JPH0663984B2 - Defect detection method - Google Patents

Defect detection method

Info

Publication number
JPH0663984B2
JPH0663984B2 JP8090388A JP8090388A JPH0663984B2 JP H0663984 B2 JPH0663984 B2 JP H0663984B2 JP 8090388 A JP8090388 A JP 8090388A JP 8090388 A JP8090388 A JP 8090388A JP H0663984 B2 JPH0663984 B2 JP H0663984B2
Authority
JP
Japan
Prior art keywords
image
differential
defect
differential image
absolute value
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP8090388A
Other languages
Japanese (ja)
Other versions
JPH01253639A (en
Inventor
和寛 山本
新 根本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Metals Ltd
Original Assignee
Sumitomo Special Metals Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Special Metals Co Ltd filed Critical Sumitomo Special Metals Co Ltd
Priority to JP8090388A priority Critical patent/JPH0663984B2/en
Publication of JPH01253639A publication Critical patent/JPH01253639A/en
Publication of JPH0663984B2 publication Critical patent/JPH0663984B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、例えば鋼板表面の微小欠陥を検出する際に利
用される欠陥検出方法に関するものである。
TECHNICAL FIELD The present invention relates to a defect detection method used, for example, in detecting microscopic defects on the surface of a steel sheet.

〔従来の技術〕[Conventional technology]

鋼板表面の微小欠陥を検出する方法として、その表面画
像に基づいて行う方法が知られており、このような検出
方法にあっては、欠陥は輝度の変化部分であることが多
いので、表面画像を微分処理して得られる微分画像等の
強調画像に基づき、欠陥を検出することが多い。
As a method for detecting a microscopic defect on the surface of a steel sheet, a method based on the surface image is known, and in such a detection method, since the defect is often a brightness change portion, the surface image Defects are often detected on the basis of an enhanced image such as a differential image obtained by differentiating.

〔発明が解決しようとする課題〕[Problems to be Solved by the Invention]

ところが、表面画像を強調した微分画像に聞づいて欠陥
を検出する場合、例えば酸洗むら等のような背景の急激
な変化があるときには、この背景の変化も強調されるこ
とになり、対象とする欠陥の検出が困難であるという問
題点があった。
However, when a defect is detected by listening to the differential image in which the surface image is emphasized, when there is a rapid change in the background such as pickling unevenness, this background change is also emphasized. There is a problem that it is difficult to detect such defects.

本発明はかかる事情に鑑みてなされたものであり、微分
画像とこの微分画像を微分方向に所定量ずらした別の微
分画像との絶対値の加算処理または差分絶対値処理によ
って強調画像を得、この強調画像に基づいて欠陥を検出
することにより、背景の変化があっても、微小欠陥を正
確にしかも容易に検出できる欠陥検出方法を提供するこ
とを目的とする。
The present invention has been made in view of such circumstances, to obtain an emphasized image by the addition process or the absolute difference process of the absolute value of the differential image and another differential image obtained by shifting the differential image by a predetermined amount in the differential direction, An object of the present invention is to provide a defect detection method capable of accurately and easily detecting a minute defect even if there is a change in the background by detecting a defect based on this emphasized image.

〔課題を解決するための手段〕[Means for Solving the Problems]

本発明に係る欠陥検出方法は、被検出物の表面画像を
得、該表面画像を画像処理して前記被検出物の表面欠陥
を検出する欠陥検出方法において、前記表面画像を一方
向に微分処理して第1の微分画像を得、この第1の微分
画像を前記方向に所定量ずらせて第2の微分画像を得、
前記第1の微分画像の絶対値と前記第2の微分画像の絶
対値との加算処理、または前記第1の微分画像と前記第
2の微分画像との差の絶対値処理を施すことにより前記
表面画像の強調画像を得、該強調画像を二値化処理した
後小粒子除去処理または前記方向に垂直な方向に縮小処
理して前記被検出物の表面欠陥を検出することを特徴と
する。
A defect detection method according to the present invention is a defect detection method for obtaining a surface image of a detected object, image processing the surface image to detect surface defects of the detected object, and differentially processing the surface image in one direction. To obtain a first differential image, and to shift the first differential image in the direction by a predetermined amount to obtain a second differential image,
The addition of the absolute value of the first differential image and the absolute value of the second differential image, or the absolute value of the difference between the first differential image and the second differential image, The enhanced image of the surface image is obtained, the enhanced image is binarized, and then the small particles are removed or the image is reduced in a direction perpendicular to the direction to detect the surface defect of the detected object.

〔作用〕[Action]

本発明の欠陥検出方法にあっては、まず被検出物の表面
画像を微分処理して第1の微分画像を得る。この第1の
微分画像をその微分方向にずらせて第2の微分画像を得
る。この2種の微分画像について、両者の絶対値の加算
処理または両者の差の絶対値処理を施すことによって強
調画像を得る。次いでこの強調画像を二値化処理した
後、小粒子除去処理または微分方向に垂直な方向の縮小
処理を行って、欠陥を検出する。
According to the defect detecting method of the present invention, first, the surface image of the object to be detected is differentiated to obtain the first differential image. The first differential image is shifted in the differential direction to obtain the second differential image. An enhanced image is obtained by performing an addition process of the absolute values of the two types or an absolute value process of the difference between the two types of differential images. Next, after the binarization process is performed on the emphasized image, a small particle removal process or a reduction process in a direction perpendicular to the differential direction is performed to detect a defect.

そうすると得られる強調画像において、微小な領域にお
ける変化は更に強調され、広範囲な領域における変化は
強調されないので、背景の変化の影響を受けることなく
正確に微小欠陥を検出することができる。
In the obtained emphasized image, the change in the minute area is further emphasized and the change in the wide area is not emphasized, so that the minute defect can be accurately detected without being affected by the change in the background.

〔実施例〕〔Example〕

以下、本発明をその実施例を示す図面に基づいて具体的
に説明する。なお、本実施例では酸洗処理後の鋼板にお
ける表面の微小欠陥を検出する場合について説明する。
Hereinafter, the present invention will be specifically described with reference to the drawings illustrating the embodiments. In the present embodiment, a case will be described in which microscopic defects on the surface of the steel sheet after the pickling treatment are detected.

第1図は、本発明に係る欠陥検出方法の実施状態を示す
模式図であり、図中1は、表面の微小欠陥を検出すべき
被検出物たる鋼板を示す。鋼板1は酸洗処理が施された
後、図示しない搬送手段にて第1図表裏方向に搬送され
ている。鋼板1の上方には、ストロボ2及びカメタ3が
設けられており、ストロボ2からの照明により鋼板1の
表面画像がカメタ3に得られるようになっている。カメ
ラ3には、カメラ3にて得られた表面画像を画像処理し
て微小欠陥を検出する画像処理装置4が接続されてい
る。
FIG. 1 is a schematic diagram showing an implementation state of the defect detection method according to the present invention, in which 1 denotes a steel plate as an object to be detected for a microscopic defect on the surface. After the steel sheet 1 is subjected to pickling treatment, it is conveyed in the front and back direction of FIG. A strobe 2 and a camera 3 are provided above the steel plate 1, and a surface image of the steel plate 1 can be obtained on the camera 3 by illumination from the strobe 2. The camera 3 is connected to an image processing device 4 that performs image processing on the surface image obtained by the camera 3 to detect minute defects.

次に動作について説明する。Next, the operation will be described.

カメラ3の下方に搬送された鋼板1は、ストロボ2から
の照明によってカメラ3に撮像され、その表面画像が得
られる。カメラ3にて得られた表面画像は、画像処理装
置3へ入力され、以下に示す手順にて画像処理されて微
小欠陥が検出される。
The steel plate 1 conveyed below the camera 3 is imaged by the camera 3 by the illumination from the strobe 2, and a surface image thereof is obtained. The surface image obtained by the camera 3 is input to the image processing device 3 and subjected to image processing in the procedure described below to detect a micro defect.

酸洗処理後の鋼板の表面には酸洗むらが見られ、得られ
るその表面画像では、微小欠陥が存在する部分とこの酸
洗むらの部分との輝度レベルが高くなる。第2図はこの
表面画像の輝度レベルを示す模式図であり、微小欠陥部
分(第2図(a))と酸洗むらの部分(第2図(b))
との部分の輝度レベルが高い。但し、微小欠陥が存在す
る部分は酸洗むらの部分に比して、輝度変化領域が狭
い。
The pickling unevenness is observed on the surface of the steel sheet after the pickling treatment, and in the obtained surface image, the luminance level of the portion where the minute defect exists and the pickling unevenness is high. FIG. 2 is a schematic diagram showing the brightness level of the surface image, which includes minute defect portions (FIG. 2 (a)) and uneven pickling portions (FIG. 2 (b)).
The brightness level of the and part is high. However, the area where the minute defects are present has a narrower brightness change area than the area where the pickling is uneven.

このような表面画像を第2図左右方向に微分処理して第
1の微分画像を得る。第3図の実線にて示すAは、表面
画像を微分処理した微分画像の輝度レベルを示す模式図
であり、図中(a)の部分が微小欠陥部分に対応し、図
中(b)の部分が酸洗むらの部分に対応する。微小欠陥
部分は輝度変化領域が狭いので、微分画像の輝度レベル
においては正負の接近した振幅分布となり、酸等むらの
部分は輝度変化領域が広いので、微分画像の輝レベルに
おいては距離を隔てた正及び負の振幅分布を呈する。
Such a surface image is differentiated in the left-right direction in FIG. 2 to obtain a first differential image. A shown by a solid line in FIG. 3 is a schematic diagram showing the brightness level of the differential image obtained by differentiating the surface image. The part (a) in the figure corresponds to the minute defect part, and the part (b) in FIG. The part corresponds to the uneven pickling part. Since the minute defect portion has a narrow brightness change area, the positive and negative amplitude distributions are close to each other at the brightness level of the differential image, and the uneven brightness area has a wide brightness change area, so the brightness level of the differential image is separated. It exhibits positive and negative amplitude distributions.

次いで、第1の微分画像を微分方向に所定量だけずらし
て第2の微分画像を得る。第3図の破線にて示すBは、
この第2の微分画像における輝度レベルを示す模式図で
あり、Aの波形を第3図右方向にずらせた波形を呈す
る。
Then, the first differential image is shifted in the differential direction by a predetermined amount to obtain the second differential image. B shown by a broken line in FIG.
It is a schematic diagram which shows the brightness level in this 2nd differential image, and shows the waveform which shifted the waveform of A to the right direction of FIG.

次に、この第1の微分画像の輝度レベルの絶対値と第2
の微分画像の輝度レベルの絶対値とを加算する処理(絶
対値加算処理)か、または第1の微分画像の輝度レベル
と第2の微分画像の輝度レベルとの差の絶対値を求める
処理(差分絶対値処理)を行い、強調画像を得る。な
お、この絶対値加算処理,差分絶対値処理は、具体的に
は下記(1),(2)式にて示すものである。但し、n
は微分方向にずらせた所定量を示す。
Next, the absolute value of the luminance level of the first differential image and the second
Processing for adding the absolute value of the brightness level of the differential image of (absolute value addition processing), or processing for obtaining the absolute value of the difference between the brightness level of the first differential image and the brightness level of the second differential image ( An absolute image is obtained by performing a difference absolute value process). The absolute value addition processing and the difference absolute value processing are specifically shown by the following equations (1) and (2). However, n
Indicates a predetermined amount shifted in the differential direction.

g(x,y) =|f(x,y)|+|f(x+n,y)| …(1) g(x,y) =|f(x,y)−f(x+n,y)| …(2) 第4図は、これらの処理が行われて得られる強調画像に
おける輝度レベルを示す模式図である。第4図から理解
される如く、微小欠陥部分(a)では強調されて輝度レ
ベルは上昇しているが、酸洗むらの部分(b)では強調
されずに輝度レベルは変化しない。
g (x, y) = | f (x, y) | + | f (x + n, y) | ... (1) g (x, y) = | f (x, y) -f (x + n, y) | (2) FIG. 4 is a schematic diagram showing the brightness level in the emphasized image obtained by performing these processes. As can be seen from FIG. 4, the luminance level is increased by being emphasized in the minute defect portion (a), but is not emphasized in the uneven pickling portion (b) and the luminance level does not change.

次に、このような輝度レベルを呈する強調画像において
適当なレベルにて2値化処理を行った後、小粒子除去ま
たは前記微分方向に垂直な方向に縮小処理を行ってノイ
ズ成分を除去し、縮小欠陥を検出する。
Next, after performing binarization processing at an appropriate level on the emphasized image exhibiting such a brightness level, small particles are removed or reduction processing is performed in a direction perpendicular to the differentiation direction to remove noise components, Detect shrinkage defects.

従って本発明の検出方法では、酸洗むらの部分は強調さ
れずに、縮小欠陥部分が強調されるので、酸洗むらを微
小欠陥として誤検出することなく、正確に微小欠陥を検
出することができる。つまり、酸洗むらの影響なしに、
微小欠陥を検出することができる。
Therefore, in the detection method of the present invention, the pickling unevenness portion is not emphasized but the reduction defect portion is emphasized, so that the pickling unevenness can be accurately detected without erroneously detecting the pickling unevenness as a minute defect. it can. In other words, without the effect of uneven pickling,
Minute defects can be detected.

なお、第1図に示す装置構成では鋼板1の上面における
微小欠陥を検出する構成となっているが、鋼板1の下方
に別のストロボ及びカメラを設けて同様な画像処理を行
う構成とする場合には、同時に両面における微小欠陥を
検出することができることは勿論である。
Although the apparatus configuration shown in FIG. 1 is configured to detect minute defects on the upper surface of the steel plate 1, when another strobe and camera are provided below the steel plate 1 to perform similar image processing. Of course, it is of course possible to detect minute defects on both sides at the same time.

〔発明の効果〕〔The invention's effect〕

本発明の欠陥検出方法では、微分方向にずらせた2種の
微分画像について絶対値加算処理または差分絶対値処理
を行って強調画像を得るので、酸洗むらのような背景の
変化がある場合にあっても、微小欠陥検出を正確に行う
ことができる。
In the defect detection method of the present invention, since an enhanced image is obtained by performing absolute value addition processing or differential absolute value processing on two types of differential images that are shifted in the differential direction, when there is a background change such as pickling unevenness. Even if there is, the minute defect can be accurately detected.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明に係る欠陥検出方法の実施状態を示す模
式図、第2図は表面画像の輝度レベルを示す模式図、第
3図は微分画像の輝度レベルを示す模式図、第4図は強
調画像の輝度レベルを示す模式図である。 1……鋼板、2……ストロボ、3……カメラ、4……画
像処理装置
FIG. 1 is a schematic diagram showing an implementation state of a defect detecting method according to the present invention, FIG. 2 is a schematic diagram showing a luminance level of a surface image, FIG. 3 is a schematic diagram showing a luminance level of a differential image, and FIG. FIG. 6 is a schematic diagram showing the brightness level of an emphasized image. 1 ... Steel plate, 2 ... Strobe, 3 ... Camera, 4 ... Image processing device

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】被検出物の表面画像を得、該表面画像を画
像処理して前記被検出物の表面欠陥を検出する欠陥検出
方法において、 前記表面画像を一方向に微分処理して第1の微分画像を
得、この第1の微分画像を前記方向に所定量ずらせて第
2の微分画像を得、前記第1の微分画像の絶対値と前記
第2の微分画像の絶対値との加算処理、または前記第1
の微分画像と前記第2の微分画像との差の絶対値処理を
施すことにより前記表面画像の強調画像を得、該強調画
像を二値化処理した後小粒子除去処理または前記方向に
垂直な方向に縮小処理して前記被検出物の表面欠陥を検
出することを特徴とする欠陥検出方法。
1. A defect detection method for obtaining a surface image of an object to be detected and image-processing the surface image to detect surface defects of the object to be detected, wherein the surface image is differentially processed in one direction. Differential image is obtained, the first differential image is shifted in the direction by a predetermined amount to obtain a second differential image, and the absolute value of the first differential image and the absolute value of the second differential image are added. Processing, or the first
Of the surface image is obtained by performing absolute value processing of the difference between the differential image and the second differential image, and the enhanced image is binarized, and then the small particles are removed or the direction perpendicular to the direction is obtained. A defect detection method, characterized in that a surface defect is detected by performing a reduction process in a direction.
JP8090388A 1988-03-31 1988-03-31 Defect detection method Expired - Fee Related JPH0663984B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8090388A JPH0663984B2 (en) 1988-03-31 1988-03-31 Defect detection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8090388A JPH0663984B2 (en) 1988-03-31 1988-03-31 Defect detection method

Publications (2)

Publication Number Publication Date
JPH01253639A JPH01253639A (en) 1989-10-09
JPH0663984B2 true JPH0663984B2 (en) 1994-08-22

Family

ID=13731331

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8090388A Expired - Fee Related JPH0663984B2 (en) 1988-03-31 1988-03-31 Defect detection method

Country Status (1)

Country Link
JP (1) JPH0663984B2 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014209043A1 (en) * 2013-06-27 2014-12-31 파크시스템스 주식회사 Image acquiring method and image acquiring apparatus using same

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3212373B2 (en) * 1992-08-27 2001-09-25 信越化学工業株式会社 Inspection method and inspection device for air bubbles and foreign matter in optical fiber preform

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014209043A1 (en) * 2013-06-27 2014-12-31 파크시스템스 주식회사 Image acquiring method and image acquiring apparatus using same
US10133052B2 (en) 2013-06-27 2018-11-20 Park Systems Corp. Image acquiring method and image acquiring apparatus using the same

Also Published As

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JPH01253639A (en) 1989-10-09

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