JPH0695401B2 - Optical disk spin developing method and apparatus - Google Patents
Optical disk spin developing method and apparatusInfo
- Publication number
- JPH0695401B2 JPH0695401B2 JP59034283A JP3428384A JPH0695401B2 JP H0695401 B2 JPH0695401 B2 JP H0695401B2 JP 59034283 A JP59034283 A JP 59034283A JP 3428384 A JP3428384 A JP 3428384A JP H0695401 B2 JPH0695401 B2 JP H0695401B2
- Authority
- JP
- Japan
- Prior art keywords
- developing
- resist
- developing solution
- spin
- supply
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003287 optical effect Effects 0.000 title claims description 12
- 238000000034 method Methods 0.000 title claims description 11
- 239000000243 solution Substances 0.000 claims description 26
- 239000012089 stop solution Substances 0.000 claims description 4
- 238000007599 discharging Methods 0.000 claims 1
- 230000001678 irradiating effect Effects 0.000 claims 1
- 229920002120 photoresistant polymer Polymers 0.000 description 10
- 238000010586 diagram Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000011521 glass Substances 0.000 description 3
- 244000201986 Cassia tora Species 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- NCAIGTHBQTXTLR-UHFFFAOYSA-N phentermine hydrochloride Chemical compound [Cl-].CC(C)([NH3+])CC1=CC=CC=C1 NCAIGTHBQTXTLR-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 230000003068 static effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B23/00—Record carriers not specific to the method of recording or reproducing; Accessories, e.g. containers, specially adapted for co-operation with the recording or reproducing apparatus ; Intermediate mediums; Apparatus or processes specially adapted for their manufacture
- G11B23/0057—Intermediate mediums, i.e. mediums provided with an information structure not specific to the method of reproducing or duplication such as matrixes for mechanical pressing of an information structure ; record carriers having a relief information structure provided with or included in layers not specific for a single reproducing method; apparatus or processes specially adapted for their manufacture
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は光デイスクの製造装置に係り、特にホトレジス
ト原盤に一定の断面形状の溝を安定に形成する光デイス
クのスピン現像方法及び装置に関するものである。Description: BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to an optical disk manufacturing apparatus, and more particularly to an optical disk spin developing method and apparatus for stably forming grooves having a constant cross-sectional shape on a photoresist master. is there.
案内溝をそなえた光デイスクのホトレジスト原盤を形成
する場合、原盤を一定速度で回転させながら、所定の溝
間隔になるように記録用ヘッドと一定相対速度で移動さ
せ、ホトレジスト上に一定エネルギー密度の光を露光
し、これを現像することにより、案内溝を形成する。従
来においては一定温度、濃度の現像液中に一定時間浸漬
して現像する方法や、一定濃度、温度の現像液を、回転
原盤上にシヤワーするスピン現像法、あるいは第１図に
示すような現像の進行を溝による光の回折を利用してモ
ニターするモニタースピン現像装置がある。例えば、特
開昭58−169356号を参照。第１図において、１はガラス
板、２はホトレジスト膜、３は回転用モーター、４はモ
ニター用He−Neレーザ、５はミラー、6,7は第０次およ
び第１次回折光A,B用のホトデイテクター、8,9は増巾
器、10は演算器、11は基準電圧発生器、12はコンパレー
ター、13,14は現像液および現像停止液a,b用電磁弁、1
5,16はそれぞれのノズルである。ノズルは矢印に示す方
向に移動させることが出来る。現像の進行により、割算
器10の出力が基準レベルを越えると、電磁弁が働いて現
像液をストツプし現像停止液をシヤワーして現像を停止
させるようになつている。溝の形成にあたつて、ホトレ
ジストを底迄打抜く場合にはこの従来装置で十分である
が、ホトレジストの現像を途中で止める中間調現像によ
つて溝形成を行う場合、従来装置では溝深さにバラツキ
が出て、一定の深さの溝を作ることは困難である。これ
はホトレジストの深さ方向に対してはホトレジストが強
く感光しているために、露光、現像条件のわずかなバラ
ツキによつて現像量が大きく変わるためである。特にス
ピン現像の場合、デイスク半径方向で深さが大きく変化
する欠点があつた。When forming a photoresist master of an optical disc with a guide groove, while rotating the master at a constant speed, the master is moved at a constant relative speed with the recording head so that a predetermined groove interval is obtained, and a constant energy density on the photoresist is maintained. A guide groove is formed by exposing it to light and developing it. Conventionally, a method of developing by immersing in a developing solution of constant temperature and concentration for a certain period of time, a spin developing method of showering a developing solution of constant concentration and temperature on a rotating master, or developing as shown in FIG. There is a monitor spin developing device that monitors the progress of the process using the diffraction of light by the groove. See, for example, JP-A-58-169356. In FIG. 1, 1 is a glass plate, 2 is a photoresist film, 3 is a rotation motor, 4 is a monitor He-Ne laser, 5 is a mirror, and 6 and 7 are for 0th and 1st order diffracted lights A and B. Photo detector, 8 and 9 are amplifiers, 10 is a calculator, 11 is a reference voltage generator, 12 is a comparator, 13 and 14 are solenoid valves for developing solution and developing stop solutions a and b, 1
Reference numerals 5 and 16 are respective nozzles. The nozzle can be moved in the direction indicated by the arrow. When the output of the divider 10 exceeds the reference level due to the progress of the development, the solenoid valve operates to stop the developing solution and shower the developing stopping solution to stop the developing. When forming a groove, this conventional device is sufficient for punching the photoresist to the bottom, but when the groove is formed by halftone development that stops the development of the photoresist halfway, the conventional device does not have the groove depth. It is difficult to form a groove with a certain depth due to the unevenness. This is because the photoresist is strongly exposed in the depth direction of the photoresist, and the amount of development greatly changes due to slight variations in exposure and development conditions. Especially in the case of spin development, there is a drawback that the depth changes greatly in the radial direction of the disk.
本発明の目的はこのような欠点を除去し、デイスク全面
にわたつて一定の深さの溝形成が可能な、ホトレジスト
原盤のスピン現像方法及び装置を提供することにある。It is an object of the present invention to provide a method and apparatus for spin development of a photoresist master, which eliminates such drawbacks and enables formation of a groove having a constant depth over the entire surface of a disk.
本発明は、ディスク上への現像液の供給量がディスクの
回転中心からの距離にほぼ比例するようにしたことを特
徴とするものである。The present invention is characterized in that the supply amount of the developing solution onto the disc is substantially proportional to the distance from the rotation center of the disc.
ホトレジストの露光エネルギー密度が一定の場合、溝形
状、特に深さの一様性は現像の一様性に依存する。スピ
ン現像の場合、デイスクが回転しているため、デイスク
上の現像液は外側にすみやかに排出される。現像液にか
かる遠心力は注目点のデイスク回転中心からの距離に比
例する。デイスク上の注目点での現像力は、現像液の滞
留時間と、新鮮現像液の供給量に比例すると考えられ
る。滞留時間は現像液にかかる力、すなわち遠心力の逆
数に比例するため、注目点での新鮮現像液の供給量を注
目点の回転中心からの距離に比例するようにすれば、現
像力は回転中心からの距離によらず一定となることにな
る。When the exposure energy density of the photoresist is constant, the groove shape, especially the uniformity of depth depends on the uniformity of development. In the case of spin development, since the disk is rotating, the developing solution on the disk is quickly discharged to the outside. The centrifugal force applied to the developing solution is proportional to the distance from the center of rotation of the disk of interest. The developing power at the point of interest on the disk is considered to be proportional to the residence time of the developing solution and the supply amount of fresh developing solution. Since the residence time is proportional to the force applied to the developer, that is, the reciprocal of the centrifugal force, if the supply amount of fresh developer at the point of interest is made proportional to the distance from the center of rotation of the point of interest, the developing force will rotate. It will be constant regardless of the distance from the center.
以下、本発明の一実施例を第２図により説明する。第２
図は本発明によるスピン現像装置のノズル部分を示す図
であり、他の構成は第１図と同じである。ガラス板１上
に塗布されたホストレジスト２上に多孔ノズル17から現
像液が各孔18を通つて流下するようになつている。ガラ
ス板はモータ３により回転する。孔18の位置の回転中心
からの距離をγとすると、孔18の面積Ｓ（γ）はγに比
例するようにし、孔からの流下量がγに比例するように
している。従つて各孔の面積は異つている。この場合、
各孔には現像液の動圧がなるべくかからないように、静
圧が孔からの流出量を決めるようにノズル内の空間部分
19を広くとる必要がある。そうしないと、流下量は孔面
積に比例しなくなる。例としてあげれば、記録径がφ13
5mmからφ280mmの場合、最外孔径2mmで、6mmピツチに計
16個の孔をあけたノズルで、全流量約1.2／分で一様
な結果が得られた。An embodiment of the present invention will be described below with reference to FIG. Second
The drawing shows the nozzle portion of the spin developing apparatus according to the present invention, and the other structure is the same as that of FIG. On the host resist 2 coated on the glass plate 1, the developing solution flows from the porous nozzle 17 through each hole 18. The glass plate is rotated by the motor 3. When the distance from the center of rotation of the position of the hole 18 is γ, the area S (γ) of the hole 18 is proportional to γ, and the amount of flow down from the hole is proportional to γ. Therefore, the area of each hole is different. in this case,
The space inside the nozzle so that the static pressure determines the outflow rate from each hole so that the dynamic pressure of the developer is not applied to each hole as much as possible.
It is necessary to take 19 widely. Otherwise, the flow rate will not be proportional to the pore area. For example, the recording diameter is φ13.
From 5 mm to φ280 mm, the outermost hole diameter is 2 mm and the total pitch is 6 mm.
A nozzle with 16 holes provided uniform results at a total flow rate of about 1.2 / min.
第３図は本発明の別の実施例を示す図である。第２図と
同様にノズル部分のみを示す。本実施例ではノズルの空
間部分を狭くして、現像液の動圧が孔にかかり、流出量
を決める例を示している。この場合、孔21からの流出量
は孔の面積に必ずしも比例しない。従つてここでは例と
して数値をあげると、最外孔径2mmで6mmピツチに計16個
の孔をその径が孔の回転中心からの距離に比例するよう
にあけ、空間の断面径4mmとしたときに、全流量を約1.2
／分とすると一様な結果が得られた。いずれにして
も、新規現像液の流下供給量が回転中心からの距離に比
例するようにすればよい。FIG. 3 is a diagram showing another embodiment of the present invention. As in FIG. 2, only the nozzle portion is shown. In this embodiment, the space of the nozzle is narrowed, and the dynamic pressure of the developer is applied to the hole to determine the outflow amount. In this case, the amount of outflow from the hole 21 is not necessarily proportional to the area of the hole. Therefore, to give a numerical value as an example here, when the outermost hole diameter is 2 mm, a total of 16 holes are opened in a 6 mm pitch so that the diameter is proportional to the distance from the rotation center of the hole, and the cross-sectional diameter of the space is 4 mm. And the total flow rate is about 1.2
A uniform result was obtained with / min. In any case, the flow rate of the new developer supplied may be proportional to the distance from the center of rotation.
第４図は本発明の別の実施例を示す図である。FIG. 4 is a diagram showing another embodiment of the present invention.
本実施例では現像液ノズル23を１個とし、このノズルを
デイスク半径方向にスキヤンすることにより、時間平均
的にみて、ノズルの回転中心からの距離γにおける平均
滞留時間が距離γに比例するようしている。現像時間を
60秒程度とすると、半径方向のスキヤンくり返し回数は
30回程度は必要である。第２図〜第４図の実施例におい
ては煩雑さをさけるために図示しなかつたが、第１図と
同様に構成にして、現像の進行をモニターすることによ
り、更に安定に一定深さの溝を形成することが出来る。In this embodiment, one developing solution nozzle 23 is provided, and by scanning this nozzle in the disk radial direction, the average residence time at the distance γ from the center of rotation of the nozzle is proportional to the distance γ in terms of time average. is doing. Development time
When it is set to about 60 seconds, the number of times of skiing in the radial direction
About 30 times is necessary. In the embodiment shown in FIGS. 2 to 4, it is not shown in order to avoid complication, but the same construction as that shown in FIG. Grooves can be formed.
以上、本発明によれば、デイスク全面にわたり安定に所
定断面形状の溝を形成することが可能となり、信頼性の
高い原盤作製が可能となる。従つて、光デイスクにとつ
て最適な形状の溝が形成でき、記録再生ヘツドの位置決
めが安定となり、信頼性の高いデータの記録が可能とな
る効果がある。また生産面でみると、原盤作製の歩留り
が向上し、コスト低下の効果も得られる。As described above, according to the present invention, it is possible to stably form a groove having a predetermined cross-sectional shape over the entire surface of the disk, and it is possible to manufacture a highly reliable master disk. Therefore, there is an effect that a groove having an optimum shape can be formed on the optical disk, the recording / reproducing head is positioned stably, and highly reliable data recording can be performed. In terms of production, the production yield of the master can be improved and the cost can be reduced.
第１図は従来のモニタースピン現像装置の概略を示す
図、第２図〜第４図は本発明の実施例を示す図であり、
スピン現像装置のノズル部分を示している。FIG. 1 is a diagram showing an outline of a conventional monitor spin developing device, and FIGS. 2 to 4 are diagrams showing an embodiment of the present invention.
The nozzle part of a spin developing device is shown.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 長手 弘 大阪府茨木市丑寅１丁目１番88号 日立マ クセル株式会社内 (72)発明者 渡辺 均 大阪府茨木市丑寅１丁目１番88号 日立マ クセル株式会社内 (56)参考文献 特開 昭59−78342（ＪＰ，Ａ) 特開 昭56−110933（ＪＰ，Ａ) 特開 昭54−102123（ＪＰ，Ａ) ─────────────────────────────────────────────────── ─── Continuation of front page (72) Inventor Hiroshi Naga, 1-1-88, Tora, Ibaraki-shi, Osaka Within Hitachi Maxell Co., Ltd. (72) Inventor, Hitoshi Watanabe 1-88, Tora, Ibaraki-shi, Osaka Hitachi Maxel Co., Ltd. (56) Reference JP-A-59-78342 (JP, A) JP-A-56-110933 (JP, A) JP-A-54-102123 (JP, A)
Claims (8)
スク板を回転させながら、該レジスト上へ現像液を供給
してパターンを現像するスピン現像方法であって、前記
現像液のレジストへの供給量が前記ディスク板の回転中
心からの距離に比例するようにしたことを特徴とする光
ディスクのスピン現像方法。1. A spin developing method of developing a pattern by supplying a developing solution onto the resist while rotating a disc plate with a resist having a desired pattern exposed, the amount of the developing solution being supplied to the resist. Is proportional to the distance from the center of rotation of the disk plate.
ぼ垂直に入射させ、その透過光と１次回折光の強度比を
検出し、該強度比が所定の大きさに達したときに前記現
像液の供給を停止するとともに、現像停止液を供給して
現像を停止させることを特徴とする特許請求の範囲第１
項に記載の光ディスクのスピン現像方法。2. A laser beam is made to enter the resist-coated disk plate substantially vertically, the intensity ratio between the transmitted light and the first-order diffracted light is detected, and when the intensity ratio reaches a predetermined level, the developing solution is obtained. Claim 1 wherein the supply of the developing solution is stopped and the developing stop solution is supplied to stop the development.
Item 5. A spin developing method for an optical disk according to item.
めに前記ディスク板の半径方向に配列した複数の吐出口
を有するノズルを用い、各吐出口からの前記現像液の供
給量を前記ディスク板の回転中心から各吐出口の位置ま
での距離に比例するようにしたことを特徴とする特許請
求の範囲第１項又は第２項に記載の光ディスクのスピン
現像方法。3. A nozzle having a plurality of ejection openings arranged in a radial direction of the disk plate is used to supply the developing solution onto the resist, and the supply amount of the developing solution from each ejection opening is changed to the disk. The spin developing method for an optical disk according to claim 1 or 2, wherein the spin developing method is proportional to the distance from the rotation center of the plate to the position of each ejection port.
めに前記現像液の吐出口を前記ディスク板の半径方向に
走査し、該吐出口から供給された前記現像液が前記レジ
スト上に滞在する平均時間が前記ディスク板の回転中心
からの距離に比例するようにしたことを特徴とする特許
請求の範囲第１項又は第２項に記載の光ディスクのスピ
ン現像方法。4. The supply port of the developer is scanned in the radial direction of the disk plate to supply the developer onto the resist, and the developer supplied from the discharge port stays on the resist. The spin developing method for an optical disk according to claim 1 or 2, characterized in that the average time to perform is proportional to the distance from the center of rotation of the disk plate.
スク板を回転させる回転手段と、回転している前記ディ
スク板の前記レジスト上へ現像液を供給する現像液供給
手段とを備え、前記現像液供給手段から前記レジスト上
へ供給される前記現像液の供給量が前記ディスク板の回
転中心からの距離に比例するように前記現像供給手段を
構成したことを特徴とする光ディスクのスピン現像装
置。5. A developing solution, comprising: rotating means for rotating a resist-coated disk plate exposed with a desired pattern; and developing solution supplying means for supplying a developing solution onto the resist of the rotating disk plate. An optical disk spin developing apparatus, wherein the developing supply means is configured such that an amount of the developing solution supplied from the supply means onto the resist is proportional to a distance from a rotation center of the disk plate.
射する照射手段と、前記ディスク板へ照射したレーザ光
の透過光と１次回折光の強度比を検出する検出手段と、
該強度比が所定の大きさに達したときに、前記現像液の
前記レジスト上への供給を停止するように前記現像供給
手段を制御するとともに、現像停止液が前記レジスト上
へ供給されるように現像停止液供給手段を制御する手段
とを有することを特徴とする特許請求の範囲第５項に記
載の光ディスクのスピン現像装置。6. An irradiation means for irradiating the disk plate with laser light substantially vertically, and a detecting means for detecting the intensity ratio of the transmitted light of the laser light and the first-order diffracted light irradiated on the disk plate.
When the intensity ratio reaches a predetermined value, the developing supply means is controlled so that the supply of the developing solution onto the resist is stopped, and the developing stop solution is supplied onto the resist. 6. The spin developing device for an optical disk according to claim 5, further comprising: a means for controlling a developing stop solution supply means.
径方向に配列した複数の吐出口を有するノズルを備え、
各吐出口からの前記現像液の供給量が前記ディスク板の
回転中心から各吐出口の位置までの距離に比例するよう
にしたことを特徴とする特許請求の範囲第５項又は第６
項に記載の光ディスクのスピン現像装置。7. The developing supply means comprises a nozzle having a plurality of ejection openings arranged in the radial direction of the disk plate,
7. The supply amount of the developing solution from each ejection port is proportional to the distance from the center of rotation of the disc plate to the position of each ejection port.
Item 6. A spin developing device for an optical disk described in the paragraph.
ジスト上へ吐出するノズルを前記ディスク板の半径方向
に走査する手段を備え、該ノズルから供給された前記現
像液の前記レジスト上に滞在する平均時間が前記ディス
ク板の回転中心からの距離に比例するようにしたことを
特徴とする特許請求の範囲第５項又は第６項に記載の光
ディスクのスピン現像装置。8. The developing supply means comprises means for scanning a nozzle for discharging the developing solution onto the resist in the radial direction of the disk plate, and the developing solution supplied from the nozzle onto the resist. The spin developing device for an optical disk according to claim 5 or 6, wherein an average staying time is proportional to a distance from a rotation center of the disk plate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59034283A JPH0695401B2 (en) | 1984-02-27 | 1984-02-27 | Optical disk spin developing method and apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59034283A JPH0695401B2 (en) | 1984-02-27 | 1984-02-27 | Optical disk spin developing method and apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60179957A JPS60179957A (en) | 1985-09-13 |
| JPH0695401B2 true JPH0695401B2 (en) | 1994-11-24 |
Family
ID=12409828
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59034283A Expired - Lifetime JPH0695401B2 (en) | 1984-02-27 | 1984-02-27 | Optical disk spin developing method and apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0695401B2 (en) |
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|---|---|---|---|---|
| JP3588568B2 (en) * | 1998-08-19 | 2004-11-10 | 東京エレクトロン株式会社 | Developing device |
| JP3526266B2 (en) * | 2000-10-12 | 2004-05-10 | 沖電気工業株式会社 | Photoresist developing nozzle, photoresist developing apparatus, and photoresist developing method |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54102123A (en) * | 1978-01-27 | 1979-08-11 | Matsushita Electric Ind Co Ltd | Developing method |
| JPS56110933A (en) * | 1980-01-25 | 1981-09-02 | Chiyou Lsi Gijutsu Kenkyu Kumiai | Developing method |
| JPS5817444A (en) * | 1981-07-24 | 1983-02-01 | Hitachi Ltd | Photoresist developing device |
| JPS5963726A (en) * | 1982-10-05 | 1984-04-11 | Toshiba Corp | Device for developing photo resist |
| JPS5978342A (en) * | 1982-10-28 | 1984-05-07 | Fujitsu Ltd | Resist film developing method |
| JPS60103830U (en) * | 1983-12-20 | 1985-07-15 | 株式会社東芝 | rotary developing device |
-
1984
- 1984-02-27 JP JP59034283A patent/JPH0695401B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60179957A (en) | 1985-09-13 |
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