JPH07111113A - Wiring cable of laminated wiring board and manufacture thereof - Google Patents

Wiring cable of laminated wiring board and manufacture thereof

Info

Publication number
JPH07111113A
JPH07111113A JP25552793A JP25552793A JPH07111113A JP H07111113 A JPH07111113 A JP H07111113A JP 25552793 A JP25552793 A JP 25552793A JP 25552793 A JP25552793 A JP 25552793A JP H07111113 A JPH07111113 A JP H07111113A
Authority
JP
Japan
Prior art keywords
metal layer
wire
wiring
wiring board
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP25552793A
Other languages
Japanese (ja)
Other versions
JP3054793B2 (en
Inventor
Hidenori Harada
秀則 原田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Totoku Electric Co Ltd
Original Assignee
Totoku Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Totoku Electric Co Ltd filed Critical Totoku Electric Co Ltd
Priority to JP25552793A priority Critical patent/JP3054793B2/en
Publication of JPH07111113A publication Critical patent/JPH07111113A/en
Application granted granted Critical
Publication of JP3054793B2 publication Critical patent/JP3054793B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Wire Processing (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

PURPOSE:To suppress the edge backing of the metallic conductor of a wiring cable. CONSTITUTION:A wiring cable 100 has a structure in which a first metal layer 100a electrochemically more basic than a metallic conductor 1 is formed around the outer periphery of the metallic conductor 1 and a second metal layer 100b excellent in plastic workability and electrochemically more noble than the first metal layer 100a is formed around the outer periphery of the first metal layer 100a, with an insulating jacket 2 covering the outer periphery of the second metal layer 100b. Thus cathode corrosion resistance suppresses the edge backing caused by an etching electrolyte, so the reliability of connection between through-hole conductor layers can be enhanced.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】この発明は、合せ配線板の布線用
電線およびその製造方法に関し、さらに詳しくは、合せ
配線板のスルホール導体層間を電気的に接続する信頼性
を向上させうる布線用電線およびその製造方法に関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an electric wire for laying wiring on a laminated wiring board and a method for manufacturing the same, and more particularly to a wiring which can improve reliability of electrically connecting through-hole conductor layers of the laminated wiring board. The present invention relates to an electric wire and a manufacturing method thereof.

【0002】[0002]

【従来の技術】図7は、従来の合せ配線板の布線用電線
の一例の断面図である。この布線用電線300は、例え
ば銅または銅合金の金属導体線1の外周に、例えばポリ
イミドの絶縁外皮2を被せた構成である。
2. Description of the Related Art FIG. 7 is a sectional view of an example of a conventional electric wire for wiring of a laminated wiring board. The electric wire 300 for wiring has a structure in which a metal conductor wire 1 made of, for example, copper or a copper alloy is covered with an insulating jacket 2 made of polyimide, for example.

【0003】図8は、上記従来の布線用電線300を用
いた従来の合せ配線板の一例の断面図である。この合せ
配線板400は、配線パタンを形成した配線板LB,U
Bを、接着剤ADで一体に貼り合せ、その合せ目に布線
用電線300を布線した構成である。前記布線用電線3
00により、スルホールT1,T2のスルホール導体層
D1,D2が電気的に接続されている。なお、多数の配
線板を貼り合わせて多層の合せ配線板としたものもあ
る。
FIG. 8 is a sectional view of an example of a conventional laminated wiring board using the above-mentioned conventional wire 300 for wiring. This laminated wiring board 400 has wiring patterns LB and U on which wiring patterns are formed.
B is integrally bonded with the adhesive AD, and the electric wire 300 for wiring is laid at the joint. The wire for wiring 3
00, the through-hole conductor layers D1 and D2 of the through-holes T1 and T2 are electrically connected. There is also a multi-layered laminated wiring board in which a large number of wiring boards are bonded together.

【0004】[0004]

【発明が解決しようとする課題】図9は、スルホールT
1,T2の内面にスルホール導体層D1,D2を形成す
る直前の状態を示す断面図である。スルホールT1,T
2に無電解銅めっきを施してスルホール導体層D1,D
2を形成するが、その前処理として、スルホールT1,
T2の内面を軽くエッチングする。これは、スルホール
T1,T2の内面の汚れを除去すると共に、布線用電線
300の断面に付着している酸化被膜を取り除き、さら
に、めっき面を荒らして、無電解銅めっきの密着性を良
くするためである。
FIG. 9 shows a through hole T.
It is sectional drawing which shows the state just before forming the through-hole conductor layers D1 and D2 on the inner surface of 1 and T2. Through hole T1, T
2 is electroless copper plated to form through-hole conductor layers D1 and D
2 is formed, but as a pretreatment thereof, the through hole T1,
Lightly etch the inner surface of T2. This removes stains on the inner surfaces of the through holes T1 and T2, removes the oxide film adhering to the cross section of the wiring wire 300, and further roughens the plated surface to improve the adhesion of the electroless copper plating. This is because

【0005】しかし、図10に示すように、エッチング
用電解液により布線用電線300の金属導体線1が深く
エッチングされてしまい、金属導体線1がスルホールT
1,T2の内面より窪んでしまうエッジバック30を生
じる。そして、このエッジバック30のため、無電解銅
めっきにより形成したスルホール導体層と金属導体線1
の電気的な接続の信頼性、ひいては、スルホール導体層
D1,D2間の電気的な接続の信頼性が低下してしまう
問題点がある。
However, as shown in FIG. 10, the metal conductor wire 1 of the wiring wire 300 is deeply etched by the etching electrolyte, so that the metal conductor wire 1 is through-hole T.
An edge back 30 is formed that is recessed from the inner surface of T1 and T2. Because of this edge back 30, the through-hole conductor layer and the metal conductor wire 1 formed by electroless copper plating
There is a problem in that the reliability of the electrical connection, and eventually the reliability of the electrical connection between the through-hole conductor layers D1 and D2, is reduced.

【0006】そこで、この発明の目的は、スルホール導
体層間の電気的な接続の信頼性を向上できるようにした
合せ配線板の布線用電線を提供することにある。また、
その布線用電線の製造方法を提供することにある。
Therefore, an object of the present invention is to provide an electric wire for wiring a laminated wiring board, which can improve the reliability of electrical connection between through-hole conductor layers. Also,
It is to provide a method for manufacturing the electric wire for wiring.

【0007】[0007]

【課題を解決するための手段】第1の観点では、この発
明は、複数の配線板を一体に合せた合せ配線板のスルホ
ール導体層間を電気的に接続するために、複数の配線板
の合せ目に布線される合せ配線板の布線用電線におい
て、金属導体線と絶縁外皮の間に、金属導体線よりも電
気化学的に卑なる性質の第1金属層を設けたことを特徴
とする合せ配線板の布線用電線を提供する。
According to a first aspect of the present invention, there is provided a wiring board in which a plurality of wiring boards are integrally joined together so as to electrically connect through-hole conductor layers of the wiring board. In the electric wire for wiring of a laminated wiring board to be laid on the eye, a first metal layer having a property that is electrochemically baser than the metal conductor wire is provided between the metal conductor wire and the insulating outer coat. An electric wire for laying a laminated wiring board is provided.

【0008】第2の観点では、この発明は、上記構成の
布線用電線において、前記第1金属層と前記絶縁外皮の
間に、塑性加工性に優れ且つ前記第1金属層よりも電気
化学的に貴なる性質の第2金属層を設けたことを特徴と
する合せ配線板の布線用電線を提供する。
According to a second aspect, the present invention provides a wire for wiring having the above-mentioned structure, which is excellent in plastic workability between the first metal layer and the insulating outer shell and is electrochemically superior to the first metal layer. Provided is an electric wire for wiring a laminated wiring board, which is provided with a second metal layer having a noble property.

【0009】第3の観点では、この発明は、金属導体線
の外周に金属導体線よりも電気化学的に卑なる金属を
0.03μm以上,3μm以下の厚さにめっきして第1
金属層を形成する第1金属層めっき工程と、前記第1金
属層の外周に塑性加工性に優れ且つ前記第1金属層より
も電気化学的に貴なる金属を0.5μm以上,10μm
以下の厚さにめっきして第2金属層を形成する第2金属
層めっき工程と、その第2金属層めっき工程を経た被め
っき線を伸線する伸線工程と、その伸線工程を経た被め
っき線の外周に絶縁外皮を塗布焼付ける絶縁外皮塗布焼
付け工程とを有することを特徴とする合せ配線板の布線
用電線の製造方法を提供する。
According to a third aspect of the present invention, in the first aspect of the present invention, a metal which is electrochemically baser than the metal conductor wire is plated on the outer circumference of the metal conductor wire to a thickness of 0.03 μm or more and 3 μm or less.
A first metal layer plating step of forming a metal layer, and 0.5 μm or more, 10 μm or more of a metal excellent in plastic workability and electrochemically noble than the first metal layer on the outer periphery of the first metal layer.
A second metal layer plating step of forming a second metal layer by plating to the following thickness, a wire drawing step of drawing a wire to be plated that has undergone the second metal layer plating step, and a wire drawing step thereof A method for manufacturing an electric wire for wiring of a laminated wiring board, comprising a step of coating and baking an insulating outer coat on the outer periphery of a wire to be plated.

【0010】[0010]

【作用】上記第1の観点によるこの発明の合せ配線板の
布線用電線では、スルホール導体層の無電解めっきの前
処理工程において、エッチング用電解液が金属導体線お
よび第1金属層に接触すると、金属導体線がカソードと
なり,電気化学的に卑なる性質の第1金属層がアノード
となり,ガルバニ電池系を形成する。この結果、電池作
用によるカソード防食作用が起こり、金属導体線のエッ
ジバックの発生が防止される。つまり、第1金属層が犠
牲電極となって溶出することで、金属導体線の溶出が抑
制される。従って、無電解めっきにより形成したスルホ
ール導体層と金属導体線の電気的な接続の信頼性、ひい
ては、スルホール導体層間の電気的な接続の信頼性を向
上できる。
In the electric wire for wiring of the laminated wiring board of the present invention according to the first aspect, the electrolytic solution for etching contacts the metal conductor wire and the first metal layer in the pretreatment step of the electroless plating of the through-hole conductor layer. Then, the metal conductor wire serves as a cathode, and the first metal layer having an electrochemically base property serves as an anode to form a galvanic cell system. As a result, a cathodic protection effect due to the cell effect occurs, and the occurrence of edge back of the metal conductor wire is prevented. That is, the elution of the metal conductor wire is suppressed by the elution of the first metal layer as a sacrificial electrode. Therefore, it is possible to improve the reliability of the electrical connection between the through-hole conductor layer formed by electroless plating and the metal conductor wire, and thus the reliability of the electrical connection between the through-hole conductor layers.

【0011】上記第2の観点によるこの発明の合せ配線
板の布線用電線では、第1金属層の外周に、塑性加工性
に優れた第2金属層が施されているので、伸線加工を施
す場合に比較的薄い第1金属層が保護され、好適に細径
の布線用電線を製造することが出来る。また、上記第1
の観点による布線用電線と同様の作用により、エッジバ
ックの発生が防止され、スルホール導体層間の電気的な
接続の信頼性を向上できる。
In the electric wire for wiring of the laminated wiring board of the present invention according to the second aspect, since the second metal layer excellent in plastic workability is applied to the outer periphery of the first metal layer, the wire drawing work is performed. In the case of applying, the relatively thin first metal layer is protected, and a wire having a small diameter can be suitably manufactured. Also, the first
By the action similar to that of the electric wire for wiring from the viewpoint, the occurrence of edge back can be prevented and the reliability of electrical connection between the through-hole conductor layers can be improved.

【0012】上記第3の観点によるこの発明の合せ配線
板の布線用電線の製造方法では、上記第2の観点による
布線用電線を好適に製造できる。ここで、第1金属層を
0.03μm以上,3μm以下の厚さにめっきする理由
は、0.03μm未満の厚さでは,カソード防食効果が
十分ではなく、3μmを越える厚さでは,カソード防食
効果に差がないのに,めっきコストが上昇するからであ
る。また、第2金属層を0.5μm以上,10μm以下
の厚さにめっきする理由は、0.5μm未満の厚さで
は,伸線工程で第2金属層が破れて第1金属層が露出す
る場合があり,第1金属層を保護する効果が十分ではな
く、10μmを越える厚さでは,伸線工程で第1金属層
を保護する効果に差がないのに,めっきコストが上昇す
るからである。なお、伸線工程で第2金属層が破れて第
1金属層が露出すると、例えば鉄の第1金属層とダイの
ダイヤモンドとの間で反応を起こして鉄の炭化物を生
じ、ダイのダイヤモンドの摩耗や,布線用電線の表面が
荒れるなどの不都合を生じる。
According to the method for producing a wire for wiring of a laminated wiring board of the present invention according to the third aspect, the wire for wiring according to the second aspect can be suitably produced. Here, the reason for plating the first metal layer to a thickness of 0.03 μm or more and 3 μm or less is that the thickness of less than 0.03 μm is not sufficient for cathodic protection, and the thickness of more than 3 μm is cathodic protection. This is because there is no difference in effect, but the plating cost rises. Further, the reason for plating the second metal layer to a thickness of 0.5 μm or more and 10 μm or less is that if the thickness is less than 0.5 μm, the second metal layer is broken and the first metal layer is exposed in the wire drawing step. In some cases, the effect of protecting the first metal layer is not sufficient, and if the thickness exceeds 10 μm, there is no difference in the effect of protecting the first metal layer in the wire drawing process, but the plating cost increases. is there. When the second metal layer is broken and the first metal layer is exposed in the wire drawing step, for example, a reaction occurs between the first metal layer of iron and the diamond of the die to form iron carbide, and This causes inconveniences such as wear and roughening of the surface of the wiring wire.

【0013】[0013]

【実施例】以下、図に示す実施例によりこの発明をさら
に詳しく説明する。なお、これによりこの発明が限定さ
れるものではない。図1は、この発明の合せ配線板の布
線用電線の一実施例の断面図である。この布線用電線1
00は、銅の金属導体線1の外周に、鉄の第1金属層1
00aを形成し、その外周に銅の第2金属層100bを
形成し、その外周にポリイミドの絶縁外皮2を被せた構
成である。なお、金属導体線1には例えば銅合金を用い
てもよい。また、第1金属層100aには例えば錫や亜
鉛を用いてもよい。また、第2金属層100bには例え
ば金や銀あるいは結晶構造にFCCを有するものを用い
てもよい。
The present invention will be described in more detail with reference to the embodiments shown in the drawings. The present invention is not limited to this. FIG. 1 is a sectional view of an embodiment of an electric wire for wiring of a laminated wiring board according to the present invention. This wire for wiring 1
00 is the first metal layer 1 made of iron on the outer periphery of the copper metal conductor wire 1.
00a is formed, a copper second metal layer 100b is formed on the outer circumference thereof, and a polyimide insulating outer cover 2 is covered on the outer circumference thereof. The metal conductor wire 1 may be made of copper alloy, for example. Moreover, you may use tin or zinc for the 1st metal layer 100a, for example. Further, for the second metal layer 100b, for example, gold, silver, or one having FCC in the crystal structure may be used.

【0014】この発明の合せ配線板の布線用電線の製造
工程は、電気めっき工程と,伸線工程と,絶縁外皮塗布
焼付け工程とからなる。図2は、電気めっき工程の説明
図である。ボビン1aから例えば線径0.9mmの銅の
金属導体線1を引き出し、その金属導体線1の外周に鉄
めっき浴3で鉄を0.03μm以上,3μm以下の厚さ
に電気めっきし、第1金属層を形成する。次に、第1金
属層を形成した被めっき線4aの外周に銅めっき浴5で
銅を0.5μm以上,10μm以下の厚さに電気めっき
し、第2金属層を形成する。次に、第2金属層を形成し
た被めっき線4bを乾燥機6により例えば70℃〜80
℃の温度で乾燥し、巻取り機7aに巻き取る。
The manufacturing process of the electric wire for wiring of the laminated wiring board of the present invention comprises an electroplating process, a wire drawing process, and an insulating outer coating and baking process. FIG. 2 is an explanatory diagram of the electroplating process. For example, a copper metal conductor wire 1 having a wire diameter of 0.9 mm is drawn from the bobbin 1a, and iron is electroplated on the outer periphery of the metal conductor wire 1 with an iron plating bath 3 to a thickness of 0.03 μm or more and 3 μm or less. 1. Form a metal layer. Next, copper is electroplated on the outer periphery of the wire 4a on which the first metal layer is formed in a copper plating bath 5 to a thickness of 0.5 μm or more and 10 μm or less to form a second metal layer. Next, the wire to be plated 4b on which the second metal layer is formed is dried by the dryer 6 to, for example, 70 ° C to 80 ° C.
It is dried at a temperature of ° C and wound on the winder 7a.

【0015】図3は、伸線工程の説明図である。ボビン
1bから前記第2金属層を形成した被めっき線4bを引
き出し、伸線機8のダイ10a,10bに通し、例えば
線径0.09mmの被めっき線4cに伸線し、巻取り機
7bに巻き取る。なお、被めっき線4bの最外周には塑
性加工性に優れた第2金属層が形成されているので、良
好に伸線加工できる。
FIG. 3 is an explanatory view of the wire drawing process. The wire to be plated 4b on which the second metal layer has been formed is drawn out from the bobbin 1b, passed through the dies 10a and 10b of the wire drawing machine 8, and drawn to, for example, the wire to be plated 4c having a wire diameter of 0.09 mm, and the winding machine 7b. Roll it up. Since the second metal layer having excellent plastic workability is formed on the outermost periphery of the wire to be plated 4b, the wire drawing can be performed satisfactorily.

【0016】図4は、絶縁外皮塗布焼付け工程の説明図
である。ボビン1cから前記伸線した被めっき線4cを
引き出し、焼鈍装置11により例えば550℃の温度で
焼鈍する。次に、焼鈍した被めっき線4dにポリイミド
塗布装置12でポリイミドをローラ塗布し、さらに焼付
け機15で例えば450℃の温度で焼付け、絶縁外皮を
形成する。以上により製造された布線用電線100を、
巻取り機7cに巻き取る。この布線用電線100の線径
は例えば0.140mmである。
FIG. 4 is an explanatory diagram of the insulating coating and baking process. The drawn wire 4c is drawn from the bobbin 1c and annealed by the annealing device 11 at a temperature of 550 ° C., for example. Then, the annealed wire 4d is roller-coated with polyimide by the polyimide coating device 12, and further baked by the baking machine 15 at a temperature of, for example, 450 ° C. to form an insulating outer coat. The electric wire 100 for wiring manufactured by the above,
Take up on the winder 7c. The wire diameter of the wiring wire 100 is, for example, 0.140 mm.

【0017】得られた布線用電線100をエッチング用
電解液である過硫酸アンモニウム水溶液(濃度:200
g/l,温度:20℃)に90秒間浸してエッチングを
行い、走査電子顕微鏡により表面状態を観察したとこ
ろ、金属導体線1にエッジバックは認められなかった。
これは、図5に示すように、第1金属層100aが金属
導体層1や第2金属層100bよりも電気化学的に卑で
あるので、犠牲電極となって溶出し、エッジバック30
を生じるが、これにより金属導体線1は防食されるため
である。
The obtained wire 100 for wiring is treated with an aqueous ammonium persulfate solution (concentration: 200) as an electrolytic solution for etching.
It was immersed in g / l, temperature: 20 ° C.) for 90 seconds for etching, and the surface state was observed by a scanning electron microscope. No edge back was observed on the metal conductor wire 1.
As shown in FIG. 5, since the first metal layer 100a is electrochemically less base than the metal conductor layer 1 and the second metal layer 100b, it becomes a sacrificial electrode and elutes, and the edge back 30
This is because the metal conductor wire 1 is protected against corrosion.

【0018】比較例として、線径0.09mmの銅細線
を金属導体線とし,その外周にポリイミドの絶縁外皮を
塗布焼付けした従来の布線用電線300を、上記と同じ
条件でエッチング処理し、走査電子顕微鏡により表面状
態を観察したところ、金属導体線にエッジバックが認め
られた。また、厚さ20μmに無電解銅めっきし、走査
電子顕微鏡により表面状態を観察したところ、図10に
示すように、金属導体線1との接続部分に、窪みが認め
られた。
As a comparative example, a copper wire having a wire diameter of 0.09 mm is used as a metal conductor wire, and a conventional electric wire for wiring 300 having a polyimide insulation coating applied and baked on the outer periphery thereof is etched under the same conditions as described above. When the surface condition was observed with a scanning electron microscope, edge back was observed in the metal conductor wire. Further, when electroless copper plating was performed to a thickness of 20 μm and the surface condition was observed with a scanning electron microscope, as shown in FIG. 10, a dent was recognized in the connection portion with the metal conductor wire 1.

【0019】[0019]

【発明の効果】この発明の合せ配線板の布線用電線によ
れば、スルホール導体層の無電解めっきの前処理工程で
金属導体層にエッジバックが発生するのを防止でき、ス
ルホール導体層と金属導体線の電気的な接続の信頼性を
向上できる。また、この発明の合せ配線板の布線用電線
の製造方法によれば、上記布線用電線を好適に製造でき
る。
According to the wire for wiring of a laminated wiring board of the present invention, it is possible to prevent the occurrence of edge back in the metal conductor layer in the pretreatment step of the electroless plating of the through hole conductor layer, and to prevent the formation of the through hole conductor layer. The reliability of electrical connection of the metal conductor wire can be improved. Further, according to the method for producing an electric wire for wiring of a laminated wiring board of the present invention, the above electric wire for wiring can be suitably produced.

【図面の簡単な説明】[Brief description of drawings]

【図1】この発明の合せ配線板の布線用電線の一実施例
の断面図である。
FIG. 1 is a sectional view of an embodiment of an electric wire for wiring of a laminated wiring board according to the present invention.

【図2】電気めっき工程の説明図である。FIG. 2 is an explanatory diagram of an electroplating process.

【図3】伸線工程の説明図である。FIG. 3 is an explanatory diagram of a wire drawing process.

【図4】絶縁外皮塗布焼付け工程の説明図である。FIG. 4 is an explanatory diagram of an insulating outer coating and baking step.

【図5】この発明の布線用電線のエッチング液によるエ
ッジバックの状態を示す断面図である。
FIG. 5 is a cross-sectional view showing a state of an edge back of an electric wire for wiring according to the present invention with an etching solution.

【図6】この発明の布線用電線を布線した合せ配線板の
断面図である。
FIG. 6 is a cross-sectional view of a laminated wiring board on which the wiring wire of the present invention is laid.

【図7】従来の合せ配線板の布線用電線の一例の断面図
である。
FIG. 7 is a cross-sectional view of an example of an electric wire for wiring of a conventional laminated wiring board.

【図8】従来の布線用電線を布線した合せ配線板の断面
図である。
FIG. 8 is a cross-sectional view of a laminated wiring board in which a conventional wiring wire is laid.

【図9】スルホール導体層の無電解めっきの前処理工程
の直前の断面図である。
FIG. 9 is a sectional view immediately before a pretreatment step of electroless plating of a through-hole conductor layer.

【図10】従来の布線用電線のエッチング液によるエッ
ジバックの状態を示す断面図である。
FIG. 10 is a cross-sectional view showing a state of edge backing of a conventional electric wire for wiring with an etching solution.

【符号の説明】[Explanation of symbols]

1 金属導体線 2 絶縁外皮 3 鉄めっき浴 5 銅めっき浴 6 乾燥機 7a,7b,7c 巻取り機 8 伸線機 10a,10b ダイ 11 焼鈍装置 12 ポリイミド塗布装置 15 焼付け機 100 布線用電線 100a 第1金属層 100b 第2金属層 200 合せ配線板 T1,T2 スルホール D1,D2 スルホール導体層 LB,UB 配線板 DESCRIPTION OF SYMBOLS 1 Metal conductor wire 2 Insulation skin 3 Iron plating bath 5 Copper plating bath 6 Dryer 7a, 7b, 7c Winder 8 Wire drawing machine 10a, 10b Die 11 Annealing device 12 Polyimide coating device 15 Baking machine 100 Wire for wire 100a First metal layer 100b Second metal layer 200 Laminated wiring board T1, T2 through hole D1, D2 through hole conductor layer LB, UB wiring board

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.6 識別記号 庁内整理番号 FI 技術表示箇所 // H05K 3/10 A 7511−4E ─────────────────────────────────────────────────── ─── Continuation of front page (51) Int.Cl. 6 Identification number Office reference number FI technical display location // H05K 3/10 A 7511-4E

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 複数の配線板を一体に合せた合せ配線板
のスルホール導体層間を電気的に接続するために、複数
の配線板の合せ目に布線される合せ配線板の布線用電線
において、 金属導体線と絶縁外皮の間に、金属導体線よりも電気化
学的に卑なる性質の第1金属層を設けたことを特徴とす
る合せ配線板の布線用電線。
1. An electric wire for wiring a laminated wiring board, which is laid at a seam of a plurality of wiring boards to electrically connect through-hole conductor layers of the laminated wiring board in which a plurality of wiring boards are integrally combined. 2. An electric wire for wiring of a laminated wiring board according to claim 1, wherein a first metal layer having a property that is electrochemically baser than the metal conductor wire is provided between the metal conductor wire and the insulating jacket.
【請求項2】 請求項1に記載の合せ配線板の布線用電
線において、前記第1金属層と前記絶縁外皮の間に、塑
性加工性に優れ且つ前記第1金属層よりも電気化学的に
貴なる性質の第2金属層を設けたことを特徴とする合せ
配線板の布線用電線。
2. The electric wire for wiring of a laminated wiring board according to claim 1, wherein the plastic workability between the first metal layer and the insulating outer layer is excellent, and the electrochemical property is higher than that of the first metal layer. An electric wire for wiring a laminated wiring board, characterized in that a second metal layer having a noble property is provided on the wire.
【請求項3】 請求項1に記載の合せ配線板の布線用電
線において、金属導体線が銅または銅合金であり、第1
金属層が鉄であることを特徴とする合せ配線板の布線用
電線。
3. The electric wire for wiring of a laminated wiring board according to claim 1, wherein the metal conductor wire is copper or a copper alloy.
An electric wire for wiring a laminated wiring board, wherein the metal layer is iron.
【請求項4】 請求項2に記載の合せ配線板の布線用電
線において、金属導体線が銅または銅合金であり、第1
金属層が鉄であり、第2金属層が銅または金または銀で
あることを特徴とする合せ配線板の布線用電線。
4. The electric wire for wiring of a laminated wiring board according to claim 2, wherein the metal conductor wire is copper or a copper alloy.
An electric wire for wiring a laminated wiring board, wherein the metal layer is iron and the second metal layer is copper, gold or silver.
【請求項5】 金属導体線の外周に金属導体線よりも電
気化学的に卑なる金属を0.03μm以上,3μm以下
の厚さにめっきして第1金属層を形成する第1金属層め
っき工程と、前記第1金属層の外周に塑性加工性に優れ
且つ前記第1金属層よりも電気化学的に貴なる金属を
0.5μm以上,10μm以下の厚さにめっきして第2
金属層を形成する第2金属層めっき工程と、その第2金
属層めっき工程を経た被めっき線を伸線する伸線工程
と、その伸線工程を経た被めっき線の外周に絶縁外皮を
塗布焼付ける絶縁外皮塗布焼付け工程とを有することを
特徴とする合せ配線板の布線用電線の製造方法。
5. A first metal layer plating for forming a first metal layer by plating a metal, which is electrochemically less base than the metal conductor wire, to a thickness of 0.03 μm or more and 3 μm or less on the outer periphery of the metal conductor wire. And a step of plating the outer periphery of the first metal layer with a metal having excellent plastic workability and electrochemically nobler than the first metal layer to a thickness of 0.5 μm or more and 10 μm or less.
A second metal layer plating step of forming a metal layer, a wire drawing step of drawing a wire to be plated that has undergone the second metal layer plating step, and an insulating outer coat applied to the outer periphery of the wire to be plated that has undergone the wire drawing step. A method for producing an electric wire for wiring of a laminated wiring board, comprising: an insulating outer coating and baking step.
JP25552793A 1993-10-13 1993-10-13 Wire for wiring of laminated wiring board and method of manufacturing the same Expired - Fee Related JP3054793B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25552793A JP3054793B2 (en) 1993-10-13 1993-10-13 Wire for wiring of laminated wiring board and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25552793A JP3054793B2 (en) 1993-10-13 1993-10-13 Wire for wiring of laminated wiring board and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH07111113A true JPH07111113A (en) 1995-04-25
JP3054793B2 JP3054793B2 (en) 2000-06-19

Family

ID=17279982

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25552793A Expired - Fee Related JP3054793B2 (en) 1993-10-13 1993-10-13 Wire for wiring of laminated wiring board and method of manufacturing the same

Country Status (1)

Country Link
JP (1) JP3054793B2 (en)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102140074B1 (en) * 2019-01-21 2020-07-31 문종성 Garter belt-type heating clothing

Also Published As

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