JPH07109872B2 - 半導体装置およびその製造方法 - Google Patents

半導体装置およびその製造方法

Info

Publication number
JPH07109872B2
JPH07109872B2 JP63-508046A JP50804688A JPH07109872B2 JP H07109872 B2 JPH07109872 B2 JP H07109872B2 JP 50804688 A JP50804688 A JP 50804688A JP H07109872 B2 JPH07109872 B2 JP H07109872B2
Authority
JP
Japan
Prior art keywords
conductivity type
well
region
concentration
layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP63-508046A
Other languages
English (en)
Japanese (ja)
Other versions
JPWO1989003591A1 (ja
JPH07109872B1 (enExample
Inventor
紳二 小田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP63-508046A priority Critical patent/JPH07109872B2/ja
Priority claimed from PCT/JP1988/001017 external-priority patent/WO1989003591A1/ja
Publication of JPWO1989003591A1 publication Critical patent/JPWO1989003591A1/ja
Publication of JPH07109872B2 publication Critical patent/JPH07109872B2/ja
Publication of JPH07109872B1 publication Critical patent/JPH07109872B1/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
JP63-508046A 1987-10-08 1988-10-06 半導体装置およびその製造方法 Expired - Lifetime JPH07109872B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63-508046A JPH07109872B2 (ja) 1987-10-08 1988-10-06 半導体装置およびその製造方法

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
JP62-254203 1987-10-08
JP25420387 1987-10-08
JP63-88714 1988-04-11
JP8871488 1988-04-11
JP63-508046A JPH07109872B2 (ja) 1987-10-08 1988-10-06 半導体装置およびその製造方法
PCT/JP1988/001017 WO1989003591A1 (en) 1987-10-08 1988-10-06 Semiconducteur device and method of producing the same

Publications (3)

Publication Number Publication Date
JPWO1989003591A1 JPWO1989003591A1 (ja) 1989-12-07
JPH07109872B2 true JPH07109872B2 (ja) 1995-11-22
JPH07109872B1 JPH07109872B1 (enExample) 1995-11-22

Family

ID=27305890

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63-508046A Expired - Lifetime JPH07109872B2 (ja) 1987-10-08 1988-10-06 半導体装置およびその製造方法

Country Status (1)

Country Link
JP (1) JPH07109872B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2014120609A (ja) * 2012-12-17 2014-06-30 Fujitsu Semiconductor Ltd 半導体装置及びその製造方法
JP6247463B2 (ja) * 2013-06-25 2017-12-13 ラピスセミコンダクタ株式会社 半導体装置の製造方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5745947A (en) * 1980-09-03 1982-03-16 Toshiba Corp Mos type semiconductor integrated circuit
JPS61242064A (ja) * 1985-04-19 1986-10-28 Toshiba Corp 相補型半導体装置の製造方法

Also Published As

Publication number Publication date
JPH07109872B1 (enExample) 1995-11-22

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