JPH0668427A - Magneto-resistance effect type head and its manufacture - Google Patents

Magneto-resistance effect type head and its manufacture

Info

Publication number
JPH0668427A
JPH0668427A JP22044292A JP22044292A JPH0668427A JP H0668427 A JPH0668427 A JP H0668427A JP 22044292 A JP22044292 A JP 22044292A JP 22044292 A JP22044292 A JP 22044292A JP H0668427 A JPH0668427 A JP H0668427A
Authority
JP
Japan
Prior art keywords
film
magnetic
magnetoresistive
domain control
magnetic domain
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP22044292A
Other languages
Japanese (ja)
Other versions
JP2781103B2 (en
Inventor
Katsuro Watanabe
克朗 渡辺
Hiroshi Fukui
宏 福井
Moriaki Fuyama
盛明 府山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP22044292A priority Critical patent/JP2781103B2/en
Publication of JPH0668427A publication Critical patent/JPH0668427A/en
Application granted granted Critical
Publication of JP2781103B2 publication Critical patent/JP2781103B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PURPOSE:To provide a magneto-resistance effect type head in which a Barkhausen noise can be suppressed and with high output by stack-ink magnetic domain control film and magneto-resistance effect film between electrodes, and attaching magnetic anisotropy on them in directions different from each other. CONSTITUTION:The magnetic domain control film 12 and the magneto-resistance effect film 11 are stacked on lover gap film 19 formed on lower shield film 17 on a nonmagnetic substrate 10 so as to keep magnetic continuity. After that, the magnetic anisotropy in the directions different from each other are attached on the film 12 and the film 11. Thereby, an effective anisotropic magnetic field when the film 12 and the film 11 are stacked can be decreased, which improves sensitivity. Therefore, it is possible to suppress the Barkhausen noise and to improve the sensitivity and to obtain high output in the magneto- resistance effect type head.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、磁気的に記録された情
報の再生に用いられる磁気抵抗効果型ヘッド及びそれを
用いた磁気ディスク装置に関し、特に感度が高く大きな
出力が得られる磁気抵抗効果型ヘッド及びそれを用いた
磁気ディスク装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a magnetoresistive head used for reproducing magnetically recorded information and a magnetic disk device using the same, and more particularly to a magnetoresistive effect with high sensitivity and high output. The present invention relates to a die head and a magnetic disk device using the same.

【0002】[0002]

【従来の技術】磁気抵抗効果(以下、MRと称す)素子
を使用して磁気的に記録された情報を再生することがで
きることは公知であったが、近年の磁気ディスク装置の
小型化、高密度化の進行に伴い、ディスクとヘッドの相
対速度に依存せずに高い再生出力電圧が得られるMRヘ
ッドの開発が急がれている。MR素子においては、電気
抵抗が磁化ベクトルと電流がなす角度に依存して変化す
ることから、媒体からの磁界による磁化変化の機構とし
ては磁壁移動ではなく磁化回転が望ましい。また、磁壁
移動が起こると、再生波形にバルクハウゼンノイズとし
て現われ読み取りエラ−の原因となるので、磁壁移動は
抑えなければならない。
2. Description of the Related Art It has been known that magnetically recorded information can be reproduced by using a magnetoresistive (hereinafter referred to as MR) element. With the progress of densification, development of an MR head that can obtain a high reproduction output voltage without depending on the relative speed of the disk and the head is urgently required. In the MR element, since the electric resistance changes depending on the angle formed by the magnetization vector and the current, the rotation of the magnetization is preferable as the mechanism of the change of the magnetization due to the magnetic field from the medium, not the domain wall movement. Further, when the domain wall motion occurs, it appears as Barkhausen noise in the reproduced waveform and causes a read error, so the domain wall motion must be suppressed.

【0003】このため、MR膜を単一の磁区からなる単
磁区構造にする、あるいは磁壁移動を抑制するなど磁区
構造を制御するための手段が発明されている。具体的に
は、特開昭62-40610号において反強磁性膜とMR膜とを
積層して、磁気交換結合により単磁区構造にする方法
が、特開平2-220213において永久磁石膜とMR膜を積層
して単磁区構造にする方法が提案されている。
For this reason, means have been invented for controlling the magnetic domain structure such that the MR film has a single magnetic domain structure composed of a single magnetic domain, or domain wall movement is suppressed. Specifically, a method of stacking an antiferromagnetic film and an MR film in JP-A-62-40610 to form a single domain structure by magnetic exchange coupling is disclosed in JP-A-2-220213. There has been proposed a method of stacking layers to form a single domain structure.

【0004】[0004]

【発明が解決しようとする課題】しかしながら、上記特
開昭62-40610号や特開平2-220213号に記載されている方
法は、MR膜の磁区構造の制御は確実に行うことができ
る反面、実効的な異方性磁界が大きくなり、磁化回転が
起こりにくくなる。そのため、磁気抵抗効果膜が媒体か
らの磁界を検出する部分に、反強磁性膜または永久磁石
膜をMR膜に積層されていると、磁気ヘッドの出力が低
下するという問題がある。また、磁気抵抗効果膜が媒体
の磁界を検出する部分すなわち電極間の部分の、実効的
な異方性磁界の増加を抑えるために、上記反強磁性膜ま
たは上記永久磁石膜を除いた構造にすると、感度が向上
する反面、磁区構造を制御する膜(以下、磁区制御膜と
呼ぶ)の端部においてMR膜に磁壁が出現し、バルクハ
ウゼンノイズが発生することがあるという問題がある。
However, while the methods described in JP-A-62-40610 and JP-A-2-220213 can surely control the magnetic domain structure of the MR film, The effective anisotropic magnetic field becomes large and the magnetization rotation hardly occurs. Therefore, if an antiferromagnetic film or a permanent magnet film is laminated on the MR film at the portion where the magnetoresistive film detects the magnetic field from the medium, there is a problem that the output of the magnetic head is reduced. Further, in order to suppress an increase in the effective anisotropic magnetic field in the portion where the magnetoresistive film detects the magnetic field of the medium, that is, between the electrodes, a structure excluding the antiferromagnetic film or the permanent magnet film is used. Then, although the sensitivity is improved, there is a problem that a magnetic domain wall appears in the MR film at the end of a film that controls the magnetic domain structure (hereinafter referred to as a magnetic domain control film), and Barkhausen noise may occur.

【0005】このように、MR膜の磁区構造の制御と実
効的な異方性磁界は密接な関係があるが、上記従来技術
においては、実効的な異方性磁界に大きな影響を与える
反強磁性膜の磁気異方性の方向あるいは永久磁石膜の着
磁方向とMR膜の磁気異方性の方向に関しては触れられ
ていない。
As described above, the control of the magnetic domain structure of the MR film and the effective anisotropic magnetic field have a close relationship, but in the above-mentioned prior art, the anti-strength which greatly affects the effective anisotropic magnetic field. No mention is made of the direction of magnetic anisotropy of the magnetic film or the direction of magnetization of the permanent magnet film and the direction of magnetic anisotropy of the MR film.

【0006】本発明の目的は、バルクハウゼンノイズを
抑制あるいは低減する手段を有する磁気抵抗効果型ヘッ
ドにおいて、バルクハウゼンノイズが抑制され、かつ感
度が高く大きな出力が得られる磁気抵抗効果型ヘッドを
提供することにある。
An object of the present invention is to provide a magnetoresistive head having a means for suppressing or reducing Barkhausen noise, which is capable of suppressing Barkhausen noise and having high sensitivity and high output. To do.

【0007】[0007]

【課題を解決するための手段】上記目的を達成するため
に本発明では、基板と、前記基板上に、1軸磁気異方性
を有する磁気抵抗効果膜と、1軸磁気異方性を有し、前
記磁気抵抗効果膜の磁区を制御する磁区制御膜と、前記
磁気抵抗効果膜に電流を流すための一対の電極とを有す
る磁気抵抗効果型ヘッドにおいて、磁気抵抗効果膜と、
バルクハウゼンノイズを低減又は抑止するために磁気抵
抗効果膜の磁区構造を制御する磁区制御膜の磁気的連続
性が両膜の界面によって保たれるように積層し、さら
に、磁気抵抗効果膜の1軸磁気異方性の磁化容易軸と磁
区制御膜の1軸磁気異方性の磁化容易軸を互いに異なる
方向に付与する。
In order to achieve the above object, the present invention provides a substrate, a magnetoresistive film having uniaxial magnetic anisotropy, and a uniaxial magnetic anisotropy on the substrate. Then, in a magnetoresistive head having a magnetic domain control film for controlling magnetic domains of the magnetoresistive film, and a pair of electrodes for flowing a current through the magnetoresistive film, a magnetoresistive film,
In order to reduce or suppress Barkhausen noise, the magnetic domain control film for controlling the magnetic domain structure of the magnetoresistive film is laminated so that magnetic continuity is maintained by the interface between the two films. The easy axis of magnetic anisotropy and the easy axis of uniaxial magnetic anisotropy of the magnetic domain control film are provided in different directions.

【0008】さらに、磁気抵抗効果膜と磁区制御膜の間
に、磁性薄膜を配置し、それぞれの界面において、磁気
的連続性が保たれている積層構造を作製することによっ
て、磁区制御の強さを任意の強さに調節することができ
る。
Further, a magnetic thin film is disposed between the magnetoresistive film and the magnetic domain control film, and a laminated structure in which magnetic continuity is maintained at each interface is provided, whereby the magnetic domain control strength is improved. Can be adjusted to any strength.

【0009】ここで、磁気抵抗効果膜としては、例え
ば、磁気抵抗変化率が大きいFe-Ni系合金、Co-Ni系合金
またはFe-Ni-Co系合金を、磁区制御膜としては反強磁性
膜又は永久磁石膜を用いることができる。また、前記磁
性薄膜としては、例えば、Fe-Ni-Nb系合金を用いること
ができる。
Here, as the magnetoresistive effect film, for example, an Fe-Ni-based alloy, a Co-Ni-based alloy or an Fe-Ni-Co-based alloy having a large magnetoresistance change rate is used, and as the magnetic domain control film, antiferromagnetic material Membranes or permanent magnet membranes can be used. Further, as the magnetic thin film, for example, an Fe-Ni-Nb based alloy can be used.

【0010】上述のヘッドの構造で、磁気抵抗効果膜及
び磁区制御膜に1軸磁気異方性を付与する方法として
は、つぎのような方法を用いることができる。磁区制御
膜を反強磁性膜で構成する場合には、まず、磁界を印加
しながら磁気抵抗効果膜を成膜し、つぎに、磁区制御膜
を積層し、さらに、磁区制御膜を、反強磁性材料のネ−
ル温度以上の温度に加熱しながら、磁気抵抗効果膜の磁
気異方性と異なる方向に、磁気抵抗効果膜の異方性磁界
よりも大きい直流磁界を印加する方法を用いることがで
きる。また、磁区制御膜が永久磁石膜の場合には、ま
ず、磁界を印加しながら磁気抵抗効果膜を成膜し、つぎ
に、磁区制御膜を成膜し、その後磁気抵抗効果膜の磁気
異方性と異なる方向に直流磁界を印加し着磁する方法を
用いることができる。
With the above-described head structure, the following method can be used as a method of imparting uniaxial magnetic anisotropy to the magnetoresistive effect film and the magnetic domain control film. When the magnetic domain control film is composed of an antiferromagnetic film, first, the magnetoresistive film is formed while applying a magnetic field, then the magnetic domain control film is laminated, and then the magnetic domain control film is strengthened. Magnetic material
It is possible to use a method of applying a DC magnetic field larger than the anisotropic magnetic field of the magnetoresistive effect film in a direction different from the magnetic anisotropy of the magnetoresistive effect film while heating to a temperature not lower than the cooling temperature. When the magnetic domain control film is a permanent magnet film, first, the magnetoresistive effect film is formed while applying a magnetic field, then the magnetic domain control film is formed, and then the magnetic anisotropic film of the magnetoresistive effect film is formed. It is possible to use a method in which a DC magnetic field is applied in a direction different from the magnetic property to magnetize.

【0011】[0011]

【作用】磁気抵抗効果(以下、MRと称す)膜の磁区構
造を制御する効果、即ちバルクハウゼンノイズを低減又
は抑止する効果は、MR膜と磁区制御膜が磁気的に連続
である領域が広く、MR膜と磁区制御膜との交換結合磁
界が大きいほど大きくなる。また、MR膜に関しては、
媒体からの磁界に対して磁気的に等方的な薄膜よりも異
方的な薄膜の方が磁気抵抗変化が大きくなるなどの理由
から、MR膜に磁気異方性を付けている。
The effect of controlling the magnetic domain structure of the magnetoresistive (hereinafter referred to as MR) film, that is, the effect of reducing or suppressing Barkhausen noise is wide in the region where the MR film and the magnetic domain control film are magnetically continuous. , The larger the exchange coupling magnetic field between the MR film and the magnetic domain control film, the larger the magnetic field. Regarding the MR film,
The MR film is provided with magnetic anisotropy because, for example, the anisotropic thin film has a larger magnetoresistance change than the magnetically isotropic thin film with respect to the magnetic field from the medium.

【0012】従来は、磁区構造の制御を十分に行うた
め、図7に示すようにMR膜の磁気異方性の方向も磁区
制御膜の磁気異方性の方向も同一に、一対の電極の間隔
方向(以下、トラック幅方向という)にしていた。実際
に感度に大きな影響を与えるのは、トラック幅方向の異
方性磁界(以下実効的な異方性磁界と呼ぶ)であり、実
効的な異方性磁界が小さいほど感度は高くなる。この場
合には、MR膜と磁区制御膜の交換結合磁界の大きさを
He、MR膜の異方性磁界の大きさをHkとすると、MR
膜と磁区制御膜を積層したときの実効的な異方性磁界の
大きさHk′は、両者の和(He+Hk)となる。
Conventionally, in order to sufficiently control the magnetic domain structure, the direction of the magnetic anisotropy of the MR film and the direction of the magnetic anisotropy of the magnetic domain control film are the same as shown in FIG. The space direction (hereinafter referred to as the track width direction) was used. The anisotropy field in the track width direction (hereinafter referred to as the effective anisotropy field) has a large effect on the sensitivity, and the smaller the effective anisotropy field, the higher the sensitivity. In this case, when the magnitude of the exchange coupling magnetic field between the MR film and the magnetic domain control film is He and the magnitude of the anisotropic magnetic field of the MR film is Hk, the MR
The magnitude Hk 'of the effective anisotropic magnetic field when the film and the magnetic domain control film are laminated is the sum (He + Hk) of both.

【0013】ここで、本発明の磁気抵抗効果型ヘッドの
ように、交換結合磁界及びMR膜の異方性磁界の大きさ
を変えずに、図1(a)に示すようにMR膜の磁気異方
性の磁化容易軸と、磁区制御膜の磁気異方性の磁化容易
軸を互いに異なる方向に付与すると、Hk′はMR膜と
磁区制御膜の磁気異方性の方向が同一のときの値(He
+Hk)に比べ小さくなる。即ち、Hk′<He+Hk と
なる。さらに、図1(b)のようにMR膜の磁気異方性
の方向と磁区制御膜の磁気異方性の方向が直交する場合
には、Hk′は(−He+Hk)まで小さくすることがで
きる。以上述べたことを図示したものが図2であり、M
R膜の磁区構造を制御している状態で、Hk′は、従来
のMR膜と磁区制御膜の磁気異方性の方向が同一のとき
のHk′=He+Hk から、互いに異なる方向に磁気異
方性を付けることにより、直交する場合の Hk′=−
He+Hk まで減少させることができ、これは図3に示
すように出力の向上となって現われる。
As in the magnetoresistive head of the present invention, the magnetic field of the MR film is changed as shown in FIG. 1A without changing the magnitude of the exchange coupling magnetic field and the anisotropic magnetic field of the MR film. When the easy axis of anisotropy and the easy axis of magnetic anisotropy of the magnetic domain control film are given in different directions, Hk ′ is obtained when the directions of magnetic anisotropy of the MR film and the magnetic domain control film are the same. Value (He
It becomes smaller than + Hk). That is, Hk '<He + Hk. Further, when the direction of magnetic anisotropy of the MR film and the direction of magnetic anisotropy of the magnetic domain control film are orthogonal to each other as shown in FIG. 1B, Hk 'can be reduced to (-He + Hk). . FIG. 2 illustrates what has been described above.
With the magnetic domain structure of the R film being controlled, Hk 'changes from Hk' = He + Hk when the magnetic anisotropy directions of the conventional MR film and the magnetic domain control film are the same, to Hg 'in different directions. Hk '=-
It can be reduced to He + Hk, which appears as an increase in output as shown in FIG.

【0014】このような方法でHk′を小さくすること
ができるが、MR膜と磁区制御膜の材料及び交換結合の
強さによっては、さらに小さくしなければ実用に適さな
い場合がある。このような場合には、MR膜の異方性磁
界は、材料によってほぼ決まってしまうので、変化させ
ることが困難である。そこで、図4のようにMR膜と磁
区制御膜の間に、磁性薄膜を入れて交換結合の強さを任
意の強さまで減少させることによってHk′を小さくす
ることができる。磁性薄膜としては、MR膜より飽和磁
化が小さく、磁化が消失する温度がMR膜と磁区制御膜
の交換結合が消失する温度よりも高い材料が望ましい。
磁性薄膜の飽和磁化を小さくするほど、交換結合の強度
も小さくなる。従って、予め望ましい交換結合の強さを
求め、この交換結合を実現することができる磁性薄膜の
飽和磁化を計算して、磁性薄膜の材料を選択することが
可能である。
Although Hk 'can be reduced by such a method, depending on the materials of the MR film and the magnetic domain control film and the strength of the exchange coupling, it may not be suitable for practical use unless further reduced. In such a case, it is difficult to change the anisotropic magnetic field of the MR film because it is almost determined by the material. Therefore, as shown in FIG. 4, Hk 'can be reduced by inserting a magnetic thin film between the MR film and the magnetic domain control film to reduce the strength of exchange coupling to an arbitrary strength. As the magnetic thin film, a material having a saturation magnetization smaller than that of the MR film and a temperature at which the magnetization disappears is higher than a temperature at which the exchange coupling between the MR film and the magnetic domain control film disappears.
The smaller the saturation magnetization of the magnetic thin film, the smaller the strength of exchange coupling. Therefore, it is possible to select the material of the magnetic thin film by previously obtaining the desired strength of the exchange coupling and calculating the saturation magnetization of the magnetic thin film that can realize this exchange coupling.

【0015】このように、MR膜と磁区制御膜とに互い
に別の方向に磁気異方性を付与することにより、磁気異
方性を小さくし、感度を向上させている。また、MR膜
と磁区制御膜との界面においては、磁気的に連続である
ので、磁区制御効果が低下することはなく、MR膜を単
一磁区に保つことができる。従って、微視的には、MR
膜のスピンの方向は、磁区制御膜との界面においては交
換結合により磁区制御膜のスピンと平行であるが、界面
から離れるにつれて、異方性を付与された方向を向く。
巨視的には、MR膜の磁化容易軸は、磁区制御膜と異な
る方向を向いている。
As described above, the magnetic anisotropy is imparted to the MR film and the magnetic domain control film in directions different from each other, thereby reducing the magnetic anisotropy and improving the sensitivity. Also, since the magnetic film is magnetically continuous at the interface between the MR film and the magnetic domain control film, the magnetic domain control effect does not deteriorate, and the MR film can be kept in a single magnetic domain. Therefore, microscopically, MR
The spin direction of the film is parallel to the spin of the magnetic domain control film at the interface with the magnetic domain control film due to exchange coupling, but as it moves away from the interface, it is oriented in an anisotropic direction.
Macroscopically, the easy axis of magnetization of the MR film is oriented in a direction different from that of the magnetic domain control film.

【0016】なお、MR膜と磁区制御膜とに互いに別の
方向に磁気異方性を付与しているが、これは、磁界中で
作製したMR膜の磁気異方性が主に原子対の方向性配列
に起因し、反強磁性膜のネ−ル温度程度の温度や永久磁
石膜の着磁磁界程度の磁界ではほとんど変化しないこと
を利用している。
Although the magnetic anisotropy is imparted to the MR film and the magnetic domain control film in directions different from each other, the magnetic anisotropy of the MR film produced in a magnetic field is mainly due to the atomic pair. It is utilized that the directional arrangement causes almost no change at a temperature of about the Neel temperature of the antiferromagnetic film or a magnetic field of about the magnetizing magnetic field of the permanent magnet film.

【0017】本発明を用いている磁気抵抗効果型ヘッド
において、MR膜および磁区制御膜が、その界面におい
て、前記磁気抵抗効果膜と磁気的連続性を有し、また、
前記磁気抵抗効果膜は、前記磁区制御膜の磁化容易軸と
互いに異なる方向に磁化容易軸を有する状態となってい
るかどうかは、以下のような性質を有しているかどうか
を調べることにより、確認することができる。まず、磁
区制御膜に反強磁性膜を用いている場合には、磁気抵抗
効果型ヘッドをネ−ル温度以上に加熱すると、MR膜と
磁区制御膜の磁気異方性の方向が揃うので、MR膜の磁
化が回転しにくくなり、ヘッドの出力が減少する。ま
た、磁気的なバイアスを印加する手段を備えている場合
には、ネ−ル温度以上の温度に上げる前後において、再
生波形が正負対称になる最適なバイアスの値が変化す
る。磁区制御膜に永久磁石膜を用いている場合には、強
い外部磁界を印加して着磁の方向を変化させると出力が
変化する。また、一般にはMR膜か磁区制御膜のどちら
は、一対の電極の間隔方向すなわちトラック幅方向に磁
化容易軸を有しているので、膜の断面には磁極は出ない
が、トラック幅方向に磁化容易軸を有していない膜にお
いては磁極が出る。これを、ヘッドの浮上面において、
磁気力顕微鏡で検出することもできる。これらの性質を
確認することによって、そのヘッドが、本発明の構成を
有しているかどうか判断できる。
In the magnetoresistive head using the present invention, the MR film and the magnetic domain control film have magnetic continuity with the magnetoresistive film at the interface thereof, and
Whether or not the magnetoresistive film has an easy axis of magnetization different from the easy axis of the magnetic domain control film is confirmed by examining whether or not it has the following properties. can do. First, when an antiferromagnetic film is used as the magnetic domain control film, if the magnetoresistive head is heated above the nail temperature, the directions of magnetic anisotropy of the MR film and the magnetic domain control film will be aligned. The magnetization of the MR film becomes hard to rotate, and the output of the head decreases. In the case where a means for applying a magnetic bias is provided, the optimum bias value at which the reproduced waveform becomes positive and negative symmetrical changes before and after the temperature is raised to the nail temperature or higher. When a permanent magnet film is used as the magnetic domain control film, the output changes when a strong external magnetic field is applied to change the direction of magnetization. In general, either the MR film or the magnetic domain control film has an easy axis of magnetization in the direction of the gap between the pair of electrodes, that is, the track width direction, so no magnetic pole appears in the cross section of the film, but in the track width direction. A magnetic pole appears in a film having no easy axis of magnetization. On the air bearing surface of the head,
It can also be detected by a magnetic force microscope. By confirming these properties, it can be determined whether or not the head has the configuration of the present invention.

【0018】[0018]

【実施例】本発明の磁気抵抗効果型ヘッドを適用した磁
気ディスク装置の一実施例について、図8を用いて説明
する。図8は、この磁気ディスク装置の概略構造に示す
斜視図である。
EXAMPLE One example of a magnetic disk device to which the magnetoresistive head of the present invention is applied will be described with reference to FIG. FIG. 8 is a perspective view showing a schematic structure of this magnetic disk device.

【0019】この磁気ディスク装置の概略構造を説明す
る。同図に示すように、磁気ディスク装置は、スピンド
ル202と、スピンドル202を軸として、等間隔に積
層された複数の磁気ディスク204a,204b,20
4c,204d,204eと、スピンドル202を駆動
するモータ203とを備えている。さらに、移動可能な
キャリッジ206と、キャリッジ206に保持された磁
気ヘッド群205a,205b,205c,205d
と、このキャリッジ206を駆動するボイスコイルモー
タ213を構成するマグネット208およびボイスコイ
ル207と、これを支持するベース201とを備えて構
成される。また、磁気ディスク制御装置等の上位装置2
12から送出される信号に従って、ボイスコイルモータ
213を制御するボイスコイルモータ制御回路209を
備えている。また、上位装置212から送られてきたデ
ータを、磁気ディスク204a等の書き込み方式に対応
し、磁気ヘッドに流すべき電流に変換する機能と、磁気
ディスク204a等から送られてきたデータを増幅し、
ディジタル信号に変換する機能とを持つライト/リード
回路210を備え、このライト/リード回路210は、
インターフェイス211を介して、上位装置212と接
続されている。
A schematic structure of this magnetic disk device will be described. As shown in the figure, the magnetic disk device includes a spindle 202 and a plurality of magnetic disks 204a, 204b, 20 stacked at equal intervals around the spindle 202 as an axis.
4c, 204d, 204e, and a motor 203 for driving the spindle 202. Further, the movable carriage 206 and the magnetic head groups 205a, 205b, 205c, 205d held by the carriage 206.
And a magnet 208 and a voice coil 207 that constitute a voice coil motor 213 that drives the carriage 206, and a base 201 that supports the magnet. In addition, a higher-level device 2 such as a magnetic disk controller
A voice coil motor control circuit 209 for controlling the voice coil motor 213 in accordance with the signal sent from 12 is provided. Further, a function of converting the data sent from the higher-level device 212 into a current that should be passed through the magnetic head in accordance with the writing method of the magnetic disk 204a and the like, and amplifying the data sent from the magnetic disk 204a and the like,
A write / read circuit 210 having a function of converting into a digital signal is provided, and the write / read circuit 210 is
It is connected to the host device 212 via the interface 211.

【0020】次に、この磁気ディスク装置において、磁
気ディスク204dのデータを読みだす場合を動作を説
明する。上位装置212から、インターフェイス211
を介して、ボイスコイルモータ制御回路209に、読み
だすべきデータの指示を与える。ボイスコイルモータ制
御回路209からの制御電流によって、ボイスコイルモ
ータ213がキャリッジ206を駆動させ、磁気ディス
ク204d上の指示されたデータが記憶されているトラ
ックの位置に、磁気ヘッド群205a,205b,20
5c,205dを高速で移動させ、正確に位置付けす
る。この位置付けは、ボイスコイルモータ制御回路20
9と接続されている位置決め用磁気ヘッド205bが、
磁気ディスク204c上の位置を検出して提供し、デー
タ用磁気ヘッド205aの位置制御を行うことによって
行われる。また、ベース201に支持されたモータ20
3は、スピンドル202に取り付けた直径3.5インチ
の複数の磁気ディスク204a,204b,204c,
204d,204eを回転させる。次に、ライト/リー
ド回路210からの信号に従って、指示された所定の磁
気ヘッド204aを選択し、指示された領域の先頭位置
を検出後、磁気ディスク205d上のデータ信号を読み
だす。この読みだしは、ライト/リード回路210に接
続されているデータ用磁気ヘッド205aが、磁気ディ
スク204dとの間で信号の授受を行うことにより行わ
れる。読みだされたデータは、所定の信号に変換され、
上位装置212に送出される。
Next, the operation of the magnetic disk device for reading data from the magnetic disk 204d will be described. The interface 211 from the host device 212
The voice coil motor control circuit 209 is instructed via the command of the data to be read. The voice coil motor 213 drives the carriage 206 by the control current from the voice coil motor control circuit 209, and the magnetic head groups 205a, 205b, 20 are moved to the positions of the tracks on the magnetic disk 204d where the instructed data are stored.
5c and 205d are moved at high speed to accurately position them. This positioning is performed by the voice coil motor control circuit 20.
The positioning magnetic head 205b connected to
This is performed by detecting and providing the position on the magnetic disk 204c and controlling the position of the data magnetic head 205a. In addition, the motor 20 supported by the base 201
3 is a plurality of 3.5-inch diameter magnetic disks 204a, 204b, 204c mounted on the spindle 202,
Rotate 204d and 204e. Next, in accordance with the signal from the write / read circuit 210, the designated predetermined magnetic head 204a is selected, the head position of the designated area is detected, and then the data signal on the magnetic disk 205d is read. This reading is performed by the data magnetic head 205a connected to the write / read circuit 210 exchanging signals with the magnetic disk 204d. The read data is converted into a predetermined signal,
It is sent to the upper device 212.

【0021】実施例1 つぎに、本発明の第1の実施例として、図8の磁気ディ
スク装置に用いることのできる磁気抵抗効果型ヘッドを
図5を用いて説明する。図5からわかるように、本実施
例の磁気抵抗効果型ヘッドは、非磁性基板10と、基板
上に形成される下部シールド膜17と、この下部シール
ド膜17の上に形成される下部ギャップ膜19とを備え
ている。この下部ギャップ膜19上には、磁区制御膜1
2が形成され、さらにこの上に磁気抵抗効果(MR)膜
11が積層されている。このMR膜11の上には、シャ
ント膜14と、ソフト膜(以下、SAL膜と記述する)
15とが形成されている。ソフト膜15の上には、所定
場所に所定の間隔をおいて信号取り出し用電極16が形
成され、更にその上には、上部ギャップ膜20と、保護
膜21と、上部磁気シールド膜18とが形成されてい
る。
Embodiment 1 Next, as a first embodiment of the present invention, a magnetoresistive head which can be used in the magnetic disk device of FIG. 8 will be described with reference to FIG. As can be seen from FIG. 5, the magnetoresistive head of the present embodiment has a non-magnetic substrate 10, a lower shield film 17 formed on the substrate, and a lower gap film formed on the lower shield film 17. 19 and. The magnetic domain control film 1 is formed on the lower gap film 19.
2 is formed, and a magnetoresistive effect (MR) film 11 is further laminated thereon. A shunt film 14 and a soft film (hereinafter referred to as a SAL film) are formed on the MR film 11.
And 15 are formed. A signal extracting electrode 16 is formed at a predetermined location on the soft film 15 at a predetermined interval, and an upper gap film 20, a protective film 21, and an upper magnetic shield film 18 are further formed thereon. Has been formed.

【0022】つぎに本実施例の磁気抵抗効果型ヘッドの
製造手順と、各膜を構成する材料とについて説明する。
アルミナなどの絶縁層を薄膜形成し精密研磨を施した非
磁性基板10の上に、下部シ−ルド膜17としてスパッ
タリングによりパ−マロイを1μm形成した。フォトリ
ソグラフィ−技術を用いてパタ−ン化した後、つぎに下
部ギャップ膜19として、アルミナ絶縁膜を0.2μm
成膜した。その上に、磁区制御膜12として膜厚0.1
μmのNiOを作製し、その上にMR膜11として膜厚
0.02μmのパ−マロイをトラック幅方向から90°
の方向に40Oeの直流磁界を印加しながら作製した。
Next, the manufacturing procedure of the magnetoresistive head of this embodiment and the materials forming each film will be described.
A permalloy of 1 μm was formed as a lower shield film 17 by sputtering on a non-magnetic substrate 10 on which an insulating layer such as alumina was formed into a thin film and precision-polished. After patterning using a photolithography technique, an alumina insulating film having a thickness of 0.2 μm is formed as a lower gap film 19.
A film was formed. On top of that, a film thickness of 0.1 is formed as the magnetic domain control film 12.
A NiO film having a thickness of 0.02 μm was formed on the NiO film having a thickness of 0.02 μm as an MR film 11 on the NiO film, and the angle was 90 ° from the track width direction.
It was manufactured while applying a DC magnetic field of 40 Oe in the direction of.

【0023】次に、シャント膜14としてNbを0.0
1μm、SAL膜15としてNi−Fe−Cr系合金を
0.02μmを作製した。この構造は、シャントバイア
ス方式とソフト膜(SAL)バイアス方式を合わせた複
合バイアス方式と呼ばれ、MR膜11に磁気的なバイア
スを印加するための構造である。つぎに、フォトリソグ
ラフィ−技術を用いて、まずシャント膜14、SAL膜
15、MR膜11及び磁区制御膜12を浮上面側からの
幅(以下、素子高さと呼ぶ)が3μmになるようにパタ
−ン化し、次に下部ギャップ膜19をパタ−ン化した。
Next, Nb of 0.0 is formed as the shunt film 14.
A Ni—Fe—Cr alloy having a thickness of 1 μm and a Ni—Fe—Cr alloy thickness of 0.02 μm was prepared. This structure is called a composite bias system that combines a shunt bias system and a soft film (SAL) bias system, and is a structure for applying a magnetic bias to the MR film 11. Next, by using a photolithography technique, the shunt film 14, the SAL film 15, the MR film 11 and the magnetic domain control film 12 are patterned so that the width from the air bearing surface side (hereinafter referred to as element height) is 3 μm. Then, the lower gap film 19 was patterned.

【0024】さらに、SAL膜15の上に、Nb 0.
06μm、Au 0.13μm、Cr 0.02μmか
らなる電極16をリフトオフによって作製した。その
際、電極間距離(内側の縁同士の距離)は3.6μmと
した。この上に上部ギャップ膜20として、膜厚0.2
μmのアルミナ絶縁膜を成膜、パタ−ン化し、保護膜2
1として膜厚1μmのレジストを形成した後、膜厚1μ
mのパ−マロイからなる上部シ−ルド膜18を成膜、パ
タ−ン化した。上部ギャップ膜20及び上部シ−ルド膜
18のパタ−ン化には、フォトリソグラフィ−技術を用
いた。全ての膜の形成が終わった後で、トラック幅方向
に3kOeの直流磁界を印加しながら、磁区制御膜12
を構成するNiOをネール点より高い温度の275℃で
30分間熱処理を行ない、磁区制御膜12を構成するN
iOに磁気異方性を付けた。
Further, on the SAL film 15, Nb 0.
An electrode 16 made of 06 μm, Au 0.13 μm, and Cr 0.02 μm was produced by lift-off. At that time, the distance between the electrodes (the distance between the inner edges) was set to 3.6 μm. An upper gap film 20 having a film thickness of 0.2 is formed thereon.
A protective film 2 is formed by forming and patterning a μm alumina insulating film.
After forming a resist having a film thickness of 1 μm as 1
An upper shield film 18 of m permalloy was formed and patterned. A photolithography technique was used for patterning the upper gap film 20 and the upper shield film 18. After the formation of all films, the magnetic domain control film 12 is applied while applying a DC magnetic field of 3 kOe in the track width direction.
The NiO forming the magnetic domain control film 12 is subjected to heat treatment at 275 ° C. higher than the Neel point for 30 minutes.
Magnetic anisotropy was added to iO.

【0025】なお、ヘッドと同様の膜厚で作製した試料
の、MR膜の異方性磁界及びMR膜と磁区制御膜の交換
結合磁界はそれぞれ5 Oe及び40 Oeであり、ヘ
ッドと同様に磁気異方性を付与したMR膜と磁区制御膜
の積層膜の実効的な異方性磁界は35 Oeであった。
The anisotropic magnetic field of the MR film and the exchange coupling magnetic field of the MR film and the magnetic domain control film of the sample manufactured with the same film thickness as the head were 5 Oe and 40 Oe, respectively, and the magnetic field was the same as that of the head. The effective anisotropic magnetic field of the laminated film of the anisotropy-provided MR film and magnetic domain control film was 35 Oe.

【0026】本実施例では、分解能の高いヘッドを得る
ために上部及び下部シ−ルド膜17、18を設けたが、
高い分解能を要求しない場合には設けなくともよい。磁
気的なバイアスを印加する手段としてのシャント膜14
およびソフト膜15に関しては、媒体からの磁界の符号
を判定する手段を設けない限り必要であり、複合バイア
ス方式の他、シャント方式、ソフト膜バイアス方式など
の他のバイアス方式を用いてもよい。また、MR膜11
が平坦に形成できるようにすれば、必ずしも磁区制御膜
から作製する必要は無く、電極から作製してもよい。さ
らに、磁区制御膜には、NiOの他、FeMn、FeM
nにRu、Rh、Ti、Crを添加した反強磁性体を用
いることができる。
In this embodiment, the upper and lower shield films 17 and 18 are provided in order to obtain a head with high resolution.
It may not be provided if high resolution is not required. Shunt film 14 as means for applying magnetic bias
The soft film 15 is required unless a means for determining the sign of the magnetic field from the medium is provided, and other bias methods such as the shunt method and the soft film bias method may be used in addition to the composite bias method. In addition, the MR film 11
If it can be formed flat, it is not always necessary to make it from the magnetic domain control film, and it may be made from the electrode. Further, in the magnetic domain control film, in addition to NiO, FeMn, FeM
An antiferromagnetic material in which Ru, Rh, Ti, or Cr is added to n can be used.

【0027】以上のように作製した本実施例の磁気抵抗
効果型ヘッドについて、保磁力1600 Oe、磁性体
膜厚tmag=20nm、残留磁束密度Brと磁性体膜
厚の積Br・tmag=180G・μmのCo−Ta−
Cr系スパッタ媒体にオ−バ−ライト特性32dBを有
する誘導型薄膜磁気ヘッドを用いて5kFCIで記録し
た記録パタ−ンを、浮上量0.14μm、センス電流7
×106A/cm2で再生し、その再生出力を評価した。
比較として、ヘッド構造は同じで、MR膜と磁区制御膜
の磁気異方性の方向を共にトラック幅方向に付与したM
Rヘッドも作製し、同様の評価を行なった。結果を表1
に示す。表1のように、本実施例の磁気抵抗効果型ヘッ
ドは、比較例より実効的な異方性磁界が小さく、再生出
力電圧が大きく、高感度高出力であることがわかる。ま
た、バルクハウゼンノイズは、共に観測されなかった。
With respect to the magnetoresistive head of this embodiment manufactured as described above, coercive force of 1600 Oe, magnetic film thickness tmag = 20 nm, product of residual magnetic flux density Br and magnetic film thickness Br.tmag = 180 G.multidot. μm Co-Ta-
A recording pattern recorded at 5 kFCI by using an induction type thin film magnetic head having an overwriting characteristic of 32 dB on a Cr-based sputter medium was used, and the flying height was 0.14 μm and the sense current was 7
Reproduction was performed at × 10 6 A / cm 2 , and the reproduction output was evaluated.
For comparison, the head structure is the same, and the magnetic anisotropy directions of the MR film and the magnetic domain control film are both given in the track width direction.
An R head was also manufactured and the same evaluation was performed. The results are shown in Table 1.
Shown in. As can be seen from Table 1, the magnetoresistive head of this example has a smaller effective anisotropic magnetic field, a larger reproduction output voltage, and higher sensitivity and higher output than the comparative example. Neither Barkhausen noise was observed.

【0028】実施例2 本実施例の磁気抵抗効果型ヘッドは、図6、図4に示す
ように、第1の実施例の磁区制御膜12とMR膜11の
間に、交換結合を弱めるために、磁性薄膜13をさらに
有する構成である。磁性薄膜13としては、0.01μ
m厚さのFe−Ni−Nb系合金薄膜を、磁区制御膜1
2の成膜後にFe−Ni−Nb系合金ターゲットを用い
てスパッタリングで形成した。その後、MR膜11を作
製した。膜厚、磁気異方性の方向及び他の構造に関して
は、実施例1と同様にしてMRヘッドを作製した。
Embodiment 2 As shown in FIGS. 6 and 4, the magnetoresistive head of this embodiment weakens the exchange coupling between the magnetic domain control film 12 and the MR film 11 of the first embodiment. In addition, the magnetic thin film 13 is further provided. As the magnetic thin film 13, 0.01 μ
The Fe-Ni-Nb alloy thin film having a thickness of m is used as the magnetic domain control film 1.
After the film formation of No. 2, it was formed by sputtering using a Fe-Ni-Nb based alloy target. After that, the MR film 11 was produced. An MR head was manufactured in the same manner as in Example 1 with respect to the film thickness, the direction of magnetic anisotropy and other structures.

【0029】本実施例のヘッドと同様の膜厚、磁気異方
性で作製した試料の、磁区制御膜12、磁性薄膜13及
びMR膜11の積層膜の実効的な異方性磁界は8 Oe
であり、実施例1より低減していた。。
The effective anisotropic magnetic field of the laminated film of the magnetic domain control film 12, the magnetic thin film 13 and the MR film 11 of the sample produced with the same film thickness and magnetic anisotropy as the head of this embodiment is 8 Oe.
And was lower than in Example 1. .

【0030】磁性薄膜13は、交換結合磁界を弱める役
割を持つために、飽和磁化がMR膜11より小さいこ
と、磁化が消失する温度がMR膜11と磁区制御膜12
の交換結合が消失する温度よりも高いこと、MR膜11
により多くの電流が流れるようにするためにMR膜11
よりも比抵抗が大きいこと、また磁気抵抗効果が小さい
ことが要求される。本実施例ではFe−Ni−Nb系合
金を用いたが、Fe−Ni−Cr系合金、Niなどの材
料も用いることができる。
Since the magnetic thin film 13 has a role of weakening the exchange coupling magnetic field, the saturation magnetization is smaller than that of the MR film 11, and the temperature at which the magnetization disappears is the MR film 11 and the magnetic domain control film 12.
The temperature is higher than the temperature at which the exchange coupling of the MR film disappears.
In order to allow more current to flow, the MR film 11
It is required that the specific resistance is larger than that and the magnetoresistive effect is small. In the present embodiment, the Fe-Ni-Nb type alloy was used, but materials such as Fe-Ni-Cr type alloy and Ni can also be used.

【0031】作製した磁気抵抗効果型ヘッドについて、
実施例1と同様の評価を行なった結果を表1に示す。表
1からわかるように、本実施例の磁気抵抗効果型ヘッド
は、実効的な異方性磁界が比較例の1/5以下で、再生
出力電圧が比較例の5倍以上であった。バルクハウゼン
ノイズは、実施例1同様観測されなかった。
Regarding the manufactured magnetoresistive head,
Table 1 shows the results of the same evaluations as in Example 1. As can be seen from Table 1, in the magnetoresistive head of this example, the effective anisotropic magnetic field was 1/5 or less of the comparative example, and the reproduction output voltage was 5 times or more that of the comparative example. Barkhausen noise was not observed as in Example 1.

【0032】実施例3 つぎに、本発明の第3の実施例として、MR膜11の材
料としてCo−Ni系合金を用い、膜厚、磁気異方性の
方向及び他の構造に関しては、実施例1と同様にして磁
気抵抗効果型ヘッドを作製した。ヘッドと同様の膜厚で
作製したMR膜の異方性磁界及びMR膜と磁区制御膜の
交換結合磁界はそれぞれ25 Oe及び35 Oeであ
り、ヘッドと同様に磁気異方性を付与したMR膜と磁区
制御膜の積層膜の実効的な異方性磁界は10 Oeであ
った。
Example 3 Next, as a third example of the present invention, a Co—Ni alloy was used as the material of the MR film 11, and the film thickness, the direction of magnetic anisotropy and other structures were implemented. A magnetoresistive head was manufactured in the same manner as in Example 1. The anisotropic magnetic field of the MR film and the exchange coupling magnetic field of the MR film and the magnetic domain control film produced with the same film thickness as the head are 25 Oe and 35 Oe, respectively, and the MR film provided with the magnetic anisotropy like the head. The effective anisotropic magnetic field of the laminated film of the magnetic domain control film was 10 Oe.

【0033】作製した磁気抵抗効果型ヘッドについて、
実施例1と同様の評価を行なった結果を表1に示す。表
1からわかるように、本実施例の磁気抵抗効果型ヘッド
は、実効的な異方性磁界が比較例の1/4以下で、再生
出力電圧が比較例の6倍以上であった。なお、バルクハ
ウゼンノイズは観測されなかった。
Regarding the manufactured magnetoresistive head,
Table 1 shows the results of the same evaluations as in Example 1. As can be seen from Table 1, in the magnetoresistive head of this example, the effective anisotropic magnetic field was 1/4 or less of the comparative example, and the reproduction output voltage was 6 times or more that of the comparative example. Barkhausen noise was not observed.

【0034】実施例4 つぎに、本発明の第4の実施例として、図6に示した第
2の実施例と同じ構造を有する他の実施例の磁気抵抗効
果型ヘッドについて述べる。本実施例の磁気抵抗効果型
ヘッドは、磁区制御膜12としてCo−Pt系合金を、
MR膜としてCo−Ni系合金膜を用いたものである。
他の構成は第2の実施例と同様の構成であるので説明を
省略する。
Fourth Embodiment Next, as a fourth embodiment of the present invention, a magnetoresistive head of another embodiment having the same structure as the second embodiment shown in FIG. 6 will be described. In the magnetoresistive head of this embodiment, a Co—Pt-based alloy is used as the magnetic domain control film 12.
A Co-Ni alloy film is used as the MR film.
The other structure is the same as that of the second embodiment, and the description thereof is omitted.

【0035】本実施例の磁気抵抗効果型ヘッドの製造手
順について説明する。アルミナなどの絶縁層を薄膜形成
し精密研磨を施した非磁性基板10の上に、下部シ−ル
ド膜17としてスパッタリングによりパ−マロイを1μ
m形成した。フォトリソグラフィ−技術を用いてパタ−
ン化した後、ギャップ膜19を0.2μm成膜した。磁
区制御膜12として膜厚0.03μmのCo−Pt系合
金をスパッタリングし、トラック幅方向に10kOeの
直流磁界を印加し着磁を行なった。その上に、交換結合
を弱めるために磁性薄膜13としてFe−Ni−Nb系
合金薄膜を 0.02μm厚さにスパッタリングにより
成膜し、さらにMR膜11として膜厚0.02μmのC
o−Ni系合金をトラック幅方向から90°の方向に4
0 Oeの直流磁界を印加しながら作製した。次に、複
合バイアス方式による磁気的バイアスの印加手段、即ち
シャント膜14としてNbを0.01μm、SAL膜1
5としてNi−Fe−Cr系合金を0.02μmを作製
した。フォトリソグラフィ−技術を用いて、まずバイア
スを印加する構造、MR膜及び磁区制御膜を素子高さが
3μmになるようにパタ−ン化し、次にギャップ膜をパ
タ−ン化した。SAL膜15の上に、電極間距離が3.
6μmになるように、リフトオフによってNb 0.0
6μm、Au 0.13μm、Cr 0.02μmから
なる電極16を作製した。膜厚0.2μmのギャップ膜
20を成膜、パタ−ン化し、保護膜21として膜厚1μ
mのレジストを形成した後、膜厚1μmのパ−マロイか
らなる上部シ−ルド膜18を成膜、パタ−ン化した。ギ
ャップ膜20及び上部シ−ルド膜18のパタ−ン化に
は、フォトリソグラフィ−技術を用いた。
A procedure for manufacturing the magnetoresistive head of this embodiment will be described. On the non-magnetic substrate 10 on which an insulating layer such as alumina was formed into a thin film and precision-polished, a lower shield film 17 was sputtered with 1 μm of permalloy.
m formed. Patterning using photolithography technology
Then, the gap film 19 having a thickness of 0.2 μm was formed. As the magnetic domain control film 12, a Co—Pt-based alloy having a film thickness of 0.03 μm was sputtered, and a DC magnetic field of 10 kOe was applied in the track width direction for magnetization. On top of that, a Fe—Ni—Nb type alloy thin film as a magnetic thin film 13 is formed to a thickness of 0.02 μm by sputtering to weaken the exchange coupling, and further an MR film 11 of C having a thickness of 0.02 μm is formed.
4 o-Ni alloy in 90 ° direction from the track width direction
It was manufactured while applying a DC magnetic field of 0 Oe. Next, a magnetic bias applying means by the composite bias method, that is, Nb of 0.01 μm as the shunt film 14 and the SAL film 1 are used.
As No. 5, a Ni—Fe—Cr alloy having a thickness of 0.02 μm was prepared. Using a photolithography technique, first, the structure for applying a bias, the MR film and the magnetic domain control film were patterned so that the element height was 3 μm, and then the gap film was patterned. On the SAL film 15, the distance between the electrodes is 3.
Nb 0.0 by lift-off so as to be 6 μm.
An electrode 16 made of 6 μm, Au 0.13 μm, and Cr 0.02 μm was produced. A gap film 20 having a film thickness of 0.2 μm is formed and patterned to form a protective film 21 having a film thickness of 1 μm.
After forming a resist having a thickness of m, an upper shield film 18 made of permalloy having a thickness of 1 μm was formed and patterned. A photolithography technique was used for patterning the gap film 20 and the upper shield film 18.

【0036】なお、ヘッドと同様の膜厚で作製したMR
膜の異方性磁界及びMR膜と磁区制御膜の交換結合磁界
はそれぞれ25 Oe及び80 Oeであり、両者の間
にFe−Ni−Nb系合金 0.02μmを入れ、ヘッ
ドと同様の磁気異方性を付与した積層膜の実効的な異方
性磁界は10 Oeであった。
An MR formed with the same film thickness as the head
The anisotropic magnetic field of the film and the exchange coupling magnetic field of the MR film and the magnetic domain control film are 25 Oe and 80 Oe, respectively, and a Fe—Ni—Nb alloy 0.02 μm is inserted between them to obtain the same magnetic anisotropy as the head. The effective anisotropic magnetic field of the laminated film having the directionality was 10 Oe.

【0037】本実施例では、分解能の高いヘッドを得る
ために上部及び下部シ−ルド膜を設けたが、高い分解能
を要求しない場合には設けなくともよい。シ−ルド膜を
設けない場合には、ヘッド作製後に永久磁石膜の着磁を
行なうこともできる。磁気的なバイアスを印加する手段
に関しては、実施例1でも述べたように、媒体からの磁
界の符号を判定する手段を設けない限り必要であり、複
合バイアス方式の他、シャント方式、ソフト膜バイアス
方式などの他のバイアス方式を用いてもよい。磁区制御
膜、MR膜及び電極の作製順序に関しては、永久磁石膜
はNiOとは異なり導電性であるので、電極の下の構造
をMR膜、第3の磁性薄膜、永久磁石膜とすることも可
能であり、また、MR膜が平坦に形成できるようにすれ
ば電極から作製することもできる。さらに、磁区制御膜
には、Co−Pt系合金の他、Co−Pt−Cr系合
金、Co−Cr系合金などの永久磁石膜を用いることが
できる。
In this embodiment, the upper and lower shield films are provided in order to obtain a head with high resolution, but they may not be provided if high resolution is not required. When the shield film is not provided, the permanent magnet film can be magnetized after the head is manufactured. As described in the first embodiment, the means for applying the magnetic bias is necessary unless the means for judging the sign of the magnetic field from the medium is provided, and in addition to the composite bias method, the shunt method and the soft film bias. Other biasing schemes such as schemes may be used. Regarding the manufacturing order of the magnetic domain control film, the MR film and the electrode, since the permanent magnet film is conductive unlike NiO, the structure under the electrode may be the MR film, the third magnetic thin film or the permanent magnet film. It is possible, and if the MR film can be formed flat, it can be manufactured from the electrode. Further, for the magnetic domain control film, a permanent magnet film such as a Co—Pt—Cr alloy or a Co—Cr alloy can be used in addition to the Co—Pt alloy.

【0038】作製した磁気抵抗効果型ヘッドについて、
実施例1と同様の評価を行なった結果を表1に示す。表
1からわかるように、本実施例の磁気抵抗効果型ヘッド
は、実効的な異方性磁界が比較例の1/4以下で、再生
出力電圧が比較例の6倍以上であった。なお、バルクハ
ウゼンノイズは観測されなかった。
Regarding the manufactured magnetoresistive head,
Table 1 shows the results of the same evaluations as in Example 1. As can be seen from Table 1, in the magnetoresistive head of this example, the effective anisotropic magnetic field was 1/4 or less of the comparative example, and the reproduction output voltage was 6 times or more that of the comparative example. Barkhausen noise was not observed.

【0039】[0039]

【表1】 [Table 1]

【0040】このように、上述の実施例1から実施例4
に記載した磁気抵抗効果型ヘッドは、再生感度が高いの
で、記録媒体の記録密度を高くした場合にも、感度良く
再生することができる。従って、本実施例により提供さ
れる磁気抵抗効果型ヘッドを搭載した磁気ディスク装置
は、従来と同等の大きさで大記憶容量の磁気ディスク装
置を実現できる。また、記憶密度を高くすることが可能
であるので、従来と同等の記憶容量の場合には、記録媒
体を小型化することができるので、小型な磁気ディスク
装置を実現できる。
As described above, the first to fourth embodiments described above are used.
Since the magnetoresistive head described in 1) has high reproduction sensitivity, it can be reproduced with high sensitivity even when the recording density of the recording medium is increased. Therefore, the magnetic disk device equipped with the magnetoresistive head provided by the present embodiment can realize a magnetic disk device having the same size as the conventional one and a large storage capacity. Further, since the storage density can be increased, the recording medium can be downsized in the case of the same storage capacity as the conventional one, so that a small magnetic disk device can be realized.

【0041】[0041]

【発明の効果】本発明によれば、磁気抵抗効果型ヘッド
の感磁部である電極間においても磁区制御膜とMR膜を
積層して磁区構造を制御し、磁区制御膜とMR膜に互い
に別の方向に磁気異方性を付与して実効的な異方性磁界
を小さくすることにより、バルクハウゼンノイズが発生
しない高出力の磁気抵抗効果型ヘッドが得られる。
According to the present invention, the magnetic domain control film and the MR film are laminated even between the electrodes, which are the magnetically sensitive portions of the magnetoresistive head, to control the magnetic domain structure, and the magnetic domain control film and the MR film are mutually controlled. By giving magnetic anisotropy in another direction to reduce the effective anisotropic magnetic field, a high output magnetoresistive head without Barkhausen noise can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の磁気抵抗効果型ヘッドにおいて磁区制
御膜とMR膜に互いに異なる方向に磁気異方性を付与す
ることを説明する図である。
FIG. 1 is a diagram illustrating that magnetic anisotropy is applied to a magnetic domain control film and an MR film in different directions in a magnetoresistive head of the present invention.

【図2】実効的な異方性磁界Hk′と交換結合磁界He
の関係を示した説明図。
FIG. 2 is an effective anisotropic magnetic field Hk ′ and an exchange coupling magnetic field He.
FIG.

【図3】磁気抵抗効果型ヘッドの再生出力と実効的な異
方性磁界の関係を示したグラフ。
FIG. 3 is a graph showing the relationship between the reproduction output of the magnetoresistive head and the effective anisotropic magnetic field.

【図4】磁区制御膜とMR膜の交換結合磁界が大きい場
合に、磁性薄膜を配置することによって交換結合を弱め
るときに用いる構造を示した説明図。
FIG. 4 is an explanatory diagram showing a structure used to weaken exchange coupling by disposing a magnetic thin film when the exchange coupling magnetic field between the magnetic domain control film and the MR film is large.

【図5】本発明の一実施例の磁気抵抗効果型ヘッドの要
部切欠き斜視図。
FIG. 5 is a perspective view of a magnetoresistive head according to an embodiment of the present invention with a main portion cut away.

【図6】本発明の他の実施例の磁気抵抗効果型ヘッドの
要部切欠き斜視図。
FIG. 6 is a perspective view of a magnetoresistive head according to another embodiment of the present invention with a main portion cut away.

【図7】従来の磁気抵抗効果型ヘッドにおいて磁区制御
膜とMR膜に同じ方向に磁気異方性を付与している状態
を説明する説明図。
FIG. 7 is an explanatory diagram illustrating a state in which magnetic anisotropy is applied to the magnetic domain control film and the MR film in the same direction in the conventional magnetoresistive head.

【図8】本発明の一実施例の磁気ディスク装置の構成を
示す説明図。
FIG. 8 is an explanatory diagram showing a configuration of a magnetic disk device according to an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

11…MR膜,12…磁区制御膜,13…第3の磁性薄
膜,14…シャント膜,15…SAL膜,16…電極,
17…下部シ−ルド膜,18…上部シ−ルド膜,19、
20…ギャップ膜,21…保護膜。
11 ... MR film, 12 ... Domain control film, 13 ... Third magnetic thin film, 14 ... Shunt film, 15 ... SAL film, 16 ... Electrode,
17 ... Lower shield film, 18 ... Upper shield film, 19,
20 ... Gap film, 21 ... Protective film.

Claims (13)

【特許請求の範囲】[Claims] 【請求項1】基板と、前記基板上に、1軸磁気異方性を
有する磁気抵抗効果膜と、1軸磁気異方性を有し、前記
磁気抵抗効果膜の磁区を制御する磁区制御膜と、前記磁
気抵抗効果膜に電流を流すための一対の電極とを有する
磁気抵抗効果型ヘッドにおいて、 前記磁区制御膜は、少なくとも前記一対の電極間におい
て、前記磁気抵抗効果膜と積層され、かつ、それらの界
面において、前記磁気抵抗効果膜と磁気的連続性を有
し、 また、前記磁気抵抗効果膜は、前記磁区制御膜の磁化容
易軸と異なる方向に磁化容易軸を有することを特徴とす
る磁気抵抗効果型ヘッド。
1. A substrate, a magnetoresistive film having uniaxial magnetic anisotropy on the substrate, and a magnetic domain control film having uniaxial magnetic anisotropy and controlling magnetic domains of the magnetoresistive film. And a magnetoresistive head having a pair of electrodes for passing a current through the magnetoresistive film, wherein the magnetic domain control film is laminated with the magnetoresistive film at least between the pair of electrodes, and A magnetic continuity with the magnetoresistive effect film at their interface, and the magnetoresistive effect film has an easy magnetization axis in a direction different from the easy magnetization axis of the magnetic domain control film. A magnetoresistive head.
【請求項2】請求項1において、前記磁区制御膜の前記
磁気抵抗効果膜に対する磁区制御効果を調節するための
磁性薄膜をさらに有し、 前記磁性薄膜は、前記磁気抵抗効果膜と前記磁区制御膜
との間に配置され、前記磁気抵抗効果膜との界面、およ
び、前記磁区制御膜との界面で、それぞれ磁気的連続性
を有すること特徴とする磁気抵抗効果型ヘッド。
2. The magnetic thin film according to claim 1, further comprising a magnetic thin film for adjusting a magnetic domain control effect of the magnetic domain control film with respect to the magnetoresistive effect film, the magnetic thin film including the magnetoresistive effect film and the magnetic domain control film. A magnetoresistive head, which is disposed between the magnetoresistive film and the magnetoresistive film, and has magnetic continuity at an interface with the magnetoresistive film and an interface with the magnetic domain control film.
【請求項3】請求項1において、前記磁区制御膜は、前
記一対の電極の間隔方向に磁化容易軸を有することを特
徴とする磁気抵抗効果型ヘッド
3. The magnetoresistive head according to claim 1, wherein the magnetic domain control film has an easy axis of magnetization in a direction of a distance between the pair of electrodes.
【請求項4】請求項1において、前記磁区制御膜は、反
強磁性材料または永久磁石材料で構成されることを特徴
とする磁気抵抗効果型ヘッド。
4. The magnetoresistive head according to claim 1, wherein the magnetic domain control film is made of an antiferromagnetic material or a permanent magnet material.
【請求項5】請求項2において、前記磁性薄膜の飽和磁
化は、前記磁気抵抗効果膜の飽和磁化より小さいことを
特徴とする磁気抵抗効果型ヘッド。
5. The magnetoresistive head according to claim 2, wherein the saturation magnetization of the magnetic thin film is smaller than that of the magnetoresistive film.
【請求項6】請求項1において、前記磁気抵抗効果膜に
対して、前記磁気抵抗効果膜に流す電流の方向と直交す
る方向に磁気的なバイアスを印加するために用いられる
膜をさらに有することを特徴とする磁気抵抗効果型ヘッ
ド。
6. The film according to claim 1, further comprising a film used to apply a magnetic bias to the magnetoresistive film in a direction orthogonal to a direction of a current flowing through the magnetoresistive film. A magnetoresistive head.
【請求項7】請求項1において、前記磁気抵抗効果膜
は、Fe−Ni系合金、Co−Ni系合金およびFe−
Ni−Co系合金のうち、いずれかの合金で構成される
ことを特徴とする磁気抵抗効果型ヘッド。
7. The magnetoresistive effect film according to claim 1, wherein the magnetoresistive effect film is a Fe—Ni based alloy, a Co—Ni based alloy, and a Fe—
A magnetoresistive head, comprising any one of Ni-Co alloys.
【請求項8】請求項1において、前記磁区制御膜は、N
iOで構成されることを特徴とする磁気抵抗効果型ヘッ
ド。
8. The magnetic domain control film according to claim 1, wherein the magnetic domain control film is N.
A magnetoresistive head comprising iO.
【請求項9】請求項2において、前記磁性薄膜は、Fe
−Ni−Nb系合金で構成されることを特徴とする磁気
抵抗効果型磁気ヘッド。
9. The magnetic thin film according to claim 2, wherein the magnetic thin film is Fe.
A magnetoresistive effect magnetic head characterized by comprising a Ni-Nb alloy.
【請求項10】請求項1において、前記磁気抵抗効果膜
と前記磁区制御膜を積層することにより合成された磁気
異方性に関して、その異方性磁界の前記一対の電極の間
隔方向の成分が、前記磁気抵抗効果膜の異方性磁界と、
前記磁気抵抗効果膜および前記磁区制御層の間に作用す
る交換結合磁界との和よりも小さいことを特徴とする磁
気抵抗効果型ヘッド。
10. The magnetic anisotropy synthesized by stacking the magnetoresistive effect film and the magnetic domain control film according to claim 1, wherein a component of an anisotropic magnetic field in a space direction of the pair of electrodes is An anisotropic magnetic field of the magnetoresistive film,
A magnetoresistive head, which is smaller than a sum of an exchange coupling magnetic field acting between the magnetoresistive film and the magnetic domain control layer.
【請求項11】基板と、前記基板上に、1軸磁気異方性
を有する磁気抵抗効果膜と、反強磁性材料から構成さ
れ、前記磁気抵抗効果膜の磁区を制御する磁区制御膜
と、前記磁気抵抗効果膜に電流を流すための一対の電極
とを有する磁気抵抗効果型ヘッドの製造方法であって、 前記基板上に、磁界を印加しながら前記磁気抵抗効果膜
を成膜し、 前記磁気抵抗効果膜上に、前記磁区制御膜を積層し、 前記磁区制御膜を前記反強磁性材料のネール温度以上に
加熱しながら、前記磁区制御膜に対して、前記磁気抵抗
効果膜の成膜時の磁界と異なる方向に、前記磁気抵抗効
果膜の異方性磁界より大きい直流磁界を印加することを
特徴とする磁気抵抗効果型ヘッドの製造方法。
11. A substrate, a magnetoresistive film having uniaxial magnetic anisotropy on the substrate, and a magnetic domain control film made of an antiferromagnetic material for controlling the magnetic domain of the magnetoresistive film. A method of manufacturing a magnetoresistive effect head having a pair of electrodes for supplying a current to the magnetoresistive effect film, wherein the magnetoresistive effect film is formed on the substrate while applying a magnetic field, The magnetic domain control film is laminated on the magnetoresistive film, and the magnetoresistive film is formed on the magnetic domain control film while heating the magnetic domain control film to the Neel temperature of the antiferromagnetic material or higher. A method of manufacturing a magnetoresistive head, wherein a DC magnetic field larger than the anisotropic magnetic field of the magnetoresistive film is applied in a direction different from the magnetic field at that time.
【請求項12】基板と、前記基板上に、1軸磁気異方性
を有する磁気抵抗効果膜と、永久磁石材料から構成さ
れ、前記磁気抵抗効果膜の磁区を制御する磁区制御膜
と、前記磁気抵抗効果膜に電流を流すための一対の電極
とを有する磁気抵抗効果型ヘッドの製造方法であって、 前記基板上に、磁界を印加しながら前記磁気抵抗効果膜
を成膜し、 前記磁気抵抗効果膜上に、前記磁区制御膜を積層し、 その後、前記磁区制御膜に対して、前記磁気抵抗効果膜
の成膜時の磁界と異なる方向に、直流磁界を印加するこ
とを特徴とする磁気抵抗効果型ヘッドの製造方法。
12. A substrate, a magnetoresistive effect film having uniaxial magnetic anisotropy on the substrate, a magnetic domain control film which is made of a permanent magnet material and controls a magnetic domain of the magnetoresistive effect film, A method of manufacturing a magnetoresistive head having a pair of electrodes for flowing a current through the magnetoresistive film, wherein the magnetoresistive film is formed on the substrate while applying a magnetic field, The magnetic domain control film is laminated on the resistance effect film, and then a DC magnetic field is applied to the magnetic domain control film in a direction different from the magnetic field at the time of forming the magnetoresistive effect film. Method of manufacturing magnetoresistive head.
【請求項13】磁気ディスクの信号を磁気抵抗効果を用
いて読み取る磁気抵抗効果型ヘッドと、前記磁気ディス
クを回転させる駆動部と、前記磁気抵抗効果型ヘッドの
読み取った信号を処理する処理回路とを有する磁気ディ
スク装置において、 前記磁気抵抗効果型ヘッドは、基板と、前記基板上に、
1軸磁気異方性を有する磁気抵抗効果膜と、1軸磁気異
方性を有し、前記磁気抵抗効果膜の磁区を制御する磁区
制御膜と、前記磁気抵抗効果膜に電流を流すための一対
の電極とを有し、 前記磁区制御膜は、少なくとも前記一対の電極間におい
て、前記磁気抵抗効果膜と積層され、かつ、その界面に
おいて、前記磁気抵抗効果膜と磁気的連続性を有し、 また、前記磁気抵抗効果膜は、前記磁区制御膜の磁化容
易軸と互いに異なる方向に磁化容易軸を有することを特
徴とする磁気ディスク装置。
13. A magnetoresistive head for reading a signal of a magnetic disk by using a magnetoresistive effect, a drive unit for rotating the magnetic disk, and a processing circuit for processing a signal read by the magnetoresistive head. In the magnetic disk device having, the magnetoresistive head is a substrate, and on the substrate,
A magnetoresistive effect film having a uniaxial magnetic anisotropy, a magnetic domain control film having a uniaxial magnetic anisotropy and controlling a magnetic domain of the magnetoresistive effect film, and a current flowing through the magnetoresistive effect film. A pair of electrodes, the magnetic domain control film is laminated with the magnetoresistive film at least between the pair of electrodes, and has magnetic continuity with the magnetoresistive film at the interface. The magnetic resistance effect film has an easy axis of magnetization in a direction different from the easy axis of magnetization of the magnetic domain control film.
JP22044292A 1992-08-19 1992-08-19 Magnetoresistive head and method of manufacturing the same Expired - Lifetime JP2781103B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP22044292A JP2781103B2 (en) 1992-08-19 1992-08-19 Magnetoresistive head and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP22044292A JP2781103B2 (en) 1992-08-19 1992-08-19 Magnetoresistive head and method of manufacturing the same

Publications (2)

Publication Number Publication Date
JPH0668427A true JPH0668427A (en) 1994-03-11
JP2781103B2 JP2781103B2 (en) 1998-07-30

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
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