JP2508662Y2 - Flaw detection device - Google Patents

Flaw detection device

Info

Publication number
JP2508662Y2
JP2508662Y2 JP1990122914U JP12291490U JP2508662Y2 JP 2508662 Y2 JP2508662 Y2 JP 2508662Y2 JP 1990122914 U JP1990122914 U JP 1990122914U JP 12291490 U JP12291490 U JP 12291490U JP 2508662 Y2 JP2508662 Y2 JP 2508662Y2
Authority
JP
Japan
Prior art keywords
defect
difference
flaw
density
unit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP1990122914U
Other languages
Japanese (ja)
Other versions
JPH0479250U (en
Inventor
守 吉田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP1990122914U priority Critical patent/JP2508662Y2/en
Publication of JPH0479250U publication Critical patent/JPH0479250U/ja
Application granted granted Critical
Publication of JP2508662Y2 publication Critical patent/JP2508662Y2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Description

【考案の詳細な説明】 [産業上の利用分野] 本考案は,対象領域内に濃度むらがあっても誤検出す
ることなく疵を検出する疵検出装置に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a flaw detection device that detects flaws without erroneous detection even if there is uneven density in the target area.

[従来の技術] 従来の疵検出装置の構成例を第4図に示す。第4図に
おいて(1)は画像を入力する入力部,(2)は画像デ
ータの高周波成分をカットするローパスフイルタ,
(3)は(1)の入力部の画像データから(2)のロー
パスフィルタを通った画像データの差を計算する差分計
算部,(7)は(3)で得られた差分データを判定値と
比較することにより疵を検出する疵検出部,(6)は結
果を出力する結果出力部である。
[Prior Art] FIG. 4 shows a configuration example of a conventional flaw detection device. In FIG. 4, (1) is an input unit for inputting an image, (2) is a low-pass filter for cutting high-frequency components of image data,
(3) is a difference calculation unit that calculates the difference between the image data of the input unit of (1) and the image data that has passed through the low-pass filter of (2), and (7) is the difference data obtained in (3) A defect detection unit that detects a defect by comparing with (6) is a result output unit that outputs a result.

次に従来の疵検出装置による処理例を第5図に示す。
第5図において(a)の実線は(1)の入力部で入力し
た入力画像の信号波形を示す。また同図の破線は(2)
のローパスフィルタを通した信号波形を示す。第5図
(b)は差分計算部における入力データからローパスフ
ィルタの結果を引いた差分データを示す。更に疵検出部
では個の差分データと疵判定値Thを比較し,差分値が判
定値を越えた所を疵としていた。この様に,従来の方法
では背景に緩やかな濃度変動がある場合ローパスフィル
タで母材部分を推定し入力信号との差分を取ることによ
り疵信号を抽出し,疵の検出を行っていた。
Next, FIG. 5 shows an example of processing by the conventional flaw detection device.
In FIG. 5, the solid line in (a) shows the signal waveform of the input image input through the input section in (1). The broken line in the figure is (2)
3 shows a signal waveform after passing through the low pass filter of FIG. FIG. 5 (b) shows difference data obtained by subtracting the result of the low-pass filter from the input data in the difference calculation unit. Further, the flaw detection unit compares the individual difference data with the flaw judgment value Th, and marks the portion where the difference value exceeds the judgment value as a flaw. As described above, in the conventional method, when there is a gradual density fluctuation in the background, the defect signal is extracted by estimating the base metal part with a low-pass filter and taking the difference from the input signal to detect the defect.

[考案が解決しようとする課題] 第6図に従来の装置による別の処理例を示す。第6図
(a),(b)第5図と同じく実線が入力データ破線が
ローパスフィルタの出力を示すが,第5図と違って疵が
ない代わりに中央付近の信号レベルが大きく落ち込んで
いる。これは表面性状の違い等に起因するものである。
この様な信号に対して従来の処理をそのまま行うと,同
図(b)の様に欠陥でないところの信号が立ち誤検出の
原因となる。
[Problems to be Solved by the Invention] FIG. 6 shows another example of processing by a conventional device. Similar to FIGS. 6 (a) and 6 (b), the solid line shows the input data and the broken line shows the output of the low-pass filter, but unlike FIG. 5, there is no flaw, but the signal level near the center drops greatly. . This is due to differences in surface properties and the like.
If the conventional processing is performed on such a signal as it is, a signal at a non-defective portion as shown in FIG.

この様に従来の方法では母材部濃度が急に立ち下がる
と正常部分を疵と誤検出することがあった 本考案はこのような課題を解決するためになされたも
のであり,従来の方法で疵候補の検出を行つた後疵候補
回りの濃度分布から本当の疵か否かを判定することによ
り誤検出の発生を防ぐことを目的としたものである。
As described above, in the conventional method, when the concentration of the base metal part suddenly drops, the normal part may be erroneously detected as a flaw. The present invention was made to solve such a problem. The purpose of this is to prevent the occurrence of erroneous detection by determining whether or not there is a true defect from the density distribution around the defect candidate after detecting the defect candidate.

[課題を解決するための手段] この考案に係る疵検出装置は,疵候補の中から疵では
ないものを判定するために疵候補の差分信号の頂点から
両側の一定画素分の濃度の変化量を比較し,この結果か
ら疵か否かを判定する判定部を備えたものである。
[Means for Solving the Problems] A flaw detection apparatus according to the present invention is configured to determine the amount of change in the density of a fixed pixel on both sides from the apex of the difference signal of the flaw candidate in order to determine which of the flaw candidates is not a flaw. And a determination unit for determining whether or not there is a defect based on the result.

またこの考案に係る疵検出装置は,疵候補の中から疵
ではないものを判定するために疵候補の近傍の濃度の落
ち込みと少し離れたところの濃度平均を比較し,この結
果から疵か否かを判定する判定部を備えたものである。
In addition, the flaw detection device according to the present invention compares the drop in the density in the vicinity of the flaw candidate with the density average at a slight distance in order to determine the non-defect among the flaw candidates, and based on this result, It is provided with a determination unit for determining whether or not.

[作用] この考案に係る疵検出装置は,疵候補の周辺の濃度分
布パターンから疵候補が本当の疵か否かを判定するの
で,検査領域内で誤検出を誘発する様な濃度の落ち込み
があっても,背景中の緩やかな濃度変化を除去し,疵の
みを検出することができる。
[Operation] Since the flaw detection device according to the present invention determines whether or not the flaw candidate is a true flaw based on the density distribution pattern around the flaw candidate, there is a concentration drop that induces an erroneous detection in the inspection area. Even if there is, a gradual change in density in the background can be removed and only a flaw can be detected.

[実施例] 以下に本考案に係る装置の実施例を示す。[Embodiment] An embodiment of the device according to the present invention will be shown below.

第1図に本考案による装置の構成の一例を示す。第1図
において(1)は画像を入力する入力部,(2)は画像
データの高周波成分をカットするローパスフィルタ,
(3)は(1)の入力部の画像データから(2)のロー
パスフィルタを通った画像データの差を計算する差分計
算部,(4)は(3)で得られた差分データを判定値と
比較することにより疵の候補を検出する疵候補検出部,
(5)は(4)で得られた疵候補についてその回りの濃
度情報から疵候補が実際の疵か否かを判定する疵候補検
出部,(6)は結果を出力する結果出力部である。
FIG. 1 shows an example of the configuration of the device according to the present invention. In FIG. 1, (1) is an input unit for inputting an image, (2) is a low-pass filter for cutting high-frequency components of image data,
(3) is a difference calculation unit that calculates the difference between the image data of the input unit (1) and the image data that has passed through the low-pass filter of (2), and (4) is the difference data obtained in (3) A defect candidate detection unit that detects a defect candidate by comparing with
(5) is a defect candidate detection unit that determines whether or not the defect candidate is an actual defect from the density information around the defect candidate obtained in (4), and (6) is a result output unit that outputs the result. .

次に動作について説明する。まず(1)の画像入力か
ら(3)の差分計算までは従来の方式と同様であり,図
5に示す通りである。また(4)の疵候補検出も処理内
容は従来の疵検出と同様であり,同じく第5図に示す通
りである。(5)の疵判定部の処理について第2図を用
いて説明する。
Next, the operation will be described. First, from (1) image input to (3) difference calculation is the same as the conventional method, as shown in FIG. The processing content of the defect candidate detection of (4) is similar to that of the conventional defect detection, and is also as shown in FIG. The processing of the flaw determination unit (5) will be described with reference to FIG.

第2図において,(a)は実際の疵を模式的に表した
もの,(b)は濃度の大きな変化部が疵候補として検知
される濃度分布の例を示す。同図においてPは疵候補と
して検出された時の差分値のピーク位置である。またA
L,ARはP点からそれぞれ左右i画素ずつの濃度平均値で
ある。更に,DL,DRはP点の濃度値とAL,ARの差である。
図にも示した様に一般的に疵は(a)のような濃度分布
となりDLとDRはほぼ等しくなる。また(b)では,P点の
左右で濃度分布の形状は大きく異なり,DLとDRに差がで
る。そこで, を満たした場合は疵と判定し,それ以外は棄却する。
In FIG. 2, (a) schematically shows an actual flaw, and (b) shows an example of a density distribution in which a change portion having a large density is detected as a flaw candidate. In the figure, P is the peak position of the difference value when detected as a defect candidate. Also A
L and AR are density average values for each of the left and right i pixels from the point P. Further, DL and DR are the differences between the density value at point P and AL and AR.
As shown in the figure, generally, flaws have a concentration distribution as shown in (a), and DL and DR are almost equal. Further, in (b), the shape of the concentration distribution is greatly different on the left and right of the point P, and there is a difference between DL and DR. Therefore, If it satisfies the condition, it is judged as a defect, and otherwise it is rejected.

次に別の実施例に基づいて疵判定方法を第3図に示
す。第3図は濃度むらが斑状に発生する場合の例であ
り,2箇所で濃度の落ち込みがあるためその間にある正常
部があたかも疵であるような濃度分布となっている。第
3図においてPは疵候補として検出された時の差分値の
ピーク位置であるまたBL,BRはP点から左右i画素内の
濃度最小値であり,AL,ARはその外側j画素の濃度平均値
である。更にDL,DRはそれぞれALとBL,ARとBRの差であ
る。第2図にも示した様に疵であれば疵のところだけが
濃度が高くその周辺は一様であるので, DL≦Dset DR≦Dset Dsetは設定値 の両方を満たす場合のみ疵とし,それ以外は棄却する。
Next, FIG. 3 shows a flaw determination method based on another embodiment. Fig. 3 is an example of the case where uneven density occurs in a patchy manner, and since there is a drop in density at two locations, the density distribution is such that the normal part between them is like a flaw. In Fig. 3, P is the peak position of the difference value when it is detected as a defect candidate, BL and BR are the minimum density values in the left and right i pixels from the P point, and AL and AR are the density values of the outer j pixels. It is an average value. Furthermore, DL and DR are the differences between AL and BL, and AR and BR, respectively. As shown in Fig. 2, if there is a flaw, the density is high only at the flaw and the surrounding area is uniform. Therefore, DL ≤ Dset DR ≤ Dset Dset is a flaw only when both of the set values are satisfied, and Reject other than.

この様に本考案によれば,まず差分の信号レベルから
疵候補をピックアップし,次に疵候補の中から周辺の濃
度分布形状により疵以外のものを棄却していくので,誤
検出を減らすことができる。
As described above, according to the present invention, the defect candidates are first picked up from the difference signal level, and then the defect candidates other than the defect are rejected according to the density distribution shape of the periphery, so that false detection is reduced. You can

[考案の効果] 以上の様に,この考案によれば検査領域中に大きな濃
度の落ち込みがあっても誤検出することなく疵を検出す
ることができる。
[Advantage of Device] As described above, according to this device, even if there is a large concentration drop in the inspection area, a defect can be detected without erroneous detection.

【図面の簡単な説明】[Brief description of drawings]

第1図は本考案による疵検出装置の実施例の構成図,第
2図は本考案による実施例の動作の説明図,第3図はこ
の考案による実施例の動作の説明図,第4図は従来の装
置の構成図,第5図,第6図は従来の装置の動作の説明
図である。図において,(1)は入力部,(2)はロー
パスフィルタ,(3)は差分計算部,(4)は疵候補検
出部,(5)は疵判定部,(6)は結果出力部,(7)
は疵検出部である。 尚,各図中同一符号は同一または相当部分を示す。
FIG. 1 is a block diagram of an embodiment of a flaw detection device according to the present invention, FIG. 2 is an explanatory view of operation of the embodiment according to the present invention, FIG. 3 is an explanatory view of operation of an embodiment of the present invention, and FIG. Is a block diagram of a conventional device, and FIGS. 5 and 6 are explanatory views of the operation of the conventional device. In the figure, (1) is an input unit, (2) is a low-pass filter, (3) is a difference calculation unit, (4) is a defect candidate detection unit, (5) is a defect determination unit, (6) is a result output unit, (7)
Is a flaw detection unit. In the drawings, the same reference numerals indicate the same or corresponding parts.

Claims (2)

(57)【実用新案登録請求の範囲】(57) [Scope of utility model registration request] 【請求項1】画像を入力する入力部と、入力された画像
データの走査線方向にフィルタリングするローパスフィ
ルタと、入力データとローパスフィルタ出力の差分を計
算する差分計算部と、上記差分の結果から疵候補を検出
する疵候補検出部と、この疵候補検出部で得られた疵候
補の差分信号の頂点から両側の一定画素分の濃度変化率
の違いから疵か否かを判定する疵判定部と、上記判定結
果を出力する結果出力部を備えたことを特徴とする疵検
出装置。
1. An input unit for inputting an image, a low-pass filter for filtering input image data in a scanning line direction, a difference calculation unit for calculating a difference between input data and an output of the low-pass filter, and a result of the difference. A defect candidate detection unit that detects a defect candidate, and a defect determination unit that determines whether or not there is a defect based on the difference in the density change rates of certain pixels on both sides from the apex of the difference signal of the defect candidate obtained by this defect candidate detection unit. And a defect output device for outputting the above determination result.
【請求項2】疵判定部において、疵候補の近傍とやや離
れた所の濃度平均を比較することにより疵か否かを判定
することを特徴とする実用新案登録請求の範囲第(1)
項記載の疵検出装置。
2. A utility model registration claim (1) characterized in that, in the defect determination unit, it is determined whether or not there is a defect by comparing the average density of the vicinity of the defect candidate and the density average of a place slightly apart.
The flaw detection device according to the item.
JP1990122914U 1990-11-22 1990-11-22 Flaw detection device Expired - Lifetime JP2508662Y2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1990122914U JP2508662Y2 (en) 1990-11-22 1990-11-22 Flaw detection device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1990122914U JP2508662Y2 (en) 1990-11-22 1990-11-22 Flaw detection device

Publications (2)

Publication Number Publication Date
JPH0479250U JPH0479250U (en) 1992-07-10
JP2508662Y2 true JP2508662Y2 (en) 1996-08-28

Family

ID=31870649

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1990122914U Expired - Lifetime JP2508662Y2 (en) 1990-11-22 1990-11-22 Flaw detection device

Country Status (1)

Country Link
JP (1) JP2508662Y2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5360467B2 (en) * 2008-10-08 2013-12-04 アイシン精機株式会社 Defect inspection equipment

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5917088A (en) * 1982-07-21 1984-01-28 株式会社日立製作所 Decompressing orifice
JPS59224546A (en) * 1983-06-03 1984-12-17 Matsushita Electric Works Ltd Defect detector
JPS59225338A (en) * 1983-06-06 1984-12-18 Daido Steel Co Ltd Fluorescent magnetic powder flaw detecting method in steel material
JPS59226853A (en) * 1983-06-07 1984-12-20 Daido Steel Co Ltd Flaw detecting method in steel by fluorescent magnetic powder
JPS6089734A (en) * 1983-10-24 1985-05-20 Nok Corp Inspecting method of surface defect
JPS617406A (en) * 1984-06-21 1986-01-14 Mitsubishi Electric Corp Defect detecting method of body shape
JPS6252454A (en) * 1985-08-30 1987-03-07 Daido Steel Co Ltd Method and apparatus for judging flaw in fluorescent magnetic powder flaw detection
JP2555022B2 (en) * 1986-03-28 1996-11-20 株式会社日立製作所 Detection method of defect of inspection machine
JPS6344281A (en) * 1986-08-08 1988-02-25 Sanyo Electric Co Ltd Image processor
JPS63175976A (en) * 1987-01-16 1988-07-20 Toshiba Corp Flaw detecting and inspecting device

Also Published As

Publication number Publication date
JPH0479250U (en) 1992-07-10

Similar Documents

Publication Publication Date Title
CN104101600B (en) Cross Section of CC Billet testing of small cracks method
JP2000036044A (en) Defect integrating processor and defect integrating processing method
CN115375686A (en) Glass edge flaw detection method based on image processing
CN115100191A (en) Metal casting defect identification method based on industrial detection
JPH08189904A (en) Surface defect detector
JP2508662Y2 (en) Flaw detection device
JP3640136B2 (en) Surface flaw inspection method and apparatus
JPH07333197A (en) Automatic surface flaw detector
JP4403036B2 (en) Soot detection method and apparatus
JPH08145907A (en) Inspection equipment of defect
JPH09138200A (en) Method for determining surface defect of strip material
JPH02242382A (en) Defect checking method
JP2508662Z (en)
JPH11132743A (en) Defect inspecting device by image signal processing
JPH1038543A (en) Shape inspection method
JPH08145904A (en) Inspection equipment of bright defect/dark defect
JP2000321038A (en) Method for detecting fault of pattern
JPH0569536A (en) Defect detecting method and defect detecting circuit in inspection device for printed matter
JPH0894541A (en) Method for detecting chipped corner of subject for inspection
JP3145296B2 (en) Defect detection method
JP2738252B2 (en) Edge detection device of strip material by image
JP3297945B2 (en) Steel sheet surface defect detection method
JPH09145637A (en) Method for judging grade of roughness defect
JPH06281438A (en) Method for detecting worn part of roll
JP2002163656A (en) Device and method for detecting traveling vehicle

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term