JPH0679144U - Substrate processing equipment - Google Patents

Abstract

(57) [Summary] [Purpose] To improve the workability of maintenance and to simplify the design. [Configuration] A guide rail 53 is provided on a bottom plate 51a of the substrate processing apparatus.
L, 53R, 55L, 55R are provided, and two bases 61, 63 are mounted on the upper part. The bases 61 and 63 have a box shape capable of storing liquid therein, and the processing liquid pressure-feeding pump 13, the filter 15 and the opening / closing valve 17 provided in the circulation path 11 of the processing tank 1 are mounted on the base 61. Then, the processing liquid pressure pump 23, the filter 25, and the opening / closing valve 27 provided in the circulation path 21 are mounted on the base 63.

Description

[Detailed description of the device]

[0001]

[Industrial applications]

 The present invention relates to a substrate processing apparatus that supplies a required processing liquid to a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal panel, and performs processing such as substrate cleaning and etching on the substrate.

[0002]

[Prior art]

 As this type of substrate processing apparatus, for example, a plurality of processing tanks that individually store various chemicals, pure water, etc. are prepared. By sequentially immersing the substrates in this processing tank, oxide film etching, It is known that a substrate is subjected to processing such as cleaning. In order to remove the fine particles contained in the chemical liquid, such substrate processing equipment adopts a so-called circulation filtering system configuration in which the chemical liquid in each processing tank is filtered by a filter while being circulated by a pump. There is.

[0003]

[Problems to be solved by the device]

 By the way, in such a conventional substrate processing apparatus, the devices such as the pump and the filter are laid out at appropriate positions in the apparatus. Therefore, when performing maintenance, there was a problem that workability was poor because work could not be carried out for each circulation route depending on the type of treatment liquid.

Further, when designing this substrate processing apparatus, since there is no regularity in the layout position of equipment such as a pump and a filter, it is necessary to perform this type of layout individually for each apparatus. There was also the problem of spending a great deal of time on.

The substrate processing apparatus of the present invention has been made in order to solve the above-mentioned problems in the prior art, and an object thereof is to improve the workability of maintenance and to simplify the design.

[0006]

[Means for Solving the Problems]

 In order to achieve such an object, as a means for solving the above-mentioned problems, a substrate processing apparatus of the present invention includes a plurality of processing liquid accommodating portions for individually accommodating a processing liquid for substrate processing, In a substrate processing apparatus having a plurality of processing liquid paths that individually circulate or deliver the processing liquid stored in each processing liquid storage section, the circulation provided in the processing liquid path for each processing liquid path. The gist of the present invention is to provide a base for collecting and placing the shipping or delivery equipment, and to provide a transport path for individually guiding the base to the outside of the apparatus main body.

In such a substrate processing apparatus, it is preferable that each of the bases be formed in a container shape capable of storing a liquid.

[0008]

[Action]

 According to the substrate processing apparatus of the present invention configured as described above, since the processing liquid passage-related tools are collected and mounted on each base, each base is guided to the outside of the apparatus main body. By doing so, it is possible to proceed with work such as maintenance for each processing liquid path. In addition, at the design stage, it is possible to unitize the equipment set for each processing liquid path.

[0009]

【Example】

 A preferred embodiment of the present invention will be described below in order to further clarify the configuration and operation of the present invention described above.

A substrate processing apparatus according to an embodiment of the present invention supplies a semiconductor wafer (hereinafter referred to as a substrate) with a chemical solution, pure water, or the like, and performs processing such as substrate cleaning on the substrate. The pipeline structure of this substrate processing apparatus will be described first with reference to FIG.

As shown in FIG. 1, the substrate processing apparatus includes processing tanks 1 and 2 for individually storing the processing liquids L1 and L2 and accommodating the substrates. An outlet 1a is provided on the bottom wall of the processing tank 1, and a circulation path 11 that returns from the outlet 1a to the upper portion of the processing tank 1 is provided. A processing liquid pressure pump 13, a filter 15, and an opening / closing valve 17 are sequentially provided in the circulation path 11 from the upstream side thereof. On the other hand, the processing tank 2 side is also provided with a circulation path 21 similarly to the processing tank 1 side, and in this circulation path 21, a processing liquid pressure pump 23, a filter 25 and an opening / closing valve 27 are sequentially provided from the upstream side thereof. There is. The processing liquids L1 and L2 stored in the respective processing tanks 1 and 2 are contained in the processing liquids L1 and L2 by being filtered by the filters 15 and 25 while being circulated through the circulation paths 11 and 21 respectively. The fine particles are removed respectively.

Further, a drain pipe 33 that guides the processing liquid L1 to the drain container 31 is provided so as to branch from between the processing liquid pressure pump 13 and the filter 15 on the processing liquid L1 side. Similarly, a drain pipe 35 that guides the treatment liquid L1 to the drain container 31 is provided so as to branch from between the treatment liquid pressure pump 23 and the filter 25 on the treatment liquid L2 side. The drain pipes 33 and 35 are provided with open / close valves 37 and 39, respectively. The open / close valve 37 of the drain pipe 31 is opened and the open / close valve 17 of the circulation path 11 is closed to allow the processing liquid L1 to escape to the drain container 31 side, while the open / close valve 39 of the drain pipe 35 is closed. Is opened and the open / close valve 27 of the circulation path 21 is closed, the treatment liquid L2 can be released to the drain container 31 side. The circulation paths 11 and 21 and the drain pipes 33 and 35 are made of resin and are flexible.

FIG. 2 is a perspective view showing the vicinity of the bottom of the substrate processing apparatus. As shown in FIG. 2, this substrate processing apparatus is provided with two pairs of guide rails 53L, 53R, 55L, 55R on a bottom plate 51a of a housing 51. The guide rails 53L, 53R, 55L, 55R have a concave concave shape, and the groove 57 thereof engages with the protruding pieces 61L, 61R, 63L, 63R of the bottoms of the bases 61, 63 so that the guide rails 53L, 53R, 55L, The bases 61 and 63 are placed on the 55R.

The bases 61 and 63 have a box shape capable of storing liquid inside. On the bottom surface of the base 61, the processing liquid pressure pump 13, the filter 15 and the opening / closing valve 17 provided in the circulation path 11 and the opening / closing valve 37 provided in the drain pipe 33 are placed. Further, on the bottom surface of the base 63, a processing liquid pressure pump 23 provided in the circulation path 21, a filter 25, an open / close valve 27, and an open / close valve 39 provided in the drain pipe 35 are placed.

FIG. 3 shows the positional relationship between the bases 61 and 63 at the bottom T of the substrate processing apparatus. As shown in FIG. 3, the equipment related to the treatment liquid L1, that is, the treatment liquid pressure pump 13, the filter 15, and the opening / closing valves 17 and 37 are gathered and located on the base 61. The processing liquid pressure pump 23, the filter 25, and the opening / closing valves 27, 39 are gathered and located on the base 63. After the substrate processing apparatus is stopped, the bases 61, 63 are guided from the position shown in FIG. 3, that is, the position shown by the chain double-dashed line in FIG. 2, as shown in FIG. It is pulled out of the housing 51 along the rails 53L, 53R, 55L, 55R.

Therefore, in this substrate processing apparatus, it is possible to perform the work separately for the bases 61 and 63 according to the types of the processing liquids L1 and L2 during the work such as the maintenance. There is. In particular, the guide rails 53L, 53R, 55L, 55R allow the bases 61, 63 to be easily carried out to the outside of the main body of the apparatus, so that maintenance work can be performed outside the apparatus, and the workability is excellent. .

Further, since the bases 61 and 63 are used to unitize the set of instruments for each processing liquid path, the substrate processing apparatus can be designed simply by arranging the units. Therefore, the design can be simplified and the time required for the design can be shortened.

Further, in this embodiment, since the bases 61 and 63 are box-shaped, when there is a liquid leak from the pipe line, particularly from the connecting portion between the pipe line and the instrument, the leakage occurs. The treatment liquid can be stored in the bases 61 and 63, and the safety is excellent.

Further, since the bases 61 and 63 can be easily replaced, it is possible to easily cope with a circulatory system having a different conduit configuration by simply replacing the bases 61 and 63 with another one.

Next, another aspect of this embodiment will be described. In this embodiment, as shown in FIG. 4, the circulation paths 11 and 21 and the drain pipes 33 and 35 may be spirally wound to be expandable and contractable. With this configuration, the bases 61 and 63 can be taken out from the main body of the apparatus without pulling these pipes. Further, these conduits may be replaced with spiral ones, and the side walls may have a bellows shape.

Further, in the above-described embodiment, as shown in FIG. 5, liquid leakage sensors 91, 93 for electrically sensing a liquid are provided on the inner bottom surfaces of the bases 61, 63, respectively. The electronic control unit 95 may receive the output signal of (1), and the electronic control unit may display an alarm on the display panel 97 according to the detection status of the leak sensors 91, 93. According to this configuration, when the liquid leakage is detected by the liquid leakage sensors 91, 93, the electronic control unit 95 displays an alarm for each sensor, that is, for each of the processing liquids L1, L2. Therefore, it is possible to easily detect the abnormal circulation path in which the liquid leakage has occurred.

Further, a configuration may be adopted in which a discharge port is provided on the bottom surfaces of the bases 61 and 63, and the valve provided at this discharge port is controlled to be opened and closed by the electronic control unit 95. With this configuration, when the liquid leakage is detected by the liquid leakage sensors 91, 93, the liquid stored in the bases 61, 63 can be automatically discharged to the outside by the electronic control unit 95.

Further, in the above-mentioned embodiment, the instruments placed on the bases 61 and 63 are provided in the circulation paths 11 and 21 from the processing tanks 1 and 2, but instead, the processing liquid is supplied. A processing liquid supply path for supplying the processing liquid from the processing tank to a point of use (for example, a processing liquid discharge nozzle) may be prepared in advance, and an instrument provided in the processing liquid supply path may be the target of the above-described placement. With this configuration, workability such as maintenance can be improved even in the processing liquid supply path to the use point, and the design can be simplified.

Although some embodiments of the present invention have been described in detail above, the present invention is not limited to these embodiments at all, and may be implemented in various modes without departing from the scope of the present invention. Of course, it can be implemented.

[0025]

[Effect of device]

 As described above, in the substrate processing apparatus of the present invention, the equipment is collected by the processing liquid path and placed on the base. Therefore, by guiding each base to the outside of the main body of the apparatus, maintenance etc. can be performed for each processing liquid path. Can proceed. Therefore, it is excellent in workability such as maintenance. Further, since the set of instruments is unitized for each processing liquid path, the design of the device can be simplified and the time required for the design can be shortened.

[Brief description of drawings]

FIG. 1 is a schematic route diagram showing a pipe line configuration of a substrate processing apparatus according to an embodiment of the present invention.

FIG. 2 is a perspective view showing the vicinity of the bottom of this substrate processing apparatus.

FIG. 3 is an explanatory diagram showing a positional relationship between a base and the like on the bottom of the substrate processing apparatus.

FIG. 4 is a perspective view around a base showing another embodiment of this embodiment.

FIG. 5 is a schematic configuration diagram showing another embodiment of this embodiment.

[Explanation of symbols]

 1, 2 ... Treatment tank 11, 21 ... Circulation path 13, 23 ... Treatment liquid pressure pump 15, 25 ... Filter 17, 27 ... Open / close valve 31 ... Drain container 33, 35 ... Drain piping 37, 39 ... Open / close valve 51 ... Housing 53L, 53R, 55L, 55R ... Guide rails 61, 63 ... Base L1 ... Treatment liquid L2 ... Treatment liquid

Claims (2)

[Scope of utility model registration request] 1. A plurality of processing liquid accommodating portions for individually accommodating a processing liquid for processing a substrate, and a plurality of processing liquids for individually circulating or delivering the processing liquids accommodated in the processing liquid accommodating portions from the respective processing liquid accommodating portions. In a substrate processing apparatus having a processing liquid path, each processing liquid path is provided with a base for collecting and mounting circulation or delivery equipment provided in the processing liquid path, and each of the bases is individually provided. A substrate processing apparatus having a transfer path leading to the outside of the apparatus main body. 2. The substrate processing apparatus according to claim 1, wherein each base is formed in a container shape capable of storing a liquid.