JPH0688864B2 - Rectifier for single crystal pulling equipment - Google Patents

Rectifier for single crystal pulling equipment

Info

Publication number
JPH0688864B2
JPH0688864B2 JP23353089A JP23353089A JPH0688864B2 JP H0688864 B2 JPH0688864 B2 JP H0688864B2 JP 23353089 A JP23353089 A JP 23353089A JP 23353089 A JP23353089 A JP 23353089A JP H0688864 B2 JPH0688864 B2 JP H0688864B2
Authority
JP
Japan
Prior art keywords
cylinder
single crystal
window
rectifying
graphite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP23353089A
Other languages
Japanese (ja)
Other versions
JPH0397688A (en
Inventor
哲宏 小田
淳 岩崎
啓 内川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin Etsu Handotai Co Ltd
Original Assignee
Shin Etsu Handotai Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin Etsu Handotai Co Ltd filed Critical Shin Etsu Handotai Co Ltd
Priority to JP23353089A priority Critical patent/JPH0688864B2/en
Publication of JPH0397688A publication Critical patent/JPH0397688A/en
Publication of JPH0688864B2 publication Critical patent/JPH0688864B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Crystals, And After-Treatments Of Crystals (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はCZ法による単結晶引上装置に用いられ、垂直上
方に引き上げられる単結晶を同心に包囲し、内部に不活
性ガスが流下される単結晶引上装置用整流筒に関する。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention is used in a single crystal pulling apparatus by the CZ method, concentrically surrounding a single crystal pulled vertically upward, and an inert gas is flowed down inside. The present invention relates to a rectifying cylinder for a single crystal pulling apparatus.

[従来の技術] CZ法により、石英坩堝内のSi融液からSi単結晶を引き上
げる際、石英坩堝とSi融液との反応により、揮発性SiO
が生成され、坩堝端縁、Si単結晶、引上軸及びチャンバ
内壁に析出する。回転しながら上昇する引上軸に析出し
たSiOは、上方蓋部の気密用シールリングにより掻き落
とされ、下方の融液に落込み、育成中の単結晶に欠陥が
生ずる。そこで、引上軸と同軸に、チャンバ内に整流筒
を融液面上150〜350mmまで垂下させ、上方から整流筒内
にArガスを流下させ、融液面から蒸発したSiOをArガス
とともにチャンバ下部から排出させる方法が提案されて
いる(特公昭54-6511号公報)。
[Prior Art] When pulling a Si single crystal from the Si melt in the quartz crucible by the CZ method, the reaction between the quartz crucible and the Si melt causes volatile SiO
Are generated and are deposited on the crucible edge, the Si single crystal, the pulling shaft and the chamber inner wall. The SiO deposited on the pull-up shaft that rises while rotating is scraped off by the airtight seal ring of the upper lid, drops into the melt below, and causes defects in the growing single crystal. Therefore, coaxially with the pulling shaft, a rectifying cylinder is hung in the chamber to 150 to 350 mm above the melt surface, Ar gas is allowed to flow into the rectifying cylinder from above, and SiO evaporated from the melt surface is stored in the chamber together with Ar gas. A method of discharging from the lower part has been proposed (Japanese Patent Publication No. 54-6511).

他方、この整流筒の下端を外上方に折り返した形状のカ
ラーを付設することにより、固液界面付近の単結晶の上
下方向温度勾配を大きくして、結晶成長速度を大きくす
るとともに、単結晶中の酸素濃度を低くして酸化誘起欠
陥(OISF)及びスワール欠陥を低減させ、しかも上記Si
O排出効果を高める方法が提案されている。(特開昭64-
65086号公報)。
On the other hand, by attaching a collar with the lower end of this rectifying tube folded outward and upward, the vertical temperature gradient of the single crystal near the solid-liquid interface is increased to increase the crystal growth rate and Oxygen-induced defects (OISF) and swirl defects are reduced by lowering the oxygen concentration of
A method for enhancing the O 2 emission effect has been proposed. (Japanese Patent Laid-Open No. 64-
65086 publication).

このような整流筒は、耐熱性、加工容易性及びコストの
観点から、黒鉛で形成するのが好ましいが、引き上げ直
後のSi単結晶の形状を観察したり、固液界面の直径を光
学的に計測することができず、直径の自動制御や良好な
Si単結晶育成の妨げになる。そこで、整流筒の下端部に
窓穴を形成することが上記公報において提案されてい
る。
Such a rectifying tube is preferably formed of graphite from the viewpoint of heat resistance, processability and cost, but it is possible to observe the shape of the Si single crystal immediately after pulling or to optically determine the diameter of the solid-liquid interface. Unable to measure, automatic diameter control and good
It hinders the growth of Si single crystals. Therefore, it is proposed in the above publication to form a window hole at the lower end of the flow straightening cylinder.

[発明が解決しようとする課題] ところが、窓穴を形成すると、整流筒の下端開口から流
出するArガスの流量が少なくなり、上記効果が低減する
ことになる。例えば、融液表面からの酸素蒸発量が少な
くなって、Si単結晶の酸素濃度が大きくなる。具体的に
は、酸素濃度を18ppma以下にすることが困難となり、高
集積化を推進しているデバイスメーカの最近の要求に応
えることができない。このような問題点は、Arガスの流
量を大きくすることにより解決される。しかし、実際に
行なってみると、後述の実験例に示すように、この量は
大量、例えば200l/minにもなりコスト高となることがわ
かった。チャンバ(炉)内の圧力を下げて酸素蒸発量を
増やすこともできるが、石英坩堝とSi融液との反応が大
きくなって石英坩堝の寿命が短くなり、コスト高とな
る。
[Problems to be Solved by the Invention] However, when the window hole is formed, the flow rate of Ar gas flowing out from the lower end opening of the flow straightening cylinder is reduced, and the above effect is reduced. For example, the amount of oxygen evaporated from the surface of the melt decreases and the oxygen concentration of the Si single crystal increases. Specifically, it becomes difficult to reduce the oxygen concentration to 18 ppma or less, and it is not possible to meet the recent demands of device manufacturers who are promoting high integration. Such problems are solved by increasing the flow rate of Ar gas. However, when actually performed, it was found that this amount becomes a large amount, for example, 200 l / min, and the cost becomes high, as shown in an experimental example described later. Although it is possible to decrease the pressure in the chamber (furnace) to increase the amount of oxygen evaporated, the reaction between the quartz crucible and the Si melt becomes large and the life of the quartz crucible becomes short, resulting in high cost.

本発明の目的は、このような問題点に鑑み、不活性ガス
の流量を大きくすることなくかつ上記各効果を低減させ
ずに、単結晶の形状を観察することができ、しかも、製
作容易で大幅なコスト高とならない単結晶引上装置用整
流筒を提供することにある。
In view of such problems, an object of the present invention is to observe the shape of a single crystal without increasing the flow rate of an inert gas and without reducing the above-mentioned effects, and further, it is easy to manufacture. An object of the present invention is to provide a rectifying cylinder for a single crystal pulling device that does not significantly increase the cost.

[課題を解決するための手段] この目的を達成するために、本発明に係る単結晶引上装
置用整流筒では、坩堝が内設されたメインチャンバの上
端開口部に上端開口部が接続され垂直上方に引き上げら
れる単結晶を同心に包囲し下部側面に窓孔が形成された
第1の黒鉛製円筒と、該窓孔を覆う石英製窓板とを備え
ている。
[Means for Solving the Problem] In order to achieve this object, in a rectifying cylinder for a single crystal pulling apparatus according to the present invention, an upper end opening is connected to an upper end opening of a main chamber in which a crucible is provided. It is provided with a first graphite cylinder concentrically surrounding a single crystal pulled vertically upward and having a window formed on a lower side surface thereof, and a quartz window plate covering the window.

具体的な窓板取付構造は、例えば、内径が前記円筒の外
径に略等しく前記窓孔に対応した窓孔が形成された第2
の黒鉛製円筒を、該両窓孔を一致させて前記第1の円筒
に嵌入係止し、該第1の円筒と該第2の円筒の接合面の
該窓孔縁部に溝を形成し、該溝に前記窓板の縁部が嵌入
した構造となっている。
A specific window plate mounting structure is, for example, a second window in which an inner diameter is substantially equal to an outer diameter of the cylinder and a window hole corresponding to the window hole is formed.
The graphite cylinder is fitted into and locked in the first cylinder with the both window holes aligned, and a groove is formed in the window hole edge portion of the joint surface of the first cylinder and the second cylinder. The structure is such that the edge portion of the window plate is fitted in the groove.

他の具体的な窓板取付構造では、前記窓板を、外径が前
記第1の円筒の内径に略等しい円筒で構成し、これを前
記第1の円筒に嵌入係止した構造となっている。
In another specific window plate mounting structure, the window plate is configured by a cylinder having an outer diameter substantially equal to the inner diameter of the first cylinder, and is fitted and locked in the first cylinder. There is.

なお、整流筒下端に、外側上方へ突出した黒鉛製カラー
を取り付けてもよい。
It should be noted that a graphite collar protruding outward and upward may be attached to the lower end of the flow straightening cylinder.

また、必要性は少ないが、整流筒やこのカラーの表面を
SiCでコーティングして劣化をより小さくするようにし
てもよい。
Also, although it is not necessary, the surface of the rectifying cylinder and this collar should be
It may be coated with SiC to make the deterioration smaller.

[作用] 整流筒に窓孔を形成しているので、引き上げ直後のSi単
結晶の形状を観察することができ、直径の光学的計測が
可能となり、また、良好なSi単結晶を育成することが可
能となる。
[Function] Since the rectifying cylinder has a window hole, the shape of the Si single crystal immediately after being pulled can be observed, the diameter can be optically measured, and a good Si single crystal can be grown. Is possible.

この窓孔は窓板で覆われているので、整流筒内を流下す
る不活性ガスは全て整流筒の下端と融液面との間を通
り、不活性ガスの流量を特に大きくしなくても、単結晶
内の酸素濃度を低減でき、引上軸等へのSiO析出を防止
でき、かつ、単結晶成長速度を大きくすることができ
る。
Since this window hole is covered with the window plate, all the inert gas flowing down in the straightening cylinder passes between the lower end of the straightening cylinder and the melt surface, and the flow rate of the inert gas does not need to be particularly large. It is possible to reduce the oxygen concentration in the single crystal, prevent SiO precipitation on the pulling shaft, etc., and increase the single crystal growth rate.

また、整流筒の材料としては、耐熱性があり不純物を放
出しないものが要求され、セラミック等も考えられる
が、本体の円筒を成形容易で安価な黒鉛で形成し、窓孔
部分のみ、すなわち必要部分のみを石英で覆っているの
で、整流筒全体としては、製作容易であり、かつ、大幅
なコスト高とならない。
In addition, as the material of the flow straightening cylinder, one that is heat resistant and does not emit impurities is required, and ceramics and the like can be considered, but the cylinder of the main body is made of graphite that is easy to mold and is inexpensive, and only the window hole portion, that is, the necessary Since only part of the rectifying cylinder is covered with quartz, the rectifying cylinder as a whole is easy to manufacture and does not significantly increase the cost.

[実施例] 以下、図面に基づいて本発明の実施例を説明する。[Embodiment] An embodiment of the present invention will be described below with reference to the drawings.

(1)第1実施例 第1図は単結晶引上装置用整流筒の使用状態を示す。(1) First Example FIG. 1 shows a use state of a rectifying cylinder for a single crystal pulling apparatus.

メインチャンバ10の上端開口12には、サブチャンバ14が
接続されている。サブチャンバ14の側壁にはArガス供給
用の入口ジョイント14aが形成され、メインチャンバ10
の底面にはArガス吸引排出用の排出孔10aが形成され、
メインチャンバ10の肩部には引上単結晶観察用の覗き窓
10b及び固液界面の直径計測用ITVが対向配置される別の
覗き窓(不図示)が設けられている。このメインチャン
バ10内には、昇降及び回転可能な昇降回転軸16の上端に
テーブル18が固着され、このテーブル18上に黒鉛坩堝20
が載置され、黒鉛坩堝20内に石英坩堝22が嵌合されてい
る。黒鉛坩堝20の周囲はヒータ24で囲繞され、ヒータ24
の周囲は黒鉛断熱壁26で囲繞されている。石英坩堝22内
に多結晶Siを入れ、ヒータ24に電力を供給すると、この
Siが溶解され融液28となる。
A sub chamber 14 is connected to the upper end opening 12 of the main chamber 10. An inlet joint 14a for supplying Ar gas is formed on the side wall of the sub chamber 14, and the main chamber 10
A discharge hole 10a for suctioning and discharging Ar gas is formed on the bottom surface of
A viewing window on the shoulder of the main chamber 10 for observing the pulled single crystal
Another viewing window (not shown) is provided opposite to 10b and the ITV for measuring the diameter of the solid-liquid interface. In this main chamber 10, a table 18 is fixed to the upper end of an elevating and lowering rotary shaft 16 which can be raised and lowered and rotated, and a graphite crucible 20 is mounted on the table 18.
Is placed, and a quartz crucible 22 is fitted in the graphite crucible 20. The circumference of the graphite crucible 20 is surrounded by a heater 24.
The periphery of is surrounded by a graphite heat insulating wall 26. When polycrystalline Si is put in the quartz crucible 22 and power is supplied to the heater 24,
Si is melted to form a melt 28.

一方、サブチャンバ14の中心線に沿って上下動される引
上軸30の下端には、種ホルダ32を介して種結晶34が保持
されている。
On the other hand, a seed crystal 34 is held via a seed holder 32 at the lower end of the pulling shaft 30 which is vertically moved along the center line of the sub-chamber 14.

また、メインチャンバ10の上端開口部には、整流筒38の
本体である黒鉛製長円筒40の上端開口が接続されてい
る。この長円筒40は、引上軸30と同心に垂直に配置され
ている。長円筒40の長さは、長円筒40の下端から融液28
の表面までの距離が5〜100mmになるようにする。ま
た、長円筒の内径は、整流筒38の内面と単結晶36の表面
との最短距離が5〜100mmになるようにする。
Further, the upper end opening of the main chamber 10 is connected to the upper end opening of a graphite elongated cylinder 40 which is the main body of the flow straightening cylinder 38. The elongated cylinder 40 is arranged concentrically with the pulling shaft 30 and vertically. The length of the long cylinder 40 is measured from the lower end of the long cylinder 40 to the melt 28
Make sure that the distance to the surface is 5 to 100 mm. The inner diameter of the long cylinder is such that the shortest distance between the inner surface of the flow straightening cylinder 38 and the surface of the single crystal 36 is 5 to 100 mm.

長円筒40の下部側面には、観察用の窓孔40aが形成され
ている。長円筒40の下端には、縮径して半径方向内側に
向いた係止部40bが形成されている。
An observation window 40a is formed on the lower side surface of the oblong cylinder 40. At the lower end of the oblong cylinder 40, a locking portion 40b that is reduced in diameter and faces inward in the radial direction is formed.

第2図に示す如く、外径が長円筒40の内径に略等しい黒
鉛製短円筒42の側面にも、窓孔40aと同一形状の窓孔42a
が形成されている。短円筒42の外周面の窓孔42a縁部に
は溝枠42bが形成されており、これに石英製窓板44の縁
部が嵌合される。この状態で、短円筒42が長円筒40内に
嵌入され、窓孔42aと窓孔40aとを一致させた状態で短円
筒42が長円筒40の係止部40bにより係止される。第3図
は、この係止状態での、窓部を通る横断面を示す。
As shown in FIG. 2, on the side surface of the graphite short cylinder 42 whose outer diameter is approximately equal to the inner diameter of the long cylinder 40, a window hole 42a having the same shape as the window hole 40a is formed.
Are formed. A groove frame 42b is formed at the edge of the window hole 42a on the outer peripheral surface of the short cylinder 42, and the edge of the quartz window plate 44 is fitted into the groove frame 42b. In this state, the short cylinder 42 is fitted into the long cylinder 40, and the short cylinder 42 is locked by the locking portion 40b of the long cylinder 40 with the window hole 42a and the window hole 40a aligned. FIG. 3 shows a cross section through the window in this locked state.

係止部40bの外周面には、第1図に示す如く、この外周
面と同一傾斜を有する中空円錐台状の黒鉛製カラー46の
小径側端部が接合されている。
As shown in FIG. 1, a small-diameter side end of a hollow truncated cone-shaped graphite collar 46 having the same inclination as the outer peripheral surface is joined to the outer peripheral surface of the locking portion 40b.

次に、上記の如く構成された本実施例の動作を説明す
る。
Next, the operation of this embodiment configured as described above will be described.

メインチャンバ10内を真空ポンプで減圧し、サブチャン
バ14の入口ジョイント14aからArガスを供給し、メイン
チャンバ10の排出孔10aからArガスを吸引排出させる。A
rガスの供給量又は排出量を調節して、メインチャンバ1
0内の圧力を100mbar程度にする。次に、ヒータ24に電力
を供給して石英坩堝22内の多結晶シリコンを加熱溶融
し、融液28を形成する。次に、引上軸30を下降させて種
結晶34を融液28内に漬け、引き上げて単結晶36を育成す
る。この際、作業者はメインチャンバ10の覗き窓10bか
ら窓板44を通して単結晶36を観察しながら、良好な単結
晶36が育成されるように各種制御量を調節(自動制御量
を補正)する。
The pressure inside the main chamber 10 is reduced by a vacuum pump, Ar gas is supplied from the inlet joint 14a of the sub chamber 14, and Ar gas is sucked and discharged from the discharge hole 10a of the main chamber 10. A
Adjust the amount of gas supply or exhaust to adjust the main chamber 1
Set the pressure in 0 to about 100 mbar. Next, electric power is supplied to the heater 24 to heat and melt the polycrystalline silicon in the quartz crucible 22 to form a melt 28. Then, the pulling shaft 30 is lowered to immerse the seed crystal 34 in the melt 28, and the seed crystal 34 is pulled up to grow a single crystal 36. At this time, the operator observes the single crystal 36 through the viewing window 10b of the main chamber 10 through the window plate 44 and adjusts various control amounts (corrects the automatic control amount) so that a good single crystal 36 is grown. .

一方、Arガスは整流筒38内を流下し、その全てが整流筒
38の下端と融液28の表面との間を通り、カラー46の外面
と石英坩堝22の内面との間を通って石英坩堝22から排出
され、下降して排出孔10aから吸引排出される。
On the other hand, Ar gas flows down in the rectifying cylinder 38, and all of the Ar gas is rectifying cylinder.
It is discharged from the quartz crucible 22 through the space between the lower end of 38 and the surface of the melt 28, between the outer surface of the collar 46 and the inner surface of the quartz crucible 22, and descends to be sucked and discharged through the discharge hole 10a.

したがって、融液28と石英坩堝22との反応により生成さ
れた揮発性SiOは、このArガスの流れにのって排出孔10a
から排出され、石英坩堝22の内周面、カラー46の外面、
単結晶36、種ホルダ32及び引上軸30等にSiOが析出する
のを防止することができる。また、このArガスの流れに
より融液28から蒸発する酸素量が多くなり、単結晶36の
酸素濃度が低くなるので、酸化誘導欠陥及びスワール欠
陥が低減される。
Therefore, the volatile SiO produced by the reaction between the melt 28 and the quartz crucible 22 is discharged through the discharge holes 10a along with the flow of Ar gas.
Is discharged from the inner surface of the quartz crucible 22, the outer surface of the collar 46,
It is possible to prevent SiO from depositing on the single crystal 36, the seed holder 32, the pulling shaft 30, and the like. Further, since the amount of oxygen evaporated from the melt 28 is increased by the flow of Ar gas and the oxygen concentration of the single crystal 36 is lowered, oxidation-induced defects and swirl defects are reduced.

また、単結晶36の周囲を覆うようにArガスが通るので、
単結晶36が冷却される。さらに、カラー46は、融液28か
ら直接受ける輻射熱及び石英坩堝22の内面で反射された
輻射熱を吸収して加熱されるが、Arガスにより冷却され
るので、長円筒40の下部の温度はカラー46を設けない場
合よりも相当低くなる。したがって、固液界面付近の単
結晶36の上下方向温度勾配が大きくなり、単結晶36の成
長速度が大きくなる。このことは、単結晶36の単位長さ
当たりの酸素取り込み量が少なくなることを意味し、単
結晶36の酸素濃度低減に寄与する。
Also, since Ar gas passes so as to cover the periphery of the single crystal 36,
The single crystal 36 is cooled. Further, the collar 46 is heated by absorbing the radiant heat directly received from the melt 28 and the radiant heat reflected on the inner surface of the quartz crucible 22, but is cooled by Ar gas, so that the temperature at the lower part of the long cylinder 40 is the color. It is considerably lower than the case without 46. Therefore, the temperature gradient in the vertical direction of the single crystal 36 near the solid-liquid interface becomes large, and the growth rate of the single crystal 36 becomes large. This means that the amount of oxygen taken up per unit length of the single crystal 36 is reduced, which contributes to the reduction of the oxygen concentration of the single crystal 36.

(2)第2実施例 第4図は第2実施例の整流筒の下端部横断面を示す。(2) Second Embodiment FIG. 4 shows a transverse cross section of the lower end portion of the flow straightening cylinder of the second embodiment.

この整流筒では、第1実施例よりも狭い矩形の窓孔40c
を黒鉛製長円筒窓40Aの下部側面に3箇所形成し、これ
に対応して黒鉛製短円筒42Aにも矩形の窓孔42cを3箇所
形成し、各短円筒42Aの外周面の窓孔42c縁部に溝枠42d
を形成し、各溝枠42dに平らな矩形の石英製窓板44Aを嵌
め入れている。
In this straightening cylinder, a rectangular window hole 40c narrower than that of the first embodiment is used.
Are formed on the lower side surface of the graphite long cylindrical window 40A at three locations, and correspondingly, the graphite short cylinders 42A are also provided with three rectangular window holes 42c, and the window holes 42c on the outer peripheral surface of each short cylinder 42A are formed. Groove frame 42d on the edge
And a flat rectangular quartz window plate 44A is fitted into each groove frame 42d.

この第2実施例では、平らな窓板を用いているので第1
実施例よりも制作容易であり、かつ、整流筒をより安価
に構成することができる。
In this second embodiment, since the flat window plate is used, the first
The production is easier than in the embodiment, and the rectifying cylinder can be constructed at a lower cost.

(3)第3実施例 第5図は本発明の第3実施例の下部構成を示す。(3) Third Embodiment FIG. 5 shows a lower structure of the third embodiment of the present invention.

長円筒40は第1実施例のものと同一形状であるが、短円
筒42及び窓板44の代わりに、外径が長円筒40の内径に略
等しい石英製円筒形窓板44aを長円筒40内に嵌入係止さ
せている。
The long cylinder 40 has the same shape as that of the first embodiment, but instead of the short cylinder 42 and the window plate 44, a quartz cylindrical window plate 44a having an outer diameter substantially equal to the inner diameter of the long cylinder 40 is used. It is fitted and locked inside.

この第3実施例では、任意の窓孔の形状に対し同一形状
の窓板44aを用いることができるという利点がある。
The third embodiment has an advantage that the window plate 44a having the same shape can be used for any shape of the window hole.

(4)実験例 次に、実験例を説明する。(4) Experimental Example Next, an experimental example will be described.

(A)比較の基準となる条件は次の通りである。(A) The conditions that serve as a reference for comparison are as follows.

Arガス流量 :100l/min メインチャンバ10内圧力:100mbar 整流筒38の内径:200mm 整流筒38の下端から融液面28の表面までの初期距離 :3
0mm 窓孔40aの面積:200cm2(必要充分な面積) 窓板44なし 単結晶36の直径:6inch 上記条件の下で、単結晶36の直胴部10cm以降の酸素濃度
は20ppmaであった。また、この直胴部の横断面における
酸素濃度分布の分散D D=100(CC-CP)/CC は15%であった。ここに、 CC:中心の酸素濃度 CP:周面から中心側へ3mmの位置の酸素濃度である。酸
素濃度は、この最大値を基準値以下にすることが要求さ
れるので、分散Dを小さくする必要がある。
Ar gas flow rate: 100 l / min Main chamber 10 pressure: 100 mbar Inner diameter of rectifying cylinder 38: 200 mm Initial distance from lower end of rectifying cylinder 38 to surface of melt surface 28: 3
0 mm Area of the window hole 40a: 200 cm 2 (necessary and sufficient area) No window plate 44 Diameter of the single crystal 36: 6 inch Under the above conditions, the oxygen concentration after the straight body part 10 cm of the single crystal 36 was 20 ppma. The dispersion D D of the oxygen concentration distribution in the cross section of the straight body portion was D D = 100 (C C -C P ) / C C was 15%. Where C C is the oxygen concentration at the center C P is the oxygen concentration at a position 3 mm from the peripheral surface toward the center. Since the oxygen concentration is required to have this maximum value equal to or lower than the reference value, it is necessary to reduce the dispersion D.

(B)上記基準条件のうち、Arガス流量のみを200l/min
に変えた場合、酸素濃度を約1.5ppma低下させることが
できた。しかし、上記分散Dは20%と悪化した。
(B) Of the above standard conditions, only Ar gas flow rate is 200 l / min
When changed to, the oxygen concentration could be reduced by about 1.5 ppma. However, the dispersion D was deteriorated to 20%.

(C)上記(A)の基準条件において、窓孔に窓板を取
り付け、他を同一条件にした場合、酸素濃度を約3ppma
低下させることができた。また、上記分散Dは13%で、
僅かに改善された。
(C) Under the standard conditions of (A) above, when the window plate is attached to the window hole and the other conditions are the same, the oxygen concentration is about 3 ppma.
Could be lowered. The dispersion D is 13%,
Slightly improved.

[発明の効果] 以上説明した如く、本発明に係る単結晶引上装置用整流
筒では、下端部に窓孔を設け、この窓孔を窓板で覆って
いるので、整流筒内を流下する不活性ガスは全て整流筒
の下端と融液面との間を通り、不活性ガスの流量を特に
大きくしなくても、引上軸等にSiOが析出するのを防止
でき、単結晶の成長速度を大きくすることができ、さら
に、酸化誘導欠陥及びスワール欠陥を低減させることが
でき、また、本体の円筒を成形容易で安価な黒鉛で形成
し、窓孔部分のみ、すなわち必要部分のみを石英で覆っ
ているので、整流筒全体としては、製作容易であり、か
つ、大幅なコスト高とならないという優れた効果を奏す
る。
[Effects of the Invention] As described above, in the rectifying cylinder for a single crystal pulling apparatus according to the present invention, the lower end portion is provided with the window hole and the window hole is covered with the window plate, so that the rectifying tube flows down. All of the inert gas passes between the lower end of the rectifying cylinder and the melt surface, and SiO can be prevented from precipitating on the pulling shaft, etc. without increasing the flow rate of the inert gas, and single crystal growth can be prevented. It is possible to increase the speed and further reduce the oxidation-induced defects and swirl defects.The cylinder of the main body is made of graphite which is easy to mold and is inexpensive, and only the window hole portion, that is, only the necessary portion is made of quartz. Since it is covered with, the rectifying cylinder as a whole has an excellent effect that it is easy to manufacture and the cost is not significantly increased.

【図面の簡単な説明】[Brief description of drawings]

第1図乃至第3図は本発明に係る単結晶引上装置用整流
筒の第1実施例に係り、 第1図は整流筒の使用状態を示す概略縦断面図、 第2図は整流筒の下部構成を示す分解斜視図、 第3図は第2図の組付け状態でのIII-III線断面図であ
る。 第4図は本発明の第2実施例に係る整流筒の下部構成を
示す横断面図である。 第5図は本発明の第3実施例に係る整流筒の下部構成を
示す分解斜視図である。 図中、 10はメインチャンバ 12は開口 14はサブチャンバ 22は石英坩堝 28は融液 30は引上軸 36は単結晶 38は整流筒 40は黒鉛製長円筒 40a、40c、42a、42cは窓孔 42、42Aは黒鉛製短円筒 42b、42dは溝枠 44、44A、44Bは石英製窓板 46は黒鉛製カラー
1 to 3 relate to a first embodiment of a rectifying cylinder for a single crystal pulling apparatus according to the present invention, FIG. 1 is a schematic vertical sectional view showing a condition of use of the rectifying cylinder, and FIG. 2 is a rectifying cylinder. FIG. 3 is an exploded perspective view showing the lower structure of FIG. 3, and FIG. 3 is a sectional view taken along line III-III in the assembled state of FIG. FIG. 4 is a cross-sectional view showing the lower structure of the flow straightening cylinder according to the second embodiment of the present invention. FIG. 5 is an exploded perspective view showing the lower structure of the flow straightening cylinder according to the third embodiment of the present invention. In the figure, 10 is a main chamber 12, an opening 14 is a subchamber 22, a quartz crucible 28 is a melt 30, a pulling shaft 36 is a single crystal 38, a rectifying cylinder 40 is a graphite elongated cylinder 40a, 40c, 42a, 42c is a window. Holes 42 and 42A are graphite short cylinders 42b and 42d are groove frames 44, 44A and 44B are quartz window plates 46 are graphite collars.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】坩堝(22)が内設されたメインチャンバ
(10)の上端開口(12)部に上端開口部が接続され、垂
直上方に引き上げられる単結晶(36)を同心に包囲し、
下部側面に窓孔(40a、40c)が形成された第1の黒鉛製
円筒(40、40A)と、 該窓孔を覆う石英製窓板(44、44A、44B)と、 を有することを特徴とする単結晶引上装置用整流筒。
1. A main chamber (10) having a crucible (22) internally provided with an upper end opening (12) connected to the upper end opening to concentrically surround a single crystal (36) pulled vertically upward.
A first graphite cylinder (40, 40A) having window holes (40a, 40c) formed on the lower side surface, and a quartz window plate (44, 44A, 44B) covering the window hole. A rectifying cylinder for a single crystal pulling device.
【請求項2】外径が前記円筒の内径に略等しく、前記窓
孔(40a、40c)に対応した窓孔(42a、42c)が形成され
た第2の黒鉛製円筒(42、42A)が、該両窓孔を一致さ
せて前記第1の円筒(40、40A)に嵌入係止され、 該第1の円筒と該第2の円筒の接合面の該窓孔縁部に溝
(42b、42d)が形成され、該溝に前記窓板(44、44A)
の縁部が嵌入されたことを特徴とする請求項1記載の単
結晶引上装置用整流筒。
2. A second graphite cylinder (42, 42A) having an outer diameter substantially equal to the inner diameter of the cylinder and having window holes (42a, 42c) corresponding to the window holes (40a, 40c). , The both window holes are aligned with each other and fitted and locked in the first cylinder (40, 40A), and the groove (42b, 42b, at the edge of the window hole of the joint surface of the first cylinder and the second cylinder). 42d) is formed, and the window plate (44, 44A) is formed in the groove.
The rectifying cylinder for a single crystal pulling apparatus according to claim 1, wherein an edge portion of the single crystal pulling apparatus is fitted.
【請求項3】前記窓板(44B)は、内径が前記第1の円
筒(40)の外形に略等しい円筒であり、前記第1の円筒
に嵌入係止されて前記窓孔(40a)を覆うことを特徴と
する請求項1記載の単結晶引上装置用整流筒。
3. The window plate (44B) is a cylinder having an inner diameter substantially equal to the outer shape of the first cylinder (40), and the window plate (44B) is fitted and locked in the first cylinder so as to close the window hole (40a). The rectifying cylinder for a single crystal pulling apparatus according to claim 1, which is covered.
JP23353089A 1989-09-09 1989-09-09 Rectifier for single crystal pulling equipment Expired - Lifetime JPH0688864B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23353089A JPH0688864B2 (en) 1989-09-09 1989-09-09 Rectifier for single crystal pulling equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23353089A JPH0688864B2 (en) 1989-09-09 1989-09-09 Rectifier for single crystal pulling equipment

Publications (2)

Publication Number Publication Date
JPH0397688A JPH0397688A (en) 1991-04-23
JPH0688864B2 true JPH0688864B2 (en) 1994-11-09

Family

ID=16956489

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23353089A Expired - Lifetime JPH0688864B2 (en) 1989-09-09 1989-09-09 Rectifier for single crystal pulling equipment

Country Status (1)

Country Link
JP (1) JPH0688864B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
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Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2569053Y2 (en) * 1992-10-09 1998-04-22 コマツ電子金属株式会社 Semiconductor single crystal manufacturing equipment
WO2001081661A1 (en) * 2000-04-25 2001-11-01 Shin-Etsu Handotai Co.,Ltd. Silicon single-crystal wafer, method for producing silicon single crystal, and method for fabricating silicon single-crystal wafer
WO2002103092A1 (en) * 2001-06-14 2002-12-27 Shin-Etsu Handotai Co., Ltd. Production device for semiconductor single crystal and production method for semiconductor single crystal using it
JP5092940B2 (en) 2008-07-01 2012-12-05 信越半導体株式会社 Single crystal manufacturing apparatus and single crystal manufacturing method
JP5409215B2 (en) * 2009-09-07 2014-02-05 Sumco Techxiv株式会社 Single crystal pulling device
JP5505359B2 (en) * 2011-04-13 2014-05-28 信越半導体株式会社 Heater output control method and single crystal manufacturing apparatus
KR101435172B1 (en) * 2012-10-08 2014-09-01 웅진에너지 주식회사 Heat shield structure for silicon ingot grower

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111575783A (en) * 2019-02-18 2020-08-25 信越半导体株式会社 Silicon single crystal pulling apparatus

Also Published As

Publication number Publication date
JPH0397688A (en) 1991-04-23

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