT 8. Inside the height deviation absorber 3, a transparent conductor wiring for connecting the contact 4 to a test device (not shown) is provided.

【0016】また、給電接点4’は、高さズレ吸収体3
の外周縁側の下面に、ソケット基体1の給電端子5と向
き合わせに設けられている。本実施例では、接点4,
4’は、メタライズ層をパターニングした導体パターン
で構成してあるが、これらの接点4,4’は図1に示す
ようにバンプを有するようにしてもよい。接点4,4’
にバンプを有することにより、DUT8が半導体チップ
の場合にも、接点4を半導体チップの電極にバンプを介
して接触させることができる。
Further, the power feeding contact 4'is provided with the height deviation absorber 3
Is provided on the lower surface on the outer peripheral edge side of the socket so as to face the power supply terminal 5 of the socket base 1. In this embodiment, the contacts 4,
Although 4'is composed of a conductor pattern obtained by patterning a metallized layer, these contacts 4, 4'may have bumps as shown in FIG. Contact points 4, 4 '
By providing the bumps on the contacts, the contacts 4 can be brought into contact with the electrodes of the semiconductor chip via the bumps even when the DUT 8 is a semiconductor chip.

【0017】実施例において、DUT8と図示しない試
験装置とをソケットにより電気的に接続するには、ま
ず、DUT8の表裏面を反転させ、DUT8の裏面側の
電極9を上方に向けてDUT8をヒートシンク6の溝部
6a内に差込み、DUT8の表面側をヒートシンク6で
支持する。
In the embodiment, in order to electrically connect the DUT 8 and a test device (not shown) by sockets, first, the front and back surfaces of the DUT 8 are reversed, and the electrode 9 on the back surface side of the DUT 8 is directed upward, and the DUT 8 is heat-sinked. The heat sink 6 supports the surface side of the DUT 8 by inserting the heat sink 6 into the groove 6 a of the DUT 6.

【0018】次に、キャップ12をDUT8に覆せる。
そして、覆板2及び高さズレ吸収体3を通して見下ろし
た姿勢で、キャップ12の接点4,4’とDUT8の電
極9,給電端子5とを位置合わせする。キャップ12
は、接点4,4’を除いた領域が透明であるため、接点
4,4’がDUT8の電極9,給電端子5に対してズレ
ている場合には、そのズレ量及びズレの方向が容易に把
握され、キャップ12を水平方向に移動させてDUT8
の接点4,4’をDUT8の電極9,給電端子5に目視
により重ね合わせる。
Next, the cap 12 is covered with the DUT 8.
Then, the contacts 4, 4 ′ of the cap 12, the electrode 9 of the DUT 8 and the power supply terminal 5 are aligned with each other in a posture looking down through the cover plate 2 and the height deviation absorber 3. Cap 12
Since the area excluding the contacts 4 and 4'is transparent, when the contacts 4 and 4'are misaligned with respect to the electrode 9 of the DUT 8 and the power supply terminal 5, the misalignment amount and the direction of the misalignment are easy. The cap 12 is moved horizontally and the DUT 8
The contacts 4 and 4'of the above are visually overlapped with the electrode 9 and the power supply terminal 5 of the DUT 8.

【0019】次に、フック7をキャップ12の外周縁に
掛止し、キャップ12をフック7で圧下する。キャップ
12の接点4,4’は、圧縮変形する高さズレ吸収体3
の下面に支持されているから、接点4,4’は、電極
9,給電端子5の高さ方向のズレに応じて高さズレ吸収
体3を圧縮変形して上下に変位し、全ての接点4,4’
と電極9,給電端子5との間は確実に電気的に接続され
ることとなる。
Next, the hook 7 is hooked on the outer peripheral edge of the cap 12, and the cap 12 is pressed down by the hook 7. The contact points 4, 4 ′ of the cap 12 are the height deviation absorber 3 that is compressed and deformed.
Since the contacts 4 and 4'are supported on the lower surface of the electrode 4, the height deviation absorber 3 is compressed and deformed in accordance with the height deviation of the electrode 9 and the power supply terminal 5, and the contacts 4 and 4'are displaced up and down. 4,4 '
The electrode 9, and the power supply terminal 5 are reliably electrically connected.

【0020】本発明に係るソケットの製造方法の一例を
説明する。まず、覆板2として、耐熱性をもつ透明な絶
縁板、例えば石英ガラスを用い、この石英ガラス2の一
面上に高さズレ吸収体3を形成する。高さズレ吸収体3
としては、耐熱性及び圧縮変形性をもつ透明の絶縁材、
例えばシリコンゴム或いはポリイミド膜を用い、これを
石英ガラス2の一面に貼付ける、或いはスピンコート等
により積層形成する。この高さズレ吸収体3は、単層又
は多層構造であってもよい。
An example of the socket manufacturing method according to the present invention will be described. First, a transparent insulating plate having heat resistance, for example, quartz glass is used as the cover plate 2, and the height deviation absorber 3 is formed on one surface of the quartz glass 2. Height gap absorber 3
As a transparent insulating material having heat resistance and compressive deformation,
For example, silicon rubber or a polyimide film is used, and this is attached to one surface of the quartz glass 2 or laminated by spin coating or the like. The height deviation absorber 3 may have a single-layer or multi-layer structure.

【0021】その後、高さズレ吸収体3の表面にアルミ
や金等のメタライズ層をスパッタ,蒸着、或いはメッキ
等により形成する。その形成されたメタライズ層をDU
T8の電極9と一致させてパターニングし、これを接点
4,4’とする。
Thereafter, a metallized layer of aluminum, gold or the like is formed on the surface of the height deviation absorber 3 by sputtering, vapor deposition, plating or the like. The formed metallized layer is DU
Patterning is performed so as to match the electrode 9 of T8, and this is used as contacts 4 and 4 '.

【0022】[0022]

【発明の効果】以上説明したように本発明によれば、被
試験半導体集積回路は、電極が上方を向いた姿勢に保持
され、透明なキャップを被試験半導体集積回路に覆せ、
キャップを通して電極の位置合わせを行うため、キャッ
プ上から半導体集積回路の電極位置が確認でき、電極の
位置合わせを容易に行うことができるばかりでなく、電
極の位置合わせを楽な姿勢で行うことができる。さら
に、キャップの接点は、高さズレ吸収体の板面にスパッ
タ,蒸着等の手段により形成することができ、従来のよ
うにポゴピンを用いる必要がないため、接点間の距離を
100μm程度或いはそれ以下になっても、電気的接続
を行うことができる。
As described above, according to the present invention, the semiconductor integrated circuit under test is held in a posture in which the electrodes are directed upward, and the transparent cap is covered with the semiconductor integrated circuit under test.
Since the electrode is aligned through the cap, the electrode position of the semiconductor integrated circuit can be confirmed from the top of the cap, and not only the electrode can be easily aligned, but also the electrode can be aligned in a comfortable posture. it can. Further, the contacts of the cap can be formed on the plate surface of the height deviation absorber by means such as sputtering and vapor deposition, and since it is not necessary to use pogo pins as in the conventional case, the distance between the contacts is about 100 μm or less. Electrical connection can be made even in the following cases.

【0023】さらに、キャップの接点にバンプを有する
ため、未製品化レベルの半導体チップの電極をバンプを
利用して試験装置に電気的に接続することができ、未製
品化レベルでのバーンイン試験を行うことができる。
Further, since the contact point of the cap has the bump, the electrode of the semiconductor chip of the unmanufactured level can be electrically connected to the test apparatus by using the bump, and the burn-in test at the unmanufactured level can be performed. It can be carried out.

【0024】また、ヒートシンクは、被試験半導体集積
回路の発する熱を拡散する機能に加えて、半導体集積回
路を支持する機能を併せ持つため、半導体集積回路の別
途支持機構が不要となり、構造を簡素化することができ
る。
Further, since the heat sink has a function of supporting the semiconductor integrated circuit in addition to the function of diffusing the heat generated by the semiconductor integrated circuit under test, a separate supporting mechanism for the semiconductor integrated circuit is not required and the structure is simplified. can do.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の一実施例を示す断面図である。FIG. 1 is a sectional view showing an embodiment of the present invention.

【図2】従来例を示す断面図である。FIG. 2 is a sectional view showing a conventional example.

【符号の説明】 1 ソケット基体 2 覆板 3 高さズレ吸収体 4,4’ キャップの接点 5 給電端子 6 ヒートシンク 6a ヒートシンクの溝部 7 フック 8 DUT 9 DUTの電極 10 BT基板 12 キャップ[Explanation of reference numerals] 1 socket base 2 cover plate 3 height deviation absorber 4, 4'cap contact 5 power supply terminal 6 heat sink 6a heat sink groove 7 hook 8 DUT 9 DUT electrode 10 BT substrate 12 cap

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 キャップを有し、被試験半導体集積回路
の電極と試験装置とを電気的に接続する半導体集積回路
試験用ソケットであって、 被試験半導体集積回路は、試験を行う際に、電極が上方
を向いた姿勢に保持されるものであり、 キャップは、被試験半導体集積回路の上方から電極を覆
うものであり、覆板と電極部とを有し、 覆板は、被試験半導体集積回路の電極を透視し得る透明
の耐熱性絶縁材であり、 キャップの電極部は、高さズレ吸収体と接点とを有し、 高さズレ吸収体は、被試験半導体集積回路の電極を透視
し得る圧縮変形可能な透明の耐熱性絶縁材であり、覆板
の下面に取付けられ、 接点は、高さズレ吸収体の下面に、被試験半導体集積回
路の電極と向き合わせに設けられ、該被試験半導体集積
回路の電極の高さ位置に応じて高さズレ吸収体を圧縮変
形させ、上下に変位して被試験半導体集積回路の電極に
接触するものであることを特徴とする半導体集積回路試
験用ソケット。
1. A semiconductor integrated circuit test socket, which has a cap and electrically connects an electrode of a semiconductor integrated circuit under test and a test device, wherein the semiconductor integrated circuit under test is: The electrode is held in a posture facing upward, the cap covers the electrode from above the semiconductor integrated circuit under test, and has a cover plate and an electrode portion, and the cover plate is the semiconductor under test. It is a transparent heat-resistant insulating material that allows the electrodes of the integrated circuit to be seen through.The electrode part of the cap has a height deviation absorber and contacts, and the height deviation absorber is the electrode of the semiconductor integrated circuit under test. It is a transparent heat-resistant insulating material that is compressible and deformable to be seen through, and is attached to the lower surface of the cover plate. Depending on the height position of the electrode of the semiconductor integrated circuit under test A semiconductor integrated circuit test socket, characterized in that the height deviation absorber is compressed and deformed, and is vertically displaced to come into contact with an electrode of a semiconductor integrated circuit under test.
【請求項2】 キャップの接点は、バンプを有すること
を特徴とする請求項1に記載の半導体集積回路試験用ソ
ケット。
2. The socket for testing a semiconductor integrated circuit according to claim 1, wherein the contact of the cap has a bump.
【請求項3】 ヒートシンクを有し、該ヒートシンク
は、被試験半導体集積回路が発する熱を拡散するもので
あり、上端面に、被試験半導体集積回路を受け入れて支
える支持部を有するものであることを特徴とする請求項
1、又は2に記載の半導体集積回路試験用ソケット。
3. A heat sink is provided, which diffuses heat generated by the semiconductor integrated circuit under test, and has a support portion for receiving and supporting the semiconductor integrated circuit under test on its upper end surface. 3. The semiconductor integrated circuit test socket according to claim 1 or 2.
JP5151811A 1993-06-23 1993-06-23 Semiconductor integrated circuit test socket Expired - Lifetime JP2526489B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5151811A JP2526489B2 (en) 1993-06-23 1993-06-23 Semiconductor integrated circuit test socket

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5151811A JP2526489B2 (en) 1993-06-23 1993-06-23 Semiconductor integrated circuit test socket

Publications (2)

Publication Number Publication Date
JPH0712890A true JPH0712890A (en) 1995-01-17
JP2526489B2 JP2526489B2 (en) 1996-08-21

Family

ID=15526829

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5151811A Expired - Lifetime JP2526489B2 (en) 1993-06-23 1993-06-23 Semiconductor integrated circuit test socket

Country Status (1)

Country Link
JP (1) JP2526489B2 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100503996B1 (en) * 1997-07-09 2005-10-06 텍사스 인스트루먼츠 인코포레이티드 Burn-in test socket apparatus
US7474110B2 (en) 2006-06-19 2009-01-06 Tokyo Electron Limited Probe card
JP2011253966A (en) * 2010-06-02 2011-12-15 Chichibu Fuji Co Ltd Aging board for semiconductor laser element
JP2018503818A (en) * 2015-02-05 2018-02-08 リーノ インダストリアル インコーポレイテッド Inspection device
KR20220130959A (en) * 2021-03-19 2022-09-27 (주)티에스이 test device for semiconductor
WO2024021766A1 (en) * 2022-07-28 2024-02-01 苏州和林微纳科技股份有限公司 Ultrathin grounding heat dissipation assembly and test base

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04170044A (en) * 1990-11-02 1992-06-17 Nec Kyushu Ltd Jig for inspecting semiconductor wafer

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04170044A (en) * 1990-11-02 1992-06-17 Nec Kyushu Ltd Jig for inspecting semiconductor wafer

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100503996B1 (en) * 1997-07-09 2005-10-06 텍사스 인스트루먼츠 인코포레이티드 Burn-in test socket apparatus
US7474110B2 (en) 2006-06-19 2009-01-06 Tokyo Electron Limited Probe card
US7498827B2 (en) 2006-06-19 2009-03-03 Tokyo Electron Limited Probe card
JP2011253966A (en) * 2010-06-02 2011-12-15 Chichibu Fuji Co Ltd Aging board for semiconductor laser element
JP2018503818A (en) * 2015-02-05 2018-02-08 リーノ インダストリアル インコーポレイテッド Inspection device
KR20220130959A (en) * 2021-03-19 2022-09-27 (주)티에스이 test device for semiconductor
WO2024021766A1 (en) * 2022-07-28 2024-02-01 苏州和林微纳科技股份有限公司 Ultrathin grounding heat dissipation assembly and test base

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