JPH0683036A - Reticule for stepping - Google Patents
Reticule for steppingInfo
- Publication number
- JPH0683036A JPH0683036A JP4235786A JP23578692A JPH0683036A JP H0683036 A JPH0683036 A JP H0683036A JP 4235786 A JP4235786 A JP 4235786A JP 23578692 A JP23578692 A JP 23578692A JP H0683036 A JPH0683036 A JP H0683036A
- Authority
- JP
- Japan
- Prior art keywords
- stepping
- light
- reticule
- patterns
- projection exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Landscapes
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
Description
【０００１】[0001]
【産業上の利用分野】本発明は投影露光用レチクルに関
し、特に縮小投影露光時に使用する投影露光用レチクル
に関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a projection exposure reticle, and more particularly to a projection exposure reticle used in reduction projection exposure.
【０００２】[0002]
【従来の技術】従来の投影露光用レチクルは、図３に示
す様に光を透過するガラス基板１の表面に光を透過しな
いクロム遮光パターン２が形成された構造となってい
た。2. Description of the Related Art A conventional projection exposure reticle has a structure in which a chrome light-shielding pattern 2 that does not transmit light is formed on the surface of a glass substrate 1 that transmits light, as shown in FIG.
【０００３】[0003]
【発明が解決しようとする課題】従来の投影露光用レチ
クルは、光を透過しない異物がガラス基板表面に付着す
るとクロム遮光パターンと同一平面上に位置することに
なるので露光されるべき箇所の光が遮られて露光パター
ンに欠陥が発生するという問題点があった。In the conventional projection exposure reticle, when a foreign substance that does not transmit light adheres to the surface of the glass substrate, it is positioned on the same plane as the chrome light shielding pattern. However, there is a problem in that the pattern is blocked and a defect occurs in the exposure pattern.
【０００４】本発明の目的は、露光パターンに欠陥のな
い投影露光用レチクルを提供することにある。An object of the present invention is to provide a projection exposure reticle having no exposure pattern defect.
【０００５】[0005]
【課題を解決するための手段】本発明の投影露光用レチ
クルは、光透過基板内に遮光パターンを埋設して構成さ
れている。The projection exposure reticle of the present invention is constructed by embedding a light shielding pattern in a light transmitting substrate.
【０００６】[0006]
【実施例】次に本発明の実施例について図面を参照して
説明する。Embodiments of the present invention will now be described with reference to the drawings.
【０００７】図１（Ａ）〜（Ｆ）は本発明の一実施例の
製造方法を説明する工程順に示した断面図である。FIGS. 1A to 1F are cross-sectional views showing a sequence of steps for explaining a manufacturing method according to an embodiment of the present invention.
【０００８】投影露光用レチクルは、まず、図１（Ａ）
に示す様に、光を透過するガラス基板１上にレジスト膜
４を被覆し、ホトリソグラフィ技術を用いてパターンを
形成する。The projection exposure reticle is first shown in FIG.
As shown in, the resist film 4 is coated on the glass substrate 1 which transmits light, and a pattern is formed by using the photolithography technique.
【０００９】次に、図１（Ｂ）に示す様に、ガラス基板
１をエッチングし遮光パターンの位置決めを行う。Next, as shown in FIG. 1B, the glass substrate 1 is etched to position the light shielding pattern.
【００１０】次に、図１（Ｃ）に示す様に、スパッタに
よりガラス基板１上にクロム膜５を形成する。Next, as shown in FIG. 1C, a chromium film 5 is formed on the glass substrate 1 by sputtering.
【００１１】次に、図１（Ｄ）に示す様に、クロム膜５
上に酸化膜６を形成する。Next, as shown in FIG. 1D, the chromium film 5 is formed.
An oxide film 6 is formed on top.
【００１２】次に、図１（Ｅ）に示す様に、エッチバッ
クを行い、クロム膜５によるクロム遮光パターン２を形
成する。Next, as shown in FIG. 1E, etching back is performed to form a chrome light-shielding pattern 2 of a chrome film 5.
【００１３】その後、図１（Ｆ）に示すように、再度ガ
ラス基板１上に光を透過する酸化膜６を形成することに
より、光透過基板内に遮光パターンが埋設された投影露
光用レチクルが得られる。Thereafter, as shown in FIG. 1 (F), a projection exposure reticle having a light-shielding pattern embedded therein is formed by forming an oxide film 6 that transmits light again on the glass substrate 1. can get.
【００１４】図２は本発明の一実施例のクロム遮光パタ
ーンと付着した異物の位置関係を説明する断面図であ
る。FIG. 2 is a sectional view for explaining the positional relationship between the chrome light-shielding pattern and the adhering foreign matter according to one embodiment of the present invention.
【００１５】図２に示す様に、この様に構成された投影
露光用レチクルは、クロム遮光パターン２がガラス基板
１と酸化膜６との光透過基板内に埋設されているので直
接クロム遮光パターン２と同一平面上に異物３が付着す
ることはない。そこで、縮小投影露光する際に、縮小投
影レンズの焦点をクロム遮光パターン２に合わせること
で投影露光用レチクル表面に付着した異物３が焦点から
ずれ、投影パターンへ与える影響をおさえ露光パターン
の欠陥を防止することができる。As shown in FIG. 2, in the projection exposure reticle thus constructed, the chrome light-shielding pattern 2 is embedded in the light-transmitting substrate of the glass substrate 1 and the oxide film 6, so that the chrome light-shielding pattern is directly formed. The foreign matter 3 does not adhere to the same plane as 2. Therefore, during the reduction projection exposure, by adjusting the focus of the reduction projection lens to the chrome light-shielding pattern 2, the foreign matter 3 adhering to the surface of the projection exposure reticle deviates from the focus and the influence on the projection pattern is suppressed. Can be prevented.
【００１６】[0016]
【発明の効果】以上説明したように本発明は、光透過基
板内に遮光パターンを埋設したことで、投影露光用レチ
クル表面に付着した異物による投影パターンへの影響を
おさえ、露光パターンの欠陥を防止できるという効果を
有する。As described above, according to the present invention, by embedding the light-shielding pattern in the light-transmitting substrate, the influence of foreign matter adhering to the surface of the projection exposure reticle on the projection pattern is suppressed and the defects of the exposure pattern are prevented. It has an effect that it can be prevented.
【図１】本発明の一実施例の製造方法を説明する工程順
に示した断面図である。1A to 1D are cross-sectional views showing the manufacturing method of one embodiment of the present invention in the order of steps.
【図２】本発明の一実施例のクロム遮光パターンと付着
した異物の位置関係を説明する断面図である。FIG. 2 is a cross-sectional view illustrating a positional relationship between a chrome light-shielding pattern and a foreign substance attached thereto according to an embodiment of the present invention.
【図３】従来の投影露光用レチクルの一例の断面図であ
る。FIG. 3 is a sectional view of an example of a conventional projection exposure reticle.
１ ガラス基板 ２ クロム遮光パターン ３ 異物 ４ レジスト膜 ５ クロム膜 ６ 酸化膜 1 glass substrate 2 chrome light-shielding pattern 3 foreign matter 4 resist film 5 chrome film 6 oxide film
Claims (1)
ことを特徴とする投影露光用レチクル。1. A projection exposure reticle having a light-shielding pattern embedded in a light-transmitting substrate.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4235786A JPH0683036A (en) | 1992-09-03 | 1992-09-03 | Reticule for stepping |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4235786A JPH0683036A (en) | 1992-09-03 | 1992-09-03 | Reticule for stepping |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH0683036A true JPH0683036A (en) | 1994-03-25 |
Family
ID=16991235
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4235786A Withdrawn JPH0683036A (en) | 1992-09-03 | 1992-09-03 | Reticule for stepping |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0683036A (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008062634A1 (en) * | 2006-11-22 | 2008-05-29 | Nano Craft Technologies Co. | Three-dimensional microstructure, method for manufacturing the microstructure, and apparatus for manufacturing the microstructure |
-
1992
- 1992-09-03 JP JP4235786A patent/JPH0683036A/en not_active Withdrawn
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2008062634A1 (en) * | 2006-11-22 | 2008-05-29 | Nano Craft Technologies Co. | Three-dimensional microstructure, method for manufacturing the microstructure, and apparatus for manufacturing the microstructure |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 19991130 |