JPH07106503A - Semiconductor device package and semiconductor device - Google Patents

Semiconductor device package and semiconductor device

Info

Publication number
JPH07106503A
JPH07106503A JP25327793A JP25327793A JPH07106503A JP H07106503 A JPH07106503 A JP H07106503A JP 25327793 A JP25327793 A JP 25327793A JP 25327793 A JP25327793 A JP 25327793A JP H07106503 A JPH07106503 A JP H07106503A
Authority
JP
Japan
Prior art keywords
layer
power supply
signal
semiconductor device
signal layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP25327793A
Other languages
Japanese (ja)
Inventor
Norio Wada
則雄 和田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shinko Electric Industries Co Ltd
Original Assignee
Shinko Electric Industries Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinko Electric Industries Co Ltd filed Critical Shinko Electric Industries Co Ltd
Priority to JP25327793A priority Critical patent/JPH07106503A/en
Publication of JPH07106503A publication Critical patent/JPH07106503A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16245Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector

Landscapes

  • Lead Frames For Integrated Circuits (AREA)

Abstract

PURPOSE:To obtain a package for semiconductor device, which has a size close to chip size, by laminating three layers of a signal layer, a power supply layer and a grounding layer formed by metal foil through insulation sheets, with the grounding layer and the power supply layer connected to the outside with individual vias and common leads. CONSTITUTION:A signal layer 14, a grounding layer 16 and a power supply layer 18 are formed to predetermined pattens by applying etching process to metal foil. The signal layer 14 and grounding layer 16 are adhered by an insulation sheet 20, and also the grounding layer 16 and the power supply layer 18 are adhered with an insulation sheet 22. Also, a via 24 is formed from a through-hole in the insulation sheet 20 to the grounding layer 16, and also a via 26 is formed from a through-hole in the insulation sheets 20 and 22 to the power supply layer 18. In this way, the grounding layer 16 and the power supply layer 18 can be connected to the external portion by means of the vias 24 and 26 and common leads 30 and 32. Therefore, the number of leads 30 and 32 can be reduced and instead the signal layer 14 can be made denser accordingly.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は半導体装置用パッケージ
および半導体装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device package and a semiconductor device.

【0002】[0002]

【従来の技術】半導体チップを搭載するパッケージには
種々のものが開発されている。これらパッケージは、リ
ードフレームに代表されるように、ステージ部に半導体
チップを搭載し、この半導体チップの廻りにワイヤ等を
介して半導体チップと電気的に接続されるリード部が形
成されているものが一般的である。
2. Description of the Related Art Various packages for mounting semiconductor chips have been developed. In these packages, as represented by a lead frame, a semiconductor chip is mounted on a stage part, and a lead part electrically connected to the semiconductor chip via a wire or the like is formed around the semiconductor chip. Is common.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、昨今半
導体チップは益々大型化する傾向にあり、上記のように
半導体チップの回りにリード部を配置したのでは半導体
装置全体が大型化し、小型化の要請に反する。そこで本
発明は上記問題点を解決すべくなされたもので、その目
的とするところはチップサイズに近い大きさのものとす
ることができ、小型化が可能である半導体装置用パッケ
ージおよびこれを用いた電気的特性に優れる半導体装置
を提供するにある。
However, there is a tendency for semiconductor chips to become larger and larger in size these days, and if the lead portions are arranged around the semiconductor chips as described above, the entire semiconductor device becomes large and there is a demand for downsizing. Against. Therefore, the present invention has been made to solve the above problems, and an object of the present invention is to provide a semiconductor device package that can be made into a size close to a chip size and can be miniaturized. Another object of the present invention is to provide a semiconductor device having excellent electrical characteristics.

【0004】[0004]

【課題を解決するための手段】本発明は上記目的を達成
するため次の構成を備える。すなわち本発明に係る半導
体装置用パッケージでは、金属箔により形成された、少
なくとも信号層、電源層、接地層の3層が絶縁体シート
を介して積層され、前記信号層は、前記絶縁体シート上
に配線された複数のインナーリードと、該インナーリー
ドに一体的に接続する外部接続用のアウターリードとを
有し、前記電源層および接地層からは、前記絶縁体シー
トを貫通して前記信号層に露出した複数の電源用ビア、
接地用ビアが導出され、該ビアのうちの選択されたビア
が前記信号層のリードに接続されていることを特徴とし
ている。前記信号層のインナーリードを、複数の半導体
チップを搭載可能に配線すると好適である。さらに本発
明では、少なくとも信号層、電源層、接地層の3層が絶
縁体シートを介して積層され、前記信号層は、金属板を
加工して形成され、前記絶縁体シート上に所定のパター
ンで配線された複数のインナーリードと、該インナーリ
ードに一体的に接続する外部接続用のアウターリードと
を有し、前記電源層および接地層は金属箔により形成さ
れると共に、該電源層および接地層からは、前記絶縁体
シートを貫通して前記信号層のインナーリード間に露出
した複数の電源用ビア、接地用ビアが導出され、該ビア
のうちの選択されたビアが前記信号層のリードに接続さ
れていることを特徴としている。また本発明に係る半導
体装置では、半導体チップが、上記半導体装置用パッケ
ージの信号層のインナーリード、電源用ビア、接地用ビ
アに、半導体チップの信号用端子、電源用端子、接地用
端子がバンプを介して接続されて搭載されていることを
特徴としている。
The present invention has the following constitution in order to achieve the above object. That is, in the semiconductor device package according to the present invention, at least three layers of a signal layer, a power supply layer, and a ground layer, which are formed of metal foil, are laminated with an insulator sheet interposed therebetween, and the signal layer is formed on the insulator sheet. A plurality of inner leads wired to the inner leads and outer leads for external connection that are integrally connected to the inner leads. From the power supply layer and the ground layer, the insulation sheet is penetrated to the signal layer. Multiple power vias exposed at
It is characterized in that a grounding via is led out and a selected via of the vias is connected to a lead of the signal layer. It is preferable to wire the inner leads of the signal layer so that a plurality of semiconductor chips can be mounted. Furthermore, in the present invention, at least three layers of a signal layer, a power supply layer, and a ground layer are laminated with an insulating sheet interposed therebetween, and the signal layer is formed by processing a metal plate, and has a predetermined pattern on the insulating sheet. And a plurality of outer leads for external connection that are integrally connected to the inner leads, the power supply layer and the ground layer are formed of a metal foil, and the power supply layer and the contact layer are connected to each other. A plurality of power supply vias and grounding vias, which are exposed between the inner leads of the signal layer through the insulating sheet, are led out from the ground layer, and selected vias of the vias are leads of the signal layer. It is characterized by being connected to. In the semiconductor device according to the present invention, the semiconductor chip is such that the signal terminal, the power supply terminal, and the grounding terminal of the semiconductor chip are bumped on the inner lead of the signal layer of the semiconductor device package, the power supply via, and the grounding via. It is characterized by being connected and mounted via.

【0005】[0005]

【作用】本発明に係る半導体装置用パッケージによれ
ば、その大きさを搭載する半導体チップのサイズとほぼ
同じくできるので、小型化が図れる。また、接地層、電
源層は、各ビアおよび共通のリードにより外部に接続で
きるので、リードの本数を少なくでき、それだけ信号層
を密にできるので多ピン化に対応できる。また、本発明
に係る半導体装置によれば、パッケージ内に信号層と別
に面積の大きな接地層と電源層をもっている多層構造を
なすため、信号層に対してはストリップラインとしてク
ロストークを抑えられるうえ、電源系に対してはインダ
クタンスが低いため電源雑音を小さくでき、特に高周波
特性に優れるという電気的特性を有する。
According to the semiconductor device package of the present invention, its size can be made substantially the same as the size of the semiconductor chip to be mounted, so that the size can be reduced. Further, since the ground layer and the power supply layer can be connected to the outside by the respective vias and the common lead, the number of leads can be reduced, and the signal layer can be made dense accordingly, so that the number of pins can be increased. Further, according to the semiconductor device of the present invention, since the package has a multi-layer structure having a ground layer and a power supply layer having a large area separately from the signal layer, crosstalk can be suppressed as a strip line for the signal layer. Since the inductance of the power supply system is low, the power supply noise can be reduced and the high frequency characteristics are particularly excellent.

【0006】[0006]

【実施例】以下、本発明の好適な実施例を添付図面に基
づいて詳細に説明する。図1は半導体装置10の断面説
明図を示す。12はパッケージを示し、14はその信号
層、16は接地層、18は電源層である。信号層14、
接地層16、電源層18は銅箔等の金属箔をエッチング
加工することにより所定のパターンに形成されている。
信号層14と接地層16とは耐熱性を有し、かつ接着性
を有する絶縁体シート20により接着されている。また
接地層16と電源層18も同様の絶縁体シート22によ
り接着されている。信号層14は絶縁体シート20上に
貼着された金属箔をエッチング加工することにより形成
され、また接地層16と電源層18とは絶縁体シート2
2の両面に貼着された金属箔をエッチング加工すること
によって形成され、しかる後絶縁体シート20、22の
両シートを重ね合わせてキュアすることにより一体化さ
れる。また絶縁体シート20には接地層16に至る貫通
孔が形成されて該貫通孔内に導電性ペーストが充填され
てビア24が形成される。絶縁体シート20上に露出す
るビア24は絶縁体シート20上に形成されているラン
ド25に接続される。また絶縁体シート20、22に電
源層18に至る貫通孔が形成され、該貫通孔内に導電性
ペーストが充填されてビア26が形成されている。絶縁
体シート20上に露出するビア26は絶縁体シート20
上に形成されているランド27に接続される。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENT A preferred embodiment of the present invention will be described in detail below with reference to the accompanying drawings. FIG. 1 shows a cross-sectional explanatory view of a semiconductor device 10. Reference numeral 12 represents a package, 14 is a signal layer thereof, 16 is a ground layer, and 18 is a power supply layer. Signal layer 14,
The ground layer 16 and the power supply layer 18 are formed in a predetermined pattern by etching a metal foil such as a copper foil.
The signal layer 14 and the ground layer 16 are adhered by an insulating sheet 20 having heat resistance and adhesiveness. The ground layer 16 and the power supply layer 18 are also adhered by the same insulating sheet 22. The signal layer 14 is formed by etching a metal foil adhered on the insulator sheet 20, and the ground layer 16 and the power supply layer 18 are separated from each other by the insulator sheet 2.
It is formed by etching a metal foil attached to both surfaces of No. 2, and thereafter, both sheets of the insulating sheets 20 and 22 are overlapped and cured to be integrated. A through hole reaching the ground layer 16 is formed in the insulating sheet 20, and a conductive paste is filled in the through hole to form a via 24. The via 24 exposed on the insulator sheet 20 is connected to the land 25 formed on the insulator sheet 20. Further, a through hole reaching the power supply layer 18 is formed in the insulating sheets 20 and 22, and a conductive paste is filled in the through hole to form a via 26. The via 26 exposed on the insulator sheet 20 is formed by the insulator sheet 20.
It is connected to the land 27 formed above.

【0007】図2は絶縁体シート20上に形成されてい
る信号層14と上記ランド25、27の配線例を示す平
面図である。信号層14は、絶縁体シート20上に配線
されたインナーリード14aと、絶縁体シート20外に
突出するアウターリード14bからなる。インナーリー
ド14aは搭載すべき半導体チップ28に形成されてい
る信号用端子の配列パターンにしたがって絶縁体シート
20上を引き回されている。またビア24は半導体チッ
プ28の接地用端子のパターンにしたがって設けられ、
ビア26は半導体チップ28の電源用端子のパターンに
したがって設けられている。ビア24の内の選択的に選
ばれたビア24aは図2に示すように絶縁体シート20
上に形成されたリード30により外部に接続可能になっ
ている。同様にビア26の内の選択的に選ばれたビア2
6aは図2に示すように絶縁体シート20上に形成され
たリード32により外部に接続可能になっている。
FIG. 2 is a plan view showing a wiring example of the signal layer 14 and the lands 25 and 27 formed on the insulating sheet 20. The signal layer 14 includes inner leads 14 a wired on the insulation sheet 20 and outer leads 14 b protruding outside the insulation sheet 20. The inner leads 14a are routed on the insulating sheet 20 according to the arrangement pattern of the signal terminals formed on the semiconductor chip 28 to be mounted. Further, the via 24 is provided according to the pattern of the ground terminal of the semiconductor chip 28,
The via 26 is provided according to the pattern of the power supply terminal of the semiconductor chip 28. As shown in FIG. 2, the selectively selected via 24 a of the vias 24 is formed of the insulating sheet 20.
The lead 30 formed on the upper side enables connection to the outside. Similarly, the via 2 selectively selected from the vias 26
As shown in FIG. 2, 6a can be connected to the outside by a lead 32 formed on the insulating sheet 20.

【0008】上記のように形成されたパッケージ10
に、半導体チップ28が、信号用端子、電源用端子、接
地用端子をそれぞれ対応する信号層のインナーリード1
4a、ビア24、26に位置合わしてバンプ34を介し
て接続されて搭載され、半導体装置10に完成される。
なお半導体チップ28と絶縁体シート20との間には接
着剤層36が介在されて絶縁が図られている。接着剤層
36はソルダーレジスト等の絶縁体層であってもよい。
上記実施例において電源層18の下面側に絶縁体シート
(図示せず)を貼着するようにしてもよい。
The package 10 formed as described above
In addition, the semiconductor chip 28 has inner leads 1 of the signal layer corresponding to the signal terminal, the power supply terminal, and the ground terminal, respectively.
4a, the vias 24 and 26 are aligned and connected via bumps 34 and mounted, and the semiconductor device 10 is completed.
An adhesive layer 36 is interposed between the semiconductor chip 28 and the insulator sheet 20 for insulation. The adhesive layer 36 may be an insulating layer such as a solder resist.
In the above embodiment, an insulating sheet (not shown) may be attached to the lower surface side of the power supply layer 18.

【0009】上記実施例におけるパッケージ10によれ
ば、その大きさを半導体チップ28のサイズとほぼ同じ
くできるので、小型化が図れる。また、接地層16、電
源層18は、ビア24、26および共通のリード30、
32により外部に接続できるので、リード30、32の
本数を少なくでき、それだけ信号層14を密にできるの
で多ピン化に対応できる。また、パッケージ10内に信
号層14と別に面積の大きな接地層16と電源層18を
もっている多層構造をなすため、信号層14に対しては
ストリップラインとしてクロストークを抑えられるう
え、電源系に対してはインダクタンスが低いため電源雑
音を小さくでき、特に高周波特性に優れるという電気的
特性を有する。なお、信号層14、電源層18、接地層
16の順に積層すれば(図示せず)、電源層18と接地
層16の間の絶縁体シートに誘電率の大きなものを使用
することによって、いわゆるデカップリングコンデンサ
を形成でき、電源雑音を小さくできるという電気的特性
を有する。
According to the package 10 of the above-described embodiment, the size thereof can be made substantially the same as the size of the semiconductor chip 28, so that the size can be reduced. Further, the ground layer 16 and the power supply layer 18 include the vias 24 and 26 and the common lead 30,
Since it can be connected to the outside by means of 32, the number of leads 30, 32 can be reduced, and the signal layer 14 can be made denser by that much, so that a large number of pins can be accommodated. Further, since the package 10 has a multi-layer structure having the ground layer 16 and the power supply layer 18 having a large area separately from the signal layer 14, the signal layer 14 can be suppressed as a strip line from crosstalk, and can be used for the power supply system. In particular, since the inductance is low, the power supply noise can be reduced, and the electrical characteristics are particularly excellent in high frequency characteristics. If the signal layer 14, the power supply layer 18, and the ground layer 16 are laminated in this order (not shown), by using an insulating sheet having a large dielectric constant between the power supply layer 18 and the ground layer 16, a so-called It has an electrical characteristic that a decoupling capacitor can be formed and power supply noise can be reduced.

【0010】信号層14は2層以上の多層に形成するこ
ともできる。また絶縁体シート20上に複数の半導体チ
ップを搭載できるよう、インナーリード14aを配線す
るようにしてもよい。さらに図1に破線で示すように、
パッケージ10の側面、さらには半導体チップ28上面
を覆って樹脂38により封止することにより、湿気の進
入等を防止でき、気密性を確保できる。上記実施例では
アウターリード14bにより直接基板上に実装するタイ
プの例を示したが、図3に示すように、上記のアウター
リード14bに金属板を加工した厚手のアウターリード
40をはんだ付けして固定し、このアウターリード40
が外部に露出するようにして全体を封止樹脂38にて封
止するようにしてもよい。厚手のアウターリード40を
用いることによってアウターリード40の変形を防止で
きる。
The signal layer 14 can also be formed in multiple layers of two or more. The inner leads 14a may be wired so that a plurality of semiconductor chips can be mounted on the insulating sheet 20. Further, as shown by the broken line in FIG.
By covering the side surface of the package 10 and further the upper surface of the semiconductor chip 28 with the resin 38 and sealing with the resin 38, it is possible to prevent ingress of moisture and the like and ensure airtightness. In the above-described embodiment, an example of the type in which the outer leads 14b are directly mounted on the substrate is shown. However, as shown in FIG. 3, the thick outer leads 40 made of a metal plate are soldered to the outer leads 14b. Fix this outer lead 40
May be exposed to the outside, and the whole may be sealed with the sealing resin 38. By using the thick outer lead 40, deformation of the outer lead 40 can be prevented.

【0011】図4は他の実施例を示す。前記実施例と同
一の部材は同一の符号をもって示す。14は信号層、1
6は接地層、18は電源層であり、やはり絶縁体シート
20、22を介して積層して形成されている。接地層1
6、電源層18は前記実施例と同様に金属箔をエッチン
グして形成され、一方信号層14は通常のリードフレー
ム、すなわち金属板をプレス加工もしくはエッチング加
工して形成されている。絶縁体シート20上には金属箔
をエッチング加工して形成された前記と同様のランド2
5、27が所定の配列で形成されている(図5)。ラン
ド25には接地層16に接続するビア24が接続され、
ランド27には電源層18に接続するビア26が接続さ
れる。またランド25、27上にはバンプ34が形成さ
れている。
FIG. 4 shows another embodiment. The same members as those in the above embodiment are designated by the same reference numerals. 14 is a signal layer, 1
Reference numeral 6 is a ground layer, and 18 is a power supply layer, which are also formed by laminating insulating sheets 20 and 22. Ground layer 1
6. The power supply layer 18 is formed by etching a metal foil as in the above embodiment, while the signal layer 14 is formed by pressing or etching a normal lead frame, that is, a metal plate. The same land 2 as described above is formed by etching a metal foil on the insulator sheet 20.
5, 27 are formed in a predetermined arrangement (FIG. 5). Vias 24 connected to the ground layer 16 are connected to the land 25,
Vias 26 connected to the power supply layer 18 are connected to the lands 27. Bumps 34 are formed on the lands 25 and 27.

【0012】絶縁体シート20上には前記のごとく金属
板により形成したリードフレームからなる信号層14が
積層され、図6に示すように、ビア24のいくつかは接
地用リード30にバンプ34を介して接続され、ビア2
6のいくつかは電源用リード32にバンプ34を介して
接続されている。同図に示すように、ビア24、26は
インナーリード14a間のスペース部分に導出されるよ
う配列されている。また信号層14のインナーリード1
4a先端上にもランド25、27上のバンプ34と高さ
が同じくなるようにしてバンプ34が形成されている。
半導体チップ36は前記と同様にしてバンプ34を介し
て各対応する端子が接続され、しかる後封止樹脂38に
より封止して半導体装置に完成される。本実施例におい
ても前記と同様の作用効果を奏する。
The signal layer 14 made of a lead frame formed of a metal plate as described above is laminated on the insulator sheet 20, and some of the vias 24 have bumps 34 on the grounding lead 30, as shown in FIG. Connected through via 2
Some of 6 are connected to the power supply lead 32 via bumps 34. As shown in the figure, the vias 24 and 26 are arranged so as to be led out to the space portion between the inner leads 14a. Also, the inner lead 1 of the signal layer 14
The bumps 34 are also formed on the tip of the 4a so as to have the same height as the bumps 34 on the lands 25 and 27.
The semiconductor chip 36 is connected to the corresponding terminals via the bumps 34 in the same manner as described above, and then sealed with the sealing resin 38 to complete the semiconductor device. Also in the present embodiment, the same operational effects as described above are exhibited.

【0013】以上本発明につき好適な実施例を挙げて種
々説明したが、本発明はこの実施例に限定されるもので
はなく、発明の精神を逸脱しない範囲内で多くの改変を
施し得るのはもちろんである。
Although the present invention has been variously described with reference to the preferred embodiments, the present invention is not limited to these embodiments, and many modifications can be made without departing from the spirit of the invention. Of course.

【0014】[0014]

【発明の効果】本発明に係る半導体装置用パッケージに
よれば、その大きさを搭載する半導体チップのサイズと
ほぼ同じくできるので、小型化が図れる。また、接地
層、電源層は、各ビアおよび共通のリードにより外部に
接続できるので、リードの本数を少なくでき、それだけ
信号層を密にできるので多ピン化に対応できる。また、
本発明に係る半導体装置によれば、パッケージ内に信号
層と別に面積の大きな接地層と電源層をもっている多層
構造をなすため、信号層に対してはストリップラインと
してクロストークを抑えられるうえ、電源系に対しては
インダクタンスが低いため電源雑音を小さくでき、特に
高周波特性に優れるという電気的特性を有する。
According to the semiconductor device package of the present invention, the size thereof can be made substantially the same as the size of the semiconductor chip to be mounted, so that the size can be reduced. Further, since the ground layer and the power supply layer can be connected to the outside by the respective vias and the common lead, the number of leads can be reduced, and the signal layer can be made dense accordingly, so that the number of pins can be increased. Also,
According to the semiconductor device of the present invention, since the package has a multi-layered structure having a ground layer and a power supply layer having a large area separately from the signal layer, crosstalk can be suppressed as a strip line for the signal layer, and the power supply can be suppressed. Since the system has a low inductance, power supply noise can be reduced, and the system has electrical characteristics that are particularly excellent in high frequency characteristics.

【図面の簡単な説明】[Brief description of drawings]

【図1】半導体装置の一例を示す断面図である。FIG. 1 is a cross-sectional view showing an example of a semiconductor device.

【図2】パッケージの平面図を示す。FIG. 2 shows a plan view of the package.

【図3】他の実施例を示す断面図である。FIG. 3 is a sectional view showing another embodiment.

【図4】さらに他の実施例を示す断面図である。FIG. 4 is a sectional view showing still another embodiment.

【図5】図4に示す実施例の接地層、電源層に接続され
るビア構造を示す部分断面図である。
5 is a partial cross-sectional view showing a via structure connected to a ground layer and a power supply layer of the embodiment shown in FIG.

【図6】図4に示す実施例のビアの導出部位を示す部分
平面図である。
FIG. 6 is a partial plan view showing a lead-out portion of a via of the embodiment shown in FIG.

【符号の説明】[Explanation of symbols]

10 半導体装置 12 パッケージ 14 信号層 16 接地層 18 電源層 20、22 絶縁体シート 24、26 ビア 25、27 ランド 28 半導体チップ 30、32 リード 34 バンプ 38 封止樹脂 10 semiconductor device 12 package 14 signal layer 16 ground layer 18 power supply layer 20, 22 insulating sheet 24, 26 via 25, 27 land 28 semiconductor chip 30, 32 lead 34 bump 38 sealing resin

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 金属箔により形成された、少なくとも信
号層、電源層、接地層の3層が絶縁体シートを介して積
層され、 前記信号層は、前記絶縁体シート上に配線された複数の
インナーリードと、該インナーリードに一体的に接続す
る外部接続用のアウターリードとを有し、 前記電源層および接地層からは、前記絶縁体シートを貫
通して前記信号層に露出した複数の電源用ビア、接地用
ビアが導出され、 該ビアのうちの選択されたビアが前記信号層のリードに
接続されていることを特徴とする半導体装置用パッケー
ジ。
1. At least three layers of a signal layer, a power supply layer, and a ground layer, which are formed of a metal foil, are laminated with an insulating sheet interposed therebetween, and the signal layer has a plurality of wiring lines formed on the insulating sheet. A plurality of power sources having inner leads and outer leads for external connection that are integrally connected to the inner leads, and exposed from the power supply layer and the ground layer to the signal layer through the insulating sheet. A semiconductor device package, characterized in that a power via and a ground via are led out, and a selected via of the vias is connected to a lead of the signal layer.
【請求項2】 前記信号層のインナーリードが、複数の
半導体チップを搭載可能に配線されていることを特徴と
する請求項1記載の半導体装置用パッケージ。
2. The semiconductor device package according to claim 1, wherein the inner leads of the signal layer are wired so that a plurality of semiconductor chips can be mounted.
【請求項3】 少なくとも信号層、電源層、接地層の3
層が絶縁体シートを介して積層され、 前記信号層は、金属板を加工して形成され、前記絶縁体
シート上に所定のパターンで配線された複数のインナー
リードと、該インナーリードに一体的に接続する外部接
続用のアウターリードとを有し、 前記電源層および接地層は金属箔により形成されると共
に、該電源層および接地層からは、前記絶縁体シートを
貫通して前記信号層のインナーリード間に露出した複数
の電源用ビア、接地用ビアが導出され、 該ビアのうちの選択されたビアが前記信号層のリードに
接続されていることを特徴とする半導体装置用パッケー
ジ。
3. At least a signal layer, a power layer, and a ground layer
Layers are laminated via an insulating sheet, and the signal layer is formed by processing a metal plate, and a plurality of inner leads wired in a predetermined pattern on the insulating sheet, and integrated with the inner leads. An outer lead for external connection to be connected to, the power supply layer and the ground layer is formed of a metal foil, from the power supply layer and the ground layer, through the insulator sheet of the signal layer A semiconductor device package, wherein a plurality of power supply vias and grounding vias exposed between inner leads are led out, and selected vias of the vias are connected to leads of the signal layer.
【請求項4】 請求項1、2または3記載の半導体装置
用パッケージの信号層のインナーリード、電源用ビア、
接地用ビアに、半導体チップの信号用端子、電源用端
子、接地用端子がそれぞれバンプを介して接続されてい
ることを特徴とする半導体装置。
4. The inner lead of the signal layer of the semiconductor device package according to claim 1, 2 or 3, a power supply via,
A semiconductor device in which a signal terminal, a power supply terminal, and a grounding terminal of a semiconductor chip are connected to a grounding via via bumps, respectively.
JP25327793A 1993-10-08 1993-10-08 Semiconductor device package and semiconductor device Pending JPH07106503A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25327793A JPH07106503A (en) 1993-10-08 1993-10-08 Semiconductor device package and semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25327793A JPH07106503A (en) 1993-10-08 1993-10-08 Semiconductor device package and semiconductor device

Publications (1)

Publication Number Publication Date
JPH07106503A true JPH07106503A (en) 1995-04-21

Family

ID=17249050

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25327793A Pending JPH07106503A (en) 1993-10-08 1993-10-08 Semiconductor device package and semiconductor device

Country Status (1)

Country Link
JP (1) JPH07106503A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100248682B1 (en) * 1995-04-27 2000-03-15 가네꼬 히사시 Semiconductor device and installing method of semiconductor chip
JP2004014896A (en) * 2002-06-10 2004-01-15 Fuji Electric Holdings Co Ltd Resin sealed semiconductor device and its manufacturing method
KR101134706B1 (en) * 2010-10-01 2012-04-13 엘지이노텍 주식회사 Leadframe and method for manufacturing the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100248682B1 (en) * 1995-04-27 2000-03-15 가네꼬 히사시 Semiconductor device and installing method of semiconductor chip
JP2004014896A (en) * 2002-06-10 2004-01-15 Fuji Electric Holdings Co Ltd Resin sealed semiconductor device and its manufacturing method
KR101134706B1 (en) * 2010-10-01 2012-04-13 엘지이노텍 주식회사 Leadframe and method for manufacturing the same

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