JPH0664944A - Hermetic coating of optical fiber with carbon - Google Patents

Hermetic coating of optical fiber with carbon

Info

Publication number
JPH0664944A
JPH0664944A JP4242773A JP24277392A JPH0664944A JP H0664944 A JPH0664944 A JP H0664944A JP 4242773 A JP4242773 A JP 4242773A JP 24277392 A JP24277392 A JP 24277392A JP H0664944 A JPH0664944 A JP H0664944A
Authority
JP
Japan
Prior art keywords
optical fiber
carbon
hermetic coating
hermetic
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4242773A
Other languages
Japanese (ja)
Other versions
JP3074224B2 (en
Inventor
Michihiko Yanagisawa
道彦 柳澤
Tsugio Sato
継男 佐藤
Kunio Ogura
邦男 小倉
Nobuyuki Yoshizawa
信幸 吉澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
Nippon Telegraph and Telephone Corp
Original Assignee
Furukawa Electric Co Ltd
Nippon Telegraph and Telephone Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd, Nippon Telegraph and Telephone Corp filed Critical Furukawa Electric Co Ltd
Priority to JP04242773A priority Critical patent/JP3074224B2/en
Publication of JPH0664944A publication Critical patent/JPH0664944A/en
Application granted granted Critical
Publication of JP3074224B2 publication Critical patent/JP3074224B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Surface Treatment Of Glass Fibres Or Filaments (AREA)

Abstract

PURPOSE:To prevent the damage to the surface of an optical fiber and the lowering of the optical fiber strength by locally coating an optical fiber with a carbon hermetic coating. CONSTITUTION:A plasma 3 is generated around an optical fiber 2 by applying a high-frequency electric power to an electrode 1 and a raw material for hermetic coating is supplied to the plasma 3 to form a hermetic coating film on a part of the optical fiber 2. The high-frequency energy applied to the electrode 1 is varied continuously or stepwise during the formation of the hermetic coating film.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は光ファイバの融着接続部
や端末に局所的にカーボンハーメチック被覆膜を形成す
る方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for locally forming a carbon hermetic coating film on a fusion splicing portion or an end of an optical fiber.

【0002】[0002]

【従来の技術】光ファイバのコネクター接続部や融着接
続部は被覆樹脂を除去して行なわれるため、接続に使用
される各種治具との接触で表面に傷が付き易い。ファイ
バ表面に傷があると環境中の水分がこの傷内に侵入して
傷が広がり、ファイバ強度の著しい劣化を招く(疲労現
象)。従って、傷の付いたファイバ表面には水分を透過
させないハーメチック被覆膜を形成することが、ファイ
バの強度の長期信頼性を高める上で有効である。
2. Description of the Related Art Since a connector connecting portion and a fusion splicing portion of an optical fiber are formed by removing a coating resin, the surface is easily scratched by contact with various jigs used for the connection. If there is a flaw on the surface of the fiber, moisture in the environment penetrates into the flaw to spread the flaw, resulting in a remarkable deterioration of the fiber strength (fatigue phenomenon). Therefore, it is effective to form a hermetic coating film that does not allow water to permeate on the surface of the damaged fiber in order to improve the long-term reliability of the strength of the fiber.

【0003】現在、ハーメチック被覆膜を形成するため
の方法としては、炭酸ガスレーザーによって光ファイバ
を加熱して熱CVD法で成膜させる方法と、光ファイバ
の周囲にハーメチック原料を含んだプラズマを生成して
成膜させる方法(プラズマCVD法)とが提案されてい
る。本発明は上記2方法のうち後者に関するものであ
る。
Currently, as a method for forming a hermetic coating film, a method of heating an optical fiber by a carbon dioxide gas laser to form a film by a thermal CVD method and a plasma containing a hermetic raw material around the optical fiber are used. A method of generating and forming a film (plasma CVD method) has been proposed. The present invention relates to the latter of the above two methods.

【0004】[0004]

【発明が解決しようとする課題】従来は、成膜中に電極
に印加する高周波電力は一定に保たれているので、プラ
ズマの持つエネルギーも時間的に一定にしていた。とこ
ろが、ハーメチック機能に優れるグラファイトを含んだ
アモルファス構造のカーボン膜を形成させるためには、
かなり高エネルギーのプラズマを生成させる必要があ
る。このため、カーボン膜が形成される前にプラズマ中
の高エネルギー粒子によって光ファイバ表面が衝撃を受
け、同表面に非常に多くの傷ができてしまい、ファイバ
強度が著しく低下するという傾向がしばしば見られた。
In the past, since the high frequency power applied to the electrodes during film formation was kept constant, the energy of the plasma was also kept constant over time. However, in order to form a carbon film having an amorphous structure containing graphite having an excellent hermetic function,
It is necessary to generate a plasma of considerably high energy. For this reason, there is a tendency that high-energy particles in plasma impact the surface of the optical fiber before the carbon film is formed, and the surface of the optical fiber is damaged by a large number and the fiber strength is significantly reduced. Was given.

【0005】本発明の目的は光ファイバ表面に傷が付か
ず、光ファイバの強度が低下しないように光ファイバに
局所的にカーボンハーメチック被覆を施す方法を提供す
ることにある。
An object of the present invention is to provide a method for locally applying a carbon hermetic coating to an optical fiber so that the surface of the optical fiber is not scratched and the strength of the optical fiber is not lowered.

【0006】[0006]

【課題を解決するための手段】本発明の光ファイバのカ
ーボンハーメチック被覆方法は、図1に示すように電極
1に高周波電力を印加して光ファイバ2の周囲にプラズ
マ3を生成させ、このプラズマ3中にハーメチック用原
料を供給することにより、光ファイバ2の局所表面にハ
ーメチック被覆膜を形成する方法において、ハーメチッ
ク被覆膜形成中に電極1に供給する高周波エネルギーを
連続的または段階的に変化させることを特徴とする光フ
ァイバのカーボンハーメチック被覆方法。
In the carbon hermetic coating method for an optical fiber of the present invention, a high frequency power is applied to an electrode 1 to generate a plasma 3 around the optical fiber 2 as shown in FIG. In the method for forming a hermetic coating film on the local surface of the optical fiber 2 by supplying the hermetic raw material into the electrode 3, the high frequency energy supplied to the electrode 1 during the formation of the hermetic coating film is continuously or stepwise. A carbon hermetic coating method for an optical fiber characterized by varying.

【0007】[0007]

【作用】本発明の光ファイバのカーボンハーメチック被
覆方法は、ハーメチック被覆膜形成中に電極1に供給す
る高周波エネルギーを連続的または段階的に変化させる
ものであるため、プラズマが光ファイバの表面に直接触
れる成膜初期の段階でプラズマのエネルギーを低くすれ
ば、ハーメチック機能に優れるグラファイトを含んだア
モルファス構造のカーボン膜を形成する場合でも、プラ
ズマ中のエネルギー粒子により光ファイバ2の表面が衝
撃を受けにくくなり、光ファイバ2の表面に傷が付きに
くい。また、カーボン膜がある程度の厚さに形成された
後にプラズマのエネルギーを高くすれば、既に形成され
たカーボン膜により光ファイバ2へのプラズマ中のエネ
ルギー粒子の衝撃が防がれるので、光ファイバ2の強度
が低下することなくハーメチック機能に優れたカーボン
膜が形成される。
The carbon hermetic coating method for an optical fiber according to the present invention continuously or stepwise changes the high frequency energy supplied to the electrode 1 during the formation of the hermetic coating film, so that plasma is applied to the surface of the optical fiber. If the plasma energy is lowered at the initial stage of film formation where the film is directly touched, the surface of the optical fiber 2 is impacted by the energetic particles in the plasma even when a carbon film having an amorphous structure containing graphite having an excellent hermetic function is formed. It becomes difficult to scratch the surface of the optical fiber 2. If the energy of plasma is increased after the carbon film is formed to a certain thickness, the carbon film already formed prevents the energy particles in the plasma from impacting the optical fiber 2. A carbon film excellent in hermetic function is formed without lowering the strength of the carbon.

【0008】[0008]

【実施例】本発明の光ファイバのカーボンハーメチック
被覆方法の一実施例としてプラズマCVD法を用いたハ
ーメチック被覆装置の構成を図1に示す。これはチャン
バ5内を真空ポンプで排気してチャンバ5内の真空度を
約0.01〜5Torrにすることができるようにして
ある。このチャンバ5内に中空円筒状の電極1が配置さ
れており、同電極1内をファイバ2が縦に貫くように配
置されている。
FIG. 1 shows the structure of a hermetic coating apparatus using a plasma CVD method as an example of a carbon hermetic coating method for optical fibers according to the present invention. The inside of the chamber 5 is evacuated by a vacuum pump so that the degree of vacuum inside the chamber 5 can be set to about 0.01 to 5 Torr. A hollow cylindrical electrode 1 is arranged in the chamber 5, and a fiber 2 is arranged so as to vertically penetrate the electrode 1.

【0009】ハーメチック用原料にはベンゼン、トルエ
ン、キシレンを使用した。成膜速度に違いはあるものの
炭化水素系原料ならばどんなものでも可能である。ま
た、原料供給前に約1分間20W、0.8TorrでA
rプラズマによって光ファイバ2の表面を処理した。
Benzene, toluene and xylene were used as hermetic raw materials. Although there is a difference in film forming rate, any hydrocarbon-based raw material can be used. In addition, before supplying the raw material, A at 20 W, 0.8 Torr for about 1 minute
The surface of the optical fiber 2 was treated with r plasma.

【0010】通信用のカーボン被覆光ファイバ(ファイ
バ径125μm、カーボン膜厚400Å、UV樹脂被覆
径250μm)を用いて検討を行った。UV樹脂を除去
したファイバ端面を切断し、2本のファイバをアーク放
電により融着接続した。融着接続部はアーク放電により
約10mmに亙ってカーボンが剥れている。これを図1
のチャンバ5内にセットし、内径約10mm、高さ約1
5mmの中空円筒状の電極1を使用してプラズマCVD
法により前記融着接続部にカーボンハーメチック膜をリ
コートした。
A study was conducted using a carbon-coated optical fiber for communication (fiber diameter 125 μm, carbon film thickness 400 Å, UV resin coating diameter 250 μm). The fiber end surface from which the UV resin was removed was cut, and two fibers were fusion-spliced by arc discharge. Carbon was peeled off from the fusion-bonded portion by about 10 mm due to arc discharge. Figure 1
It is set in the chamber 5 of, and the inner diameter is about 10 mm and the height is about 1
Plasma CVD using 5 mm hollow cylindrical electrode 1
A carbon hermetic film was recoated on the fusion-bonded portion by a method.

【0011】この場合、成膜時間を20秒とし、高周波
発振器空マッチング回路を通して高周波電圧を電極1へ
印加した。この場合、印加開始後約3秒間は印加電圧を
20Wとし、その後17秒は120Wにした。このよう
にして作製したサンプルを電子顕微鏡で観察したとこ
ろ、カーボン層の厚みは1層目、2層目とも300〜5
00Åであった。
In this case, the film formation time was set to 20 seconds, and a high frequency voltage was applied to the electrode 1 through a high frequency oscillator empty matching circuit. In this case, the applied voltage was set to 20 W for about 3 seconds after the start of application, and 120 W for 17 seconds thereafter. When the sample manufactured in this manner was observed with an electron microscope, the thickness of the carbon layer was 300 to 5 for both the first layer and the second layer.
It was 00Å.

【0012】前記のようにして作製したサンプルの外周
にUV樹脂を再度被覆して、歪速度0.5,2,5,2
0,50%/min、n=9で引張破断強度を調べた結
果、0.5%/minでの強度の50%値は2.9kg
で、疲労係数n値は150であった。
The outer periphery of the sample produced as described above was coated again with UV resin to obtain strain rates of 0.5, 2, 5, and 2.
As a result of examining the tensile breaking strength at 0,50% / min and n = 9, the 50% value of the strength at 0.5% / min was 2.9 kg.
The fatigue coefficient n value was 150.

【0013】前記パワーの変化パターンを変え、20W
〜120Wまで連続的に変化させ、その後120Wで1
5秒間保持しても、20W→40W→60W→100W
→120Wと3秒刻みで変化させても、膜厚に違いはあ
るものの、強度低下を抑えつつ、疲労特性にも優れたリ
コート膜が形成できた。
By changing the power variation pattern, 20 W
Change continuously up to ~ 120W, then 1 at 120W
20W → 40W → 60W → 100W even after holding for 5 seconds
Even if the value was changed to 120 W in 3 second increments, although there was a difference in the film thickness, a recoat film excellent in fatigue characteristics could be formed while suppressing the decrease in strength.

【0014】比較例1として、電極1への印加電圧を1
20Wの一定パワーとし、20秒間成膜した。この光フ
ァイバについて前記と同様の方法で引張試験を行なって
破断強度を調べた結果、破断強度は約1.2kgとな
り、明らかな強度劣化がみられた。ただし、疲労係数n
値は140と良好な値を示している。
As Comparative Example 1, the voltage applied to the electrode 1 was 1
The film was formed for 20 seconds with a constant power of 20W. As a result of conducting a tensile test on this optical fiber in the same manner as described above and examining the breaking strength, the breaking strength was about 1.2 kg, and a clear strength deterioration was observed. However, the fatigue coefficient n
The value is 140, which is a good value.

【0015】比較例2として、電極1への印加電圧を最
初から最後まで20Wとして成膜した。この時の破断強
度は2.3kgであったが、低いパワーで成膜したため
疲労係数n値は20で、充分なハーメチック機能を持た
ないことがわかった。
As Comparative Example 2, the voltage applied to the electrode 1 was 20 W from the beginning to the end. The breaking strength at this time was 2.3 kg, but since the film was formed with low power, the fatigue coefficient n value was 20 and it was found that it did not have a sufficient hermetic function.

【0016】[0016]

【発明の効果】本発明では以上説明したように、電極1
へ印加する高周波パワーを成膜中に変化させるので、成
膜中にプラズマ中の高エネルギー粒子により光ファイバ
2の表面に傷付くことがなく、カーボンコート部分の強
度が低下しない。
As described above, according to the present invention, the electrode 1
Since the high-frequency power applied to the film is changed during film formation, the surface of the optical fiber 2 is not damaged by the high-energy particles in the plasma during film formation, and the strength of the carbon coated portion does not decrease.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明の光ファイバのカーボンハーメチック被
覆方法の説明図である。
FIG. 1 is an explanatory view of a carbon hermetic coating method for an optical fiber according to the present invention.

【符号の説明】[Explanation of symbols]

1 電極 2 光ファイバ 3 プラズマ 1 electrode 2 optical fiber 3 plasma

───────────────────────────────────────────────────── フロントページの続き (72)発明者 小倉 邦男 東京都千代田区丸の内2丁目6番1号 古 河電気工業株式会社内 (72)発明者 吉澤 信幸 東京都千代田区内幸町一丁目1番6号 日 本電信電話株式会社内 ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Kunio Ogura Kunio Ogura 2-6-1, Marunouchi, Chiyoda-ku, Tokyo Furukawa Electric Co., Ltd. (72) Nobuyuki Yoshizawa 1-1-6 Uchisaiwai-cho, Chiyoda-ku, Tokyo Nippon Telegraph and Telephone Corporation

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 電極1に高周波電力を印加して光ファイ
バ2の周囲にプラズマ3を生成させ、このプラズマ3中
にハーメチック用原料を供給することにより光ファイバ
2の局所表面にハーメチック被覆膜を形成する光ファイ
バのカーボンハーメチック被覆方法において、ハーメチ
ック被覆膜形成中に前記電極1に供給する高周波エネル
ギーを連続的または段階的に変化させることを特徴とす
る光ファイバのカーボンハーメチック被覆方法。
1. A hermetic coating film on a local surface of an optical fiber 2 by applying a high frequency power to an electrode 1 to generate a plasma 3 around the optical fiber 2 and supplying a hermetic raw material into the plasma 3. A carbon hermetic coating method for an optical fiber, wherein the high frequency energy supplied to the electrode 1 is continuously or stepwise changed during the formation of the hermetic coating film.
JP04242773A 1992-08-19 1992-08-19 Carbon fiber hermetic coating method for optical fiber Expired - Lifetime JP3074224B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP04242773A JP3074224B2 (en) 1992-08-19 1992-08-19 Carbon fiber hermetic coating method for optical fiber

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP04242773A JP3074224B2 (en) 1992-08-19 1992-08-19 Carbon fiber hermetic coating method for optical fiber

Publications (2)

Publication Number Publication Date
JPH0664944A true JPH0664944A (en) 1994-03-08
JP3074224B2 JP3074224B2 (en) 2000-08-07

Family

ID=17094068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP04242773A Expired - Lifetime JP3074224B2 (en) 1992-08-19 1992-08-19 Carbon fiber hermetic coating method for optical fiber

Country Status (1)

Country Link
JP (1) JP3074224B2 (en)

Also Published As

Publication number Publication date
JP3074224B2 (en) 2000-08-07

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